Abstract: A sulphur cement pre-composition, comprising sulphur, a first organosilane and a second organosilane, and a sulphur cement product comprising sulphur, a particulate inorganic material, a first organosilane and a second organosilane are disclosed. The first organosilane comprises one or more functional groups chosen from thiol, sulphide, amine or alkenyl groups. The second organosilane does not comprise any thiol, sulphide, amine or alkenyl groups. Processes for making the sulphur cement pre-composition and the sulphur cement product are also disclosed.

Abstract: Provided is a method of producing a member for electrophotography capable of providing a high-quality electrophotographic image.

Abstract: A liquid silicone rubber coating composition exhibiting high adhesion for an airbag base fabric; a curtain airbag having a silicone rubber coating layer of the cured composition formed on at least one surface of the base fabric; and a method for producing such curtain airbag are provided. The composition comprises (A) an organopolysiloxane having at least 2 alkenyl groups bonded to the silicon atoms per molecule; (B) an organohydrogenpolysiloxane having at least 2 structural units represented by formula (1) per molecule, the structural units being linked by a non-siloxane structural unit not containing SiH group; (C) an addition catalyst; (E) an organosilicon compound having an epoxy group and an alkoxy group bonded to the silicon atom in the molecule; and (F) a titanium compound and/or a zirconium compound; and preferably (D) a fine powder silica having a specific surface area of at least 50 m2/g.

Abstract: A low refractive index film-forming composition and a low refractive index film are prepared with a method in which fluoroalkyl group-containing silicon alkoxide (B) is mixed with silicon alkoxide (A) to obtain a mixture; water (C), formic acid (D), and an organic solvent (E) are mixed with the mixture to produce a hydrolysate of the mixture; and silica sol (F) obtained by dispersing beaded colloidal silica particles in a liquid medium is mixed with the hydrolysate.

Abstract: Disclosed herein is a composition for producing an insulator. More specifically, the composition comprises a silane-based organic-inorganic hybrid material containing one or more multiple bonds, an acrylic organic crosslinking agent and a silane-based crosslinking agent having six or more alkoxy groups. Also disclosed herein is an organic insulator produced using the insulator composition. The organic insulator is highly crosslinked to facilitate the fabrication of an organic thin film transistor in terms of processing.

Abstract: A UV-shielding silicone coating composition comprises (A) a dispersion in a dispersing medium of composite zinc oxide nanoparticles which are obtained by coating zinc oxide nanoparticles with an oxide or hydroxide of Al, Si, Zr or Sn, the dispersion having a photocatalytic degradability of up to 25%, (B) a silicone resin, (C) a curing catalyst, and (D) a solvent, the solids content of composite zinc oxide nanoparticle dispersion (A) being 1 to 50% by weight based on silicone resin (B). The composition is transparent to visible light, mar resistant, UV-shielding, weatherable, and durable.

Abstract: A wear coating is disclosed that includes a layer treated by a trifunctional organosilane. An article is also disclosed, the article having a surface to which the wear coating is applied. A method of applying the wear coating is also disclosed. In some embodiments, the organosilane is trimethylsilane and the wear coating is applied by chemical vapor deposition, followed by heat treating the wear coating in the presence of the trimethylsilane.

Abstract: A formulation comprising a first organosilane precursor and a halogenation reagent wherein at least a portion or all of the halogenation reagent reacts to provide the second organosilane precursor. Methods of generating such formulation in situ from readily available pure materials are also provided. Further provided are methods of using the formulations as the precursor for a flowable vapor deposition process.

Abstract: The present invention provides a sulphur cement precomposition, comprising sulphur and at least a polysulphide-containing organosilane in an amount of at least 0.3 wt % based on the weight of the total composition, which polysulphide-containing organosilane is of the general molecular formula: (X3Si)mH(2n+l?m)Cn-Sa-Cn?H(2n?+l?m?)(SiX?3)m? wherein a is an integer in the range of from 2 to 8, X and X? each are, independently, a hydrolysable group, n and n? each are, independently, an integer in the range of from 1 to 4, and m and m? each are, independently, an integer in the range of from 1 to (2n+1).

Abstract: A surface treatment composition comprises a polyfluoropolyether silane. The polyfluoropolyether silane and the surface treatment composition are produced by reacting a perfluoropolyether-containing compound and a hydrosilane in the pres-ence of a hydrosilylation catalyst and an isomer reducing agent.

Abstract: A surface treatment process comprises (a) providing at least one substrate; (b) providing a curable surface treatment composition comprising (1) at least one fluorinated organosilane compound comprising (i) a monovalent segment selected from polyfluoroalkyl, polyfluoroether, polyfluoropolyether, and combinations thereof and (ii) a monovalent endgroup comprising at least one silyl moiety comprising at least one group selected from hydrolyzable groups, hydroxyl, and combinations thereof, and (2) at least one organosilane compound comprising (i) a multivalent non-fluorinated segment and (ii) at least two monovalent endgroups, each monovalent endgroup independently comprising at least one silyl moiety comprising at least one group selected from hydroxyl, hydrolyzable groups, and combinations thereof, and/or at least one organosilazane compound; (c) applying the curable surface treatment composition to the substrate; and (d) curing the applied, curable surface treatment composition.

Abstract: A solid material or an oily material for forming an organic thin film is produced by hydrolyzing and condensing at least one kind of organic metal compound expressed by Formula (1) in a lower alcohol-based solvent in the presence of water and an acid with a concentration of 0.5% to 5% by mass in the resultant reaction solution. The solid material or oily material that is obtained is dissolved in an organic solvent, and a substrate is brought into contact with a solution that is obtained to form a highly functional organic thin film on the substrate.

Abstract: There is provided a composition for forming a monolayer or a multilayer on the substrate. A composition for forming a monolayer or a multilayer containing a silane compound of Formula (1A) or Formula (1B): [where R1s are independently a methyl group or an ethyl group; Xs are independently a C1-10 linking group; and Zs are independently a C1-10 alkyl group or a phenyl group optionally having a substituent, where X optionally contains at least one oxygen atom or sulfur atom in the main chain thereof, and when Z is an alkyl group, at least one hydrogen atom of the alkyl group is optionally substituted with a fluorine atom] and an organic solvent.

Abstract: A method of producing a hydrated lime. The process hydrates quicklime in conjunction with standard means of hydrating lime. The resulting hydrated lime has highly reduced contents of calcium oxide and magnesium oxide. The hydrated lime has little to no remaining reactivity when placed in contact with water after the process. The hydrated lime can is with stoichiometric volumes of water as required to fully hydrate the quicklime and water mixture as well as with volumes beyond the calculated stoichiometry with some potential for remaining water left after the process without the potential for lime putty or a wet hydrate as the result.

Abstract: A dry composition including at least one binder and at least one silicone oil with the following formula (I): in which: Z1 and Z2, identical or different, independently represent a terminal group selected from the group consisting of a hydrogen atom; a hydroxyl; a linear or branched, optionally substituted C1 to C12 alkyl; a linear or branched, optionally substituted C2 to C12 alkenyl radical; a linear or branched, optionally substituted C1 to C12 heteroalkyl; an optionally substituted C5 to C10 cycloalkyl radical; and an optionally substituted C6 to C18 aryl radical; R1 and R2, identical or different, independently represent a hydrogen atom; a hydroxyl; a linear or branched, optionally substituted C1 to C12 alkyl; a linear or branched, optionally substituted C2 to C12 alkenyl radical; a linear or branched, optionally substituted C1 to C12 heteroalkyl; an optionally substituted C5 to C10 cycloalkyl radical; or an optionally substituted C6 to C18 aryl radical; m and n, identical or different, independen

Abstract: A new generation environmental friendly water-based coating composition which exhibits excellent coating film properties is disclosed. Said water-based coating composition comprises mesoporous silica nanoparticles in organosilica, water, and a film-forming catalyst, and optionally with a small amount of ethanol. Method for manufacturing said water-based coating composition and the use thereof are also disclosed.

Abstract: Described herein are compositions for forming an underlayer film for a solvent-developable resist. These compositions can include a hydrolyzable organosilane having a silicon atom bonded to an organic group containing a protected aliphatic alcohol group, a hydrolysate of the hydrolyzable organosilane, a hydrolysis-condensation product of the hydrolyzable organosilane, or a combination thereof and a solvent. The composition can form a resist underlayer film including, a hydrolyzable organosilane, a hydrolysate of the hydrolyzable organosilane, a hydrolysis-condensation product of the hydrolyzable organosilane, or a combination thereof, the silicon atom in the silane compound having a silicon atom bonded to an organic group containing a protected aliphatic alcohol group in a ratio of 0.1 to 40% by mol based on the total amount of silicon atoms. Also described is a method for applying the composition onto a semiconductor substrate and baking the composition to form a resist underlayer film.

Abstract: The invention relates to a method for production of polyhydroxyfunctional polysiloxanes with branched polyglycidol polyether groups, in which firstly at least one allylic or methallylic starting material is reacted with at least one glycidol, such that an allyl polyether or methallyl polyether is formed, and then the allyl polyether or methallyl polyether thus produced is added to a Si—H functional alkyl polysiloxane in the presence of an acid buffering agent. The invention further relates to polysiloxanes, which may be obtained by said method and the use of the polysiloxanes in coating agents, polymeric coating masses and thermoplastics.

Abstract: Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions.

Abstract: A high surface area filler, a conformal coating composition, and an apparatus. The high surface area filler comprises an amorphous silicon dioxide powder and a phosphine compound bonded to the amorphous silicon dioxide powder. The conformal coating composition comprises a conformal coating and the high surface area filler. The apparatus includes an electronic component mounted on a substrate and metal conductors electrically connecting the electronic component. The conformal coating composition overlies the metal conductors and comprises a conformal coating and the high surface area filler. Accordingly, the conformal coating composition is able to protect the metal conductors from corrosion caused by sulfur components (e.g., elemental sulfur, hydrogen sulfide, and/or sulfur oxides) in the air.

Abstract: A nickel-free sealing reagent comprises an alkyl sodium sulfonate compound, a dispersing agent, and a siloxane defoaming agent. A method of sealing an alloy comprises applying a nickel-free sealing reagent to the alloy, wherein the sealing agent comprises an alkyl sodium sulfonate compound, a dispersing agent, and a siloxane defoaming agent.

Abstract: Molecular glass based planarizing compositions for lithographic processing are disclosed. The processes generally include casting the planarizing composition onto a surface comprised of lithographic features, the planarizing composition comprising at least one molecular glass and at least one solvent; and heating the planarizing composition to a temperature greater than a glass transition temperature of the at least one molecular glass. Exemplary molecular glasses include polyhedral oligomeric silsesquioxane derivatives, calixarenes, cyclodextrin derivatives, and other non-polymeric large molecules.

Abstract: A method of coating a surface, preparing a doped metal-ion precursor solution for coating, and an article including a component coated by the described method are disclosed. The method of coating includes applying a fluoro-silane doped metal-ion precursor solution on the surface to form a coated surface. The metal-ion precursor solution includes greater than about 0.6 molar percent concentration of a metal-ion precursor in a solvent comprising an alcohol. The method of preparing the doped metal-ion precursor solution includes dissolving a metal-ion precursor in a solvent comprising an alcohol at a temperature greater than about 100° C. and refluxing at a temperature greater than about 150° C. such that the concentration of metal-ion precursor in the solution is greater than 0.6 molar percent of the solution, and adding a fluoro-silane to the metal-ion precursor solution.

Abstract: A chemical vapor deposition method for producing a porous organosilica glass film comprising: introducing into a vacuum chamber gaseous reagents including at least one precursor selected from the group consisting of an organosilane and an organosiloxane, and a porogen that is distinct from the precursor, wherein the porogen is a C4 to C14 cyclic hydrocarbon compound having a non-branching structure and a degree of unsaturation equal to or less than 2; applying energy to the gaseous reagents in the vacuum chamber to induce reaction of the gaseous reagents to deposit a preliminary film on the substrate, wherein the preliminary film contains the porogen; and removing from the preliminary film substantially all of the labile organic material to provide the porous film with pores and a dielectric constant less than 2.6.

Abstract: Methods and compositions for forming porous low refractive index coatings on substrates are provided. The method comprises coating a substrate with a sol-formulation comprising silica based nanoparticles and an alkyltrialkoxysilane based binder. Use of the alkyltrialkoxysilane based binder results in a porous low refractive index coating having bimodal pore distribution including mesopores formed from particle packing and micropores formed from the burning off of organics including the alkyl chain covalently bonded to the silicon. The mass ratio of binder to particles may vary from 0.1 to 20. Porous coatings formed according to the embodiments described herein demonstrate good optical properties (e.g. a low refractive index) while maintaining good mechanical durability due to the presence of a high amount of binder and a close pore structure.

Abstract: The present invention relates to an article having at least one surface, wherein said surface is at least partially coated with a ultra high hydrophobic film having a surface roughness such that the film exhibits a static water contact angle at least equal to 115°, preferably 120°, even better 125°, and wherein said film is a nanostructured film comprising a first layer comprising nanoparticles bound by at least one binder adhering to the surface of the article, and a second layer of an anti-fouling top coat at least partially coating said first layer. The present invention also concerns a process for preparing the above article.

Abstract: A composition for protecting a surface of an organic substrate, such as VCT, wood, or a synthetic laminate material, includes a silicate (i.e., an alkali metal polysilicate or colloidal silica) and a siliconate (e.g., a metal siliconate, such as an alkali metal methyl siliconate, etc.). In addition, the composition may include acrylic latex, a silane coupling agent, and a solvent, such as ethylene glycol monobutyl ether. Such a composition may also include a leveling agent, such as a surfactant. Organic substrates, such as VCT, wood, and synthetic laminate materials, with such a composition on their surfaces are also disclosed.

Abstract: A composition for manufacturing a composite of a non-oxide ceramic matrix and a refractory phase within the non-oxide ceramic matrix includes a preceramic polymer for forming a non-oxide ceramic matrix and a refractory material dispersed within the preceramic polymer.

Abstract: A diffusion agent composition used in forming an impurity diffusion agent layer on a semiconductor substrate, and containing an impurity diffusion component, a silicon compound, and a solvent containing a solvent having a boiling point of 100° C. or less, a solvent having a boiling point of 120-180° C., and a solvent having a boiling point of 300° C.

Abstract: A composition for the production of an antireflection coating, comprising a condensate obtainable by the condensation of silicon compounds of the general formula RnSiX4-n (I) in which the X groups are the same or different and represent hydrolyzable groups or hydroxyl groups, the R groups are the same or different and represent non-hydrolyzable groups, and n is 0, 1, 2, or 3, wherein the composition comprises at least one polymeric agent controlling the rheology and at least one solvent with a boiling point of at least 150° C. The present invention also describes methods for the preparation and use of the present composition. In particular, the composition can be applied by screen printing methods on substrates.

Abstract: Disclosed are precursors that are adapted to deposit SiCOH films with dielectric constant and Young's Modulus suitable for future generation dielectric films.

Abstract: The present invention relates to organoalkoxysilane compositions which comprise at least one organoalkoxysilane S, and at least one anhydrous surfactant T, where the weight fraction of all of the organoalkoxysilanes S is 33% by weight, based on the weight of the organoalkoxysilane composition, and where the ratio of the weight sum of all of the organoalkoxysilanes S to the weight sum of all of the anhydrous surfactants T (S:T) has a value of from 5:1 to 1:2.

Abstract: Methods for forming doped silane and/or semiconductor thin films, doped liquid phase silane compositions useful in such methods, and doped semiconductor thin films and structures. The composition is generally liquid at ambient temperatures and includes a Group IVA atom source and a dopant source. By irradiating a doped liquid silane during at least part of its deposition, a thin, substantially uniform doped oligomerized/polymerized silane film may be formed on a substrate. Such irradiation is believed to convert the doped silane film into a relatively high-molecular weight species with relatively high viscosity and relatively low volatility, typically by cross-linking, isomerization, oligomerization and/or polymerization. A film formed by the irradiation of doped liquid silanes can later be converted (generally by heating and annealing/recrystallization) into a doped, hydrogenated, amorphous silicon film or a doped, at least partially polycrystalline silicon film suitable for electronic devices.

Abstract: There is provided a material that exhibits high solvent resistance after the formation of a cured film, excellent photo-alignment capability relative to a polymerizable liquid crystal, satisfactory heat resistance, and high transparency and moreover, that can be dissolved in a glycol-based solvent, a ketone-based solvent, or a lactic acid ester-based solvent that is applicable to the production of an overcoating of a color filter, during the formation of the cured film. A composition for forming thermoset film having photo-alignment properties, including: a component (A) that is a compound having a photo-aligning group and a hydroxy group; and a component (B) that is a silicon isocyanate compound. A liquid crystal alignment layer formed from the thermoset film forming composition, and an optical device with a retardation layer obtained by use of the thermoset film forming composition.

Abstract: Disclosed are precursors having a pyrrolecarbaldiminates ligand and methods of synthesizing the same. The pyrrolecarbaldiminates ligand may be substituted.

Abstract: An adhesion promoter for a hot melt adhesive or a pressure sensitive adhesive prepared by admixing a silane composition with an aqueous buffer solution, where the silane composition includes at least two silane compounds. The adhesive is able to bind at very low surface free energy substrates, such as Xerographic prints contaminated by silicone fuser oil. The hot melt adhesive maintains a substantially stable viscosity at temperature ranging from about 100° C. to about 200° C.

Abstract: A conditioning agent (typically for use in repairing a flaw in a glazing panel) is contained in a sealed container which is itself disposed internally of a flexible outer walled container. Pressure applied to the outer flexible walled container can cause release of the conditioning agent from the internal conditioning agent container. The conditioning agent preparation may comprise a hygroscopic solvent (such as acetone) combined with one or more primer additives to prime the surface of the glazing panel for repair.

Abstract: A surface treatment composition comprising (i) an organosilicon compound having an alkoxysilane functional group at the end of a fluorocontaining polyether chain and (ii) fluorocontaining polyether compound s, wherein a content of the fluorocontaining polyether compounds in the surface treatment composition is less than 25 mol % based on the surface treatment composition.

Abstract: A low-permittivity interlayer insulating film of the present invention is formed by a plasma CVD method and includes at least carbon and silicon, wherein a ratio of the carbon to the silicon is 2.5 or more, and relative permittivity is 3.8 or less. Also, a film formation method of a low-permittivity interlayer insulating film of the present invention includes forming a film of an insulating film material that includes at least carbon and silicon by a plasma CVD method, wherein a hydrocarbon is not used as the insulating film material, and a ratio of the carbon to the silicon is 2.5 or more, and relative permittivity is 3.8 or less in the formed low-permittivity interlayer insulating film.

Abstract: The method consists of the formation of a layer over a stone substrate to increase its hardness, chemical resistance, wear and scratch resistance, comprising applying on the substrate a coating matrix incorporating an organic material and fillers including inorganic nanoparticles and/or microparticles; chemically binding said matrix to the substrate, by a self-assembly process and/or a binding process by covalent bonding, electrostatic bonding, van der Waals bonding or hydrogen bonds; and finally drying said matrix. The mentioned organic material is selected from organosilanes, organophosphates, polycarboxylic compounds, compounds based on triazine heterocycles and said nanoparticles are nanoparticles of oxides, carbides, borides, nitrides of metals or of semimetals.

Abstract: A chemical composition for protecting glassy surfaces exposed to the external environment comprising silicon dioxide, in a percentage between about 0.3-2%, isopropyl alcohol (2-propanol) in percentage between 60-70%, 1-methoxy-2-propanol in percentage between 15-25%, ethanol in percentage between 0.5-3.5% and ethyl silicate in percentage between 0.1-1%.

Abstract: The present invention discloses a composition for enhancing evaporation of a solution and a method thereof. A far-infrared ray is released by a far-infrared releasing substance in the composition so as to induce evaporation of the solution. The far-infrared releasing substance may be ceramic minerals and mainly comprises 80˜99.9 wt % of oxide minerals including 60˜95 wt % of the aluminum oxide. The present invention can enhance evaporation of the solution by a simple physical method. Hence, the present invention not only promotes the application of the products but also reduces the pollutants generated by a chemical reaction, thereby achieving the object of protecting the environment from the pollution.

Abstract: A chemical vapor deposition method for producing a porous organosilica glass film comprising: introducing into a vacuum chamber gaseous reagents including at least one precursor selected from the group consisting of an organosilane and an organosiloxane, and a porogen that is distinct from the precursor; applying energy to the gaseous reagents in the vacuum chamber to induce reaction of the gaseous reagents to deposit a preliminary film on the substrate, wherein the preliminary film contains the porogen; and removing from the preliminary film substantially all of the porogen to provide the porous film with pores and a dielectric constant less than 2.6.

Abstract: A siloxane based coating composition having excellent dyeability, abrasion resistance, glossiness and transparency, a preparation method thereof, and an optical lens coated by the coating composition are suggested. The siloxane based coating composition includes organo silane compound, inorganic oxide (H-index filler), solvent and a dyeing improving material. The dyeing improving material adopts nitric acid, hydrochloric acid, phosphoric acid, sodium nitrate, potassium nitrate, silver nitrate, or the like. The siloxane based coating composition shows excellent dyeability owing to the dyeing improving material, excellent abrasion resistance owing to the organo silane compound, and excellent glossiness and transparency, so it may be applied as a coating film on a surface of a plastic lens such as optical lens, industrial safety lens and leisure-purpose goggle that require high transparency.

Abstract: An antireflective coating composition includes a hydrolytic condensate (C1) of alkoxy silane (C11) and fluoric alkoxy silane (C12); a particle-type metal fluoride (C2) with a refractive index of 1.40 or less; and a liquid dispersion-enhancing chelating agent (C3). A coating film to which the above composition is applied controls refractive index, surface energy, film strength and so on, so it ensures excellent antireflective characteristic, excellent scratch resistance, good erasure of liquid stains such as fingerprints, and particularly excellent dust removal, so it may be usefully applied to an outermost layer of a front surface of a display regardless of kind of a display substrate or presence of an additional coating layer.

Abstract: A porous organosilica glass (OSG) film consists of a single phase of a material represented by the formula SivOwCxHyFz, where v+w+x+y+z=100%, v is from 10 to 35 atomic %, w is from 10 to 65 atomic %, x is from 5 to 30 atomic %, y is from 10 to 50 atomic % and z is from 0 to 15 atomic %, wherein the film has pores and a dielectric constant less than 2.6.

Abstract: Fine mesoporous silica particles are provided by which not only the functions of low reflectance (Low-n), low dielectric constant (Low-k) and low thermal conductivity but also improved strength of a molded article are achieved. The fine mesoporous silica particles are manufactured by a process including a surfactant composite fine silica particle preparation step and a mesoporous particle formation step. In the silica fine particle preparation step, a surfactant, water, an alkali and a hydrophobic part-containing additive including a hydrophobic part for increasing the volume of micelles are mixed with a silica source to thereby prepare surfactant composite fine silica particles. In the mesoporous particle formation step, the mixture is mixed with an acid and an organosilicon compound to thereby remove the surfactant and hydrophobic part-containing additive from the surfactant composite fine silica particles and provide the surface of each silica fine particle with an organic functional group.

Abstract: A process for producing a coating composition includes separately chemically grafting particles with compounds having reactive groups and compounds having hydrophilic polymer chains. The hydrophilic polymer chains dissolve in water at at least one temperature between 0 and 100° C. The reactive groups may react with the substrate and or react with one another to form a cross-linked coating, comprising the particles. A process for forming a coating on a substrate is also provided.

Abstract: A coating film to prevent a conspicuous fingerprint has a water contact angle of no less than 60° so that most of water contained in fingerprints on the coating film evaporates without forming a layer adsorbed on the coating film. Further, the coating film has lipophilicity and has a diiodomethane contact angle of no more than 45° so that the coating film exhibits enhanced affinity to fingerprints, which primarily contain oily components.

Abstract: Provided is a near-infrared shielding coating agent containing: (1) an inorganic near-infrared absorbing agent; (2) a tetrafunctional silicon compound represented by general formula Si(OR1)4, a hydrolysate thereof, and/or a condensation polymerization product thereof; (3) a trifunctional silicon compound represented by general formula R2Si(OR3)3, a hydrolysate thereof, and/or a condensation polymerization product thereof; (4) a silane coupling agent represented by one of the general formulas Si(X)3-Y or R4Si(X)2-Y, a hydrolysate thereof, and/or a condensation polymerization product thereof; and (5) a solvent. This coating agent allows the formation, at an ordinary temperature between 5° C. and 40° C., of a near-infrared shielding film that has a high film hardness and is not prone to cracks.