Abstract: Certain example embodiments relate to a layer of or including Ti1-xSixOy and/or a method of making the same. In certain example embodiments, the Ti1-xSixOy-based layer may be substoichiometric with respect to oxygen. In certain example embodiments of this invention, the layer may include Ti1-xSixOy where x is from about 0.05 to 0.95 (more preferably from about 0.1 to 0.9, and even more preferably from about 0.2 to 0.8, and possibly from about 0.5 to 0.8) and y is from about 0.2 to 2 (more preferably from about 1 to 2, and even more preferably from about 1.5 to 2, and possibly from about 1.9 to 2). The layer may have an index of refraction of from about 1.6 to 1.9. The layer may also be used with a transparent conductive oxide in a transparent conductive coating.

Abstract: A coated article is provided with at least one infrared (IR) reflecting layer. In certain embodiments, the coating is provided with at least one layer of zirconium silicon oxynitride (e.g., ZrSiOxNy), for improving the coated article's ability to block of UV radiation. The oxygen content of the layer may be adjusted in order to tune the coating's visible transmission versus UV blockage.

Abstract: Certain example embodiments of this invention relate to sputtered aluminum second surface mirrors with tapes optionally provided thereto, and/or methods of making the same. The tape replaces the paint backing that conventionally is used in the mirror industry to help protect the reflecting member of the mirror from the ingress of moisture. The final layer of the thin film layer stack is selected so as to help make its interface with the tape less sensitive to moisture. Because the safety tape can remain adhered to the layer stack even in high humidity environments, such minors may be used in a potentially broader array of applications and/or environments such as, for example, bathrooms, interior and/or exterior applications in areas where there are humid climates, etc. In one of the example embodiments, the tape is a safety tape.

Abstract: To provide a method for manufacturing a mask blank capable of manufacturing a high quality mask blank that suppresses generation of defects in a thin film for forming a mask pattern with high yields, a method for manufacturing a transfer mask that manufactures the thin film of the mask blank by patterning, and a sputtering target used for manufacturing the mask blank. By using the sputtering target containing silicon and having a hardness of 900 HV or more in Vickers' hardness, the thin film for forming the mask pattern on a substrate is formed by sputtering, and the high quality mask blank that suppresses generating of defects is manufactured, and further the transfer mask is manufactured by patterning the thin film.

Abstract: A coated glass pane comprising at least the following layers in sequence: a glass substrate; a lower anti-reflection layer, comprising in sequence from the glass substrate; a layer based on an oxide of Zn and Sn and/or an oxide of Sn, a separation layer based on a metal oxide and/or an (oxi)nitride of silicon and/or an (oxi)nitride of aluminum, and a top layer based on an oxide of Zn; and a silver-based functional layer.

Abstract: A reflection layer system and a method for the production thereof for front-surface mirrors for solar applications are provided.

Abstract: To provide a process for producing an EUV mask blank, capable of reducing foreign matter attributable to a sputtering target, and a process for producing a substrate with a functional film for such a mask blank.

Abstract: A coated article, and a corresponding method of making the same are provided. The coated article includes a coating supported by a substrate, the coating including a thin metal or metal nitride contact layer (e.g., NiCr, Ni, Cr, CrNx or NiCrNx) located directly between and contacting an infrared (IR) reflecting layer (e.g., Ag) and an oxide barrier layer (e.g., NiCrOx).

Abstract: The present invention provides a manufacturing method of a reflective layer for a reflective type liquid crystal display, comprising: providing a manufacturing method of the reflective layer for a reflective type liquid crystal display, comprising: providing a substrate, the substrate comprising a reflective area and a non-reflective area; coating a photoresist to cover the non-reflective area; placing the substrate in a sputtering chamber for depositing a reflective metal layer on the reflective area of the substrate; passing the reaction gas into the sputtering chamber, and using the RF magnetron sputtering method to bombard the surface of the reflective metal layer such that the surface of the reflective metal layer and the reaction gas react to form a metal compound as the reflective layer.

Abstract: A heat resistant black coating film which is capable of making the surface of optical members to be low reflection property and black property, a black light shading plate having a resin film using the same as a base substrate, and a diaphragm, a diaphragm device for light intensity adjustment and a shutter using the same, and heat resistant light shading tape. They are provided by a black coating film (A), where a titanium oxide film containing titanium and oxygen as main components, and having an oxygen content of from 0.7 to 1.

Abstract: A coated article is provided that may be heat treated in certain example embodiments. A graded layer (e.g., contact layer or other suitable layer) is formed by initially sputter-depositing a layer, and thereafter ion beam treating the sputter-deposited layer with at least reactive gas ions in order to form a graded layer. In certain example embodiments, the result is a coated article that has improved visible transmission and/or durability, without sacrificing optional heat treatability.

Abstract: A process for producing a coated glass, the process comprising, a) providing a glass substrate, b) depositing a chemical vapour (CVD) deposited coating on at least one surface of the glass substrate to produce a CVD coated glass, and c) sputter depositing a further coating on the surface of the CVD coated glass, wherein the further coating comprises at least three reflective metal layers.

Abstract: The invention provides a substrate bearing a low-maintenance coating. In some embodiments, the coating includes a low-maintenance film that includes both titanium oxide and tungsten oxide. The invention also provides methods and equipment for depositing such coatings.

Abstract: A coated article that can be used in applications such as insulating glass (IG) units, so that resulting IG units can achieve high visible transmission of at least 70% (e.g., when using clear glass substrates from 1.0 to 3.5 mm thick), combined with at least one of: (a) SHGC no greater than about 0.45, more preferably no greater than about 0.40; (b) SC no greater than about 0.49, more preferably no greater than about 0.46; (c) chemical and/or mechanical durability; (d) neutral transmissive color such that transmissive a* is from ?5.0 to 0 (more preferably from ?3.5 to ?1.5), and transmissive b* is from ?2.0 to 4.0 (more preferably from 1.0 to 3.0); and (e) neutral reflective color from the exterior of the IG unit (i.e., Rg/Rout) such that reflective a* is from ?3.0 to 2.0 (more preferably from ?2.0 to 0.5), and reflective b* is from ?5.0 to 1.0 (more preferably from ?4.0 to ?1.0).

Abstract: The present invention relates to the field of analyzing the age and/or quality of certain natural products, for example foods. The invention also relates to devices for analyzing said age and/or quality as well as to methods for preparing such devices, to methods for analyzing natural products and to their use.

Abstract: Certain example embodiments of this invention relate to coated articles with low-E coatings having one or more barrier layer systems including multiple dielectric layers, and/or methods of making the same. In certain example embodiments, providing barrier layer systems that each include three or more adjacent dielectric layers advantageously increases layer quality, mechanical durability, corrosion resistance, and/or thermal stability, e.g., by virtue of the increased number of interfaces. These barrier layer systems may be provided above and/or below an infrared (IR) reflecting layer in the low-E coating in different embodiments. Coated articles according to certain example embodiments of this invention may be used in the context of insulating glass (IG) window units, vehicle windows, other types of windows, or in any other suitable application.

Abstract: The invention relates to a method for producing an ultrabarrier layer system through vacuum coating a substrate with a layer stack that is embodied as an alternating layer system of smoothing layers and transparent ceramic layers, but comprising at least one smoothing layer between two transparent ceramic layers, which are applied by sputtering, in which during the deposition of the smoothing layer a monomer is admitted into an evacuated coating chamber in which a magnetron plasma is operated.

Abstract: Methods are generally provided for sputtering thin films on individual substrates. Individual substrates can be conveyed into a vacuum chamber to draw a sputtering pressure that is less than about 50 mTorr. Then, the individual substrates can be conveyed into a sputtering chamber and past a planar magnetron continuously sputtering a target by an ionized gas at the sputtering pressure such that a thin film is formed on a surface of the individual substrate. The target is subjected to a high frequency power having a frequency from about 400 kHz to about 4 MHz at power levels of greater than about 1 kW. In one particular embodiment, the method can be generally directed to sputtering thin films on individual substrates defining a surface having a surface area of about 1000 cm2 to about 2500 cm2.

Abstract: The invention relates to a substrate made of an aluminium-silicon alloy or crystalline silicon to which a polishable layer is applied and also to a metal mirror which comprises this substrate. Furthermore, the invention relates to a method for the production of metal mirrors and also the use of the metal mirror according to the invention.

Abstract: In order to produce stress-reduced reflective optical elements (1) for an operating wave length in the soft X-ray and extreme ultraviolet wavelength range, in particular for use in EUV lithography, it is proposed to apply, between substrate (2) and a multilayer system (4) optimized for high reflectivity at the operating wavelength, a stress-reducing multilayer system (6) with the aid of particle-forming particles having an energy of 40 eV or more, preferably 90 eV or more. Resulting reflective optical elements are distinguished by low surface roughness, a low number of periods in the stress-reducing multilayer system and also high values of the stress-reducing multilayer system.

Abstract: A colored substrate and a method for producing a substrate having a colored interference filter layer containing a polycrystalline metal oxide or polycrystalline metal oxides with the aid of physical or chemical vapor deposition using a coating system, in particular with the aid of a sputtering gas, in which at least two, in particular at least six, coating layers are vapor deposited one on top of the other forming polycrystalline metal oxides in each case.

Abstract: Disclosed is a reflective film laminate, which has a pure Ag film or an Ag-based alloy film as a first layer on a base body, and an oxide film of a metal of one or more kinds selected from among Zr, Cr, Nb, Hf, Ta, V, Ni, Mo, W, Al and Si, as a second layer on the first layer. The thickness of the second layer is 0.1 to 10 nm, and deterioration of the reflection ratio of reflective film laminate is 30% or less by having the second layer provided therein. The reflective film laminate is provided with a protection film, which has a high initial reflection ratio, excellent sulfuration resistance and heat resistance, and an extremely small number of pin holes. As a result, the reflection ratio of the reflective film laminate is not easily deteriorated due to aggregation of Ag atoms of the Ag film.

Abstract: The invention relates mainly to an infrared reflector consisting of a metallic substrate coated with a layer of zirconium and chromium nitride of general formula (ZrxCr1-x)1-yNy with x between 0.15 and 0.7 and y between 0.01 and 0.265. The invention also relates to a method of manufacturing this infrared reflector.

Abstract: Example embodiments of this invention relate to a method of making a thermally tempered coated article including a transparent conductive oxide (TCO) film in a color compression configuration supported by a tempered glass substrate. A coated article, that is thermally tempered and made by such a process, is also provided. Coated articles according to certain example non-limiting embodiments of this invention may be used in applications such as solar cells, oven doors, electrostatic discharge glass, solar control windows, defrosting windows, or other types of windows in certain example instances.

Abstract: A coated article for use in spandrel applications and/or the like is provided. In certain example embodiments, a coating is provided to have a coating design which permits the coating to realize more predictable and/or consistent optical characteristics such as glass side reflectance, color and/or the like. Certain example embodiments of this invention relate to a method of making a coated article for spandrel applications or the like. In certain embodiments, a powder inclusive lacquer coating is used as an overcoat.

Abstract: A method of making a cathode structure for an OLED provided over organic layers includes evaporating a first layer over the organic layers, such layer including a metal or metal alloy whose work function is less that 4.0 eV, or a material including an electron-injecting dopant and a reactive metal; depositing at least one second layer of an inorganic material over the first layer to form a buffer structure with the first layer; and sputtering a protective layer of a metal or metal alloy provided over the buffer structure.

Abstract: A coated article is provided so as to have a fairly high visible transmission (TY or Tvis) to sheet resistance (Rs) ratio (i.e., a ratio Tvis/Rs). The higher this ratio, the better the coated article's combined functionality of providing for both good solar performance (e.g., ability to reflect and/or absorb IR radiation) and high visible transmission. In certain example embodiments, coated articles herein may be heat treatable. Coated articles herein may be used in the context of insulating glass (IG) window units, architectural or residential monolithic window units, vehicle window units, and/or the like.

Abstract: A device housing is described. The device housing includes a transparent substrate, a color layer formed on an inside surface of the substrate, and a reflection layer formed on the color layer. The substrate is made of transparent glass or plastic. The color layer is a zirconium oxide layer. The reflection layer is a zirconium layer. The color value of the device housing has a L* coordinate between 30 and 35, an a* coordinate between 9 and 11, and a b* coordinate between ?18 and ?20 in the CIE LAB color system. A method for making the device housing is also described.

Abstract: The invention relates to a substrate (10), especially a transparent glass substrate, provided with a thin-film multilayer coating comprising an alternation of n functional layers (40) having reflection properties in the infrared and/or in solar radiation, especially metallic functional layers based on silver or on metal alloy containing silver, and (n+1) dielectric films (20, 60), where n?1, said films being composed of a layer or a plurality of layers (22, 24, 62, 64), at least one of which is made of a dielectric material, so that each functional layer (40) is placed between at least two dielectric films (20, 60), characterized in that at least one functional layer (40) includes a blocker film (30, 50) consisting of at least one interface layer (32, 52) immediately in contact with said functional layer, this interface layer being based on titanium oxide TiOx.

Abstract: This invention relates to an optical article having antistatic and antireflection or reflective properties, comprising a substrate having at least one main surface coated with an antireflection or reflective coating, said coating comprising at least one electrically conductive layer comprising at least 30% tin oxide (SnO2) by weight relative to the total weight of the electrically conductive layer, said electrically conductive layer having been deposited by ion-assisted deposition, and said substrate having a water uptake rate equal to or greater than 0.6% by weight relative to the total weight of said substrate, the water uptake rate being measured after predrying said substrate and then storing it for 800 hours in a chamber at 50° C. under 100% relative humidity and at atmospheric pressure.

Abstract: Deposition processes and devices for the fabrication of multilayer systems to better control the energy contribution at different stages of the deposition. This is achieved by depositing films by sputtering in a scheme providing for thermalized particles. Thermalized particles are obtained by choosing the working gas pressure and the distance between target and substrate to result in a mean free path of particles smaller than the distance between target and substrate or to result in a product of pressure and distance being larger than 2.0 cmPa.

Abstract: The radio wave transmitting decorative member and the method of producing thereof efficiently and stably of the present invention is provided with radio wave transmitting properties as well as mirror-surface like metallic luster, hardly loses its metallic luster, and can be produced at a low cost. The method of producing a radio wave transmitting decorative member, having a substrate, a transparent organic material layer, and a light reflecting layer formed of an alloy composed of either silicon or germanium and a metal provided between the substrate and the transparent organic material layer; wherein the light reflecting layer is formed from a target having an alloy composed of either silicon or germanium, and of a metal with the use of a DC magnetrons sputtering.

Abstract: Provision of a process for producing an EUV mask blank wherein formation of scars of a glass substrate surface or a chuck surface due to sandwiching of foreign objects such as particles between an electrostatic chuck and the glass substrate, is suppressed. A process for producing an EUV mask blank wherein an electrostatic chuck for clamping a glass substrate has a main body and a lower dielectric layer made of an organic polymer film, and electrode portion made of an electrically conductive material and an upper dielectric layer made of an organic polymer film provided in this order on the main body, wherein the upper dielectric layer includes an anode and a cathode.

Abstract: A coated article that can be used in applications such as insulating glass (IG) units, so that resulting IG units can achieve high visible transmission of at least 70% (e.g., when using clear glass substrates from 1.0 to 3.5 mm thick), combined with at least one of: (a) SHGC no greater than about 0.45, more preferably no greater than about 0.40; (b) SC no greater than about 0.49, more preferably no greater than about 0.46; (c) chemical and/or mechanical durability; (d) neutral transmissive color such that transmissive a* is from ?5.0 to 0 (more preferably from ?3.5 to ?1.5), and transmissive b* is from ?2.0 to 4.0 (more preferably from 1.0 to 3.0); and (e) neutral reflective color from the exterior of the IG unit (i.e., Rg/Rout) such that reflective a* is from ?3.0 to 2.0 (more preferably from ?2.0 to 0.5), and reflective b* is from ?5.0 to 1.0 (more preferably from ?4.0 to ?1.0).

Abstract: A method of making a coated article (e.g., window unit), and corresponding coated article are provided. A layer of or including diamond-like carbon (DLC) is formed on a glass substrate. Then, a protective layer is formed on the substrate over the DLC inclusive layer. During heat treatment (HT), the protective layer prevents the DLC inclusive layer from significantly burning off. Thereafter, the resulting coated glass substrate may be used as desired, it having been HT and including the protective DLC inclusive layer.

Abstract: The invention relates to a glazing that comprises at least one layer deposited by cathodic spraying under vacuum, said layer containing one or more oxides and a proportion in weight of titanium oxide of at least 40% and not exceeding 95%. The thickness of the layer in question and optionally the thickness of the other layers containing metal oxide is/are selected so that on a clear “float” glass sheet having a thickness of 4 mm, said layer(s) would yield a reflection of at least 15% and a light transmission of at least 60%. The layer or layer system in question further has a mechanical and/or chemical resistance comparable to that of layers produced by pyrolysis for obtaining products having the same kind of optical properties.

Abstract: A process for forming a textured back reflector for a photovoltaic device is provided. The process includes providing a moving substrate, positioning the substrate within a deposition chamber, and sputtering a metal or a metal alloy target positioned within the deposition chamber to produce sputtered material. The process further includes introducing a reacting gas mixed with argon into the deposition chamber. The reacting gas and the sputtered metal or metal alloy material form an alloy layer. The alloy layer is formed on the substrate and provides a textured surface on the substrate.

Abstract: The film type light shading plate widely applicable to optical parts in which a light shading thin film having sufficient light shading performance and low reflectivity in the visible range is formed on a resin film of a base substrate, and further a diaphragm for digital camera or digital video camera, a diaphragm device for adjusting a light intensity of projector or a shutter to which said film type light shading plate is applied. The film type light shading plate in which a light shading thin film (B) comprising of a crystalline titanium oxy-carbide film is formed on at least one surface of the resin film substrate (A), characterized in that the light shading thin film (B) has an average optical density of 4.0 or more in wavelength 400 to 800 nm by a carbon content of 0.6 or more as C/Ti atomicity ratio, an oxygen content of 0.2 to 0.6 as O/Ti atomicity ratio, and a total thickness of the light shading thin film (B) of 260 nm or more.

Abstract: The subject of the invention is a mirror, especially a front-face mirror and/or a mirror for concentrating solar energy, comprising a material, which mirror comprises a substrate coated with a multilayer comprising at least one silver layer and at least one protective layer located on top of said at least one silver layer, at least one protective layer being characterized in that at least one of its physicochemical characteristics varies with the distance from the substrate.

Abstract: Methods and apparatus for use with a micromirror element includes a micromirror a micromirror having a substantially flat outer surface disposed outwardly from a support structure that is operable to at least partially support the micromirror. The support structure includes at least one layer overlying at least two discrete planes that are both substantially parallel to the outer surface of the micromirror. In one particular embodiment, the support structure includes annular-shaped sidewalls that encapsulate a photoresist plug.

Abstract: The disclosed subject matter relates to a metal multi-layered film structure that includes two types of metal films including first metal films and second metal films alternately formed on a resin substrate. The first metal films can be composed of an aluminum-based material having a film thickness between 0.7 nm and 20 nm. The second metal films can be composed of a metal selected from the group consisting of stainless steel-based materials, nickel-based materials, cobalt-based materials, titanium-based materials and chromium-based materials, having a film thickness ranging from 1 nm to 20 nm. This metal multi-layered film structure can be manufactured through a method of sputtering. The metal multi-layered film structure is suitable for an extension reflector for vehicular lamps.

Abstract: A scratch resistant coated article is provided which is also resistant to attacks by at least some fluoride-based etchant(s) for at least a period of time. In certain example embodiments, an anti-etch layer(s) is provided on a glass substrate in order to protect the glass substrate from attacks by fluoride-based etchant(s). In certain example embodiments, the anti-etch layer(s) is substantially transparent to visible light. In certain embodiments, a DLC layer(s) may be provided over the anti-etch layer. An underlayer may be provided under the anti-etch layer(s) in certain example embodiments. In certain example embodiments, the anti-etch layer(s) may be of or include a carbide and/or oxycarbide of Zr, Sn or the like.

Abstract: A reflector structure suitable for extreme ultraviolet lithography (EUVL) is provided. The structure comprises a substrate having a multi-layer reflector. A capping layer is formed over the multi-layer reflector to prevent oxidation. In an embodiment, the capping layer is formed of an inert oxide, such as Al2O3, HfO2, ZrO2, Ta2O5, Y2O3-stabilized ZrO2, or the like. The capping layer may be formed by reactive sputtering in an oxygen environment, by non-reactive sputtering wherein the materials are sputtered directly from the respective oxide targets, by non-reactive sputtering of the metallic layer followed by full or partial oxidation (e.g., by natural oxidation, by oxidation in oxygen-containing plasmas, by oxidation in ozone (O3), or the like), by atomic level deposition (e.g., ALCVD), or the like.

Abstract: A coated article is provided that may be used as a vehicle windshield, insulating glass (IG) window unit, or the like. An ion beam is used to treat an infrared (IR) reflecting layer(s) of such a coated article. Advantageously, this has been found to improve sheet resistance (Rs) properties, emittance, solar control properties, and/or durability of the coated article.

Abstract: To provide a heat reflecting glass provided with at least a chromium nitride film, which has a visible light transmittance Tv of at most 35% and a solar transmittance Te/visible light transmittance Tv ratio of less than 1.0 and which undergoes substantially no change in the optical properties even when subjected to heat treatment for strengthening or bending. An oxygen-blocking undercoat film made of silicon nitride is formed on the surface of a glass substrate; a chromium nitride film for heat reflection is formed as an upper layer of the oxygen-blocking undercoat film; and further, an oxygen-blocking protective film made of silicon nitride is formed as an upper layer of the chromium nitride film. The ratio in the number of atoms of nitrogen to chromium in the chromium nitride for heat reflection is from 20% to 60%.

Abstract: A sputter coated article is provided with improved mechanical durability (e.g., pre-HT scratch resistance) and/or thermal stability by sputtering at least one Ag inclusive layer in an atmosphere including at least O2 gas. For instance, in certain example embodiments an Ag inclusive target may be sputtered in an atmosphere including a combination of Ar and O2 gas. In certain embodiments, this enables the resulting AgOx infrared (IR) reflecting layer to better adhere to adjacent contact layer(s).

Abstract: A sputtering target for optical media is mainly composed of Al and contains 1 to 10 at % of one or two species of elements selected from the group consisting of Ta and Nb and 0.1 to 10 at % of Ag. An optical medium 100 comprises a substrate 10 and reflective layers 20A, 20B provided on the substrate 10. Each of the reflective layers 20A, 20B has a composition, mainly composed of Al, containing 1 to 10 at % of one or two species of elements selected from the group consisting of Ta and Nb and 0.1 to 10 at % of Ag.

Abstract: A reflector structure suitable for extreme ultraviolet lithography (EUVL) is provided. The structure comprises a substrate having a multi-layer reflector. A capping layer is formed over the multi-layer reflector to prevent oxidation. In an embodiment, the capping layer is formed of an inert oxide, such as Al2O3, HfO2, ZrO2, Ta2O5, Y2O3-stabilized ZrO2, or the like. The capping layer may be formed by reactive sputtering in an oxygen environment, by non-reactive sputtering wherein the materials are sputtered directly from the respective oxide targets, by non-reactive sputtering of the metallic layer followed by full or partial oxidation (e.g., by natural oxidation, by oxidation in oxygen-containing plasmas, by oxidation in ozone (O3), or the like), by atomic level deposition (e.g., ALCVD), or the like.

Abstract: A method of manufacturing a screen having a screen substrate provided with a plurality of three-dimensional shape units disposed two-dimensionally on a front side of the screen substrate, includes: forming a first film by applying a first film forming material to be an antireflection film to at least part of surfaces of the three-dimensional shape units among the screen substrate; and forming a second film by applying a second film forming material to be a reflecting film with a predetermined incident angle to the screen substrate, the reflecting film on at least part of the antireflection film.

Abstract: A method of producing substrates with functional layers which have high optical properties and/or a high surface smoothness, in particular a low turbidity and significantly lower roughness, is provided. The method includes a sputtering process for coating a substrate with at least one functional layer, the sputtering process being interrupted at least once by the application of an intermediate layer with a thickness of less than 20 nm.