Abstract: The present invention provides a heat shading glass including a glass sheet and a heat shading film formed on the glass sheet. The heat shading film comprises a first metal oxide film, a first Ag film, a second metal oxide film, a second Ag film, and a third metal oxide film, layered in that order on the glass sheet. The oxide films include indium oxide containing tin oxide. An X-ray diffraction chart of the heat shading film shows a diffraction peak of the indium oxide as well as a diffraction peak of the Ag. Thus, as a heat shading laminated glass, it can be used as window glass for buildings or vehicles, has superior visible light transmittance, reflects infrared radiation, has colorless transmission color and reflection color, and has superior durability.

Abstract: A method for forming an optical thin film having multiple optical layers on the surface of a substrate using a magnetron sputtering apparatus with a sputtering chamber having cathodes, the substrate, and at least two kinds of targets disposed therein. An inert gas and a reactive gas are introduced into the sputtering chamber to form at least some of the multiple optical layers on the substrate by successively alternately repeatedly forming at least two kinds of optical layers each having a different optical constant by means of the reactive magnetron sputtering apparatus under a condition of a discharge pressure being no greater than 1.3×10−1 Pa.

Abstract: A heat treatable coated article (e.g., vehicle windshield, IG unit, etc.) is provided with a dual-silver low-E coating. Before and/or after heat treatment (HT); the coating and/or coated article has a visible transmittance of at least 70%, more preferably at least 75%. Moreover, the coating and/or coated article is designed so as to have approximately the same color when viewed over a wide range of viewing angles. In certain embodiments, at least one contact layer (e.g., of or including NiCrOx) that contacts an infrared (IR) reflecting layer (e.g., Ag) is oxidation graded so that it progressively becomes less oxidized through its thickness as it nears the IR reflecting layer. In still other embodiments, a Si-rich silicon nitride layer(s) may be utilized to reduce haze.

Abstract: A tensile force is applied to at least a surface of a film to which a conductive material is applied within an elastic limit by a tensile force applying means, the conductive material is applied to a first surface of the film by a coating means in a tensioned state, and thereafter the tensile force is released by a tensile force releasing means to form the film having a conductive sheet for a touch-panel. Preferably, the tensile force applying means is a barrel-shaped roller.

Abstract: The invention provides a method for manufacturing an optical information recording medium having a track pitch of 200 to 400 nm and a groove depth of 20 to 150 nm, and being capable of recording and reproducing using a light with a wavelength of 450 nm or less, the method at least comprising: a metal reflective layer forming step for forming a metal reflective layer on a substrate; a recording layer forming step for forming a recording layer of an organic dye type on said metal reflective layer; and a cover layer forming step for forming a cover layer on said recording layer; in this order.

Abstract: When forming an optical thin film on a surface of a bulb of a light source such as an electric lamp or a discharge lamp, a thin film whose interface/surface is less rough is formed on a base having a spheroid shape. When forming a thin film on a base 2 with a spheroid shape, which is disposed in a vacuum chamber 4 of a film-forming device and spun on its rotation axis, an interface or a surface of the thin film is made less rough and the thickness distribution of the thin film is made smaller by setting a sputtering gas pressure to be in a range from 0.04 Pa to 5.

Abstract: This invention provides a method for producing a CD-R optical recording medium. A first stack at a first stage is created by forming on a substrate a recording layer containing an organic dyestuff and a metal layer. At least after a formation of the metal layer; the first stack is transported from the first stage along a transport path towards a second stage through an atmosphere having a relative humidity. The relative humidity is maintained at 40% or less. To control the relative humidity, a shielding plate may be provided around the transport path. An air conditioner may locally control the relative humidity of an area encircled by this shielding plate.

Abstract: A photocatalytically-assisted self-cleaning (“PASC”) coating on a substrate enables the substrate to shed dirt simply by rinsing with water. A method of making a PASC coating includes depositing by chemical vapor deposition an alkali metal diffusion barrier layer on a substrate; sputtering an ultraviolet radiation activated layer on the alkali metal diffusion barrier layer at a temperature of 100° C. or less; and, without heating above 100° C., exposing the ultraviolet radiation activated layer to ultraviolet radiation to form the self-cleaning substrate. The sputter deposition of the ultraviolet radiation activated layer on the chemical vapor deposited alkali metal diffusion barrier layer allows the ultraviolet radiation activated layer to be activated upon exposure to UV radiation without first having been heated during and/or after deposition.

Abstract: A method and apparatus for forming an optical coating using negatively charged ions, which form a high quality thin film of high density, are disclosed in the present invention. The apparatus includes a gas flow controller controlling an amount of an externally introduced inert gas, a pre-heater pre-heating the inert gas introduced from the gas flow controller through a first gas flow tube, a cesium vaporizer discharging a cesium gas through a third gas flow tube carried by the inert gas introduced from the pre-heater through a second gas flow tube and a bubbler, a pressure detector detecting a vapor pressure of the cesium vaporizer, a pressure control valve controlling the vapor pressure of the cesium vaporizer, a gas introduction tube introducing the cesium gas to a vacuum chamber, a plurality of targets in the vacuum chamber, and a plurality of cesium discharge units selectively discharging the cesium gas to each surface of the targets.

Abstract: A glazing assembly is provided made of at least one transparent substrate having a stack thereon that includes an alternation of n functional layers and n−1 coatings, wherein the functional layers have reflection properties in the infrared and/or solar radiation and where n≧1 and where, in order to maintain the quality of the stack when the substrate is subjected to a heat treatment step, at least one of the following must be satisfied: the coating placed on top of at least one of the functional layers includes at least one barrier layer providing a barrier to at least oxygen and water; and at least one absorbent or stabilizing layer made of a material capable of absorbing or stabilizing the consituent material of the functional layer forms a part of either the coating placed on top of the functional layer and under the barrier layer or the coating placed beneath the functional layer; and a method for production of the glazing assembly.

Abstract: Multilayer high transmittance, low emissivity coatings on transparent substrates feature a special antireflective base film of at least two parts on the substrate-near side of a metallic, reflective film. A first of the two parts is in contact with the metallic film. This first film-part has crystalline properties for causing the metallic film to deposit in a low resistivity configuration. The second of the two film-parts supports the first part and is preferably amorphous. Coated articles of the invention also feature, in combination with the above-mentioned base film or independently thereof, a newly discovered, particularly advantageous subrange of thicker primer films for coated glass that can be thermally processed for tempering, heat strengthening, or bending.

Abstract: A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for producing hardened surfaces, surfacing machine tools, etc. and for ultra-thin band pass filters as well as the low Z element in low Z/high Z optical components, such as mirrors which enhance reflectivity from grazing to normal incidence.

Abstract: A method of sputter deposition onto an organic material, wherein the discharge gas of the sputtering operation is a gas having a spectrum of light emission of a lower energy than that of argon.

Abstract: In a film formation method comprising introducing a sputtering gas into a film forming chamber and forming a film on a substrate therein, the partial pressure of H2O in an atmosphere inside the film forming chamber is controlled so as to satisfy prescribed conditions, thereby forming a reflective layer of a prescribed reflectance on the substrate, thereby providing a film formation method using sputtering and a production method of a photovoltaic element using the film formation method that attain stable good film formation even during long-time sputter film formation, can constantly form a reflective film with a desired reflectance, has excellent workability and durability, and constantly attain high photoelectric conversion efficiency.

Abstract: It is an object to improve the recording transfer rate of a phase change recording medium, to reduce the producing costs of the medium, to greatly increase the degree of freedom for the selection of the substrate of the medium, particularly to provide a medium having a structure of Rc<Ra, and to increase the storage capacity of the medium. In order to accomplish this object, a medium, wherein the initial state is an amorphous state immediately after sputtering, has a structure having a unique short-range order. In addition, there is provided a medium wherein the distribution of the number of crystal grains with respect to grain sizes has a plurality of maximum values. Moreover, when a recording operation is carried out by laser beams, an amorphous state band part is formed between tracks. In addition, the thermal conductivity of a recording layer is in a unique range, and contains Kr or Xe in a specific range.

Abstract: There is disclosed an improved method of manufacturing an optical device using impurity induced Quantum Well Intermixing (QWI) process.

Abstract: A glass coated with a heat reflecting colored film, which is excellent in the uniformity of the film thickness and composition, which is free from a unfavorable whitish coloration in ceramic color printing and which is excellent in a silver print coloration, is presented. A glass coated with a heat reflecting colored film, obtained by heat treatment of a glass having a first layer containing iron oxide, chromium oxide and nickel oxide and a second layer containing cobalt oxide, laminated sequentially by a sputtering method, on one side of a glass substrate.

Abstract: Beryllium-based multilayer structures and a process for fabricating beryllium-based multilayer mirrors, useful in the wavelength region greater than the beryllium K-edge (111 Å or 11.1 nm). The process includes alternating sputter deposition of beryllium and a metal, typically from the fifth row of the periodic table, such as niobium (Nb), molybdenum (Mo), ruthenium (Ru), and rhodium (Rh). The process includes not only the method of sputtering the materials, but the industrial hygiene controls for safe handling of beryllium. The mirrors made in accordance with the process may be utilized in soft x-ray and extreme-ultraviolet projection lithography, which requires mirrors of high reflectivity (>60%) for x-rays in the range of 60-140 Å (60-14.0 nm).

Abstract: A hydrophobic coating is provided. The coating has a high contact angle &thgr; which does not significantly decrease or degrade upon lengthy exposure to ultraviolet (UV) radiation. In certain embodiments, the coating has a contact angle &thgr; of at least 70 degrees both before and after significant exposure to UV radiation.

Abstract: A substrate is coated with a solar management coating system including at least one infrared (IR) reflective layer. A diamond-like carbon (DLC) inclusive protective coating system (e.g., including at least one highly tetrahedral amorphous carbon (ta-C) inclusive layer having sp3 carbon-carbon bonds) is provided on the substrate over at least the IR reflective layer in order to make the coating system scratch resistant, abrasion resistant, and generally mechanically durable. The DLC inclusive protective coating system may be hydrophobic, hydrophillic, or neutral in different embodiments of the invention. Optionally, at least one fluoro-alkyl silane (FAS) compound inclusive layer may be provided on the substrate over at least one of the DLC inclusive layer(s) in hydrophobic embodiments in order to increase contact angle &thgr; of the coated article.

Abstract: An overcoat protected diffraction grating. A replica grating having a thin aluminum reflective grating surface is produced by replication of a master grating or a submaster grating. The thin aluminum reflective surface may be cracked or have relatively thick grain boundaries containing oxides and hydroxides of aluminum and typically is also naturally coated with an aluminum oxide film. The grating is subsequently overcoated in a vacuum chamber with one or two thin, pure, dense aluminum overcoat layers and then also in the vacuum the aluminum overcoat layer or layers are coated with one or more thin protective layers of a material transparent to ultraviolet radiation. In preferred embodiments this protective layer is a single layer of MgF2, SiO2 or Al2O3. In other preferred embodiments the layer is a layer of MgF2 or SiO2 covered with a layer of Al2O3 and in a third preferred embodiment the protective layer is made up of four alternating layers of MgF2 and Al2O3 or four alternating layers of SiO2 and Al2O3.

Abstract: A method for producing a layer of a metal oxide with optical losses of 15 dB/cm, at most, for light with a wavelength of 633 nm, includes depositing the layer using magnetic field enhanced reactive DC-sputtering, from a metallic target.

Abstract: A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

Abstract: A target for use in sputtering may include a backing adapted to be operatively connected to a sputtering power source and an outer layer of a sputterable material carried by the backing The sputterable material comprises a mixture of zinc and a second metal having a melting point less than that of the zinc. The zinc and the second metal are present in the sputterable material in metallic form and are arranged as discrete volumes of the second metal in a matrix of zinc. This target may be manufactured by simultaneously plasma spraying zinc metal and the second metal onto a backing to create an outer layer of a sputterable material carried by the backing. The target may be used by placing the target and a substrate in a sputtering chamber and applying power to the target while maintaining in the sputtering chamber a reactive atmosphere comprising oxygen, thereby depositing on a surface of the substrate a film comprising oxides of zinc and the second metal.

Abstract: A combination process of vacuum sputtering and wet coating produces a high conductivity and light attenuation anti-reflection coating on a substrate of a CRT surface. The coating includes five layers by vacuum sputtering and one layer on top of the coating by conventional wet process. The layers produced by vacuum sputtering provides high anti-reflection, low resistivity, and light-attenuation effect. The layer produced by wet process provides fingerprint proof effect.

Abstract: A multicolor organic light emitting device employs vertically stacked layers of double heterostructure devices which are fabricated from organic compounds. The vertical stacked structure is formed on a glass base having a transparent coating of ITO or similar metal to provide a substrate. Deposited on the substrate is the vertical stacked arrangement of three double heterostructure devices, each fabricated from a suitable organic material. Stacking is implemented such that the double heterostructure with the longest wavelength is on the top of the stack. This constitutes the device emitting red light on the top with the device having the shortest wavelength, namely, the device emitting blue light, on the bottom of the stack. Located between the red and blue device structures is the green device structure.

Abstract: A process for coating a substrate with titanium dioxide, which process comprises the D.C. plasma sputtering and/or mid-frequency sputtering from a sputtering target which comprises sub-stoichiometric titanium dioxide, TiOx, where x is below 2.

Abstract: A solar control member utilizes a combination of layers that include spaced apart titanium nitride layers to selectively transmit a higher percentage of visible light than near infrared energy, with a low visible light reflection. The titanium nitride layers are spaced apart by a distance that promotes optical decoupling with respect to occurrence of constructive and destructive interference of visible light propagating between the two titanium nitride layers. In one embodiment, the titanium nitride layers are spaced apart by a laminating adhesive layer. In another embodiment, the titanium nitride layers are formed on opposite sides of a substrate. Each titanium nitride layer is sputter deposited. Care is taken to ensure that each layer does not become too metallic and to ensure that excessive oxygen is not incorporated into the layer.

Abstract: A light quantity correction filter that can implement the desired transmittance distribution precisely and easily without complicating an exposure system, a method of making the light quantity correction filter, and a method of manufacturing a color cathode ray tube using the light quantity correction filter are provided.

Abstract: An improved method and apparatus for applying discrete area holograms or other optical devices directly onto documents or other substrates in a continuous process analogous to the operation of a printing press. The continuous process is carried out in a vacuum chamber in which at least two process steps are performed in sequence: the formation of a micro-grooved discrete resin area and a localized coating of it with a reflective or refractive material layer. The formation of the micro-grooved resin area can be accomplished by electron beam curing of the resin. The localized coating of the micro-grooved resin can be done by sputtering. One or more other steps, including pre-coating, post-coating and partial removal of the reflective or refractive layer, may also be carried out as part of the continuous process within the vacuum chamber.

Abstract: Object: To provide a method for preparing an optical thin film having multiple optical layers with little inclusion of impurities and having a high density.

Abstract: A heat-treatable coated glass article comprises a substantially transparent substrate with a substantially transparent dual-function coating on a surface of the substrate. The coating provides low emissivity and high anti-solar performance properties. It comprises a first anti-reflection layer of dielectric material, preferably tungsten oxide. An infra-red reflective layer of silver metal and/or copper metal overlies the anti-reflection dielectric layer. A buffer layer, such as a chromium buffer layer, is positioned between the anti-reflection layer and the infra-red reflective layer. Also, optionally, a color control layer may be used, preferably being positioned between the anti-reflection layer and the substrate. A second buffer layer directly overlies the infra-red reflective layer. A second anti-reflection layer overlies the second buffer layer. In accordance with a method of manufacturing the coated article, each of the layers of the coating is deposited in turn by D.C.

Abstract: A method and article are disclosed wherein a substrate is provided with a photocatalytically-activated self-cleaning surface by forming a photocatalytically-activated self-cleaning coating on the substrate by spray pyrolysis chemical vapor deposition or magnetron sputter vacuum deposition. The coating has a thickness of at least about 500 Angstroms to limit sodium-ion poisoning to a portion of the coating facing the substrate. Alternatively, a sodium ion diffusion barrier layer is deposited over the substrate prior to the deposition of the photocatalytically-activated self-cleaning coating to prevent sodium ion poisoning of the photocatalytically-activated self-cleaning coating. The substrate includes glass substrates, including glass sheet and continuous float glass ribbon.

Abstract: A process for coating a substrate surface with titanium dioxide, which process comprises the D.C. plasma sputtering and/or mid-frequency sputtering from a sputtering target which comprises sub-stoichiometric titanium dioxide, TiOx, where x is below 2.

Abstract: A silver oxide layer capable of absorbing and/or reflecting significant amounts of ultraviolet (UV) radiation, and a method of making the same. An ion beam including oxygen ions is utilized to densify silver material and transform it into a silver oxide inclusive layer. Due to the densification caused by the bombardment of oxygen ions, the resulting silver oxide layer is capable of absorbing and/or reflecting significant amounts of UV radiation. Such silver oxide layers may be utilized in the context of any suitable coating system where UV absorption and/or reflection is desired.

Abstract: The present invention provides a method for forming a film of aluminum oxide in which a target containing aluminum is sputtered in a gas containing fluorine atoms. The thin film of aluminum oxide according to the present invention has little optical absorption and high refractive index in the ultraviolet and vacuum ultraviolet regions.

Abstract: A method of making a micro-mirror light beam switch having a thin flexible movable support member for supporting a thin central reflective mirror surface thereon and for supporting a plurality of thin unimorph piezoelectric cantilevered mirror actuators mechanically coupled between a fixed substrate and movable hinging portions of the thin movable support member. The method employs thin film deposition techniques and photolithography for readily forming the extremely thin switch, whereby the components thereof are substantially co-planar for precisely controlled, multi-axial micro-mirror motion and low voltage operation necessary for the rapid switching of optical traffic from fiber to fiber in the next-generation optical networks.

Abstract: A multi-layer antireflection coating is formed to include successive layers of a medium refractive index material, a high refractive index material, and a low refractive index material. The medium refractive index layer is hydrogenated in order to tailor the refractive index of the material to below 1.99 and to increase clarity in transmission. Preferably, the hydrogen atomic concentration is at least 7 percent, more preferably exceeds 9 percent, and most preferably exceeds 18 percent. The three layers combine to form a three-layer antireflection coating, but the hydrogenation may be used in antireflection coatings having a greater or lesser number of layers.

Abstract: Disclosed are compositions of matter which include a thin metallic and/or metallic oxide, nitride, carbide, silicide, boride, or sulfide coating disposed directly upon a polymeric substrate, in the absence of a carrier layer for the thin coating. Also disclosed are methods to make the composition and an apparatus to practice the method.

Abstract: In a film formation method comprising introducing a sputtering gas into a film forming chamber and forming a film on a substrate therein, the partial pressure of H2O in an atmosphere inside the film forming chamber is controlled so as to satisfy prescribed conditions, thereby forming a reflective layer of a prescribed reflectance on the substrate, thereby providing a film formation method using sputtering and a production method of a photovoltaic element using the film formation method that attain stable good film formation even during long-time sputter film formation, can constantly form a reflective film with a desired reflectance, has excellent workability and durability, and constantly attain high photoelectric conversion efficiency.

Abstract: A recording medium having sufficient characteristics, such as signal characteristics at an elevated density or recording durability, and a method for producing the recording medium. Specifically, there is provided an optical recording medium having a recording layer formed of a phase-change material capable of producing reversible phase changes between the crystal state and the amorphous state, in which the phase changes are induced in the recording layer on illuminating light rays on the recording layer to record and/or erase information signals. The recording layer contains Ag&agr;In&bgr;Sb&ggr;Te&dgr; as the phase-change material, in which the proportions of components &agr;, &bgr;, &ggr; and &dgr; in at% meet the relation of 6≦&agr;≦16, 1.1≦&dgr;/&bgr;≦2.2 and 2≦&ggr;/&dgr;≦3.

Abstract: The invention relates to a glass substrate having on at least one of its faces an antireflection coating formed by a stack of thin dielectric material layers having alternately high and low refractive indices. To prevent the modification of the optical properties of the coating in the case where the substrate is subject to a heat treatment such as tempering, bending or annealing, the layer or layers of the stack which are liable to deteriorate on contact with alkali ions such as sodium ions are separated form the substrate by at least one layer forming part of the antireflection coating and forming a “shield” with respect to the diffusion of alkali.

Abstract: Durable—long lived plastic films carrying sputter-deposited metal layers such as reflective metal layers on both sides are disclosed. The slip side of the plastic film is not preglowed. The nonslip side is preglowed. This combination of glowing and not preglowing leads to the desired long life.

Abstract: A glazing assembly is provided made of at least one transparent substrate having a stack thereon that includes an alternation of n functional layers and n-1 coatings, wherein the functional layers have reflection properties in the infrared and/or solar radiation and where n≳1 and where, in order to maintain the quality of the stack when the substrate is subjected to a heat treatment step, at least one of the following must be satisfied: the coating placed on top of at least one of the functional layers includes at least one barrier layer providing a barrier to at least oxygen and water; and at least one absorbent or stabilizing layer made of a material capable of absorbing or stabilizing the consituent material of the functional layer forms a part of either the coating placed on top of the functional layer and under the barrier layer or the coating placed beneath the functional layer; and a method for production of the glazing assembly.

Abstract: An improved method and apparatus for making a dual-layer DVD disc that does not require a stamping step (typically, as part of the 2P prior art manufacturing process) during its manufacture. As proposed by Mueller, a polycarbonate substrate is molded and coated with a semireflective data layer in the usual way. A PMMA substrate is molded and coated with a fully reflective data layer. Adhesive is placed on the semireflective data layer, and the fully reflective data layer is transferred from its PMMA substrate to the polycarbonate substrate. The polycarbonate substrate thus ends up with two data layers in conformance with the DVD specifications, and the PMMA substrate can even be recycled for another use. However, instead of using a PMMA substrate that is larger than the polycarbonate substrate as proposed by Mueller, in the invention they have equal diameters. This allows conventional molding equipment to be used with no major changes.

Abstract: A multicolor organic light emitting device employs vertically stacked layers of double heterostructure devices which are fabricated from organic compounds. The vertical stacked structure is formed on a glass base having a transparent coating of ITO or similar metal to provide a substrate. Deposited on the substrate is the vertical stacked arrangement of three double heterostructure devices, each fabricated from a suitable organic material. Stacking is implemented such that the double heterostructure with the longest wavelength is on the top of the stack. This constitutes the device emitting red light on the top with the device having the shortest wavelength, namely, the device emitting blue light, on the bottom of the stack. Located between the red and blue device structures is the green device structure.

Abstract: The present invention provides a method for forming a film of aluminum oxide in which a target containing aluminum is sputtered in a gas containing fluorine atoms.

Abstract: By heating a film comprising an indium-zinc oxide (IZO) as its main component under an ambient atmosphere of low-concentration oxygen, a transparent conductive film showing a high transmittance of about 80% or more in a wavelength region of 450 to 3200 nm can be obtained. The electrical resistivity of the transparent conductive film is about 3.0×10−3 &OHgr;-cm or less. A film with IZO as its main component is substantially in amorphous form or microcrystalline form, and such a film may be fabricated by sputtering.

Abstract: Silicon-chromium cathode targets comprising 5 to 80 weight percent chromium are disclosed for sputtering absorbing coatings of silicon-chromium alloy in atmospheres comprising inert gas, reactive gases such as nitrogen, oxygen, and mixtures thereof which may further comprise inert gas, such as argon, to form nitrides, oxides, and oxynitrides as well as metallic films. The presence of chromium in the cathode target in the range of 5 to 80 weight percent provides target stability and enhanced sputtering rates over targets of silicon alone, comparable to the target stability and sputtering rates of silicon-nickel, not only when sputtering in oxygen to produce an oxide coating, but also when sputtering in inert gas, nitrogen or a mixture of nitrogen and oxygen to produce coatings of silicon-chromium, silicon-chromium nitride or silicon-chromium oxynitride respectively.

Abstract: A method for forming an oxide film on a substrate by a sputtering process using a target comprising a metal as the main component, wherein sputtering is carried out in an atmosphere which contains a gas containing carbon atoms.