Abstract: A method according to one embodiment includes depositing a dielectric hard mask layer above a polymer mask under-layer; forming a photoresist mask above the hard mask layer; transferring the image of the photoresist mask onto the hard mask layer using reactive ion etching, thereby defining a hard mask; determining that a critical dimension bias of the hard mask is within or outside a specification; and changing a level of an input source power used during a subsequent reactive ion etching step to move the critical dimension bias towards a target critical dimension bias when the critical dimension bias of the hard mask is outside the specification. Additional embodiments are also disclosed.

Abstract: A method of manufacturing a magnetic recording medium is provided. The method includes: forming a magnetic layer 2 on a non-magnetic substrate 1; forming a mask layer 3 on the magnetic layer 2; forming a resist layer 4 which is patterned into a predetermined shape on the mask layer 3; patterning the mask layer 3 into a shape corresponding to the resist layer 4 using the resist layer 4; patterning the magnetic layer 2 into a shape corresponding to the mask layer 3 using the patterned mask layer 3; and removing the mask layer 3 that remains on the magnetic layer 2 by reactive plasma etching. The reactive plasma etching is performed under an atmosphere containing an organic compound having at least one kind or plural kinds of functional groups selected from a hydroxyl group, a carbonyl group, a hydroxy carbonyl group, an alkoxy group, and an ether group.

Abstract: A method of producing bit-patterned media is provided whereby a shell structure is added on a bit-patterned media dot. The shell may be an antiferromagnetic material that will help stabilize the magnetization configuration at the remanent state due to exchange coupling between the dot and its shell. Therefore, this approach also improves the thermal stability of the media dot and helps each individual media dot maintain a single domain state.

Abstract: A method for manufacturing a magnetic head, includes forming, on a non-magnetic film, a main magnetic pole film with a body portion and a write magnetic pole portion continuous with the body portion, and etching the non-magnetic film such that an undercut is formed around the body portion and beneath the write magnetic pole portion. The undercut penetrates beneath the write magnetic pole portion in a track width direction. The method includes wet etching the non-magnetic film beneath the main magnetic pole film at the undercut, the undercut being at least partially filled with an organic filler. The method also includes, after removal of the organic filler, covering at least both sides of the write magnetic pole portion with a magnetic gap film, and forming a write shield film adjacent to the magnetic gap film. The undercut forms a hollow in the non-magnetic film underlying the write magnetic pole portion.

Abstract: A method and system for fabricating a magnetic transducer is described. The transducer has device and field regions, and a magnetoresistive stack. Hard mask layer and wet-etchable layers are provided on the magnetoresistive stack and hard mask layer, respectively. A hard mask and a wet-etchable mask are formed from the hard mask and the wet-etchable layers, respectively. The hard and wet-etchable masks each includes a sensor portion and a line frame. The sensor portion covers part of the magnetoresistive stack corresponding to a magnetoresistive structure. The line frame covers a part of the magnetoresistive stack in the device region. The magnetoresistive structure is defined in a track width direction. Hard bias material(s) are then provided. Part of the hard bias material(s) is adjacent to the magnetoresistive structure in the track width direction. The wet-etchable sensor portion and line frame, and hard bias material(s) thereon, are removed.

Abstract: A method for forming a transducing head having a magnetic writer includes forming a pedestal adjacent to a writer pole and a gap layer, depositing a front shield on the pedestal, etching the front shield, and depositing a backfill layer upon the front shield after etching. The front shield has a controlled thickness upon etching.

Abstract: A perpendicular magnetic recording (PMR) head is fabricated with a pole tip shielded laterally by a graded side shield that is conformal to the shape of the pole tip at an upper portion of the shield but not conformal to the pole tip at a lower portion. The shield includes a trailing shield, that is conformal to the trailing edge of the pole tip and may include a leading edge shield that magnetically connects two bottom ends of the graded side shield.

Abstract: An XMR-sensor and method for manufacturing the XMR-Sensor are provided. The XMR-sensor includes a substrate, a first contact, a second contact and an XMR-structure. The substrate includes a first main surface area and a second main surface area. The first contact is arranged at the first main surface area and the second contact is arranged at the second main surface area. The XMR-structure extends from the first contact to the second contact such that an XMR-plane of the XMR-structure is arranged along a first direction perpendicular to the first main surface area or the second main surface area.

Abstract: A method for manufacturing a magnetic sensor using an electrical lapping guide deposited and patterned simultaneously with a hard bias structure of the sensor material. The method includes depositing a sensor material, and patterning and ion milling the sensor material to define a track width of the sensor. A magnetic, hard bias material is then deposited and a second patterning and ion milling process is performed to simultaneously define the back edge of an electrical lapping guide and a back edge of the sensor.

Abstract: A method of imprint lithography includes imprinting a first pattern with a first template on a first substrate of a lithographic template. A second pattern is imprinted with a second template on the substrate of the lithographic template. The first pattern and the second pattern at least partially overlap, thus forming a third pattern. The third pattern is lithographically formed on a second substrate with the lithographic template. In an embodiment, the first pattern is a concentric line pattern formed by thin film deposition. In an embodiment, the second pattern is a radial line pattern. In an embodiment the first pattern and the second pattern may have line frequency increased.

Abstract: In accordance with one embodiment, a multi-reader can be manufactured so as to be able to read from multiple regions of a storage device contemporaneously during operation.

Abstract: A method fabricates a magnetic transducer having an ABS location. Etch stop and nonmagnetic etchable layers are provided. A side shield layer is provided between the ABS location and the etch stop and etchable layers. Part of the side shield and etchable layers are removed using a first removal process. This portion of the pole trench formed has a top wider than the bottom in the side shield layer. Part of the etchable layer is removed using a second removal process, thereby forming the pole trench. The pole trench has a bottom and a top wider than the bottom in the side shield layer and substantially perpendicular sidewalls in the etchable layer. A nonmagnetic side gap layer is provided. A remaining portion of the pole trench has a location and profile for a pole. At least part of the pole is in the pole trench.

Abstract: A magnetic read sensor having reduced hard bias free layer spacing and improved insulation robustness between the hard bias layers and the shield and sensor. The read sensor has a novel bi-layer insulation layer that can be made very thin while also providing good electrical insulation to prevent sense current shunting. The bi-layer insulation layer can be made by a process that provides improved sensor performance.

Abstract: The embodiments disclose a method of creating a mask by depositing a protection layer that mechanically strengthens patterned features that are imprinted into a resist layer that is deposited onto a magnetic layer, implanting mechanically strengthened patterned resist layer features into the magnetic layer using ion implantation and removing the resist layer and the mask to expose at least a portion of the magnetic layer.

Abstract: A method fabricates a magnetic transducer having a nonmagnetic layer and an ABS location corresponding to an ABS. Etch stop and nonmagnetic etchable layers are provided. A side shield layer is provided between the ABS location and the etch stop and etchable layers. A pole trench is formed in the side shield and etchable layers. The pole trench has a pole tip region in the side shield layer and a yoke region in the etchable layer. A nonmagnetic side gap layer, at least part of which is in the pole trench, is provided. A remaining portion of the pole trench has a location and profile for a pole and in which at least part of the pole is formed. A write gap and trailing shield are provided. At least part of the write gap is on the pole. At least part of the trailing shield is on the write gap.

Abstract: A magnetic write head having a write pole and a trailing, wrap-around magnetic shield formed over the write pole and separated from the write pole by a non-magnetic trailing gap layer and non-magnetic side gap layers. The write head includes a remnant magnetic seed layer, that while being used to facilitate electroplating of the magnetic shield, is left intentionally extending beyond the back edge of the magnetic shield. This extended portion of the magnetic seed layer acts as a shunt for magnetic flux and prevents data erasure due to over-writing.

Abstract: The invention pertains to a head-disk assembly device, “mass spin-valve” or “gravitational rectifier” and method of producing gravitomagnetic induction utilizing Nano-features; Nano-bumps and Nano-pits; fabricated on the surface of a hard disk. The device includes a computer hard disk; a piezoelectric glide head and/or a GMR read head; a typical hard drive's electronics; wherein, defects are fabricated on the said disk using a Focused Ion Beam (FIB) by depositing requisite number of nanobumps of specified height, and etching equal number of nanopits of specified depth a few mils or mm apart on a pre-decided radius. By spinning the said nano-features disk produce (1) an associated mechanical force utilizing a piezoelectric glide head and/or (2) an associated magnetic force utilizing a GMR read head; for (a) general use in surface characterization work and (b) for producing power by the presence or the absence of matter on a spinning disk.

Abstract: A magnetic read head that has improved pinned layer stability while also maintaining excellent free layer stability. The free layer has sides that define a trackwidth of the sensor and a back edge that defines a functional stripe height of the sensor. However, the pinned layer can extend significantly beyond both the width of the free layer and the back edge (e.g. stripe height) of the free layer. The sensor also has a soft magnetic bias structure that compensates for the reduced volume presented by the side extension of the pinned layer. The soft magnetic bias structure can be magnetically coupled with the trailing magnetic shield, either parallel coupled or anti-parallel coupled. In addition, all or a portion of the soft magnetic bias structure can be exchange coupled to a layer of anti-ferromagnetic material in order to improve the robustness of the soft magnetic bias structure.

Abstract: A magnetic read sensor having an extended pinned layer structure and also having an extended free layer structure. The extended pinned layer structure and extended free layer structure both extend beyond the strip height of the free layer of the sensor to provide improved pinning strength as well as improved free layer biasing reliability and bias field strength.

Abstract: Disclosed are a wireless power receiver and a method of manufacturing the same. The wireless power receiver includes a first coil to wirelessly receive power, a second coil to make communication, and a first magnetic substrate having first and second recesses spaced apart from each other. The first coil is disposed on the first recess of the first magnetic substrate, and the second coil is disposed on the second recess of a second magnetic substrate.

Abstract: A method of manufacturing a magnetoresistive-based device having magnetic material layers formed between a first electrically conductive layer and a second electrically conductive layer, the magnetic materials layers including a tunnel barrier layer formed between a first magnetic materials layer and a second magnetic materials layer, including removing the first electrically conductive layer and the first magnetic materials layer unprotected by a first hard mask, to form a first electrode and a first magnetic materials, respectively; and removing the tunnel barrier layer, second magnetic materials layer, and second electrically conductive layer unprotected by the second hard mask to form a tunnel barrier, second magnetic materials, and a second electrode.

Abstract: A magnetic slider for magnetic data recording constructed by a process that allows for careful control of seed layer and overcoat thickness. The slider is treated by a process that result in surface pits and scratches. A refill layer is used to fill in the pits and scratches, the refill layer being constructed of a material that does not include Si or carbon. An angled ion beam etching can be used to remove portions of the refill layer that extend outside of the pits and scratches. Then, a seed layer comprising Si and a protective layer comprising C are deposited over the surface. Because the refill layer does not contain either of Si or C, the thickness of the seed layer and carbon overcoat can be accurately measured and controlled, without the refill layer being mistaken for seed or overcoat material.

Abstract: Embodiments of the present disclosure provide a method for selective removal of atoms from a substrate. Such a method comprises forming a patterned mask over at least a portion of the surface of the substrate to form a masked portion and an unmasked portion of the surface. In an embodiment, the method comprises exposing the surface to low energy light ions. In a related embodiment the low energy light ions selectively remove atoms from the unmasked portion of the substrate. In some embodiments, the method further comprises removing the mask. In another embodiment, the present disclosure relates to a method of creating a plurality of magnetic domains on a magnetically susceptible substrate. In an embodiment, the present disclosure pertains to a method of forming a magnetic medium.

Abstract: A method for manufacturing a magnetic write pole of a magnetic write head that achieves improved write pole definition reduced manufacturing cost and improves ease of photoresist mask re-work. The method includes the use of a novel bi-layer hard mask beneath a photoresist mask. The bi-layer mask includes a layer of silicon dielectric, and a layer of carbon over the layer of silicon dielectric. The carbon layer acts as an anti-reflective coating layer that is unaffected by the photolithographic patterning process used to pattern the write pole and also acts as an adhesion layer for resist patterning. In the event that the photoresist patterning is not within specs and a mask re-work must be performed, the bi-layer mask can remain intact and need not be removed and re-deposited. In addition, the low cost and ease of use silicon dielectric and carbon reduce manufacturing cost and increase throughput.

Abstract: A plasma etching method performs plasma etching on a sample, which has laminated films containing a variable layer of a magnetic film, a barrier layer of an insulating material, and a fixed layer of a magnetic film, using a hard mask, which includes at least one of a Ta film and a TiN film. The plasma etching method includes a first step of etching the laminated films using N2 gas; and a second step of etching the laminated films after the first step using mixed gas of N2 gas and gas containing carbon elements.

Abstract: A magnetic recording medium is manufactured by forming a magnetic recording layer on a substrate, forming a protective layer on the magnetic recording layer, executing a sputtering process using a target containing a first ingredient and a second ingredient to form on the protective layer a grain-state mask layer that includes grains formed of the first ingredient and grain boundaries between the grains formed of the second ingredient, etching the grain boundaries so that a projection pattern of the grains is formed, and transferring the projection pattern of the grains to the magnetic recording layer.

Abstract: A resist film is formed on a cold-rolled steel sheet so as to fabricate a groove by etching. At this point, a steel sheet exposed portion where a portion of the steel sheet is exposed is formed in the resist film, and the steel sheet exposed portion has a first region oriented in a sheet width direction, and a plurality of second regions starting from the first region, widths of the first region and the second regions being 20 ?m to 100 ?m, and a distance from an end portion of one of the second regions to an end portion of another of the second regions adjacent thereto being 60 ?m to 570 ?m.

Abstract: In a method for manufacturing the functional element, a protective film covering an underlayer, a patterned multilayer film, and a patterned cap layer are formed, and the underlayer is then processed without newly forming a resist. Thereby, an electrode can be formed in steps less than ever before. Since the protective film formed on the patterned multilayer film and the patterned cap layer is used as a mask, the problem of the misregistration can be prevented.

Abstract: The invention relates generally to tracer particles for product identification and/or authentication. When incorporated into a manufactured item, that item can be subsequently authenticated by either detecting, or failing to detect, the tracer particle. The tracer particles of the invention are magnetically attractable, with micromarkings, and in some embodiments, are manufactured with food grade materials and of a particle size suitable for ingestion by humans. The particles can be analyzed qualitatively or quantitatively. In other aspects, the invention provides methods for the manufacture of the tracer particles, and in other aspects, provides methods for using the particles. Examples of products that can be tagged using the tracer particles of the invention include pharmaceuticals, animal feeds or feed supplements, and baby formula. Other applications include forensics, such as in explosive materials.

Abstract: A dual spin filter that minimizes spin-transfer magnetization switching current (Jc) while achieving a high dR/R in STT-RAM devices is disclosed. The bottom spin valve has a MgO tunnel barrier layer formed with a natural oxidation process to achieve low RA, a CoFe/Ru/CoFeB—CoFe pinned layer, and a CoFeB/FeSiO/CoFeB composite free layer with a middle nanocurrent channel (NCC) layer to minimize Jc0. The NCC layer may have be a composite wherein conductive M(Si) grains are magnetically coupled with adjacent ferromagnetic layers and are formed in an oxide, nitride, or oxynitride insulator matrix. The upper spin valve has a Cu spacer to lower the free layer damping constant. A high annealing temperature of 360° C. is used to increase the MR ratio above 100%. A Jc0 of less than 1×106 A/cm2 is expected based on quasistatic measurements of a MTJ with a similar MgO tunnel barrier and composite free layer.

Abstract: A three step ion beam etch (IBE) sequence involving low energy (<300 eV) is disclosed for trimming a sensor critical dimension (free layer width=FLW) to less than 50 nm. A first IBE step has a steep incident angle with respect to the sensor sidewall and accounts for 60% to 90% of the FLW reduction. The second IBE step has a shallow incident angle and a sweeping motion to remove residue from the first IBE step and further trim the sidewall. The third IBE step has a steep incident angle to remove damaged sidewall portions from the second step and accounts for 10% to 40% of the FLW reduction. As a result, FLW approaching 30 nm is realized while maintaining high MR ratio of over 60% and low RA of 1.2 ohm-?m2. Sidewall angle is manipulated by changing one or more ion beam incident angles.

Abstract: A magnetic read head having a reduced read gap and a stable magnetic pinned layer structure. The sensor includes a seed layer that has a surface formed with an anisotropic texture. A magnetic pinned layer formed over the seed layer has a body centered cubic structure which causes the pinned layer structure to have a magnetic anisotropy with an easy axis oriented perpendicular to the air bearing surface when deposited over the textured seed layer. A magnetic free layer structure formed over the pinned layer structure and over a non-magnetic barrier layer has a face centered cubic structure which causes the magnetic free layer to have a magnetic anisotropy with an easy axis oriented parallel with the air bearing surface.

Abstract: A write element for a thermally assisted magnetic head slider includes an air bearing surface facing to a magnetic recording medium; a first magnetic pole, a second magnetic pole, and coils sandwiched between the first and the second magnetic poles; a waveguide for guiding light generated by a light source module mounted on a substrate; and a plasmon unit provided around the first magnetic pole and the waveguide, which has a near-field light generating surface for propagating near-field light to the air bearing surface. The near-field light generating surface of the plasmon unit is apart from the air bearing surface with a first predetermined distance to form a first recess, and the first recess is filled in with a protective layer. The thermally assisted magnetic head slider can prevent the plasmon unit from protruding over the air bearing surface, thereby improving the performance of thermally assisted magnetic head.

Abstract: A method and apparatus for forming a magnetic layer having a pattern of magnetic properties on a substrate is described. The method includes using a metal nitride hardmask layer to pattern the magnetic layer by plasma exposure. The metal nitride layer is patterned using a nanoimprint patterning process with a silicon oxide pattern negative material. The pattern is developed in the metal nitride using a halogen and oxygen containing remote plasma, and is removed after plasma exposure using a caustic wet strip process. All processing is done at low temperatures to avoid thermal damage to magnetic materials.

Abstract: A vacuum planarization method substantially improves the surface roughness of a thermally-assisted recording (TAR) disk that has a recording layer (RL) formed of a substantially chemically-ordered FePt alloy or FePt-X alloy (or CoPt alloy or CoPt-X alloy) and a segregant, like SiO2. A first amorphous carbon overcoat (OC1) is deposited on the RL and etched with a non-chemically reactive plasma to remove at least one-half the thickness of OC1. Then a second amorphous carbon overcoat (OC2) is deposited on the etched OC1. The OC2 is then reactive-ion-etched, for example in a H2/Ar plasma, to remove at least one-half the thickness of OC2. A thin third overcoat (OC3) may be deposited on the etched OC2.

Abstract: A method provides an EAMR transducer. The EAMR transducer is coupled with a laser and has an ABS configured to reside in proximity to a media during use. The EAMR transducer includes an NFT for focusing the energy onto the media. A sacrificial layer is deposited on the NFT and a mask having an aperture provided on the sacrificial layer. A portion of the sacrificial layer exposed by the aperture is removed to form a trench above the NFT. A heat sink is then provided. At least part of the heat sink resides in the trench. The heat sink is thermally coupled to the NFT. Optical material(s) are provided around the heat sink. A write pole configured to write to a region of the media is also provided. The write pole is thermally coupled with the top of the heat sink. Coil(s) for energizing the write pole are also provided.

Abstract: A sequence of process steps having balanced process times are implemented in sequence of etch chambers coupled linearly and isolated one from the other, resulting in the optimization of island to trench ratio for a patterned media. A biased chemical etching using active etching gas is used to descum and trim the resist patterns. An inert gas sputter etch is performed on the magnetic layers, resulting in the patterned magnetic layer on the disk. A final step of stripping is then performed to remove the residual capping resist and carbon hard mask on top of un-etched magnetic islands. The effective magnetic material remaining on the disk surface can be optimized by adjusting the conditions of chemical etch and sputter etch conditions. Relevant process conditions that may be adjusted include: pressure, bias, time, and the type of gas in each step.

Abstract: A two part ion beam etch sequence involving low energy (<300 eV) is disclosed for fabricating a free layer width (FLW) as small as 20-25 nm in a MTJ element. A first etch process has one or more low incident angles and accounts for removal of 70% to 100% of the MTJ stack that is not covered by an overlying photoresist layer. The second etch process employs one or more high incident angles and a sweeping motion that is repeated during a plurality of cycles. Sidewall slope may be adjusted by varying the incident angle during either of the etch processes. FLW is about 30 nm less than an initial critical dimension in the photoresist layer while maintaining a MR ratio over 60% and low RA (resistance×area) value of 1.0 ohm-?m2.

Abstract: A method is described for manufacturing an encoder element having a base body and a magnetic layer situated on the outer circumference of the base body, including the following steps: providing the base body; providing a magnetic or magnetizable powdery material; directly applying the powdery material to the outer circumference or to an end face of the base body to generate the magnetic layer in such a way that an integral, direct joint is created between the base body and the magnetic layer; and magnetizing the applied magnetic layer.

Abstract: The present invention provides a method for manufacturing a magnetoresistive element having a high selection ratio of an insulating layer to a free layer. The method for manufacturing a magnetoresistive element includes the steps of preparing (left drawing, middle drawing) a substrate on which a free layer, a fixed layer disposed under a first magnetic layer, and a barrier layer that is an insulating layer disposed between the free layer and the fixed layer are formed and processing (right drawing) the free layer by plasma etching, in which an insulating layer configuring the barrier layer contains a Ta element or a Ti element.

Abstract: A magnetoresistive sensing device includes a substrate, a magnetoresistive sensing element, a circuitry element and a shielding unit. The magnetoresistive sensing element, the circuitry element and the shielding unit are disposed at the same side of the substrate. The shielding unit is between the magnetoresistive sensing element and the circuitry element. The shielding unit comprises at least one magnetic material.

Abstract: Three structures, and processes for manufacturing them, that improve the performance of a TAMR feature in a magnetic write head are disclosed. This improvement is achieved by making the separation between the edge plasmon generator and the plasmon shield less than the separation between the edge plasmon generator and the optical wave-guide.

Abstract: A magneto-optic surface includes a support; at least two moving elements; each of the moving elements including at least one anchoring point to the support and at least one moving part movable with respect to the support, the moving part including at least one magnetic part; the support and the moving elements being laid out in such a way that under the effect of an external magnetic field, at least one of the moving elements moves with respect to the support such that the optical properties of the magneto-optic surface are modified.

Abstract: The present invention relates to a press platen (1) or endless belt for embossing materials, in particular wooden materials or plastics materials. In order to considerably reduce the production costs and the use of material, it is proposed according to the invention that use is made of a sandwich body which consists of a carrier body (10) and an embossing body (11), wherein said bodies are connected together in a firm and planar manner via a magnetically active and/or metallic adhesive agent (12). As a result of the selection of the adhesive agent, for example in the form of a magnetic film or magnetic materials, a hard or soft solder or a soldering paste, it is thus possible to break the connection in a reversible manner at any time and thus to exchange the embossing body (11).

Abstract: A perpendicular magnetic recording (PMR) head is fabricated with a pole tip shielded laterally by a graded side shield that is conformal to the shape of the pole tip at an upper portion of the shield but not conformal to the pole tip at a lower portion. The shield includes a trailing shield, that is conformal to the trailing edge of the pole tip and may include a leading edge shield that magnetically connects two bottom ends of the graded side shield.

Abstract: The embodiments disclose a dual-layer magnetic recording structure including a top magnetic layer etched to remove patterned portions of the top magnetic layer and a bottom magnetic layer including portions with altered magnetic properties of molecules to reduce net magnetic moments and including portions of unaltered magnetic properties exchange-coupled through the top magnetic layer.

Abstract: A method of patterning a substrate, comprises patterning a photoresist layer disposed on the substrate using imprint lithography and etching exposed portions of a hard mask layer disposed between the patterned photoresist layer and the substrate. The method may also comprise implanting ions into a magnetic layer in the substrate while the etched hard mask layer is disposed thereon.

Abstract: Embodiments relate to IC current sensors fabricated using thin-wafer manufacturing technologies. Such technologies can include processing in which dicing before grinding (DBG) is utilized, which can improve reliability and minimize stress effects. While embodiments utilize face-up mounting, face-down mounting is made possible in other embodiments by via through-contacts. IC current sensor embodiments can present many advantages while minimizing drawbacks often associated with conventional IC current sensors.

Abstract: According to one embodiment, a magnetic recording head manufacturing method includes forming a spin torque oscillator layer on a main magnetic pole layer, forming a mask on the spin torque oscillator layer, processing the spin torque oscillator layer by performing ion beam etching through the mask, and partially modifying the main magnetic pole layer through the mask. The partially modifying the main magnetic pole layer makes it possible to decrease the saturation flux density of the main magnetic pole layer in the modified portion, and form an unmodified main magnetic pole portion covered with the mask, and a modified portion around the main magnetic pole.

Abstract: A method and apparatus for planarizing magnetically susceptible layers of substrates is provided. A patterned resist is formed on the magnetically susceptible layer, and the substrate is subjected to a plasma immersion ion implantation process to change a magnetic property of the magnetically susceptible layer according to the pattern of the resist material. The substrate is subjected to a plasma material removal process either before or after the implantation process to planarize the surface of the magnetically susceptible layer resulting from the implantation process. The plasma material removal process may be directional or non-directional.