Abstract: The invention relates to a ceramic substrate material having a first layer having a cavity structure formed therein, and at least one sealing layer situated on at least a part of the cavity structure. The first layer comprises at least one first component made of a crystalline ceramic material and/or a glass material as a matrix, the first layer containing a second component made of a further crystalline ceramic material, with selected mantle areas of the crystals and/or crystal agglomerates of the second component being etched out in such a way that the cavity structure is provided (preferably in the form of a pore and/or tube structure). The sealing layer seals the surface of the first layer in the areas on which it is situated (e.g., above the cavity structure), allowing application of thin-film structures to the cavity structure.

Abstract: A method for cutting a substrate is disclosed which uses a femtosecond laser capable of preventing thermal expansion and generation of shock waves from occurring around a region where a cutting process is carried out when the femtosecond laser is used to cut the substrate, thereby being capable of achieving a reduction in costs. The method includes the steps of arranging the substrate on a stage, and irradiating a femtosecond laser to a predetermined portion of the substrate arranged on the stage, thereby cutting the substrate along the predetermined substrate portion.

Abstract: There are provided a method of processing an amorphous material which is capable of forming surface projections of uniform height in desired positions on the amorphous material, and a magnetic disk substrate using the amorphous material. A predetermined pressure is applied to selected parts of a surface of an amorphous material using fine particles having a hardness higher than that of the amorphous material to form high-density compressed layers, and a surface layer of the amorphous material is removed using a treatment agent that has a different removal capacity in the compressed layers and a remaining uncompressed layer, thus making the compressed layers project out. For example, the treatment agent may be an etching solution having a different etching rate in the compressed layers and the uncompressed layer.

Abstract: The invention relates to a chemical process for obtaining anti-reflective glass, comprising immersion in an acid solution, for the simultaneous and continuous production of one or more parts and/or sheets of glass having standard, special or variable dimensions, thicknesses, colours, uses and applications. The inventive process can be used to obtain glass with an anti-reflective finish in a simultaneous and continuous manner on both sides (atmospheric side and tinned side) of the glass sheet or of various different glass parts and/or sheets simultaneously by means of immersion. Said process comprises the use of containers of glass and containers of chemical solutions which are covered with a special polymer or resin in order to prevent chemical attack from the chemical solutions used in the process. The aforementioned chemical solution containers are encapsulated such that all of the factors involved in the operation can be controlled and ensured.

Abstract: Core rods or other glass components associated with optical fiber preforms are cleaned by loading them into a number of first sleeves, and partially obstructing entrance and exit ends of the sleeves to retain the components. The sleeves are contained inside a second sleeve so that the entrance ends of the first sleeves face an entrance end of the second sleeve. A fluid delivery system supplies cleaning fluids to the entrance end of the second sleeve, so that the fluids enter the first sleeves and contact exposed surfaces of the loaded components. The fluids leave the exit ends of the first sleeves and purge from an exit end of the second sleeve. Separators may be placed between the components in the first sleeves to enhance cleaning action and to cushion adjacent end faces of the components. Cleaned components may be unloaded from the first sleeves without risk of contamination.

Abstract: A method of substantially uniformly etching oxides from non-homogeneous substrates is provided. The method utilizes a substantially non-aqueous etchant including an organic solvent and a fluorine-containing compound. The fluorine containing compound may include HF, HF:NH4F, (NH4)HF2, or TMAF:HF and mixtures thereof. The etchant may be applied to chemically non-homogeneous layers such as shallow trench isolation fill oxide layers, or to layers having a non-homogeneous composition or density at different depths within the layers, such as spin-on-glass or spin-on-dielectric films.

Abstract: To provide a method for manufacturing a quartz piece which can suppress the deterioration of the CI and the temperature characteristic failure by forming the end surface of the quartz piece perpendicularly. A method for manufacturing a quartz piece that has a shape having two sides facing each other from a quartz substrate, includes the steps of: forming an etching mask provided with an opening area for forming the outside shape along one side out of the two sides which face each other, and provided with no opening area on the other side out of the two sides facing each other, on one surface side of the quartz substrate; and forming an etching mask provided with an opening area for forming an outside shape along the other side out of the two sides which face each other, and provided with no opening area on the one side, on the other surface side of the quartz substrate.

Abstract: A method of producing a glass substrate for a mask blank has the steps of measuring a convex/concave profile of a surface of the glass substrate, controlling a flatness of the surface of the glass substrate to a value not greater than a predetermined reference value by specifying the degree of convexity of a convex portion present on the surface of the glass substrate with reference to a result of measurement obtained in the profile measuring step and executing local machining upon the convex portion under a machining condition depending upon the degree of convexity, and polishing, after the flatness control step, the surface of the glass substrate subjected to the local machining. The surface of the glass substrate subjected to the local machining is subjected to acid treatment after the flatness control step and before the polishing step.

Abstract: There is provided a method for removing molten and scattered Cu and overhang that are generated around a via opening during laser machining in a direct laser via forming method of directly machining an outer-layer copper foil. In a manufacturing method of a printed wiring board of machining the via by laser directly through the copper foil of a copper-clad laminate in which the copper foil is clad on a base material resin, a process for machining the via is carried out in a sequence of (a) a copper foil surface treatment step of forming an oxide film on the surface of said copper foil, (b) a laser via machining step, (c) an alkali treatment step and (d) a molten and scattered Cu etching step. It is desirable to carry out (e) a de-smearing treatment after the molten and scattered Cu etching.

Abstract: A method for manufacturing a glass substrate having projections of the same height. The method includes forming a surface layer having a decreased chemical resistance on a glass plate, forming a texture including a plurality of projections having upper portions included in the surface layer, and selectively removing the surface layer.

Abstract: The shape of a crotch portion of a tuning fork of a quartz piece is controlled such that main surfaces of two sheets of original plates, which are made of quartz crystal and the main surfaces thereof are orthogonal to the direction of the Z axis, which is a crystal axis, are bonded so that the plus/minus directions of the X axis, which is another crystal axis, are made in a reverse relation to each other to form a quartz substrate, and masks for forming the outer shape, through which the surfaces of the quartz substrate are exposed, are formed on both front and back surfaces of the quartz substrate in a manner that the mask follows along the outer shape of the quartz piece and the width direction of the outer shape agrees with the X axis, and the quartz substrate is etched to form the outer shape of the quartz piece.

Abstract: The present invention relates to a method of fabricating a nanogap and a nanogap sensor, and to a nanogap and a nanogap sensor fabricated using the method. The present invention relates to a method of fabricating a nanogap and a nanogap sensor, which can be realized by an anisotropic etching using a semiconductor manufacturing process. According to the method of present invention, the nanogap and nanogap sensor can be simply and cheaply produced in large quantities.

Abstract: The present invention provides an abrasive compound suitable for polishing the surface of a glass substrate for an optical disk platter or a magnetic disk platter. More specifically, the present invention provides an abrasive compound for a glass hard disk platter, characterized as comprising a stable slurry having water and, dispersed therein as an abrasive, cerium(IV) oxide particles having an average secondary particle size of 0.1 to 0.5 ?m and containing CeO2 in a concentration of 0.2 to 30 wt %. Preferably, the present invention provides the above abrasive compound in which cerium amounts for 95% or more in terms of oxides of the total amount of rare earth elements in the abrasive.

Abstract: The present invention relates to a device for cleaning, etching, activation and subsequent treatments of glass surfaces, glass surfaces coated with metal oxides or with organic material layers, SiO2-layer coated materials, and SiO2-layer coated materials with an organic material surface coating by effects of an electrical plasma layer. The invention disclosed herein includes at least one electrode system (1) consisting of at least two electrodes (2) and (3) situated inside of a dielectric body (4). An electrical plasma layer is generated preferably at atmospheric gas pressure, and preferably above the electrodes (2) and (3) situated on the same side of the treated glass, metal oxide coated glass, other SiO2-coated materials and SiO2-coated materials with a layer of organic material (5) and which are energized by an alternating or pulsed electrical voltage applied between them.

Abstract: A method of fabricating spacers for use in a flat panel device includes: preparing a core glass having a low solubility in a chemical etching solution and a tube glass having a high solubility in the chemical etching solution and having a larger inner diameter than an outer diameter of the core glass; inserting the core glass into the tube glass to obtain a cylindrical glass; drawing the cylindrical glass at a predetermined temperature until the core glass has a predetermined diameter; cutting the drawn cylindrical glass to a predetermined length; and removing the tube glass in the cylindrical glass using the chemical etching solution.

Abstract: In an electronic apparatus comprising a digital display portion and first and second oscillators comprising first and second oscillating circuits, each of the first and second oscillating circuits having a resonator, an amplifier, a plurality of capacitors, and at least one resistor, a mode of vibration of the resonator of the first oscillating circuit being the same as that of the resonator of the second oscillating circuit, an output signal being output from each of the first and second oscillating circuits, the output signal of one of the first and second oscillating circuits being a clock signal for use in operation of the electronic apparatus to display time information at the digital display portion.

Abstract: A mirror etching composition comprising a solution of water, sulfated potash and vegetable glycerin and, when applied to the electroplated non-reflective surface of a mirror, effectively simulates the appearance of a tarnished or deteriorated “antique” mirror. The electroplated surface applied to the back of new mirrors is normally sealed with a painted protective coating. In order to etch the electroplated surface on new mirrors, the painted protective coating must be stripped with a paint or varnish remover to expose the electroplated surface. After this mirror etching composition is applied to the electroplated non-reflective surface and the desired effect has been achieved, the electroplated surface may be sealed with a painted protective coating. New mirrors that have been electroplated and not yet sealed with a painted protective coating may be treated with this mirror etching composition before sealing.

Abstract: Methods of forming electrospray ionization emitter tips are disclosed herein. In one embodiment, an end portion of a capillary tube can be immersed into an etchant, wherein the etchant forms a concave meniscus on the outer surface of the capillary. Variable etching rates in the meniscus can cause an external taper to form. While etching the outer surface of the capillary wall, a fluid can be flowed through the interior of the capillary tube. Etching continues until the immersed portion of the capillary tube is completely etched away.

Abstract: A method of manufacturing a semiconductor device. In the method, a thin film is formed on an Si substrate having face orientation (100), that part of the thin film, which lies on an element-isolating region, is removed. Then, the Si substrate is subjected to selective etching, making a trench in the substrate to isolate an element, by using the thin film as mask and a mixture solution of hydrofluoric acid and ozone water.

Abstract: A method of preparing high capacity hydrous ruthenium oxide micro-ultracapacitors. A laser direct-write process deposits a film of hydrous ruthenium oxide in sulfuric acid under ambient temperature and atmospheric conditions. A dual laser process combining infrared and ultraviolet light is used for fabricating a complete wet electrochemical cell in a single processing step. Ultraviolet laser micromachining is used to tailor the shape and size of the deposited material into planar electrodes. The micro-ultracapacitors have improved size, weight, and cost efficiency and exhibit high specific power and high specific energy.

Abstract: The present invention relates to a novel dispensable medium for etching doped tin oxide layers having non-Newtonian flow behaviour for etching surfaces in the production of displays and/or solar cells and to the use thereof. In particular, it relates to corresponding particle-free compositions by means of which fine structures can be etched selectively without damaging or attacking adjacent areas.

Abstract: A technique for fabricating the required surface shapes for micro optical elements, such as curved micro mirrors and lenses, starts with a simple, binary for example, approximation to the desired surface shape. Then polishing, e.g., chemical mechanical polishing (CMP), is used to form the smooth optical surface. Specifically, starting with a mesa or blind hole, with a mesa profile, a smooth mirror or lens structure is fabricated.

Abstract: An etching solution for a multiple layer of copper and molybdenum includes: about 5% to about 30% by weight of a hydrogen peroxide; about 0.5% to about 5% by weight of an organic acid; about 0.2% to about 5% by weight of a phosphate; about 0.2% to about 5% by weight of a first additive having nitrogen; about 0.2% to about 5% by weight of a second additive having nitrogen; about 0.01% to about 1.0% by weight of a fluoric compound; and de-ionized water making a total amount of the etching solution 100% by weight.

Abstract: In a method for manufacturing a quartz crystal unit, a quartz crystal tuning fork resonator is formed by etching a quartz crystal wafer to form a quartz crystal tuning fork base and first and second quartz crystal tuning fork tines connected to the quartz crystal tuning fork base. The quartz crystal tuning fork resonator has a piezoelectric constant e?12 within a range of 0.12 C/m2 to 0.19 C/m2 in the absolute value to drive the quartz crystal tuning fork resonator. An electrode is disposed on each of two of side surfaces of each of the first and second quartz crystal tuning fork tines so that the electrodes disposed on the side surfaces of the first quartz crystal tuning fork tine have an electrical polarity opposite to an electrical polarity of the electrodes disposed on the side surfaces of the second quartz crystal tuning fork tine. The quartz crystal tuning fork resonator is mounted on a mounting portion of a case.

Abstract: A glass composition suitable for reactive ion etching.

Abstract: A method for providing a high quality glass substrate that if free of residual polishing particles. The method includes polishing the surface of the glass plate with a polishing agent containing cerium oxide particles, washing the glass plate with washing agent containing the three components of acid, a reducing agent, and fluorine ion. The washing agent is provided with an etching effect by the acid, a reducing and decomposing effect by the reducing agent, and a dissolving enhancing effect by the cerium oxide by fluorine ion. The synergistic effect of the three components provides the washing agent with an extremely high ability for washing away cerium oxide and foreign matter from the surface of the glass plate through a small amount of etching such that potential scratches are not produced.

Abstract: The present invention relates to a novel printable etching medium having non-Newtonian flow behaviour for the etching of surfaces in the production of solar cells and to the use thereof. In particular, the invention relates to corresponding particle-containing compositions by means of which extremely fine structures can be etched very selectively without damaging or attacking adjacent areas.

Abstract: An exemplary embodiment of the present invention provides a nano fabrication method for a glass, the method including forming a molecule substituting layer on a glass substrate, patterning the molecule substituting layer correspondent to shapes to be patterned on the glass substrate, substituting crystal atoms of the glass substrate with atoms of the molecule substituting layer, removing the patterned molecule substituting layer from the glass substrate, and etching the molecule substituted portion of the glass substrate.

Abstract: An etching method of subjecting a base material to an etching process using an etching agent containing hydrogen fluoride and ozone is disclosed. The base material has a first region constituted from silicon as a main material and a second region constituted from SiO2 as a main material. The etching method includes the steps of: preparing the base material; and supplying the etching agent onto the base material to form a step between the first and second regions using a feature that an etching rate of silicon by the etching agent is higher than an etching rate of SiO2 by the etching agent, so that the height of the surface of the first region is lower than the height of the surface of the second region.

Abstract: The present invention discloses an etching apparatus comprising an etching bath having an etchant; an etchant recycling part in the etching bath; a DI and undiluted etchant supply part for supplying a DI water and a undiluted etchant; an etchant mixing part for mixing the DI water and the undiluted etchant; and an etchant heating part for heating the mixed etchant.

Abstract: A method for removing photoresist is described. A substrate having a photoresist to be removed thereon is provided, and then an ashing process is performed to remove most of the photoresist. The substrate is then subjected to a surface treatment that provides sufficient energy for the extra electrons caused by the ashing process to escape from the substrate, and the remaining photoresist and polymer are stripped with stripping solvents after the surface treatment.

Abstract: A wet etching solution includes hydrogen fluoride in an amount of about 0.1% to about 3% by weight of the etching solution, an inorganic acid in an amount of about 10% to about 40% by weight of the etching solution, the inorganic acid being one or more of nitric acid, sulfuric acid, and/or hydrochloric acid, a nonionic surfactant in an amount of about 0.0001% to about 5% by weight of the etching solution, the nonionic surfactant including one or ore of alkylphenol ethoxylate and/or ammonium lauryl sulfate, and water.

Abstract: A method of fabricating an optical fiber includes placing a distal end of an optical fiber in an etch-proof fiber-holder such that a tip portion of the optical fiber is covered by the fiber-holder, and an etching portion of the optical fiber adjacent to the tip portion is not covered by the fiber-holder. The optical fiber is exposed to an etching solution to change a profile of the etching portion, and the distal end of the optical fiber is removed from the fiber-holder.

Abstract: A manufacturing method for a light propagating probe comprises a step of sharpening a light-propagating body having a sharpened section formed on an optical fiber, a step of forming the light-propagating body into a hook shape close to the sharpened section, a metal film coating step for forming a transparent opening section in a tip section, a step of protecting the transparent opening section with a resist material, a step of forming a reflecting surface for a light lever method, a step for metal film coating a spring operating part to the rear from the hook-shaped section, and a step of removing the resist material protecting the transparent opening section.

Abstract: A method for preparing a decorative glass using a glass etching composition, wherein a frosting of elaborate patterns and designs is applied on the surface of the glass having an arbitrary shape, such a plane, a curved plane or a tube, by utilizing the silk-screen process or the like, using a glass etching composition characterized as comprising 1 to 20 w/v % (preferably, 2 to 5 w/v %) of a fluoride, 20 to 80 v/v % (preferably, 20 to 50 v/v %) of water and 20 to 80 v/v % (preferably, 50 to 80 v/v %) of an organic solvent miscible with water or another glass etching composition comprising the former composition and an additive. The glass etching composition is free from the problems of the danger to a human body and environmental pollution.

Abstract: An apparatus and process for monitoring migratory cell proliferation with restricted migration on a substrate includes providing a substrate, coating the substrate with extracellular matrix, plating cells suspended in cell culture media on extracellular matrix, and placing intersecting channels across the extracellular matrix components by removing the extracellular matrix components from the channels to isolate islands of the extracellular matrix components on the substrate. When the cells are immersed with a fluid, migration of the cells is confined to the isolated islands of the extracellular matrix components, permitting long-term observation of a migratory population.

Abstract: A method for manufacturing quartz oscillators is provided which permits quartz oscillators having an oscillation frequency, as designed, to be obtained with small variation of individual oscillation frequency and with high reliability. The method for manufacturing quartz oscillators according to the present invention comprises the steps of forming a first resist layer (300) on one surface of a quartz substrate (100), exposing said first resist layer to light of a first amount of exposure to form a patterned first masking layer (210), forming a second resist layer (400) on the other surface of said quartz substrate, exposing said second resist layer to light of a second amount of exposure via said quartz substrate to form a patterned second masking layer (410) by using said first masking layer, and etching said quartz substrate to form quartz pieces (150) by using said patterned first masking layer and said patterned second masking layer.

Abstract: The apparatus for quantifying effectiveness of solvent to clean a coating from a substrate using a drip test includes a test stand, a drip test device, and a computer associated with the stand and test device. The test stand is adapted to support a glass panel at a predetermined angle. The drip test device is adapted to deposit solvent-based droplets onto a coated surface of the glass panel to clean the coated surface. The computer optically scans the glass panel and to determine cleanliness after a drip test is conducted. The method includes conducting a drip test on a coated glass panel, placing a template behind the glass panel, optically scanning the glass panel and template into a computer, and evaluating the glass panel for cleanliness based on the scanned image of the glass panel and template.

Abstract: A method of manufacturing a substrate 5 with a plurality of concave portions 3 according to the invention includes the steps of forming a mask 6 on the substrate 5, forming a plurality of initial holes 61 on the mask 6 by means of a physical method such as blast processing or irradiation with laser beams, and forming the plurality of concave portions in the substrate 5 by subjecting the mask 6 with the plurality of initial holes 61 to an etching process. In case of carrying out the blast processing, glass beads whose average diameter is in the range of 50 to 100 ?m are used as blast media.

Abstract: An inexpensive and rapid method for fabricating arrays of hollow microneedles uses a photoetchable glass. Furthermore, the glass hollow microneedle array can be used to form a negative mold for replicating microneedles in biocompatible polymers or metals. These microneedle arrays can be used to extract fluids from plants or animals. Glucose transport through these hollow microneedles arrays has been found to be orders of magnitude more rapid than natural diffusion.

Abstract: In an apparatus for etching a glass substrate according to the present invention, impurities that are attached to the surface of a glass substrate, which are formed by assembling a color filter substrate and a TFT substrate provided in the etching bath filled with etchant, are removed by using ultrasonic oscillation generated from an ultrasonic oscillator, by which a glass substrate having uniform thickness and surface is obtained.

Abstract: To provide a planarization method which does not depend upon the size and the density of a wiring pattern and in which a reliable wiring system and a Josephson device can be formed and wiring structure, an insulation layer is planarized by forming a reversal pattern mask of wiring and selectively removing the insulation layer on the wiring.

Abstract: A method of manufacturing a plasma display panel, whose glass substrate is not tinged and luminance is high, is provided, even when silver material is used. A layer including silver compounds, which include sulfur generated on a surface of an electrode by reacting on sulfur in air, is removed before a forming process of a dielectric layer. Then decomposition of the compound is restricted in a firing process of the dielectric layer. Even when the electrode having the silver material with high electrical conductivity is used, yellow coloration on the glass substrate is prevented. As a result, a high quality plasma display panel which does not decrease in luminance is provided.

Abstract: A glass substrate for use in an information recording medium is manufactured by polishing a surface of a disc-shaped glass substrate and then performing texture processing on the surface. The texture processing includes the steps of forming lines of texture on the surface of the glass substrate extending along a circumferential direction of the glass substrate by performing a mechanical texture formation method in which the surface of the glass substrate is supplied with an abrasive slurry while an abrasive member slidably contacts the surface, and correcting the shape of the texture by removing burrs formed on the texture during the formation of the texture. The correction of the shape of the texture is performed by using a correcting pad made of foam of a synthetic resin having a 100% modulus of 3 to 40 MPa and scrubbing the surface of the glass substrate with the correcting pad in a direction intersecting the direction in which the texture extends.

Abstract: A sub-micron structure is fabricated in a transparent dielectric material by focusing femtosecond laser pulses into the dielectric to create a highly tapered modified zone with modified etch properties. The dielectric material is then selectively etched into the modified zone from the direction of the narrow end of the tapered zone so that as the selective etching proceeds longitudinally into the modified zone, the progressively increasing width of the modified zone compensates for lateral etching occurring closer to the narrow end so as to produce steep-walled holes. The unetched portion of the modified zone produced by translating the laser beam close to and parallel to the bottom surface of the dielectric can serve as an optical waveguide to collect light from or deliver light to the etched channel which can contain various biological, optical, or chemical materials for sensing applications.

Abstract: Disclosed is a method for forming a conductor on a dielectric. The method commences with the deposition of a conductive thickfilm on the dielectric, followed by a “subsintering” of the conductive thickfilm. Either before or after the subsintering, the conductive thickfilm is patterned to define at least one conductor. After subsintering, the conductive thickfilm is etched to expose the conductor(s), and the conductor(s) are then fired. A brief chemical etch may be used after the final firing step if improved wire-bondability is required.

Abstract: In the present invention, a surface 7 of a glass substrate 1 is irradiated with a laser beam 2 to thereby form a V-shaped groove 6. At that time, the laser beam 2 is condensed outside and above the glass substrate 1. The distance between a beam-condensing point 4 of the laser beam 2 and the surface 7 of the glass substrate 1 is changed to thereby make it possible to change the angle between opposite side surfaces of the V-shaped groove. The angle is in a range of from 30 degrees to 120 degrees. Further, the laser beam used in the present invention is pulsed light, preferably with a pulse width not larger than 10 picoseconds.

Abstract: According to a flexible thin film capacitor of the present invention, an adhesive film is formed on a substrate composed of at least one selected from the group consisting of an organic polymer and a metal foil, and an inorganic high dielectric film and metal electrode films are formed thereon. A metal oxide adhesive film can be used as the adhesive film. The adhesive film is formed in contact with the inorganic high dielectric film and at least one of the metal electrode films.

Abstract: Methods of bonding glass and silicon-containing articles are disclosed. Bonding is achieved without use of adhesives or high temperature fusion. A wide variety of glass and silicon-containing articles may be bonded by the methods of the invention.

Abstract: A method for reducing the density of sites on the surface of fused silica optics that are prone to the initiation of laser-induced damage, resulting in optics which have far fewer catastrophic defects, and are better capable of resisting optical deterioration upon exposure to a high-power laser beam.