Abstract: A surface sucking apparatus having a body and a plurality of legs. The body removably attachable to a vacuum hose. The body having a first portion, a second portion and a passageway extending therebetween for removing material. The plurality of legs positioned about the body so that the body is movable between a first position and a second position.

Abstract: An apparatus and method for cleaning the interior of an above ground storage tank includes a nozzle assembly mounted to a cover on the storage tank sidewall having a horizontally extending wash pipe fixedly and a suction pipe for recirculation of spent fluids. The wash pipe has an interior segment which can be extended to a tank floor and is configured with a bend to extend along the tank sidewall to which is attached a submersible swivel joint fitted with a choked nozzle. The nozzle assembly is attached to a control assembly so that the direction of flow from the nozzle may be manipulated by rotation of the swivel joint from the exterior of the storage tank. The nozzle also may be adjusted so the direction of flow may follow the angle of the tank floor.

Abstract: There is provided a biochemical analyzer and a method of cleaning fluid components of the same. The biochemical analyzer includes a reagent adding mechanism, a sample adding mechanism, at least one reaction cup, a cleaning mechanism and a waste pipeline connected to the cleaning mechanism. A control system is employed, wherein the control system has a cleaning mode for cleaning fluid components of the biochemical analyzer, having: a) a water injection step; and b) a water discharge. With the cleaning method, the fluid components such as the water drawing device and waste valve on the waste pipeline may be automatically cleaned without manual intervention.

Abstract: A method of using a hand-held power tool having a debris removal attachment is provided. The method includes providing a hand-held power tool having an output shaft and selectively coupling an extension shaft to the output shaft. The method also includes coupling a first impeller to the extension shaft and providing a housing adjacent the first impeller. The method further includes rotating the first impeller to generate a pressure differential sufficient to draw debris into the housing. The extension shaft has a first end and a second end, the first end configured to couple to the output shaft of the hand-held power tool, and the second end configured to couple to a tool bit.

Abstract: The invention relates to a method and to a device for treating containers relating especially to cleaning plastic bottles (1) preferably in the inverted position. Each container is thereby subjected to a treatment medium (16) applied and/or introduced thereto. Electrically charged ions introduced into the treatment medium (16) serve to balance the charge of each container. According to the invention, the treatment medium (16) is tested for the presence of ions.

Abstract: A method suctions liquid from an upper surface of a substrate as the substrate is transported by a carrier under a head in a chamber. This operation is performed by the first section of the head. The method causes a first film of cleaning foam to flow onto the upper surface of the substrate as the substrate proceeds under the head. This operation is performed by a second section which is contiguous to the first section in the head. The method causes a second film of rinsing fluid to flow onto the upper surface of the substrate as the substrate is carried under the head. This rinsing operation is performed by a third section which is contiguous to the second section in the head and which is defined partially around the second section and up to the first section.

Abstract: The present disclosure provides a vacuum attachment comprising a body including an adaptor configured to connect to a vacuum assembly, a vacuum airflow path configured to be in fluid communication with the vacuum assembly, and a dispensing airflow path configured to be in fluid communication with a pressurized gas source.

Abstract: A pulse jet liquid gas cleaning system has an ultrasonic transducer operable to transform a high-pressure stream of cryogenic fluid from a cryogenic fluid supply into pulsed jets of individual cryogenic fluid slugs.

Abstract: Apparatus and methods for removing particle contaminants from a surface of a substrate includes coating a layer of a viscoelastic material on the surface. The viscoelastic material is coated as a thin film and exhibits substantial liquid-like characteristic. An external force is applied to a first area of the surface coated with the viscoelastic material such that a second area of the surface coated with the viscoelastic material is not substantially subjected to the applied force. The force is applied for a time duration that is shorter than a intrinsic time of the viscoelastic material so as to access solid-like characteristic of the viscoelastic material. The viscoelastic material exhibiting solid-like characteristic interacts at least partially with at least some of the particle contaminants present on the surface.

Abstract: The technology of washing and treatment MWU (modular washing unit) is conceived to wash and treat fruits and vegetables in a confined environment, with progressively more and more clean water (counter-current) and with an optimal ratio between the quantities of water used and processed products. The system allows important savings of water, chemicals and energy. The technology of washing and treatment MWU (modular washing unit) is conceived to allow the transport and the treatment of the product in confined environment, with clean water (counter-current) In the MWU the product is submitted to sequence of filling and emptying with appropriated solutions, progressively cleaner, prior to subsequent discretionary treatments. A treatment plant can be equipped with a variable number of MWUs, with additional remote MWUs to meet the desired production capacity.

Abstract: Vacuum cleaning apparatus (1, 51) includes a vapor generating member (8, 8a, 53, 53a) for generating vapor of a petroleum-based solvent, a cleaning chamber (2) allowing a workpiece to be cleaned under reduced pressure by the vapor fed from the vapor generating member, a condensing chamber (21) that is connected to the cleaning chamber and is maintained in a depressurized state, a temperature maintaining member (22) that maintains the condensing chamber at a lower temperature than the cleaning chamber, and an opening/closing member (20) that provides or cuts off communication between the condensing chamber and the cleaning chamber.

Abstract: Provided is a substrate treatment apparatus. The apparatus includes a chuck supporting a substrate and being rotatable, a container surrounding the chuck and collecting chemicals scattered due to rotations of the substrate, and a first spray nozzle spraying the chemicals to the substrate.

Abstract: A method for emptying a furnace floor from smelt in a black liquor recovery boiler when the black liquor recovery boiler is being shut down. The emptying can be started while smelt is still flowing in smelt spouts. The floor is emptied by sucking smelt from the furnace with a smelt eductor. A device for removing smelt and wash water from a furnace of a black liquor recovery boiler by means of suction. Negative pressure is generated in the device by conducting pressurized gas into a suction pipe of an eductor so that preheated pressurized gas is discharged in the discharge direction of smelt and wash water.

Abstract: A method and device for wet treating a peripheral area of a wafer-shaped article uses rollers for driving the wafer-shaped article at its edge. First and second liquid treatment units supply liquid towards the peripheral area. Each of the liquid treatment units comprises a liquid carrier, a liquid supply nozzle for supplying liquid to the liquid carrier and a liquid discharging channel for removing liquid from the liquid carrier. The second liquid treatment unit includes a gas treatment section with a gas supply nozzle for removing most of the second liquid from the peripheral area, and with a gas discharge channel for discharging gas and removed liquid.

Abstract: A cyclone comprises a second or lower portion that is pivotable with respect to a first or upper portion about an articulation between a first position and a second position; the second portion being aligned with the first portion along a first or vertical axis when the second portion is in the first position, and the second portion being aligned on a second axis that is different from the first axis when the second portion is moved from the first position to the second position. In various additional embodiments, the second axis may be normal to the first axis, for example, in the first position the lower portion is horizontal and in the first position the lower portion is vertical and aligned with the upper portion. The second position may be used as a cleaning position. When the lower portion is pivoted away from the upper portion, the vortex is interrupted. In the second position, the lower portion may also interface with a suction mechanism.

Abstract: A cleaning liquid is pressurized and superheated to a condition, in which temperature of the cleaning liquid is above an atmospheric boiling point. A product to be cleaned is interposed between a pair of liquid holding blocks, so that gaps are respectively formed between side surfaces of the product and the liquid holding blocks. The pressurized and superheated liquid is injected to the product so that layers of condensate of vapor of injected cleaning liquid are formed in the gaps. Contamination on the surface of the product is removed by the cleaning liquid and the surface is dried by latent heat of the condensate of the vapor of the cleaning liquid.

Abstract: An apparatus for cleaning an article may include a cleaning head. The cleaning head may have a lower edge and may include an annular steam chamber and a steam nozzle. The annular steam chamber may define a vacuum chamber that may be configured to receive the article therewithin. The annular steam chamber may have a plurality of discrete apertures positioned in vertically spaced relation to the lower edge. The steam nozzle may be configured to provide steam to the annular steam chamber for discharge through the apertures into the vacuum chamber.

Abstract: A method for using a vacuum apparatus that includes a vacuum chamber and a pump, the vacuum chamber housing an object, the pump reducing an internal pressure of the vacuum chamber, the method including: ventilating inside the vacuum chamber by introducing a gas into the vacuum chamber and discharging the gas from the vacuum chamber by causing the pump to reduce the internal pressure of the vacuum chamber. In the ventilating, a discharge rate at which molecules of the gas per unit volume are discharged is at least 3.3×10?5 mol/(s·L), and the temperature in the vacuum chamber is at least 15° C. and at most 80° C.

Abstract: Method for cleaning a steam nozzle (7) of a beverage preparation machine comprising a rinsing container (12) having a top opening (22) and a draining device (23) for evacuating the liquid contained therein; a feed device for feeding the nozzle with liquid; a device (13) for moving the nozzle vertically so that its free end (7a) enters the container (12); and a control unit for controlling the moving and feeding devices. It includes a rinsing sequence with the following steps: the lowering of the nozzle (7) into the rinsing position inside the container; the filling of the container (12) with liquid by the nozzle; and the draining of the container (12) activated by the control unit connected to the moving and feeding devices.

Abstract: In one embodiment, a method of cleaning a semiconductor manufacturing apparatus includes supplying a cleaning gas for removing a deposition film deposited on an inside wall of a treatment chamber through a supply pipe of the treatment chamber so that a supply amount of the cleaning gas from the supply pipe per unit time is greater than an exhaust amount of the cleaning gas from an exhaust pipe of the treatment chamber per unit time. The method further includes supplying an inert gas to fill the supply pipe with the inert gas.

Abstract: A cleaning robot cleaning a specific region and including a movement module, a sound wave module, a cleaning module and a controlling module is provided. The movement module includes a plurality of wheels. The sound wave module emits a sound wave and receives a plurality of reflected waves. The cleaning module performs a cleaning function. The controlling module generates a contour according to the reflected waves and controls at least one of the movement module and the cleaning module according to the contour.

Abstract: An air gun in combination with a vacuum source is powered by pressurized gas that is received through a gas inlet. The air gun and the vacuum source are configured to be simultaneously operable using the pressurized gas, which provides a method for conveniently air cleaning various objects.

Abstract: A mobile surface cleaning robot including a robot body having a forward drive direction, a drive system supporting the robot body above a floor surface for maneuvering the robot across the floor surface, and a robot controller in communication with the drive system. The robot also includes a collection volume supported by the robot body and a cleaning module releasably supported by the robot body and arranged to clean the floor surface. The cleaning module includes a first vacuum squeegee having a first duct, a driven roller brush rotatably supported rearward of the first vacuum squeegee, a second vacuum squeegee disposed rearward of the roller brush and having a second duct, and a third duct in fluid communication with the first and second ducts. The third duct is connectable to the collection volume at a fluid-tight interface formed by selectively engaging the cartridge with the robot body.

Abstract: A substrate cleaning apparatus includes: a substrate holder configured to hold and rotate a substrate; an ultrasonic cleaning unit configured to impart an ultrasonic vibration energy to deaerated pure water and then supply the deaerated pure water onto a surface of the substrate; a pure water spray nozzle configured to spray deaerated pure water onto the surface of the substrate; a chamber surrounding the substrate holder and the pure water spray nozzle; and an inert gas supply line configured to supply an inert gas into the chamber.

Abstract: A vacuum assembly for removing debris formed on the surface of a work chuck after a wafer grinding process by positioning a vacuum source above the work chuck and then activating the vacuum source.

Abstract: A method and system for cleaning lithography components including contacting a substrate having residue including organic compounds and graphitic carbon deposited on a surface thereof with hydrogen peroxide vapor. The hydrogen peroxide vapor is irradiated with electromagnetic radiation having a wavelength in the range of 100 nm to 350 nm forming hydroxyl radicals. The hydroxyl radicals react with the residue to remove the residue from the surface of the substrate.

Abstract: A system and method for removing material (e.g., drilling or cutting) utilizing foam is provided. The system and method may comprise a vacuum collar that removes foam and residual particles from a cutting interface. The foam may be directed to a foam-to-liquid transforming device that decreases the volume of foam.

Abstract: A semiconductor substrate cleaning method includes cleaning a semiconductor substrate formed with a line-and-space pattern, rinsing the substrate, supplying the rinse water to rinse the substrate, and drying the substrate. The rinsing includes supplying deionized water and hydrochloric acid into a mixing section to mix the deionized water and the hydrochloric acid into a mixture, heating the mixture in the mixing section by a heater, detecting a pH value and a temperature of the mixture by a pH sensor and a temperature sensor respectively, adjusting an amount of hydrochloric acid supplied into the mixing section so that the rinse water has a predetermined pH value indicative of acidity, and energizing or de-energizing the heater so that the temperature of the mixture detected by the temperature sensor reaches a predetermined temperature, thereby producing the rinse water which has a temperature of not less than 70° C. and is acidic.

Abstract: Chucks for mounting and retaining semiconductor wafers during processing are described, particularly suited for wafer processing involving total immersion of the wafer-chuck structure in a liquid. Chuck structures are disclosed for preventing or hindering processing chemicals from contacting and contaminating large portions of the underside of the wafer undergoing processing, limiting such chemical contact to readily cleaned, relatively small annular regions on the periphery of the wafer. Embodiments include structures with supplemental gas flows on the underside of the wafer as well as the creation of gas/liquid meniscusci to prevent chemical penetration of the wafer's underside. Methods of processing semiconductor wafers employing such chucks are also described.

Abstract: An assembly, including: a nozzle including a first chamber with a first orifice arranged to receive a stream of gas; a second chamber with a second orifice to emit the stream; a throat connecting the nozzle chambers; and a collector including: top and bottom walls with first and second openings; a third chamber bounded by the top and bottom walls and including a third opening connected to the second orifice to receive the stream; and a fourth opening. The first chamber tapers from the first orifice to the throat. The second chamber expands in size from the throat to the second orifice. The third chamber expands in size from the third opening to the fourth opening. The collector is arranged to: entrain, in the stream, debris entering the third chamber through first or second opening; and emit the stream, with the entrained debris, from the fourth opening.

Abstract: A radiation source includes an uncapped Mo/Si multilayer mirror, and a cleaning apparatus configured to remove a deposition comprising Sn on the uncapped Mo/Si multilayer mirror. The cleaning apparatus is configured to provide a gas comprising one or more of H2, D2 and HD and one or more additional compounds selected from hydrocarbon compounds and/or silane compounds in at least part of the radiation source, to produce hydrogen and/or deuterium radicals and radicals of the one or more additional compounds, from the gas, and to supply the hydrogen and/or deuterium radicals and radicals of the one or more additional compounds to the uncapped Mo/Si multilayer mirror to remove at least part of the deposition.

Abstract: A semiconductor manufacturing apparatus component (101), to which a nitride semiconductor expressed by a general formula of AlxInyGa1-x-yN (provided that, x and y satisfy relationships of 0?x<1, 0?y<1, and 0?x+y<1) adheres, is disposed inside a washing apparatus (100) provided with a gas introducing pipe (104) and a gas discharging pipe (105). After the inside of the apparatus is set to a decompressed state, a halogen-containing gas is introduced from the gas introducing pipe (104) to set a pressure inside the apparatus to be equal to or more than 10 kPa and equal to or less than 90 kPa. Then, the halogen-containing gas is retained inside the apparatus to remove the nitride semiconductor adhered to the semiconductor manufacturing apparatus component (101).

Abstract: A hard surface cleaner having a cleaning head with rotational assist. In one embodiment, the cleaning head includes a housing having a fluid-supply and vacuum inlets. The housing also includes at least one flow-control inlet arranged with the vacuum inlet to draw a flow of air into the housing through the flow-control inlet. The cleaning head further includes a spray assembly at least partially enclosed within the housing. The spray assembly includes a shaft, at least one spray nozzle operably coupled to the shaft, and a plurality of fins also operably coupled to the shaft. The spray nozzle is configured to receive a pressurized fluid from the fluid-supply inlet and to rotate about the shaft by delivering the pressurized fluid toward a floor surface. The fins are positioned at least partially within the flow of air through the flow control inlet to control the rotational speed of the spray assembly.

Abstract: A protective chuck is disposed on a substrate with a gas layer between the bottom surface of the protective chuck and the substrate surface. The gas layer protects a surface region against a fluid layer covering the substrate surface. In some embodiments, the pressure fluctuation at the gas layers is monitored, and through the dynamic feedback, the gas flow rate can be adjusted to achieve a desired operation regime. The dynamic control of operation regime setting can also be applied to high productivity combinatorial systems having an array of protective chucks.

Abstract: A surface cleaning apparatus is disclosed. In some embodiments, the surface cleaning apparatus comprises a member having a dirty fluid inlet. A fluid flow path extends from the dirty fluid inlet to a clean air outlet of the surface cleaning apparatus and includes a suction motor. At least one cyclone is positioned in the fluid flow path and has at least one material outlet and a divider plate associated with the material outlet. A material collection chamber is in flow communication with the at least one cyclone. The apparatus further comprises a liner bag retaining member.

Abstract: Method for producing a plastic layer having a layer thickness of less than 200 ?m on an upper side of a substrate includes the following steps: applying plastic powder to the substrate upper side by means of a powder scattering device, then cleaning the substrate underside, then melting the applied plastic powder in a furnace, as a result of which the plastic layer is formed on the substrate, and cooling the substrate, wherein the substrate is transported continuously from method step to method step.

Abstract: Rotary surface cleaning machines with recovery tanks and associated systems and methods are disclosed. A representative rotary surface cleaning machine in accordance with the present disclosure includes a base assembly, a support frame coupled to the base assembly, a recovery tank carried by the support frame, a vacuum blower, and a discharge pump. The vacuum blower draws a mixture of air and fluid from the base assembly to the recovery tank when the base assembly is in operation. Then the discharge pump discharges a liquid portion of the mixture from the recovery tank.

Abstract: A system to remove debris from a chamber includes a debris chamber, an exhaust pipe, a debris conduit, and a tab. The exhaust pipe may direct a flow of gas into an air outlet, and include an exhaust pipe interior. The debris conduit connects the chamber with at least one of the exhaust pipe interior and the air outlet, and includes a debris conduit end disposed in at least one of the exhaust pipe interior and the air outlet. The tab includes at least three outer edges forming at least two corners, and an adjacent edge. The adjacent edge is adjacent to the debris conduit end.

Abstract: A method and apparatus for controlling the directional movement of a self-propelled robotic pool cleaner having at least one pair of rotational support members for propelling and cleaning a surface of a pool. The method includes accelerating the at least one pair of rotational support members of the pool cleaner from a stopped position to a first predetermined rotational rate in a first predetermined time period; rotating the at least one pair of rotational support members at said first predetermined rotational rate for a second predetermined time period; and increasing the first rate of rotation to a second greater predetermined rotational rate, wherein said pool cleaner is propelled at a normalized rate for cleaning said pool.

Abstract: Apparatus and method for providing the apparatus, the apparatus including: a duct; and a non-return valve; wherein the duct has a first portion and a second portion; the first portion has a first end and a second end; the first end is open to a fluid (e.g. air); the second end is connected to the second portion such that fluid is permitted to flow between the first portion and the second portion; the non-return valve is positioned at or proximate to the second end; and the non-return valve is arranged such that, upon application of a suction force to the first portion at the first end, fluid flows into the first portion via the non-return valve from outside the duct, and through the first portion from the second end to the first end.

Abstract: A method of using a processing system that is operable to deposit liquid and to remove liquid by way of negative pressure. The method includes arranging a device to have at least one of the liquid deposited thereon by the processing system and the liquid removed therefrom by the processing system. The device has a sensor portion disposed thereon. The sensor portion can provide a sensor signal based on pressure related to the at least one of the liquid being deposited thereon by the processing system and the liquid being removed therefrom by the processing system. The method further includes performing at least one of depositing, by the processing system, the liquid onto the device and removing the liquid, by the processing system, from the device. The method still further includes providing the sensor signal, by the sensor portion, based on the pressure related to the at least one of the liquid being deposited onto the device and the liquid being removed from the device.

Abstract: A method for treating a semiconductor device includes dissolving an inert gas species in a wet chemical cleaning solution and treating a material layer of a semiconductor device with the wet chemical cleaning solution in ambient atmosphere. The inert gas species is oversaturated in the wet chemical cleaning solution in the ambient atmosphere.

Abstract: The present invention provides methods of removing liquid from a barrier structure in the context of treating microelectronic workpieces with one or more treatment materials, including liquids, gases, fluidized solids, dispersions, combinations of these, and the like.

Abstract: A method of cleaning a contaminated composite part, so as to provide a surface suitable for adhesive bonding. The method includes applying a wicking medium adjacent to a surface of the contaminated composite material. Then applying a solvent medium soaked in a cleaning solution adjacent to the wicking medium. Then vapor barrier is applied adjacent to the solvent medium. Next a breather material is applied adjacent to the vapor barrier. Then a vacuum bagging film with a vacuum port is applied and sealed against the composite part. The composite part is then heated and vented to remove contaminates from the composite material.

Abstract: Embodiments of the invention generally provide methods for cleaning a UV processing chamber. In one embodiment, the method includes flowing an oxygen-containing gas through a plurality of passages formed in a UV transparent gas distribution showerhead and into a processing region located between the UV transparent gas distribution showerhead and a substrate support disposed within the thermal processing chamber, exposing the oxygen-containing gas to UV radiation under a pressure scheme comprising a low pressure stage and a high pressure stage to generate reactive oxygen radicals, and removing unwanted residues or deposition build-up from exposed surfaces of chamber components presented in the thermal processing chamber using the reactive oxygen radicals.

Abstract: The present inventions are directed to portable cleaning apparatuses adapted for use on mobile cleaning carts useable, for example, for cleaning hospital rooms. Each apparatus comprises a pre-filter module, a vacuum source module, and a secondary filter module, releasably securable to one another, the entire apparatus being configured provide high efficiency cleaning at low noise levels.

Abstract: A method and system for cleaning a substrate in a multi-module cleaning assembly is provided. The method begins by receiving the substrate into the cleaning module. A cleaning chemistry, at a temperature elevated from an ambient temperature, is applied onto a top surface of the substrate. Concurrent with application of the cleaning chemistry, vapors are exhausted from the cleaning chemistry through a port located below a bottom surface of the substrate with the vapor exhaustion providing a negative pressure relative to a pressure external to the cleaning module. The application of the cleaning chemistry is terminated, followed by termination of the exhausting of the vapors. The substrate is dried after the flowing of inert gas is terminated.

Abstract: Apparatus and related methods for continually measuring and dispensing precise amounts of bulk chemical in a car wash application. A gravimetric dispensing assembly can include a load cell and a syringe dosing pump that is suspended below the load cell such that an entire mass of the syringe dosing pump is communicated to the load cell. In this manner, the load cell can measure the actual mass of chemical being dispensed from the syringe dosing pump on a continuous basis without solely relying on the rated volumetric capacity of the syringe dosing pump. The syringe dosing pump can be driven by a stepper motor that can be pulsed as directed by a controller so as to maintain, increase or decrease an amount of bulk chemical being dispensed from the syringe dosing pump.

Abstract: The present invention relates to a vacuumable gel and the gel use to decontaminate surfaces, for example, radioactive decontamination. The gel is composed of a colloidal solution comprising: from 5 to 25 wt % of an inorganic viscosity modifier; from 0.01 to 0.2 wt % of a surfactant, preferably, a surfactant in an amount strictly below 0.1 wt %, wt % relative to the total weight of the gel; from 0.5 to 7 mol, per liter of gel, of an inorganic acid or base; and optionally from 0.05 to 1 mol, per liter of gel, of an oxidizer having a standard redox potential Eo greater than 1.4 V in a strong acid medium or of the reduced form of this oxidizer; the remainder being water. The gel may be applied, by spraying, to a surface to be decontaminated, and removed in the form of dry residues by suction or brushing after drying.

Abstract: Disclosed herein is a non-contact multi-transfer apparatus, including: an air module spraying and sucking air to an object to be transferred; a lower housing having an opening corresponding to the air module and mounting the air module thereon; an upper housing engaged with an upper portion of the lower housing and having a connection part on one side of an upper surface thereof; and a transfer guide part provided at both sides or one side of the upper housing or the lower housing for a transfer.