Miscellaneous Patents (Class 118/506)
  • Patent number: 9688023
    Abstract: A process for additive manufacturing of a resorbable implant to be implanted into a patient includes providing a biocompatible resin including a liquid light-polymerizable material that is resorbable after polymerization and an initiator. The process further includes actuating an additive manufacturing apparatus to expose an amount of the biocompatible resin to light to at least partially cure the exposed amount of biocompatible resin to form a layer of the resorbable implant and actuating the additive manufacturing apparatus to expose at least some additional amount of biocompatible resin to light to at least partially cure the exposed additional amount of biocompatible resin to form an additional layer of the resorbable implant and to at least partially overcure previously cured layers to cause at least some interlayer binding between the previously cured layers and the additional layer.
    Type: Grant
    Filed: August 22, 2011
    Date of Patent: June 27, 2017
    Inventors: H. David Dean, Jonathan E. Wallace, Antonios G. Mikos, Martha Wang, Ali Siblani, Kyobum Kim, John P. Fisher
  • Patent number: 9012030
    Abstract: A substrate processing chamber component comprising a chamber component structure having an yttrium-aluminum coating. The yttrium-aluminum coating comprises a compositional gradient through a thickness of the coating.
    Type: Grant
    Filed: February 7, 2012
    Date of Patent: April 21, 2015
    Assignee: Applied Materials, Inc.
    Inventors: Nianci Han, Li Xu, Hong Shih
  • Publication number: 20140329009
    Abstract: Processing apparatus and method for processing a workpiece surface, in particular for the internal coating of cylinder bores. Processing apparatus has a shield unit which is provided to separate from one another—at least during operation—a part region of the workpiece surface provided for the processing and an adjacently arranged part region of the workpiece surface. The shield unit has at least one blocking nozzle which is provided to generate a fluid flow for separating the at least two part regions.
    Type: Application
    Filed: May 1, 2014
    Publication date: November 6, 2014
    Applicant: SULZER METCO AG
    Inventor: Christian BOHNHEIO
  • Publication number: 20140134335
    Abstract: The present invention relates to a novel process for the production of coated filaments for subsequent application as print in extrusion-based 3D printers, e.g. FDM printers (fused deposition modelling printers). The filaments are coated in a separate process outside of the printer, and can also be used in a conventional extrusion printer. The present invention further relates to the coating device for application of the coating to the filament and to a roll containing the coated filaments.
    Type: Application
    Filed: November 6, 2013
    Publication date: May 15, 2014
    Applicant: Evonik Industries AG
    Inventors: Markus PRIDOEHL, Ulrike Behrens, Stefan Bernhardt, Ann-Kristin Klaar, Samuel von Karsa-Wilberforce
  • Publication number: 20130273252
    Abstract: A coating apparatus including a coating part which coats a liquid material containing a metal on a substrate, a coating-film forming part which subjects the liquid material coated on the substrate to a predetermined treatment to form a coating film, and a removing part which removes a peripheral portion of the coating material formed along the outer periphery of the substrate.
    Type: Application
    Filed: April 15, 2013
    Publication date: October 17, 2013
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventor: Hidenori Miyamoto
  • Patent number: 8480319
    Abstract: A process block is formed by arranging a heating-process related block on the side of a carrier block, a group of liquid-process related unit blocks, and a heating block on the side of an interface block, in this order from the side of the carrier block to the side of the interface block. The group of liquid-process related unit blocks is composed of: a group of unit blocks for coating films that is formed by stacking upward a unit block for an antireflection film, a unit block for a resist film, and a unit block for an upper layer film, in this order; and unit blocks for developing that are stacked on one another in the up and down direction with respect to the group of unit blocks for coating films. Liquid process modules of each of the liquid-process related unit blocks are arranged on the right and left sides of a transfer path for a substrate.
    Type: Grant
    Filed: August 30, 2011
    Date of Patent: July 9, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Shinichi Hayashi, Yuichi Douki, Akira Miyata, Yuuichi Yamamoto, Kousuke Yoshihara, Nobuaki Matsuoka, Suguru Enokida
  • Patent number: 8479683
    Abstract: A method of forming a boron nitride or boron carbon nitride dielectric produces a conformal layer without loading effect. The dielectric layer is formed by chemical vapor deposition (CVD) of a boron-containing film on a substrate, at least a portion of the deposition being conducted without plasma, and then exposing the deposited boron-containing film to a plasma. The CVD component dominates the deposition process, producing a conformal film without loading effect. The dielectric is ashable, and can be removed with a hydrogen plasma without impacting surrounding materials. The dielectric has a much lower wet etch rate compared to other front end spacer or hard mask materials such as silicon oxide or silicon nitride, and has a relatively low dielectric constant, much lower then silicon nitride.
    Type: Grant
    Filed: September 13, 2012
    Date of Patent: July 9, 2013
    Assignee: Novellus Systems, Inc.
    Inventors: George Andrew Antonelli, Mandyam Sriram, Vishwanathan Rangarajan, Pramod Subramonium
  • Patent number: 8414734
    Abstract: The present invention provides a system (100) for aligning a dispensing apparatus (110) utilized within a semiconductor deposition chamber (102). A stationary reference apparatus (106) is disposed along the bottom of the deposition chamber. A self-alignment support system (122), comprising one or more support components (124), is intercoupled between the dispensing apparatus and a deposition system exterior component (112). The self-alignment support system is adapted to facilitate and secure repositioning of the dispensing apparatus responsive to pressure applied to the dispensing surface (114) thereof. A non-yielding offset component (126) is placed upon a first surface (108) of the stationary reference apparatus. The dispensing surface of the dispensing apparatus is engaged with the offset component, and pressure is applied to the dispensing apparatus via the offset component until a desired alignment is achieved.
    Type: Grant
    Filed: May 31, 2007
    Date of Patent: April 9, 2013
    Assignee: Texas Instruments Incorporated
    Inventor: Martin B. Garcia
  • Publication number: 20130081569
    Abstract: A tire coating apparatus for applying fluid to vehicle tires in a vehicle washing system, includes a pair of mechanical applicators, which each have at least one coating applicator disposed thereon for contacting the vehicle tires to apply the fluid. One mechanical applicator is intended to engage the tires on a right side of a vehicle while the other mechanical applicator is intended to engage the tires on a left side of the vehicle. The mechanical applicators also include a guide portion for guiding the vehicle wheel when a patron had elected not to have a coating fluid applied to the vehicle wheels. The mechanical applicators are rotatable between an initial position where the coating applicators are in a non-coating position to a second position where the coating applicators are intended to contact a vehicle tire.
    Type: Application
    Filed: October 3, 2011
    Publication date: April 4, 2013
    Inventors: Robert J. Wentworth, Lionel Belanger
  • Patent number: 8408222
    Abstract: New baffles and methods of using these baffles are provided. The baffles comprise a body having an edge wall configured to direct the flow of a composition against a substrate (e.g., silicon wafer) edge. The edge wall comprises a vertical surface, a curved sidewall coupled to the vertical surface, and a lip coupled to the curved sidewall. A preferred baffle is annular in shape and formed from a synthetic resinous composition. Even more preferably, the baffle is not formed of a metal. The inventive methods comprise positioning the baffle adjacent a substrate during a spin coating process so that the edge wall causes the composition to cover the edges of the substrate and preferably a portion of the back side of the substrate.
    Type: Grant
    Filed: July 20, 2009
    Date of Patent: April 2, 2013
    Assignee: Brewer Science Inc.
    Inventors: Gary J. Brand, Philip H. Allen, Ramachandran K. Trichur
  • Patent number: 8402917
    Abstract: A mask frame assembly for thin film deposition including a frame having an opening portion and a support portion, and a mask having a deposition area in a position corresponding to the opening portion, wherein the mask includes a first layer including the deposition area and a peripheral portion disposed outside the deposition area and a second layer including a first surface and a second surface opposite to the first surface, at least a part of the first surface of the second layer faces the first layer and contacts the peripheral portion, and the second surface is welded to the support portion of the frame.
    Type: Grant
    Filed: November 24, 2009
    Date of Patent: March 26, 2013
    Assignee: Samsung Display Co., Ltd.
    Inventors: Jung-Woo Ko, Sang-Shin Lee, Taek-Kyo Kang, Seung-Ju Hong
  • Patent number: 8342761
    Abstract: Disclosed is an coating/developing apparatus and method thereof in which the processing time is shortened and the foot prints is reduced by shortening the travel distance of a wafer transfer arm. The coating/developing apparatus of the present disclosure includes, inter alia, liquid processing part (COT) that processes the substrate using a liquid, a cooling processing part (CA) provided to correspond to the liquid processing part (COT) and perform the cooling process for the substrate, a liquid processing unit (COTU) provided to correspond to the cooling processing part (CA) and equipped with a heating processing part (HP) that performs a heating processing for the substrate. The cooling processing part (CA) transfers the substrate to/from the liquid processing part (COT) and the heating processing part (HP).
    Type: Grant
    Filed: August 19, 2010
    Date of Patent: January 1, 2013
    Assignee: Tokyo Electron Limited
    Inventor: Nobuaki Matsuoka
  • Publication number: 20120244457
    Abstract: The present invention provides an electrode for a polymer electrolyte membrane fuel cell. In one embodiment, a planar nanoporous or microporous metal foam or metal aerogel structure is provided, from which an electrode with a catalyst layer integrally formed by fixing a catalyst in the metal foam or metal aerogel is formed.
    Type: Application
    Filed: July 6, 2011
    Publication date: September 27, 2012
    Applicants: SNU R&DB FOUNDATION, HYUNDAI MOTOR COMPANY
    Inventors: Nak Hyun Kwon, In Chul Hwang, Jae Seung Lee, Bum Wook Roh, Yung Eun Sung, Ju Wan Lim, Yoon Hwan Cho, Nam Gee Jung, Hee Man Choe, Yong Hun Cho
  • Patent number: 8048228
    Abstract: A masking apparatus includes a mask base body and a mask plate. The mask base body includes at least one spacer plate, and a cavity in which an electronic component can be housed. The mask plate is disposed on an upper surface and/or a lower surface of the mask base body. The mask plate includes a film-forming opening with a shape corresponding to the shape of an external structural body to be formed on an outer surface of the component. The mask plate thus allows a film-forming operation to be selectively performed on the outer surface of the component through the film-forming opening. The cavity includes, in an inner surface thereof, a film-forming groove communicating with the film-forming opening so that the external structural body can be formed at once on an upper surface and/or a lower surface of, and also on a peripheral surface of the component.
    Type: Grant
    Filed: October 26, 2007
    Date of Patent: November 1, 2011
    Assignee: TDK Corporation
    Inventors: Hajime Kuwajima, Hitoshi Ohkubo
  • Patent number: 7923380
    Abstract: A substrate processing apparatus includes a processing chamber that processes a substrate, and a substrate placing base enclosed in the processing chamber, and a substrate transporting member that allows the substrate to wait temporarily on the substrate placing base, and exhaust holes provided so as to surround the substrate placing base, and a retracting space that allows the substrate transporting member to move in between lines each connecting the exhaust hole and an upper end of the substrate placing base and the substrate placing base.
    Type: Grant
    Filed: September 11, 2009
    Date of Patent: April 12, 2011
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Hidehiro Yanai, Masakazu Sakata, Akira Takahashi
  • Publication number: 20100307410
    Abstract: In the present invention, at a coater cup 18 of a resist coating device 10, a through-hole 46 is formed in a top wall 38 of an upper cup 24 that is formed of a resin material. A silicon substrate 16 is held at a rotating chuck 14 that passes-through the through-hole 46. A reverse surface of the silicon substrate 16 thereby faces a top surface of the top wall 38 of the upper cup 24. Here, a deformation correcting hardware 48 is mounted to the top wall 38 of the upper cup 24 along a hole edge portion of the through-hole 46 (i.e., along a pushed-out portion 38A). Because the deformation correcting hardware 48 is formed to have higher rigidity than the top wall 38 of the upper cup 24, deformation of the top wall 38 can be corrected or suppressed by the deformation correcting hardware 48.
    Type: Application
    Filed: April 23, 2010
    Publication date: December 9, 2010
    Applicant: OKI SEMICONDUCTOR CO., LTD.
    Inventor: Katsuhiro Yoshino
  • Publication number: 20100212587
    Abstract: The stain preventing cover is formed from a composite sheet 24 having a three layer structure as a raw material which is produced by laminating a first sheet material 21 having a low dielectric constant and having insulation performance, a second sheet material 22 having a dielectric constant higher than that of the first sheet material 21 or having semiconductivity and a third sheet material 23 having a dielectric constant lower than that of the second sheet material 22 and having insulation performance, in which an end of the second sheet material 22 is positioned together with an end of the first and third sheet materials 21 and 23 adjacent to a electrostatic high voltage part 10 of a coating machine and another end thereof is positioned distant from an earth part 11 of the coating machine to be electrically insulated.
    Type: Application
    Filed: May 15, 2008
    Publication date: August 26, 2010
    Inventors: Masahito Sakakibara, Hisanori Nakamura, Youichi Hanai, Hideki Saitou, Michio Mitsui, Masatoshi Iwase
  • Publication number: 20100176088
    Abstract: To ensure a uniform flow over the surface of a product W, an apparatus is provided for the wet chemical treatment of the product W that is disposed in the apparatus 100. This apparatus comprises at least one flow member 150 that includes respectively at least one paddle-like flow element 155, wherein at least one flow member 155 is disposed situated opposite the surface of the product W and is moveable substantially parallel to the surface of the product W.
    Type: Application
    Filed: June 3, 2008
    Publication date: July 15, 2010
    Applicant: ATOTECH DEUTSCHLAND GMBH
    Inventors: Sebastian Dunnebeil, Heinz Klingl
  • Publication number: 20090317964
    Abstract: Techniques for reducing particle contamination on a substrate are disclosed. In one particular exemplary embodiment, the technique may be realized with a platen having different regions, where the pressure levels in the regions may be substantially equal. For example, the platen may comprise a platen body comprising first and second recesses, the first recess defining a fluid region for holding fluid for maintaining a temperature of the substrate at a desired temperature, the second recess defining a first cavity for holding a ground circuit; a first via defined in the platen body, the first via having first and second openings, the first opening proximate to the fluid region and the second opening proximate to the first cavity, wherein pressure level of the fluid region may be maintained at a level that is substantially equal to pressure level of the first cavity.
    Type: Application
    Filed: June 18, 2009
    Publication date: December 24, 2009
    Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: David E. SUURONEN, Dale K. Stone, Shigeo Oshiro, Arthur P. Riaf, Edward D. MacIntosh
  • Patent number: 7597762
    Abstract: A method for manufacturing components is provided. The method includes coupling a drive assembly to a positioning assembly, coupling a plurality of components to be manufactured to a plurality of fixtures, securing the plurality of fixtures to the drive assembly wherein each fixture is configured to receive a component to be manufactured, and repositioning the plurality of components simultaneously using the positioning assembly to facilitate manufacturing of the plurality of components, wherein the components are configured to be oscillated in a first plane of rotation via the drive assembly and rotated through a second plane of rotation via the plurality of fixtures.
    Type: Grant
    Filed: September 21, 2005
    Date of Patent: October 6, 2009
    Assignee: General Electric Company
    Inventors: Joseph G. Albanese, Robert Scott Shalvoy, Jon E. Dickinson
  • Publication number: 20090166736
    Abstract: A lateral double diffused metal oxide semiconductor a lateral double diffused metal oxide semiconductor (LDMOS) transistor which may include a first conductive type semiconductor substrate and a shallow trench isolation film defining an active region in the substrate. A second conductive type body region may be disposed over a portion of the top of the semiconductor substrate. A first conductive type source region may be disposed in the top of the body region. A first conductive type extended drain region may be disposed over a portion of the top of the semiconductor substrate and spaced from the body region. A gate dielectric film covers surfaces of the second conductive type body region and first conductive type source region and a portion of the top of the first conductive type semiconductor substrate. A gate conductive film may extend from the first conductive type source region, over the gate dielectric film, over the shallow trench isolation film, and inside the shallow trench isolation film.
    Type: Application
    Filed: December 28, 2008
    Publication date: July 2, 2009
    Inventor: Il-Yong Park
  • Publication number: 20090117280
    Abstract: A coating system includes an intermediate coat applying process, an overcoat applying process, and a clear coat applying process, which are disposed successively along a coating flow direction. The intermediate coat applying process includes first through fourth intermediate coat applying stations through, which are disposed in parallel to each other across a coating line. The overcoat applying process includes first through sixth overcoat applying stations through, which are disposed in parallel to each other across the coating line. At least each of the first through third overcoat applying stations through has a plurality of coating robots for applying coats having different colors.
    Type: Application
    Filed: April 11, 2007
    Publication date: May 7, 2009
    Applicant: HONDA MOTOR CO., LTD.
    Inventor: Daisuke Nakazono
  • Patent number: 7494941
    Abstract: At a time of a substrate loading step or/and at a time of a substrate unloading step, particles are effectively eliminated from a reaction chamber. Provided are a step of loading at least one wafer 200 into a reaction chamber 201, a step of introducing reaction gas into the reaction chamber 201, and exhausting an inside of the reaction chamber 201, thereby processing the wafer 200, and a step of unloading the processed wafer 200 from the reaction chamber 201. In the step of loading the wafer 200 or/and in the step of unloading the wafer 200, the inside of the reaction chamber 201 is exhausted at a larger exhaust flow rate than an exhaust flow rate in the step of processing the wafer 200.
    Type: Grant
    Filed: November 19, 2004
    Date of Patent: February 24, 2009
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Osamu Kasahara, Kiyohiko Maeda, Akihiko Yoneda
  • Publication number: 20080223295
    Abstract: The invention is a method for producing a tool which can be used to create optically active surface structures in the sub-?m range, having a support surface onto which relief surface structures are applied over the support surface by means of material deposition. The invention is distinguished by the support surface being directly contacted with a mask in which openings with diameters in the sub-?m range are provided or can be provided, by the support surface including the mask being subjected to a coating process in which the coating material deposits through the openings of the mask onto the support surface, and the mask is removed from the support surface when a partial amount of an average end structure height of the surface structures is reached and the coating procedure is then continued without the mask using the same coating material or different coating materials.
    Type: Application
    Filed: April 17, 2008
    Publication date: September 18, 2008
    Inventors: Frank Burmeister, Walter Doll, Gunter Kleer
  • Publication number: 20080124565
    Abstract: A material for forming a conductive structure for a micromechanical current-driven device is described, which is an alloy containing about 0.025% manganese and the remainder nickel. Data shows that the alloy possesses advantageous mechanical and electrical properties. In particular, the sheet resistance of the alloy is actually lower and more stable than the sheet resistance of the pure metal. Accordingly, when used for conductive leads in a photonic device, the leads using the NiMn alloy may provide current to heat the photonic device while generating less heat within the leads themselves, and a more stable output.
    Type: Application
    Filed: November 29, 2006
    Publication date: May 29, 2008
    Applicant: Innovative Micro Technology
    Inventors: Gregory A. Carlson, Alok Paranjpye, Jeffery F. Summers, Douglas L. Thompson
  • Patent number: 7371467
    Abstract: A component capable of being exposed to a plasma in a process chamber has a structure having an electroplated coating comprising yttrium-containing species. The electroplated coating is resistant to corrosion in the plasma, and can have a compositional gradient of yttrium-containing species through a thickness of the coating. In one embodiment, the coating is formed by electroplating a layer comprising yttrium onto the surface, and then electroplating a second layer onto the first layer, and annealing the first and second layers. The second layer can comprise aluminum or zirconium. In another embodiment, the coating is formed by electroplating a layer comprising a mixture of aluminum and yttrium onto the surface and annealing the layer.
    Type: Grant
    Filed: April 13, 2004
    Date of Patent: May 13, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Nianci Han, Li Xu, Hong Shih, Yang Zhang, Danny Lu, Jennifer Y. Sun
  • Patent number: 7153366
    Abstract: The systems, methods and products of the invention include systems and methods for manufacturing servo tracks on a magnetic tape. In one aspect, the invention includes systems for manufacturing magnetic tapes having servo tracks thereon wherein the servo tracks are optically detectable and are capable of being processed by a servo control system for maintaining alignment of a magnetic recording head with the data tracks on the recording side of the magnetic tape. In one practice, the manufacturing systems described herein engrave the servo tracks onto the non-recording side of a magnetic tape by directing a laser beam at the non- recording side of the magnetic tape. In another practice, the manufacturing systems described herein engrave the servo tracks onto the magnetic side of a magnetic tape by directing a laser beam at the magnetic side of the magnetic tape. Such engraved patterns can act as optical servo tracks for maintaining alignment of the recording head with the data tracks on the magnetic tape.
    Type: Grant
    Filed: November 22, 2000
    Date of Patent: December 26, 2006
    Assignee: Quantum Corporation
    Inventors: Hong Chen, Joseph M. Panish, Tzuo-Chang Lee, Leo Cappabianca
  • Patent number: 6913675
    Abstract: The invention provides a film forming apparatus that is capable of forming films sequentially with two types of film forming mechanisms in the same chamber. The film forming apparatus according to the present invention includes a Pt target disposed at one side within a film forming chamber, a sputtering output mechanism to supplying to the Pt target, a Pt vapor deposition source disposed at an other side within the film forming chamber, vapor deposition output mechanism to supply to the Pt vapor deposition source, a substrate holder disposed between the Pt target and the Pt vapor deposition source within the film forming chamber to mount a substrate, a rotating mechanism to move the substrate holder so that the substrate directs to the Pt target or to the Pt vapor deposition source, a heating mechanism to heat the substrate when the substrate is subjected to a sputtering film forming, and a cooling mechanism to cool the substrate when the substrate is subjected to vapor deposition film forming.
    Type: Grant
    Filed: March 3, 2003
    Date of Patent: July 5, 2005
    Assignees: Seiko Epson Corporation, Youtec Co., Ltd.
    Inventors: Takeshi Kijima, Eiji Natori, Mitsuhiro Suzuki
  • Patent number: 6893505
    Abstract: A method and apparatus for regulating fluid flows, such as flows of electrochemical processing fluids for processing microelectronic workpieces. The apparatus includes a valve body having an entrance port, an exit port, and a flow passage between the entrance and exit ports through which a first fluid flows. The valve body further includes a pressure chamber coupleable to a second fluid source and at least partially isolated from the flow passage. A regulator, movably disposed in the flow passage to change a flow area of the flow passage, has a first surface with a first projected area and a second surface with a second, larger, projected area, both of which are operatively coupled to the first fluid. A third surface of the regulator is operatively coupled to the second fluid. The regulator can adjust its position to maintain a constant or nearly constant first fluid flow rate as the fluid pressure at the entrance port changes.
    Type: Grant
    Filed: May 8, 2002
    Date of Patent: May 17, 2005
    Assignee: Semitool, Inc.
    Inventor: Steven L. Peace
  • Publication number: 20040237886
    Abstract: An apparatus for dispensing fluid includes a base member having a feed channel and a slot nozzle having first and second spaced apart members. A slot-shaped outlet channel is in fluid communication with the feed channel and is defined between the first and second spaced apart members. A slot-shaped outlet opening is in fluid communication with the slot-shaped outlet channel and has a width defined between the first and second spaced apart members. A valve is coupled with the base member and selectively interrupts and releases the flow of fluid through the slot-shaped outlet opening. An adjustment device infinitely adjusts the position of the first member relative to the position of the second member to change the width of the slot-shaped outlet opening. A method for dispensing fluid onto a substrate includes directing the fluid through the slot-shaped outlet channel while continuously increasing the pressure of the fluid.
    Type: Application
    Filed: July 12, 2004
    Publication date: December 2, 2004
    Inventors: Hans-Jurgen Meissner, Gerd Ostermann, Uwe Lehmann, Juergen Steckelberg
  • Patent number: 6790482
    Abstract: An arrangement and method orients the magnetization direction of magnetic layers on a plate shaped substrate on a mounting. The mounting defines a positioning plane for the substrate and a magnet arrangement is on one side of the positioning plane. The magnet arrangement has at least three electromagnets whose dipole axes are at least approximately parallel to the positioning plane and, viewed perpendicularly to the positioning plane, define a closed surface.
    Type: Grant
    Filed: January 3, 2003
    Date of Patent: September 14, 2004
    Assignee: Unaxis Balzers Aktiengesellschaft
    Inventor: Wolfram Maass
  • Patent number: 6780248
    Abstract: A system and method for applying adhesive to at least a first end of a rod-shaped member, such as a cotton swab stick includes a carrier, an adhesive applicator, and a rotator device. The carrier conveys the rod-shaped member or stick in a machine direction and also allows rotation of the rod-shaped member about its longitudinal axis. The adhesive applicator includes an application surface positioned to engage the first end of the rod-shaped member. The application surface includes at least one discharge passage for applying adhesive to the first end of the rod-shaped member. The rotator device rotates the rod relative to the application surface and about its longitudinal axis as the rod-shaped member is conveyed along the application surface.
    Type: Grant
    Filed: October 18, 2002
    Date of Patent: August 24, 2004
    Assignee: Nordson Corporation
    Inventors: Wesley C. Fort, James Keough, Leslie J. Varga
  • Patent number: 6756074
    Abstract: Systems and methods for creating a combinatorial coating library including a coating system operatively coupled to at least one of a plurality of materials suitable for forming at least one coating layer on a surface of one or more substrates. The systems and methods also including a curing system operative to apply at least one of a plurality of curing environments to each of a plurality of regions associated with the at least one coating layer, the curing system comprising a plurality of waveguides each having a first end corresponding to at least one of the plurality of regions and a second end associated with at least one curing source. The combinatorial coating library comprising a predetermined combination of at least one of the plurality of materials and at least one of the plurality of curing environments associated with each of the plurality of regions.
    Type: Grant
    Filed: March 4, 2003
    Date of Patent: June 29, 2004
    Assignees: General Electric Company, Avery Dennison Corporation
    Inventors: Radislav Alexandrovich Potyrailo, Daniel Robert Olson, Michael Jarvath Brennan, Jay Raghunandan Akhave, Mark Anthony Licon, Ali Reza Mehrabi, Dennis Lee Saunders, Bret Ja Chisholm
  • Patent number: 6723167
    Abstract: In one embodiment of the invention, a sleeve that forms a hollowed cylinder to enclose a spindle. The sleeve has a thickness and a first length. A strut is mounted to the spindle to keep the sleeve from traveling up a shaft. The strut is slotted into a first slot on a top end of the hollowed cylinder.
    Type: Grant
    Filed: December 21, 2000
    Date of Patent: April 20, 2004
    Assignee: Intel Corporation
    Inventor: James A. Porter
  • Patent number: 6599585
    Abstract: A UV curing system includes a light source, which produces UV light and non-useful light (heat energy), a shade member having a lamp-side surface that reflects light and provides thermal insulation to the target substance, and a housing having an internal reflecting surface. The shade member is situated between the light source and the target substance so that all, or most, light from the light source does not directly strike the target substance. The housing is situated on the opposite side of the light source from the barrier and partially encloses the light source.
    Type: Grant
    Filed: June 10, 2002
    Date of Patent: July 29, 2003
    Assignee: Aetek UV Systems
    Inventors: Allen P. Blacker, Jr., Thomas Becker, Kevin McKay, Simon N. Whittle
  • Publication number: 20030042148
    Abstract: A method and apparatus for anodizing aluminum exhaust housings including the utilization of conducting rods placed through the narrow passages. The rods allow current to flow and anodizing coating to build up inside the narrow passages. The rods are insulated from the housing and are connected to a special end plate. The end plate has an insulating spacer between the housing and connecting plate and ensures that the rods are installed and spaced properly and that the current properly flows. The assembly is then degreased and rinsed. The clean assembly is then placed into an appropriate anodizing solution and connected to a current source until the coating sufficiently builds up. The assembly is then removed from the anodizing tanks and rinsed in a series of tanks of increasing temperature.
    Type: Application
    Filed: August 31, 2001
    Publication date: March 6, 2003
    Applicant: Detroit Diesel Corporation
    Inventors: Kenneth Wickenheiser, Thomas B. Poiry
  • Publication number: 20020157605
    Abstract: A coating system includes a source of electrically non-insulative coating material, a dispenser for dispensing the coating material toward an article to be coated thereby, and an electrostatic high potential supply for supplying charge to the coating material. The high potential supply is coupled across the dispenser and the article The coating system further includes a reservoir, a valve having a housing providing first, second, third and fourth ports, and a component movable within the housing and having a first passageway selectively to connect the first port to the second port to permit the flow of coating material between the first port and the second port The first port is coupled to the coating material source. The second port is coupled to the reservoir. The third port is coupled to the dispenser The component is movable within the housing selectively to connect the second port to the third port to permit the flow of coating material between the reservoir and the dispenser.
    Type: Application
    Filed: June 13, 2002
    Publication date: October 31, 2002
    Inventors: Harold T. Allen, Varce E. Howe, Jerry L. McPherson, Roy E. Young
  • Patent number: 6455172
    Abstract: A method for producing a laminated metal ribbon comprises the steps of (a) vapor-depositing a third metal layer on at least one welding surface of a first metal ribbon 4 and a second metal ribbon 5 in a vacuum chamber 1, the third metal being the same as or different from a metal or an alloy of the first and second metal ribbons 4, 5; (b) pressure-welding the first metal ribbon 4 to the second metal ribbon 5; and (c) subjecting the resultant laminate 9 to a heat treatment for thermal diffusion.
    Type: Grant
    Filed: September 22, 2000
    Date of Patent: September 24, 2002
    Assignee: Hitachi Metals, Ltd.
    Inventors: Kentaro Yano, Noboru Hanai
  • Patent number: 6423143
    Abstract: A coating system includes a source of electrically non-insulative coating material, a dispenser for dispensing the coating material toward an article to be coated thereby, and an electrostatic high potential supply for supplying charge to the coating material. The high potential supply is coupled across the dispenser and the article. The coating system further includes a reservoir, a valve having a housing providing first, second, third and fourth ports, and a component movable within the housing and having a first passageway selectively to connect the first port to the second port to permit the flow of coating material between the first port and the second port.
    Type: Grant
    Filed: November 2, 1999
    Date of Patent: July 23, 2002
    Assignee: Illinois Tool Works Inc.
    Inventors: Harold T. Allen, Varce E. Howe, Jerry L. McPherson, Jr., Roy E. Young, II
  • Publication number: 20010037945
    Abstract: Between a wafer and a holder holding a wafer, a seal member is disposed so that a contact surface is formed in an approximate plane, and an inner periphery surface is formed in an approximate plane and approximately vertical to a contact surface. The seal member, in a sealed state, has a brim portion of a radius of curvature of 0.5 mm or less at a boundary portion between an inner periphery surface of a seal member and a contact surface. Due to a brim portion, a gap between a contact surface of a seal member and a surface being plated of a wafer W can be made smaller, resulting in reducing bubbles entering in a gap.
    Type: Application
    Filed: May 7, 2001
    Publication date: November 8, 2001
    Inventors: Wataru Okase, Takenobu Matsuo, Koichiro Kimura, Kyungho Park, Yoshinori Kato, Yasushi Yagi
  • Patent number: 6312526
    Abstract: In the chemical vapor deposition apparatus, a substrate stage for mounting a substrate is provided inside a reaction chamber of the apparatus. A source gas inlet for introducing a source gas and exhaust outlets and for exhausting the source gas are provided. Exhaust outlet valves provided for exhaust outlets are open and shut successively with time. The direction of the flow of source gas relative to the fixed substrate varies with time. The present chemical vapor deposition apparatus allows the improved evenness of film thickness, the composition ratio, and the like within the substrate surface as well as the reduction of particles of foreign substance generated inside the reaction chamber.
    Type: Grant
    Filed: November 16, 1999
    Date of Patent: November 6, 2001
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Mikio Yamamuka, Takaaki Kawahara, Masayoshi Tarutani, Tsuyoshi Horikawa, Shigeru Matsuno, Takehiko Sato
  • Patent number: 6200635
    Abstract: A method for producing visco-elastic fluidic material flows by drawing a visco-elastic fluidic material with corresponding separate second fluid flows associated therewith to form a visco-elastic fiber vacillating in a repeating, generally omega-shaped pattern having a bowed portion with first and second side portions that first converge toward each other and then diverge outwardly in generally opposing directions. In one operation, the visco-elastic fiber vacillating in the repeating, generally omega-shaped pattern is an adhesive material deposited onto woven and non-woven fabric substrates and stretched elongated elastic strands in the manufacture of a variety of bodily fluid absorbing hygienic articles.
    Type: Grant
    Filed: August 31, 1998
    Date of Patent: March 13, 2001
    Assignee: Illinois Tool Works Inc.
    Inventor: Kui-Chiu Kwok
  • Patent number: 6168665
    Abstract: A substrate processing apparatus comprising a substrate mounting table, a cup having an upper opening and surrounding the substrate mounting table, a lid for opening/closing the upper opening of the cup, a support arm for supporting the lid, a first lifting mechanism having a first piston for supporting the support arm directly or indirectly and a first cylinder for guiding the first piston in an up-and-down motion, a second lifting mechanism having a second piston for supporting the support arm directly or indirectly and a second cylinder for guiding the second piston in up-and -down motion, a driving circuit for supplying the pressurized fluid to the first and second cylinders, independently and exhausting the pressurized fluid from the first and second cylinders, independently, and a control mechanism for controlling operations of the driving circuit.
    Type: Grant
    Filed: November 4, 1998
    Date of Patent: January 2, 2001
    Assignee: Tokyo Electron Limited
    Inventors: Mitsuhiro Sakai, Kiyohisa Tateyama, Kimio Motoda
  • Patent number: 5779798
    Abstract: The invention concerns a device for distributing liquid by gravity, particularly in a photographic coating process.The device comprises: a) a rigid cylindrical outer pipe; an inner casing produced from a flexible material and the external diameter of which is less than or equal to the internal diameter of the pipe, said casing being arranged so as to define, with the pipe, substantially concentric first and second zones isolated from each other, the second zone being connected to a source of fluid so as to be able, under the effect of the pressure of the fluid, to cause the relative volumes of the first and second zones to vary in order to control the flow of liquid in the first zone; and c) a source of pressurized fluid connected to the second zone.
    Type: Grant
    Filed: July 26, 1995
    Date of Patent: July 14, 1998
    Assignee: Eastman Kodak Company
    Inventor: Jean-Claude Bosvot
  • Patent number: 5746831
    Abstract: A coating system comprises a source of electrically non-insulative coating material, a dispenser for dispensing the coating material toward an article to be coated thereby, an electrostatic high potential supply for supplying charge to the coating material, means for coupling the high potential supply across the dispenser and the article, a first reservoir, and a first valve. The first valve has a first housing providing first, second, third, fourth and fifth ports, and a first component movable within the first housing and having a first passageway selectively to connect the first port to the second port to permit the flow of coating material from the first port to the second port. The first port is coupled to the coating material source, the second port to the first reservoir, and the third port to the dispenser. The second port is coupled to the third port to permit the flow of coating material from the first reservoir to the dispenser. A source is provided for an electrically non-conductive fluid.
    Type: Grant
    Filed: May 3, 1995
    Date of Patent: May 5, 1998
    Assignee: Ransburg Corporation
    Inventors: Harold T. Allen, Edward T. Feldman, Varce E. Howe, Ghaffar Kazkaz, Ghazi M. A. Khattab, Jerry L. McPherson, Jr., James A. Scharfenberger
  • Patent number: 5656325
    Abstract: A powder coating apparatus and method are provided for feeding fine powdered coating material such as thermoplastic type material to a succession of discrete articles passing by the apparatus. The invention also provides a powder feed system that deposits an excess of powdered coating material than that required to form the coating and provides for recirculation of the powder not ultimately used to form the coating back to the powder feeding apparatus.
    Type: Grant
    Filed: August 3, 1994
    Date of Patent: August 12, 1997
    Assignee: ND Industries, Inc.
    Inventor: John S. Wallace
  • Patent number: 5554393
    Abstract: An apparatus for supplying particles and/or granules to form a layer of prescribed thickness onto a given surface includes an endless pattern-forming device having a plurality of spaces, a device for supplying particles and/or granules into the spaces via a control member provided on the particle or granule-supplying device, a device for temporarily retaining the supplied particles and/or granules in the spaces and for releasing the temporarily retained particles and/or granules onto the given surface. A patterned shaped article is produced by a method using the apparatus. The method includes supplying dry particles and/or granules for a pattern course into the spaces, temporarily retaining the supplied particles and/or granules in the spaces, releasing the temporarily retained particles and/or granules onto the given surface, and allowing the released particles and/or granules to set on the given surface.
    Type: Grant
    Filed: December 6, 1994
    Date of Patent: September 10, 1996
    Assignee: CCA Inc.
    Inventors: Hiroshi Uchida, Mituhiro Onuki, Hideo Watanabe
  • Patent number: 5501735
    Abstract: Apparatus for contacting a circuit board substrate with etching fluid or some other chemical includes a conveyor system comprised of upper and lower rotating disks for receiving and transporting the circuit board substrate while the substrate is contacted with fluid. The apparatus includes a labyrinth seal which is used to prevent fluid from escaping from the apparatus. A shunting system permits the type of fluid applied to the substrate to be readily altered. Housing units incorporated in the apparatus are readily secured together with a resilient clamp.
    Type: Grant
    Filed: February 22, 1994
    Date of Patent: March 26, 1996
    Inventor: Don P. Pender
  • Patent number: 5421882
    Abstract: A gel-coating apparatus for seeds comprising: a nozzle portion for forming and cutting a gel coating film by opening and closing operation of a cutting plunger; a seed storing vessel moving upward and downward; an arm having a rotation shaft at the center thereof and a hollow needle at both ends thereof; a seed supply portion having pipes for communicating the needles with a negative pressure source and a positive pressure source by way of electromagnetic valves; a curing vessel provided below the nozzle portion; and a control section for synchronously operating the movement of the curing vessel, the nozzle portion, the seed storing vessel, the arm, and the seed supply portion.
    Type: Grant
    Filed: April 28, 1993
    Date of Patent: June 6, 1995
    Assignee: Yazaki Corporation
    Inventors: Yasushi Kouno, Takeo Hayashi
  • Patent number: 5335854
    Abstract: An electrically isolating pressure feed paint reservoir suitable for holding electrically conductive paint applied with an electrostatic spray gun. A paint container is located in an electrically insulated housing which is mounted on a dolly for portability. The housing also mounts a pneumatically operated paint pump for delivering pressurized paint to the spray gun. When a lid to the housing is removed the high voltage power source is turned off and any high voltage present in the housing is discharged through a resistor.
    Type: Grant
    Filed: December 11, 1992
    Date of Patent: August 9, 1994
    Assignee: Ransburg Corporation
    Inventors: David M. Seitz, Michael D. Elbertson