Abstract: The present disclosure relates to a method for controlling a spot welding arrangement, the method comprising the steps of moving a welding tip portion of the spot welding arrangement between a first and a second position by applying a force to the welding tip portion; determining a distance moved between the first and second positions; determining a type of welding yoke connected to the spot welding arrangement based on the determined distance and the applied force; and controlling settings of the spot welding arrangement based on the welding yoke connected to the spot welding arrangement.

Abstract: A lead connector is provided for connecting a plasma torch lead of a plasma arc torch to a power supply of a plasma cutting system. The lead connector includes a base portion, a central conduit disposed in the base portion, where the central conduit is configured to carry a gas and a torch current to the plasma arc torch, and multiple pins disposed radially about a center of the central conduit. The pins are located at a radius of between about 0.4 inches and about 0.65 inches from the center of the central conduit on a radial plane of the base portion. The pins include one or more pilot carrying pins and one or more control signal pins located from about 27 degrees to about 64 degrees and from about 120 degrees to about 170 degrees, respectively, about the center of the central conduit on the radial plane.

Abstract: A plasma chamber of a plasma processing system is provided. The plasma chamber defines a plasma channel having a first side and a second side oppositely disposed along a length of the plasma channel. The plasma chamber comprises a first section and a second section constructed from a dielectric material and an interface that bonds together the first and second sections at between a first flange of the first section and a third flange of the second section and between a second flange of the first section and a fourth flange of the second section.

Abstract: A substrate support includes an edge ring, one or more heating elements, and a cable configured to provide power from a power source to the edge ring and the one or more heating elements. The cable includes a first plurality of wires connected to the edge ring, a second plurality of wires connected to the one or more heating elements, a filter module, wherein the first plurality of wires and the second plurality of wires are twisted together within the filter module, and an isolation device. The isolation device is connected to the first plurality of wires and disposed between the filter module and the edge ring. The isolation device is configured to compensate for a resonance frequency generated during operation of the edge ring and the one or more heating elements.

Abstract: Disclosed is a substrate treating apparatus, which includes a chamber having a space for treating a substrate in an interior thereof, a substrate support assembly including a support plate situated in the chamber and which supports the substrate, a gas supply unit which supplies a gas into the interior of the chamber, a plasma generating unit which excites the gas in in the interior of the chamber into a plasma state, and a substrate temperature control unit which controls a temperature of the substrate, and the substrate temperature control unit includes a plurality of heaters installed in different areas of the support plate, a power supply part which supplies electric power to the plurality of heaters, a ferrite core which interrupts a low-frequency signal introduced to the power supply part, and a plurality of air cores which interrupts a high-frequency signal introduced into the power supply part.

Abstract: A radio-frequency (RF) power circuit for a multi-electrode cathode in a processing chamber may include an RF source and inductive element(s) that are conductively coupled to the RF source. A first inductive element may be inductively coupled to the inductive element(s), and the first inductive element may be configured to receive a first portion of RF power originating from the RF source and provide the first portion of the RF power for a first pedestal electrode. A second inductive element may also be inductively coupled to the inductive element(s), and the second inductive element may be configured to receive a second portion of RF power originating from the RF source through the inductive element(s) and provide the second portion of the RF power for a second pedestal electrode.

Abstract: Systems and methods for a welding-type power supply to provide both a welding output voltage and a battery charging output voltage. The power supply includes a first contactor associated with a first circuit to provide the welding output voltage, and a second contactor associated with a second circuit to provide the battery charging output voltage. An auxiliary switch is operatively coupled to the second contactor, to prevent the first circuit from closing when the second contactor is closed to prevent transmission of the welding output voltage to the second circuit.

Abstract: A radio frequency (RF) filter system for a substrate processing chamber comprises a first RF filter coupled to a first element of the processing chamber and a second RF filter coupled to the first element of the processing chamber. Each of the RF filters comprises a first filter stage configured to reject a first frequency, a second filter stage coupled to the first filter stage and configured to reject a second frequency, and a third filter stage coupled to the second filter stage and configured to reject the first frequency. Further, the first filter stage comprises a first inductor and a first capacitance, the second filter stage comprises a second inductor and a second capacitance, the third filter stage comprises a third inductor and a third capacitance.

Abstract: The present invention provides an SiC inverted plasma cutting power supply, which is characterized in that: the SiC inverted plasma cutting power supply comprises a main circuit and a closed-loop control circuit; the main circuit comprises a sequentially connected noise suppression module, a power-frequency rectification and filtering module, an SiC inverter module, a power transformer, an SiC rectification and smoothing module and a non-contact arc initiation module, wherein the noise suppression module is connected to an alternating-current input power supply, and the SiC rectification and smoothing module and the non-contact arc initiation module are respectively connected to a load; the closed-loop control circuit comprises a man-machine interaction module, a DSC controller, a failure diagnosis and protection module, an SiC high-frequency drive module and a load electrical signal detection module.

Abstract: Systems and methods to control auxiliary power output voltage using a welding output voltage are disclosed. An example power system includes an engine, a generator to provide electrical power based on mechanical power received from the engine, the electrical power comprising welding-type power and non-welding power, and a controller to control the generator or the engine to increase or decrease a voltage of the non-welding power based on a voltage measurement of the welding-type power.

Abstract: In some aspects, methods for preserving a usable life of a plasma arc electrode consumable installed in a plasma arc torch can include measuring a characteristic of an electrical signal being provided to the torch to generate a plasma arc between the torch and a workpiece to be processed; monitoring the characteristic during operation of the torch over a time period; comparing the characteristic to a threshold value; and, responsive to determining that a measured characteristic meets and/or exceeds the threshold value, initiating an arc extinguishing sequence to preserve the life of the electrode.

Abstract: A power conversion system includes a feedback controller circuit connected between the output of a boost converter and a duty cycle control input of the boost converter. The feedback controller circuit comprises: a first summing node which generates an error signal indicative of a difference between a voltage of the output of the boost converter and a reference voltage, a compensator circuit receiving the error signal and applying a gain to the error signal to generate an amplified error signal, and a scaling circuit for scaling the amplified error signal to generate a scaled signal, which is applied to a duty cycle control input of the boost converter to alter the duty cycle and/or pulse frequency of the boost converter. The feedback controller circuit provides a frequency-dependent impedance transformation looking into the boost converter from the source such that instability due to line impedance is reduced.

Abstract: A direct drive circuit for providing RF power to a component of a substrate processing system includes a clock generator to generate a clock signal at a first frequency, a gate driver to receive the clock signal and a half bridge circuit. The half bridge circuit includes a first switch with a control terminal connected to the gate driver, a first terminal and a second terminal; a second switch with a control terminal connected to the gate driver, a first terminal connected to the second terminal of the first switch and an output node, and a second terminal; a first DC supply to supply a first voltage potential to the first terminal of the first switch; and a second DC supply to supply a second voltage potential to the second terminal of the second switch. The first voltage potential and the second voltage potential have opposite polarity and are approximately equal in magnitude.

Abstract: An apparatus may include a power supply to generate an output current. The apparatus may further include a plasma torch to apply the output current across a gap and a user interface to receive a selection for enabling a pierce current mode. The apparatus may further include a controller to temporarily increase an output current setting at the plasma torch from a first level to a second level, responsive to the selection of pierce current mode.

Abstract: A processing object reforming apparatus includes a plasma processing unit that acidifies at least a surface of a processing object by processing the surface of the processing object by using plasma; and a control unit that controls the plasma processing unit to plasma-process the processing object with a plasma energy amount based on a type of the processing object.

Abstract: A welding system includes a welding torch. The welding torch includes a sensor configured to detect a motion associated with the welding torch, a temperature associated with the welding torch, or some combination thereof. A display of the welding torch is activated, a determination is made that the welding torch has been involved in a high impact event, live welding using the welding torch is disabled, a software selection is made, or some combination thereof, based on the motion, the temperature, or some combination thereof.

Abstract: A plasma torch system and method is provided, in which the system utilizes a number of pressure sensors throughout the system and the torch to detect the flow/pressure of shield and plasma gas during operation. The detected pressures are used by the system to dynamically control the system pressures to optimize the cutting operation.

Abstract: An object is to realize combustion flame which can further reduce the amount of NOx generation. A combustor (14) includes a pilot nozzle (40); a plurality of main nozzles (44) arranged apart from the pilot nozzle (40) in the circumferential direction on the outer peripheral side of the pilot nozzle (40) and configured to perform premix combustion; a combustor basket (34) surrounding the pilot nozzle (40) and each main nozzle (44); an outlet outer ring (50) provided at a tip end of the combustor basket (34); and a combustion liner (36) fitted, at an inner surface thereof, onto the outer periphery of the combustor basket (34) and surrounding the outlet outer ring (50). The outlet outer ring (50) is formed parallel to an inner wall surface (66) of the combustion liner (36).

Abstract: In order to increase the operable range of a DC plasma torch in an abatement apparatus, the apparatus comprises a power control configured for controlling the power of the plasma torch by selective control of the plasma source gas flow regulator.

Abstract: Methods and apparatus for processing a substrate in a multi-frequency plasma processing chamber are disclosed. The base RF signal pulses between a high power level and a low power level. Each of the non-base RF generators, responsive to a control signal, proactively switches between a first predefined power level and a second predefined power level as the base RF signal pulses. Alternatively or additionally, each of the non-base RF generators, responsive to a control signal, proactively switches between a first predefined RF frequency and a second predefined RF frequency as the base RF signal pulses. Techniques are disclosed for ascertaining in advance of production time the first and second predefined power levels and/or the first and second predefined RF frequencies for the non-base RF signals.

Abstract: Methods and systems for transferring a plasma arc from between an electrode and a tip to between an electrode and a workpiece and back as dictated by the conditions at the cutting arc are provided. The present disclosure allows for arc transfer detection without use of a current sensor at the workpiece or knowledge of a precise pilot circuit limit value through a novel plasma arc control circuit. In one embodiment, the plasma arc control circuit provides a programmable current source and a current sink configured to limit current in a pilot arc control circuit. The pilot arc circuit may be configured to signal its limiting status to a controller, which may switch the pilot arc control circuit in or out of the current path. Certain embodiments may include a pulse width modulation control in the pilot arc control circuit for controlling current flow through the pilot arc circuit.

Abstract: A plasma arc cutting system and method is providing which provides a fixed arc start current until separation occurs between the torch nozzle and electrode. After separation the current is dropped to a low current level for a period of time and then current pulses are provided until a work current is detected in a work piece to be cut.

Abstract: A welding method, which performs non-keyhole welding of a ferritic stainless steel having a plate thickness of 3 mm or less using a plasma welding torch (10), includes supplying an inert gas, as a pilot gas (23), into the gap between a tungsten electrode (11) and an insert chip (12) at a flow rate of 2.1 m/sec or less, and supplying a shield gas (24) into the gap between the insert chip (12) and a shield cap (15), wherein a mixed gas prepared by adding either 0.5 to 4 vol % of oxygen gas or 1 to 6 vol % of carbon dioxide gas to an inert gas is used as the shield gas (24).

Abstract: In some aspects, methods of initiating a plasma arc in a plasma cutting system can include providing a plasma gas supply lead line extending between a power supply and a plasma arc cutting torch, where the lead line has a first segment proximate to the power supply and a second segment proximate to the torch, and an in-line valve within the lead line between the first segment and the second segment; selectively closing the in-line valve to capture a static volume of gas in the first segment; establishing a decayable volume of gas in the second segment; and initiating the plasma arc when a pressure of the decayable volume reaches a pressure value within a predetermined range.

Abstract: A method and apparatus for providing welding-type power includes receiving an input that may be either a single or a three phase input voltage. Three power modules, each having a single phase boost power circuit, and an output circuit process the input power. A weld output circuit receives and combines the outputs of the three power modules. An input power distribution module connects the three power modules such that each receives a unique single phase power signal. A controller controls the three power modules and the input power distribution module.

Abstract: An impedance matching device includes an input port connected to a high-frequency power supply, an output port connected to a load, an impedance variable circuit, a T-parameter memory for storing sets of T-parameters in a manner such that each of the sets of T-parameters is related to a corresponding one of adjustable impedance values of the device, an input voltage detector for detecting a forward wave voltage and a reflected wave voltage at the input port, and a p-p value calculator for computation of a p-p value of a high-frequency voltage at the output port. The computation of the p-p value of the high-frequency voltage is performed by using the forward wave voltage and the reflected wave voltage detected at the input port and also using one set of the T-parameters stored in the T-parameter memory.

Abstract: Systems and methods relating to securing a torch assembly and a work lead assembly to a plasma cutting power supply are provided. The present disclosure relates to a system and method that allows the torch assembly and the work lead assembly to be readily replaced by the user since the power supply unit need not be opened or disassembled for removal. The present disclosure provides methods and systems for removably securing both the torch assembly and the work lead assembly to the plasma cutting power supply. In one embodiment, the torch assembly and the work lead assembly may be communicatively coupled to the plasma cutting power supply unit via a single cable and a single connector. The connection between the first connector and the first port may be of the quick disconnectable type. The connection between the second connector and the second port may be of the twist lock type, such as a dinse style connector.

Abstract: A multilevel LLC resonant converter comprises a resonant tank connected in series with a primary side of a transformer, a first switch and a second switch connected in series, wherein a common node of the first switch and the second switch is coupled to a mid-voltage point through a first isolation switch and the resonant bank and a third switch and a fourth switch connected in series, wherein a common node of the third switch and the fourth switch is coupled to the resonant tank.

Abstract: A system and method of starting a welding operation is provided where an electrode is advanced towards a work piece in a pulsed fashion and having a voltage level which will provide a first current when contact between the electrode and the work piece is made. After contact the electrode is retracted so that a welding arc is established and after the welding arc is established the current and wire feed speed is increased to a welding level.

Abstract: An arc welding method comprising the steps of accelerating a feeding speed of a welding wire to cause shorting between the welding wire and a base metal when a welding end signal is input during a period of arcing, retracting the welding wire backward thereafter until a wire retracting speed reaches a predetermined rate, controlling the wire retracting speed constant at this speed for a predetermined duration of time, then stopping the backward retraction of the welding wire, and then terminating a welding power output after supplying a predetermined amount of welding current for a predetermined duration of time starting from a time when opening of the shorting occurs during the backward retraction of the welding wire.

Abstract: A system is provided that includes a torch power unit, wherein the torch power unit includes a motor and a digital device coupled to the motor and configured to control the motor. A method of operation is provided that includes controlling one or more aspects of a torch power unit via a microprocessor, a digital signal processor, or a field programmable gate array, or a combination thereof. In another embodiment, a system is provided that includes a torch power unit that includes a torch, one or more components comprising a generator, a power converter, a compressor, a motor, a wire feeder, or a combination thereof, and a microprocessor configured to control the one or more components.

Abstract: A sensor apparatus for measuring a plasma process parameter for processing a workpiece. The sensor apparatus includes a base, an information processor supported on or in the base, and at least one sensor supported on or in the base. The at least one sensor includes at least one sensing element configured for measuring an electrical property of a plasma and may include a transducer coupled to the at least one sensing element. The transducer can be configured to receive a signal from the sensing element and convert the signal into a second signal for input to the information processor.

Abstract: An arc welder including an integrated monitor is disclosed. The monitor is capable of monitoring variables during a welding process and weighting the variables accordingly, quantifying overall quality of a weld, obtaining and using data indicative of a good weld, improving production and quality control for an automated welding process, teaching proper welding techniques, identifying cost savings for a welding process, and deriving optimal welding settings to be used as pre-sets for different welding processes or applications.

Abstract: In some aspects of the invention, a system for operating a plurality of plasma and/or induction heating processing systems includes an operating unit that has a display device on which a graphic user interface can be displayed, at least two power generators that supply power to a plasma process or an induction heating process, and a network that connects the operating unit to the power generators to transmit signals between the operating unit and the power generators. The graphic user interface includes a static region and a dynamic region, and a selection device for selecting information to be displayed in the dynamic region.

Abstract: A plasma cutting or welding system includes a power input. The power input is configured to be coupled to a plurality of multipronged input plugs. Each of the multipronged input plugs corresponds to an input voltage. The power supply also includes a user input device for selecting an operating current. The user input device is subdivided into a plurality of current ranges. Each of the current ranges includes an iconic representation of at least one multipronged input plug.

Abstract: An arc welder including an integrated monitor is disclosed. The monitor is capable of monitoring variables during a welding process and weighting the variables accordingly, quantifying overall quality of a weld, obtaining and using data indicative of a good weld, improving production and quality control for an automated welding process, teaching proper welding techniques, identifying cost savings for a welding process, and deriving optimal welding settings to be used as pre-sets for different welding processes or applications.

Abstract: A processing target reforming apparatus includes: a conveying unit that conveys a processing target along a conveyance path; a discharge unit including a plurality of discharge electrodes aligned along the conveyance path, a counter electrode with the conveyance path interposed therebetween, and a power source that applies a voltage waveform to the discharge electrodes; and a control unit that controls the discharge unit such that a phase of the voltage waveform applied to a first discharge electrode of the discharge electrodes at a timing when a certain point of the processing target passes between the first discharge electrode and the counter electrode is shifted with respect to a phase of the voltage waveform applied by the power source to a second discharge electrode of the discharge electrodes at a timing when the certain point of the processing target passes between the second discharge electrode and the counter electrode.

Abstract: This disclosure relates to a thermal spray coating system including a table that is configured to support a component. A spray torch is configured to direct a thermal spray at a component surface. A cooling device is arranged adjacent to spray torch and configured to be in close proximity to the component surface. The cooling device includes a manifold that is connected to an air supply. The manifold has a face with multiple impingement holes less than one-eighth inch (3.1 mm) in diameter that are configured to direct cooling air on the component surface. In one example, the diameter of the impingement holes is approximately 0.059 inch (1.5 mm) and provide cooling air at a velocity of at least 400 ft per second (122 meters per second). The face is arranged within one inch (25 mm) of the component surface, in one example. Accordingly, the above cooling device uses less air and yields more consistent results in thermal coating of the component.

Abstract: A plasma cutting or welding system includes a power input. The power input is configured to be coupled to a plurality of multipronged input plugs. Each of the multipronged input plugs corresponds to an input voltage. The power supply also includes a user input device for selecting an operating current. The user input device is subdivided into a plurality of current ranges. Each of the current ranges includes an iconic representation of at least one multipronged input plug.

Abstract: Methods, devices and systems for detecting an incomplete cutting action when cutting a workpiece with a high-energy beam are disclosed. In one aspect, a method includes taking an image of a region of the workpiece to be monitored, the region including an interaction region of the high-energy beam with the workpiece, evaluating the image taken in order to detect pooled slag at an end of the interaction region opposite a cutting front, and detecting whether a related cutting action is incomplete based on an occurrence of detection of pooled slag.

Abstract: Methods and apparatus for regulating the temperature of a component in a plasma-enhanced process chamber are provided herein. In some embodiments, an apparatus for processing a substrate includes a process chamber and an RF source to provide RF energy to form a plasma in the process chamber. A component is disposed in the process chamber so as to be heated by the plasma when formed. A heater is configured to heat the component and a heat exchanger is configured to remove heat from the component. A chiller is coupled to the heat exchanger via a first flow conduit having an on/off flow control valve disposed therein and a bypass loop to bypass the flow control valve, wherein the bypass loop has a flow ratio valve disposed therein.

Abstract: A portable plasma arc torch system can be used for processing materials. The system includes a replaceable or rechargeable power source and replaceable or rechargeable gas source. A controller communicates with at least one of the power source or the gas source. A plasma delivery device received via the controller current from the power source and gas from the gas source to generate a plasma arc at an output of the plasma delivery device. The plasma arc can be used to process materials such as metallic workpieces. The plasma arc torch can include a wearable portable assembly which includes the replaceable or rechargeable power and gas source. A plasma delivery device receives current from the power source in the assembly and gas from the gas source in the assembly to generate a plasma arc.

Abstract: A portable plasma cutting system includes a power supply and a torch attachable to the power supply. The torch generates a plasma arc for cutting a workpiece. A gas valve is disposed in the system or the torch. The gas valve establishes a gas flow rate or a gas pressure in the torch. A controller is within the system and in communication with the power supply. The controller is capable of automatically manipulating the gas valve to establish the gas flow rate or pressure based upon a predetermined operating condition. A user activated switch is in communication with the controller. The switch has a first setting which causes the controller to automatically establish the gas flow rate or pressure based upon the predetermined operating condition, and a second setting which causes the controller to establish one of a user-determined gas flow rate or a user-determined gas pressure.

Abstract: A system and method for regulating a gas flow of a plasma arc system. The system having a gas regulator that control gas flow from a gas source to the plasma torch system, a pilot input valve to fill a pilot chamber and a pilot dump valve to evacuate the pilot chamber, the pilot chamber mechanically coupled to the gas regulator through a pressure actuator, such that the gas flow pressure through the regulator is controlled using the pressure actuator and based on the pressure in the pilot chamber.

Abstract: The invention relates to a device generating a plasma flow comprising an electrically conductive housing, tubular in shape, forming a central channel traversed by a vortex gas, a central electrode arranged coaxially in said channel and an electric power source intended to apply an electric voltage V between the electrode and the housing, characterized in that the mean diameter of the channel formed by the housing decreases progressively from an area situated substantially at the level of the free end of the electrode as far as an end area of said housing, said end area being configured in such a way that the minimum electric voltage Vcmin(0) to be applied in order to develop an electric arc between said electrode and said end area is strictly greater than said voltage V.

Abstract: An apparatus and method to extend and concentrate a plasma from one or more plasma sources through at least one RF grounded pathway. A first embodiment of the invention involves a method to extend and concentrate a plasma. A second embodiment of the invention involves an apparatus to extend and concentrate a plasma. In some embodiments, an electrostatic rod inserted inside a RF grounded pathway assists the extension and concentration of a plasma that can treat one or more articles.

Abstract: There is provided a plasma processing apparatus capable of performing a uniform plasma process on a substrate by controlling a plasma distribution within a chamber to a desired state and uniformizing a plasma density within the chamber. The plasma processing apparatus includes an evacuable chamber 11 for performing a plasma process on a wafer W; a susceptor 12 for mounting the wafer W within the chamber 11; an upper electrode plate 30a facing the susceptor 12 with a processing space S; a high frequency power supply 20 for applying a high frequency power to one of the susceptor 12 and the upper electrode plate 30a to generate plasma within the processing space S; and an inner wall member facing the processing space S. Hollow cathodes 31a to 31c are formed at the upper electrode plate 30a connected with a DC power supply 37 for adjusting a sheath voltage.

Abstract: The present invention relates to a heat treatment apparatus that performs activation annealing or defect repair annealing and surface oxidization which succeed impurity doping intended to control the conductive property of a semiconductor substrate. In the present invention, a sample to be heated is placed on a lower electrode in a plasma treatment chamber. A gap between an upper electrode and the lower electrode is filled with a gap whose main raw material is a rare gas (helium, argon, krypton, xenon, or the like) having a pressure close to the atmospheric pressure. A power fed from a high-frequency power supply is applied to the upper electrode in order to induce an atmospheric-pressure glow discharge. Gas heating in the gap between the electrodes, which depends on the glow discharge, is used to heat-treat the sample to be heated.

Abstract: A radio-frequency heating apparatus includes a radio-frequency power generation unit (120), variable phase shift units (142a to 142d) that change a phase of a radio-frequency power generated by the radio-frequency power generation unit (120), radio-frequency power units (140a to 140d), and a control unit (110) that sets a frequency for the radio-frequency power generation unit (120) and a phase shift amount for the variable phase shift units (142a to 142d). Backward power detection units in the radio-frequency power units (140a to 140d) individually detect a reflected power and a through power at the frequency set for the radio-frequency power generation unit (120) by the control unit (110), and the control unit (110) determines a frequency for the radio-frequency power generation unit (120) and a phase shift amount for the variable phase shift units (142a to 142d) for heating the object, on the basis of the detected amplitude and phase of the reflected wave and the through wave.

Abstract: A segmented transformer coupled plasma (TCP) coil is provided as a source for generating a uniform plasma in a plasma reactor. The segmented TCP is divided into two or more segment coils which, when connected to an RF source, produces a circulating flow of electrons to cause a magnetic field in the plasma. Because the segmented TCP employs multiple segment coils, a plasma is generated that is more spatially uniform than the plasma produced by a monolithic coil. This is implemented using a power distributing component that allows the RF current to be distributed in the segment coils such that a uniform plasma density can be obtained in an area spanned by the coils. For instance, variable shunts, switchable shunts, and disconnect switches can be used to vary the RF currents in the individual coils.