Abstract: A heat protection glazing is provided that includes an infrared-reflective coating on temperature resistant substrates, which are transparent in the visible spectral range. The coating is resistant and effective relative to long-term thermal loads.

Abstract: Titanium and aluminum cathode targets are disclosed for sputtering absorbing coatings of titanium and aluminum-containing materials in atmospheres comprising inert gas, reactive gases such as nitrogen, oxygen, and mixtures thereof, which can further comprise inert gas, such as argon, to form nitrides, oxides, and oxynitrides, as well as metallic films. The titanium and aluminum-containing coatings can be utilized as an outer coat or as one or more coating layers of a coating stack.

Abstract: A transparent conductive laminate having a completely crystallized, transparent conductive layer on a substrate comprising an organic polymer molding, and a process for producing the same. The transparent conductive layer is excellent in transparency and wet heat confidence and is not excessively low in specific resistivity. The transparent conductive laminate includes a substrate comprising an organic polymer molding having formed thereon a completely crystallized, transparent conductive layer comprising an In.Sn composite oxide having an amount of Sn atom of 1 to 6% by weight based on the total weight of In atom and Sn atom and having a film thickness of 15 to 50 nm, a Hall mobility of 30 to 45 cm2/V·S, and a carrier density of from 2×1020/cm3 to 6×1020/cm3.

Abstract: The method for manufacturing a photomask blank according to the present invention, when manufacturing a photomask blank having at least one functional layer on a transparent substrate, in a step of film-formation of such a functional film where the functional film includes a chromium-containing element and an a metallic element that is capable of bringing a mixture of the metallic element and the chromium into a liquid phase at a temperature of 400° C. or lower, a chromium target (target A) and a target (target B) mainly containing at least one kind of the metallic element are simultaneously sputtered (co-sputtered). The present invention provides a technique for manufacturing a functional film having a small variation in its characteristics such as optical density and a low detect, and showing a high etching rate.

Abstract: A method for producing a transparent conductive film including a transparent film substrate and a crystalline transparent conductive layer, including: a first depositing a first indium-based complex oxide having a first tetravalent metal element oxide on the transparent film substrate; and a second depositing indium oxide or a second indium-based complex oxide and lower than the tetravalent metal element oxide content of the indium-based complex oxide used in the first depositing by sputtering to form an amorphous transparent conductive layer, and crystallizing the amorphous transparent conductive layer. The method allows a reduction in crystallization time.

Abstract: A method for producing a polarizing element includes the steps of: forming an island-shaped film of a metal halide on a glass substrate; forming needle-shaped particles of the metal halide by stretching the glass substrate through heating to elongate the island-shaped film; and forming needle-shaped metal particles composed of a metal by reducing the metal halide of the needle-shaped particles, wherein the metal halide is deposited on the glass substrate by a reactive physical vapor deposition method.

Abstract: A method for manufacturing polycarbonate solar cells. The method is designed to adapt many techniques used in the compact disc manufacturing industry to the manufacture of polycarbonate solar cells. The method comprises: creating a polycarbonate substrate for a solar cell; depositing a low resistivity cathodic contact layer on the polycarbonate substrate; depositing a photonic energy absorbing layer with a sputter chamber comprising a quaternary CIGS sputter target; using a modulated high intensity pulsed xenon flashlamp; depositing a buffer layer; depositing a highly resistive transmissive intrinsic layer; depositing a transmissive contact oxide window layer; adding anodic contacts to one of the layers; depositing an anti-reflective coating layer; and encapsulating the solar cell to provide environmental protection.

Abstract: A coated article, and a corresponding method of making the same are provided. The coated article includes a coating supported by a substrate, the coating including a thin metal or metal nitride contact layer (e.g., NiCr, Ni, Cr, CrNx or NiCrNx) located directly between and contacting an infrared (IR) reflecting layer (e.g., Ag) and an oxide barrier layer (e.g., NiCrOx).

Abstract: A method for producing a polarizing element includes the steps of: forming a coating film of a metal on a glass substrate; forming an island-shaped film composed of a metal halide on the glass substrate by partially removing the coating film and also halogenating the metal; forming needle-shaped particles of the metal halide by stretching the glass substrate through heating to elongate the island-shaped film; and forming needle-shaped metal particles composed of a metal by reducing the metal halide of the needle-shaped particles.

Abstract: A deep-UV optical coating preparation method includes the step of putting a high purity metal ingot and a substrate in a sputter chamber and electrically connecting a sputter power supply to the sputter chamber and the step of applying an inertia gas, oxygen and a fluorinated gas to the sputter chamber for causing deposition of a high-refraction fluorine-doped metal oxide film and a low-refraction metal fluoride film to form a deep ultraviolet optical coating having excellent optical and mechanical properties on the substrate.

Abstract: A heat resistant black coating film which is capable of making the surface of optical members to be low reflection property and black property, a black light shading plate having a resin film using the same as a base substrate, and a diaphragm, a diaphragm device for light intensity adjustment and a shutter using the same, and heat resistant light shading tape. They are provided by a black coating film (A), where a titanium oxide film containing titanium and oxygen as main components, and having an oxygen content of from 0.7 to 1.

Abstract: The invention relates to a prism part included in an analysis chip for use in an analysis device for analyzing a specimen utilizing surface plasmon resonance, and being cooperative with a channel member to form a channel for flowing a sample solution containing the specimen. The prism part includes a prism main body into which excitation light for generating surface plasmon is incident, and a gold film formed on a specified surface of the prism main body. The prism main body includes a mixed layer having a predetermined thickness from the specified surface toward the inner side. The mixed layer is formed by ions of gold for the gold film to enter from the specified surface in the formation of the gold film on the specified surface.

Abstract: An optical information recording medium of the present invention includes at least a recording layer (4) that allows information to be recorded thereon and/or reproduced therefrom by being irradiated with a laser beam, and a transmittance adjusting layer (7) in this order from an incident side of the laser beam (30). In the optical information recording medium of the present invention, the transmittance adjusting layer (7) contains Bi, Ti, and O and with a composition of Bi, Ti, and O contained in the transmittance adjusting layer (7) being denoted as BixTiyOz, in atomic number ratio, x, y, and z satisfy 0.07?x?0.35, 0.07?y?0.28, 0.56?z?0.70, and x+y+z=1. Or the transmittance adjusting layer (7) contains Bi2O3 and TiO2, and with a composition of Bi2O3 and TiO2 contained in the transmittance adjusting layer (7) being denoted as (Bi2O3)?(TiO2)?, in molar ratio, ? and ? satisfy 0.2???0.7, 0.3???0.8, and ?+?=1.

Abstract: A coated article is provided that may be heat treated in certain example embodiments. A graded layer (e.g., contact layer or other suitable layer) is formed by initially sputter-depositing a layer, and thereafter ion beam treating the sputter-deposited layer with at least reactive gas ions in order to form a graded layer. In certain example embodiments, the result is a coated article that has improved visible transmission and/or durability, without sacrificing optional heat treatability.

Abstract: A system for large scale manufacture of thin film photovoltaic cells includes a chamber comprising a plurality of compartments in a common vacuum ambient therein. Additionally, the system includes one or more shutter screens removably separating each of the plurality of compartments. The system further includes one or more transfer tools configured to transfer a substrate from one compartment to another without breaking the common vacuum ambient. The substrate is optically transparent and is characterized by a lateral dimension of about 1 meter or greater for a solar module. Embodiments of the invention provide compartments configured to subject the substrate to one or more thin film processes to form a Cu-rich Cu—In composite material overlying the substrate and at least one of the plurality of compartments is configured to subject the Cu-rich Cu—In composite material to a thermal process to form a chalcogenide structured material.

Abstract: The invention provides a substrate bearing a low-maintenance coating. In some embodiments, the coating includes a low-maintenance film that includes both titanium oxide and tungsten oxide. The invention also provides methods and equipment for depositing such coatings.

Abstract: The present invention is a method of coating a substrate in a single zone of a MSVD coater wherein the zone includes at least two bays, comprising running a first bay of a zone including a first target in metal mode and running the second bay including a second target in transition or oxide mode, wherein the ?G of formation of the target oxide being run in transition mode or oxide mode is equal to or less than ?160 kcal/mole O2 or the difference in ?G between the target being run in transition mode or oxide mode and the target being run in metal mode is at least 60 kcal/mole O2.

Abstract: A coated article that can be used in applications such as insulating glass (IG) units, so that resulting IG units can achieve high visible transmission of at least 70% (e.g., when using clear glass substrates from 1.0 to 3.5 mm thick), combined with at least one of: (a) SHGC no greater than about 0.45, more preferably no greater than about 0.40; (b) SC no greater than about 0.49, more preferably no greater than about 0.46; (c) chemical and/or mechanical durability; (d) neutral transmissive color such that transmissive a* is from ?5.0 to 0 (more preferably from ?3.5 to ?1.5), and transmissive b* is from ?2.0 to 4.0 (more preferably from 1.0 to 3.0); and (e) neutral reflective color from the exterior of the IG unit (i.e., Rg/Rout) such that reflective a* is from ?3.0 to 2.0 (more preferably from ?2.0 to 0.5), and reflective b* is from ?5.0 to 1.0 (more preferably from ?4.0 to ?1.0).

Abstract: The present invention relates to the field of analyzing the age and/or quality of certain natural products, for example foods. The invention also relates to devices for analyzing said age and/or quality as well as to methods for preparing such devices, to methods for analyzing natural products and to their use.

Abstract: A device, in particular a cover panel for a display device or a monitor auxiliary panel or a surface for input devices, includes a substrate and a coating applied onto the substrate. The coating has a surface having a coefficient of friction in the range between approximately 0.01 and 0.12, in particular between approximately 0.02 and 0.1, or between approximately 0.03 and 0.09.

Abstract: Deposition processes and devices for the fabrication of multilayer systems to better control the energy contribution at different stages of the deposition. This is achieved by depositing films by sputtering in a scheme providing for thermalized particles. Thermalized particles are obtained by choosing the working gas pressure and the distance between target and substrate to result in a mean free path of particles smaller than the distance between target and substrate or to result in a product of pressure and distance being larger than 2.0 cmPa.

Abstract: The invention relates to a method for producing an ultrabarrier layer system through vacuum coating a substrate with a layer stack that is embodied as an alternating layer system of smoothing layers and transparent ceramic layers, but comprising at least one smoothing layer between two transparent ceramic layers, which are applied by sputtering, in which during the deposition of the smoothing layer a monomer is admitted into an evacuated coating chamber in which a magnetron plasma is operated.

Abstract: The invention is related to a method of preparing a conducting film on an ultra-thin glass substrate. The preparing method uses magnetron sputtering, setting an initial magnetron sputtering power and/or an initial flow rate of argon to deposit the conducting film, detecting film layer stress of the conducting film by a pressure sensor on provided on the ultra-thin glass substrate, and adjusting a magnetron sputtering power and/or a flow rate of argon gas in real time according to the detected film layer stress, such that an absolute value of the film layer stress is kept below a predetermined value; the ultra-thin glass substrate has a thickness less than 0.1 mm.

Abstract: The present disclosure provides a method of improving hydrophilicity of a coating layer through surface morphology treatment and a super-hydrophilic glass coating layer produced using the same. The method includes forming a photocatalyst layer on a substrate; and heating the substrate having the photocatalyst layer formed thereon to a temperature of 500° C. to 600° C. to perform post-heat treatment, and increasing surface roughness of the photocatalyst layer. The photocatalyst layer has a surface contact angle of 30 degrees or less.

Abstract: The invention is a method for obtaining a reactive sputtering process with a reduced or eliminated hysteresis behavior. This is achieved by employing a target made from a mixture of metal and compound materials. In the method according to the present invention, the fraction of compound material is large enough to eliminate or significantly reduce the hysteresis behavior of the reactive sputtering process and enable a stable deposition of compound films at a rate significantly higher than what is possible from a target completely made from compound material.

Abstract: Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition.

Abstract: A method of processing a photovoltaic materials using a sputtering process including providing at least one transparent substrate having an overlying first electrode layer. The method further including forming an overlying copper and gallium layer using a first sputtering process within a first chamber from a first target including a copper species and a gallium species. Additionally, the method includes forming an indium layer overlying the copper and the gallium layer using a second sputtering process within the first chamber from a second target including an indium species. The method further includes forming a sodium bearing layer overlying the indium layer using a third sputtering process within the first chamber, thereby forming a composite film including the copper and gallium layer, the indium layer, and the sodium bearing layer.

Abstract: Methods are generally provided for sputtering thin films on individual substrates. Individual substrates can be conveyed into a vacuum chamber to draw a sputtering pressure that is less than about 50 mTorr. Then, the individual substrates can be conveyed into a sputtering chamber and past a planar magnetron continuously sputtering a target by an ionized gas at the sputtering pressure such that a thin film is formed on a surface of the individual substrate. The target is subjected to a high frequency power having a frequency from about 400 kHz to about 4 MHz at power levels of greater than about 1 kW. In one particular embodiment, the method can be generally directed to sputtering thin films on individual substrates defining a surface having a surface area of about 1000 cm2 to about 2500 cm2.

Abstract: An information recording medium including three or more information layers, wherein: at least one information layer includes a recording layer and a nucleation layer; the recording layer contains a material that is represented by formula (1) [(Ge0.5Te0.5)x(In0.4Te0.6)1-x]ySb100-y (mol %) with x satisfying 0.8?x<1.0 and y satisfying 95?y<100; the nucleation layer contains a material that is represented by formula (2) (Ge0.5Te0.5)z(Bi0.4Te0.6)100-z (mol %) with z satisfying 10?z?71; and the nucleation layer is in contact with the recording layer. This information recording medium is capable of achieving sufficient signal amplitude even in cases where a small recording mark is formed, and is also capable of stably maintaining a small recording mark.

Abstract: The present invention generally comprises a semiconductor film and the reactive sputtering process used to deposit the semiconductor film. The sputtering target may comprise pure zinc (i.e., 99.995 atomic percent or greater), which may be doped with aluminum (about 1 atomic percent to about 20 atomic percent) or other doping metals. The zinc target may be reactively sputtered by introducing nitrogen and oxygen to the chamber. The amount of nitrogen may be significantly greater than the amount of oxygen and argon gas. The amount of oxygen may be based upon a turning point of the film structure, the film transmittance, a DC voltage change, or the film conductivity based upon measurements obtained from deposition without the nitrogen containing gas. The reactive sputtering may occur at temperatures from about room temperature up to several hundred degrees Celsius. After deposition, the semiconductor film may be annealed to further improve the film mobility.

Abstract: A pixel unit having a display area is provided. The pixel unit includes a first substrate, a second substrate, a liquid crystal layer, and at least one ultraviolet light (UV) absorption pattern. The second substrate is disposed in parallel to the first substrate, and the liquid crystal layer is disposed between the first substrate and the second substrate. The UV absorption pattern is disposed between the first substrate and the second substrate. A part of the display area overlaps the UV absorption pattern to define at least one first alignment area, while the part of the display area which does not overlap the UV absorption pattern defines at least one second alignment area. The liquid crystal molecules of the liquid crystal layer present different pre-tilt angles in the first alignment area and the second alignment area.

Abstract: A method for forming a photocatalytic apatite includes a target production step (S12) for producing a sputtering target that contains photocatalytic apatite, and a sputtering step (S13) for forming a photocatalytic apatite film on a substrate by sputtering using the target. A firing step (S11) for firing the photocatalytic apatite is conducted before the sputtering step so as to increase the crystallinity of the photocatalytic apatite.

Abstract: A sputtering cathode is generally provided. The sputtering cathode can include a semiconducting target (e.g., a cadmium sulfide target, a cadmium tin oxide target, etc.) defining a sputtering surface and a back surface opposite to the sputtering surface. A backing plate can be positioned facing the back surface of the target and non-bonded to the back surface of the target. A non-bonding attachment mechanism can removably hold the target within the sputtering cathode such that the back surface is facing the backing plate during sputtering.

Abstract: A sputtering composite target includes: an oxide based component containing indium oxide; and a carbon based component.

Abstract: A material having a low work function is quickly inserted near an interface between an organic layer and a cathode. A sputtering apparatus (Sp) includes a target material formed of silver (Ag), a dispenser formed outside a processing container and evaporating cesium (Cs) having a lower work function than silver (Ag) by heating the cesium (Cs), a first gas supply pipe communicating with the dispenser to transfer evaporated cesium (Cs) to the processing container by using argon gas as a carrier gas, and a high frequency power supply source supplying high frequency power to the processing container. A controller generates plasma by exciting the argon gas by using energy of the high frequency power, and while forming a metal electrode by using an silver (Ag) atom, wherein the Ag atom is generated from a the target material by using the generated plasma, controls a ratio of the cesium (Cs) mixed with the metal electrode.

Abstract: A colored substrate and a method for producing a substrate having a colored interference filter layer containing a polycrystalline metal oxide or polycrystalline metal oxides with the aid of physical or chemical vapor deposition using a coating system, in particular with the aid of a sputtering gas, in which at least two, in particular at least six, coating layers are vapor deposited one on top of the other forming polycrystalline metal oxides in each case.

Abstract: Methods of depositing a transparent conductive oxide layer on a substrate are generally disclosed. A shield of greater than about 75% by weight molybdenum can be attached to a first surface of a substrate such that the shield contacts at least about 75% of the first surface. The shield can then be heated via an energy source to cause thermal exchange from the shield to the substrate to heat the substrate to a sputtering temperature. A transparent conductive oxide layer can then be sputtered on a second surface of the substrate at the sputtering temperature. Methods are also generally disclosed for manufacturing a cadmium telluride based thin film photovoltaic device.

Abstract: A coated article is described. The coated article includes a substrate; and a photochromic layer formed on the substrate. The photochromic layer is a titanium layer doped with metal element ‘M’. The element ‘M’ is selected from a group consisting of nickel, iron, and chromiun. A method for applying the photochromic layer to the substrate is also described.

Abstract: Example embodiments of this invention relate to a method of making a thermally tempered coated article including a transparent conductive oxide (TCO) film in a color compression configuration supported by a tempered glass substrate. A coated article, that is thermally tempered and made by such a process, is also provided. Coated articles according to certain example non-limiting embodiments of this invention may be used in applications such as solar cells, oven doors, electrostatic discharge glass, solar control windows, defrosting windows, or other types of windows in certain example instances.

Abstract: A coated article for use in spandrel applications and/or the like is provided. In certain example embodiments, a coating is provided to have a coating design which permits the coating to realize more predictable and/or consistent optical characteristics such as glass side reflectance, color and/or the like. Certain example embodiments of this invention relate to a method of making a coated article for spandrel applications or the like. In certain embodiments, a powder inclusive lacquer coating is used as an overcoat.

Abstract: Certain example embodiments of this invention relate to heatable glass substrates that may be used in connection with lighting applications, and/or methods of making the same. In certain example embodiments, a glass substrate supports an antireflective (AR) coating on a first major surface thereof, and a conductive coating on a second, opposite major surface thereof. Bus bars connect the conductive coating to a power source in certain example embodiments. The substrate may be heat treated (e.g., heat strengthened and/or thermally tempered), with one or both coatings thereon. The heatable glass substrate thus may help provide a chemical and/or environmental barrier for the luminaire or lighting system disposed behind it. In addition, or in the alternative, the heatable glass substrate may help reduce the amount of moisture (e.g., snow, rain, ice, fog, etc.) that otherwise could accumulate on the luminaire or lighting system.

Abstract: A substrate is provided with an abrasion resistance antireflection coating. The coated substrate includes a multilayer antireflection coating on at least one side. The coating has layers with different refractive indices, wherein higher refractive index layers alternate with lower refractive index layers. The layers having a lower refractive index are formed of silicon oxide with a proportion of aluminum, with a ratio of the amounts of aluminum to silicon is greater than 0.05, preferably greater than 0.08, but with the amount of silicon predominant relative to the amount of aluminum. The layers having a higher refractive index include a silicide, an oxide, or a nitride.

Abstract: A method for fabricating a lens module includes forming an IR-cut filter, forming a shading block on part of a surface of the IR-cut filter, forming a blocking layer on the IR-cut filter and the shading block, forming an electromagnetic shielding layer on the blocking layer, polishing the electromagnetic shielding layer and the blocking layer to expose the shading block, removing the shading block from the IR-cut filter to form an optical component, mounting a lens in the barrel portion adjacent to the IR-cut filter portion, and packaging the holding portion of the optical component to a printed circuit board to form the lens module.

Abstract: A method of making a cathode structure for an OLED provided over organic layers includes evaporating a first layer over the organic layers, such layer including a metal or metal alloy whose work function is less that 4.0 eV, or a material including an electron-injecting dopant and a reactive metal; depositing at least one second layer of an inorganic material over the first layer to form a buffer structure with the first layer; and sputtering a protective layer of a metal or metal alloy provided over the buffer structure.

Abstract: An optical recording medium includes a substrate having features that define track regions, an optical recording layer disposed on the substrate, and a light-transmitting layer disposed on the optical recording layer. The optical recording layer has a composition of (Sb2Se3)wTexOyPdz, where w, x, y, and z each represent a molar percent and satisfy 10 (mol %)?w?60 (mol %), 0 (mol %)<x?60 (mol %), 30 (mol %)?y?60 (mol %), 10 (mol %)?z?30 (mol %), and w+x+y+z=100.

Abstract: An optical information recording medium including a substrate; two or more recording layers provided on the substrate; and a protective layer provided on the recording layers, wherein the surface of one of the side of the substrate and the protective layer is a light irradiation plane, at least one of the recording layers other than the recording layer at the deepest position from the light irradiation plane includes W, Pd, and Cu oxides as the principal components, and the ratio of W, Pd, and Cu that are respectively included in the W, Pd, and Cu oxides satisfies the relationship 0.17?x1 (where x1=a/(b+0.8c), where a: atomic ratio of W with respect to the total of W, Pd, and Cu, b: atomic ratio of Pd with respect to the total of W, Pd, and Cu, and c: atomic ratio of Cu with respect to the total of W, Pd, and Cu).

Abstract: A thin film comprising titanium oxide as its main component includes titanium, oxygen and copper, content of Ti is 29.0 to 34.0 at % and content of Cu is 0.003 to 7.7 at % or less with remainder being oxygen and unavoidable impurities. A ratio of oxygen component to metal components, O/(2 Ti+0.5 Cu), is 0.96 or higher. The thin film has a high refractive index and low extinction coefficient. A sintered compact sputtering target suitable for producing the foregoing thin film is also provided and can be used to obtain a thin film with superior transmittance and low reflectance and which is effective as an interference film or protective film of an optical information recording medium, and to obtain a thin film that can be applied to a glass substrate; that is, a thin film that can be used as a heat ray reflective film, antireflection film, and interference filter.

Abstract: A coated article includes a substrate and a thermochromic coating formed on the substrate. The thermochromic coating is a vanadium dioxide layer co-doped M and R, where M is two or more elements selected from a group consisting of titanium, niobium, molybdenum and tungsten, R is one or more elements selected from a group consisting of rhodium, palladium and ruthenium.

Abstract: A coated article is provided so as to have a fairly high visible transmission (TY or Tvis) to sheet resistance (Rs) ratio (i.e., a ratio Tvis/Rs). The higher this ratio, the better the coated article's combined functionality of providing for both good solar performance (e.g., ability to reflect and/or absorb IR radiation) and high visible transmission. In certain example embodiments, coated articles herein may be heat treatable. Coated articles herein may be used in the context of insulating glass (IG) window units, architectural or residential monolithic window units, vehicle window units, and/or the like.

Abstract: A glass composition for ultraviolet light is provided. The glass composition for ultraviolet light contains Lu, Al, and O in an amount of 99.99 weight % or more in total. The glass composition contains Lu in an amount of 24% or more and 33% or less in cation percent and Al in an amount of 67% or more and 76% or less in cation percent.