Abstract: A device that is useful for managing moisture content within a fuel cell assembly (24) includes a hydrophilic layer (46) between a solid reactant distribution plate layer and a hydrophobic layer (38) adjacent to a catalyst layer (34). In disclosed examples, the hydrophilic layer (46) is positioned relative to the reactant distribution plate to have a flow field configuration similar to that of the reactant distribution plate so that the hydrophilic layer does not interfere with reactant flow through the hydrophobic layer to the catalyst layer. A disclosed example includes a reactant distribution plate comprising a solid, non-porous material and the hydrophilic material to establish the hydrophilic layer (46). In another example, the hydrophilic layer (46) is applied to, secured to or positioned against of ribs of the reactant distribution plate.

Abstract: A c-axis-oriented HAP thin film synthesized by seeded growth on a palladium hydrogen membrane substrate. An exemplary synthetic process includes electrochemical seeding on the substrate, and secondary and tertiary hydrothermal treatments under conditions that favor growth along c-axes and a-axes in sequence. By adjusting corresponding synthetic conditions, an HAP this film can be grown to a controllable thickness with a dense coverage on the underlying substrate. The thin films have relatively high proton conductivity under hydrogen atmosphere and high temperature conditions. The c-axis oriented films may be integrated into fuel cells for application in the intermediate temperature range of 200-600° C. The electrochemical-hydrothermal deposition technique may be applied to create other oriented crystal materials having optimized properties, useful for separations and catalysis as well as electronic and electrochemical applications, electrochemical membrane reactors, and in chemical sensors.

Abstract: A catalyst-coated membrane that includes an anode catalyst layer, a cathode catalyst layer, and a hydrogen ion conductive polymer electrolyte membrane interposed between the anode catalyst layer and the cathode catalyst layer, a peripheral area of at least one of the anode catalyst layer and the cathode catalyst layer is provided with a decrease portion in which the mass of the electrode catalyst per unit area of the catalyst layer decreases from the inner side toward the outer side.

Abstract: A crosslinked nano-inorganic particle/polymer electrolyte membrane composed of a polymer film substrate, graft molecular chains bound to the backbone skeleton of the polymer film substrate and comprising a vinyl monomer graft-polymerized, sulfonic groups bound to the graft molecular chains, and an inorganic material as nano-scale particles uniformly dispersed within a crosslinked structure ascribed to the backbone skeleton of the polymer film substrate and the graft molecular chains, wherein the backbone skeleton of the polymer film substrate, the graft molecular chains, and the nano-inorganic particles mutually construct a crosslinked structure.

Abstract: A fuel cell plate including a first plate having a first header edge defining a first header aperture, the first header edge having a first break and a substantially aligned second plate having a second header edge defining a second header aperture, the second header edge having a second break. The fuel cell plate, well suited for use in a vehicle fuel cell stack, for removing water from a fuel cell stack header is disclosed.

Abstract: To accelerate a film formation rate in forming a negative electrode active material film by vapor deposition using an evaporation source containing Si as a principal component, and to provide an electrode for lithium batteries which is superior in productivity, and keeps the charge and discharge capacity at high level are contemplated. The method of manufacturing an electrode for lithium batteries of the present invention includes the steps of: providing an evaporation source containing Si and Fe to give a molar ratio of Fe/(Si+Fe) being no less than 0.0005 and no greater than 0.15; and vapor deposition by melting the evaporation source and permitting evaporation to allow for vapor deposition on a collector directly or through an underlying layer. The electrode for lithium batteries of the present invention includes a collector, and a negative electrode active material film which includes SiFeyOx (wherein, 0<x<2, and 0.0001?y/(1+y)?0.

Abstract: A method of manufacturing a fuel cell includes thermally treating a hydrogen permeable membrane in a given temperature higher than an actual operating temperature of the fuel cell, and forming an electrolyte layer on the hydrogen permeable membrane subjected to the thermal treatment. The hydrogen permeable membrane is composed of a polycrystalline metal.

Abstract: A mask having mask patterns for the transfer of a desired circuit pattern, a method for manufacturing the mask, and a semiconductor device manufacturing method using the mask, are provided. There are extracted two rectangular aperture patterns which are adjacent each other in an obliquely disposed state with respect to an X axis in an XY plane. The thus-extracted two rectangular aperture patterns are rotated at a certain angle so that a pattern edge corresponding to one side of one of the rectangular aperture patterns and a pattern edge corresponding to one side of the other rectangular aperture pattern are opposed in parallel to each other. The two rectangular aperture patterns thus rotated at a certain angle are then subjected to optical proximity effect correction to form two corrected rectangular aperture patterns.

Abstract: A method of fabricating a color filter array including the removal of unwanted residual color pigments. A substrate is coated with a colored photoresist layer. The photoresist layer is patterned. The substrate is then cured. A descumming step is performed after the curing step to remove the residual pigments without causing significant damage to the remaining color filter array pattern. In another embodiment, the descumming process may be used to control or manipulate the thickness of the color filter array. In another embodiment, the descumming process may be used to modify the surface of the color filter array to be more desirable for the formation of microlenses or other layers over the color filter array.

Abstract: A method and system for patterning a substrate using a dual-tone development process is described. The method and system comprise using a resist material having a polymer backbone with a plurality of protecting groups attached thereto to improve process latitude and critical dimension uniformity for the dual-tone development process.

Abstract: Exemplary embodiments provide charge generating layers and electrographic imaging members containing the charge generating layers. In various embodiments, an imaging member can be a multilayered photoconductive imaging member with a charge generating layer including, for example, a photogenerating pigment, such as a metal phthalocyanine; a dopant material, such as a multiple halide compound dopant and/or an ether dopant; and a binder or polymer. The imaging members can exhibit high photosensitivity, low residual potential (Verase), and excellent cyclic/environmental stability and can be used as photoreceptors, photosensitive members, and the like, in a machine of copy, printer, fax, scan, multifunction machines, and the like.

Abstract: A photoreceptor includes a conductive support body, an intermediate layer, and a photosensitive layer. The intermediate layer is made of gallium nitride (GaN) crystals having electron affinity greater than that of the photosensitive layer and formed between and in contact with the conductive support body and the photosensitive layer. The photosensitive layer is composed of either a single layer type photosensitive layer or a laminated type photosensitive layer.

Abstract: An electrophotographic photoreceptor is disclosed, comprising on or over an electrically conductive support a photosensitive layer containing a charge generation material and a charge transfer material, wherein the charge generation material is comprised of two or more compounds represented by the following formula wherein X and Y are each an alkyl group or a halogen atom, n is an integer of 1 to 6 and m is an integer of 0 to 6, and wherein the compounds differ in at least one of m and n of the formula.

Abstract: A liquid developer includes: magnetic polymer particles including a magnetic material containing yttrium iron garnet (YIG), a polymer compound having a carboxylate salt structure, and a colorant; and a dispersion medium in which the magnetic polymer particles are dispersed.

Abstract: A toner includes toner particles containing at least binder resin and colorant. The toner particles contain a large-sized toner particle group of particles and a small-sized toner particle group of particles having a volume average particle size smaller than that of the large-sized toner particle group. In the toner, a volume average particle size D50v is 4 ?m to 8 ?m at 50% in accumulated volume counted from a large particle-side in accumulated volume distribution of entire toner particles; a content of toner particles contained in a toner particle group having a volume average particle size of 7 ?m or more is 24% to 47% by volume based on the entire toner particles; and a content of toner particles contained in a toner particle group having a number average particle size of 5 ?m or less is 10% to 50% by number or less based on the entire toner particles.

Abstract: A polymer suitable as a base resin for a positive resist composition, in particular a chemically amplified positive resist composition, having a higher resolution, a larger exposure allowance, a smaller sparse-dense size difference, a better process applicability, a better pattern configuration after exposure, and in addition, a further excellent etching resistance, than a conventional positive resist. A positive resist composition using the same, a patterning process, and a novel polymerizable compound to obtain the polymer. A polymer has a hydrogen atom of at least a carboxyl group is substituted by an acid labile group represented by the following general formula (2), a positive resist composition using the same, a patterning process, and a novel polymerizable compound to obtain a polymer like this.

Abstract: A block copolymer that can form selectively a microphase-separated structure under exposure with an ultraviolet exposure device, and a substrate processing method by which a micropattern can be formed at a low cost on the substrate by using the block copolymer. The block copolymer has as a basic skeleton a hydrophobic block that has a repeating structure of a hydrophobic monomer and a hydrophilic block that has a repeating structure of a hydrophilic monomer having a hydrophilic functional group. At least some of the hydrophilic functional groups are covered with a hydrophobic protective group and the hydrophobic protective group, which covers the hydrophilic functional group, is dissociated from the hydrophilic functional group by light irradiation. The substrate processing method uses the block copolymer to form a micropattern on the substrate.

Abstract: A low-resistance, fine electrode is formed by baking in air a photosensitive paste which has an inorganic component containing copper powder, boron powder, and glass frit, and an organic component containing a photopolymerization initiator, monomer, and organic vehicle, and in which the average particle size of the copper powder is 2.5 ?m or less, and the content of boron powder based on the total amount of copper powder and boron powder is 8 to 25 wt %.

Abstract: The present invention provides a blended solvent for solubilizing an ultraviolet photoresist. The blended solvent comprises a mixture of from about 5 vol % to about 95 vol % of a first solvent, wherein the first solvent comprises a cyclic ester. A balance of the mixture comprises a second solvent, wherein the second solvent comprises a volatile organic liquid.

Abstract: A method of processing an on-press developable lithographic printing plate with ink and/or fountain solution is described. The plate comprises on a substrate a photosensitive layer which is either capable of hardening (negative-working) or solubilization (positive-working) upon exposure to a laser, the non-hardened or solubilized areas of the photosensitive layer being soluble or dispersible in ink and/or fountain solution. The plate is exposed with a laser, heated to an elevated temperature, and then developed with ink and/or fountain solution on a lithographic press. The laser exposed plate is preferably heated by passing through a heating device or while mounted on a lithographic press before on-press development.

Abstract: The invention pertains to a method for preparing a composite printing form from a photosensitive element and a carrier using a template. The photosensitive element is located on the carrier by positioning the element through cutout portions in the template. The method is particularly suited for preparing composite printing forms for relief printing, and in particular for preparing composite printing forms for flexographic printing of corrugated substrates.

Abstract: The present invention provides a resist pattern thickening material, which can utilize ArF excimer laser light; which, when applied over a resist pattern such as an ArF resist having a line pattern or the like, can thicken the resist pattern regardless of the size of the resist pattern; which has excellent etching resistance; and which is suited for forming a fine space pattern or the like, exceeding the exposure limits. The present invention also provides a process for forming a resist pattern and a method for manufacturing a semiconductor device, wherein the resist pattern thickening material of the present invention is suitably utilized.

Abstract: A photo acid generator (PAG) or an acid is used to reduce resist scumming and footing. Diffusion of acid from photoresist into neighbors causes a decreased acid level, and thus causes resist scumming. An increased acid layer beneath the resist prevents acid diffusion. In one embodiment, the increased acid layer is a layer of spun-on acid or PAG dissolved in aqueous solution. In another embodiment, the increased acid layer is a hard mask material with a PAG or an acid mixed into the material. The high acid content inhibits the diffusion of acid from the photoresist into neighboring layers, and thus substantially reduces photoresist scumming and footing.

Abstract: A spacer is formed on side and top portions of a photoresist pattern after a mask process is performed so that the spacer may be used as an etching mask. The spacer is formed using a polymer deposition layer which is a low temperature oxide or nitride that can be deposited on side and top portions of the photoresist pattern at 75˜220° C. after the mask process is performed. A method for manufacturing a semiconductor device includes forming a bottom anti-reflection coating film on an etch-target layer, patterning a photoresist layer formed on the bottom anti-reflection coating film, forming an insulation layer on a patterned photoresist layer and the bottom anti-reflection coating film, etching back the insulation layer to form a spacer on sidewalls of the patterned photoresist layer, and etching the bottom anti-reflection coating film and the etching target layer exposed by the spacer to form a fine pattern.

Abstract: A method of improving damascene wire uniformity without reducing performance. The method includes simultaneously forming a multiplicity of damascene wires and a multiplicity of metal dummy shapes in a dielectric layer of a wiring level of an integrated circuit chip, the metal dummy shapes being dispersed between damascene wires of the multiplicity of damascene wires; and removing or modifying those metal dummy shapes of the multiplicity of metal dummy shapes within exclusion regions around selected damascene wires of the multiplicity of damascene wires. Also a method of fabricating a photomask and a photomask for use in improving damascene wire uniformity without reducing performance.

Abstract: A method capable of easily and simply manufacturing a conductive member pattern such as a nano-size fine wiring or electrode is disclosed. Specifically, the disclosed method for manufacturing a conductive member pattern includes the steps of: forming an ion-exchangeable resin pattern on a substrate by using a photosensitive resin; making the resin pattern absorb a metal component-containing solution; and baking the resin pattern having absorbed the metal component-containing solution, wherein the width and the ratio “width/height” of the resin pattern before baking are 1 ?m or less and 5 or less, respectively.

Abstract: A method of obtaining information related to a defect present in the irradiation of a substrate coated with a layer of radiation sensitive material using immersion lithography is disclosed. The method includes irradiating an area of the radiation sensitive material with a non-patterned radiation beam, the area being irradiated with a dose which is sufficient for the radiation sensitive material to be substantially removed during subsequent development of the radiation sensitive material if the radiation sensitive material is a positive radiation sensitive material, or with a dose which is sufficient for the radiation sensitive material to be substantially insoluble during subsequent development of the radiation sensitive material if the radiation sensitive material is a negative radiation sensitive material.

Abstract: The invention relates to a process for forming a structure comprising (a) providing a transparent support; (b) forming a color mask on a first side of the transparent support; (c) applying a first layer comprising a deposition inhibitor material that is sensitive to visible light; (d) patterning the first layer by exposing the first layer through the color mask with visible light to form a first pattern and developing the deposition inhibitor material to provide selected areas of the first layer effectively not having the deposition inhibitor material; and (e) depositing a second layer of functional material over the transparent support; wherein the second layer of functional material is substantially deposited only in selected areas over the transparent support not having the deposition inhibitor material.

Abstract: Double patterns are formed by coating a first chemically amplified positive resist composition comprising an acid labile group-bearing resin and a photoacid generator and prebaking to form a resist film on a processable substrate, exposing the resist film to high-energy radiation, PEB, and developing with an alkaline developer to form a first positive resist pattern, treating the first resist pattern to be alkali soluble and solvent resistant, coating a second resist composition and prebaking to form a reversal film, and exposing the reversal film to high-energy radiation, PEB, and developing with an alkaline developer to form a second positive resist pattern. The last development step includes dissolving away the reversed first resist pattern and achieving reversal transfer.

Abstract: Double patterns are formed by coating a chemically amplified positive resist composition comprising an acid labile group-bearing resin and a photoacid generator and prebaking to form a resist film on a processable substrate, exposing the resist film to high-energy radiation, PEB, and developing with an alkaline developer to form a positive resist pattern, treating the positive resist pattern to be alkali soluble and solvent resistant, coating a negative resist composition and prebaking to form a reversal film, and exposing the reversal film to high-energy radiation, PEB, and developing with an alkaline developer to form a negative resist pattern. The last development step includes the reversal transfer step of dissolving away the positive resist pattern which has been converted to be soluble in developer.

Abstract: A method for increasing the removal rate of a photoresist layer is provided. The method includes performing a pre-treatment of a substrate, such as a plasma process, before forming the photoresist layer. The method can be applied to the fabrication of semiconductor devices for increasing the removal rate of the photoresist layer.

Abstract: A method is described and disclosed for harvesting and preparing porcine hearts that may be used, among other things, as an improved analog of the human heart in cardiac simulator systems for training surgical personnel for performing beating heart surgery.

Abstract: The present invention relates to compositions and methods for storing platelets to preserve the function and freshness of the platelets. More particularly, the present invention relates to the use of a preservative composition having an antiplatelet agent, an anticoagulant, and an oxygen carrier, for maintaining the freshness of platelets. Additionally, the composition may also contain an ultra-short acting broad spectrum anti-microbial agents. The preservative composition may be used to store platelets in a liquid state, a frozen state, or a freeze-dried state.

Abstract: The present invention relates to compositions and methods for storing platelets to preserve the function and freshness of the platelets. More particularly, the present invention relates to the use of a preservative composition having an antiplatelet agent, an anticoagulant, and an oxygen carrier, for maintaining the freshness of platelets. Additionally, the composition may also contain an ultra-short acting broad spectrum anti-microbial agents. The preservative composition may be used to store platelets in a liquid state, a frozen state, or a freeze-dried state.

Abstract: A non-invasive measurement of biological tissue reveals information about the function of that tissue. Polarized light is directed onto the tissue, stimulating the emission of fluorescence, due to one or more endogenous fluorophors in the tissue. Fluorescence anisotropy is then calculated. Such measurements of fluorescence anisotropy are then used to assess the functional status of the tissue, and to identify the existence and severity of disease states. Such assessment can be made by comparing a fluorescence anisotropy profile with a known profile of a control.

Abstract: A method for detecting sequence specific methylation in a biomolecule, comprising: (a) contacting the biomolecule with an S-adenosyl-L-methionine-dependent methyltransferase in the presence of a detectable cofactor of said methyltransferase; and (b) detecting whether the recognition sequence of said methyltransferase has been modified with the cofactor or a derivative thereof, wherein modification of the recognition sequence of said methyltransferase is indicative of an absence of methylation at said recognition sequence. Also disclosed is a cofactor specific for S-adenosyl-L-methionine-dependent methyltransferases, wherein said cofactor is an N-adenosylaziridine derivative with a reporter group attached to the 6 or 7 position of the adenine ring or attached to the aziridine ring. A complex of the cofactor and a methyltransferase a composition comprising the cofactor or the complex and the use of the cofactor or the complex for detecting sequence-specific methylation in DNA molecules are also disclosed.

Abstract: The present invention relates to an improved method for the bisulfite conversion of DNA. In certain time-temperature ranges the efficacy of the bisulfite conversion is clearly improved. By combination with denaturating solvents, new reaction conditions and new purification methods the efficacy can be further increased The converted DNA can subsequently be analysed by different methods. The present invention facilitates the analysis of cytosine methylation.

Abstract: A nucleic acid probe for classification of pathogenic bacterial species is capable of collectively detecting bacterial strains of the same species and differentially detecting them from other bacterial species. Any one of the base sequences of SEQ ID NOS. 40 to 42 or a combination of at least two of them is used for detecting the gene of an infectious disease pathogenic bacterium.

Abstract: A nucleic acid probe for classification of pathogenic bacterial species is capable of collectively detecting bacterial strains of the same species and differentially detecting them from other bacterial species. Any one of the base sequences of SEQ ID NOS. 52 to 54 or a combination of at least two of them is used for detecting the gene of an infectious disease pathogenic bacterium.

Abstract: A nucleic acid probe for classification of pathogenic bacterial species is capable of collectively detecting bacterial strains of the same species and differentially detecting them from other bacterial species. Any one of the base sequences of SEQ ID NOS. 43 to 45 or a combination of at least two of them is used for detecting the gene of an infectious disease pathogenic bacterium.

Abstract: The presently described subject matter is directed to water-soluble conjugated polyene compounds that exhibit aggregation induced emission, as well as to water dispersible, fluorescent, polymeric microparticles and/or nanoparticles comprising the water-soluble conjugated polyene compounds. Also provided are methods of making and using the compounds and particles. The described conjugated polyene compounds are useful as bioprobes for the detection biomacromolecules, as well as in the manufacture of sensors.

Abstract: Provided are polynucleotides of molecular variant promoters of the CYP2D6 gene which, for example, are associated with abnormal drug response or individual predisposition to several common diseases and disorders caused by drug under- or over-metabolization, and vectors comprising such polynucleotides. Furthermore, methods of diagnosing the status of disorders related to intermediate metabolization of drugs are described. In addition, kits comprising oligonucleotides hybridizing to the CYP2D6 promoter and/or being capable of being extended into this region useful for diagnosing subjects that are ultrarapid or intermediate metabolizer of drugs are provided.

Abstract: Analysis chip of at least one analyte, said chip comprising at least one analysis spot for recognition and immobilization specific to the analyte; and a reference range (G) comprising several reference spots each arranged on said chip in a defined manner and independently of one another, each reference spot of this range comprising, immobilized on its surface and in a defined proportion P that is different and known for each spot relative to the other reference spots of said range: a probe reference molecule (PRM) permitting recognition and hybridization specifically to a defined target reference molecule (TRM), and/or an inert oligonucleotide molecule (IM) incapable of recognition and hybridization with said PRM, these molecules both being unable to immobilize said analyte or analytes. The method of the invention comprises the use of said chip with its reference range for analysis of said, at least one, analyte.

Abstract: EGFR biomarkers useful in a method for predicting the likelihood that a mammal that will respond therapeutically to a method of treating cancer comprising administering an EGFR modulator, wherein the method comprises (a) measuring in the mammal the level of at least one biomarker selected from epiregulin and amphiregulin, (b) exposing a biological sample from the mammal to the EGFR modulator, and (c) following the exposing of step (b), measuring in the biological sample the level of the at least one biomarker, wherein an increase in the level of the at least one biomarker measured in step (c) compared to the level of the at least one biomarker measured in step (a) indicates an increased likelihood that the mammal will respond therapeutically to the method of treating cancer.

Abstract: A nucleotide chain to be modified, a nucleotide having a particular base that is different from bases constituting the nucleotide chain, an enzyme catalyzing addition of the nucleotide to the 3?-terminus of the nucleotide chain, a degrading enzyme acting specifically on the nucleotide, and a desired modifier for modifying the nucleotide chain are allowed to coexist in a buffer solution as a mixture solution such that: the nucleotide is added to the 3?-terminus of the nucleotide chain; the sequence of the added nucleotide is degraded to form, at the 3?-terminus of the nucleotide chain, a functional group capable of binding to the modifier; and the 3?-terminus of the nucleotide chain having the functional group thus formed is directly modified with the modifier. The reactions at three stages continuously proceed in the mixture solution. As a result, simplified procedures and reduced reaction time can be achieved.

Abstract: A method for replicating and amplifying a target nucleic acid sequence is described. A method of the invention involves the formation of a recombination intermediate without the prior denaturing of a nucleic acid duplex through the use of a recombination factor. The recombination intermediate is treated with a high fidelity polymerase to permit the replication and amplification of the target nucleic acid sequence. In preferred embodiments, the polymerase comprises a polymerase holoenzyme. In further preferred embodiments, the recombination factor is bacteriophage T4 UvsX protein or homologs from other species, and the polymerase holoenzyme comprises a polymerase enzyme, a clamp protein and a clamp loader protein, derived from viral, bacteriophage, prokaryotic, archaebacterial, or eukaryotic systems.

Abstract: This document provides methods and materials related to genetic markers of Bipolar Disorder (BD) and Schizophrenia (SZ). For example, methods for using such genetic markers to assess risk of developing BD and/or SZ are provided, as are methods for making a differential diagnosis between BD and SZ.

Abstract: This invention relates to magnetic particles having a glass surface which are substantially spherical. This invention also relates to methods for making them, as well as to suspensions thereof and their uses for the purification of DNA or RNA in particular in automated processes.

Abstract: The present invention provides an improved system for linking nucleic acids to one another. In particular, the present invention provides techniques for producing DNA product molecules that may be easily and directly ligated to recipient molecules. The product molecules need not be cleaved with restriction enzymes in order to undergo such ligation. In preferred embodiments of the invention, the DNA product molecules are produced through iterative DNA synthesis reactions, so that the product molecules are amplified products. The invention further provides methods for directed ligation of product molecules (i.e., for selective ligation of certain molecules within a collection of molecules), and also for methods of exon shuffling, in which multiple different product molecules are produced in a single ligation reaction. Preferred embodiments of the invention involve ligation of product molecules encoding functional protein domains, particularly domains naturally found in conserved gene families.

Abstract: Methods for determining genotypes and haplotypes of genes are described. Also described are single nucleotide polymorphisms and haplotypes in the ApoE gene and methods of using that information.