Abstract: A carrier for carrying an ophthalmic lens comprises: a basket (10) comprising a basket wall defining a concave cavity for accommodating an ophthalmic lens (100), the basket further comprising at least three recesses (12) arranged in the basket wall at different locations along the circumference of the basket (10); and a retainer (20) comprising at least three retainer arms (21) arranged in a star-shaped configuration corresponding to the arrangement of the recesses (12) along the circumference of the basket (10). In an assembled state each retainer arm (21) of the retainer (20) engages with a corresponding one of the recesses (12) in the basket wall of the basket (10) to retain the ophthalmic lens (100) in the cavity.

Abstract: A method of decreasing the concentration of certain contaminants in liquids by the chemical reduction of the contaminant using a hydride. A suitable reactor is charged with the contaminated liquid. An amount of catalyst and then an amount of hydride are added to the reactor. The hydride reacts with the contaminant in the liquid, chemically reducing and thus destroying a portion of the contaminant and thereby reducing the concentration of the contaminant in the liquid. Additional hydride can be added to further reduce the concentration to meet a desired level.

Abstract: This disclosure describes systems, methods, and apparatus for counter-current solids leaching. A multi-stage countercurrent leaching chamber can include a top and bottom end, a barren liquor input, two or more regions for countercurrent mixing, and a barren solids output. The input can be configured to receive barren liquor. The two or more regions for countercurrent mixing and separation can be configured to mix and separate liquid and solid phases. The barren solids output can be configured to collect and discharge barren solids from the bottom end of the multi-stage countercurrent leaching chamber. A fluidized bed chamber and clarifier chamber can also be included, where the fluidized bed receives a fluidizable slurry of pregnant solids and the clarifier chamber aids in separating liquids from solids passing from a top of the fluidized bed chamber to the top end of the multi-stage countercurrent leaching chamber.

Abstract: Systems and methods for fabricating nanostructures using other nanostructures as templates. A method includes mixing a dispersion and a reagent solution. The dispersion includes nanostructures such as nanowires including a first element such as copper. The reagent solution includes a second element such as silver. The second element at least partially replaces the first element in the nanostructures. The nanostructures are optionally washed, filtered, and/or deoxidized.

Abstract: In alternative embodiments, the invention provides processes and methods for extracting and recovering rare earth materials from a wet-process phosphoric acid using one or more continuous ion exchange resin systems. In alternative embodiments, the method is particularly suited for use in extracting and recovering multiple rare earth materials present in low concentrations contained in wet-process phosphoric acid.

Abstract: The invention provides methods and systems for sanitizing and/or regenerating porous filter media using dissolved ozone in the filter backwash under fluidized conditions.

Abstract: A nozzle for discharging droplets of a processing liquid for processing a substrate has a main body including a supply port, a drain port, a processing liquid flow passageway connecting the supply port and the drain port, and a plurality of discharge ports from which the processing liquid is discharged. The processing liquid flow passageway includes a plurality of branch flow channels, which branch out between the supply port and the drain port and collect together between the supply port and the drain port. The plurality of discharge ports form a plurality of columns respectively corresponding to the plurality of branch flow channels; and are aligned along and connected to the corresponding branch flow channels. A piezo element applies vibration to the processing liquid flowing through the plurality of branch flow channels.

Abstract: A foreign matter removal device 10 preliminary cleans the work 50 in a bucket 12 housed in an input tank 15, then further cleans the work 50 in buckets 13, 14 housed in cleaning tanks 16, 17 by agitating cleaning liquid while inverting the buckets to transfer the work to a subsequent bucket. Particularly, the bottom of the cleaning tank is formed such that the nearer to a center of the bottom, the deeper the bottom becomes. The cleaning liquid overflowing from the cleaning tanks are stored in auxiliary tanks 22, 23. First and second ejection units 29a, 29b are arranged at different heights in the cleaning tank to generate a circulating flow in the cleaning liquid.

Abstract: A cleaning device for cleaning a substrate is provided. In one aspect, the cleaning device includes a brush including a first end, a second end opposed to the first end, an outer surface, and a hollow bore defined in the brush about a central axis of the brush. The brush defines a first cross-sectional area near the first end and a second cross-sectional area near the second end. Both the first and second cross-sectional areas are generally perpendicular to the central axis and the second cross-sectional area is greater than the first cross-sectional area.

Abstract: A wafer cleaning apparatus includes a beam for holding a plurality of semiconductor or solar wafers. The beam includes at least one channel extending axially through the beam. An opening extends from the channel to a location between adjacent wafers. A manifold includes a conduit coupled to the channel and an immersion tank includes an ultrasonic transducer.

Abstract: A method and system for cleaning a substrate in a multi-module cleaning assembly is provided. The method begins by receiving the substrate into the cleaning module. A cleaning chemistry, at a temperature elevated from an ambient temperature, is applied onto a top surface of the substrate. Concurrent with application of the cleaning chemistry, vapors are exhausted from the cleaning chemistry through a port located below a bottom surface of the substrate with the vapor exhaustion providing a negative pressure relative to a pressure external to the cleaning module. The application of the cleaning chemistry is terminated, followed by termination of the exhausting of the vapors. The substrate is dried after the flowing of inert gas is terminated.

Abstract: In a substrate processing method according to the present invention, a cleaning liquid nozzle supplies a rinsing liquid to a central portion of a substrate and thereafter moves from a position corresponding to the central portion of the substrate to a position corresponding to a peripheral, edge portion thereof while supplying the rinsing liquid before stopping at the position corresponding to the peripheral edge portion. Next, a drying liquid nozzle moves from the position corresponding to the peripheral edge portion to the position corresponding to the central portion while supplying a drying liquid. Then, the drying liquid nozzle is kept stationary at the position corresponding to the central portion for a predetermined period of time while supplying the drying liquid. Thereafter, a gas nozzle moves from the position corresponding to the central portion to the position corresponding to the peripheral edge portion while supplying an inert gas.

Abstract: Provided is a liquid processing apparatus in which a target substrate is horizontally held on a substrate holding unit and rotated around a vertical shaft, and the chemicals are supplied from a chemical supplying unit to the bottom surface of the target substrate that is rotating. In particular, the liquid processing apparatus performs a first step in which the chemicals are supplied to the target substrate while rotating the target substrate at a first rotation speed, a second step in which the supply of the chemicals is halted and the chemicals are thrown off by rotating the target substrate at a second rotation speed higher than the first rotation speed, and a third step in which the rinse liquid is supplied to the target substrate while rotating the target substrate at a third rotation speed equal to or lower than the first rotation speed.

Abstract: A turbine engine cleaning system includes a source of cleaning fluid, a source of rinse fluid, a pump configured to deliver the cleaning fluid and rinse fluid under pressure, and a wash harness. The wash harness is connected in flow communication with a plurality of turbine engines. The wash harness is configured to direct cleaning fluid from the source of cleaning fluid and rinse fluid from the source of rinse fluid from the pump to the turbine engines in sequence.

Abstract: Provided is a method and apparatus for cleaning a photomask. The photomask including a first region and a second region surrounding the first region, a pattern to be protected disposed on the first region, and a material to be removed exists on the second region. A cleaning liquid is sprayed from an inside region of the second region toward an outer region of the second region to remove the material, and a gas is blown from the first region toward the second region to protect the pattern.

Abstract: A batch cleaning apparatus includes a housing including a process chamber, a fluid holding tank supported by the housing, and a fluid delivery manifold assembly removably disposed in the process chamber of the housing and in fluid communication with fluid holding tank. The fluid delivery manifold assembly includes a fluid inlet port selectively coupled to the fluid holding tank, a plurality of distribution manifolds in fluid communication with the fluid inlet port, and a plurality of spray bars in fluid communication with the distribution manifolds. The spray bars are configured to provide support for printed circuit boards during a cleaning operation. Other embodiments of batch cleaning apparatus and methods of batch cleaning are further disclosed.

Abstract: A method of perfuming in automatic dishwashing comprising the step of providing a first perfume into an automatic dishwashing machine wherein the first perfume is capable of generating a second perfume comprising from about 0.001% to about 10% by weight thereof of a sulphurous compound.

Abstract: A method and apparatus for cleaning, drying, coating, baking etching and deposition of surfaces on glass substrate as it transitions thru and between small gaps between hydro-static porous media bearings. Due to the non-contact nature of the device extremely high pressures can be induced upon the work piece through various fluids without damage to the substrate, allowing the system to utilize the viscous nature of fluids to accomplish the desired cleaning, drying, coating, etching or baking. The process also allows for simultaneous and immediately sequential ordering of processes.

Abstract: A method and apparatus 30 are provided for cleaning of bottle filling equipment 10 that has a plurality of elevated valves 18, each valve being in flow communication with filling liquid supply means 14. The method includes storing a manifold 32 that has a plurality of cleaning openings 42 in a configuration resembling that of the valves, in a position that allows clear visibility and access to the operation of the valves. The manifold 32 is lowered relative to the valves 18, so that it is below the valves and is positioned underneath the valves, with each cleaning opening 42 in flow communication with a valve. The valves 18 are rinsed with liquid flowing through the filling liquid supply 14, the valves and the manifold 32. Afterwards, the manifold 32 is removed from the valves 18 and returned to its stored position.

Abstract: Disclosed is a polycrystalline silicon washing apparatus that sequentially immerses polycrystalline silicon into a plurality of acid baths each of which is filled with an acid to wash the polycrystalline silicon. The temperatures of the acids in the acid baths are set such that the temperature of the acid in a later acid bath of adjacent acid baths is equal to or lower than that of a former acid bath and the temperature of the acid in the last acid bath is lower than that of the acid in the first acid bath. Each of the acid baths is provided with a temperature adjusting unit that controls the temperature of the acid at a constant value.

Abstract: A produce cleaning machine provides baskets for holding large and small produce items and water sprayers for directing water jets onto the produce from above and below. One basket is motorized to rotate to more evenly clean the produce, while a further basket can be rolled in and out of the machine to make loading and unloading easier. The force of the spray is adjustable and the rotational speed of the motor is as well to provide for special handling of the produce. Rotation after cleaning is used to help dry the produce, and ultraviolet emission is used to sanitize the produce.

Abstract: A method and apparatus provide for automatically cleaning and decontaminating medical instruments. The method comprising the steps of: a) placing the medical instruments into a container after their use in a medical procedure; b) closing the container to seal the instruments inside whereby to prevent personnel contact with the instruments and any contaminants which might be thereon; c) inserting the sealed container into a washer/decontaminator and sealing the washer/decontaminator; d) the washer/decontaminator automatically opening the container and applying a washing fluid thereto to wash the instruments within the container; and e) the washer/decontaminator automatically applying a disinfectant to the container to disinfect the instruments whereby to allow safe handling thereof by personnel.

Abstract: A method of removing particles from a wafer is provided. The method is adopted after a process for removing unreactive metal of a salicide process or after a salicide process and having oxide residue remaining on a wafer or after a chemical vapor deposition (CVD) process that resulted with particles on a wafer. The method includes performing at least two cycles (stages) of intermediate rinse process. Each cycle of the intermediate rinse process includes conducting a procedure of rotating the wafer at a high speed first, and then conducting a procedure of rotating the wafer at a low speed.

Abstract: A process for removing the coating layers from finished golf balls is disclosed herein. The process involves soaking the golf balls in a removal solution and then subjecting the golf balls to ultrasonic treatment in order to remove a coating layer, an indicia and/or a paint layer.

Abstract: A floor cleaning system and method for use thereof is disclosed for facilitating removal of waste materials. The system includes a floor base, a floor covering, a substrate spacing the floor base and the artificial grass surfacing apart from one another, and at least one fluid-carrying structure. The floor base receives the waste materials. The floor covering is spaced above the floor base, and is at least in part permeable to the waste materials and in liquid communication with the floor base. The fluid-carrying structure is adapted to provide cleaning fluid to the floor base to rinse the waste materials received thereon. The cleaning fluid and waste materials flow along the floor base under the floor covering to facilitate evacuation thereof.

Abstract: A cleaning system used for cleaning small parts, and more specifically for degreasing small parts, is provided that comprises a top work station, a bottom work station, and a grid tray having a grid portion. The top and bottom work stations can be assembled into a container and may employ one or more clips to secure the assembly. A method of cleaning items using the cleaning system is also provided. Further provided is a kit comprising the cleaning system, one or more brushes, and one or more pairs of gloves.

Abstract: Method of de-coating metallic coated scrap pieces, the metallic coated scrap pieces comprising a metallic core layer and a metallic coating layer of which the liquidus temperature of the metallic coating layer is lower than the solidus temperature of the metallic core layer, such as brazing sheet scrap pieces, or from metallic coated scrap pieces of which the upper part of the melting range of the metallic core layer has an overlap with the lower part of the melting range of the metallic core layer. The metallic coating layer is at least partially removed from the metallic core layer of said scrap pieces by agitating the scrap pieces at an elevated temperature T above the solidus temperature of the metallic coating layer and below the liquidus temperature of the metallic core layer, together with abrading particles. The abrading particles are brought into fluidisation during the agitating of the metallic coated scrap pieces, thereby forming a fluidised bed.

Abstract: A method for removing contaminants from a material (39), such as resin particles, includes the steps of providing a vessel (50), directing a cleaning fluid (41) into the vessel (50), transferring the material into the vessel (50), moving the material within the vessel (50), and removing contaminants from the material as cleaning fluid (41) flows in the vessel (50). The vessel (50) has a vessel inlet (52) and a spaced apart vessel outlet (54). The cleaning fluid (41) is directed into the vessel (50) so that the cleaning fluid (41) flows in the vessel (50). The material (39) is transferred into the vessel (50) through the vessel inlet (52), and the material (39) is then moved within the vessel (50) from the vessel inlet (52) towards the vessel outlet (54). The cleaning fluid (41) flowing in the vessel (50) contacts the material (39) while the material is moving from the vessel inlet (52) toward the vessel outlet (54) and removes contaminants (39) from material (39).

Abstract: A method and apparatus for removing a first liquid from a surface of a substrate is provided. A second liquid is supplied to at least part of a surface of a substrate having a rotary movement. The rotary movement has a center of rotation and an edge of rotation. The second liquid is directed from the center of rotation to the edge of rotation using a nozzle. A dry zone is created on the substrate as the position of the spray moves from the center of rotation to the edge of rotation. As a result, the first liquid and the second liquid are removed from the surface of the substrate.

Abstract: A cleaning apparatus according to the present invention is provided with a brush drive mechanism which brings a brush being rotating closer to a substrate, measures electrical potentials generated on a plurality of conductor patterns formed on the substrate, by a contact and separation with/from tips of scrub materials of the brush being rotating, and controls a positioning of the brush by use of the measurement results. With the process as described above, it is possible to treat uniformly a surface to-be-cleaned for a large-sized substrate, with the cleaning brush. Consequently, it is possible to form a highly qualified transistor for liquid crystal display on the substrate having been cleaned, with enhancing yield.

Abstract: A moving light washer places moving light parts into a crate that has holes and drain parts therein, and uses the crate in a dishwasher to wash the the moving light parts. The crate can also be used for storing the lights, such that the same structure that is used for washing the lights is also used at a different time for storing the lights.

Abstract: Washing agent dispenser for a household washing machine, namely a dishwasher, which dispenser has a body (2) delimiting at least a recess (3) for containing a certain amount of washing agent, comprising occlusion means (4,5) for said recess (3). According to the invention, said occlusion means (4,5) are capable of taking at least two different operating conditions for a partial opening of said recess (3), one for loading said amount of washing agent, the other for its subsequent dispensing.

Abstract: Drill cuttings associated with drilling fluid are thermally cleaned. The wet cuttings are fed into a vessel chamber having mechanical mixers, such as ribbon blenders, extending lengthwise of the chamber. Direct heating is applied to the chamber contents by introducing hot combustion gas from a heater. A combination of direct heating and mechanical back mixing of wet colder cuttings with drier hotter cuttings results in conditioning and conduction heating of the wet cuttings. The drilling fluid is evaporated and removed as gas. Dried cuttings are separately recovered. Caking and agglomeration of the solids is reduced.

Abstract: Method for the removal and recovery of the oily component from cuttings coming from the drilling of oil wells by treatment of the cuttings with a solvent, which can be compressed to the liquid state, at a pressure value ranging from 45 to 80 bar and a temperature corresponding to the saturation value.

Abstract: A method of processing thin flat articles, particularly semiconductor wafers, utilizing sonic energy. In one aspect, the invention is a method comprising: supporting a substrate in a generally horizontal orientation and transmitting sonic energy to the substrate while flowing liquid onto both sides of the substrate to loosen particles on both sides of the substrate while maintaining said orientation. In another aspect, the invention is a cleaning method comprising: applying cleaning fluid to one side of a thin flat article while supporting the article in a generally horizontal orientation; and applying energy to the other one of the sides with sufficient power to produce vibration on the one side in the area of the cleaning fluid to loosen particles on the one side, while maintaining said orientation.

Abstract: A method for separating a substance such as a hydrocarbon from a particulate material such as soil is provided. An aqueous slurry is formed and a shear force is applied to the slurry, such as in a reversible helical screw conveyor, while the slurry is vibrated. The substance thus separated can then be removed from the particulate material.

Abstract: A method of cleaning encrusted ballast comprises the steps of screening the encrusted ballast to separate detritus from the ballast, washing the screened ballast with water while removing the separated detritus on a conveyor belt unit, clarifying the washing water to produce a clarified water portion and washing water sludge, and disposing of the washing water sludge by moving it to the detritus on the conveyor belt unit for common removal with the detritus.

Abstract: Embodiments of the invention are directed to substrate processing apparatuses and methods for processing substrates. In one embodiment, a substrate processing apparatus includes a processing chamber, a substrate holder inside of the processing chamber for holding a substrate, and a sonic box in the processing chamber for supplying sonic waves substantially perpendicularly to the substrate. The sonic box may comprises a membrane, and a transducer coupled to the membrane.

Abstract: A method for preparing a workpiece surface utilizing two more fluids of differing density and miscibility which create one or more fluid interfaces wherein the fluids are chosen such that the solubility or affinity of one of the fluids is high for a material to be removed from the workpiece surface while the other fluid has a low solubility or affinity for the material to be removed. The workpiece surface is treated by passing the workpiece through the fluid interface. The two or more fluids are preferably dispensed into an apparatus and allowed to settle into two or more predominant layers separated by an interface. Surface preparation techniques which may benefit from the present invention include etching, cleaning or drying processes and the like.

Abstract: An apparatus and method for drying substrates. The inventive apparatus comprises: an object support member for supporting at least one substrate in a process tank having one or more support sections comprising capillary material. The inventive method is a method of removing liquid from a wet substrate in a process tank comprising contacting the wet substrate with capillary material. In another aspect, the invention is a method of drying at least one substrate having a surface in a process tank comprising: submerging the substrate in a liquid having a liquid level; supporting the submerged substrates in the process tank; supplying a drying vapor above the liquid level; lowering the liquid level or raising the substrate so that the liquid level is below the substrate, thereby removing a major portion of liquid from the substrate surface; and removing remaining liquid from the substrate surface with capillary material.

Abstract: A method for separating a substance such as a hydrocarbon from a particulate material such as soil is provided. An aqueous slurry is formed and a shear force is applied to the slurry, such as in a reversible helical screw conveyor, while the slurry is vibrated. The substance thus separated can then be removed from the particulate material.

Abstract: In a method and apparatus for cleaning the front surface of a mounted lens a web is moved to a lowered position against the lens. A first segment of the web is then slackened. The first segment of web is then rubbed against the lens. Following the rubbing the web is pulled taut while the web is still in the lowered position. A second segment of web can be wiped against the lens while the web is held taut. The first segment can be wet and the second segment dry.

Abstract: Embodiments of the invention are directed to substrate processing apparatuses and methods for processing substrates. In one embodiment, a substrate processing apparatus includes a processing chamber, a substrate holder inside of the processing chamber for holding a substrate, and a sonic box in the processing chamber for supplying sonic waves substantially perpendicularly to the substrate. The sonic box may comprises a membrane, and a transducer coupled to the membrane.

Abstract: A plant for the continuous washing of plastic material in scales. The plant having a washing apparatus, at least one filtering unit connected to the apparatus for purifying the washing fluid and means for varying the time the scales remain in the washing apparatus as a function of the quantity of scales contained at that same moment in the same apparatus.

Abstract: In a ring shaped part washing method an ultrasonic vibration plate 33 is disposed in a washing tank 23 filled with a washing fluid 31, and ultrasonic waves generated by the ultrasonic vibration plate 33 are applied to ring-shaped parts 27 disposed in the washing tank 23 to thereby remove foreign substances stick to the ring-shaped parts 27 therefrom. The ring-shaped parts 27 are disposed inclinedly with respect to the ultrasonic vibration plate 33 in such a manner that the axes 27a of the ring-shaped parts 27 intersect with the plate surface 33a of the ultrasonic vibration plate 33 at an angle &thgr; other than a right angle.

Abstract: The invention relates to a method for conveying dishes in a tunnel dishwasher and to a tunnel dishwasher. The tunnel dishwasher (1) comprises at least one washing zone (2, 3, 4) and a first conveyor (5a) arranged to move alternately forwards (F) and backwards (R), during which forward (F) motion the dishes (11) to be washed are arranged to be moved along with the first conveyor (5a) relative to the washing zone (2, 3, 4). The tunnel dishwasher (1) further comprises at least a second conveyor (5b) arranged to move in the opposite direction relative to the first conveyor (5a) in such a way that the first and the second conveyor (5a, 5b) are arranged to convey the dishes (11) to be washed alternately forwards (F).

Abstract: A method for cleaning a substrate with sherbet-like composition, comprising mixing the liquid organic agent and pure water in a mixing vessel to form a mixture, supercooling the mixture uniformly at a predetermined temperature while stirring the mixture, wherein the stirring includes creating vortices in the mixture, growing the vortices and diffusing the grown vortices in the mixture, thus providing sherbet-like cleaning composition and moving the sherbet-like cleaning composition relative to the substrate to be cleaned.

Abstract: A method of removing cured silicone polymer deposits from electronic components. The components are immersed in a preheated solution of a quaternary ammonium fluoride in a hydrophobic non-hydroxylic aprotic solvent with agitation. The components are then immersed in a preheated solvent consisting essentially of a hydrophobic aprotic solvent with agitation. This is followed by a rinse and spray of the components with a hydrophilic, essentially water soluble solvent, with agitation. The components are then immersed in a water bath and then rinsed with a pressurized spray of water and then dried with a N2 blow dry.

Abstract: The present invention relates to a process for pickling hot rolled, hot rolled & annealed, and cold rolled & annealed stainless steel strip in a continuous fashion. The process comprises a series of pre-pickling tanks and pickling tanks, and optionally includes a scrubber-brush tank, a de-smutting tank, a filtration unit and a heat exchanger.

Abstract: A cleaning apparatus for cleaning solder paste off the bottom side of a printed circuit board stencil includes a container of cleaning solution therein and a blade holder that is movable between a wiping position and the container of cleaning solution. A wiping blade is mounted in the blade holder. The blade holder, with the blade mounted thereon, is reciprocated back and forth when in communication with a stencil to be cleaned. The blade is moved from the wiping position in communication with the stencil into the cleaning solution in the container. A pneumatic piston and rotary actuator provides controlled movement of the wiping blade. The wiping blade may be vibrated during wiping to improve removal of solder paste from the stencil and the cleaning solution may be ultrasonically vibrated to improve removal of solder paste from the wiping blade. The wiping blade may also be pulsed into a sponge to remove excess cleaning solution prior to the next cleaning cycle.