Abstract: Methods of cleaning workpieces are described. One method includes performing both a sonication cleaning operation and a rinse cleaning operation within a single cleaning tank. Another cleaning method described includes the use of cross flow of cleaning liquid within a cleaning tank while performing a rinse clean. The cleaning method includes the oscillation of one or more workpieces in the cleaning tank to perform the rinse clean.

Abstract: A process chamber for processing semi-conductor wafers. The chamber includes at least one rotor within the process chamber. The rotor is adapted to receive and/or process semi-conductor wafers. The top of the process chamber also includes a tiltable rim. This rim tilts from a non-inclined position to an inclined position. The wafers may be loaded into and unloaded from the process chamber when the rim is in its inclined position.

Abstract: The disclosure relates to a continuous cleaning method for cleaning a moving fabric in a paper machine. The method uses one or more cleaning stages. In one embodiment, one cleaning stage applies steam to heat and soften contaminants on the fabric followed by the application of water, preferably superheated water, to remove the contaminants. Another cleaning stage may apply hot water, steam and/or superheated water via an encapsulated shower and evacuation chamber making it possible to clean the width of the fabric without substantial rewet.

Abstract: A carwash system is disclosed wherein a spray arm dependingly mounted to an overhead longitudinally movable carriage for dispensing fluids onto the exterior surfaces of a vehicle in a wash bay unidirectionally circumnavigates the vehicle for multiple circuits while performing one or more wash functions by coordinating longitudinal and rotational movements of the arm through the selective operation of two independent motor drives. Electrical power and/or data is carried to and from electrical devices on the arm by way of a slip ring conductor which is mounted coaxially with the arm pivot on the bottom side of the carriage. The fluid supply conduit also passes concentrically through this pivot.

Abstract: In a substrate processing method according to the present invention, a cleaning liquid nozzle supplies a rinsing liquid to a central portion of a substrate and thereafter moves from a position corresponding to the central portion of the substrate to a position corresponding to a peripheral, edge portion thereof while supplying the rinsing liquid before stopping at the position corresponding to the peripheral edge portion. Next, a drying liquid nozzle moves from the position corresponding to the peripheral edge portion to the position corresponding to the central portion while supplying a drying liquid. Then, the drying liquid nozzle is kept stationary at the position corresponding to the central portion for a predetermined period of time while supplying the drying liquid. Thereafter, a gas nozzle moves from the position corresponding to the central portion to the position corresponding to the peripheral edge portion while supplying an inert gas.

Abstract: A vacuum trap, a plasma etch system using the vacuum trap and a method of cleaning the vacuum trap. The vacuum trap includes a baffle housing; and a removable baffle assembly disposed in the baffle housing, the baffle assembly comprising a set of baffle plates, the baffle plates spaced along a support rod from a first baffle plate to a last baffle plate, the baffle plates alternately disposed above and below the support rod and alternately disposed in an upper region and a lower region of the baffle housing.

Abstract: The transporting process from cleaning and drying processing of a substrate in a cleaning/drying processing unit in a cleaning/drying processing group to post-exposure bake (PEB) of the substrate in a thermal processing group for post-exposure bake in a cleaning/drying processing block is described below. First, after the substrate after exposure processing is subjected to the cleaning and drying processing in the cleaning/drying processing group, a sixth central robot takes out the substrate from the cleaning/drying processing group and carries that substrate into the thermal processing group for post-exposure bake in the cleaning/drying processing block.

Abstract: An apparatus and method are disclosed in which a semiconductor substrate having a surface containing contaminants is cleaned or otherwise subjected to chemical treatment using a foam. The semiconductor wafer is supported either on a stiff support (or a layer of foam) and foam is provided on the opposite surface of the semiconductor wafer while the semiconductor wafer is supported. The foam contacting the semiconductor wafer is pressurized using a form to produce a jammed foam. Relative movement between the form and the semiconductor wafer. such as oscillation parallel and/or perpendicular to the top surface of the semiconductor wafer. is then induced while the jammed foam is in contact with the semiconductor wafer to remove the undesired contaminants and/or otherwise chemically treat the surface of the semiconductor wafer using the foam.

Abstract: A method is disclosed for removing deposits from rotating parts of a gas turbine engine while under full fire or idle speed utilizing a particulate coke composition. The coke composition may be introduced directly into the combustion chamber (combustor) of the gas turbine or, alternatively, anywhere in the fuel stream, water washing system, or the combustion air system. By kinetic impact with the deposits on blades and vanes, the deposits will be dislodged and will thereby restore the gas turbine to rated power output. If introduced into the compressor section, the coke particles impinge on those metal surfaces, cleaning them prior to entering the hot gas section where the process is repeated.

Abstract: Provided is a liquid processing apparatus in which a target substrate is horizontally held on a substrate holding unit and rotated around a vertical shaft, and the chemicals are supplied from a chemical supplying unit to the bottom surface of the target substrate that is rotating. In particular, the liquid processing apparatus performs a first step in which the chemicals are supplied to the target substrate while rotating the target substrate at a first rotation speed, a second step in which the supply of the chemicals is halted and the chemicals are thrown off by rotating the target substrate at a second rotation speed higher than the first rotation speed, and a third step in which the rinse liquid is supplied to the target substrate while rotating the target substrate at a third rotation speed equal to or lower than the first rotation speed.

Abstract: In the case of a device and a method for cleaning substrates on a carrier, to the underside of which the substrates are fastened so as to be parallel to and slightly apart from one another, the carrier has in its interior a plurality of longitudinal channels, which run parallel to one another. As a result of the sawing of the wafers, they merge, via openings, into interstices between the substrates. As a result of a relative movement, an elongate tube, from which cleaning fluid is let out, is introduced into one of the longitudinal channels, the relative movement being achieved substantially through moving of the carrier.

Abstract: A cleaning apparatus is provided. The apparatus includes a casing that defines an inlet opening on a first surface thereof and an outlet opening on a second surface thereof. An elongate path is formed therebetween for receiving an article to be cleaned. A sanitizing device is carried by the casing in proximity to the path for sanitizing the article to be cleaned. A first roller is carried by the casing and extends into the path. The first roller is configured to rotate in the direction of the path to thereby translate the article to be cleaned from the inlet opening to the outlet opening.

Abstract: In a method of manufacturing a disk drive device, a cleaning process and an assembly process are performed in succession in a clean room having a predetermined cleanness level. The cleaning process includes an alkali cleaning process, a first purified water cleaning process, a second purified water cleaning process, a spray cleaning process, a draining process and a drying process. In the first purified water cleaning process, purified water ultrasonic wave cleaning is sequentially performed on the base member of the disk drive device to be cleaned by using ultrasonic waves of frequencies of 40 kHz, 68 kHz and 132 kHz in purified water filled in a first purified water cleaning tank. The cleaned base member and other components having a predetermined cleanness level are assembled in the assembly process continuous from the cleaning process.

Abstract: A cleaning and drying-preventing method including: positioning a nozzle in a container such that a funnel-like inner circumferential surface of the container is located around a periphery of a distal end of the nozzle; sucking a liquid in the nozzle to retract a level of the liquid to a side of a supply passage; supplying a solvent into the container to form a swirl flow of the solvent turning around the distal end of the nozzle, and cleaning the nozzle by the swirl flow; supplying a solvent into the container to form a liquid pool of the solvent; and further retracting the level of the liquid in the nozzle to the side of the supply passage. A liquid layer, an air layer, and a solvent layer are formed in the nozzle in this order from the side of the supply passage, to prevent drying of the liquid in the nozzle.

Abstract: A hair brush that permits quick and easy removal of hair has a handle attached to a head. The head is made up of at least two frames that are mounted to the handle through cantilevers that permit movement of the frames relative to one another. The bristles are mounted to the frames, preferably in single rows. A force applied to one frame moves that frame relative to the other frame and the handle, thereby permitting the user to reach between the frames to remove any hair that is caught in the bristles. The brush allows a gap between the bristles to be enlarged, thereby making removal using human fingers much easier. Repeated movement and return of the frames to their resting position can cause the hair fibers to work away from the bristle bases and make removal much easier.

Abstract: The invention is directed at systems and methods which provide for effective cleaning and drying of vehicles of different shapes and sizes. The invention in one example includes a vehicle washing apparatus comprising a conveyor system to move a vehicle along a path, and a bridge assembly supported above a vehicle and moveable along the length thereof. At least one trolley assembly is operatively supported by the bridge assembly and is moveable in a direction generally transverse to the movement of the bridge assembly. At least one cleaning arm assembly for delivering cleaning fluid to or for brushing the surface of a vehicle is operatively supported by the at least one trolley assembly or bridge.

Abstract: In a substrate processing apparatus consisting of an indexer block and a processing block, a substrate is transported between the indexer block and the processing block by an indexer robot. The indexer robot includes two hands that are provided one above the other on a rotating stage. The other hand moves in a vertical direction to one hand. A difference in height between the one hand and the other hand can be adjusted so as to be equal to spacing between substrate storing grooves of a carrier where the substrate that is to be carried into the indexer block is stored. In addition, the difference in height between the one hand and the other hand can be adjusted so as to be equal to spacing between support plates of a substrate platform provided between the indexer block and the processing block.

Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.

Abstract: A method and system for cleaning a surface, having particulate matter thereon, of a substrate features impinging upon the surface a jet of a liquid having coupling elements entrained therein. A sufficient drag force is imparted upon the coupling elements to have the same move with respect to the liquid and cause the particulate matter to move with respect to the substrate.

Abstract: Provided are a substrate liquid processing apparatus, a substrate liquid processing method, and a computer readable storage medium having a substrate liquid processing program stored therein that can prevent the occurrence of the electrostatic breakdown caused by the discharge of electric charges in a substrate. The substrate liquid processing apparatus processes a circuit-forming surface of the substrate with a chemical liquid. Furthermore, prior to processing the substrate with the chemical liquid, the substrate liquid processing apparatus performs an anti-static process for an surface opposite to the circuit-forming surface of the substrate by an anti-static liquid, thereby emitting the electric charges on the substrate.

Abstract: An apparatus and method for cleaning workpieces (5) using two pairs of substantially vertical rotating roller brushes (15) at each brush station whereby rotation of said brushes (15) propel workpieces (5) from one brush station to the next. Workpieces (5) are held for a predetermined period of time at each station by edgewheels (30, 31) which also rotate the workpieces (5). Cleaning fluid is sprayed onto workpieces (5) as they rotate to assist in removing particulate contamination. Method involves inserting a single workpiece (5) in between two pairs of rotating roller brushes (15) which scrub said workpiece as it is rotated by a pair of edgewheels (30, 31). There may be a divider shield (9) in between each brush station to prevent a large proportion of particulate matter and use cleaning fluid from traveling between the brush stations.

Abstract: The present invention relates to a device (1) for cleaning plastic chips, comprising a container (2) for the reception of the plastic chips and a stirring device (4) which is rotatably arranged about a rotational axis (400) in the container for stirring the plastic chips, wherein the stirring device (4) has a rotational body (5) which extends along the rotational axis (400), wherein the rotational body (5) has a cross section having a varying distance (a) from the rotational axis (400).

Abstract: Washing machine for screen that includes a closed washing chamber having internal nozzles for cleaning the screen. The nozzles are provided on a flushing frame enclosing the screen, and the flushing frame may be moved upwards and downwards within the chamber whereby the screen is flushed and cleaned. A method for cleaning the screen in the washing machine is also described.

Abstract: Several methods of removing contaminant particles from a surface of a substrate are disclosed herein. In one embodiment, the method includes directing an incompressible fluid spray onto a surface of a substrate to remove contaminant particles from the surface. In an embodiment, the surface of the substrate and the nozzle are both immersed in an incompressible fluid. The fluid can flow across the surface of the substrate to remove the contaminant particles from the area. The fluid spray can be positioned normal to the substrate surface, or can be positioned at an angle relative to the substrate surface.

Abstract: A liquid processing apparatus, capable of preventing a cleaning solution from remaining on a lifting member of a target object, thereby preventing an attachment of a cleaning solution to an opposite surface of a target object, and preventing an inflow of the cleaning solution into an inert gas supply part to efficiently supply the inert gas to the object, is disclosed. The liquid processing apparatus includes a hollow-shaped support plate to support an object, a hollow-shaped rotary shaft fixedly connected to the support plate, a rotary drive part to rotate the rotary shaft in a predetermined rotating direction, and a lift pin plate arranged in a hollow of the support plate to have lift pins supporting a main body and the processed object. A cleaning solution supply part to supply a cleaning solution and an inert gas supply part to supply an inert gas are extended in a hollow of the rotary shaft.

Abstract: An apparatus for treating containers, including a transport device which transports the containers along a specified transport path, the transport device including a plurality of holding elements for holding the containers, with the holding elements being transported along the specified transport path. The apparatus includes a cleaning device for sterilizing the holding elements at least in sections.

Abstract: A tablet compressing machine and a process for cleaning a tablet compressing machine with a rotor unit, in which an actuator is provided for the purpose of tilting a sealed housing of the tablet compressing machine, in which the rotor unit, a rinsing unit and the powder supply are disposed, so that the cleaning liquid may drain off horizontal surfaces in the sealed housing. The process therefore comprises the steps of distributing the cleaning liquid, tilting the tablet compressing machine and discharging the cleaning liquid. Retrofitting of existing tablet compressing machines is possible.

Abstract: A conveyor dishwasher (2) has a control apparatus (50) for automatically setting the quantity of final rinse liquid sprayed in the final rinse zone (18) per unit time as a function of the conveying speed and/or as a function of the type of washware conveyed through the final rinse zone (18). A rinse aid metering apparatus (57) is also provided which is designed to add in a metered fashion a constant quantity of rinse aid per unit time to the fresh water provided for final rinsing purposes independently of the quantity of final rinse liquid sprayed in the final rinse zone (18) per unit time.

Abstract: A method and apparatus for washing a vehicle or water craft includes heating only a quantity of clean wash fluid required to completely wash the exterior of the watercraft to a first predetermined temperature. The heated clean wash fluid is discharged through one or more nozzles on a wash station platform at a predetermined temperature so that the temperature of the wash fluid as it strikes the hull of the water craft is at a second minimum temperature to kill organisms adhered to the vehicle. The clean wash fluid is applied in a number of successive wash cycles each covering a predetermined section of the exterior of the watercraft over a predetermined discharge time period for each section. Rotary spinning, oscillating, fixed and manually moveable nozzles are mounted on the wash station platform to automatically and manually provide wash fluid over the entire exterior surface of the water craft.

Abstract: Provided is a method and apparatus for cleaning a photomask. The photomask including a first region and a second region surrounding the first region, a pattern to be protected disposed on the first region, and a material to be removed exists on the second region. A cleaning liquid is sprayed from an inside region of the second region toward an outer region of the second region to remove the material, and a gas is blown from the first region toward the second region to protect the pattern.

Abstract: The invention relates to a method for removing at least part of at least one layer of a composite coating that is formed of fibers and at least one resin that is present on the surface of the body of a gas cartridge. In said method, at least one liquid nitrogen stream is dispensed at a temperature less than ?100 DEG C at a pressure of at least 00 bars upon contact with said coating so as to remove at least part of said coating layer present on the body of the gas cartridge.

Abstract: A tool for cleaning a personal care applicator, particularly an applicator for a product that is subject to dry out. In some embodiments, the invention is implemented as a reusable cleaning tool. In other embodiments, the invention is implemented as a disposable, single-use or limited use cleaning tool. The tool comprises a relatively flat body having first and second exterior surfaces, and one or more cleaning regions that extend through the body. As an applicator is drawn through the cleaning region, dried out product is scraped off the applicator.

Abstract: A cleaning apparatus a metal organic chemical vapor deposition (MOCVD) device incorporating a susceptor rotatably holding the plurality of substrate holders through a rotating mechanism of a bearing; and a cleaning method for efficiently removing deposits from components of the device. The cleaning apparatus includes storage for the susceptor and the plurality of substrate holders; a means for rotating the susceptor and/or a means for rotating the plurality of substrate holders; a heater; a cleaning gas-introducing port; and a cleaning gas-discharging port. The susceptor holding the plurality of substrate holders is stored in the cleaning apparatus after the device is used for vapor phase epitaxy, and cleaning gas is introduced to the susceptor while the susceptor and/or each of the substrate holders is rotated, so as to remove deposits deposited during vapor phase epitaxy.

Abstract: A method of washing eggs in a manner which allows controlling the level of pollutants of the washing fluid. At least two sprayer units are located over a conveyor in which eggs to be washed travel in a conveying direction. The eggs are engaged by a brush at each sprayer station. At least two sprayer units located over the conveyor receive washing fluid, spray the washing fluid over the eggs and collect the washing fluid in a collector. The intake of washing fluid, the spraying of the washing fluid and the collecting of the washing fluid at each of the sprayer units is confined to that sprayer unit. Each sprayer unit except the farthest downstream sprayer unit receives washing fluid from the collector of the next downstream sprayer unit.

Abstract: A cylindrical dedusting apparatus has an upper material infeed opening to introduce material into a frusto-conical infeed hopper centered over the tip of a conical wash deck supported over an air infeed conduit. Air is blown through slots and openings in the surface of the wash deck to separate dust and debris from the particulate material. The dust-laden air is discharged by passing between the infeed hopper and a cylindrical sleeve to enter into a circular collector for discharge from the apparatus. Flow rate of material over the wash deck is adjusted by vertically moving the infeed hopper within the sleeve relative to the wash deck, the tip serving as a stopper to define the dimension of the gap through which material flows onto the wash deck. Cleaned material passes through a lower discharge opening while dirty air is removed through a radially oriented discharge conduit from the circular collector.

Abstract: A substrate is placed on a plurality of support pins within an opening of a carrier, such that a gap exists between the radial perimeter of the substrate and the carrier. The substrate and carrier are passed in a linear direction through a meniscus generated between respective faces of upper and lower proximity heads. Each of the upper and lower proximity heads includes a plurality of meniscus nozzles configured to supply liquid to the meniscus. A plurality of vacuum ports are formed on the respective face of each of the upper and lower proximity heads and are arranged to completely surround the plurality of meniscus nozzles. Liquid of the meniscus is evacuated from the gap between the radial perimeter of the substrate and the carrier so as to reduce a size and a frequency of at least one of entrance or exit marks on the substrate.

Abstract: A method for a stage device of an electron beam exposure system which conducts a cleaning operation and an electron beam (EB) exposure operation is disclosed. The method includes the steps of moving a movable stage within a predetermined range and regulating pressure of gas supplied to an air bearing; and setting a floating height of the movable stage in the cleaning operation lower than that in the EB exposure operation and setting the pressure in a differential pumping portion in the cleaning operation equal to that in the EB exposure operation, or setting the floating height of the movable stage in the cleaning operation equal to that in the EB exposure operation and setting the pressure in the differential pumping portion in the cleaning operation higher than that in the EB exposure operation.

Abstract: A method for cleaning a semiconductor wafer composed of silicon directly after a process of chemical mechanical polishing of the semiconductor wafer includes transferring the semiconductor wafer from a polishing plate to a first cleaning module and spraying both side surfaces of the semiconductor wafer with water at a pressure no greater than 1000 Pa at least once while transferring the semiconductor wafer. The semiconductor wafer is then cleaned between rotating rollers with water. The side surfaces of the semiconductor wafer are sprayed with an aqueous solution containing hydrogen fluoride and a surfactant at a pressure no greater than 70,000 Pa. Subsequently, the side surfaces are sprayed with water at a pressure no greater than 20,000 Pa. The wafer is then dipped into an aqueous alkaline cleaning solution, and then cleaned between rotating rollers with a supply of water. The semiconductor wafer is then sprayed with water and dried.

Abstract: A cleaning method is provided for brush cleaning a surface of a substrate. The method comprises scrubbing a first surface of the substrate with a brush having a first surface geometry; and then scrubbing the first surface of the substrate with a brush having a second surface geometry, wherein the first and the second surface geometries are different. Numerous other aspects are provided.

Abstract: In an automatic wash, a control unit operates a boom arm around a vehicle in a bay by moving a bridge along a lengthwise vehicle orientation, moving a trolley on the bridge along a widthwise vehicle orientation, and rotating the boom arm about the trolley. The boom arm is coupled to a mount which is flexibly coupled to the trolley such that boom arm impact displaces the mount and the trolley. The displacement may be two-dimensional and/or angular. In response, the control unit determines whether an impact has occurred by comparing the data to a baseline. If there is an impact, the control unit relocates the boom arm and may continue the wash process. If a sufficient force impact occurs that the control unit cannot correct, the boom arm may disengage from the mount which may trigger a breakaway sensor and cause the control unit to abandon the wash.

Abstract: An apparatus and method for treating a wet solid is provided. The apparatus comprises a porous belt and nozzles for applying on or more liquids to the wet solid. The contact with the liquids is achieved in a treatment chamber which is configured for movement between a first position, separated from the belt, and a second position, where the treatment chamber is in sealing contact with the belt.

Abstract: Provided is an apparatus, system and method for treating a substrate, and more particularly, a substrate treating apparatus having a cluster structure, a substrate treating system, and a substrate treating method using the substrate treating system. The substrate treating apparatus includes a load port on which a container containing a substrate is installed, a plurality of process modules treating the substrate, a transfer module disposed between the load port and the process modules, and transferring the substrate between the container and the process modules, and a buffer chamber disposed between neighboring ones of the process modules, and providing a space for carrying the substrate between the neighboring process modules.

Abstract: A mobile device for transporting, tracking and processing medical instruments. The device comprises a cart including at least one receptacle for receiving an instrument container having instruments stored therein. The cart also includes plumbing for circulating processing fluids through the instrument container and a communications system for communicating tracking data associated with the instrument container and the cart.

Abstract: A method of processing a substrate. In one embodiment, the invention can be a method of processing a substrate comprising: supporting the substrate in a horizontal orientation; rotating the substrate; providing a fluid dispensing apparatus adjacent a surface of the substrate, the fluid dispensing apparatus comprising a body having an outer surface and a first conduit terminating as a first hole in the outer surface of the body and a second conduit terminating as a second hole in the outer surface of the body, the first hole oriented at a non-normal angle relative to the substrate and offset a first radial distance from a rotational center-point of the substrate; and ejecting liquid out of the first hole into contact with the substrate at the rotational center-point and ejecting liquid out of the second hole into contact with the substrate at a second radial distance from the rotational center-point.

Abstract: In an embodiment, the present invention discloses a EUV cleaner system and process for cleaning a EUV carrier. The euv cleaner system comprises separate dirty and cleaned environments, separate cleaning chambers for different components of the double container carrier, gripper arms for picking and placing different components using a same robot handler, gripper arms for holding different components at different locations, horizontal spin cleaning and drying for outer container, hot water and hot air (70 C) cleaning process, vertical nozzles and rasterizing megasonic nozzles for cleaning inner container with hot air nozzles for drying, separate vacuum decontamination chambers for outgassing different components, for example, one for inner and one for outer container with high vacuum (e.g., <10?6 Torr) with purge gas, heaters and RGA sensors inside the vacuum chamber, purge gas assembling station, and purge gas loading and unloading station.

Abstract: In an embodiment, the present invention discloses a EUV cleaner system and process for cleaning a EUV carrier. The euv cleaner system comprises separate dirty and cleaned environments, separate cleaning chambers for different components of the double container carrier, gripper arms for picking and placing different components using a same robot handler, gripper arms for holding different components at different locations, horizontal spin cleaning and drying for outer container, hot water and hot air (70 C) cleaning process, vertical nozzles and rasterizing megasonic nozzles for cleaning inner container with hot air nozzles for drying, separate vacuum decontamination chambers for outgassing different components, for example, one for inner and one for outer container with high vacuum (e.g., <10?6 Torr) with purge gas, heaters and RGA sensors inside the vacuum chamber, purge gas assembling station, and purge gas loading and unloading station.

Abstract: In an embodiment, the present invention discloses a EUV cleaner system and process for cleaning a EUV carrier. The euv cleaner system comprises separate dirty and cleaned environments, separate cleaning chambers for different components of the double container carrier, gripper arms for picking and placing different components using a same robot handler, gripper arms for holding different components at different locations, horizontal spin cleaning and drying for outer container, hot water and hot air (70 C) cleaning process, vertical nozzles and rasterizing megasonic nozzles for cleaning inner container with hot air nozzles for drying, separate vacuum decontamination chambers for outgassing different components, for example, one for inner and one for outer container with high vacuum (e.g., <10?6 Torr) with purge gas, heaters and RGA sensors inside the vacuum chamber, purge gas assembling station, and purge gas loading and unloading station.

Abstract: A cleaning apparatus for cleaning a hair-cutting portion of an electric hair-cutting device includes a cleaning-liquid basin for receiving the hair-cutting portion of the electric hair-cutting device in a central area such that the hair-cutting portion is at least partially immersed in the cleaning liquid. The electric hair-cutting device is cleaned by generating a cleaning-liquid flow revolving within the basin around the central area of the basin, the hair-cutting portion being at least partially immersed in the cleaning liquid. The liquid flow effectively entrains debris away from the hair-cutting portion.

Abstract: A vehicle washing system including a frame having an entrance and an exit side. The frame linearly reciprocates along a plurality of rails that extend generally in the direction between the entrance side and the exit side to travel over a stationary vehicle. The frame has a first fluid dispensing device located in the half adjacent its entrance side and a second fluid dispensing device located adjacent its exit side. The first and second fluid dispensing devices include a plurality of manifolds each of which is in communication with a supply of fluid to apply fluid to the vehicle. The vehicle washing system includes a control system that is in communication with each of the manifolds in the first and second fluid dispensing devices to selectively and independently control the type of fluid emitted from each of the manifolds and in what order during the vehicle cleaning process.

Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes an index part including a port on which a container containing a substrate is placed and an index robot, a processing part for processing the substrate, and a buffer unit disposed between the processing part and the index part to allow the substrate transferred between the processing part and the index part to be temporarily stayed therein. The processing part includes a glue removal processing module, a substrate cooling processing module, a heat processing module, and a functional water processing module which are disposed along a transfer passage for transferring the substrate.