Using Laser Patents (Class 216/65)
  • Patent number: 8230583
    Abstract: A method for self aligning a lapping guide with a structure of a write pole. A write pole is formed over a substrate and an electrically conductive material lapping guide material is deposited in a location that is removed from the write pole. A mask is then formed over a portion of the write pole and a portion of the electrically conductive material. A material removal process such as reactive ion etching can then be performed to remove a portion of the magnetic material that is not protected by the mask structure. An magnetic material is then electroplated over the write pole with the write pole, with the mask still in place. In this way, the electroplated material has an edge that is self aligned with an edge of the electrically conductive lapping guide material, both being defined by the same mask structure.
    Type: Grant
    Filed: December 23, 2009
    Date of Patent: July 31, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Jeffrey S. Lille
  • Patent number: 8225487
    Abstract: A method according to one embodiment includes forming a mask above a thin film sensor stack; forming an electrically insulating layer above the mask and sensor stack, the insulating layer having a portion extending along a nonhorizontal end of the mask; selectively removing the insulating layer except for the portion thereof extending along the nonhorizontal end of the mask; removing portions of the sensor stack that are not covered by the mask and the portion of the insulating layer, wherein an end of the portion of the insulating layer positioned away from the mask is about aligned with a back end of the sensor stack after removing the portions thereof; and removing the mask.
    Type: Grant
    Filed: July 25, 2008
    Date of Patent: July 24, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Ying Hong, Edward Hin Pong Lee, Aron Pentek, David John Seagle
  • Patent number: 8225489
    Abstract: An MR element includes a first exchange coupling shield layer, an MR stack, and a second exchange coupling shield layer that are arranged in this order from the bottom, and a nonmagnetic layer surrounding the MR stack. The MR stack includes a first free layer, a spacer layer, a second free layer, and a magnetic cap layer that are arranged in this order from the bottom. In the step of forming the MR stack and the nonmagnetic layer, a protection layer is formed on a layered film that will be the MR stack later, and a mask is then formed on the protection layer. Next, the layered film and the protection layer are etched using the mask and then the nonmagnetic layer is formed. After removal of the mask, the protection layer is removed by wet etching.
    Type: Grant
    Filed: March 26, 2010
    Date of Patent: July 24, 2012
    Assignee: TDK Corporation
    Inventors: Daisuke Miyauchi, Takahiko Machita, Keita Kawamori
  • Patent number: 8225488
    Abstract: A method for providing a PMR pole in a magnetic recording transducer comprises providing a mask on an intermediate layer, the mask including a line having at least one side, providing a hard mask on the mask, a first portion of the hard mask residing on the at least one side and a second portion residing on a surface of the intermediate layer, the hard mask including a dry-etchable layer and a high removal ratio layer on the dry-etchable layer, removing at least part of the first portion of the hard mask, at least a portion of the line being exposed, removing the line, thereby providing an aperture in the hard mask corresponding to the line, forming a trench in the intermediate layer under the aperture using a removal process, and providing the PMR pole, at least a portion of the PMR pole residing in the trench.
    Type: Grant
    Filed: May 22, 2009
    Date of Patent: July 24, 2012
    Assignee: Western Digital (Fremont), LLC
    Inventors: Jinqiu Zhang, Yun-Fei Li, Ying Hong
  • Patent number: 8214999
    Abstract: A differential microphone having a perimeter slit formed around the microphone diaphragm that replaces the backside hole previously required in conventional silicon, micromachined microphones. The differential microphone is formed using silicon fabrication techniques applied only to a single, front face of a silicon wafer. The backside holes of prior art microphones typically require that a secondary machining operation be performed on the rear surface of the silicon wafer during fabrication. This secondary operation adds complexity and cost to the micromachined microphones so fabricated. Comb fingers forming a portion of a capacitive arrangement may be fabricated as part of the differential microphone diaphragm.
    Type: Grant
    Filed: August 4, 2011
    Date of Patent: July 10, 2012
    Assignee: The Research Foundation of State University of New York
    Inventor: Ronald N. Miles
  • Patent number: 8209847
    Abstract: A method of fabricating a magnetic head is provided. The method of fabricating the magnetic head includes forming a writing head on a writing head area, forming an insulating layer having an inclined surface, forming a reading head on the inclined surface of the insulating layer, and forming an air bearing surface by polishing the surfaces of the writing head. Forming the reading head includes forming a first shield layer, a reading sensor, and a second shield layer.
    Type: Grant
    Filed: April 3, 2008
    Date of Patent: July 3, 2012
    Assignee: Seagate Technology International
    Inventor: Kyusik Sin
  • Patent number: 8201321
    Abstract: Provided is a method of manufacturing a perpendicular magnetic recording head which can enhance accuracy and simplify the manufacturing process. The method includes: forming a photoresist pattern having an opening part; forming a non-magnetic layer so as to narrow the opening part by a dry film forming method such as ALD method; stacking a seed layer and a plating layer so as to bury the opening part provided with the non-magnetic layer; and forming a main magnetic pole layer by polishing the non-magnetic layer, the seed layer, and the plating layer by CMP method until the photoresist pattern is exposed. The final opening width is unsusceptible to variations, thus reducing the number of the steps of forming the main magnetic layer.
    Type: Grant
    Filed: December 10, 2010
    Date of Patent: June 19, 2012
    Assignees: TDK Corporation, SAE Magnetics (H.K.) Ltd.
    Inventors: Naoto Matono, Tatsuya Harada
  • Patent number: 8202440
    Abstract: Disclosed are methods and apparatus for etching a sample, such as a semiconductor device or wafer. In general terms, embodiments of the present invention allow dry etching of a material on a sample, such as a copper material, at room temperature using a reactive substance, such as a chorine based gas. For example, the mechanisms of the present invention allow precise etching of a copper material to produce fine feature patterns without heating up the whole device or substrate to an elevated temperature such as 50° C. and above. The etching is assisted by simultaneously scanning a charged particle beam, such as an electron beam, and a photon beam, such as a laser beam, over a same target area of the sample while the reactive substance is introduced near the same target area. The reactive substance, charged particle beam, and photon beam act in combination to etch the sample at the target area. For example, a copper layer may be etched using the mechanisms of the present invention.
    Type: Grant
    Filed: February 2, 2007
    Date of Patent: June 19, 2012
    Assignee: KLA-Tencor Corporation
    Inventors: Mehran Nasser-Ghodsi, Ying Wang, Harrison Chin, Anne Testoni, R. Chris Burns
  • Patent number: 8201320
    Abstract: A method for manufacturing a magnetic write head having a leading magnetic shield and a trailing magnetic shield that are arranged to prevent the lost of magnetic write field to the trailing magnetic shield. The write head includes a non-magnetic step layer that provides additional spacing between the trailing magnetic shield and the write pole at a region removed from the air bearing surface.
    Type: Grant
    Filed: December 17, 2009
    Date of Patent: June 19, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Donald G. Allen, Yingjian Chen, Andrew Chiu, Liubo Hong, Wen-Chien D. Hsiao, Edward H. P. Lee, Fenglin Liu, Katalin Pentek, Kyusik Shin, Yi Zheng, Qiping Zhong, Honglin Zhu
  • Patent number: 8186040
    Abstract: A method in one embodiment includes forming a resist structure above an upper surface of a substrate, wherein a portion of the upper surface of the substrate is a shaping layer, wherein the resist structure has an undercut; depositing a layer of magnetic material above exposed regions of the substrate, wherein a portion of the layer of magnetic material tapers towards the substrate as it approaches the undercut; removing the resist structure; and forming a write pole above the layer of magnetic material. Additional methods are disclosed.
    Type: Grant
    Filed: December 22, 2008
    Date of Patent: May 29, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Amanda Baer, Wen-Chien David Hsiao, Vladimir Nikitin, Trevor W. Olson, Yuan Yao
  • Patent number: 8171618
    Abstract: A method of forming a write pole for a magnetic recording device is provided. The method comprises providing a layer of magnetic material covered with a secondary hard mask layer and a patterned primary hard mask, milling at a first milling angle to transfer a pattern from the patterned primary hard mask to the secondary hard mask, and milling at a second milling angle to transfer the pattern from the secondary hard mask to the layer of magnetic material to form the write pole. The second milling angle is greater than the first milling angle. The method further comprises milling at a third milling angle to adjust a side wall angle of the write pole to about a desired side wall angle, and milling at a fourth milling angle to reduce a track width of the write pole to a desired track width.
    Type: Grant
    Filed: June 17, 2009
    Date of Patent: May 8, 2012
    Assignee: Western Digital (Fremont), LLC
    Inventors: Lei Wang, Ge Yi
  • Patent number: 8166632
    Abstract: A method and system for providing a PMR transducer including an intermediate layer. The method and system include providing a hard mask layer on the intermediate layer. The hard mask layer is for a reactive ion etch of the intermediate layer. The method and system also include providing a bottom antireflective coating (BARC) layer on the hard mask layer. The BARC layer is also a masking layer for the hard mask layer. The method and system also include forming a trench in the intermediate layer using at least one reactive ion etch (RIE). The trench has a bottom and a top wider than the bottom. The method and system also include providing a PMR pole. At least a portion of the PMR pole resides in the trench.
    Type: Grant
    Filed: March 28, 2008
    Date of Patent: May 1, 2012
    Assignee: Western Digital (Fremont), LLC
    Inventors: Jinqiu Zhang, Liubo Hong, Yong Shen, Donghong Li
  • Patent number: 8166633
    Abstract: A method for manufacturing an extraordinary magnetoresistive sensor (EMR sensor) having reduced size and increased resolution is described. The sensor includes a plurality of electrically conductive leads contacting a magnetically active layer and also includes an electrically conductive shunt structure. The electrically conductive leads of the sensor and the shunt structure can be formed in a common photolithographic masking and etching process so that they are self aligned with one another. This avoids the need to align multiple photolithographic processing steps, thereby allowing greatly increased resolution and reduced lead spacing. The EMR sensor can be formed with a magnetically active layer that can be close to or at the air bearing surface (ABS) for improved magnetic spacing with an adjacent magnetic medium of a data recording system.
    Type: Grant
    Filed: December 17, 2010
    Date of Patent: May 1, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Thomas Dudley Boone, Jr., Liesl Folks, Bruce Alvin Gurney, Jordan Asher Katine, Ernesto E. Marinero, Neil Smith
  • Patent number: 8166631
    Abstract: A method provides a magnetic transducer that includes an underlayer and a nonmagnetic layer on the underlayer. The method includes providing a plurality of trenches in the nonmagnetic layer. A first trench of corresponds to a main pole, while at least one side trench corresponds to at least one side shield. The method also includes providing mask covering the side trench(es) and providing the main pole. At least a portion of the main pole resides in the first trench. The method also includes removing at least a portion of the nonmagnetic layer residing between the side trench(es) and the main pole. The method also includes providing at least one side shield. The shield(s) extend from at least an air-bearing surface location to not further than a coil front location.
    Type: Grant
    Filed: August 27, 2008
    Date of Patent: May 1, 2012
    Assignee: Western Digital (Fremont), LLC
    Inventors: Ut Tran, Zhigang Bai, Kevin K. Lin
  • Patent number: 8161626
    Abstract: A suspension for supporting a magnetic head is provided with a load beam formed of a thin-plate spring. A recess for accommodating a damper is formed in the load beam. The damper is affixed to a bottom surface of the recess.
    Type: Grant
    Filed: February 12, 2010
    Date of Patent: April 24, 2012
    Assignee: NHK Spring Co., Ltd.
    Inventor: Yoichi Ikeji
  • Patent number: 8151442
    Abstract: Magnetoresistive (MR) elements having flux guides defined by the free layer. The MR element includes a free layer, a spacer/barrier layer, a pinned layer, and a pinning layer. A back edge of the free layer (opposite the sensing surface of the MR element) extends past a back edge of the spacer/barrier layer. The portion of the free layer extending past the back edge of the spacer/barrier layer defines a continuous flux guide. The flux guide is processed to reduce the conductive characteristics of the flux guide, thereby reducing current shunt loss in the flux guide.
    Type: Grant
    Filed: March 31, 2010
    Date of Patent: April 10, 2012
    Assignee: Hitachi Global Strorage Technologies Netherlands, B.V.
    Inventor: Hardayal S. Gill
  • Patent number: 8141235
    Abstract: A method for manufacturing a perpendicular magnetic recording transducer is described. A metallic underlayer, an insulator on the metallic underlayer, and a metal mask on the insulator are provided. The metal mask has an aperture therein. A trench is formed in the insulator. The trench's bottom is narrower than its top and includes part of the metallic underlayer. The top has a width of not more than 0.28 micron. A nonmagnetic seed layer that substantially covers at least the trench bottom and sides and that has a thickness of at least five hundred Angstroms is provided. A perpendicular magnetic pole material is plated on at least part of the seed layer. A CMP is performed, removing part of the perpendicular magnetic pole material. A remaining portion of the perpendicular magnetic pole material forms a perpendicular magnetic recording pole. The nonmagnetic seed layer is a stop layer for the CMP.
    Type: Grant
    Filed: June 9, 2006
    Date of Patent: March 27, 2012
    Assignee: Western Digital (Fremont), LLC
    Inventor: Lei Larry Zhang
  • Patent number: 8136220
    Abstract: A process for the manufacture of small sensors with reproducible surfaces, including electrochemical sensors. One process includes forming channels in the surface of a substrate and disposing a conductive material in the channels to form an electrode. The conductive material can also be formed on the substrate by other impact and non-impact methods. In a preferred embodiment, the method includes cutting the substrate to form a sensor having a connector portion and a transcutaneous portion, the two portions having edges that define one continuous straight line.
    Type: Grant
    Filed: October 30, 2007
    Date of Patent: March 20, 2012
    Assignee: Abbott Diabetes Care Inc.
    Inventors: James Say, Michael F. Tomasco, Adam Heller, Yoram Gal, Behrad Aria, Ephraim Heller, Phillip John Plante, Mark S. Vreeke
  • Patent number: 8136227
    Abstract: A magnetic head having non-GMR shunt for perpendicular recording and method for making magnetic head having non-GMR shunt for perpendicular recording is disclosed. A shunt is provided for shunting charge from a read sensor. The shunt is formed co-planar with the read sensor and is fabricated using non-GMR materials.
    Type: Grant
    Filed: October 11, 2005
    Date of Patent: March 20, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Michael Feldbaum, Quang Le, Edward H. Lee, Neil L. Robertson, Charles G. Seegel, III
  • Patent number: 8133554
    Abstract: Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces are disclosed herein. In one embodiment, a method includes depositing molecules of a gas onto a microfeature workpiece in the reaction chamber and selectively irradiating a first portion of the molecules on the microfeature workpiece in the reaction chamber with a selected radiation without irradiating a second portion of the molecules on the workpiece with the selected radiation. The first portion of the molecules can be irradiated to activate the portion of the molecules or desorb the portion of the molecules from the workpiece. The first portion of the molecules can be selectively irradiated by impinging the first portion of the molecules with a laser beam or other energy source.
    Type: Grant
    Filed: May 6, 2004
    Date of Patent: March 13, 2012
    Assignee: Micron Technology, Inc.
    Inventors: Ross S. Dando, Dan Gealy
  • Patent number: 8117738
    Abstract: A perpendicular magnetic recording (PMR) head is fabricated with a self-aligned pole tip shielded laterally by a separated pair of side shields and shielded from above by an upper shield. The side shields are formed from a shield layer by a RIE process characterized by a mask and gases producing a variety of etch rates. The differential in etch rates maintains the opening dimension within the mask and allows the formation of a wedge-shaped trench within the shield layer that then separates the layer into two shields. The pole tip is then plated within the trench and an upper shield is formed above the side shields and pole.
    Type: Grant
    Filed: February 28, 2011
    Date of Patent: February 21, 2012
    Assignee: Headway Technologies, Inc.
    Inventors: Cherng-Chyi Han, Min Li, Fenglin Liu, Jiun-Ting Lee
  • Patent number: 8119332
    Abstract: A method for manufacturing a coordinate detector having a resistive film formed on a substrate formed of an insulating material and a common electrode for applying a voltage to the resistive film. The substrate includes a quadrangular shape. The method includes the steps of a) forming first resistive film removal regions by removing predetermined first regions of the resistive film provided along a peripheral edge of the substrate, b) forming the common electrode on the first resistive film removal regions, c) applying voltage to the resistive film, d) measuring an electric potential of the resistive film, e) calculating second resistive film removal region data according to the measured electric potential, and f) forming second resistive film removal regions by irradiating a laser beam to predetermined second regions of the resistive film according to the calculated second resistive film removal region data.
    Type: Grant
    Filed: May 13, 2009
    Date of Patent: February 21, 2012
    Assignee: Fujitsu Component Limited
    Inventor: Koichi Kondoh
  • Patent number: 8117737
    Abstract: A manufacturing method for a magnetic head includes the steps of: forming a structure on a lower shield, the structure including a lower gap, a main magnetic pole and first and second side gaps; forming first and second side shields; forming an upper gap; and forming an upper shield. In the step of forming the structure, an initial lower gap layer is formed on the lower shield, the initial lower gap layer including a pre-lower-gap portion, and two to-be-removed portions that are located on opposite sides of the pre-lower-gap portion. Then, a protrusion including the main magnetic pole and the first and second side gaps is formed on the pre-lower-gap portion. With the top surface of the protrusion covered with a mask, the initial lower gap layer is etched in part to thereby form the lower gap.
    Type: Grant
    Filed: November 30, 2009
    Date of Patent: February 21, 2012
    Assignee: TDK Corporation
    Inventors: Hisayoshi Watanabe, Masachika Hashino, Michitoshi Tsuchiya, Koichi Otani, Tatsuhiro Nojima, Tsutomu Nishinaga, Hideyuki Ukita
  • Patent number: 8108986
    Abstract: A method for manufacturing a magnetic write head for perpendicular magnetic recording, the write head having a write pole with an increased bevel (taper) angle. The write pole is constructed by forming a mask structure over a magnetic write pole material, and then performing a combination of sweeping or rotation with static (non-rotating, non-sweeping) ion milling at an angle relative to normal. The ion milling is performed while moving the wafer laterally within the ion milling tool to ensure that the ion milling is performed uniformly across the wafer during static milling.
    Type: Grant
    Filed: December 28, 2007
    Date of Patent: February 7, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Yinshi Liu
  • Patent number: 8104166
    Abstract: A method is provided for fabricating a read element with leads that overlay a top surface of a sensor of the read element. The method includes forming a mask over a sensor layer, then using the mask to define the sensor from the sensor layer. The mask is then narrowed and a lead layer is formed that overlays both ends of the top surface of the sensor without covering a center portion of the top surface.
    Type: Grant
    Filed: December 19, 2003
    Date of Patent: January 31, 2012
    Assignee: Western Digital (Fremont), LLC
    Inventors: Jinqiu Zhang, Ming Zhao, Mohamad T. Krounbi, Henry Yuan, Lien-Chang Wang
  • Patent number: 8091210
    Abstract: A method provides a structure in a magnetic recording transducer. The structure resides on an underlayer. The method includes providing a protective layer and providing layer(s) for the structure. The protective layer covers a field region but exposes a device region in which the structure is to reside. A first portion of the layer(s) reside in the device region, while a second portion of the layer(s) reside in the field region. The method also includes removing the second portion of the layer(s) using an over-removal condition. The underlayer is covered by a remaining portion of the protective layer after the removing step is completed. The method also includes removing the remaining portion of the protective layer. An underlayer removal rate is substantially less than a protective layer during the step of removing of the protective layer.
    Type: Grant
    Filed: March 5, 2008
    Date of Patent: January 10, 2012
    Assignee: Western Digital (Fremont), LLC
    Inventors: Keith Y. Sasaki, Christopher T. Ngo
  • Patent number: 8092558
    Abstract: There is disclosed a microchannel reactor module for the immediate catalytic release of hydrogen from hydrogenated organic molecules along with the recovery of hydrogen gas and the recovery of dehydrogenated organic molecules as a liquid. More specifically, the disclosure provides a polyimide-based microchannel plate that is particularly useful for a process of immediate catalytic release of hydrogen from a hydrogenated organic molecule or formulation of molecules.
    Type: Grant
    Filed: January 20, 2009
    Date of Patent: January 10, 2012
    Assignee: Asemblon, Inc.
    Inventors: David G. O'Connor, Robert B. Nelson
  • Patent number: 8088455
    Abstract: A drain port and an exhaust port arranged at the bottom of a cup surrounding a substrate holding unit. A drainage tray is arranged below the cup so as to cover the moving area of the drain port when the substrate holding unit and the cup move in X-directions and Y-directions. An exhaust unit is arranged at a position corresponding to the position of the exhaust port of the cup when the substrate holding unit is in its spin-drying position. The exhaust unit is connected to the exhaust port to suck the interior of the cup when the spin-drying of the substrate is executed. The use of a flexible tube which is always connected to the exhaust port is no longer necessary.
    Type: Grant
    Filed: October 8, 2008
    Date of Patent: January 3, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Norihisa Koga, Shinji Koga, Naoto Yoshitaka, Akira Nishiya
  • Patent number: 8082656
    Abstract: A method for manufacturing a disk drive head suspension having a plated load point dimple. A photoresist mask having an opening with load point-defining side walls and a load point diameter is formed over a planar portion of a spring metal member. Metal is plated onto the spring metal member in the opening to form a load point having the load point diameter on the planar portion of the spring metal member.
    Type: Grant
    Filed: September 4, 2007
    Date of Patent: December 27, 2011
    Assignee: Hutchinson Technology Incorporated
    Inventors: Zachary A. Pokornowski, Michael W. Davis
  • Patent number: 8079135
    Abstract: A method for providing a perpendicular magnetic recording (PMR) transducer is described. The PMR transducer provided includes a PMR pole and yoke structure coupled with the PMR pole. The method includes providing a hard mask and an intermediate layer. A first portion of the hard mask resides on the PMR pole. A second portion of the hard mask resides on another structure. The intermediate layer surrounds at least the PMR pole. The method also includes performing a planarization on at least the intermediate layer, removing the first portion of the hard mask on the PMR pole without completely removing the second portion of the hard mask on the other structure. The method further includes removing a remaining portion of the hard mask on the other structure, providing a write gap on the PMR pole, and providing a shield on the write gap.
    Type: Grant
    Filed: December 13, 2007
    Date of Patent: December 20, 2011
    Assignee: Western Digital (Fremont), LLC
    Inventors: Yong Shen, Liubo Hong, Guanghong Luo, Honglin Zhu, Lei Wang, Yingjian Chen
  • Patent number: 8074345
    Abstract: A method of measuring a bevel angle in a write pole comprises the step of providing a mask over a wafer containing the write pole. The mask has a first opening over the write pole and a second opening over a sacrificial region of the wafer. The sacrificial region comprises a same material as the write pole. The method further comprises the steps of performing a beveling operation on the write pole and the sacrificial region to form a first bevel in the write pole and a second bevel in the sacrificial region, and measuring an angle of the second bevel in the sacrificial region to determine the bevel angle of the write pole.
    Type: Grant
    Filed: May 18, 2009
    Date of Patent: December 13, 2011
    Assignee: Western Digital (Fremont), LLC
    Inventors: Alexandre Anguelouch, Donghong Li
  • Patent number: 8056213
    Abstract: A PMR head comprises a substrate, a magnetic pole formed over the substrate, the pole having a pole tip having a cross-sectional tapered shape wherein the pole tip is surrounded by a write gap layer, an integrated shield comprising side shields on the substrate laterally surrounding the pole tip and a trailing shield overlying the pole tip and integral with the side shields.
    Type: Grant
    Filed: February 25, 2008
    Date of Patent: November 15, 2011
    Assignee: Headway Technologies, Inc.
    Inventors: Cherng-Chyi Han, Lijie Guan, Joe Smyth, Moris Dovek
  • Patent number: 8056214
    Abstract: A magnetic head includes a pole layer, first and second side shields, and an encasing layer having a pole groove that accommodates the pole layer and first and second side shield grooves that accommodate the first and second side shields. In a manufacturing method for the magnetic head, the pole groove and first and second initial side shield grooves are formed in a nonmagnetic layer using an etching mask layer having first to third openings. In the manufacturing method, a wall face of the first initial side shield groove that is closer to the pole groove and a wall face of the second initial side shield groove that is closer to the pole groove are etched by dry etching to thereby complete the first and second side shield grooves.
    Type: Grant
    Filed: August 19, 2009
    Date of Patent: November 15, 2011
    Assignees: Headway Technologies, Inc., SAE Magnetics (H.K.) Ltd.
    Inventors: Yoshitaka Sasaki, Kazuo Ishizaki, Hironori Araki, Hiroyuki Ito, Shigeki Tanemura, Atsushi Iljima
  • Patent number: 8051552
    Abstract: A wrap around shield of a write head is fabricated in multiple processes, with side shields fabricated in one process, and a trailing shield formed in another process. These multiple processes form a stitched wrap around shield, resulting in more flexible and accurate placement of the trailing shield and side shields with respect to the write pole. These processes also independently form the dimensions (shapes and sizes) of the side shields and the trailing shield which allows better control of writeability, saturation, and adjacent track interference of the perpendicular recording write head.
    Type: Grant
    Filed: May 11, 2007
    Date of Patent: November 8, 2011
    Assignee: Hitachi Global Storage Technologies Netherlands, B.V.
    Inventors: Ming Jiang, Yi Zheng
  • Patent number: 8051551
    Abstract: A method for fabricating a magnetic head having multiple readers includes forming a plurality of generally laterally positioned lower shields; forming a lower gap layer above each lower shield; forming a sensor above each lower gap layer; forming an upper gap layer above each sensor; and forming an upper shield above each upper gap layer; wherein an overall gap thickness is defined between vertically aligned pairs of the upper and lower shields, wherein the overall gap thickness between one of the pairs of upper and lower shields is thicker than the overall gap thickness between another of the pairs of upper and lower shields.
    Type: Grant
    Filed: May 25, 2010
    Date of Patent: November 8, 2011
    Assignee: International Business Machines Corporation
    Inventor: Peter Vandersalm Koeppe
  • Patent number: 8042260
    Abstract: The claimed invention pertains to methods of forming one or more inductors on a semiconductor substrate. In one embodiment, a method of forming an array of inductor core elements on a semiconductor substrate that includes integrated circuits is disclosed. A first set of spaced apart metallic core elements are formed over the substrate. Isolation sidewalls are then formed on side surfaces of the core elements. Afterward, a second set of metallic core elements are formed over the substrate. The first and second sets of core elements are substantially co-planar and interleaved such that only the isolation sidewalls separate adjacent core elements. Particular embodiments involve other processing operations, such as the selective electroplating of different types of metal to form core elements and/or the deposition and etching away of an isolation layer to form isolation sidewalls on the core elements.
    Type: Grant
    Filed: October 13, 2008
    Date of Patent: October 25, 2011
    Assignee: National Semiconductor Corporation
    Inventors: Peter J. Hopper, Peter Johnson, Peter Smeys, Andrei Papou
  • Patent number: 8042259
    Abstract: A magnetic recording head and a method of manufacturing the same. The magnetic recording head includes a stack containing a main pole and a return pole. The stack includes a first magnetic layer having a groove formed therein; an insulating layer covering a surface of the groove; and a second magnetic layer pattern filling the groove covered with the insulating layer.
    Type: Grant
    Filed: February 18, 2010
    Date of Patent: October 25, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hoo-san Lee, Young-hun Im, Yong-su Kim
  • Patent number: 8028399
    Abstract: Write elements and methods of fabricating magnetic write poles are described. For one method, a vertical mask structure is formed on a magnetic layer in locations of a pole tip and a yoke of a write pole. The vertical mask structure may be formed by coating vertical surfaces of resists with an atomic layer deposition (ALD) process or a similar process. A removal process is then performed around the vertical mask structure to define the pole tip and part of the yoke of the write pole, and the vertical mask structure is removed. A lower portion of the pole tip is them masked while the upper portion of the pole tip and the part of the yoke is exposed. The upper portion of the pole tip and the part of the yoke are then expanded with magnetic material, such as with a plating process.
    Type: Grant
    Filed: December 16, 2007
    Date of Patent: October 4, 2011
    Assignee: Hitachi Global Storage Technologies Netherlands, B.V.
    Inventors: Amanda Baer, Jeffrey S. Lille, Aron Pentek
  • Patent number: 8015694
    Abstract: A “scissoring-type” current-perpendicular-to-the-plane (CPP) magnetoresistive sensor with dual ferromagnetic sensing or free layers separated by a nonmagnetic spacer layer has improved stability as a result of etch-induced uniaxial magnetic anisotropy in each of the free layers. Each of the two ferromagnetic free layers has an etch-induced uniaxial magnetic anisotropy and an in-plane magnetic moment substantially parallel to its uniaxial anisotropy in the quiescent state, i.e., the absence of an applied magnetic field. The etch-induced uniaxial anisotropy of each of the free layers is achieved either by direct ion etching of each of the free layers, and/or by ion etching of the layer on which each of the free layers is deposited. A strong magnetic anisotropy is induced in the free layers by the etching, which favors generally orthogonal orientation of the two free layers in the quiescent state.
    Type: Grant
    Filed: December 18, 2007
    Date of Patent: September 13, 2011
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Matthew J. Carey, Jeffrey R. Childress, Stefan Maat, Neil Smith
  • Patent number: 8015692
    Abstract: A method for providing a perpendicular magnetic recording head includes providing a metal underlayer and forming a trench in the metal underlayer. The trench has a bottom and a top wider than the bottom. The method also includes providing a PMR pole. At least a portion of the PMR pole resides in the trench. The method also includes providing a write gap on the PMR pole and providing a top shield on at least the write gap.
    Type: Grant
    Filed: November 7, 2007
    Date of Patent: September 13, 2011
    Assignee: Western Digital (Fremont), LLC
    Inventors: Lei Larry Zhang, Yong Shen, Honglin Zhu, Yizhong Wang
  • Patent number: 8011084
    Abstract: A method for manufacturing a manufacturing a magnetoresistive sensor that allows the sensor to be constructed with a very narrow and well controlled track width. The method includes depositing a layer of diamond like carbon over a series of sensor layers. A first mask is then formed to define a sensor, and an ion milling is performed to remove sensor material not protected by the first mask. Then, a second mask is formed, and a hard bias layer is deposited to the thickness of the sensor layers. The second mask is then lifted off and a CMP is performed to remove the first mask structure. Because all areas other than the area directly over the sensor are substantially planar a quick, gentle CMP can be used to remove the first mask layer even if the first mask is small, such as for definition of a very narrow track-width sensor.
    Type: Grant
    Filed: July 31, 2008
    Date of Patent: September 6, 2011
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Quang Le, Jui-Lung Li
  • Publication number: 20110168672
    Abstract: A method and apparatus for processing substrate edges is disclosed that overcomes the limitations of conventional edge processing methods and systems used in semiconductor manufacturing. The edge processing method and apparatus of this invention includes a laser and optical system to direct a beam of radiation onto a rotating substrate supported by a chuck, in atmosphere. The optical system accurately and precisely directs the beam to remove or transform organic or inorganic films, film stacks, residues, or particles from the top edge, top bevel, apex, bottom bevel, and bottom edge of the substrate. An optional gas injector system directs gas onto the substrate edge to aid in the reaction. Process by-products are removed via an exhaust tube enveloping the reaction site. This invention permits precise control of an edge exclusion zone, resulting in an increase in the number of usable die on a wafer.
    Type: Application
    Filed: January 7, 2011
    Publication date: July 14, 2011
    Applicant: UVTech Systems, Inc.
    Inventors: Kenneth J. Harte, Ronald P. Millman, JR., Victoria M. Chaplick, David J. Elliott, Eugene O. Degenkolb, Murray L. Tardif
  • Patent number: 7976301
    Abstract: A device for removing an oblong burr from a molded part including an energy source that introduces energy into the burr for removing the burr by heating. The energy source includes an infrared transmitter that irradiates the oblong burr with infrared radiation, a sleeve for receiving the infrared transmitter with an inner face facing the infrared transmitter and an outer face remote from the infrared transmitter, and an outlet region through which energy may be transported in the direction of the burr. The sleeve has an outer coating with a surface facing the outside, and an inner face facing the infrared transmitter which at least partially encloses the sleeve. Infrared radiation emitted by the energy source is concentrated by a radiation-forming element, so that only the burr is irradiated by the infrared radiation. The radiation-forming element may be formed by a gap in the outer coating.
    Type: Grant
    Filed: January 18, 2008
    Date of Patent: July 12, 2011
    Assignee: Takata-Petri AG
    Inventor: Norbert Väth
  • Patent number: 7963024
    Abstract: A method for manufacturing a magnetic write head for perpendicular magnetic data recording. The method allows an upper write coil to be formed directly on a conformally deposited layer of non-magnetic material such as alumina which has been deposited over a magnetic shaping layer and write pole. The method allows the write coil to be constructed without the need for the deposition of a thick alumina fill layer and subsequent chemical mechanical polishing. This, therefore, avoids the necessity of such a chemical mechanical polishing step.
    Type: Grant
    Filed: October 10, 2007
    Date of Patent: June 21, 2011
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Aaron Neuhaus
  • Patent number: 7950138
    Abstract: A main pole layer is deposited within an opening in a patterned photoresist layer on a substrate. The photoresist is thinned to expose an upper portion of a pole tip region that is then trimmed to a rectangular shape while a lower portion retains an inverted trapezoidal shape. Thereafter, a second trimming process forms a pole tip with a first width in the upper rectangular portion and a second thickness and second width which is less than the first width in the lower portion. A CMP step subsequently thins the upper portion to a first thickness of 0.04 to 0.08 microns while the second thickness remains at 0.16 to 0.32 microns. The bottom surface of the lower portion along the ABS becomes the trailing edge in a recording operation. The pole tip has a consistent first width (track width) that is not influenced by CMP process variations.
    Type: Grant
    Filed: February 8, 2010
    Date of Patent: May 31, 2011
    Assignee: Headway Technologies, Inc.
    Inventors: Donghong Li, Yoshitaka Sasaki
  • Patent number: 7934310
    Abstract: Prior art designs of single pole writers have been limited by premature saturation at the tip. This limits the head field that can be achieved without simultaneously widening the write profile. This problem has bee solved by means of a vertical main pole whose thickness has its conventional value a short distance from the tip but that tapers down to a significantly reduced value as it approaches the tip. A process for manufacturing this tapered tip design is also presented.
    Type: Grant
    Filed: April 8, 2009
    Date of Patent: May 3, 2011
    Assignee: Headway Technologies, Inc.
    Inventors: Lijie Guan, Hung Liang Hu, Yaw Shing Tang
  • Patent number: 7930817
    Abstract: A method comprises an opposing step of arranging a light-shielding film 50 having a recessed surface 52 and a pinhole 54 formed within the recessed surface 52 such that an end face 54X of the pinhole 54 of the light-shielding film 50 on the recessed surface 52 side and a light exit surface 4B oppose each other, while the shortest distance A52 between the light-shielding film 50 and a medium-opposing surface S in a thickness direction of the light-shielding film 50 is shorter than the shortest distance A54 between the end face 54X of the pinhole 54 on the side opposite from a transparent substrate 58 and the light exit surface 4B; a light-emitting step of causing a light-emitting device 3 to emit emission light 3A; and a detecting step of detecting the light transmitted through the pinhole 54 after being emitted from the light exit surface 4B.
    Type: Grant
    Filed: August 27, 2008
    Date of Patent: April 26, 2011
    Assignee: TDK Corporation
    Inventors: Seiichi Takayama, Koji Shimazawa, Yasuhiro Ito
  • Patent number: 7921544
    Abstract: A thin-film magnetic head structure has a configuration adapted to manufacture a thin-film magnetic head configured such that a main magnetic pole layer including a magnetic pole end part on a side of a medium-opposing surface opposing a recording medium, a write shield layer opposing the magnetic pole end part so as to form a recording gap layer on the medium-opposing surface side, and a thin-film coil wound about the write shield layer or main magnetic pole layer are laminated. The main magnetic pole layer has an end face joint structure where respective end faces of the magnetic pole end part and a yoke magnetic pole part having a size greater than that of the magnetic pole end part are joined to each other, and a surface with a flat structure on a side closer to the thin-film coil.
    Type: Grant
    Filed: April 7, 2008
    Date of Patent: April 12, 2011
    Assignee: Headway Technologies, Inc.
    Inventors: Yoshitaka Sasaki, Hironori Araki, Shigeki Tanemura, Hiroyuki Ito, Lijie Guan
  • Patent number: 7900342
    Abstract: Magnetoresistance sensors with magnetic pinned layers that are pinned by anisotropic etch induced magnetic anisotropies and methods for fabricating the magnetoresistance sensors are provided. The method comprises forming a seed layer structure. The seed layer is etched to form an anisotropic etch along a top surface of the seed layer. A magnetic pinned layer is formed on the top surface of the seed layer structure. The anisotropic etch on the top surface of the seed layer structure induces a magnetic anisotropy in the magnetic pinned layer, which pins the magnetization of the magnetic pinned layer structure.
    Type: Grant
    Filed: February 23, 2007
    Date of Patent: March 8, 2011
    Assignee: Hitachi Global Storage Technologies Netherlands, B.V.
    Inventors: James M. Freitag, Mustafa M. Pinarbasi
  • Patent number: 7895732
    Abstract: An embodiment of the present invention relates to a method of manufacturing a perpendicular magnetic recording having a main pole, return pole and trailing side shield disposed on the trailing side and the cross track direction side of said main pole. A process is described where the main pole has an etching layer in the upper part. The top and sides of the main pole having the etching signal layer in the upper part are covered with a nonmagnetic gap layer while leaving open a region forming the side shield. The nonmagnetic gap layer is then etched until a signal from the etching signal layer is detected by an etching signal detector. The trailing side shield on the top and sides of the nonmagnetic gap layer are then formed after the etching is halted.
    Type: Grant
    Filed: March 15, 2007
    Date of Patent: March 1, 2011
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Tomohiro Okada, Isao Nunokawa, Kimitoshi Etoh, Kikuo Kusukawa