Abstract: In manufacturing a thin-film transistor on a glass substrate, a first thin film consisting of an amorphous silicon thin film is formed on the glass substrate, and a second thin film is formed on the first thin film. Then, this second thin film is etched to form a mask pattern. A dopant ion is doped into the first thin film through the mask pattern to form a source region and a drain region. The process of forming the mask pattern and the process of forming the source and drain regions are carried out continuously without exposing the substrate to the atmosphere.

Abstract: The present invention provides an effective barrier layer for improved via fill in high aspect ratio sub-micron apertures at low temperature, particularly at the contact level on a substrate. In one aspect of the invention, a feature is filled by first depositing a barrier layer onto a substrate having high aspect ratio contacts or vias formed thereon. The barrier layer is preferably comprised of Ta, TaNx, W, WNx, or combinations thereof. A CVD conformal metal layer is then deposited over the barrier layer at low temperatures to provide a conformal wetting layer for a PVD metal. Next, a PVD metal layer is deposited onto the previously formed CVD conformal metal layer at a temperature below that of the melting point temperature of the metal to allow flow of the CVD conformal layer and the PVD metal layer into the vias.

Abstract: A wafer flattening system is provided to consecutively and automatically remove the natural oxide film from a wafer and flatten and smooth the wafer so as to improve the surface roughness of the wafer and improve the work efficiency. A step of immersing the wafer in an aqueous solution of hydrofluoric acid of a natural oxide film removing device is performed so as to remove the natural oxide film, then followed by a step of locally etching the surface of the wafer at a local etching apparatus by an activated species gas produced from SF6 gas to flatten the surface. Then, a step of giving a mirror finish to the wafer surface by a CMP apparatus is performed to smooth it.

Abstract: A sub-atmospheric chemical vapor deposition (“SACVD”) system with a bypass from a dopant source to an exhaust system and related methods and devices. The flow of dopant may be established by dumping the dopant flow directly to the foreline of a vacuum exhaust system of an SACVD system, rather than flowing the dopant through the chamber. Establishing the dopant flow in this manner prior to the deposition of a silicon glass film on a substrate allows the initial portion of the silicon glass film to be doped at a higher level. Prior apparatus resulted in a dopant-deficient region of silicon glass formed before the dopant was fully flowing. In one embodiment, a doped silicon glass film is used as a dopant source for a semiconductor material, in another embodiment, a multi-layer doped silicon glass film achieves superior reflow.

Abstract: A method and apparatus for controlling a temperature of a microelectronic substrate. In one embodiment, the apparatus can include a substrate support configured to engage and support the microelectronic substrate. The apparatus can further include a temperature controller having one or more thermal links coupled directly with the substrate when the substrate is supported by the substrate support. The thermal links can maintain thermal contact with the substrate when the substrate is either stationary or mobile relative to the temperature controller. The temperature controller can heat or cool different portions of the substrate at different rates with one or more of several heat transfer devices, including liquid jets, gas jets, resistive electrical elements and/or thermoelectric elements.

Abstract: In an apparatus for coating a surface of at least one lens having pair of opposed major surfaces, al least one lens support is coupled to a frame and is rotatable relative thereto. A lens is releasably mounted to the lens support leaving one of the major lens surfaces exposed. A mounting plate is coupled to the frame and is positioned proximate to the lens support. A series of work stations are carried by the mounting plate for sequentially performing work operations on the exposed major surface of the lens. The lens support is indexable relative to the mounting plate to position the exposed lens surface adjacent to each of the work stations in response to commands issued from a controller.

Abstract: A method and apparatus for depositing a layer having improved film quality at an interface. The method includes the steps of introducing an inert gas into a processing chamber and forming a plasma from the inert gas by applying RF power to the chamber at a selected rate of increase. After RF power has reached full power, a process gas including a reactant gas is introduced to deposit the layer. In a preferred embodiment, the reactant gas is tetraethoxysilane. In another preferred embodiment, the process gas further includes fluorine.

Abstract: A scratch resistant coating application system for a vehicle includes: a pump having an output opening where a first end of a discharging line is connected, the pump storing aqueous emulsion; a feeder having an input opening where a second end of the discharging line is connected and an output opening where a first end of a feeding line is connected, the feeder releasing regulated aqueous emulsion into the feeding line; a sprayer connected to a second end of the feeding line for spraying the aqueous emulsion out to atmosphere; a robot having a robot arm on which the feeder and the sprayer are mounted, the robot arm carrying the sprayer; a visual system mounted on a ceiling of a work area for detecting a vehicle's position; and a central control unit electrically connected to the pump, the feeder, the robot, and the visual system for controlling the pump, the feeder, and the robot on the basis of data from the feeder and the visual system.

Abstract: A can component (3) is coated with a coating material (2) in a manner which involves determining the number of can components to which the coating material is applied, determining the total amount of coating material applied to the can components, and determining, on the basis of the number of can components and the total amount of coating material applied, the average amount of coating material applied to each can component. In this way it is possible to determine whether the correct amount of coating is being applied to the can components.

Abstract: A substrate transfer system is used in an in-line film deposition system. The substrate transfer system is provided with an auxiliary vacuum chamber and a main vacuum chamber. The auxiliary vacuum chamber has a plurality of first substrate cassettes. The main vacuum chamber is communicated with another vacuum chamber through which carriers are transferred along a transport path. The main vacuum chamber has two robots and a plurality of second substrate cassettes arranged in parallel on which the substrates is placed. The second substrate cassettes are arranged between the two robots. The substrates are disk-shaped substrates having center holes. The center holes are utilized as hook parts during a pickup operation. Thereby the method of mounting substrates in the holders of carriers etc. is improved without changing the operating speed of the robots. Therefore the amount of substrates transported per unit time is increased and the processing capacity of the substrate processing system is enhanced.

Abstract: A system and method is provided that facilitates the application of a uniform layer of developer material on a photoresist material layer. The system includes a nozzle adapted to apply a predetermined volume of developer material on a photoresist material layer along a linear path having a length approximately equal to the diameter of the photoresist material layer. A movement system moves the nozzle to a first position offset from a central region of the photoresist material layer for applying a first predetermined volume of developer material to the photoresist material layer while the developer material is spin coated. The movement system also moves the nozzle to a second position offset from the central region for applying a second predetermined volume of developer material to the photoresist material layer while the developer is spin coated. The first position is located on an opposite side of the central region with respect to the second position.

Abstract: Embodiments of the present invention provide a multiple head dispensing system having independently controlled dispensing heads. Each of the dispensing heads may be independently controlled to provide simultaneous, asynchronous operation and to allow dispensing of different materials onto substrates. Independent control of the dispensing heads is accomplished under the control of a controller in conjunction with a plurality of gantry systems, each of which positions one of the multiple dispensing heads over a substrate that is to receive dispensing material. In some embodiments, each gantry system utilizes two drive mechanisms, arranged in parallel, that provide movement of the dispensing head over an x-y plane. Multiple conveyor systems are utilized that allow parallel processing of work products in the dispensing system.

Abstract: The present invention is a conveying unit having a controller for detecting information corresponding to the thickness of each of a plurality of raw substrates, assigning desired identifiers to the raw substrates, storing the identifiers, and causing a conveyor to convey each of the raw substrates or controlling processing conditions for a plurality of processing chambers with the identifiers corresponding to the thickness of each of the raw substrates. Thus, even if one cassette accommodates a plurality of raw substrates, the conveyor can smoothly load the same type of raw substrates to the accommodating cassette and unload them therefrom in a simple structure. The controller sets desired processing conditions for each of the processing portions corresponding to the identifiers.

Abstract: In this impurity eliminating apparatus, a mounting stand on which a wafer is mounted and a casing which confronts the mounting stand are provided in a container. A lower face of the casing consists of. quartz glass. Inside the casing, an irradiating body for irradiating ultraviolet rays toward the wafer on the mounting stand is provided. The casing is full of inactive gas atmosphere supplied from an inactive gas supply pipe. The atmosphere above the wafer is exhausted from one side by an exhauster. Following the treatment by the impurity eliminating apparatus with the above structure, coating treatment with a treatment solution for forming a SOG film is performed. Thus, organic substances on the surface of the wafer is eliminated to form the SOG film.

Abstract: An automated system for electroless metallization of optical glass fibers, includes a plurality of spaced apart plating stations having different solutions for electroless metallization of optical fibers. A motor-driven fiber transport and dipping apparatus is used in the system for shuttling optical glass fibers to the plating stations and immersing the optical glass fibers in the solutions. A programmable controller directs the transport and dipping apparatus to the plating stations in a selected order and at selected time intervals, and directs the apparatus at each of the stations to immerse the fibers into the solutions at a selected entry rate, for a selected duration, and at a selected withdrawal rate.

Abstract: An apparatus and process for limiting residue remaining after the etching of metal in a semiconductor manufacturing process, such as etching back a tungsten layer to form tungsten plugs, by passivating the surface of a wafer with a halogen-containing gas are disclosed. The wafer is exposed to the halogen-containing gas in a chamber before a metal layer is deposited on the wafer. The exposure can occur in the same chamber as the metal deposition, or a different chamber. The wafer can remain in the chamber or be moved to another chamber for etching after exposure and deposition.

Abstract: A pair of left and right dies 12 and 14 are installed on both sides of a transfer path of a web 7 and ejection paths 30 of coating solution are made freely openable and closable by installing rotary valves 37 at insides of the dies 12 and 14 by which when coated portions and uncoated portions are successively formed, intermittent coating can be carried out by swiftly forming these portions.

Abstract: It is difficult to efficiently fabricate optical lenses on which gradation coloring is finely implemented. Gradation coloring is implemented on optical lenses by using an optical lens coloring system having an optical lens holding device for holding an optical lens, a coloring agent discharging device provided with one or a plurality of nozzles for discharging coloring agent for coloring the optical lens, and a relative position control device for controlling a relative position of the optical lens holding device and the coloring agent discharging device. The relative position control device controls the relative position of the optical lens holding device and the coloring agent discharging device such that coloring agent discharged out of the coloring agent discharging device arrives at a predetermined plane substantially from a direction normal to a predetermined plane of an optical lens held by the optical lens holding device.

Abstract: Apparatus for coating a surface of a semiconductor wafer includes at least one treatment module, a handling device that may access each of the treatment modules, and a host controller connected to the handling device and to each of the treatment modules. The treatment modules may include a coating assembly for coating the semiconductor wafer surface and may also include at least one thermal conditioning module. The host controller may control the handling device to move a semiconductor wafer relative to the treatment modules. The treatment modules may be disposed within opposing assemblies and may be removed from the assemblies without disabling the treatment modules remaining within the opposing assemblies.

Abstract: A dispensing system used in a spin coater is provided to transport a solvent to a wafer. The dispensing, system includes a switch valve, a sucking-back valve, a solenoid valve, a speed control unit of the sucking-back valve, and a speed control unit of the switch valve. The switch valve controls a solvent dispensing status. The sucking-back valve receives the solvent from the switch valve and exports the solvent to a wafer. The solenoid valve controls the switch valve and the sucking-back valve. The speed control unit of the switch valve is coupled between the switch valve and the solenoid valve and is used for a control of action speed on the switch valve. The speed control unit of the sucking-back valve is coupled between the switch valve and the sucking-back valve, and is used for a control of action speed of the sucking-back valve by a sufficient delay time of action.

Abstract: A vacuum processing system is provided with a programmable interlock circuit for combining the interlock signals generated by the system into combined interlock signals. The programmable interlock circuit uses a matrix of switches to select which interlocks will be combined to form which combinations. The interlock signals are formed by two lines that are shorted together when the interlock signal is okay and not shorted together when the interlock signal is not okay. When the two lines are shorted together, then they activate a relay to send a signal in a line of relays, each of which is activated by a different interlock signal. The matrix of switches short out the relay switches in order to deselect one interlock input for one interlock output. Each interlock signal is associated with an LED for visual indication of whether the interlock is okay. Likewise, each combined interlock signal is associated with an LED for visual indication of whether the combination of interlocks is okay.

Abstract: The present invention relates in a system and method for handling and processing substrates for magnetic and optical media and other types of substrates, such as wafers and lenses, requiring thin-film coatings. The system includes input and output locks which act as buffers between atmosphere and the high vacuum within the system and a transfer/main chamber which is comprised of a variable number of chamber modules. The system also includes various mechanisms for moving the substrates and the substrate carriers within the system, and components for dealing with the process and environmental requirements.

Abstract: There is provided a process of producing a prepreg in which a sheet-shaped fabric material as a reinforcing substrate is continuously provided, a thermosetting resin as a matrix resin in a molten state is supplied to the substrate, and the resin is heated, which process contains the steps of:(a) a first coating step in which the matrix resin is applied to one surface of the reinforcing substrate using a first die coater, and an amount of the matrix resin to be applied is equal to or larger than an amount of the matrix resin which the reinforcing substrate is able to contain in its total void as much as possible,(b) a first heating step in which the reinforcing substrate having the matrix resin is heated by a first non-contact type heating unit so that the matrix resin is impregnated into the inside of the reinforcing substrate, whereby a laminar composite made of the matrix resin and the reinforcing substrate is obtained,(c) a second coating step in which the matrix resin is further applied to at least one of

Abstract: Liquid-enzyme-dosing device which consists in projecting the enzymatic liquid by injection onto the end product. Dosing is highly accurate, metered by an in-piping positive-displacement flow rate meter. Regulation of dosing is carried out using a motorized microregulation valve. Monitoring of dosing takes place in a microprocessor which combines all the functions of the apparatus.

Abstract: A system for monitoring an electrostatic powder painting process having a conveyor line adaptable for transporting articles to be electrostatically powder painted sequentially through a plurality of zones in the process. For monitoring the usage of powder paint particles, or "powder", applied to the articles, the system senses the weight of the powder in the powder delivery apparatus and displays it in real time as a powder-weight function over a period of time. For monitoring the operation of the conveyor line transporting the articles, the system senses the conveyor line speed and displays it in real time as a line-speed function over a period of time. For monitoring the precleaning-surface activation of the articles, the system senses the pH of the cleaning-surface activation solution and displays it in real time as a pH function over a period of time.

Abstract: Embodiments of the present invention provide a multiple head dispensing system having independently controlled dispensing heads. Each of the dispensing heads may be independently controlled to provide simultaneous, asynchronous operation and to allow dispensing of different materials onto substrates. Independent control of the dispensing heads is accomplished under the control of a controller in conjunction with a plurality of gantry systems, each of which positions one of the multiple dispensing heads over a substrate that is to receive dispensing material. In some embodiments, each gantry system utilizes two drive mechanisms, arranged in parallel, that provide movement of the dispensing head over an x-y plane. Multiple conveyor systems are utilized that allow parallel processing of work products in the dispensing system.

Abstract: A method for manufacturing an optical information recording medium which is usually stable and is not affected by the environmental condition and an apparatus used therefor. The method comprises the steps of placing a substrate and a member comprising a material for a film opposing each other in a vacuum film forming chamber; forming a plasma by glow discharging a gas between the substrate and the member comprising a material for a film; and supplying a gas mixture containing water to the film forming chamber before forming films or during forming films of the protective layer by the film forming method in which the material for a film freed from the member comprising a material for a film by using the plasma as an energy source are attached or deposited on the substrate.

Abstract: An apparatus is provided for coating a surface of a plate-like material, or substrate, specifically a semiconductor wafer, with a coating material. The apparatus includes a plurality of self-controlled removable modules including a coating assembly, at least one thermal conditioning module, and a substrate handling device, and a host controller. The coating assembly is used to dispense coating material from a coating source onto the surface of the substrate material positioned in the coating assembly. The material handling device is positioned to access and move substrates between the coating assembly, the at least one thermal conditioning module and other modules included in the apparatus. The host controller provides substrate thermal conditioning, coating and handling information to the corresponding modules and tracks the location of each substrate in the apparatus.

Abstract: In a duplex type coating apparatus, a left-right pair of dies and are disposed on opposite sides of a carrying path of a web, the dies and are each made up of an upper member and a lower member, a tip part of the lower member projects further toward the carrying path than a tip part of the upper member, and coating liquid discharge passages are inclined in the direction of the carrying path of the web. As a result, because the same amount of coating liquid is discharged from each of the dies and coated onto each side of the web, it is possible to carry out coating at the same coating thickness and in the same position on both sides of the web.

Abstract: The invention relates to a method and apparatus for improving properties of a solid material by providing shock waves therethrough. Laser shock processing is used to provide the shock waves. The method includes applying a water based coating to a portion of the surface of the solid material and then applying a transparent overlay to the coated portion of the solid material. A pulse of coherent laser energy is directed to the coated portion of the solid material to create a shock wave. A high speed jet of fluid is directed to coated portion of the solid material at times to remove the coating from the solid material. Additionally, the method may include directing a high speed jet of fluid to the surface of the solid material to dry the solid material.

Abstract: An apparatus for supplying a treating material to a treating device has a tank containing a liquid treating material and a heat exchanger formed by a spiral pipe and provided in the tank. A nitrogen gas (N.sub.2 gas) is introduced into the tank and evaporates the liquid treating material. Water is supplied from a fluid inlet pipe connected to the lower portion of the exchanger to a fluid outlet pipe connected to the upper portion of the exchanger through the spiral pipe of the exchanger. In the heat exchange, heat exchange between the water and the liquid treating material is performed very efficiently. No use of electric power provides high safety. The temperature of the liquid treating material which is changed into a gas state by a bubbling process is controlled efficiently and the density of the vaporized treating material in the tank is made stable.

Abstract: A coater incorporates a die, a reservoir, a gravure cylinder, and a doctor blade for applying coating fluid to a moving surface. The flow rate of coating fluid to the gravure cylinder is controlled to equal the rate at which coating fluid is consumed by the coating process. This eliminates the need to recycle surplus coating fluid. The coating fluid can be quickly and conveniently replaced with a solvent in the reservoir when coating is not being performed to reduce the occurrence of coating defects arising from excessive evaporation of solvent and premature solidification of coating fluid.

Abstract: A system for coating a photoresist on a semiconductor wafer includes a loading/unloading unit and a process unit. A convey path is arranged in the process unit, and an adhesion process section, a pre-bake section, a cooling section, a resist coating section, and a cover film coating section are arranged along the convey path. The adhesion process section, the pre-bake section, and the cover film coating section are arranged in individual process chambers, while the cooling section and the resist coating section are arranged in a common main process chamber. A convey robot is disposed to be movable along the convey path, and a substrate is conveyed among the process chambers by the convey robot. A convey member is arranged in and dedicated to the main process chamber, and the substrate is conveyed from the cooling section to the-resist coating section by the convey member.

Abstract: The 3-D Model Maker of the present invention is a device that builds three dimensional models of computer generated (e.g., CAD) structures by vector plotting layer-upon-layer applications of solidifiable substances. The layers are formed by expelling minuscule beads of the substances in liquid or flowable phase onto a platform from one or more jets, the jets and platform being relatively movable in X, Y and Z coordinate system. The beads are deposited along vectors, during X/Y relative movement, on the stage, one at a time, layer-upon-layer, to build the model. The jets and platform are moved relatively to one another in accordance with instructions from the computer (controller) to form each layer in the X-Y plane (in a manner analogous to an X-Y vector plotter) and either the stage or the jets may move in the Z direction to allow the jets to form subsequent layers.

Abstract: There is disclosed a method and apparatus for coating an electromagnetic coil, particularly stator coils for an electric motor, with an insulating catalyzed resin material. The catalyzed resin material is a two component material comprising an epoxy resin and a catalyst. The catalyzed resin material is a free flowing liquid at a first temperature and begins to cure rapidly at a second elevated temperature. The stator coils are first heated by supplying current to the stator coils to raise the temperature of the stator coils to the first temperature. The free flowing liquid catalyzed resin material is dispensed through nozzles onto the stator coils as the stator coils and the nozzles move relative to each other. After the liquid catalyzed resin material has been dispensed in a predetermined amount, at predetermined locations, for predetermined times, the catalyzed resin material is allowed to penetrate the stator coils.

Abstract: A cleaning apparatus for removing foreign matters from workpieces in the form of strips or sheets cut from a larger blank, before the workpiece is subjected to a press forming operation, which apparatus includes a feeding device for feeding the successive workpieces, de-oiling rolls disposed in an upstream portion of a feed path of the workpieces as seen in a feeding direction and rotated in pressing rolling contact with the surfaces of each workpiece as each workpiece is fed, so as to remove by absorption oily substances from the surfaces of the workpiece, and tacky rolls disposed downstream of the de-oiling rolls as seen in the feeding direction and rotated in pressing rolling contact with the surfaces of the workpiece, so as to remove by tackiness thereof the foreign matters from the surfaces of the workpiece.

Abstract: A slider is associated with a carrier for transferring a vehicle body through a magnet and an air cylinder. An amount or a distance of movement of the slider transferred together with movement of the carrier is detected with a rotary encoder and it is computed as an amount or a distance of movement of the carrier. When the carrier is transferred in a predetermined amount or distance, an image of the vehicle body is fetched by an investigating robot. The fetching does not undergo any adverse influence due to a deviation of the position of the investigating robot relative to the position of the carrier.

Abstract: A surface of a 3-D object is digitized automatically and stored in a memory. Based on the signal representation of the 3-D object areas of the surface are defined for color and boundaries. Coatings application paths are defined within each area and various parameters for applying coatings for each point in each path are also defined including spray pattern, amount of coatings to be applied, speed of application along the path, among others; for each area, the points of the selected path are correlated with the angle of attack, spray pattern, amount of coatings and speed. A set of programmed instructions are compiled for execution in a general purpose computer. An assembly line of objects to be painted may then be set up and the retrieved instructions executed.

Abstract: The invention relates to a device and a method for manufacturing a mould for a disc-shaped registration carrier, said device being provided with a station for applying a photosensitive layer, such as a photoresist layer, to a substrate, with a station for exposing said photosensitive layer in accordance with the registration data to be stored, with a station for developing the photosensitive layer and metallizing the side of the substrate carrying the developed photoresist layer, and with a station for applying a metal coating, wherein the various stations are accommodated in a housing and means for receiving the substrates are provided in the various stations, whilst a transport mechanism disposed within the housing is provided with at least one transport means for gripping a substrate, which transport means is movable in a horizontal plane in two directions including an angle with each other, and which is also capable of moving upward and downward within the housing.

Abstract: Plating cups 2 each hold therein respective semiconductor substrates to be plated. The temperatures of the plating solution in the plating cups are controlled at optimum levels by controlling the operations of heaters 13 and 16, based on the temperature of the plating cups as measured by thermometers 5 mounted on the plating cups 2. Metal ion concentration in the solution and the pH level and specific gravity of the solution are measured by an atomic absorption spectrometer 17, a pH gauge 18, and a gravimeter 19, respectively, for determining necessary amount of replenishing metal ions and solution from a solution level regulator 21, thereby maintaining the relevant parameters of the solution within a permissible range.

Abstract: A dip coat process material handling system and method for coating multiple layers of material on a plurality of workpieces, in particular for producing a multi-layer optical photoconductive drum, wherein a plurality of pipes are suspended from a carrier pallet which transports the workpieces through a dip coat cell housing various dip coating stations. The system includes a load/unload station, vertical and horizontal transport systems for transporting the carrier pallet having workpieces loaded thereon to the various dip coating stations, a drying/cooling booth, and a return conveyor system. The invention allows complete dip coat processing to be completed in an in-line configuration while the workpieces are attached to the carrier pallet, thereby eliminating load/unload steps at each dip coating station to provide efficient and flexible processing of materials.

Abstract: An equipment for discharging treated articles from a barrel in a surface treatment system includes: a carriage movable between a discharging position and a charging position; a water tank supported at the discharging position for vertical movements; and a receiver set at the discharging position above the water tank. The carriage device includes a rotating mechanism for rotating the barrel in water in the tank at the discharging position to discharge the articles from the barrel onto the receiver; a cover operating mechanism for removing a cover from an aperture of the barrel at the discharging position and put it on the aperture at the charging position.

Abstract: A coating material dispensing system comprises a hazardous area and a non-hazardous area. Multiple coating material type controls have coating material input ports, coating material output ports, and control ports for controlling the passage of a type of coating material controlled by each respective coating material type control from its input port to its output port. A controller generates control signals for controlling the multiple coating material type controls. The control signals are multiplexed in the non-hazardous area, and transmitted into the hazardous area where they are demultiplexed and provided to the coating material type controls. The demultiplexer and coating material type controls are intrinsically safe.

Abstract: Material is uniformly applied to the entire outer peripheral surface of a rotating object by using a robot. The material is discharged toward the rotating object from a nozzle (2) of a material discharging device mounted on the distal end of a robot arm, with the nozzle moved along the outer peripheral surface of the object, e.g., a truncated cone (1), rotating at a predetermined speed. A robot control device periodically calculates coordinates (x, R, 0) in a work coordinate system (P5-XwYwZw), including a target moving position (x) of the nozzle in the direction of the rotation axis and a corresponding target nozzle moving position (R) in the radial direction which are individually expressed as a function of the time elapsed after the start of the material applying process (S12). These coordinates are converted to a robot-base coordinate system (OB-XBYBZB) (S14) and converts the result to data for respective robot axes (S15).

Abstract: An apparatus applies glue to closure stamps for insertion onto packages, such as cigarette packs. A pair of rotatable glue-applying wheels receive glue from a glue pot and transfer the glue onto the backs of the closure stamps as the closure stamps are fed therepast. A portion of the peripheral edge of each glue-applying wheel is recessed radially inwardly, to define an interruption in an outer diameter of the peripheral edge, so that only a non-recessed portion of the outer edge transfers glue to the closure stamps. In this way, opposite ends of the glue lines are spaced from leading and trailing edges of the closure stamp. A synchronizing mechanism is provided to achieve a proper synchronization between the stamp-feeding mechanism and the glue-applying wheels to ensure that the glue lines are kept spaced from the leading and trailing ends of the closure stamp.

Abstract: An apparatus for application of material to the external diameters of cylindrical items of manufacture. The apparatus includes a frame, a transport system having work stations supporting the items, an application system, and a curing system for curing the material applied to the cylindrical items. The application system includes first and second horizontally, axially spaced application rolls engagable with the items external diameter, and an adjustable reservoir system for supplying a desired thickness of material to be applied to the external diameter of the item.

Abstract: Plastic ophthalmic lenses are coated with a scratch-resistant coating using a spin coating process. The lenses are separated from lens mold pieces, and the lenses are routed through a coating system where the lens coating in applied. A conveyor moves the lens mold pieces toward an inspection station while the corresponding lenses are moving through the coating system. The operation of the lens coating system and the conveyor are coordinated so that the coated lens and the lens mold pieces from which that lens was made are delivered as a group to the inspection station.

Abstract: An apparatus and a method for forming a three-dimensional article with thermosetting material on the basis of a three-dimensional information on the article by means of an ink jet method. The material is jetted from at least one ink jet head to a stage and laminated thereon. The laminated material is supplied with heat by a heat source so that it is cured. In this process, a jetting direction of the material from the ink jet head to the stage and/or a jetting amount of the material jetted from the ink jet head is changed in accordance with the information by a control unit, thereby forming a solid article having a desired three-dimensional shape.

Abstract: A painting system for an automobile for washing an automobile using a plurality of robots comprises a plurality of washing apparatus disposed in the proximity of robots for individually washing the robots. The robots operate in accordance with a program taught in advance and is automatically washed by the washing apparatus after a suitable interval of time.

Abstract: Disclosed is a coating apparatus, comprising a gas exhaust rate controller disposed within an exhaust pipe connected to a cup which houses a substance to be treated, and a branch pipe connected to the exhaust pipe. The flow speed of the fluid within the branch pipe is measured, and the driving of the exhaust rate controller is controlled based on the measured value of the flow speed in accordance with the state of treatment of the object to be treated.