Running Length Work Patents (Class 118/718)
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Patent number: 8900365Abstract: Disclosed is a deposition apparatus for depositing a specific substance on an elongate substrate such as an elongate strip of tape or film. The apparatus includes a vacuum chamber, supply reel and the for reel for supplying elongate substrate in rolled form, a drum, disposed in the vacuum chamber, the drum having a helically-shaped guide groove formed along an outer surface of the drum for receiving the elongate substrate supplied from the supply reel to be wound in the guide groove and to subsequently feed the elongate substrate to a retreat reel to wind thereon upon rotation of the drum, and a deposition source material for depositing a material onto a surface of the elongate substrate which is wound on the drum.Type: GrantFiled: August 6, 2007Date of Patent: December 2, 2014Assignee: Korea Electrotechnology Research InstituteInventors: Hong Soo Ha, Sang Soo Oh, Dong Woo Ha, Kyu Jung Song, Rock Kil Ko, Ho Sup Kim
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Patent number: 8900368Abstract: The invention relates to a device and a method for continuous chemical vapor deposition under atmospheric pressure on substrates. The device is hereby based on a reaction chamber, along the open sides of which the substrates are guided, as a result of which the corresponding coatings can be effected on the side of the substrates which is orientated towards the chamber interior.Type: GrantFiled: September 22, 2006Date of Patent: December 2, 2014Assignee: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung E.V.Inventors: Stefan Reber, Albert Hurrle, Norbert Schillinger
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Patent number: 8895100Abstract: A method for manufacturing a compound film comprising a substrate and at least one additional layer is disclosed. The method comprising the steps of depositing at least two chemical elements on the substrate and/or on the at least one additional layer using depositions sources, maintaining depositing of the at least two chemical elements while the substrate and the deposition sources are being moved relative to each other, measuring the compound film properties, particularly being compound film thickness, compound-film overall composition, and compound-film composition in one or several positions of the compound film, comparing the predefined values for the compound film properties to the measured compound film properties, and adjusting the deposition of the at least two chemical elements in case the measured compound film properties do not match the predefined compound film properties.Type: GrantFiled: September 12, 2007Date of Patent: November 25, 2014Assignee: FLISOM AGInventors: Dominik Rudmann, Marc Kaelin, Thomas Studer, Felix Budde
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Publication number: 20140331931Abstract: Disclosed are an inline chemical vapor deposition method and system for fabricating a device. The method includes transporting a web or discrete substrate through a deposition chamber having a plurality of deposition modules. A buffer layer, a window layer and a transparent conductive layer are deposited onto the substrate during passage through a first deposition module, a second deposition module and a third deposition module, respectively. Advantageously, the steps for generating the buffer layer, window layer and transparent conductive layer are performed sequentially in a common vacuum environment of a single deposition chamber and the use of a conventional chemical bath deposition process to deposit the buffer layer is eliminated. The method is suitable for the manufacture of different types of devices including various types of solar cells such as copper indium gallium diselenide solar cells.Type: ApplicationFiled: August 6, 2014Publication date: November 13, 2014Inventors: Piero Sferlazzo, Thomas Michael Lampros
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Patent number: 8882918Abstract: A vapor deposition apparatus (50) includes: a mask unit (54) including a vapor deposition source (70), a vapor deposition mask (60), and a mask holding member (80); a substrate holder (52); and at least either a mask unit moving mechanism (55) or a substrate moving mechanism (53), with a roller (83) provided in a surface of one of (A) the substrate holder (52) and (B) the mask holding member (80) which faces the other one of (A) the substrate holder (52) and (B) the mask holding member (80).Type: GrantFiled: September 26, 2011Date of Patent: November 11, 2014Assignee: Sharp Kabushiki KaishaInventors: Shinichi Kawato, Satoshi Inoue, Tohru Sonoda
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Publication number: 20140318452Abstract: This disclosure describes a module web coating system and components thereof including a more uniform atmospheric control pumping mechanism and gas curtain separation system. A modular web coating system may include an unwind module, any number of process modules, and a rewind module. The process modules are interchangeable and independently operable. In addition, this disclosure describes a more uniform pumping system in which process gas is removed from multiple locations or slits spaced around a process chamber and, in an example, around a process device such as a deposition source. The gas curtain system utilizes a zone between process chambers into which separation gas is injected. Gas from the chambers is continuously removed thereby operating the chambers under negative pressure and preventing process gas from one chamber bleeding into an adjacent chamber.Type: ApplicationFiled: November 29, 2012Publication date: October 30, 2014Inventors: Michael Wayne Stowell, JR., Garrett Scott Kato
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Publication number: 20140322455Abstract: The present invention relates to a method of preparing a material having a superhydrophobic region and a hydrophobic region, and more particularly to a method of preparing a material having a superhydrophobic region and a hydrophobic region by preparing a superhydrophobic surface body and hydrolyzing one surface of the prepared superhydrophobic surface body using a strong base. The preparation method according to the invention is simpler than conventional preparation methods and is capable of preparing a material having opposite surface characteristics at low costs.Type: ApplicationFiled: April 23, 2014Publication date: October 30, 2014Applicant: Korea Advanced Institute of Science and TechnologyInventors: Sung Gap IM, Jae Bem YOU, Youngmin YOO, Myung Seok OH
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Publication number: 20140311409Abstract: A roller-type continuous vapor deposition film-forming apparatus for a substrate that is to be conveyed at high speed, comprising a plasma pretreatment device and a film-forming apparatus provided in series, wherein a substrate conveying compartment 12A, a pretreatment compartment 12B and film formation compartment 12C are formed inside a chamber 3; and a substrate S is wound from an unwinding roller 13 onto a plasma pretreatment roller 20 and film formation roller 25, which are provided in series, via guide rollers 14a-14d, and is taken up by a take-up roller 15.Type: ApplicationFiled: December 27, 2012Publication date: October 23, 2014Applicant: Dai Nippon Printing Co., Ltd.Inventors: Tatsuo Asuma, Shigeki Matsui, Teruhisa Komuro
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Patent number: 8852343Abstract: Apparatus for vapor phase growing of crystals having a single multi-zone heater arranged to heat a heated zone to give a predetermined temperature profile along the length of the heated zone. A generally U-shaped tube having a first limb, a second limb, and a linkage connecting the first and second limbs is located on the heated zone. The first limb contains a source material. The second limb supports a seed such that the source material and seed are spaced longitudinally within the heated zone to provide a predetermined temperature differential between the source and seed. The crystal is grown on the seed.Type: GrantFiled: May 16, 2008Date of Patent: October 7, 2014Assignee: Kromek LimitedInventors: Arnab Basu, Ben Cantwell, Max Robinson
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Patent number: 8840752Abstract: Disclosed are a flow path switching apparatus and a fluid processing apparatus having a liquid processing unit that performs a processing by supplying different kinds of processing fluid to wafer W at different timings. The atmosphere of the liquid processing unit is discharged fluid to a plurality of exclusive exhaust paths through exhaust paths and flow path switching units. A flow path switching unit includes an outer tube having a plurality of connection holes and a rotary tube inserted into the outer tube having a plurality of openings. In particular, one of the plurality of openings of the rotary tube is aligned with one of the plurality of connection holes of the outer tube in such a way that only an aligned set of an opening of the rotary tube and a connection hole of the outer tube is sequentially communicated during the rotation of the rotary tube.Type: GrantFiled: June 15, 2011Date of Patent: September 23, 2014Assignee: Tokyo Electron LimitedInventors: Nobuhiro Ogata, Shuichi Nagamine, Kenji Kiyota
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Patent number: 8821638Abstract: Provided is a continuous deposition apparatus wherein replacement operations of a feeding unit and a take-up unit are easily performed. The continuous deposition apparatus is provided with: a vacuum chamber (1); a deposition roller (2); evaporation sources (7L1, 7L2, 7R) which supply a deposition material to a film substrate from the side of the film substrate which is wound on the deposition roller and on which a coating is to be deposited; a feeding unit (3) which supplies the film substrate to the deposition roller (2); and a take-up unit (4) which takes up the film substrate after the coating is deposited thereon.Type: GrantFiled: August 21, 2009Date of Patent: September 2, 2014Assignee: Kobe Steel, Ltd.Inventors: Hiroshi Tamagaki, Toshiki Segawa
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Patent number: 8808793Abstract: A method comprising introducing a workpiece support into a chamber of an apparatus. The workpiece support is for supporting thereon a plurality of workpieces. The apparatus comprising: the chamber having an interior space configured to be maintained at a pressure below atmospheric pressure; a vapor source for supplying the interior space of the chamber with a linearly extending stream of lubricant vapor; the workpiece support for supporting thereon a plurality of workpieces with surfaces facing the vapor source; and a conveyor for continuously moving the workpiece support transversely past the linearly extending stream of lubricant vapor from the vapor source. The method also comprising continuously moving the workpiece support with the plurality of workpieces supported thereon transversely past the linearly extending stream of lubricant vapor from the vapor source and depositing a uniform thickness film of the lubricant on at least one surface of each of the plurality of workpieces.Type: GrantFiled: October 15, 2010Date of Patent: August 19, 2014Assignee: Seagate Technology LLCInventor: Paul Stephen McLeod
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Patent number: 8795769Abstract: A method and apparatus for coating and baking and deposition of surfaces on glass substrate or flexible substrate, such as films and thin glass sheets or other similar work pieces as it transitions thru and between small gaps of aero-static or hydro-static porous media bearings and differentially pumped vacuum grooves, in a non-contact manner, in order to process within a vacuum environment. The process is also intended to incorporate simultaneous and immediately sequential ordering of various processes.Type: GrantFiled: August 2, 2006Date of Patent: August 5, 2014Assignee: New Way Machine Components, Inc.Inventor: Andrew J. Devitt
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Publication number: 20140212583Abstract: The invention relates to a method for continuous coating of substrates, in which the substrates are transported continuously through a deposition chamber and, at the same time, measures are adopted for reducing parasitic deposits as well as possible. Likewise, the invention relates to a corresponding device for continuous coating of substrates.Type: ApplicationFiled: July 9, 2012Publication date: July 31, 2014Applicant: Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.Inventors: Stefan Reber, Norbert Schillinger, David Pocza, Martin Arnold
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Publication number: 20140208565Abstract: An apparatus for coating a thin film on a flexible substrate is described. The apparatus includes a coating drum having an outer surface for guiding the flexible substrate through a first vacuum processing region and at least one second vacuum processing region, a gas separation unit for separating the first vacuum processing region and at least one second vacuum processing region and adapted to form a slit through which the flexible substrate can pass between the outer surface of the coating drum and the gas separation unit, wherein the gas separation unit is adapted to control fluid communication between the first processing region and the second processing region by adjusting the position of the gas separation unit.Type: ApplicationFiled: April 26, 2013Publication date: July 31, 2014Applicant: APPLIED MATERIALS, INC.Inventors: Hans-Georg LOTZ, Neil MORRISON, Jose Manuel DIEGUEZ-CAMPO, Heike LANDGRAF, Tobias STOLLEY, Stefan HEIN, Florian RIES, Wolfgang BUSCHBECK
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Publication number: 20140212600Abstract: An apparatus includes a substrate support having an outer surface for guiding the substrate through a first vacuum processing region and at least one second vacuum processing region. First and second deposition sources correspond to the first processing region and at least one second deposition source corresponds to the at least one second vacuum processing region, wherein at least the first deposition source includes an electrode having a surface that opposes the substrate support. A processing gas inlet and a processing gas outlet are arranged at opposing sides of the surface of the electrode. At least one separation gas inlet how one or more openings, wherein the one or more openings are at least provided at one of opposing sides of the electrode surface such that the processing gas inlet and/or the processing gas outlet are provided between the one or more openings and the surface of the electrode.Type: ApplicationFiled: April 26, 2013Publication date: July 31, 2014Applicant: APPLIED MATERIALS, INC.Inventors: Morrison NEIL, Jose Manuel DIEGUEZ-CAMPO, Heike LANDGRAF, Tobias STOLLEY, Stefan HEIN, Florian RIES, Wolfgang BUSCHBECK
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Patent number: 8778080Abstract: Disclosed is an atmospheric-pressure double-plasma graft polymerization apparatus. The apparatus includes a workbench, an initial roller of a roll-to-roll device, an atmospheric-pressure plasma activation device, a peroxide formation device, a coating and grafting device, a drying device, a graft polymerization and curing device, a curing device and a final roller of a roll-to-roll device. The devices are sequentially provided on the workbench.Type: GrantFiled: May 21, 2008Date of Patent: July 15, 2014Assignee: Institute of Nuclear Energy Research, Atomic Energy CouncilInventors: Mien-Win Wu, Tien-Hsiang Hsueh, Cheng-Chang Hsieh, Chi-fong Ai
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Patent number: 8771419Abstract: An evaporation tool for forming a dopant structure on a front surface of a continuous workpiece, wherein the front surface includes a precursor layer to form Group IBIIIAVIA absorbers for solar cells and the dopant structure is used to introduce dopants into the precursor layer. The tool includes at least a first vapor source station to deposit a Group VIA material, such as Se, and a second vapor station to deposit a dopant material, such as Na, onto the continuous workpiece. A moving assembly of the tool holds and moves the continuous workpiece within the tool by feeding the continuous workpiece from a first end and taking up from a second end of the tool. A support assembly of the tool contacts a back surface of the continuous workpiece to remove the heat from and apply tension to the continuous workpiece during the process.Type: GrantFiled: October 5, 2007Date of Patent: July 8, 2014Assignee: Solopower Systems, Inc.Inventors: Mustafa Pinarbasi, Bulent M. Basol
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Publication number: 20140186527Abstract: The invention relates first to a device for processing a strip-type substrate (1), in particular by coating, in a processing chamber (2), using a processing roller (3) mounted to rotate about an axis of rotation (18) in the processing chamber (2), such that the substrate (1), which is unwound from a first coil (6) with which it is in contact in a helical pattern is processed continuously, wherein the processed, in particular coated, substrate (1) is wound onto a second coil (7), wherein a gas inlet/outlet device (8, 9, 10) is provided for generating a gas stream (11, 12) directed essentially in parallel to the axis of rotation (18). In addition, the invention relates to a method for coating a strip-type substrate (1) in a device.Type: ApplicationFiled: November 26, 2013Publication date: July 3, 2014Applicant: AIXTRON SEInventors: Kenneth B.K. Teo, Nalin Rupesinghe
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Publication number: 20140178568Abstract: An apparatus for passivating a coating of a flexible substrate includes a coating chamber for coating the flexible substrate, a chamber separation element, the chamber separation element being arranged for separating the coating chamber from a further chamber, a coating drum, the coating drum and the chamber separation element forming a gap, and a gas inlet, the gas inlet being arranged within the chamber separation element for supplying oxygen into the gap.Type: ApplicationFiled: April 29, 2011Publication date: June 26, 2014Applicant: APPLIED MATERIALS, INC.Inventors: Alexander Wolff, Gerd Hoffmann
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Publication number: 20140174349Abstract: Improved methods and apparatus for forming thin-film layers of semiconductor material absorber layers on a substrate web. According to the present teachings, a semiconductor layer may be formed in a multi-zone process whereby various layers are deposited sequentially onto a moving substrate web. At least one layer is deposited from a mixed gallium indium source.Type: ApplicationFiled: February 28, 2014Publication date: June 26, 2014Applicant: Global Solar Energy, Inc.Inventors: Jeffrey S. BRITT, Scott WIEDEMAN
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Patent number: 8758512Abstract: A vapor deposition reactor and a method for forming a thin film. The vapor deposition reactor includes at least one first injection portion for injecting a reacting material to a recess in a first portion of the vapor deposition reactor. A second portion is connected to the first space and has a recess connected to the recess of the first portion. The recess of the second portion is maintained to have pressure lower than the pressure in the first space. A third portion is connected to the second space, and an exhaust portion is connected to the third space.Type: GrantFiled: June 4, 2010Date of Patent: June 24, 2014Assignee: Veeco ALD Inc.Inventor: Sang In Lee
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Patent number: 8758513Abstract: A processing apparatus includes a loading chamber; a buffer chamber connected to the loading chamber; a first process chamber connected to the buffer chamber; and an unloading chamber connected to the first process chamber, wherein a processing path through the processing apparatus is a forward in-line path in a direction through the loading chamber, the buffer chamber, the first process chamber, and the unloading chamber.Type: GrantFiled: December 15, 2006Date of Patent: June 24, 2014Assignees: LG Display Co., Ltd., Avaco Co., Ltd., LG Electronics Inc.Inventors: Jin Seok Lee, Hyuk Sang Yoon, Hwan Kyu Yoo, Byeong Eok Hwang
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Publication number: 20140166990Abstract: A method of forming microelectronic systems on a flexible substrate includes depositing a plurality of layers on one side of the flexible substrate. Each of the plurality of layers is deposited from one of a plurality of sources. A vertical projection of a perimeter of each one of the plurality of sources does not intersect the flexible substrate. The flexible substrate is in motion during the depositing the plurality of layers via a roll to roll feed and retrieval system.Type: ApplicationFiled: December 17, 2012Publication date: June 19, 2014Applicant: UNIVERSAL DISPLAY CORPORATIONInventors: Ruiqing Ma, Jeff Silvernail, Prashant Mandlik, Julia J. Brown, John Felts
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Patent number: 8726829Abstract: A chemical bath deposition apparatus is presented to prepare different thin films on continuous flexible substrates in roll-to-roll processes. In particular, they are useful to deposit CdS or ZnS buffer layers in manufacture of thin film solar cells. This apparatus deposits thin films onto vertically travelling continuous flexible workpieces delivered by a roll-to-roll system. The thin films are deposited with continuously spraying the reaction solutions from their freshly mixed styles to gradually aged forms until the designed thickness is obtained. The substrates and the solutions are heated to a reaction temperature. During the deposition processes, the front surfaces of the flexible substrates are totally covered with the sprayed solutions but the substrate backsides are remained dry. The reaction ambience inside the reactor can be isolated from the outside atmosphere. The apparatus is designed to generate a minimum amount of waste solutions for chemical treatments.Type: GrantFiled: June 7, 2011Date of Patent: May 20, 2014Inventor: Jiaxiong Wang
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Publication number: 20140134762Abstract: Provided are a method and an apparatus for manufacturing an organic EL device which enable deposition of a vaporized material onto a substrate in a desired pattern, while eliminating the need for a conventional strip-shaped shadow mask. A shielding portion is configured to be switchable between a shield position where the shielding portion is arranged between an evaporation source and a substrate so as to shield the substrate and a shield release position where the shielding portion is withdrawn from between the evaporation source and the substrate so as to release the shielding of the substrate. The shielding portion is moved in a transportation direction at the same speed as the substrate when the shielding portion is located at the shield position, whereas the shielding portion is moved in a direction opposite to the transportation direction when the shielding portion is located at the shield release position.Type: ApplicationFiled: December 10, 2012Publication date: May 15, 2014Inventors: Ryohei Kakiuchi, Satoru Yamamoto, Kanako Hida
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Patent number: 8702999Abstract: Method and plasma treatment apparatus for treatment of a substrate surface (1) using an atmospheric pressure plasma. An atmospheric pressure plasma is provided in a treatment space (5) between a first electrode (2) and a second electrode (3). Furthermore, a substrate (1) and a mask web (7) in contact with the substrate (1) are provided. A plasma generating power is applied to the first and second electrode (2, 3) for treatment of surface areas of the substrate (1) exposed by the mask web (7), in which the substrate (1) and mask web (7) are moved synchronously through the treatment space (5).Type: GrantFiled: January 29, 2009Date of Patent: April 22, 2014Assignee: FujiFilm Manufacturing Europe B.V.Inventors: Bruno Alexander Korngold, Hindrik Willem de Vries, Eugen Aldea
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Patent number: 8685166Abstract: Provided is an apparatus for continuously fabricating superconducting tapes. An evaporation using drum in dual chamber (EDDC) method is suitable for mass production of high-temperature superconducting tapes. However, the EDDC method is limited to fabrication of high-temperature superconducting tapes having a limited length. In an attempt, high-temperature super-conducting tapes having a sufficiently large length can be fabricated using the EDDC method by releasing a long high-temperature superconducting tape from one reel and winding the long high-temperature superconducting tape around the other reel. In this case, it is important to stably move a high-temperature superconducting tape spirally wound around a drum from one reel to the other reel. Therefore, the provided apparatus uses endless tract belts separately disposed around a drum to stably and continuously move a high-temperature superconducting tape spirally wound around the drum along the centerline of the drum from one reel to the other reel.Type: GrantFiled: March 7, 2008Date of Patent: April 1, 2014Assignees: Korea Advanced Institute of Science and Technology, Sunam Co., Ltd.Inventors: Do-Jun Youm, Ja-Eun Yoo, Byoung-Su Lee, Sang-Moo Lee, Ye-Hyun Jung, Jae-Young Lee
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Publication number: 20140087161Abstract: The present invention relates to an apparatus for manufacturing an adhesive-free gas barrier film comprising conveying means for conveying a film web; at least one first lock system for introducing the film web into a coating chamber of the apparatus; at least one first coating means by means of which the film web can be at least partially coated by depositing a barrier material in the coating chamber; and optionally at least one second lock system for expelling the film web out of the coating chamber; and at least one second coating means by means of which the coated film web can be at least partially coated by extrusion of a plastic melt.Type: ApplicationFiled: September 16, 2013Publication date: March 27, 2014Applicant: Fresenius Medical Care Deutschland GmbHInventors: Dietmar HANSEL, Klaus HEILMANN, Thomas SCHULTE, Tobias PFEIL, Bjoern BREITER
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Patent number: 8673078Abstract: A take-up vacuum processing apparatus includes a chamber, a roller-shaped first electrode rotatably disposed within the chamber, a gas supply unit including a second electrode, and a third electrode. The first electrode causes the flexible processing target to travel by rotating. The third electrode is connected to an alternating-current source and does not contact the first electrode. An alternating-current voltage of the alternating-current source is applied between the third electrode and the first electrode. The chamber includes a divider plate for separating the chamber into a first room in which the second electrode is arranged and a second room in which the third electrode is arranged. Pressures of the first and second rooms are individually adjusted, such that plasma can be generated between the first electrode and the second electrode, and such that anomalous discharge is not generated between the first electrode and the third electrode.Type: GrantFiled: October 27, 2009Date of Patent: March 18, 2014Assignee: Ulvac, Inc.Inventors: Takayoshi Hirono, Isao Tada
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Publication number: 20140072711Abstract: A system for reel-to-reel deposition of material onto flexible materials includes a reaction chamber, a feed reel arranged in the reaction chamber, the feed reel configured to support at least one continuous length of flexible material, a receiving reel arranged in the reaction chamber separate from the feed reel, the receiving reel configured to receive the flexible material, and at least one deposition target arranged in the reaction chamber, the deposition target configured to release vaporized target material for deposition onto surfaces of the flexible material.Type: ApplicationFiled: September 7, 2012Publication date: March 13, 2014Applicant: Apple Inc.Inventors: Ian F. Davison, Mark S. Belluscio, Kurt R. Stiehl
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Publication number: 20140063854Abstract: Provided is an apparatus for manufacturing a light guiding plate. The apparatus for manufacturing a light guiding plate includes an unwinding unit unwinding a film formed of a flexible material and wound in a roll shape, a winding unit winding the film provided from the unwinding unit in a roll shape, a surface treatment unit disposed between the unwinding unit and the winding unit to treat a surface of the film transferred into the winding part into a hydrophobic surface, a pattern formation unit disposed between the surface treatment unit and the winding unit to form a micro lens pattern on the surface of the film of which the surface is treated, and a pattern curing unit disposed between the pattern formation unit and the winding unit to cure the pattern.Type: ApplicationFiled: September 3, 2013Publication date: March 6, 2014Inventors: Kyoung Soo Park, Sung Jae Lee
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Patent number: 8657959Abstract: An apparatus for atomic layer deposition of a material on a moving substrate comprises a conveying arrangement for moving a substrate along a predetermined planar or curved path of travel and a coating bar having at least one precursor delivery channel. The precursor delivery channel conducts a fluid containing a material to be deposited on a substrate toward the path of travel. When in use, a substrate movable along the path of travel defines a gap between the outlet end of the precursor delivery channel and the substrate. The gap defines an impedance Zg to a flow of fluid from the precursor delivery channel. A flow restrictor is disposed within the precursor delivery channel that presents a predetermined impedance Zfc to the flow therethrough. The restrictor is sized such that the impedance Zfc is at least five (5) times, and more preferably at least fifteen (15) times, the impedance Zg. The impedance Zfc has a friction factor f.Type: GrantFiled: December 16, 2010Date of Patent: February 25, 2014Assignee: E I du Pont de Nemours and CompanyInventors: Geoffrey Nunes, Richard Dale Kinard
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Patent number: 8652586Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.Type: GrantFiled: August 4, 2009Date of Patent: February 18, 2014Assignees: AGC Flat Glass North America, Inc., Asahi Glass Co., Ltd., AGC Glass EuropeInventor: Peter Maschwitz
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Publication number: 20140044875Abstract: An in-line multi-stage physical vapor deposition chamber is disclosed. The deposition chamber includes a cylindrical shaped main body, multiple dividers disposed within the main body and extending in radial directions to divide the interior space of the main body into multiple fan shaped zones, and a cylindrical shaped substrate holder disposed coaxially with the main body. The substrate holder is rotatable around a central axis, and individual substrates or a continuous flexible substrate is mounted on the substrate holder parallel to the central axis. Multiple metal source holders are disposed on the cylindrical sidewall of the main body in at least some of zones for mounting metal sources. Some zones are provided with heating mechanisms for heating the substrate. A load-lock chamber is connected to the main body for loading and unloading substrates into and from a first zone.Type: ApplicationFiled: August 9, 2012Publication date: February 13, 2014Applicant: Pu Ni Tai Yang Neng (HangZhou) Co., LimitedInventors: Dong Wang, Pingrong Yu, Xuegeng Li, Zhiqian Su
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Patent number: 8584611Abstract: An in-line vacuum coating system includes a vacuum chamber, a coating source and a substrate carrier for holding tubular substrates, the carrier being displaceable using the vacuum chamber. A sure method of simply and securely coupling a fixed rotational drive unit to a carrier that can be displaced at a constant rate of speed in an in-line vacuum coating system is accomplished by a fixed splined shaft rotatably installed and connectable to a rotational drive unit, and a gearwheel that can be engaged with the splined shaft and that is rotatably mounted on the carrier. The gearwheel is longitudinally displaceable to a predefined extent in spring-loaded fashion in a direction opposite to the direction of travel of the carrier.Type: GrantFiled: December 18, 2009Date of Patent: November 19, 2013Assignee: FHR Anlagenbau GmbHInventors: Manfred Pfitzner, Guenther Sickert, Roberto Kaiser, Andreas Vogt
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Patent number: 8573154Abstract: The present invention relates to a plasma film forming apparatus. In the plasma film forming apparatus, a flow control jig is disposed between a plasma nozzle and a film formation region of a substrate. The flow control jig has a plasma supply path, a raw material supply path, a film formation joined path formed by combining the plasma supply path and the raw material supply path, an exhaust path for discharging a plasma discharge gas and an unreacted raw material transported from the film formation region, and a recovery path for returning the unreacted raw material in the exhaust path to the plasma supply path.Type: GrantFiled: January 3, 2011Date of Patent: November 5, 2013Assignee: Honda Motor Co., Ltd.Inventor: Shunichi Yorozuya
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Patent number: 8551249Abstract: A cassette for supporting a film during a gaseous vapor deposition process includes a central shaft having first and second end plates. A rib on each end plate forms a spiral groove able to accept an edge of a film. Each rib has a cross sectional configuration having substantially linear major edges, a predetermined width dimension and a predetermined average thickness dimension, and a width-to-thickness aspect ratio of at least 2:1. The rib could be substantially rectangular with an optional flow spoiler at the free end or substantially wedge-shaped. The interspoke spacing between end plates is at least three hundred millimeters (300 mm) and is also greater than the width dimension of a film substrate at a gaseous deposition temperature. The width dimension of each rib is between about 0.5% to about 2.0% of the interspoke spacing.Type: GrantFiled: August 31, 2009Date of Patent: October 8, 2013Assignee: E I du Pont de Nemours and CompanyInventors: Peter Francis Carcia, Calixto Estrada, Richard Dale Kinard, Robert Scott McLean, Kirstin H. Shilkitus
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Publication number: 20130239890Abstract: The present invention provides a process for coating a substrate. A metal alloy layer including at least two metallic elements is continuously deposited on the substrate by a vacuum deposition facility. The facility includes a vapor jet coater for spraying the substrate with a vapor containing the metallic elements in a constant and predetermined relative content, the vapor being sprayed at a sonic velocity. The process may advantageously be used for depositing Zn—Mg coatings. The invention also provides a vacuum deposition facility for continuously depositing coatings formed from metal alloys, for implementing the process.Type: ApplicationFiled: April 25, 2013Publication date: September 19, 2013Applicant: ARCELORMITTAL FRANCEInventors: Patrick Choquet, Eric Silberberg, Bruno Schmitz, Daniel Chaleix
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Patent number: 8529700Abstract: A vapor deposition apparatus includes an insert within which a material is deposited on the surface of a film. A cassette includes end plates each having a rib that edgewise receive a spiral wrapping of a film at least 300 mm wide. Spaces between turns of the wrapping define a gas flow channel and spaces between adjacent turns of one rib define inlet openings that communicate with the channel. Each rib has a predetermined width dimension, a predetermined average thickness dimension, and a width-to-thickness aspect ratio of at least 2:1. The spacing between end plates is at least 300 mm and is also greater than the film width at deposition temperature. The width dimension of each rib is between about 0.5% to about 2.0% of the end plate spacing. A diverging flow director contacts one end plate to directing gaseous fluid toward the inlet openings in that end plate.Type: GrantFiled: August 31, 2009Date of Patent: September 10, 2013Assignee: E I Du Pont de Nemours and CompanyInventors: Peter Francis Carcia, Richard Dale Kinard, Robert Scott McLean, Geoffrey Nunes, Kirstin H. Shilkitus
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Patent number: 8524003Abstract: A cassette for supporting a film during a gaseous vapor deposition has first and second end plates. A rib on each end plate forms a spiral groove that edgewise receives a spiral wrapping of a film having a width greater than 300 mm. Spaces between turns of the film wrapping define a gas flow channel and spaces between adjacent turns of the rib define a plurality of inlet openings in one end plate that communicate with the channel. Each rib has a predetermined width dimension, a predetermined average thickness dimension, and a width-to-thickness aspect ratio of at least 2:1. The spacing between end plates is at least three hundred millimeters (300 mm) and is also greater than the width dimension of a film substrate at a gaseous deposition temperature. The width dimension of each rib is between about 0.5% to about 2.0% of the end plate spacing.Type: GrantFiled: August 31, 2009Date of Patent: September 3, 2013Assignee: E I du Pont de Nemours and CompanyInventors: Peter Francis Carcia, Calixto Estrada, Richard Dale Kinard, Robert Scott McLean, Kirstin H. Shilkitus
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Publication number: 20130216728Abstract: An apparatus for continuously forming a thin-film layer of organic or inorganic functional material on one or both sides of a flexible substrate via plasma enhanced vacuum vapour deposition.Type: ApplicationFiled: February 15, 2013Publication date: August 22, 2013Inventors: Christopher Hurren, Brian John Conolly, Thomas Kenneth Hussey
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Publication number: 20130199447Abstract: Provided is a continuous coating apparatus which can supply a liquid coating material (a molten metal) to a levitation-heating space through various paths, and can easily control a supply flow rate of the liquid coating material, and has a simplified structure. The continuous coating apparatus includes: a vacuum chamber unit through which a coating target passes; a levitation-heating unit disposed in the vacuum chamber unit and generating an evaporation vapor by vaporizing a supplied coating material; and a liquid coating material supply unit connected so that a liquid coating material is supplied to at least one of an upper portion and a lower portion of the levitation-heating unit, and communicating with the outside of the vacuum chamber unit.Type: ApplicationFiled: December 13, 2010Publication date: August 8, 2013Applicant: POSCOInventors: Kyung-Hoon Nam, Young-Jin Kwak, Dong-Yoeul Lee, Tae-Yeob Kim, Yong-Hwa Jung, Kyoung-Bo Kim, Woo-Sung Jung, Mun-Jong Eom, Sang-Cheol Lee, Sang-Hoon Park
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Publication number: 20130186334Abstract: Provided is a vacuum deposition apparatus including a vacuum chamber, a deposition roller that is arranged in the vacuum chamber, and winds a substrate in a sheet form subject to deposition, and a magnetic field generation unit that is provided inside the deposition roller, and generates a magnetic field on a surface of the deposition roller, where the magnetic field generation unit includes an inside magnet arranged along an axial direction of the deposition roller and an outside magnet having a polarity opposite to the inside magnet and surrounding, in an annular form, the inside magnet, and the inside magnet is formed so as to be narrower in width along the axial direction of the deposition roller than a width of an extent of winding of the substrate W on the deposition roller in a projection viewed from a deposition surface of the substrate, and is arranged within the extent of the winding of the substrate W.Type: ApplicationFiled: January 24, 2013Publication date: July 25, 2013Applicant: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)Inventor: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)
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Patent number: 8481120Abstract: The invention relates to a process for coating a substrate (S) whereby a metal alloy layer comprising at least two metallic elements is continuously deposited on the substrate (S) by means of a vacuum deposition facility (1) comprising a vapor jet coater (7) for spraying the substrate (S) with a vapor containing the metallic elements in a constant and predetermined relative content, the vapor being sprayed at a sonic velocity. The process is more particularly intended for depositing Zn—Mg coatings. The invention also relates to a vacuum deposition facility (1) for continuously depositing coatings formed from metal alloys, for implementing the process.Type: GrantFiled: March 19, 2008Date of Patent: July 9, 2013Assignee: ArcelorMittal FranceInventors: Patrick Choquet, Eric Silberberg, Bruno Schmitz, Daniel Chaleix
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Patent number: 8470094Abstract: Apparatus for continuous coating has a chamber wall which forms a processing chamber, thermal insulation which forms a processing area within the chamber, a transportation device for substrates located in the processing area with a substrate transportation direction of the substrates lying in the lengthwise extension of the apparatus for continuous coating, and heating equipment which heats the substrates, is designed to minimize unwanted coating, in particular of parts of the apparatus, in order to minimize the expense of maintaining and servicing the apparatus A condensation element is positioned in the processing chamber, which extends into the processing area and binds the arising vapor through condensation.Type: GrantFiled: November 10, 2011Date of Patent: June 25, 2013Assignee: VON ARDENNE Anlagentechnik GmBHInventors: Hubertus Von Der Waydbrink, Siegfried Scheibe, Jens Meyer, Andrej Wolf, Uwe Traeber, Michael Hentschel
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Patent number: 8465589Abstract: A method of manufacture of CIGS photovoltaic cells and modules involves sequential deposition of copper indium gallium diselenide compounds in multiple thin sublayers to form a composite CIGS absorber layer of a desirable thickness greater than the thickness of each sublayer. In an embodiment, the method is adapted to roll-to-roll processing of CIGS PV cells. In an embodiment, the method is adapted to preparation of a CIGS absorber layer having graded composition through the layer. In a particular embodiment, the graded composition is enriched in copper at a base of the layer. In an embodiment, each CIGS sublayer is deposited by co-evaporation of copper, indium, gallium, and selenium which react in-situ to form CIGS.Type: GrantFiled: February 5, 2010Date of Patent: June 18, 2013Assignee: Ascent Solar Technologies, Inc.Inventors: Prem Nath, Venugopala R. Basava, Ajay Kumar Kalla, Peter Alex Shevchuk, Mohan S. Misra
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Publication number: 20130133577Abstract: A plasma CVD apparatus capable of preventing unnecessary deposition on a supplying portion of a source gas so as to suppress generation of flakes, and thereby depositing a CVD coating excellent in quality is provided. This plasma CVD apparatus includes a vacuum chamber, a vacuum pump system for vacuuming an interior of the vacuum chamber, a deposition roller around which a substrate is wound, the deposition roller being provided in the vacuum chamber, a gas supplying portion for supplying the source gas to the interior of the vacuum chamber, and a plasma power supply for forming a plasma generating region in the vicinity of a surface of the deposition roller and thereby depositing a coating on the substrate. The gas supplying portion is provided in a plasma non-generating region positioned on the opposite side of the plasma generating region with respect to the deposition roller.Type: ApplicationFiled: October 27, 2011Publication date: May 30, 2013Applicant: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)Inventors: Hiroshi Tamagaki, Tadao Okimoto
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Publication number: 20130122220Abstract: A graphene manufacturing apparatus includes a gas supplying unit supplying a gas including carbon; a gas heating unit heating the gas supplied from the gas supplying unit; a deposition chamber in which a substrate having a catalyst layer is disposed; and an inlet pipe introducing the gas of the gas heating unit into the deposition chamber. A temperature of the deposition chamber is set at a temperature lower than a temperature of the gas heating unit so that a selection range with respect to a catalyst metal to be used in the catalyst layer may be expanded, and damage of the substrate due to a high temperature heat may be minimized.Type: ApplicationFiled: June 22, 2011Publication date: May 16, 2013Applicant: SAMSUNG TECHWIN CO., LTD.Inventors: Dong-Kwan Won, Seung-Min Cho
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Patent number: 8440020Abstract: Apparatus for continuously producing flexible semiconductor devices through deposition of a plurality of semiconductor layers onto a moving flexible substrate by using Plasma Enhanced Chemical Vapor Deposition (PECVD) processing, where at least two successive layers are deposited in the same deposition chamber onto the substrate traveling in opposite directions. Computer program product directly loadable into the internal memory of a digital computer comprising software code portions for determining and controlling all the necessary parameters for the production of flexible semi-conductor devices in a such apparatus when said computer program product is run on a computer. Roll-to-roll method for producing flexible semiconductor devices, wherein a plurality of semiconductor layers are deposited in the same deposition chamber onto a flexible substrate moving in opposite directions.Type: GrantFiled: February 20, 2003Date of Patent: May 14, 2013Assignee: VHF Technologies SAInventors: Diego Fischer, Pedro Torres