Patents by Inventor Zilong WU

Zilong WU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Nanostructured plasmonic materials and methods of making and use thereof
    Patent number: 11519857
    Abstract: Disclosed herein are nanostructured plasmonic materials. The nanostructured plasmonic materials can include a first nanostructured layer comprising: a first layer of a first plasmonic material permeated by a first plurality of spaced-apart holes, wherein the first plurality of spaced apart holes comprise a first array; and a second nanostructured layer comprising a second layer of a second plasmonic material permeated by a second plurality of spaced-apart holes, wherein the second plurality of spaced apart holes comprise a second array; wherein the second nanostructured layer is located proximate the first nanostructured layer; and wherein the first principle axis of the first array is rotated at a rotation angle compared to the first principle axis of the second array.
    Type: Grant
    Filed: September 18, 2018
    Date of Patent: December 6, 2022
    Assignee: Board of Regents, The University of Texas System
    Inventors: Yuebing Zheng, Zilong Wu
  • NANOSTRUCTURED PLASMONIC MATERIALS AND METHODS OF MAKING AND USE THEREOF
    Publication number: 20200264101
    Abstract: Disclosed herein are nanostructured plasmonic materials. The nanostructured plasmonic materials can include a first nanostructured layer comprising: a first layer of a first plasmonic material permeated by a first plurality of spaced-apart holes, wherein the first plurality of spaced apart holes comprise a first array; and a second nanostructured layer comprising a second layer of a second plasmonic material permeated by a second plurality of spaced-apart holes, wherein the second plurality of spaced apart holes comprise a second array; wherein the second nanostructured layer is located proximate the first nanostructured layer; and wherein the first principle axis of the first array is rotated at a rotation angle compared to the first principle axis of the second array.
    Type: Application
    Filed: September 18, 2018
    Publication date: August 20, 2020
    Inventors: Yuebing ZHENG, Zilong WU