Electron Microscope Type Patents (Class 250/311)
  • Patent number: 9818578
    Abstract: An apparatus and a method for measuring and monitoring the properties of a fluid, for example, pressure, temperature, and chemical properties, within a sample holder for an electron microscope. The apparatus includes at least one fiber optic sensor used for measuring temperature and/or pressure and/or pH positioned in proximity of the sample.
    Type: Grant
    Filed: February 19, 2015
    Date of Patent: November 14, 2017
    Assignee: Protochips, Inc.
    Inventors: Daniel Stephen Gardiner, William Bradford Carpenter, John Damiano, Jr., Franklin Stampley Walden, II, David P. Nackashi
  • Patent number: 9810648
    Abstract: An X-ray fluorescence analyzer includes: a sample stage; an X-ray source; a detector; an X stage; a Y stage; a ? stage; and a shielding container, wherein the irradiation position with primary X-rays is set at an offset position from a movement center of the X stage and the Y stage, wherein an irradiation area that is irradiatable with the primary X-rays is set to a selected segmented area from among segmented areas that are defined by segmenting the surface of the sample into four parts with a virtual segment lines in the X direction and the Y direction passing through the movement center, and wherein the ? stage is configured to switch the selected segmented area into any one of the segmented areas by rotating the sample stage by every 90 degrees.
    Type: Grant
    Filed: November 21, 2015
    Date of Patent: November 7, 2017
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventor: Toshiyuki Takahara
  • Patent number: 9792832
    Abstract: An image display device displays operation items of an electron microscope on an operation screen, and a storage device stores information of assist buttons which display image state information acquired via a detector of the electron microscope. The information of the assist buttons corresponds to image quality of an acquired image via the detector as well as to observation conditions composed of a combination of parameter setting values of the electron microscope, an operation program which analyzes the image quality of the acquired image. The information of the assist buttons is acquired based on analytical results of the image quality as well as current observation conditions, and the assist buttons are displayed on a predetermined part of the operation screen. Accordingly, the skills of a novice user operating a charged particle beam apparatus can be improved.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: October 17, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yayoi Konishi, Hiroyuki Noda, Takahiro Inada, Kunji Shigeto, Tohru Ando, Noriko Iizumi, Ryuichiro Tamochi, Mitsugu Sato
  • Patent number: 9779911
    Abstract: An electron microscope capable of measuring aberrations accurately is provided. The microscope is adapted to obtain scanning transmission electron (STEM) images by detecting electrons transmitted through a sample (S). The microscope (100) includes a segmented detector (20) having a detection surface (23) for detecting the electrons transmitted through the sample (S). The detection surface (23) is divided into detector segments (D1-D16) for detecting the electrons transmitted through the sample (S). The microscope (100) further includes an aperture plate (30) for limiting the active areas of the detector segments (D1-D16) on which the electrons impinge.
    Type: Grant
    Filed: February 2, 2016
    Date of Patent: October 3, 2017
    Assignee: JEOL Ltd.
    Inventor: Yuji Kohno
  • Patent number: 9779493
    Abstract: A method of setting an address point (AP) of a measuring apparatus includes generating an original image using design data, generating a first simplified image by extending sizes of patterns in the original image, searching for at least one vertex in the first simplified image, and setting a predetermined region including the at least one vertex as the AP upon locating the at least one vertex.
    Type: Grant
    Filed: March 14, 2016
    Date of Patent: October 3, 2017
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventor: Hyungjoon Cho
  • Patent number: 9761409
    Abstract: The present invention relates to modulating an irradiation condition of a charged particle beam at high speed and detecting a signal in synchronization with a modulation period for the purpose of extracting a signal arising from a certain charged particle beam when a sample is irradiated with a plurality of charged particle beams simultaneously or, for example, for the purpose of separating a secondary electron signal arising from ion beam irradiation and a secondary electron signal arising from electron beam irradiation in an FIB-SEM system. The present invention further relates to dispersing light emitted from two or more kinds of scintillators having different light emitting properties, detecting each signal strength, and processing a signal on the basis of a ratio of first signal strength when the sample is irradiated with a first charged particle beam alone to second signal strength when the sample is irradiated with a second charged particle beam alone, the ratio being set by a mechanism.
    Type: Grant
    Filed: January 10, 2014
    Date of Patent: September 12, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tsunenori Nomaguchi, Toshihide Agemura
  • Patent number: 9761408
    Abstract: A method for automatically imaging in an electron microscope (SEM, TEM or STEM) features in a region of interest in a lamella without prior knowledge of the features to be imaged, thereby enabling multiple electron microscope images to be obtained by stepping from the first image location without requiring the use of image recognition of individual image features. By eliminating the need for image recognition, substantial increases in image acquisition rates may be obtained.
    Type: Grant
    Filed: February 24, 2015
    Date of Patent: September 12, 2017
    Assignee: FEI Company
    Inventors: Paul Plachinda, Liang Zhang, Justin Roller
  • Patent number: 9728374
    Abstract: An inspection apparatus includes beam generation means, a primary optical system, a secondary optical system and an image processing system. Irradiation energy of the beam is set in an energy region where mirror electrons are emitted from the inspection object as the secondary charged particles due to the beam irradiation. The secondary optical system includes a camera for detecting the secondary charged particles, a numerical aperture whose position is adjustable along an optical axis direction and a lens that forms an image of the secondary charged particles that have passed through the numerical aperture on an image surface of the camera. In the image processing system, the image is formed under an aperture imaging condition where the position of the numerical aperture is located on an object surface to acquire an image.
    Type: Grant
    Filed: May 5, 2016
    Date of Patent: August 8, 2017
    Assignee: EBARA CORPORATION
    Inventors: Takehide Hayashi, Masahiro Hatakeyama, Shinji Yamaguchi, Masato Naka
  • Patent number: 9728372
    Abstract: A measurement method capable of easily measuring the directions of detector segments of a segmented detector relative to a scanning transmission electron microscope (STEM) image is provided. The measurement method is for use in an electron microscope equipped with the segmented detector having a detection surface divided into the detector segments. The measurement method is used to measure the directions of the detector segments relative to the STEM image. The method involves defocusing the STEM image to thereby cause a deviation of the STEM image and measuring the directions of the detector segments relative to the STEM image from the direction of the deviation of the STEM image (step S11).
    Type: Grant
    Filed: February 25, 2016
    Date of Patent: August 8, 2017
    Assignee: JEOL Ltd.
    Inventor: Yuji Kohno
  • Patent number: 9711323
    Abstract: The method is for automatic astigmatism correction of a lens system. A first image is provided that is not in focus at a first stigmator setting of a set of lenses. A calculating device calculates a corresponding first Fourier spectrum image. A distribution and direction of pixels of the Fourier spectrum image are determined by calculating a first vector and a second vector. The first vector is compared with the second vector. The lens system is changed from a first stigmator setting to a second stigmator setting to provide a second image. A corresponding Fourier spectrum image is calculated. The distribution and direction of pixels of the second Fourier spectrum image is determined by calculating a third vector and a fourth vector. The third vector is compared to the fourth vector. The image that has the lowest vector ratio is selected.
    Type: Grant
    Filed: June 17, 2015
    Date of Patent: July 18, 2017
    Assignee: Intelligent Virus Imaging Inc.
    Inventors: Ida-Maria Sintorn, Rickard Nordstrom Nordstrom, Gustaf Kylberg
  • Patent number: 9704697
    Abstract: Mass spectrometry cells include one or more interleaved magnetostatic and electrostatic lenses. In some examples, the electrostatic lenses are based on electrical potentials applied to magnetostatic lens pole pieces. In other alternatives, the electrostatic lenses can include conductive apertures. Applied voltages can be selected to trap or transport charged particles, and photon sources, gas sources, ion sources, and electron sources can be provided for various dissociation processes.
    Type: Grant
    Filed: February 22, 2016
    Date of Patent: July 11, 2017
    Assignee: Oregon State University
    Inventors: Douglas F. Barofsky, Joseph S. Beckman, Max L. Deinzer, Valery G. Voinov
  • Patent number: 9690213
    Abstract: A linear stacked stage suitable for REBL may include a first upper fast stage configured to translate a first plurality of wafers in a first direction along a first axis, the first upper fast stage configured to secure a first plurality of wafers; a second upper fast stage configured to translate a second plurality of wafers in a second direction along the first axis, the second upper fast stage configured to secure the second plurality of wafers, the second direction opposite to the first direction, wherein the translation of the first upper fast stage and the translation of the second upper fast stage are configured to substantially eliminate inertial reaction forces generated by motion of the first upper fast stage and the second upper fast stage; and a carrier stage configured to translate the first and second upper fast stages along a second axis.
    Type: Grant
    Filed: September 6, 2012
    Date of Patent: June 27, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: Upendra Ummethala, Layton Hale, Joshua Clyne, Samir Nayfeh, Mark Williams, Joseph A. Di Regolo, Andrew Wilson
  • Patent number: 9689807
    Abstract: A substrate detection device and a substrate direction method are disclosed in the embodiments for achieving a wide-range high-compatibility detection of leads in a peripheral circuit region of a liquid crystal display. The detection device comprises a converting unit configured to calculate a gray scale of a gray image of a circuit lead region of a substrate based on the gray image of the circuit lead region of the substrate, and to convert the gray image into an image of leads in the circuit lead region, based on a difference between the calculated gray scales of the leads and of the substrate in the circuit lead region; and a judging unit configured to judge a state of the leads in the circuit lead region based on the image of the leads in the circuit lead region.
    Type: Grant
    Filed: June 26, 2014
    Date of Patent: June 27, 2017
    Assignees: BOE Technology Group Co., Ltd., Beijing BOE Display Technology Co., Ltd.
    Inventors: Chao Ye, Tao Wang, Yuandan Chen, Shengzuo Guan, Guanglong Guo
  • Patent number: 9684106
    Abstract: A volume holographic imaging system, apparatus, and/or method enables the projection of a two-dimensional (2D) slice of a four-dimensional (4D) probing object. A 4D probing source object is illuminated to emit or scatter an optical field. A holographic element having one or more recorded holograms receives and diffracts the optical field into a diffracted plane beam having spectral information. A 4-f telecentric relay system includes a pupil filter on the relayed conjugate plane of the volume hologram and images the pupil of the volume hologram onto the front focal plane of the collector lens. A collector lens focuses the diffracted plane beam to a 2D slice of the 4D probing source object. The focused 2D slice is projected onto a 2D imaging plane. The holographic element may have multiple multiplexed holograms that are arranged to diffract light from the corresponding slice of the 4D probing source object.
    Type: Grant
    Filed: October 8, 2010
    Date of Patent: June 20, 2017
    Assignees: Massachusetts Institute of Technology, The Arizona Board of Regents on Behalf of the University of Arizona
    Inventors: George Barbastathis, Yuan Luo, Raymond K. Kostuk, Jennifer K. Barton
  • Patent number: 9659744
    Abstract: A charged particle beam apparatus makes it possible to acquire information in the cross-sectional direction (depth direction) of a sample having an internal structure in a nondestructive manner with reduced damage. Further, the apparatus makes it possible to analyze the depth and/or dimensions in the depth direction of the internal structure. The charged particle beam apparatus includes: a means for providing a time base for control signals; a means for applying a charged particle beam to a sample in synchronization with the time base and controlling an irradiation position; a means for analyzing the emission characteristics of an emission electron from the sample from a detection signal of the emission electron; and a means for analyzing the electrical characteristics or cross-sectional morphological characteristics of the sample based on the emission characteristics.
    Type: Grant
    Filed: November 20, 2015
    Date of Patent: May 23, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Natsuki Tsuno, Naomasa Suzuki, Hideyuki Kazumi, Shoji Hotta, Yoshinobu Kimura
  • Patent number: 9653258
    Abstract: The Near-field Optical Transmission Electron Emission Microscope involves the combination, in one instrument, of optical imaging in the near-field regime or close to it (in respect to the transmission electromagnetic radiation when the wavelength exceeds the desired lateral resolution) and the secondary electron imaging of EEM microscope (“Cathode lens objective” based Emission Electron Microscopy). These two microscopic techniques are combined by the application of the photon-electron converter, which converts the optical, transmission image of the object (illuminated by the penetrating electromagnetic radiation) to the correlated photoelectron image, by means of a matrix of one-way closed channels (capillaries). The closed, smooth front face of the converter (comprising channel-bottoms) remains in contact with the object of imaging, whereas its opposite, opened face (consisting of an array (matrix) of channel openings) is exposed to vacuum and emits the secondary electrons.
    Type: Grant
    Filed: February 20, 2016
    Date of Patent: May 16, 2017
    Inventor: Krzysztof Grzelakowski
  • Patent number: 9633817
    Abstract: Conventional devices have been difficult to use due to insufficient consideration being given to factors such as the cost necessary for diaphragm replacement and the convenience of the work. In the present invention, a diaphragm mounting member installed in a charged particle beam device for radiating a primary charged particle beam through a diaphragm separating a vacuum space and an atmospheric pressure space onto a sample placed in the atmospheric pressure space is provided with a diaphragm installation portion to which a TEM membrane is mounted and a casing fixing portion mounted on a casing of the charged particle beam device. The diaphragm installation portion has a positioning structure for positioning a platform on which the diaphragm is held.
    Type: Grant
    Filed: March 10, 2014
    Date of Patent: April 25, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Shinsuke Kawanishi, Yusuke Ominami, Hiroyuki Suzuki, Masahiko Ajima
  • Patent number: 9627168
    Abstract: A field emission device is configured with a grid that includes nanotubes or nanowires. In one embodiment a cathode, an anode, and a nanotube or nanowire grid are responsive to inputs to produce a potential barrier between the grid and at least one of the cathode and the anode such that a set of electrons from the cathode can tunnel through the potential barrier to produce a net current at the anode.
    Type: Grant
    Filed: November 12, 2014
    Date of Patent: April 18, 2017
    Assignee: ELWHA LLC
    Inventors: Roderick A. Hyde, Jordin T. Kare, Tony S. Pan, Lowell L. Wood, Jr.
  • Patent number: 9627176
    Abstract: Provided are methods to improve tomography by creating fiducial holes using charged particle beams, and using the fiducial holes to improve the sample positioning, acquisition, alignment, reconstruction, and visualization of tomography data sets. Some versions create fiducial holes with an ion beam during the process of milling the sample. Other versions create in situ fiducial holes within the TEM using the electron beam prior to acquiring a tomography data series. In some versions multiple sets of fiducial holes are made, positioned strategically around a region of interest. The fiducial holes may be employed to properly position the features of interest during the acquisition, and later to help better align the tilt-series, and improve the accuracy and resolution of the final reconstruction. The operator or software may identify the holes to be tracked with tomography feature tracking techniques.
    Type: Grant
    Filed: January 6, 2016
    Date of Patent: April 18, 2017
    Assignee: FEI Company
    Inventors: Cedric Bouchet-Marquis, Liang Zhang, Lee Pullan
  • Patent number: 9620333
    Abstract: A charged particle beam apparatus automatically prepares a sample piece from a sample and includes a charged particle beam irradiation optical system that irradiates a charged particle beam to a sample placed on a movable sample stage. A sample piece transferring unit holds and transfers a sample piece separated and extracted from the sample, and a holder support holds a sample piece holder to which the sample piece is transferred. A computer controls a position of an object based on a template prepared from an image of the object acquired by irradition with the charged particle beam and position information acquired from the image of the object. The sample piece transferring unit includes a needle that transfers the sample piece separated and extrated from the sample, and a needle actuting mechanism that actuates the needle.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: April 11, 2017
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Satoshi Tomimatsu, Makoto Sato, Atsushi Uemoto, Tatsuya Asahata, Yo Yamamoto
  • Patent number: 9607804
    Abstract: Embodiments are further directed to an information processing system for generating a corrected image of a sample. The system includes a detector, a memory communicatively coupled to the detector, and a post-detection image processor communicatively coupled to the memory and the detector. The system is configured to perform a method that includes detecting, by the detector, data of a plurality of moving particles, wherein the data of the plurality of moving particles correspond to an uncorrected image of the sample, and wherein the uncorrected image includes defocus, astigmatism and spherical aberration. The method further includes generating, by the post-detection image processor, a corrected image of the sample based at least in part on processing the detected data of the plurality of moving particles.
    Type: Grant
    Filed: June 22, 2015
    Date of Patent: March 28, 2017
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventor: Rudolf M. Tromp
  • Patent number: 9601302
    Abstract: An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven.
    Type: Grant
    Filed: July 30, 2015
    Date of Patent: March 21, 2017
    Assignee: EBARA CORPORATION
    Inventors: Shoji Yoshikawa, Kiwamu Tsukamoto, Takeshi Murakami, Masahiro Hatakeyama, Tsutomu Karimata
  • Patent number: 9583303
    Abstract: When preparing a Hole-Free Phase Plates (HFPP) a preferably featureless thin film should be placed with high accuracy in the diffraction plane of the TEM, or a plane conjugate to it. Two methods for accurately placing the thin film in said plane are described. One method uses a Ronchigram of the thin film while the TEM is in imaging mode, and the magnification of the Ronchigram is tuned so that the magnification in the middle of the Ronchigram is infinite. The second method uses electrons scattered by the thin film while the TEM is in diffraction mode. When the thin film does not coincide with the diffraction plane, electrons scattered by the thin film seem to originate from another location than the cross-over of the zero beam. This is observed as a halo. The absence of the halo is proof that the thin film coincides with the diffraction plane.
    Type: Grant
    Filed: October 8, 2015
    Date of Patent: February 28, 2017
    Assignee: FEI COMPANY
    Inventors: Bart Buijsse, Gijs van Duinen
  • Patent number: 9576100
    Abstract: According to an embodiment, a pattern data generation method is provided. In the pattern data generation method, when a resist on a substrate is exposed using a mask, an optical image at a designated resist film thickness position is calculated using a mask pattern. Feature quantity related to a shape of a resist pattern at the resist film thickness position is extracted, based on the optical image. Also, whether the resist pattern is failed is determined, based on the feature quantity, and pattern data of a mask pattern determined as failed is corrected.
    Type: Grant
    Filed: December 22, 2014
    Date of Patent: February 21, 2017
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventors: Seiro Miyoshi, Taiki Kimura, Hiromitsu Mashita, Fumiharu Nakajima, Tetsuaki Matsunawa, Toshiya Kotani, Chikaaki Kodama
  • Patent number: 9558909
    Abstract: The present invention discloses a multifunctional ultrafast electron gun of a transmission electron microscopy. The ultrafast electron gun of a transmission electron microscope comprises: a laser source, an electron gun body and a laser introducing module. The electron gun body comprises: an electron gun sleeve comprising a first section sleeve and a second section sleeve; and, a cathode, an acceleration electrode and an anode arranged in up-down order, wherein the cathode and the acceleration electrode are located within the first section sleeve and the anode is located within the second section sleeve.
    Type: Grant
    Filed: May 6, 2014
    Date of Patent: January 31, 2017
    Assignee: INSTITUTE OF PHYSICS, CHINESE ACADEMY OF SCIENCES
    Inventors: Jianqi Li, Huanfang Tian, Gaolong Cao, Chao Ma, Huaixin Yang
  • Patent number: 9548184
    Abstract: A microreactor for use in a microscope, comprising a first and second cove layer (13), which cover layers are both at least partly transparent to an electron beam (14) of an electron microscope, and extend next to each other at a mutual distance from each other and between which a chamber (15) is enclosed, wherein an inlet (4) and an outlet (5) are provided for feeding fluid through the chamber and wherein heating means (8) are provided for heating the chamber and/or elements present therein.
    Type: Grant
    Filed: September 12, 2005
    Date of Patent: January 17, 2017
    Assignees: Technische Universiteit Delft, Stichting voor de Technische Wetenschappen
    Inventors: Jan Fredrik Creemer, Hendrik Willem Zandbergen, Pasqualina Maria Sarro
  • Patent number: 9543115
    Abstract: An electron microscope includes an electron beam source, a first electromagnet, a second electromagnet and a detector. The field generated by the first electromagnet has an effect of three lenses subsequently arranged along the beam path. A first lens of these lenses is arranged upstream of the object plane and focuses the beam at the object plane. The second lens of these three lenses is arranged downstream of the object plane. The third lens of these three lenses generates an image of a diffraction plane of the second lens at the detector. The magnetic field generated by the second electromagnet has an effect of a fourth lens and can be changed in order to change a size of the image of the diffraction plane of the second lens on the detector.
    Type: Grant
    Filed: November 25, 2014
    Date of Patent: January 10, 2017
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Gerd Benner, Marko Matijevic
  • Patent number: 9536174
    Abstract: In one embodiment, a fault-aware matched filter augments the output of a component matched filter to provide both fault-aware matched filter output and a measure of confidence in the accuracy of the fault-aware matched filter output. In another embodiment, an optical flow engine derives, from a plurality of images, both optical flow output and a measure of confidence in the optical flow output. The measure of confidence may be derived using a fault-aware matched filter.
    Type: Grant
    Filed: March 6, 2015
    Date of Patent: January 3, 2017
    Assignee: Prioria Robotics, Inc.
    Inventor: Walter Lee Hunt, Jr.
  • Patent number: 9508526
    Abstract: A top opening-closing mechanism for opening and closing a top of a container including a container body and the top includes a rolling element rotatably provided at the top and positioned on the outside of the container body in a planar view, a rail, a jack for lifting the rail, and a top resting table disposed adjacent to the container and mounting the top thereon. When the top is opened, the jack lifts the rail, the rail lifts the rolling element from below, and thereby the top is lifted up from the container body. Then, the rolling element rolls on the rail and the top resting table to move the top from above the container body to the top resting table.
    Type: Grant
    Filed: December 12, 2014
    Date of Patent: November 29, 2016
    Assignee: EBARA CORPORATION
    Inventor: Matsutaro Miyamoto
  • Patent number: 9502212
    Abstract: An object of the present invention is to provide a method and an apparatus capable of measuring a potential of a sample surface by using a charged particle beam, or of detecting a compensation value of a variation in an apparatus condition which changes due to sample charging, by measuring a sample potential caused by irradiation with the charged particle beam. In order to achieve the object, a method and an apparatus are provided in which charged particle beams (2(a), 2(b)) emitted from a sample (23) are deflected by a charged particle deflector (33) in a state in which the sample (23) is irradiated with a charged particle beam (1), and information regarding a sample potential is detected by using a signal obtained at that time.
    Type: Grant
    Filed: January 22, 2014
    Date of Patent: November 22, 2016
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yuzuru Mizuhara, Miki Isawa, Minoru Yamazaki, Hitoshi Tamura, Hideyuki Kazumi
  • Patent number: 9496119
    Abstract: The present invention discloses an e-beam inspection tool, and an apparatus for detecting defects. In one aspect is described an apparatus for detecting defects that includes a dual-deflection system that moves the e-beam over the integrated circuit to each of the plurality of predetermined locations, the dual deflection system including a magnetic deflection component that provides by magnetic deflection for movement of the e-beam through a plurality of areas on the integrated circuit and an electrostatic deflection component that provides by electrostatic deflection for movement of the e-beam within each of the plurality of areas.
    Type: Grant
    Filed: January 6, 2016
    Date of Patent: November 15, 2016
    Assignee: PDF Solutions, Inc.
    Inventors: Indranil De, Marian Mankos, Christopher Hess, Dennis J. Ciplickas
  • Patent number: 9490182
    Abstract: Methods and systems for evaluating the performance of multiple patterning processes are presented. Patterned structures are measured and one or more parameter values characterizing geometric errors induced by the multiple patterning process are determined. In some examples, a single patterned target and a multiple patterned target are measured, the collected data fit to a combined measurement model, and the value of a structural parameter indicative of a geometric error induced by the multiple patterning process is determined based on the fit. In some other examples, light having a diffraction order different from zero is collected and analyzed to determine the value of a structural parameter that is indicative of a geometric error induced by a multiple patterning process. In some embodiments, a single diffraction order different from zero is collected. In some examples, a metrology target is designed to enhance light diffracted at an order different from zero.
    Type: Grant
    Filed: December 17, 2014
    Date of Patent: November 8, 2016
    Assignee: KLA-Tencor Corporation
    Inventors: Andrei V. Shchegrov, Shankar Krishnan, Kevin Peterlinz, Thaddeus Gerard Dziura, Noam Sapiens, Stilian Ivanov Pandev
  • Patent number: 9478389
    Abstract: The present invention provides a composite charged particle beam device which is provided with two or more charged particle beam columns and enables high-resolution observation while a sample is placed at the position of a cross point. The present invention has the following configuration. A composite charged particle beam device is provided with a plurality of charged particle beam columns (101a, 102a), and is characterized in that a sample (103) is disposed at the position of an intersection point (171) where the optical axes of the plurality of columns intersect, a component (408a, 408b) that forms the tip of an objective lens of the charged particle beam column (102a) is detachable, and by replacing the component (408a, 408b), the distance between the intersection point (171) and the tip of the charge particle beam column can be changed.
    Type: Grant
    Filed: July 1, 2013
    Date of Patent: October 25, 2016
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tsunenori Nomaguchi, Toshihide Agemura
  • Patent number: 9455119
    Abstract: A charged particle beam apparatus is provided with a controller configured to control other components and perform operations including: an irradiating operation to irradiate a first position of a sample with a charged particle beam while gradually changing a scan range of the charged particle beam to move from a first position; a first image acquiring operation to acquire an image of each portion where the charged particle beam moves; an indicator forming operation to form an indicator at a second position by the charged particle beam when the scan range of the charged particle beam reaches the second position; a second image acquiring operation to acquire an image of the second position in a state where the indicator is formed; and an adjusting operation to adjust relative position between the stage and the scan range of the charged particle beam.
    Type: Grant
    Filed: March 23, 2015
    Date of Patent: September 27, 2016
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Makoto Sato, Tatsuya Asahata, Masahiro Kiyohara, Ikuko Nakatani
  • Patent number: 9443694
    Abstract: For a novice user to easily recognize a difference between imaging results caused by a difference between observation conditions, a computer has an operation screen display observation target setting buttons for changing an observation condition for a specimen including a combination of parameter setting values of a charged particle beam apparatus. The processing unit has the operation screen display a radar chart including a characteristic, indicated by three or more incompatible items, of an observation condition for each of the observation target setting buttons. The radar chart indicates at least items of high resolution, emphasis on surface structure and emphasis on material difference.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: September 13, 2016
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yayoi Konishi, Mitsugu Sato, Masaki Takano, Shotaro Tamayama, Masako Nishimura, Shunya Watanabe, Mami Konomi
  • Patent number: 9431211
    Abstract: A hybrid electron microscope includes: an electron source to emit an electron beam; a parabolic mirror including: a reflective surface; and an aperture to communicate the electron beam through the parabolic mirror; and a sample holder interposed between the electron source and the parabolic mirror such that the reflective surface of the parabolic mirror faces the electron source and the sample holder.
    Type: Grant
    Filed: August 17, 2015
    Date of Patent: August 30, 2016
    Assignees: THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY OF COMMERCE, UNIVERSITY OF MARYLAND, COLLEGE PARK
    Inventors: Renu Sharma, Stefano Mazzucco
  • Patent number: 9412558
    Abstract: A method for performing high resolution electron microscopy of a soft matter object is described. The method comprises irradiating a soft matter object using an electron microscope having a spherical aberration correction with a substantially constant transfer function in a frequency band of thermal diffuse scattered electrons scattered at the soft matter object. The method comprises detecting the thermal diffuse scattered (TDS) electrons scattered at the soft matter, and using the detected thermal diffuse scattered electrons for deriving therefrom an image of the soft matter object.
    Type: Grant
    Filed: February 14, 2014
    Date of Patent: August 9, 2016
    Assignees: UNIVERSITEIT ANTWERPEN, FEI COMPANY
    Inventors: Dirk Van Dyck, Uwe Lucken, Holger Stark, Sara Bals
  • Patent number: 9406479
    Abstract: One embodiment pertains to an apparatus for compressing an electron pulse. An electron source is illuminated by a pulsed laser and generates a pulse of electrons. The pulse enters a beam separator which deflects the electrons by 90 degrees into an electron mirror. The faster, higher energy electrons form the leading edge of the pulse and penetrate more deeply into the retarding field of the electron mirror than the lower energy electrons. After reflection, the lower energy electrons exit the electron mirror before the higher energy electrons and form the leading edge of the pulse. The reflected pulse reenters the separator and is deflected by 90 degrees towards the specimen. The fast, higher energy electrons catch up with the slow, low energy electrons as the electrons strike the specimen. The electrons are scattered by the specimen and used to form a two-dimensional image or diffraction pattern of the specimen.
    Type: Grant
    Filed: June 25, 2015
    Date of Patent: August 2, 2016
    Assignee: Electron Optica, Inc.
    Inventor: Marian Mankos
  • Patent number: 9401297
    Abstract: Proposed are an electrostatic chuck mechanism and a charged particle beam apparatus including a first plane that is a plane of a side in which a sample is adsorbed, a first electrode to which a voltage for generating an adsorptive power between the first plane and the sample is applied, and a second electrode that is arranged in a position relatively separated from the sample toward the first plane and through which a virtual line that is perpendicular to the first plane and contacts an edge of the sample passes, wherein the first plane is formed so that a size in a plane direction of the first plane is smaller than that of the sample.
    Type: Grant
    Filed: February 19, 2015
    Date of Patent: July 26, 2016
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yasushi Ebizuka, Seiichiro Kanno, Masaya Yasukochi, Masakazu Takahashi, Naoya Ishigaki, Go Miya
  • Patent number: 9402294
    Abstract: A luminaire may include a wall mount and a driver circuit housing connected to the wall mount. The luminaire may also include a camera housing connected to the driver circuit housing, a light source housing connected to the camera housing, and a light source array that includes a plurality of light sources carried by the light source housing. The luminaire may include a prism, a heat sink in thermal communication with the light source array, and a camera carried by the camera housing. The luminaire may also include a sensor and a driver circuit carried by the driver circuit housing. The camera and/or the sensor may be configured to detect the presence and vicinity of an object in the target area. The light sources may be configured to emit light to illuminate the vicinity of the object sensed in the target area.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: July 26, 2016
    Assignee: Lighting Science Group Corporation
    Inventors: Eric Holland, Julia Sharon Irvin, Eric Thosteson, Benjamin Charles Burns, John Beck
  • Patent number: 9383325
    Abstract: A method for determining geometric relationships of crystal reciprocal vectors on the two-dimensional planes obtained from an EBSD pattern includes steps of: geometrically correcting Kikuchi bands for obtaining the reciprocal vectors corresponding to the Kikuchi bands; selecting a set of reciprocal vectors which define a parallelogram with minimum area on the reciprocal plane as a two-dimensional basis for forming a grid, marking the basis; determining integer coordinates of other reciprocal vectors on the reciprocal plane relative to the basis, obtaining the deviations of the integer coordinates from the nearest grid nodes, marking the reciprocal vector with minimum deviation; fitting the length and the angel of the basis, redefining a new two-dimensional grid by the fitting result; repeating till all reciprocal vectors on the reciprocal plane are marked, wherein integer coordinates of the reciprocal vectors relative to the last two-dimensional basis now disclose the geometric relationships.
    Type: Grant
    Filed: January 12, 2016
    Date of Patent: July 5, 2016
    Assignee: East China Jiaotong University
    Inventors: Lili Li, Ming Han, Guangyao Xiong, Honglin Luo, Yizao Wan
  • Patent number: 9372154
    Abstract: This invention involves measurement of optical properties of materials with sub-micron spatial resolution through infrared scattering scanning near field optical microscopy (s-SNOM). Specifically, the current invention provides substantial improvements over the prior art by achieving high signal to noise, high measurement speed and high accuracy of optical amplitude and phase. Additionally, it some embodiments, it eliminates the need for an in situ reference to calculate wavelength dependent spectra of optical phase, or absorption spectra. These goals are achieved via improved asymmetric interferometry where the near-field scattered light is interfered with a reference beam in an interferometer. The invention achieves dramatic improvements in background rejection by arranging a reference beam that is much more intense than the background scattered radiation.
    Type: Grant
    Filed: July 2, 2014
    Date of Patent: June 21, 2016
    Assignee: Anasys Instruments
    Inventor: Craig Prater
  • Patent number: 9368322
    Abstract: An inspection apparatus includes beam generation means, a primary optical system, a secondary optical system and an image processing system. Irradiation energy of the beam is set in an energy region where mirror electrons are emitted from the inspection object as the secondary charged particles due to the beam irradiation. The secondary optical system includes a camera for detecting the secondary charged particles, a numerical aperture whose position is adjustable along an optical axis direction and a lens that forms an image of the secondary charged particles that have passed through the numerical aperture on an image surface of the camera. In the image processing system, the image is formed under an aperture imaging condition where the position of the numerical aperture is located on an object surface to acquire an image.
    Type: Grant
    Filed: April 2, 2015
    Date of Patent: June 14, 2016
    Assignee: EBARA CORPORATION
    Inventors: Takehide Hayashi, Masahiro Hatakeyama, Shinji Yamaguchi, Masato Naka
  • Patent number: 9362083
    Abstract: There is provided a charged particle beam apparatus having the function of permitting observation of a sample in a gas atmosphere or in a liquid state, the apparatus being intended to let a dry sample be observed as it is getting saturated with an introduced liquid and to prevent a charged particle beam from getting scattered by an unwanted liquid introduced between a diaphragm and the sample. This invention provides a structure including an inlet-outlet part (300) that brings in and out a desired liquid or gas in the direction of the underside or the side of the sample (6), the structure being arranged so that the sample (6) is irradiated with a primary charged particle beam while the sample (6) and the diaphragm (10) are kept out of contact with each other.
    Type: Grant
    Filed: July 8, 2013
    Date of Patent: June 7, 2016
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yusuke Ominami, Shinsuke Kawanishi, Hiroyuki Suzuki, Kohtaro Hosoya, Masanari Furiki
  • Patent number: 9349571
    Abstract: A particle optical system comprises a beam generating system (3) configured to generate a plurality of particle beams (5) and to direct the plurality of particle beams (5) onto an object plane (7), a first deflector arrangement (35) arranged in the beam path of the particle beams (5) upstream of the object plane (7) and configured to deflect the plurality of particle beams (5) before they are incident on the object plane (7), an object holder (15) configured to hold an object (17) to be inspected in the object plane (7), a plurality of detectors (27) configured to receive and to detect the plurality of particle beams (5) having traversed the object plane (7), wherein the detectors are arranged in a detection plane (21) on a side of the object plane (7) opposite to the beam generating system (3), at least one first particle optical lens (19) configured to collect particles of the particle beams emanating from the object plane on the detectors (27), and a controller (31) configured to control the first deflecto
    Type: Grant
    Filed: September 9, 2014
    Date of Patent: May 24, 2016
    Assignee: CARL ZEISS MICROSCOPY GMBH
    Inventors: Thomas Kemen, Pascal Anger, Dirk Zeidler, Gerd Benner
  • Patent number: 9336982
    Abstract: An electron-detector comprises a scintillator plate 207, electron optics 204 for directing a plurality of electron beams 9 onto the scintillator plate so that the electron beams are incident onto the scintillator plate at locations of incidence disposed at a distance from each other, a light detector 237 comprising a plurality of light receiving areas 235 disposed at a distance from each other, and light optics for generating a first light-optical image of at least a portion of the scintillator plate at a region 243 where the light receiving areas of the light detector are disposed so that, by the imaging, each of the locations of incidence is associated with a light receiving area; and wherein the electron optics comprise an electron beam deflector 255 for displacing the locations of incidence of the electron beams on the scintillator plate in a direction orthogonal to a normal 249 of a surface 208 of the scintillator plate.
    Type: Grant
    Filed: September 26, 2014
    Date of Patent: May 10, 2016
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Dirk Zeidler, Jörg Jacobi
  • Patent number: 9287083
    Abstract: Provided is a charged particle beam device that is capable of suppressing an field-of-view deviation occurring when observing a tilted image or a left-right parallax-angle image acquired by irradiating a tilted beam on a sample while continuously compensating a focus. By means of an aligner for compensating field-of-view (54) installed between an objective lens (7) that focuses a primary charged particle beam on a surface of the sample (10), and a deflector for controlling tilt angle (53) that tilts the primary charged particle beam, the field-of-view deviation occurring during tilting of the primary charged particle beam is suppressed based on an amount of compensation required by a tilt angle of the deflector for controlling tilt angle (53), lens conditions, and a distance between the objective lens (7) and the sample (10), in conjunction with a focus compensation of the objective lens (7).
    Type: Grant
    Filed: December 16, 2011
    Date of Patent: March 15, 2016
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Shinichi Tomita, Wataru Kotake, Sukehiro Ito
  • Patent number: 9287087
    Abstract: In a sample observation method, a sample stage is placed at a first tilt angle with respect to a charged particle beam, and an observation surface of a sample is irradiated with the charged particle beam to acquire a first charged particle image. The sample stage is then tilted to a second tilt angle different from the first tilt angle about a first sample stage axis, and the observation surface is again irradiated with the charged particle beam to acquire a second charged particle image. The sample stage is tilted to a tilt angle at which an area of the observation surface in the acquired charged particle image is the larger of the first charged particle image and the second charged particle image. The observation surface is then irradiated with the charged particle beam to observe the observation surface.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: March 15, 2016
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Xin Man, Atsushi Uemoto
  • Patent number: 9273951
    Abstract: One or more methods and apparatuses for determining a characteristic, such as volume, of an excavated void of a construction material are provided. The one or more methods may include excavating a void defined in a construction material, interacting with the void using a material interacting device for determining at least one measurement thereof, manipulating the at least one measurement to determine a characteristic of the void such as the volume thereof, obtaining at least one measurement of the material, and determining a characteristic of the void based on the measurements obtained. The apparatus may include at least one material interacting device configured to interact with a surface of a construction material and a surface of a void defined therein for determining at least one respective measurement thereof and manipulate a plurality of the at least one measurement so as determine a characteristic of the void.
    Type: Grant
    Filed: June 6, 2012
    Date of Patent: March 1, 2016
    Assignee: Troxler Electronic Laboratories, Inc.
    Inventor: Robert Ernest Troxler
  • Patent number: 9274070
    Abstract: A process for measuring strain is provided that includes placing a sample of a material into a TEM as a sample. The TEM is energized to create a small electron beam with an incident angle to the sample. Electrical signals are generated that control multiple beam deflection coils and image deflection coils of the TEM. The beam deflection control signals cause the angle of the incident beam to change in a cyclic time-dependent manner. A first diffraction pattern from the sample material that shows dynamical diffraction effects is observed and then one or more of the beam deflection coil control signals are adjusted to reduce the dynamical diffraction effects. One or more of the image deflection coil control signals are then adjusted to remove any motion of the diffraction pattern.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: March 1, 2016
    Assignee: APPFIVE, LLC
    Inventors: Jon Karl Weiss, Amith D. Darbal, Raman D. Narayan, Steven T. Kim, Stavros Nicolopoulos