Responsive To Condition Of Coating Material Patents (Class 118/688)
  • Patent number: 6113694
    Abstract: Apparatus for coating a surface of a semiconductor wafer includes at least one treatment module, a handling device that may access each of the treatment modules, and a host controller connected to the handling device and to each of the treatment modules. The treatment modules may include a coating assembly for coating the semiconductor wafer surface and may also include at least one thermal conditioning module. The host controller may control the handling device to move a semiconductor wafer relative to the treatment modules. The treatment modules may be disposed within opposing assemblies and may be removed from the assemblies without disabling the treatment modules remaining within the opposing assemblies.
    Type: Grant
    Filed: July 13, 1998
    Date of Patent: September 5, 2000
    Assignee: Micron Technology, Inc.
    Inventor: Shawn D. Davis
  • Patent number: 6086734
    Abstract: A thin-film depositing apparatus of the present invention deposits a sputtered film on a substrate in a sputtering chamber, and removes the substrate having the sputtered film deposited thereon from the sputtering chamber via a load-lock chamber by a robot arm. As a system for controlling the sheet resistance of the sputtered film deposited on the substrate, a measuring device using an eddy current method is mounted in the proximity of a substrate outlet of the load-lock chamber and measures the sheet resistance of the sputtered film of the substrate removed from the substrate outlet. With this structure, it is possible to provide a thin-film depositing apparatus which stably measures the sheet resistance of a thin film deposited on a substrate and performs feedback of the measurement result to control the film deposition conditions so that a thin film to be deposited on a subsequent substrate has a desired thickness.
    Type: Grant
    Filed: April 16, 1999
    Date of Patent: July 11, 2000
    Assignee: Sharp Kabushiki Kaisha
    Inventor: Yoshinori Harada
  • Patent number: 6077354
    Abstract: An automotive vehicle body painting system can be equipped with a paint purge mechanism that includes a densitometer responsive to density changes in the fluid flowing through the mechanism. The densitometer can be used to selectively direct pure paint into a pure paint collection receptacle or a solvent-paint solution into a mixed paint collection receptacle. The system achieves a relatively high percentage recovery of pure paint that is purged from the painting system during each paint color change.
    Type: Grant
    Filed: October 7, 1998
    Date of Patent: June 20, 2000
    Assignee: Chrysler Corporation
    Inventors: Donald E. Kaneski, David R. Powell
  • Patent number: 6077350
    Abstract: The present invention provides a system and method for thermally curing polymeric coated substrates by effective drying of solvents used in the production of the coated component. A feedback system coupled to a heating apparatus is comprised of one or more gas sensors internal or external to the heating apparatus to provide monitoring of the quantity of solvent gases being generated. The present invention allows the curing process to be precisely controlled, where, for example, a predetermined concentration of solvent gases input to the gas sensor can trigger the heating process to be stopped or to provide for a controlled cool down period for curing of the photoresist substrate. A controller coupled between the gas sensor and the heating apparatus may also contain temperature and/or time controls for varying the output of the heating apparatus in response to indications from the gas sensor.
    Type: Grant
    Filed: March 10, 1998
    Date of Patent: June 20, 2000
    Assignees: Sony Corporation, Sony Electronics
    Inventors: Edward W. Morton, Robert Andrukaitis, Joseph Scarpinato
  • Patent number: 6074483
    Abstract: A sensor and a method for determining the basis weight of a coating material containing CaCO.sub.3 on a substrate is described. The determined basis weight is insensitive to changes in the amount of substrate material underlying the coating. Signals from the sensor may be used in the control of a coating mechanism to provide a coating having a uniform basis weight.
    Type: Grant
    Filed: March 26, 1998
    Date of Patent: June 13, 2000
    Assignee: Honeywell-Measurex Corporation
    Inventors: Edward Belotserkovsky, John A. Dahlquist
  • Patent number: 6048400
    Abstract: A substrate processing apparatus has a simple structure in which the number of nozzles is reduced. In a mixer part, photoresist which is supplied from a photoresist supply through a lower arm portion of the nozzle arm is mixed with solvent which is supplied from a solvent supply through a pipe. Following this mixing, the photoresist and the solvent flow through an upper arm portion and are ejected from a nozzle toward a substrate. In the nozzle arm, a viscometer is disposed to the upper arm portion. The viscometer measures a viscosity of photoresist solution which is obtained by mixing in the mixer part. In accordance with the measurement from the viscometer, the quantity of solvent supplied from the solvent supply is controlled, thereby obtaining a photoresist solution having a desired viscosity.
    Type: Grant
    Filed: August 18, 1997
    Date of Patent: April 11, 2000
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventor: Masami Ohtani
  • Patent number: 6039282
    Abstract: In order to improve the traveling and sliding properties of a yarn during its further processing, in particular for knitting, it is waxed during rewinding in cheese winding machines by passing it along a paraffin body. When the paraffin body is used up, the unwaxed yarn can cause yarn breaks or even needle breakages, which leads to production errors or lost production. At the winding stations, the drive of the friction drum is switched on and off at intervals to cause alternating acceleration phases with slippage between the friction drum and the bobbin and intervening slippage- free run-out phases to prevent pattern windings. The slippage is monitored over the course of the winding operation. If the slippage decreases in successive acceleration phases and remains at a low level, while the drive output of the friction drum remains unchanged, this is interpreted to indicate an outage of the paraffin application.
    Type: Grant
    Filed: December 21, 1998
    Date of Patent: March 21, 2000
    Assignee: W. Schlafhorst AG & Co.
    Inventors: Ferdinand-Josef Hermanns, Urs Meyer
  • Patent number: 6033479
    Abstract: A process gas delivery system incorporating a cleaning solution delivery subsystem for chemical vapor deposition. The system includes a slanted cleaning solution feed pipe for introducing a cleaning solution into the process gas delivery system and for disposal of waste cleaning solution from the process gas delivery system. Automatic determination of maintenance time may be accomplished by using an optical sensor provided on the process gas delivery pipe that detects the accumulation of the deposition material within the piping. The sensor may also be used to detect the cleaning solution residue inside the piping after cleaning and the liquid level during deposition.
    Type: Grant
    Filed: April 22, 1998
    Date of Patent: March 7, 2000
    Assignee: Applied Materials, Inc.
    Inventor: Towl Ikeda
  • Patent number: 6010740
    Abstract: An apparatus and method for controlling the opening of a solenoid actuated valve in a sealant dispensing gun are disclosed. A proximity sensor is provided adjacent a portion of the needle valve stem in order to sense when the needle valve has reached its open position. A dispense timer is initiated when the proximity sensor indicates that the needle valve has reached its open position. In this manner, the needle valve may be maintained in its open position for the desired dispense time only without regard to the response time of the solenoid device. Also disclosed is an apparatus and method for adjusting the valve open limit of a sealant dispensing device which incorporates a solenoid or motor actuated valve open limit device. A flow sensor is located in-line with the sealant supply path of a dispensing gun in order to monitor the dispense weight during each valve open cycle. A moving average of the dispense rates may then be calculated and compared to predetermined limits.
    Type: Grant
    Filed: September 30, 1997
    Date of Patent: January 4, 2000
    Assignee: Preferred Machining Corporation
    Inventors: Clinton W. Rutledge, Michael Godfrey, Ian J. Buckley, William W. Weil
  • Patent number: 6010739
    Abstract: In a method for direct or indirect application of a liquid or pasty medium onto a traveling material web, notably of paper or cardboard, where during the application the cross profile (length profile) of the medium is modified under control and thereafter, in the direction of travel, the length profile (cross profile) of the previously applied medium is modified under control. Control of the cross profile and control of the length profile of the applied medium occur separately from one another in automatic control loops based on measurements of the applied profile. In addition is a pertaining apparatus with an applicator, an equalizer, a pertaining cross profile control loop, and a pertaining length profile control loop.
    Type: Grant
    Filed: September 10, 1997
    Date of Patent: January 4, 2000
    Assignee: Voith Sulzer Papiermaschinen GmbH
    Inventors: Manfred Ueberschar, Anton Plomer, Hans-Peter Sollinger, Bernhard Kohl
  • Patent number: 5976611
    Abstract: The present invention relates to an optical fiber coating method and an apparatus therefor which can form high quality coating layer on an optical fiber (12) by preventing non-concentricity of a coating resin (14) applied on the optical fiber (12) and admixing of bubble.
    Type: Grant
    Filed: June 6, 1997
    Date of Patent: November 2, 1999
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Kaoru Okuno, Akira Inoue, Kazumasa Oishi, Kohei Kobayashi, Ichiro Tsuchiya
  • Patent number: 5964946
    Abstract: A bitumen-based waterproofing membrane is provided with an improved edge for sealing with a contiguous membrane to provide a membrane system with improved waterproofing characteristics. A bitumen-based reinforced membrane sheet is coated with granular material to protect the membrane sheet from ultraviolet rays. However, a section of the membrane sheet is first covered with a piece of protective tape which prevents any granular material from being deposited on the lateral section of exposed bitumen beneath the tape. The membrane sheets are then cut immediately prior to the tape or at the edge of the granular coating and then rolled up. Accordingly, the lateral section of bitumen which is covered by the protective tape is on the innermost part of the rolled-up membrane sheet. During installation, the tape is removed and the exposed bitumen or selvage section is disposed below an adjacent or contiguous membrane. Heat is then applied for an easy and effective seal between two adjacent membrane sheets.
    Type: Grant
    Filed: September 5, 1997
    Date of Patent: October 12, 1999
    Assignee: Polyglass, S.p.A
    Inventors: Luigi Zanchetta, Romano Zanchetta
  • Patent number: 5951767
    Abstract: A molecular beam epitaxy (MBE) growth chamber which provides separate longitudinally oriented isolation chambers for each effusion cell thereof. Wall structures bounding each isolation chamber are hollow to receive cryogenic material and are in fluid communication with each other. Each isolation chamber has an interior and exterior portal which provide fluid communication between the isolation chambers and the space inside the MBE chamber. An effusion cell is mounted in the interior portal to direct a portion of effusion material through the interior portal in a beam toward a substrate in the MBE chamber. Another portion of the effusion material is directed along the inside of the isolation chamber toward a sensor which controls the effusion cell. The isolation chambers facilitate measurement and control of individual materials effused from separate cells even when those cells are operated simultaneously.
    Type: Grant
    Filed: August 4, 1998
    Date of Patent: September 14, 1999
    Assignee: Chorus Corp.
    Inventor: Paul E. Colombo
  • Patent number: 5935332
    Abstract: A plant for preparing and feeding a coating composition to a coating head for paper or the like includes a plurality of hoppers, each hopper being intended to receive and deliver one ingredient of the composition. The plant further includes a premixer tank which is fed by the hoppers and mixes and homogenizes the formed composition and a homogenizing tank, fed by the premixer tank, having a high-speed stirrer for shearing the composition. A buffer capacity is directly and continuously fed by the homogenizing tank and connected to the coating head, wherein the buffer capacity preferably has a volume and an attached level detector for determining when the composition in the buffer capacity is below a predetermined level. A set of controllers attached to the level detector control the delivery of components from the plurality of hoppers.
    Type: Grant
    Filed: February 28, 1997
    Date of Patent: August 10, 1999
    Assignee: Cellier Groupe S.A.
    Inventor: Jean-Paul Caucal
  • Patent number: 5922130
    Abstract: A spray booth includes an outer enclosure in which the temperature and humidity of a fluid (such as air) is not controlled and a fluid handling unit within this enclosure, which circulates and controls the temperature and humidity of a smaller volume of the same fluid (air) to develop an environment suitable for application of coatings to desired substrates. In use, fluid is drawn from the outer enclosure into the inner, fluid handling unit in order to clean and modify the temperature and humidity of the fluid being handled, conditioning it to be delivered to the region of limited size which is established for receiving the substrate to be coated.
    Type: Grant
    Filed: March 31, 1997
    Date of Patent: July 13, 1999
    Assignee: Sermatech International, Inc.
    Inventors: Mark F. Mosser, Bruce McMordie
  • Patent number: 5912043
    Abstract: A wafer spin coating system, for coating a layer of photoresist on a wafer, includes a spin coating unit, a pumping unit and a sensing unit. A first controller in the spin coating unit controls the operation of a rotating device with the wafer mounted thereon. The first controller also outputs a photoresist pumping operation order. A second controller in the pumping unit receives the pumping operation order and outputs a pumping operation commencing signal and a valve operation signal that opens and closes a valve to control a gas feeding operation. The sensing unit receives the pumping operation commencing signal and the valve operation signal, and selectively outputs an abnormal status control signal to the first controller to stop the pumping operations if an abnormality is detected.
    Type: Grant
    Filed: November 7, 1997
    Date of Patent: June 15, 1999
    Assignee: Samsung Electronics Co, Ltd.
    Inventors: Sun-jip Choi, Jong-kwan Kim, Ill-jin Jang
  • Patent number: 5906857
    Abstract: An apparatus, system and method for controlling parameters attending the emission of a vaporized material from a source in a HV environment utilizes at least one shutter which is rotatably mounted over an exit opening through which vaporized material must exit the source. The shutter has a closure portion and is mounted adjacent the exit opening associated with the source for rotation about an axis so that by rotating the shutter about the rotation axis, the closure portion repeatedly covers and uncovers the exit opening in an intermittent fashion to prevent the emission of a vaporized material from the source during the periods of shutter rotation during which the exit opening is covered by the closure portion and to permit the emission of a vaporized material from the source during the periods of shutter rotation during which the exit opening is uncovered by the closure portion.
    Type: Grant
    Filed: May 13, 1997
    Date of Patent: May 25, 1999
    Assignee: Ultratherm, Inc.
    Inventors: Rodney Allen McKee, Frederick Joseph Walker
  • Patent number: 5807437
    Abstract: A system for producing three dimensional components by bonding together successive layers of a porous material with droplets of a binder material. A binder printhead has an array of nozzles which controllably supply jets of binder material droplets to the layers of porous material. The printhead is scanned in a raster scan fashion over each layer of porous material along a first scan axis in one direction to provide first fast scanning paths of droplets. The printhead is then moved laterally of such one direction and is then moved along the fast-scan axis in the opposite direction to provide second fast scanning paths of droplets which are interlaced with the first scanning paths. The supply of the droplets to the porous material can be controlled so as to control the overlapping thereof to produce various desired surface and interior characteristics of the components.
    Type: Grant
    Filed: February 5, 1996
    Date of Patent: September 15, 1998
    Assignee: Massachusetts Institute of Technology
    Inventors: Emanuel Sachs, Alain Curodeau, Tailin Fan, James F. Bredt, Michael Cima, David Brancazio
  • Patent number: 5807606
    Abstract: Applying adhesive in a desired pattern on a substrate by determining one or more inspection sites for monitoring adhesive deposition, applying adhesive to a substrate with a stencil or screen printer, viewing the inspection sites with a camera that generates image signals, and processing the image signals to determine if adhesive has been properly applied at the inspection sites.
    Type: Grant
    Filed: July 31, 1997
    Date of Patent: September 15, 1998
    Assignee: MPM Corporation
    Inventors: Douglas K. Mould, Joseph Renda, Jr., Steven W. Hall
  • Patent number: 5795394
    Abstract: A sensor and a method for determining the basis weight of a coating material containing CaCO.sub.3 on a substrate is described. The determined basis weight is insensitive to changes in the amount of substrate material underlying the coating. Signals from the sensor may be used in the control of a coating mechanism to provide a coating having a uniform basis weight.
    Type: Grant
    Filed: June 2, 1997
    Date of Patent: August 18, 1998
    Assignee: Honeywell-Measurex
    Inventors: Edward Belotserkovsky, John A. Dahlquist
  • Patent number: 5788776
    Abstract: A molecular beam epitaxy (MBE) growth chamber which provides separate longitudinally oriented isolation chambers for each effusion cell thereof. Wall structures bounding each isolation chamber are hollow to receive cryogenic material and are in fluid communication with each other. Each isolation chamber has an interior and exterior portal which provide fluid communication between the isolation chambers and the space inside the MBE chamber. An effusion cell is mounted in the interior portal to direct a portion of effusion material through the interior portal in a beam toward a substrate in the MBE chamber. Another portion of the effusion material is directed along the inside of the isolation chamber toward a sensor which controls the effusion cell. The isolation chambers facilitate measurement and control of individual materials effused from separate cells even when those cells are operated simultaneously.
    Type: Grant
    Filed: December 2, 1996
    Date of Patent: August 4, 1998
    Assignee: Chorus Corporation
    Inventor: Paul E. Colombo
  • Patent number: 5779799
    Abstract: An apparatus is provided for coating a surface of a plate-like material, or substrate, specifically a semiconductor wafer, with a coating material. The apparatus includes a plurality of self-controlled removable modules including a coating assembly, at least one thermal conditioning module, and a substrate handling device, and a host controller. The coating assembly is used to dispense coating material from a coating source onto the surface of the substrate material positioned in the coating assembly. The material handling device is positioned to access and move substrates between the coating assembly, the at least one thermal conditioning module and other modules included in the apparatus. The host controller provides substrate thermal conditioning, coating and handling information to the corresponding modules and tracks the location of each substrate in the apparatus.
    Type: Grant
    Filed: June 21, 1996
    Date of Patent: July 14, 1998
    Assignee: Micron Technology, Inc.
    Inventor: Shawn D. Davis
  • Patent number: 5772768
    Abstract: A printing apparatus includes a loading section for guiding wiring boards into the apparatus, a printing section equipped with a mask for printing a conductive material onto each of the wiring boards, a position detecting device for detecting a position of the wiring board held by the holding device, an alignment section for positionally correcting the mask or wiring board held by the holding device on the basis of an output signal from the position detecting device, and a transfer device having holding device for holding the wiring boards and turning to transfer the holding device and stop the holding device at the loading, printing, and alignment sections at the same time so that loading, printing, and alignment operations are simultaneously performed.
    Type: Grant
    Filed: September 1, 1995
    Date of Patent: June 30, 1998
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Noriyuki Inagaki, Toru Hattori, Toshinori Mimura
  • Patent number: 5772861
    Abstract: A system for evaluating the reflectance of an object (e.g., a CRT) that is coated with an anti-reflective coating material is disclosed. The quality and/or uniformity of the coating is evaluated by a reflectometer. The reflectometer is positioned relative to the object by non-contact sensors. Reflectance data gathered by the reflectometer is analyzed to determine to what extent the actual coating differs from the optimal (i.e., ideal) coating. A feedback system modifies the coating process for subsequent objects in an attempt to fine-tune the coating process and achieve optimal anti-reflective coatings for later objects passing through the system.
    Type: Grant
    Filed: October 16, 1995
    Date of Patent: June 30, 1998
    Assignee: Viratec Thin Films, Inc.
    Inventors: William A. Meredith, Jr., Charles C. Gammans, Kelly R. Clayton, Erik J. Bjornard, Kim D. Powers
  • Patent number: 5772769
    Abstract: A coating apparatus for detecting the presence of contaminants carried by a liquid a is that is applied as a coating on a workpiece. A tube guides the liquid along a flow path to the workpiece. A light source illuminates the liquid along the flow path with an optical fiber or other light carrier, and light is scattered by any contaminants present in the liquid. Light scattered by the contaminant particles is more intense than light scattered by the other liquid particles, and this brighter scattered light is detected by a light detector positioned adjacent to the fluid flow path. The coating system is particularly well suited for use in a spin-on coating process that applies a liquid, such as a photoresist material or a dielectric material, to a semiconductor wafer or other workpiece that is secured to a rotating turntable and rotated to receive a coating of the liquid.
    Type: Grant
    Filed: August 16, 1996
    Date of Patent: June 30, 1998
    Assignee: VLSI Technology, Inc.
    Inventor: Anthony Sayka
  • Patent number: 5750186
    Abstract: The present invention relates to coating and printing methods for the deposition of aqueous compositions. The composition may be adapted to any method without the need to change its chemical content. Viscosity is determined and adjusted by raising and lowering the temperature. High gloss value, increased film integrity and enhanced mar resistance result.
    Type: Grant
    Filed: January 15, 1997
    Date of Patent: May 12, 1998
    Inventor: Joseph Frazzitta
  • Patent number: 5746832
    Abstract: An apparatus for depositing particles onto a wafer comprises a particle generator; particle size controller connected to an output terminal of the particle generator, a first transmitting tube connected to an output of the particle size controller; a second and a third transmitter connected to an output terminal of the first transmitting tube; a first counter connected to an output terminal of the second transmitting tube; a particle depositor connected to an output terminal of the third transmitter; a second counter connected to the particle depositor; and a power supplier connected to the particle depositor. The apparatus and a method for depositing the particles onto the wafer provide a wafer on which particles of known size and kind are deposited. Also, the particles of a different kind and size are deposited on the same wafer.
    Type: Grant
    Filed: October 3, 1996
    Date of Patent: May 5, 1998
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Seung-ki Chae, Byung-seol Ahn, Sang-kyu Hahm, Jong-soo Kim
  • Patent number: 5740729
    Abstract: In a printing apparatus and method, printing material is printed on to-be-printed circuit boards in a predetermined pattern and a printing state of the material is inspected. The apparatus includes the following devices. A board supporting device has a rotary body supporting a plurality of board-fixed tables to which the boards are secured, and turns the rotary body together with the board-fixed tables intermittently at predetermined angular intervals so as to stop the board-fixed tables at each of a fixing, recognizing, printing, and inspecting position. A board feed device feeds the boards to the board-fixed tables arranged at the fixing position. A board discharge device discharges the boards from the board-fixed tables arranged at the fixing position. A recognizing device recognizes fixed positions of the boards relative to the board-fixed tables at the recognizing position. A printing device prints the printing material on the boards at the printing position.
    Type: Grant
    Filed: September 29, 1995
    Date of Patent: April 21, 1998
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Osamu Hikita, Syoji Sato, Toshinori Mimura, Kazue Okanoue, Youichi Nakamura
  • Patent number: 5707500
    Abstract: The present invention relates to vacuum processing equipment for processing a wafer in a vacuum, and film coating or forming equipment and method for forming a film on a wafer wherein radiation measurement and temperature control of the wafer is carried out by using an infrared radiation thermometer. Based upon the radiation measurement, heating and/or cooling of the wafer during processing is carried out.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: January 13, 1998
    Assignee: Hitachi, Ltd
    Inventors: Hideaki Shimamura, Yuji Yoneoka, Shigeru Kobayashi, Satosi Kisimoto, Sunao Matsubara, Hiroyuki Shida, Yukio Tanigaki, Masashi Yamamoto, Susumu Tsuzuku, Eisuke Nishitani, Tokio Kato, Akira Okamoto
  • Patent number: 5689763
    Abstract: A sensing system for a print development system of a printing system in which a print is developed with developer material and development of the print varies as a function of both a first parameter and a second parameter is provided. The development system includes a capacitance and the sensing system, which measures a first value varying as a function of the first parameter and a second value varying as a function of the second parameter, includes a sensing subsystem for measuring an output by reference to the capacitance; and a signal development subsystem, responsive to the sensing system, for developing, from the output, both a first signal and a second signal with the first signal corresponding to the first value and the second signal corresponding to the second value.
    Type: Grant
    Filed: September 16, 1996
    Date of Patent: November 18, 1997
    Assignee: Xerox Corporation
    Inventors: Darrel R. Rathbun, John J. Ricciardelli, Gerald A. Domoto
  • Patent number: 5683513
    Abstract: A process and apparatus for manufacturing MOS devices are disclosed. The process comprises the step of controlling a first clearance linear speed (1st CLSs) X which is the flows of an oxidizing and an annealing gases defined as ratios of the flow rates thereof to the area of a clearance between a semiconductor wafer and the interior surface of the tube of a heat treating furnace to be at least 30 cm/min while the semiconductor wafer is oxidized and annealed. The process comprises the step of controlling a second clearance linear speed (2nd CLS) Y which is a flow of the annealing gas defined as a ratio of the flow rate thereof to the area of the clearance to be at least 100 cm/min while the semiconductor wafer is taken out of the tube. The process comprises the step of controlling a relation between the 1st CLSs X and the 2nd CLS Y so that Y.gtoreq.-2.5 X+275. The process and the apparatus reduce and control the fixed-charge density in the oxide film of a MOS device with a high repeatability.
    Type: Grant
    Filed: November 20, 1996
    Date of Patent: November 4, 1997
    Assignee: Shin-Etsu Handotai Co., Ltd.
    Inventor: Nobuyoshi Fujimaki
  • Patent number: 5679161
    Abstract: An apparatus and method for detecting the edge of a light sensitive photographic emulsion on a support is described. The method and apparatus include a pair of collimated infrared light sources for illuminating each edge of the support at an angle of incidence of greater than 0.degree. to about 45.degree.. Positioned above the edges of the support are a pair of CCD cameras. Light scattered by the support and emulsion is detected by the CCD cameras and the edges of the emulsion and the edges of the support are detectable. Signal means are used to generate a signal corresponding to the position of the emulsion on the support. A conventional guider receives the signal and positions the support accordingly.
    Type: Grant
    Filed: December 8, 1995
    Date of Patent: October 21, 1997
    Assignee: Eastman Kodak Company
    Inventors: John Philip Wysokowski, Ernest A. Graff, Robert Lewis Walton, Mark D. Abbey, Kevin Peter Deuel
  • Patent number: 5653806
    Abstract: An apparatus for dispersingly delivering a vapor-phase source reagent material containing a deposition species, to a substrate for deposition of such species thereon. The apparatus includes a disperser housing having a front wall with an array of discharge openings therein for discharging vapor-phase source reagent material from the housing interior volume onto a wafer or other substrate article mounted in vapor-receiving relationship to the disperser housing front wall. The front wall includes interior heat transfer passages arranged in a manifolded conformation for highly efficient temperature stabilization of the vapor discharged from the housing discharge openings, to produce highly uniform thickness deposited films on the substrate.
    Type: Grant
    Filed: March 10, 1995
    Date of Patent: August 5, 1997
    Assignee: Advanced Technology Materials, Inc.
    Inventor: Peter C. Van Buskirk
  • Patent number: 5647542
    Abstract: A system for electrostatic application of conductive coating liquid has a grounded primary supply of conductive coating liquid, an electrostatic spray device and a system for delivering coating liquid from the primary supply to the spray device while maintaining a high voltage at the spray device electrically isolated from the primary supply. The delivery system includes one or more electrical insulation devices, each of which has a cylinder comprising an insulative conduit having a liquid inlet and a liquid outlet. The cylinders of the electrical insulation devices are connected via their inlets and outlets between the primary supply and the spray device to deliver coating liquid from the primary supply to the spray device.
    Type: Grant
    Filed: January 24, 1995
    Date of Patent: July 15, 1997
    Assignee: Binks Manufacturing Company
    Inventor: Michael J. Diana
  • Patent number: 5632817
    Abstract: A dual component mixing system for coating comprises a first tank containing a main agent, a second tank containing a hardening agent diluted with thinner, a mixer which mixes the main agent and the hardening agent and supplies the mixture to a manually operated coating gun, a main agent line connecting the mixer and the first tank, a hardening agent line connecting the mixer and the second tank, a flow meter disposed within the main agent line, a flow meter and a flow regulating valve disposed within the hardening agent line, and a feedback control device which receives signals from the flow meters and controls the flow regulating valve so that the amount of hardening agent is a predetermined ratio with respect to the amount of main agent. The dual component mixing system according to the present invention provides an adequate control of the main agent/hardening agent ratio regardless of the differences among individuals manipulating the coating gun.
    Type: Grant
    Filed: September 6, 1995
    Date of Patent: May 27, 1997
    Assignee: Ransburg Industrial Finishing K.K.
    Inventors: Toshio Hiraga, Masayuki Kuroda, Hidetoshi Kamaru, Youji Murata
  • Patent number: 5601649
    Abstract: Disclosed herein is an apparatus for manufacturing an oxide superconducting film employing laser ablation method. This apparatus has a thin film forming chamber having a laser-transparent laser entrance window, a target being provided in the thin film forming chamber and containing components of an oxide superconductor, a laser beam source for irradiating the target with a laser beam from the exterior of the thin film forming chamber through the laser entrance window, and apparatus for controlling power of the laser beam which is applied to the target for preventing the power of the laser beam, being applied to the target, from reduction by contamination of the entrance window caused by scattered particles. According to the present invention, it is possible to form an oxide superconducting film having high and uniform characteristics even if a long time is required for film formation, thereby attaining a remarkable effect in improvement of superconductivity of a large area oxide superconducting film.
    Type: Grant
    Filed: June 29, 1995
    Date of Patent: February 11, 1997
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Kousou Fujino, Satoshi Takano, Noriyuki Yoshida, Tsukushi Hara, Hideo Ishii
  • Patent number: 5599394
    Abstract: A dispensing apparatus for delivering a silica coating solution in a fixed quantity from a liquid container to a surface of a substrate to form a silica film thereon. The liquid container storing the silica coating solution is connected to a diaphragm pump through a suction pipe. The diaphragm pump is connected to a nozzle through a delivery pipe. The coating solution in the liquid container is supplied to the nozzle by sucking and delivering action of the diaphragm pump. The coating solution is discharged from the nozzle to a surface of a substrate supported by a spin chuck of a spin coating apparatus.
    Type: Grant
    Filed: September 27, 1994
    Date of Patent: February 4, 1997
    Assignee: Dainippon Screen Mfg., Co., Ltd.
    Inventors: Manabu Yabe, Masaru Kitagawa, Takafumi Ohki, Mitsuhiro Fujita
  • Patent number: 5582663
    Abstract: A system for detecting the presence of an object, it shape, length, size, etc., and if a heating material such as a hot melt adhesive applied to the object is applied to given places, or in the proper amount is accomplished by an infrared detection system which is not influenced by external disturbances. A radiant energy detection sensor is placed opposite a radiant energy source, and an object is moved between the radiant energy source and radiant energy detection sensor.
    Type: Grant
    Filed: August 30, 1994
    Date of Patent: December 10, 1996
    Assignee: Nordson Corporation
    Inventor: Masafumi Matsunaga
  • Patent number: 5581335
    Abstract: In accordance with the present invention a toner concentration and temperature sensing apparatus is provided for use with a developer container adapted to retain a quantity of developer material, the developer material including varying concentrations of magnetic carrier material and toner material. The toner sensing apparatus includes a micro controller device for controlling a sensing head to selectively generate a magnetic field within the developer container according to a first set of parameters stored in the micro controller. A preselected portion of the developer material is compressed by the magnetic field and a signal is generated across the sensing device and determining the resistance thereof. The signal across the sensing device varies as a function of the concentration of the toner. The micro controller converts the observed signal into a toner concentration value based on a second set of stored parameters.
    Type: Grant
    Filed: November 4, 1994
    Date of Patent: December 3, 1996
    Assignee: Xerox Corporation
    Inventors: Michael D. Borton, Kevin M. Carolan
  • Patent number: 5557379
    Abstract: A developing device for use in an image forming apparatus comprising a toner hopper containing toner, a developing roller for developing an electrophotographic latent image formed on a surface of a photosensitive member using the toner contained in the toner hopper, a toner feed mechanism for conveying the toner contained in the toner hopper to the developing roller, and a regulator for regulating the conveyance of the toner by the feed mechanism from the toner hopper to the developing roller.
    Type: Grant
    Filed: March 4, 1994
    Date of Patent: September 17, 1996
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Tetsuya Nakamura, Hirotaka Fukuyama
  • Patent number: 5534309
    Abstract: A method of providing particle deposition on a semiconductor wafer or other surface first provides a flow of clean gas into a deposition chamber that purges the chamber prior to introduction of the wafer, and after introduction, continues the flow of clean gas. An aerosol is mixed into the clean gas flow for a desired length of time, so that as the combined flow passes through the deposition chamber particles are deposited on the wafer supported in the chamber. After the deposition has continued for either a desired particle count or a length of time, the flow of aerosol is discontinued, and a clean gas flow sheath is provided over the wafer as it is removed from the chamber. The apparatus carries out this method by providing a source of a clean gas, valves for controlling aerosol introduction into the clean gas, and a support for the wafer in the path of gas introduced into the chamber.
    Type: Grant
    Filed: June 21, 1994
    Date of Patent: July 9, 1996
    Assignee: MSP Corporation
    Inventor: Benjamin Y. H. Liu
  • Patent number: 5521677
    Abstract: A solid area process control for scavengeless development using a transport roll-to-donor roll DC bias as a control parameter in an electrophotographic printing machine is disclosed. The process develops a latent image of a solid area toner patch on a photoconductive belt. Once the patch is developed, the patch is measured with an infrared reflectance type sensor. The measured development mass is compared to a target value stored in the machine memory. A test of the comparison is performed by the process. If the result of the test is less than the target value, the transport roll-to-donor roll bias is increased and the process ends. If the result is more than the target value, the transport roll-to-donor roll bias is decreased and the process ends, otherwise the process stops because the measured development is acceptable. The process is run at predetermined intervals to maintain constant output from the electrophotographic printing machine.
    Type: Grant
    Filed: July 3, 1995
    Date of Patent: May 28, 1996
    Assignee: Xerox Corporation
    Inventors: Grace T. Brewington, Richard P. Germain
  • Patent number: 5512980
    Abstract: Disclosed are a toner empty detecting method of and a toner empty detecting apparatus for detecting an empty state of toners in a toner hopper. The toner empty detecting method comprises: a step of taking in the output of the detecting element with every constant period; a step of comparing a detected value relative to a take-in value with an average value of the detected values during a detection period of last time; a step of counting the number of times when the detected value is smaller than the average value during a detection cycle of this time; and a step of generating a toner empty output when the count value is larger than the predetermined value.
    Type: Grant
    Filed: September 2, 1994
    Date of Patent: April 30, 1996
    Assignee: Fujitsu Limited
    Inventors: Yoshio Yamaguchi, Toshio Tooda
  • Patent number: 5512978
    Abstract: An apparatus for measuring concentrations of a first vapor pressure carrier fluid component and a second vapor, pressure carrier fluid component in a carrier fluid mixture, including a supply vessel for holding the carrier fluid mixture. A light source is provided for transmitting an infrared light source to the carrier fluid mixture. Detector is provided for detecting infrared light intensity transmitted through the carrier fluid mixture, and, in response thereto, determining infrared absorption of carbon hydrogen stretching frequencies of the carrier fluid mixture. And means are provided for calculating concentrations of the first carrier fluid component and the second carrier fluid component in the mixture based on the infrared absorption of carbon hydrogen stretching frequencies of the carrier fluid mixture. This method can also be extended to a mixture of more than two fluids. A means for maintaining a predetermined ratio of the carrier fluids.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: April 30, 1996
    Assignee: Xerox Corporation
    Inventors: Ralph A. Mosher, Rasin Moser, James R. Larson, John S. Berkes
  • Patent number: 5509375
    Abstract: A coating system for detecting the presence of contaminants carried by a fluid that is applied as a coating on a workpiece. A tube guides the fluid along a flow path to the workpiece. A light source illuminates the fluid along at least a portion of the flow path, and this light is scattered by any contaminants present in the fluid. Light scattered by the contaminant particles is more intense than light scattered by the other fluid particles, and this brighter scattered light is detected by a light detector positioned adjacent to the fluid flow path. If one or more contaminant particles is detected in the fluid, a warning signal can be given and/or the flow of fluid can be stopped. This coating system is particularly well suited for use in a spin-on coating process that applies a liquid, such as a photoresist material or a dielectric material, to a semiconductor wafer or other workpiece that is secured to a rotating turntable.
    Type: Grant
    Filed: May 27, 1994
    Date of Patent: April 23, 1996
    Assignee: VLSI Technology, Inc.
    Inventors: Anthony Sayka, Patricia A. Vargas
  • Patent number: 5510149
    Abstract: In the method described, a compound substantially in the form of a paste is fed by means of a pump from a storage container (1) to a metering device (3) which determines the amount of paste to be applied to a workpiece (B). From the metering device, the paste is fed to a spray head (S) where it is mixed with compressed air from a cylinder (4) or other suitable supply and sprayed on to the workpiece (B). The amount of compressed air supplied to the paste for spraying purposes is controlled by means of a control unit (6) in such a way that a strip of substantially constant width is applied to the workpiece (B).
    Type: Grant
    Filed: February 28, 1995
    Date of Patent: April 23, 1996
    Assignee: SCA Schucker GmbH
    Inventor: Josef Schucker
  • Patent number: 5510018
    Abstract: System to re-circulate the treatment material in processes of surface treatment and finishing, which can be employed in association with a pickling and/or acid washing plant (12) or in association with a plant (12) for metal-coating with heat, the plant (12) comprising at least one dip tank (13) containing the treatment material (11), which is caused to circulate advantageously in countercurrent to the material to be treated, which is advantageously strip (14), the treatment material (11) being able to consist of acid baths or molten metal, such as zinc or aluminum, the dip tank (13) comprising a discharge conduit (18) and a feeder conduit (17), the system comprising at least two vessels (16a-16b) which can be hermetically sealed and are of a type resistant to pressure and which are positioned in parallel and associated with the discharge conduit (18) and with the feeder conduit (17), each of the vessels (16a-16b) including an independent inlet closure (20) and an independent outlet closure (19), each of the
    Type: Grant
    Filed: November 23, 1994
    Date of Patent: April 23, 1996
    Assignee: Danieli & C. Officine Meccaniche SpA
    Inventor: Giorgio Rey
  • Patent number: 5506664
    Abstract: A sensor measures the toner applying capability of a toning station. It includes a transparent conductive rotatable member which is rotated through a developer applying zone and a sensing position remote from the developer applying zone. Toner is applied by developer in the station to the exterior surface of the rotatable member as controlled by a bias applied to the rotatable member. The applied toner is sensed by a transmission densitometer at the sensing position. The output can be used to control toner concentration, an original charge on an image member or a development bias applied to the toner station.
    Type: Grant
    Filed: May 5, 1994
    Date of Patent: April 9, 1996
    Assignee: Eastman Kodak Company
    Inventors: James C. Maher, Douglas C. Anderson, Richard A. Weitzel
  • Patent number: 5496592
    Abstract: In controlling an ion implantation unit, a dose of ions is calculated for every lot, and it is determined whether or not the dose D of ions is within an allowable range. When the dose of ions is within the allowable range, the ion implantation unit is operated for the next lot. When the dose of ions is not within the allowable range, the ion implantation unit is stopped.
    Type: Grant
    Filed: December 14, 1994
    Date of Patent: March 5, 1996
    Assignee: NEC Corporation
    Inventor: Yoshiyuki Saito
  • Patent number: RE36534
    Abstract: In the method described, a compound substantially in the form of a paste is fed by means of a pump from a storage container (1) to a metering device (3) which determines the amount of paste to be applied to a workpiece (B). From the metering device, the paste is fed to a spray head (S) where it is .[.mixed with.]. .Iadd.swirled by .Iaddend.compressed air from a cylinder (4) or other suitable supply and sprayed on to the workpiece (B). The amount of compressed air supplied to the paste for spraying purposes is controlled by means of a control unit (6) in such a way that a strip of substantially constant width is applied to the workpiece (B).
    Type: Grant
    Filed: April 22, 1998
    Date of Patent: January 25, 2000
    Assignee: SCA Schucker GmbH
    Inventor: Josef Schucker