Abstract: Disclosed is a liquid processing jig for performing a predetermined processing on a workpiece using a processing liquid. The liquid processing jig includes: a liquid processing unit formed on a surface of the liquid processing jig and configured to perform a predetermined processing on the workpiece by the processing liquid; a liquid supplying unit configured to supply the processing liquid to the liquid processing unit; a liquid supplying channel configured to connect the liquid supplying unit and the liquid processing unit and supply the processing liquid from the liquid supplying unit to the liquid processing unit; and a liquid discharging channel configured to discharge the processing liquid from the liquid processing unit. The liquid supplying unit, the liquid supplying channel, the liquid processing unit, and the liquid discharging channel are provided to cause the processing liquid to flow by a capillary phenomenon.

Abstract: The invention provides a heat transfer composition comprising R-1234ze (E), R-32 and 1,1,1,2-tetrafluoroethane (R-134a).

Abstract: A cleaning composition and process to remove carbon deposits from combustion equipment components is provided. The de-carbonizing composition is packaged in certain embodiments in an aerosol propellant. The inventive composition is also readily used as a liquid or an atomized mist that is readily introduced into the intake manifold through a tube tolerant of engine inlet operational temperatures and conditions. The invention introduces the composition by a process that precludes the need for engine disassembly.

Abstract: The present invention relates to systems and methods for generating germicidal compositions for use in a wide variety of settings, including agricultural settings (e.g., animal bedding), food production settings, hospitality settings, health care settings, health club settings, exercise facility settings, research based settings, veterinarian settings, medical settings, hydraulic fracturing settings, and/or any setting requiring disinfection.

Abstract: A manufacturing apparatus includes a chuck for contacting a peripheral portion of a workpiece. The apparatus includes a nozzle to eject a process fluid (liquid or gas) toward a first surface while the workpiece is in contact with the chuck. The apparatus also includes a plate having an opening configured such that a support fluid (liquid or gas) can be ejected toward a second surface of the workpiece while the workpiece is in contact with the chuck. In an example, the support fluid can be used to counteract a displacement of the interior portion in the direction perpendicular to the plane of the workpiece due to, for example, gravity and/or hydrostatic pressure of the process fluid.

Abstract: Apparatuses, and related methods, for processing a workpiece that include a particular barrier structure that can overlie and cover a workpiece. Apparatuses, and related methods, for processing a workpiece that include a particular movable member that can be positioned over and moved relative to a workpiece. Apparatuses, and related methods, for processing a workpiece that include a particular ceiling structure that can overlie a processing chamber. Nozzle devices, and related methods, that include a particular annular body. Nozzle devices, and related methods, that include a particular first, second, and third nozzle structure.

Abstract: A substrate cleaning method that includes: a step in which, while a substrate holder is being continuously rotated, a to-be-discharged position of the cleaning liquid on the substrate is changed to an eccentric position deviated from the central part of the substrate, and a gas is discharged from a gas nozzle to the central part of the substrate so as to form a dried area of the cleaning liquid under a condition in which a shortest distance between an edge of a cleaning liquid flow output from the cleaning-liquid nozzle and an edge of a gas flow output from the gas nozzle is set between 9 mm and 15 mm.

Abstract: A device (1) for removing a coating, particularly a photoresist, from a substrate (10) in at least one area of the substrate (10), comprises a nozzle (11) suitable for applying a jet of a solution medium to the substrate.

Abstract: A filter that filters carbon dioxide in the gaseous, liquid or supercritical state is efficiently purified. The carbon dioxide is used to at least clean or dry an object to be treated, or to clean or dry the object to be treated. A method of purifying a filter for filtering carbon dioxide in a gaseous, liquid or supercritical state is provided. The carbon dioxide is used to at least clean or dry the object to be treated, or to clean and dry the object to be treated. According to the method, the filter 13 is purified before the carbon dioxide is filtered in the gaseous, liquid or supercritical state by the filter 13. The filter 13 is purified by allowing carbon dioxide to pass through the filter.

Abstract: Provided is an apparatus for processing a substrate including a spin head on which a substrate is placed, a container provided to surround the spin head, an upper nozzle member supplying a processing solution downwards, a bottom cleaning member located to be a certain distance from the bottom of the spin head, wherein the bottom cleaning member sprays a cleaning solution to the bottom of the spin head.

Abstract: According to one embodiment, a wafer carrier cleaning method is provided. The wafer carrier cleaning method includes cleaning a wafer carrier with a chemical solution containing a weak acid that can dissolve metals, and cleaning the wafer carrier cleaned with the chemical solution, with pure water. The weak acid contained in the chemical solution is preferably citric acid that can dissolve heavy metals and does not damage the wafer carrier.

Abstract: An ultrasonic cleaning device includes an ultrasonic transducer (13) for providing ultrasonic energy to a propagation liquid (15), an ultrasonic propagation tube (12) for flowing the propagation liquid provided with the ultrasonic energy by the ultrasonic transducer, a holding mechanism disposed below the ultrasonic propagation tube for holding an object to be cleaned (21), and a cleaning liquid supply mechanism for supplying a cleaning liquid to a cleaning surface of the object to be cleaned held by the holding mechanism. The ultrasonic propagation tube (12) is disposed so that a side surface thereof may contact a liquid film (19) of the cleaning liquid formed on the cleaning surface by supplying the cleaning liquid to the cleaning surface by the cleaning liquid supply mechanism.

Abstract: A method and system for cleaning a secure instrument, such as a banknote, including a substrate, visual data and a security feature, including exposing the secure instrument to a supercritical fluid at a temperature and a pressure and for a duration sufficient to clean the substrate and not compromise the security feature and the visual data, wherein to clean the substrate includes to remove one or more substances from the substrate into the supercritical fluid. The substances removed from the substrate may include contaminants, dirt, sebum and pathogens.

Abstract: Techniques disclosed herein include a method and apparatus for stripping resist from a substrate without using high concentrations of toxic chemicals and without needing frequent bath replacement. Techniques include using a chemistry that lifts-off the resist, without substantially dissolving the resist, coupled with mechanically breaking removed resist into small particles using mechanical agitation and high fluid flow. Resist particles can then be removed from the vicinity of the wafer by a high-flow circulation out of a processing tank. Circulating flow can then be filtered to remove the resist particles from the circulating fluid and reintroduced into the processing tank. A filtering system can also remove particles from filters either during circulation or with circulation stopped.

Abstract: An apparatus and method for cleaning milking stalls on a platform of a rotary parlour. The rotary parlour includes a robotic manipulation device configured to perform a primary task; a holding device configured to hold the end portion of the hose member in a predetermined parking position, and a control unit. When it is time to clean a milking stall on the platform, the control unit activates the robotic manipulation device such that, instead of performing a primary task, the robotic manipulation device performs an additional task in which the robotic manipulation device grips the end portion of a hose member and moves the end portion from a parking position to a number of cleaning positions from which liquid jets are sprayed from the outlet opening of the end portion against predetermined surfaces to be cleaned in the milking stall.

Abstract: A substrate processing apparatus includes a heater having an infrared lamp and a housing for heating an upper surface of a substrate held by a substrate holding mechanism with the heater in opposed relation to the upper surface. A heater cleaning method includes locating the heater at a position above a lower nozzle in opposed relation to a first spout of the lower nozzle, the lower nozzle being in opposed relation to a lower surface of the substrate held by the substrate holding mechanism, and a lower cleaning liquid spouting step of supplying a cleaning liquid to the lower nozzle to spout the cleaning liquid upward from the first spout with no substrate being held by the substrate holding mechanism to thereby supply the cleaning liquid to an outer surface of the housing of the heater located at the heater cleaning position.

Abstract: The present invention relates, in part, to cleaning methods and solvent cleaning compositions including at least one hydrofluoro-olefin or hydrochlorofluoro-olefin solvent for use in connection with cleaning of metal parts, and in certain preferred embodiments cleaning metal parts to be used in an aircraft.

Abstract: Disclosed are devices and methodologies for cleaning wafers in wafer processing operations such as solvent cleaning. In an example situation, a wafer that has been separated from a support plate can be cleaned. The wafer still needs to be handled carefully during such a cleaning operation. Various devices and methodologies that facilitate efficient handling of wafers and solvent cleaning operations are disclosed.

Abstract: An injector cleaning apparatus with a concentric dual flow introducer and a flow-dispersing injector seat along with a method of cleaning an injector. The concentric dual flow introducer has concentric cleaning fluid flowpaths configured to communicate with a central passage and a plurality of peripheral passages of a gas injector. The input-side injector engaging interface of the concentric dual flow introducer and the flow-dispersing injector seat each have a compressible sealing portion having compressibility sufficient to yield under fluid cleaning surges attributable to initiation and termination of cleaning fluid flow through the injector cleaning apparatus along with resiliency sufficient to prevent abutment of the gas injector and a rigid facing portion of the input-side injector engaging interface and output-side injector engaging interface respectively.

Abstract: Provided are a washing device and a washing method that can remove burnt body fluid adhered to a medical instrument. The washing device can remove the burned component which adhered to a tip end portion of a surgical instrument by applying a physical force caused by the pressure of cleaning agent-dissolved water ejected from a cleaning nozzle member in addition to a chemical force caused by a cleaning agent contained in the cleaning agent-dissolved water.

Abstract: Some embodiments include methods of removing particles from over surfaces of semiconductor substrates. Liquid may be flowed across the surfaces and the particles. While the liquid is flowing, electrophoresis and/or electroosmosis may be utilized to enhance transport of the particles from the surfaces and into the liquid. In some embodiments, temperature, pH and/or ionic strength within the liquid may be altered to assist in the removal of the particles from over the surfaces of the substrates.

Abstract: A brush cleaning system includes a container having a bottom portion and an opening. A plurality of projections are located proximate to the bottom portion of the container. Bristles of a brush engage the plurality of projections to splay the bristles of the brush. A cap seals the opening of the container. A liquid solution is added to the container to clean the brush.

Abstract: A method and apparatus for cleaning a stack of secure instruments is disclosed. Each secure instrument includes a substrate, visual data and a security feature. The method and apparatus include exposing the stack to a supercritical fluid at a temperature and a pressure and for a duration sufficient to clean each secure instrument and not compromise each security feature and each visual data, and maintaining a securing mechanism on the stack during exposure of the stack to the supercritical fluid such that cleaning each secure instrument includes one or more substances from each secure instrument into the supercritical fluid.

Abstract: A substrate cleaning method is used for performing scrub cleaning of a surface of a substrate. The substrate cleaning method includes rotating a roll cleaning member and a substrate respectively in one direction while keeping the roll cleaning member in contact with the substrate in a cleaning area, and supplying a cleaning liquid to a surface of the substrate to scrub-clean the surface of the substrate in the presence of the cleaning liquid in the cleaning area. The cleaning liquid is supplied initially to an inverse-direction cleaning area of the cleaning area where the relative rotational velocity between the roll cleaning member and the substrate is relatively high, and thereafter to a forward-direction cleaning area of the cleaning area where the relative rotational velocity between the roll cleaning member and the substrate is relatively low while the substrate makes one revolution on a central axis thereof.

Abstract: A method for cleaning a surface of a plate-like article includes the steps of: treating the surface with free flow cleaning, wherein liquid is dispensed through a dispense nozzle onto the surface in a continuous liquid flow, and treating the surface with spray cleaning, wherein liquid is directed through a spray nozzle towards the surface in form of droplets. The surface is treated with a spray cleaning step before the free flow cleaning step and a spray cleaning step after the free flow cleaning step.

Abstract: Described are compositions and methods for the removal of zinc-oxide eugenol-based temporary cements or root canal filling materials from a variety of surfaces including surfaces inside the oral cavity, such as teeth, as well as surfaces of objects located outside of the oral cavity, such as instruments and prostheses. In certain compositions, the resin-dentin bond between permanent cements and collagen-containing surfaces can be increased. The compositions are non-toxic, can be used inside the oral cavity, and do not require special disposal procedures.

Abstract: A sanitary agent for treatment of a sanitary appliance includes a solid or semi-solid active body, designed to adhere to a wall of the sanitary appliance and including a treatment compound having at least an active element for treatment of the sanitary appliance. The body has an external surface thereof covered by a water-soluble film. In this way, the sanitary agent can be manipulated by hand for application thereof to a moist ceramic wall of a sanitary appliance to be treated, without the user's hands entering into contact with the components of the sanitary agent itself. Furthermore, any undesired loss of the components of the sanitary agent is avoided; these can be due to deformation of the sanitary agents before use thereof, displacements thereof and/or any dripping. A method for applying the sanitary agent for deterging, disinfecting and/or perfuming the sanitary appliance is also provided.

Abstract: Methods and apparatus for a movable megasonic wafer probe. A method is disclosed including positioning a movable probe on a wafer surface, the movable probe having an open bottom portion that exposes a portion of the wafer surface; applying a liquid onto the wafer surface through a bottom portion of the movable probe; and moving the movable probe at a predetermined scan speed to traverse the wafer surface, applying the liquid to the wafer surface while moving over the wafer surface. In additional embodiments the method includes providing a transducer for applying megasonic energy to the wafer surface. Apparatus embodiments are disclosed including the movable megasonic wafer probe.

Abstract: An apparatus and method for removing accumulated ash and soot from DPFs which uses a combination of ultrasonic energy coupled via a liquid cleaning solution to the internal and external surfaces of the DPF to dislodge and remove the accumulated materials, and a system of directing clean solution for rinsing of the filter elements by continuous filtration of the rinse solution, and a means of drawing residual material-laden cleaning solution from the filter to complete the cleaning process.

Abstract: A device for cleaning a fixed abrasive polishing pad includes a main body having a surface facing the polishing pad, an inlet coupled to an end of the main body and configured to supply a cleaning liquid, an inject orifice coupled to the inlet for injecting the cleaning liquid and being provided on the surface of the main body, an outlet coupled to the end of the main body, and a recycle orifice coupled to the outlet, and being provided on the surface of the main body.

Abstract: Foreign matter is removed from a digital hydraulic pressure controller having two portions connectable to each other and each including two valve arrays with a plurality of individually switchable valve means having different flow cross-sections and connected in parallel within a valve array. One valve array of each pressure controller portion can connect a supply line to a controller output line and the other valve array can connect the output line to a drain line. The two pressure controller portions are connected, the valve means having the largest flow cross-section of the valve array of the one portion on the supply line side is opened, the valve means having the largest flow cross-section of the valve array of the other portion on the drain line side is opened and the opened flow path is flushed through the pressure controller with pressurized working fluid, while the other valve means are closed.

Abstract: The present invention includes methods and materials for cleaning materials, particles, or chemicals from a substrate with a brush or pad. The method comprising: engaging a surface of a rotating wafer with an outer circumferential surface of a rotating cylindrical foam roller, the cylindrical foam roller having a plurality of circumferentially and outwardly extending spaced apart nodules extending from the outer surface, each nodule defining a height extending from the outer surface of the cylindrical foam roller to a substrate engagement surface of the nodule, the substrate engagement surface of one or more of the nodules having a rounded configuration; and positioning the cylindrical foam roller on the substrate such that the one or more nodules are positioned to have only the rounded substrate engagement surface contact the substrate such that no linear surface of the one or more nodules contacts the substrate.

Abstract: A device and a method for cleaning emission protection installations in coke quenching towers. The emission protection installations are fixed to a support structure in the chimney of the coke quenching tower. A liquid is sprayed onto the emission protection installations by nozzles for cleaning purposes. The nozzles are arranged on at least one movable element.

Abstract: The present invention is improved cleaning method using a composition having at least one ketone for cleaning organic residue.

Abstract: An edge bead removal apparatus is provided. The edge bead removal apparatus includes a clamping unit configured to clamp a cylindrical reticle and cause the cylindrical reticle to incline with a pre-determined angle and to rotate around a central axis. The edge bead removal apparatus also includes an edge bead removal solvent nozzle configured to spray an edge bead removal solvent to remove edge beads on both edges of the cylindrical reticle.

Abstract: Solid block alkaline detergent compositions are disclosed comprising a source of alkalinity, and other detergent additives including sequestrants. The solid block detergents of the invention used a mixed inorganic and organic sequestrant composition that successfully softens service water used in manufacturing aqueous detergents from the composition, but also obtains substantially improved organic soil removal on dishware or flatware. The solid block detergents of the invention comprise large masses of the chemical ingredients having a weight of greater than about 500 grams in a solid block product format that is typically dispensed using a spray on water dispenser that creates an aqueous concentrate that is used in a washing machine.

Abstract: An open top tank assembly and process for performing forced immersion oscillatory cleaning of products, parts, assemblies or other materials with or without non-line of sight (NLOS) features, wherein the process is repeated during application of pressure gradients to the fluid in the tank to develop a consistent rhythmic oscillation that creates movement of product in a center cavity of the tank to repeatedly transfer the fluid through the product to clean the product.

Abstract: In a substrate processing method according to the present invention, a substrate is first processed using a chemical liquid. Next, the substrate is rinsed by supplying a rinsing liquid thereto while the substrate is being rotated. Thereafter, the substrate is dried while the substrate is being rotated. The drying of the substrate includes reducing a rotating speed of the substrate to a first rotating speed lower than that of the substrate during the rinsing of the substrate, while supplying the rinsing liquid to a central portion of the substrate; moving, from the central portion of the substrate toward a peripheral edge portion thereof, a rinsing liquid supply position to which the rinsing liquid is supplied, after the rotating speed of the substrate has been reduced to the first rotating speed; and supplying a drying liquid to the substrate, after the rinsing liquid supply position has been moved.

Abstract: A substrate is moved below a substrate cleaning module in a direction extending from a leading edge to a trailing edge of the substrate cleaning module. A cleaning material is dispensed downward toward a top surface of the substrate along the leading edge of the substrate cleaning module. A rinsing material is dispensed downward toward the top surface of the substrate along the trailing edge of the substrate cleaning module to generate a rinsing meniscus. Vacuum suction is applied at a vacuum suction location along a bottom surface of the substrate cleaning module and parallel to the leading and trailing edges of the substrate cleaning module. The vacuum location is positioned between a dispense location of the cleaning material and a dispense location of the rinsing material. A plenum region located between the dispense location of the cleaning material and the vacuum location is vented.

Abstract: To provide a method of manufacturing a semiconductor device, including: forming a thin film different from a silicon oxide film on a substrate by supplying a processing gas into a processing vessel in which the substrate is housed; removing a deposit including the thin film adhered to an inside of the processing vessel by supplying a fluorine-containing gas into the processing vessel after executing forming the thin film prescribed number of times; and forming a silicon oxide film having a prescribed film thickness on the inside of the processing vessel by alternately supplying a silicon-containing gas, and an oxygen-containing gas and a hydrogen-containing gas into the heated processing vessel in which a pressure is set to be less than an atmospheric pressure after removing the deposit.

Abstract: After a substrate is cleaned, a liquid layer of a rinse liquid is formed so as to cover one surface of the substrate. Then, a liquid supply nozzle moves outward from above the center of the substrate. The liquid supply nozzle is stopped once at the time point where it moves by a predetermined distance from above the center of the substrate. In this time period, the liquid layer is divided within a thin layer region by a centrifugal force, so that a drying core is formed at the center of the liquid layer. Thereafter, the liquid supply nozzle moves outward again, so that a drying region where no rinse liquid exists expands on the substrate with the drying core as its starting point.

Abstract: A rinsing method for a water-conducting domestic appliance is provided in which rinsing liquid is heated to a first temperature in a first operating mode in at least one partial program step of a first rinse cycle; a scale formation in the water-conducting domestic appliance is recorded by a scale sensor arranged in a hydraulic system; the scale formation is compared with a nominal value for the scale formation; and, upon exceeding the nominal value, a second rinse cycle is executed in a second operating mode, while the rinsing liquid is heated to a second temperature that is higher than the first temperature.

Abstract: A method for processing a substrate is provided which includes generating a fluid meniscus to process the substrate and applying the fluid meniscus to a surface of the substrate. The method further includes reducing evaporation of fluids from a surface in the substrate processing environment.

Abstract: An apparatus and a method of washing (or pre-washing) silverware/flatware, or one or more other objects/parts is provided. The apparatus and method utilizes a fluid-push/pull system and method in which generally an entire volume of fluid is pushed or pulled through a cavity in which the silverware/flatware or other objects/parts are located. A cavity is filled with fluid, a mass of silverware or other parts is located within the cavity, generally an entire volume of fluid is pumped out of the cavity, and the pumped fluid is directed back into the cavity to create a generally continuous flow of generally an entire volume of fluid through the cavity.

Abstract: Provided is a method including the steps of: carrying out a storage process by causing a processing jig, which has a supply opening for supplying a first processing liquid, to be positioned such that a storage space section into which the supply opening is open is sandwiched by the processing jig and the process-target surface, and by storing the first processing liquid in the storage space section; and carrying out a rotation process by supplying the first processing liquid onto the process-target surface from the supply opening, while supplying a second processing liquid onto the outer peripheral part, in a state where the process-target object is being rotated, in the step for carrying out the rotation process, the processing jig being moved along a direction which is not a direction along which the process-target object is being rotated.

Abstract: A spray mat for spraying cleaning fluid under pressure onto the outer surfaces of heat exchange tubes that extend in rows in a heat exchanger, the rows of tubes being spaced apart from each other with a generally planar space defined between each two adjacent rows, the spray mat formed of a plurality of spray strips, each spray strip including: (a) a base part having upper and lower surfaces, (b) a fluid inlet, (c) a plurality of spray nozzles spaced apart and secured on the upper and lower surfaces, and (d) a duct system for fluid coupling the fluid inlet to the spray nozzles, each spray strip is bendably and fluid coupled to the next forming a flexible spray mat which is positionable into and removable out of selected ones of the planar spaces between each two adjacent rows of the heat exchange tubes.

Abstract: A method for in-line cleaning of ultrasonic welding tools is described. The method includes applying cleaning solution onto a work surface of a welding tool to be cleaned using an application device. Then the method involves removing residue dissolved in the cleaning solution from the work surface using a cleaning device. Next, the work surface is neutralized and rinsed using purified water and polished with a cleaning cloth. Finally, the work surface is rinsed using cleaning alcohol and blow-dried with compressed air.

Abstract: A method for cleaning the U-tube of the measurement cell of a densimeter, the measurement cell including an isothermic enclosure defining a measurement chamber closed by a stopper surrounded by a resilient seal, a U-tube extending inside the measurement chamber for containing a sample, the U-tube secured to the stopper at a base of the U-tube which includes free ends projecting outwardly from the measurement chamber to permit injection of the sample via an injection opening and evacuation of the sample via an evacuation opening, and means for causing the U-tube to vibrate. The method comprises, following a step of analyzing a sample, injecting a rinsing solvent into the injection opening of the U-tube, and subjecting the stopper to ultrasonic waves.

Abstract: A collapsible and transportable automated carwash includes a bay with a collapsible frame. The collapsible frame has a plurality of collapsible cross-members. The collapsible cross-members are on the bottom and top of the frame connecting the left side of the collapsible frame to the right side of the collapsible frame. The plurality of collapsible cross-members allows the collapsible frame to collapse and reduce the width of the carwash. Whereby, the collapsible and transportable automated carwash is transportable.

Abstract: A drum washing machine is provided with a double spraying system used for washing the window and the window gasket ring respectively. A first spraying nozzle is connected with the inlet solenoid valve of the washing machine to wash the outer surface of the watching window and the window gasket ring, and a second spraying nozzle to wash the folded inner wall of the window gasket ring. The spraying nozzles are connected to the solenoid valve through a three-way pipe, or connected to the solenoid valve of the washing machine through respective pipes. The double spraying system intakes water and soaks the clothes in the washing process, and/or intakes water and sprays the watching window and the window gasket ring simultaneously, and/or sprays the watching window and the window gasket ring when dehydrating the clothes in the dehydrating process.