With Sample Vaporizing Means Patents (Class 250/425)
  • Patent number: 4703180
    Abstract: A microwave discharge type ion source incorporating a plurality of vaporizing furnaces for vaporizing and ionizing solid or liquid specimens and suited for use in an ion implantation apparatus. The plurality of vaporizing furnaces are charged with a number of same type specimens or different types of specimens for allowing ionization of a same or different specimens in a continuous manner without interruption for supplementation or exchange of the specimens, the furnaces being then vacuumized. A corresponding number of feeding passages are provided for introducing exchangeably and selectively the vapors produced in the furnaces to the ionization chamber. Exchange of the vapors introduced to the ionization chamber is realized by correspondingly changing over electric heaters provided in association with the vaporizing furnaces, respectively.
    Type: Grant
    Filed: October 28, 1985
    Date of Patent: October 27, 1987
    Assignee: Hitachi, Ltd.
    Inventor: Shunroku Taya
  • Patent number: 4670685
    Abstract: A liquid metal ion source and alloy for the simultaneous ion evaporation of arsenic and boron, arsenic and phosphorus, or arsenic, boron and phosphorus. The ionic species to be evaporated are contained in palladium-arsenic-boron and palladium-arsenic-boron-phosphorus alloys. The ion source, including an emitter means such as a needle emitter and a source means such as U-shaped heater element, is preferably constructed of rhenium and tungsten, both of which are readily fabricated. The ion sources emit continuous beams of ions having sufficiently high currents of the desired species to be useful in ion implantation of semiconductor wafers for preparing integrated circuit devices. The sources are stable in operation, experience little corrosion during operation, and have long operating lifetimes.
    Type: Grant
    Filed: April 14, 1986
    Date of Patent: June 2, 1987
    Assignee: Hughes Aircraft Company
    Inventors: William M. Clark, Jr., Mark W. Utlaut, Joseph A. Wysocki, Edmund K. Storms, Eugene G. Szklarz, Robert G. Behrens, Lynwood W. Swanson, Anthony E. Bell
  • Patent number: 4664769
    Abstract: Plasma enhancement is achieved in a plasma glow system by increasing the number of photoelectric electrons in the plasma glow by producing photoelectrons from the surface of a target in the system by the use of a radiation source. This is more particularly accomplished by flooding the surface of the target with a UV laser beam during the plasma process where emitted photoelectrons are injected into the plasma to increase the plasma density.The plasma enhancement is used in a sputter etching/deposition system which includes a chamber containing a cathode, a target, a substrate platform containing substrate and a pump. An ultraviolet light source such as a UV laser and focussing optics for focussing the UV radiation onto the target through a UV transmission window are also provided. A plasma region in the chamber is enhanced by photons from the laser striking the target and producing photoelectrons which are injected into the plasma to increase its density.
    Type: Grant
    Filed: October 28, 1985
    Date of Patent: May 12, 1987
    Assignee: International Business Machines Corporation
    Inventors: Jerome J. Cuomo, Charles R. Guarnieri
  • Patent number: 4639301
    Abstract: An apparatus is described which makes possible the precise sputter etching and imaging of insulating and other targets, using a finely focused beam of ions produced from a liquid metal ion source. This apparatus produces and controls a submicron beam of ions to precisely sputter etch the target. A beam of electrons directed on the target neutralizes the charge created by the incident ion beam. Imaging of the target surface and ultra-precise control of the etching process is achieved by monitoring the particles that are sputtered from the target surface.
    Type: Grant
    Filed: April 24, 1985
    Date of Patent: January 27, 1987
    Assignee: Micrion Limited Partnership
    Inventors: John A. Doherty, Billy W. Ward, David C. Shaver
  • Patent number: 4582997
    Abstract: The invention relates to a device for regulating an ionic current, particularly a highly charged metal ion current, obtained by vaporizing and then ionizing a solid material in an ultra-high frequency cavity with the aid of a hot electron plasma confined in said cavity. This plasma is produced by ionizing a gas as a result of the combined action of a high frequency electromagnetic field and a magnetic field, whose amplitude is such that the electron cyclotron resonance is satisfied. The device inter alia comprises a pulse generator, whereof the useful cycle is regulated in order to pulse the electromagnetic field and control its mean power, a valve for modifying the gas flow entering the cavity and means for controlling said valve in such a way that the pressure prevailing in the cavity remains constant.
    Type: Grant
    Filed: October 10, 1984
    Date of Patent: April 15, 1986
    Assignee: Commissariat a l'Energie Atomique
    Inventor: Bernard Jacquot
  • Patent number: 4496843
    Abstract: The invention provides a method for producing metal ions, having the steps of: producing a gas containing a metal element by evaporation of a liquid organic metal compound; introducing the gas containing the metal element and an auxiliary gas for cleaning into the ionization chamber; and producing the metal ions by ionizing the metal element by a discharge. According to this method, the metal ions are produced easily and quickly with good controllability.
    Type: Grant
    Filed: May 27, 1982
    Date of Patent: January 29, 1985
    Assignee: Tokyo Shibaura Denki Kabushiki Kaisha
    Inventors: Kei Kirita, Katuo Koike
  • Patent number: 4453078
    Abstract: A reservoir, extracting electrode and circular tungsten filament are maintained at high positive D.C. potential relative to a grounded electrode. Thermal electrons emanated from the filament irradiates and heats the bottom of the reservoir. As a result, powdered CsI held in the reservoir is melted and then forms a liquid CsI cone-shaped portion below the capillary formed at the reservoir bottom. Vaporized CsI molecules are created by further heating the cone-shaped portion, and are ionized by electron beam irradiation, so that a Cs.sup.+ ion beam is obtained.
    Type: Grant
    Filed: June 7, 1982
    Date of Patent: June 5, 1984
    Assignee: JEOL Ltd.
    Inventor: Ryuichi Shimizu
  • Patent number: 4267457
    Abstract: Quantitative determinations by means of mass spectrometry of substances which have hitherto been very difficult to perform are made possible by the employment of the sample holding element of the present invention composed of a porous and gas-permeable aggregate of a skeletal ingredient having refractory and electrical-insulating properties, with a remarkable improvement in sensitivity and accuracy. Determination of mixture samples for their respective components is also effected without any preceding separating step.
    Type: Grant
    Filed: October 12, 1978
    Date of Patent: May 12, 1981
    Assignee: Shionogi & Co., Ltd.
    Inventors: Yuzo Nakagawa, Kouji Iwatani, Tetsuro Kadono
  • Patent number: 4251725
    Abstract: Pyrolyzing apparatus for a mass spectrometer includes a sample holder in the form of a small glass rod having in the end thereof a cylindrical depression of a predetermined small volume. The indentation is to be filled with the predetermined quantity of the substance to be analyzed. The rod is inserted into a supporting structure with the sample holding depression immediately adjacent the ionizing chamber of a quadrupole mass spectrometer. Surrounding the end of the glass rod holding the sample is a heater element which is energized in accordance with a predetermined program to rapidly raise the temperature of the sample to a predetermined initial level, then to increase the temperature of the sample in accordance with an exponential curve to a maximum of a predetermined temperature level. The shape of the sample holder is such that, under the influence of the heat, substantially all of the pyrolyzed molecules will be directed into the ionization chamber where the molecules will be ionized.
    Type: Grant
    Filed: August 6, 1979
    Date of Patent: February 17, 1981
    Assignee: Honeywell Inc.
    Inventor: William M. Adkisson
  • Patent number: 4243887
    Abstract: A method and apparatus for analyzing a sample comprising the steps of irradiating a selected area of the sample with a first burst of laser energy to vaporize the sample, condensing the vaporized sample on the surface of an intermediate carrier and analyzing the condensed sample material deposited on the intermediate carrier.
    Type: Grant
    Filed: May 1, 1979
    Date of Patent: January 6, 1981
    Assignee: Leybold-Heraeus GmbH
    Inventors: Franz Hillenkamp, Raimund Kaufmann, Eberhard Unsold, Rainer Nietsche, Reiner Wechsung, Henning Vogt, Walter Bank, Lothar Aberle
  • Patent number: 4230946
    Abstract: A cryogenic collimator apparatus and method for collimating pyrolysis fragments produced by a pyrolysis unit. The apparatus includes a cryogenic plate having an aperture therein, the plate being adapted to be interposed between the pyrolysis unit and an ionization center so that the aperture is in a direct line between the pyrolysis unit and the ionization center. The method includes using the cryogenic plate for trapping pyrolysis fragments not passing through the aperture directly from the pyrolysis unit.
    Type: Grant
    Filed: March 19, 1979
    Date of Patent: October 28, 1980
    Assignee: University of Utah
    Inventors: Gregory J. Wells, Kent J. Voorhees
  • Patent number: 4209693
    Abstract: A method and apparatus for monitoring particulates which are borne by a surrounding gaseous medium, such as found in smokestack or the like, through interception of the particulates by a hot filament having a bias potential in the range of about 100 to 1000 volts whereupon each particulate decomposes into a burst of ions which is collected by a nearby electrode at ground potential, by counting those bursts which produce a predetermined total charge and, at the same time, measuring the DC electric current produced by the bursts and other ion exchange between the hot filament and the electrode. The filament operates at a temperature level wherein infrared and visible radiations are emitted, such radiations being monitored by a phototransistor which receives the radiations.
    Type: Grant
    Filed: August 2, 1978
    Date of Patent: June 24, 1980
    Assignee: Extranuclear Laboratories, Inc.
    Inventors: Wade L. Fite, Richard L. Myers
  • Patent number: 4155008
    Abstract: A long life, high emission electron source for a plasma environment. The plasma environment is made up of corrosive particles having a lower work function than the exposed material of the electron source. The electron source is operated at an elevated temperature not only to provide free electrons but also to establish and maintain a thin partial monolayer coating of the source's emissive surface with plasma particles in an equilibrium between condensation and evaporation. The equilibrium coating increases the emissivity of the surface without permitting substantial corrosion of the surface or structure from the particles of the plasma environment. The cooler regions of the electron source are shielded from the plasma particles to prevent a build-up of corrosive particles.
    Type: Grant
    Filed: February 4, 1977
    Date of Patent: May 15, 1979
    Assignee: Jersey Nuclear-Avco Isotopes, Inc.
    Inventors: George S. Janes, Robert E. Schlier
  • Patent number: 4143272
    Abstract: A power supply for the cathode of an electron beam gun disposed in a vacuum chamber comprises a transformer for frequencies above about 20 kHz and having a primary winding and a secondary winding connected to the cathode. The transformer is mounted so as to integrate same into the vacuum chamber to dispose the primary winding in communication with the atmosphere and the secondary winding in communication with the vacuum chamber. A partition is disposed between the primary winding and the secondary winding to seal the primary winding from the vacuum and the seondary winding from the atmosphere. A control circuit receptive of a direct current supply has the output thereof connected to the primary winding of the transformer and has pulse width controlled transistors for the chopping of the direct current at a frequency above about 20 kHz.
    Type: Grant
    Filed: December 6, 1977
    Date of Patent: March 6, 1979
    Assignee: Leybold-Heraeus GmbH & Co. KG
    Inventor: Fritz Frank
  • Patent number: 4093858
    Abstract: Longitudinally extending, foraminous cartridge means having a cylindrical side wall forming one flat, circular, tip end surface and an opposite end; an open-ended cavity, and uniformly spaced orifices for venting the cavity through the side wall in the annulus of a plasma ring for uniformly ejecting cesium for coating the flat, circular, surface. To this end, the cavity is filled with a cesium containing substance and attached to a heater in a hollow-discharge duoplasmatron. By coating the flat circular surface with a uniform monolayer of cesium and locating it in an electrical potential well at the end of a hollow-discharge, ion duoplasmatron source of an annular hydrogen plasma ring, the negative hydrogen production from the duoplasmatron is increased. The negative hydrogen is produced on the flat surface of the cartridge and extracted by the electrical potential well along a trajectory coaxial with the axis of the plasma ring.
    Type: Grant
    Filed: June 6, 1977
    Date of Patent: June 6, 1978
    Assignee: The United States of America as represented by the United States Department of Energy
    Inventors: Maasaki Kobayashi, Krsto Prelec, Theodorus J Sluyters
  • Patent number: 4060708
    Abstract: A device is disclosed for producing an electrical arc which is stabilized by a stream of metastable argon, or some other stabilizing gas. The arc may be employed to vaporize a sample material so as to produce light for spectroscopic analysis. The vaporization is rapid so that the constituents of the sample material can be determined very quickly and accurately. The arc is highly stable so that it operates without sputtering, dancing or showing other signs of instability. Thus, the results obtained with the arc are highly accurate and repeatable. The arc is produced between a cathode in one end of an arc chamber and an anode outside the opposite end of the chamber. The arc passes out of the chamber through an orifice in a gas shaping nozzle. Argon gas is supplied to the chamber through a plurality of gas inlets, which preferably are directed at angles having peripheral components so that a whirling motion is imparted to the gas as it enters the chamber.
    Type: Grant
    Filed: September 17, 1975
    Date of Patent: November 29, 1977
    Assignee: Wisconsin Alumni Research Foundation
    Inventor: John P. Walters
  • Patent number: 3973121
    Abstract: A hot surface detector for heavy ions following their separation on the basis of charge-to-mass ratio. Upon striking the hot surface, the heavy ions decompose and give up their lighter constituent and/or impurity atoms and molecules to the surface. Those constituent and/or impurity atoms and molecules with ionization potentials or electron affinities comparable to the work function of the hot surface become surface ionized and are emitted from the surface as a burst of either positive or negative ions which are then detected by conventional means, including detection at an electrode, by an electron multiplier or by a mass spectrometric detector for light ions. Where negative ions are to be detected, a magnetic field is applied to prevent electrons from the hot surface from reaching the detector.
    Type: Grant
    Filed: April 29, 1974
    Date of Patent: August 3, 1976
    Inventors: Wade L. Fite, Richard L. Myers