Patents by Inventor Zhi-Cheng Chen
Zhi-Cheng Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20240096895Abstract: According to one example, a semiconductor device includes a substrate and a fin stack that includes a plurality of nanostructures, a gate device surrounding each of the nanostructures, and inner spacers along the gate device and between the nanostructures. A width of the inner spacers differs between different layers of the fin stack.Type: ApplicationFiled: November 29, 2023Publication date: March 21, 2024Inventors: Jui-Chien Huang, Shih-Cheng Chen, Chih-Hao Wang, Kuo-Cheng Chiang, Zhi-Chang Lin, Jung-Hung Chang, Lo-Heng Chang, Shi Ning Ju, Guan-Lin Chen
-
Publication number: 20240093373Abstract: A method for preparing antibacterial stainless steel by surface alloying includes the steps of coating an infiltration promoter layer on a stainless steel surface, coating an antibacterial metal layer on a surface of the infiltration promoter layer, and performing heat treatment of the stainless steel to diffuse an antibacterial metal into the stainless steel. This method can be applied to various types of stainless steel, and the antibacterial metal can be diffused and quenched into the stainless steel, such that the finally formed surface of the stainless steel has an antibacterial alloy layer with a specific thickness to provide better corrosion resistance and antibacterial ability without changing the advantages and properties of the antibacterial metal or stainless steel substrate, and the thickness and concentration of the antibacterial metal layer, and the parameters for heat treatment can be adjusted to control the chemical composition and thickness of the antibacterial alloy layer.Type: ApplicationFiled: November 16, 2022Publication date: March 21, 2024Inventors: WEN-TA TSAI, BERNARD HAOCHIH LIU, ZHI-YAN CHEN, CHONG-CHENG HUANG
-
Patent number: 11929287Abstract: The present disclosure describes a semiconductor structure with a dielectric liner. The semiconductor structure includes a substrate and a fin structure on the substrate. The fin structure includes a stacked fin structure, a fin bottom portion below the stacked fin structure, and an isolation layer between the stacked fin structure and the bottom fin portion. The semiconductor structure further includes a dielectric liner in contact with an end of the stacked fin structure and a spacer structure in contact with the dielectric liner.Type: GrantFiled: April 23, 2021Date of Patent: March 12, 2024Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Zhi-Chang Lin, Shih-Cheng Chen, Kuo-Cheng Chiang, Kuan-Ting Pan, Jung-Hung Chang, Lo-Heng Chang, Chien Ning Yao
-
Publication number: 20240071769Abstract: The present disclosure provides a manufacturing method of a semiconductor structure. The method includes: forming a conformal layer over a first patterned layer over a substrate; forming a second layer over the conformal layer and between portions of the first patterned layer; performing a first etching to form a second patterned layer and a patterned conformal layer; performing a second etching to remove a portion of the first patterned layer to form a first inclined member of the first patterned layer tapered away from the substrate and lining a vertical portion of the patterned conformal layer, and to remove a portion of the second patterned layer to form a second inclined member of the second patterned layer tapered away from the substrate and lining the vertical portion of the patterned conformal layer; and performing a third etching to remove the vertical portions of the patterned conformal layer.Type: ApplicationFiled: August 29, 2022Publication date: February 29, 2024Inventors: Zhi-Yi HUANG, Ying-Cheng CHUANG, Tsung-Cheng CHEN
-
Publication number: 20240071770Abstract: The present disclosure provides a manufacturing method of a semiconductor structure. The method includes: forming a conformal layer over a first patterned layer over a substrate; forming a second layer over the conformal layer and between portions of the first patterned layer; performing a first etching to form a second patterned layer and a patterned conformal layer; performing a second etching to remove a portion of the first patterned layer to form a first inclined member of the first patterned layer tapered away from the substrate and lining a vertical portion of the patterned conformal layer, and to remove a portion of the second patterned layer to form a second inclined member of the second patterned layer tapered away from the substrate and lining the vertical portion of the patterned conformal layer; and performing a third etching to remove the vertical portions of the patterned conformal layer.Type: ApplicationFiled: June 30, 2023Publication date: February 29, 2024Inventors: ZHI-YI HUANG, YING-CHENG CHUANG, TSUNG-CHENG CHEN
-
Patent number: 11916122Abstract: A method for forming a gate all around transistor includes forming a plurality of semiconductor nanosheets. The method includes forming a cladding inner spacer between a source region of the transistor and a gate region of the transistor. The method includes forming sheet inner spacers between the semiconductor nanosheets in a separate deposition process from the cladding inner spacer.Type: GrantFiled: July 8, 2021Date of Patent: February 27, 2024Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Zhi-Chang Lin, Kuan-Ting Pan, Shih-Cheng Chen, Jung-Hung Chang, Lo-Heng Chang, Chien-Ning Yao, Kuo-Cheng Chiang
-
Patent number: 9877889Abstract: A walker having a folded position and an unfolded position, wherein the walker comprises a structural frame with a first upright portion, a second upright portion, a folding mechanism between the first upright portion and the second upright portion, ground engaging elements on each of the first upright portion and second upright portion, and a foldable basket with first and second opposed ends secured by one or more fasteners to the first upright portion and the second upright portion, respectively. In another embodiment, walker comprises a structural frame with a first end, a second end, and sides between the first end and the second end, a handle or handles on the structural frame at the first end of the structural frame, ground engaging elements at the first end and the second end of the structural frame, and a suspension system integrated with the structural frame.Type: GrantFiled: June 26, 2017Date of Patent: January 30, 2018Assignee: Bdark Holdings Ltd.Inventor: Zhi Cheng Chen
-
Publication number: 20170354565Abstract: A walker having a folded position and an unfolded position, wherein the walker comprises a structural frame with a first upright portion, a second upright portion, a folding mechanism between the first upright portion and the second upright portion, ground engaging elements on each of the first upright portion and second upright portion, and a foldable basket with first and second opposed ends secured by one or more fasteners to the first upright portion and the second upright portion, respectively. In another embodiment, walker comprises a structural frame with a first end, a second end, and sides between the first end and the second end, a handle or handles on the structural frame at the first end of the structural frame, ground engaging elements at the first end and the second end of the structural frame, and a suspension system integrated with the structural frame.Type: ApplicationFiled: June 26, 2017Publication date: December 14, 2017Inventor: Zhi Cheng Chen
-
Patent number: 9687411Abstract: A walker having a folded position and an unfolded position, wherein the walker comprises a structural frame with a first upright portion, a second upright portion, a folding mechanism between the first upright portion and the second upright portion, ground engaging elements on each of the first upright portion and second upright portion, and a foldable basket with first and second opposed ends secured by one or more fasteners to the first upright portion and the second upright portion, respectively. In another embodiment, walker comprises a structural frame with a first end, a second end, and sides between the first end and the second end, a handle or handles on the structural frame at the first end of the structural frame, ground engaging elements at the first end and the second end of the structural frame, and a suspension system integrated with the structural frame.Type: GrantFiled: July 1, 2016Date of Patent: June 27, 2017Inventor: Zhi Cheng Chen
-
Publication number: 20160310346Abstract: A walker having a folded position and an unfolded position, wherein the walker comprises a structural frame with a first upright portion, a second upright portion, a folding mechanism between the first upright portion and the second upright portion, ground engaging elements on each of the first upright portion and second upright portion, and a foldable basket with first and second opposed ends secured by one or more fasteners to the first upright portion and the second upright portion, respectively. In another embodiment, walker comprises a structural frame with a first end, a second end, and sides between the first end and the second end, a handle or handles on the structural frame at the first end of the structural frame, ground engaging elements at the first end and the second end of the structural frame, and a suspension system integrated with the structural frame.Type: ApplicationFiled: July 1, 2016Publication date: October 27, 2016Inventor: Zhi Cheng Chen
-
Patent number: 9381132Abstract: A walker having a folded position and an unfolded position, wherein the walker comprises a structural frame with a first upright portion, a second upright portion, a folding mechanism between the first upright portion and the second upright portion, ground engaging elements on each of the first upright portion and second upright portion, and a foldable basket with first and second opposed ends secured by one or more fasteners to the first upright portion and the second upright portion, respectively. In another embodiment, walker comprises a structural frame with a first end, a second end, and sides between the first end and the second end, a handle or handles on the structural frame at the first end of the structural frame, ground engaging elements at the first end and the second end of the structural frame, and a suspension system integrated with the structural frame.Type: GrantFiled: December 23, 2013Date of Patent: July 5, 2016Inventor: Zhi Cheng Chen
-
Publication number: 20150173994Abstract: A walker having a folded position and an unfolded position, wherein the walker comprises a structural frame with a first upright portion, a second upright portion, a folding mechanism between the first upright portion and the second upright portion, ground engaging elements on each of the first upright portion and second upright portion, and a foldable basket with first and second opposed ends secured by one or more fasteners to the first upright portion and the second upright portion, respectively. In another embodiment, walker comprises a structural frame with a first end, a second end, and sides between the first end and the second end, a handle or handles on the structural frame at the first end of the structural frame, ground engaging elements at the first end and the second end of the structural frame, and a suspension system integrated with the structural frame.Type: ApplicationFiled: December 23, 2013Publication date: June 25, 2015Applicant: Artisan of Canada, Ltd.Inventor: Zhi Cheng Chen
-
Publication number: 20090308154Abstract: The present invention relates to a fuel cartridge structure with sensor apparatus, comprising a main fuel solution tank provided with a casing with accommodation space, the accommodation space being used for storing the fuel solution; and a sensor apparatus mainly having two sensor components, the two sensor components being disposed on exterior surface or in the structure of the casing of the main fuel solution tank for achieving the objective of measurement.Type: ApplicationFiled: December 22, 2008Publication date: December 17, 2009Applicant: SYSPOTEK CORPORATIONInventors: Ming Yao Dong, Yung Lieh Chien, Zhi Cheng Chen, Ming Yi Wang
-
Patent number: 7301185Abstract: A high-voltage transistor device with an interlayer dielectric (ILD) etch stop layer for use in a subsequent contact hole process is provided. The etch stop layer is a high-resistivity film having a resistivity greater than 10 ohm-cm, thus leakage is prevented and breakdown voltage is improved when driving a high voltage greater than 5V at the gate site. A method for fabricating the high-voltage device is compatible with current low-voltage device processes and middle-voltage device processes.Type: GrantFiled: November 29, 2004Date of Patent: November 27, 2007Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chung-I Chen, Hsin Kuan, Zhi-Cheng Chen, Rann-Shyan Yeh, Chi-Hsuen Chang, Jun Xiu Liu, Tzu-Chiang Sung, Chia-Wei Liu, Jieh-Ting Cheng
-
Publication number: 20060113627Abstract: A high-voltage transistor device with an interlayer dielectric (ILD) etch stop layer for use in a subsequent contact hole process is provided. The etch stop layer is a high-resistivity film having a resistivity greater than 10 ohm-cm, thus leakage is prevented and breakdown voltage is improved when driving a high voltage greater than 5V at the gate site. A method for fabricating the high-voltage device is compatible with current low-voltage device processes and middle-voltage device processes.Type: ApplicationFiled: November 29, 2004Publication date: June 1, 2006Inventors: Chung-I Chen, Hsin Kuan, Zhi-Cheng Chen, Rann-Shyan Yeh, Chi-Hsuen Chang, Jun Liu, Tzu-Chiang Sung, Chia-Wei Liu, Jieh-Ting Chang