Abstract: An array substrate, a method for fabricating the same, a display panel and a display device are disclosed. The array substrate comprises leading wires, the plurality of leading wires form a plurality of grooves in a fanout area of the array substrate, the plurality of grooves are filled with a filler, and the filler filled in the grooves has an upper surface which is flush with leading wires surrounding the grooves. The filler is made from an insulating and transparent material.

Abstract: An array substrate includes a substrate, a first signal line and a second signal line on the substrate, an insulating layer covering the first signal line and the second signal line, and a groove penetrating through the insulating layer. The first signal line and the second signal line are arranged in a same layer and separated from each other. The groove is between the first signal line and the second signal line.

Abstract: A method of manufacturing an array substrate assembly and an array substrate assembly manufactured by the method are disclosed. The method includes: manufacturing a gate metal layer on a substrate, the gate metal layer including a gate line and a common electrode signal line spaced from each other; forming a gate insulating layer, an active layer, a source-drain electrode layer, a passivation layer, and a protective pattern on the gate metal layer; and forming, in the passivation layer and the gate insulating layer, a via hole configured for a connection to the common electrode signal line. An orthogonal projection of the protective pattern on the substrate and an orthogonal projection of the via hole on the substrate partly coincide with each other, and the orthogonal projection of the protective pattern on the substrate and an orthogonal projection of the gate line on the substrate partly coincide with each other.

Abstract: An array substrate, a manufacturing method thereof, a display panel and a display device are provided. The array substrate includes a base substrate, and a gate layer, an active layer, a data line layer, a resin layer, a first transparent electrode and a second transparent electrode disposed on the base substrate, the first transparent electrode and the second transparent electrode being insulated from each other. The second transparent electrode is extended below the resin layer via a through hole of the resin layer, the first transparent electrode includes a hollowed-out region; and an orthographic projection of the through hole of the resin layer on the base substrate falls within an orthographic projection of the hollowed-out region of the first transparent electrode on the base substrate.

Abstract: A method of manufacturing an array substrate assembly and an array substrate assembly manufactured by the method are disclosed. The method includes: manufacturing a gate metal layer on a substrate, the gate metal layer including a gate line and a common electrode signal line spaced from each other; forming a gate insulating layer, an active layer, a source-drain electrode layer, a passivation layer, and a protective pattern on the gate metal layer; and forming, in the passivation layer and the gate insulating layer, a via hole configured for a connection to the common electrode signal line. An orthogonal projection of the protective pattern on the substrate and an orthogonal projection of the via hole on the substrate partly coincide with each other, and the orthogonal projection of the protective pattern on the substrate and an orthogonal projection of the gate line on the substrate partly coincide with each other.

Abstract: The present disclosure discloses an array substrate, a display panel and a display device. The array substrate includes gate regions, gate lines, data lines, pixel electrodes and common electrode lines. The common electrode lines and the gate lines have the same extension direction, the pixel electrodes are located in regions defined by adjacent gate lines and adjacent data lines, the gate lines traverse the gate regions in the extension direction that are located in the same row as the gate lines, and the pixel electrodes have a gap from the gate lines at ends thereof closer to the gate lines. As such, a portion of the gate region that extends to the pixel region has a reduced area and hence a reduced edge length. This way, during the cleaning of the active layer after formation, less active layer metal may remain at the edges of the gate region. Thereby, the array substrate fabrication process is improved, and a product yield rate of the array substrate is increased.

Abstract: An array substrate includes a substrate, a first signal line and a second signal line on the substrate, an insulating layer covering the first signal line and the second signal line, and a groove penetrating through the insulating layer. The first signal line and the second signal line are arranged in a same layer and separated from each other. The groove is between the first signal line and the second signal line.

Abstract: A method for manufacturing an array substrate, including: forming a plurality of first metal layer patterns on a base substrate which are independent from each other, each of the plurality of first metal layer patterns including an end at a non-display region of the array substrate; forming an insulating layer on the plurality of first metal layer patterns; and forming a semiconductor pattern on the insulating layer, a portion of semiconductor pattern is disposed directly opposite to the end of the first metal layer patterns.

Abstract: An array substrate, a manufacturing method thereof, a display panel and a display device are provided. The array substrate includes a base substrate, and a gate layer, an active layer, a data line layer, a resin layer, a first transparent electrode and a second transparent electrode disposed on the base substrate, the first transparent electrode and the second transparent electrode being insulated from each other. The second transparent electrode is extended below the resin layer via a through hole of the resin layer, the first transparent electrode includes a hollowed-out region; and an orthographic projection of the through hole of the resin layer on the base substrate falls within an orthographic projection of the hollowed-out region of the first transparent electrode on the base substrate.

Abstract: An array substrate, a method for fabricating the same, a display panel and a display device are disclosed. The array substrate comprises leading wires, the plurality of leading wires form a plurality of grooves in a fanout area of the array substrate, the plurality of grooves are filled with a filler, and the filler filled in the grooves has an upper surface which is flush with leading wires surrounding the grooves. The filler is made from an insulating and transparent material.

Abstract: An array substrate is disclosed, which includes a display region and a drive circuit region; the drive circuit region includes GOA units, the GOA unit including a substrate, a gate electrode layer, an insulation layer, an active layer and a source/drain electrode layer, and the drive circuit region further includes a gate wire connecting to the gate electrode layer, and a source/drain layer wire at the same layer with the source/drain electrode layer, wherein the area between the portions of the gate wire and the source/drain layer wire which intercross with each other is only formed with the insulation layer. A manufacturing method of an array substrate and a display apparatus including the array substrate is further disclosed.

Abstract: An array substrate is disclosed, which includes a display region and a drive circuit region; the drive circuit region includes GOA units, the GOA unit including a substrate, a gate electrode layer, an insulation layer, an active layer and a source/drain electrode layer, and the drive circuit region further includes a gate wire connecting to the gate electrode layer, and a source/drain layer wire at the same layer with the source/drain electrode layer, wherein the area between the portions of the gate wire and the source/drain layer wire which intercross with each other is only formed with the insulation layer. A manufacturing method of an array substrate and a display apparatus including the array substrate is further disclosed.

Abstract: A method for manufacturing an array substrate, including: forming a plurality of first metal layer patterns on a base substrate which are independent from each other, each of the plurality of first metal layer patterns including an end at a non-display region of the array substrate; forming an insulating layer on the plurality of first metal layer patterns; and forming a semiconductor pattern on the insulating layer, a portion of semiconductor pattern is disposed directly opposite to the end of the first metal layer patterns.

Abstract: The present invention relates to an array substrate, which comprises: a display region and a drive circuit region; the drive circuit region comprises GOA units, the GOA unit comprising a substrate, a gate electrode layer, an insulation layer, an active layer and a source/drain electrode layer, and the drive circuit region further comprises a gate wire connecting to the gate electrode layer, and a source/drain layer wire at the same layer with the source/drain electrode layer, wherein the area between the portions of the gate wire and the source/drain layer wire which intercross with each other is only formed with the insulation layer. The invention further relates to a manufacturing method of an array substrate and a display apparatus comprising the array substrate.

Abstract: A film patterning method is provided. The method comprises: performing a dry etching process on a film to be patterned, so as to form a patterned film; removing a suspended particle on the patterned film; and performing another dry etching process on the patterned film after the suspended particle is removed, to form a final pattern of the film. By moving or completely removing the suspended particle on the patterned film and then performing another dry etching process on the patterned film to etch away the etching residue, existence of the etching residue is completely avoided in the final pattern of the film, so that the product yield is improved and the product quality is ensured.

Abstract: The present invention relates to an array substrate, which comprises: a display region and a drive circuit region; the drive circuit region comprises GOA units, the GOA unit comprising a substrate, a gate electrode layer, an insulation layer, an active layer and a source/drain electrode layer, and the drive circuit region further comprises a gate wire connecting to the gate electrode layer, and a source/drain layer wire at the same layer with the source/drain electrode layer, wherein the area between the portions of the gate wire and the source/drain layer wire which intercross with each other is only formed with the insulation layer. The invention further relates to a manufacturing method of an array substrate and a display apparatus comprising the array substrate.

Abstract: The present disclosure provides a method for forming a thin film pattern. The method includes steps of: forming a mask pattern on a thin film in such a manner that the mask pattern includes a reserved portion corresponding to a region where the thin film pattern to be formed is located, and a partially-reserved portion neighboring the reserved portion; performing a wet-etching process to etch off a portion of the thin film which is not covered by the mask pattern; performing a dry etching process to remove the partially-reserved portion and thin the reserved portion; and performing a dry etching process to etch off a portion of the thin film which is not covered by the remaining mask pattern, so as to form the thin film pattern.

Abstract: The present disclosure discloses an array substrate, a display panel and a display device. The array substrate includes gate regions, gate lines, data lines, pixel electrodes and common electrode lines. The common electrode lines and the gate lines have the same extension direction, the pixel electrodes are located in regions defined by adjacent gate lines and adjacent data lines, the gate lines traverse the gate regions in the extension direction that are located in the same row as the gate lines, and the pixel electrodes have a gap from the gate lines at ends thereof closer to the gate lines. As such, a portion of the gate region that extends to the pixel region has a reduced area and hence a reduced edge length. This way, during the cleaning of the active layer after formation, less active layer metal may remain at the edges of the gate region. Thereby, the array substrate fabrication process is improved, and a product yield rate of the array substrate is increased.

Abstract: The present disclosure provides a method for forming a thin film pattern. The method includes steps of: forming a mask pattern on a thin film in such a manner that the mask pattern includes a reserved portion corresponding to a region where the thin film pattern to be formed is located, and a partially-reserved portion neighboring the reserved portion; performing a wet-etching process to etch off a portion of the thin film which is not covered by the mask pattern; performing a dry etching process to remove the partially-reserved portion and thin the reserved portion; and performing a dry etching process to etch off a portion of the thin film which is not covered by the remaining mask pattern, so as to form the thin film pattern.

Abstract: The present invention provides an array substrate, a method for manufacturing the same, and a display device including the same. In the manufacturing method of the present invention, photoresist is exposed and developed by using a mask to allow the first regions to retain photoresist with a first thickness and second regions to retain photoresist with a second thickness, wherein the first thickness is greater than the second thickness, and each of the first regions is at least partially connected with the second region, so that the contact area between the exposed photoresist and the substrate is large and the photoresist in the first regions is unlikely to peel off. The manufacturing method of the present invention is applicable to manufacturing various array substrates.