With Air Lock Or Evacuation Means Patents (Class 250/441.11)
  • Patent number: 10879036
    Abstract: Disclosed is a charged particle beam system, which includes: a particle source, a column and a specimen chamber with a first movable vacuum window. The particle source is configured to generate a charged particle beam which impinges the specimen to be detected placed in a specimen chamber. The column includes a deflection device for deflecting the charged particle beam and a focusing device for focusing the charged particle beam. The charged particle beam system is compatible with multiple external optical systems to achieve simultaneous detection or fast-switching detection of the specimen. An opto-electro simultaneous detection system and the method are also disclosed.
    Type: Grant
    Filed: May 10, 2017
    Date of Patent: December 29, 2020
    Assignee: FOCUS-EBEAM TECHNOLOGY (BEIJING) CO., LTD.
    Inventors: Wei He, Shuai Li, Peng Wang
  • Patent number: 10826078
    Abstract: A bipolar plate for fuel cells includes a flow plate having a first surface for the introduction of hydrogen fuel gas and water vapor and a second surface for the introduction of an oxygen containing gas, wherein at least a portion of the first and/or second surface comprises a nanostructured carbon material (NCM) coating deposited thereon, said coating having a thickness of 1 nm to 5 ?m.
    Type: Grant
    Filed: May 3, 2018
    Date of Patent: November 3, 2020
    Inventor: Ramesh Sivarajan
  • Patent number: 10629412
    Abstract: An apparatus for processing a specimen with two or more particle beams, wherein the specimen has a milled side that is processed by a first particle beam and observed by a second particle beam. The specimen is milled during a first milling operation by the first particle beam with the specimen in a first position. Thereafter, the specimen tilts in a second position around an axis of tilt of the specimen. Thereafter, the specimen is milled during a second milling operation. Milling can be performed during continuous tilting of the specimen around the axis of tilt. The axis of tilt of the specimen intersects the milled side. In all the aforementioned positions of the specimen, the second particle beam impinges on the milled side, which enables monitoring of the milling in real time.
    Type: Grant
    Filed: September 9, 2017
    Date of Patent: April 21, 2020
    Assignee: Tescan Orsay Holding, A.S.
    Inventors: Filip Lopour, Tomas Hrncir
  • Patent number: 10614995
    Abstract: In an atom probe having a vacuum chamber containing a specimen mount and a detector for receiving ions emitted from the specimen, a high vacuum subchamber is provided about the specimen mount, with an aperture in the subchamber allowing passage of emitted ions to the detector. The high vacuum subchamber may be pumped to higher vacuum (lower pressure) than the vacuum chamber, and so long as the pressure in the vacuum chamber is below about 10?1 Pa, very little gas diffusion takes place through the aperture, allowing higher vacuum to be maintained in the subchamber despite the aperture opening to the chamber. The higher vacuum in the subchamber about the specimen assists in reducing noise in atom probe image data. The aperture may conveniently be provided by the aperture in a counter electrode, such as a local electrode, as commonly used in atom probes.
    Type: Grant
    Filed: June 27, 2017
    Date of Patent: April 7, 2020
    Assignee: Cameca Instruments, Inc.
    Inventors: Thomas F. Kelly, Mark Ronald Levesque
  • Patent number: 10423079
    Abstract: The present disclosure provides a bearing device. The bearing device includes a bearing platform, a lifting passage extending through the bearing platform, a lifting structure in the lifting passage and a light reflection compensating block between the lifting structure and an inner wall of the lifting passage. A difference between a reflectivity ratio of a top surface of the light reflection compensating block and a reflectivity ratio of a bearing surface of the bearing platform is less than or equal to a threshold value. A difference between the reflectivity ratio of the top surface of the light reflection compensating block and a reflectivity ratio of a top surface of the lifting structure is less than or equal to the threshold value. The present disclosure further provides an exposure apparatus including the bearing device.
    Type: Grant
    Filed: December 1, 2017
    Date of Patent: September 24, 2019
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., CHONGQING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Qichao Chen, Tzuching Chou, Qianhao Han
  • Patent number: 10395884
    Abstract: A photocathode structure, which can include an alkali halide, has a protective film on an exterior surface of the photocathode structure. The protective film includes ruthenium. This protective film can be, for example, ruthenium or an alloy of ruthenium and platinum. The protective film can have a thickness from 1 nm to 20 nm. The photocathode structure can be used in an electron beam tool like a scanning electron microscope.
    Type: Grant
    Filed: October 3, 2018
    Date of Patent: August 27, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Gildardo R. Delgado, Rudy F. Garcia, Katerina Ioakeimidi, Frances Hill, Michael E. Romero
  • Patent number: 10062553
    Abstract: A sputtering apparatus includes a space defining member defining a sputtering space for forming a film on a substrate. The space defining member includes a concave portion, and an opening portion is provided in the bottom portion of the concave portion. The sputtering apparatus includes a shield member configured to shield the opening portion from the sputtering space. The opening portion is formed so that a pressure gauge capable of measuring the pressure in the sputtering space can be attached, and the shield member is arranged so that at least a part of the shield member is buried in the concave portion.
    Type: Grant
    Filed: January 31, 2017
    Date of Patent: August 28, 2018
    Assignee: Canon Anelva Corporation
    Inventors: Taichi Hiromi, Hidetoshi Shimokawa, Atsuyuki Ichikawa
  • Patent number: 9885639
    Abstract: A sample carrying device includes a sample carrying rod that carries a sample in the left-right direction in a sample compartment and a preparatory sample compartment, a support body that supports the sample carrying rod, a case that supports the support body such that the support body can rotate around a rotational axis perpendicular to the left-right direction, and an Q-ring disposed between the support body and the case for sealing the sample compartment and the preparatory sample compartment. The sample carrying rod can be switched between a use state where it can carry a sample and a stowed state where it has been moved in the up-down direction from the use state by rotation of the support body. The sample carrying device can easily stow a sample carrying rod in a small space.
    Type: Grant
    Filed: January 25, 2016
    Date of Patent: February 6, 2018
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Masakatsu Hasuda, Toshiyuki Iwahori
  • Patent number: 9684249
    Abstract: A lithographic apparatus comprises a substrate table for accommodating a substrate; a projection system for imaging a pattern onto the substrate, and a metrology system for measuring a position of the substrate table with respect to the projection system. The metrology system comprises a metrology frame connected to the projection system, a grid positioned stationary with respect to the metrology frame, and an encoder connected to the substrate table and facing the grid for measuring the position of the substrate table relative to the grid. The metrology frame has a surface oriented towards the substrate table, and the surface has been configured, e.g., by writing or etching, so as to form the grid.
    Type: Grant
    Filed: January 25, 2013
    Date of Patent: June 20, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Theodorus Petrus Maria Cadee
  • Patent number: 9618859
    Abstract: A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.
    Type: Grant
    Filed: January 25, 2013
    Date of Patent: April 11, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Jan Bernard Plechelmus Van Schoot, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee
  • Patent number: 9496162
    Abstract: A method for supplying inert gas to a side track buffer (STB) in a semiconductor wafer production system includes a step of sensing that a front opening unified POD (FOUP) is loading on the STB and generating a first input signal, and a step of opening a valve for inert gas and supplying nitrogen gas to the FOUP based on the first input signal, and to a semiconductor wafer production system using the method.
    Type: Grant
    Filed: October 7, 2013
    Date of Patent: November 15, 2016
    Assignee: Daifuku Co. Ltd.
    Inventors: Dong Gyu Yoo, Jae Hyun Lee, Jun Han Lee, Ui Han Jeong
  • Patent number: 9373480
    Abstract: In a SEM device which enables observations under an atmospheric pressure, in the event that a diaphragm is damaged during an observation of a sample, air flows into a charged particle optical barrel from the vicinity of the sample, due to the differential pressure between the inside of the charged particle optical barrel under vacuum and the vicinity of the sample under the atmospheric pressure. At this time, the sample may be sucked into the charged particle optical barrel. In this case, a charged particle optical system and a detector are contaminated thereby, which causes performance degradation or failures of the charged particle microscope. For coping therewith, it is necessary to prevent the charged particle optical barrel from being contaminated, without inducing a time lag, with a simple structure.
    Type: Grant
    Filed: March 5, 2014
    Date of Patent: June 21, 2016
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Shinsuke Kawanishi, Yusuke Ominami, Masahiko Ajima, Hiroyuki Suzuki
  • Patent number: 9245710
    Abstract: A charged particle beam device that appropriately maintains a throughput of the device for each of specimens different in a gas emission volume from each other is provided. A scanning electron microscope includes an electron source, a specimen stage, a specimen chamber, and an exchange chamber, and further includes a vacuum gauge that measures an internal pressure of the exchange chamber, a time counting unit that counts time taken when a measurement result by the vacuum gauge has reached a predetermined degree of vacuum, and an integral control unit that performs comparative calculation and determination based on a measurement result by the time counting unit and integral control based on a process flow. And, the integral control unit controls changing of a content of a subsequent process based on a shift of the degree of vacuum of the exchange chamber.
    Type: Grant
    Filed: February 20, 2013
    Date of Patent: January 26, 2016
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Kazuhiro Gunji, Yasushi Ebizuka, Yuta Asaga
  • Patent number: 9240305
    Abstract: All of the conventional charged particle beam devices are designed only for the observation at atmospheric pressure or in gas atmosphere at a pressure substantially equal to the atmospheric pressure, and there is no device enabling easy observation using a typical high-vacuum charged particle microscope at atmospheric pressure or in gas atmosphere at a pressure substantially equal to the atmospheric pressure. Such a conventional technique has another problem that the distance between the diaphragm and a sample cannot be controlled, and so it has a high risk of breakage of the diaphragm.
    Type: Grant
    Filed: July 3, 2013
    Date of Patent: January 19, 2016
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yusuke Ominami, Hiroyuki Suzuki, Shinsuke Kawanishi, Masahiko Ajima
  • Patent number: 9204865
    Abstract: A device for receiving liquid samples includes at least one sample carrier (1) for receiving the liquid sample, a sample carrier ejector (3) and a sample carrier holder (2) with a first guiding area and a second guiding area (4, 5) for guiding the sample carrier ejector (3). The first guiding area (4) has a tubular design and the second guiding area (5) has a groove-shaped design. The sample carrier ejector (3) has a geometry complementary to the first and second guiding areas (4, 5) and is axially displaceable within the sample carrier holder (2) such that the sample carrier (1) can be detached by the sample carrier ejector (3) from the sample carrier holder (2).
    Type: Grant
    Filed: January 16, 2008
    Date of Patent: December 8, 2015
    Assignee: Dräger Safety AG & Co. KGaA
    Inventors: Rainer Polzius, Thomas Wuske, Gero Vornbäumen
  • Patent number: 9140462
    Abstract: A charged particle emission and air-blowing device includes a communication port biased toward an end portion in a predetermined direction with respect to an air outlet, and a width expander configured to widen a flow path between an air directing plate of the end portion and a second blowing duct wider than a periphery. Emitted light from a light guide plate is reflected by the air directing plate in the delivery direction of an air flow. An air flow passes from a downward direction to an upward direction along a circuit board in an auxiliary suction path, and an opening portion faces the upper portion of the circuit board.
    Type: Grant
    Filed: May 23, 2013
    Date of Patent: September 22, 2015
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Takahiro Hanai, Kenichi Shiraishi, Nobuhiro Iwaki
  • Publication number: 20150144786
    Abstract: A method and system for performing gas cluster ion beam (GCIB) etch processing of various materials is described. In particular, the GCIB etch processing includes using one or more molecular beams to optimize pressure at localized regions of the ion beam.
    Type: Application
    Filed: November 21, 2014
    Publication date: May 28, 2015
    Inventor: Matthew C. Gwinn
  • Publication number: 20150137000
    Abstract: A charged particle beam instrument is offered which can introduce cooled samples easily into a sample chamber. The charged particle beam instrument (100) of the present invention has: a sample container (10) that accommodates samples (S) and a refrigerant (6) for cooling the samples (S); an evacuated sample chamber (20); a sample exchange chamber (30) connected with the sample chamber (20); a partition valve (40) disposed between the sample exchange chamber (30) and the sample container (10); and vacuum pumping equipment (50) for evacuating the sample container (10). The sample container (10) can be connected with the sample exchange chamber (30) via the partition valve (40). The sample container (10) is evacuated by the vacuum pumping equipment (50) while the partition valve (40) is closed.
    Type: Application
    Filed: October 22, 2014
    Publication date: May 21, 2015
    Inventor: Tatsuo Naruse
  • Publication number: 20150137001
    Abstract: A charged particle beam instrument is offered which can easily perform an in situ observation in a gaseous atmosphere. The charged particle beam instrument (100) is used to perform an observation of a specimen (S) placed in a gaseous atmosphere and has a specimen chamber (2), a gas supply portion (6) for supplying a gas into the specimen chamber (2), a venting portion (7) for venting the specimen chamber (2), a gaseous environment adjuster (4), and a gas controller (812) for controlling the gaseous environment adjuster (4). This adjuster (4) has a gas inflow rate adjusting valve (40) for adjusting the flow rate of the gas supplied into the specimen chamber (2) and a first vacuum gauge (CG1) for measuring the pressure of the gas supplied into the specimen chamber (2).
    Type: Application
    Filed: October 29, 2014
    Publication date: May 21, 2015
    Inventors: Yasushi Hiroki, Mitsuaki Ohsaki
  • Patent number: 8987683
    Abstract: A charged particle beam drawing apparatus according to one embodiment of the present invention comprises a load lock chamber provided for introducing a target object from the outside and capable of switching an atmosphere state and a vacuum state, a transfer chamber arranged so as to be able to communicate with the load lock chamber and transferring the target object, a soaking chamber arranged so as to be able to communicate with the transfer chamber and having a temperature adjustment container for housing the target object therein and controlling a temperature of the target object with radiation and a temperature adjustment part for controlling a temperature of the temperature adjustment container, and a drawing chamber arranged so as to be able to communicate with the transfer chamber and drawing on the target object at a constant temperature.
    Type: Grant
    Filed: April 22, 2014
    Date of Patent: March 24, 2015
    Assignee: NuFlare Technology, Inc.
    Inventors: Michihiro Kawaguchi, Kiminobu Akeno, Yoshinori Kagawa, Yu Asami, Keisuke Yamaguchi
  • Patent number: 8952330
    Abstract: System and method for EMI shielding for a CD-SEM are described. One embodiment is a scanning electron microscope (“SEM”) comprising an electron gun for producing an electron beam directed toward a sample; a secondary electron (“SE”) detector for detecting secondary electrons reflected from the sample in response to the electron beam; and a dual-layer shield disposed around and enclosing the SE detector. The shield comprises a magnetic shielding lamina layer and a metallic foil layer.
    Type: Grant
    Filed: January 17, 2014
    Date of Patent: February 10, 2015
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Chi Tsao, Syun-Jie Jhan, Yi-Cheng Shih, Chwen Yu
  • Patent number: 8921786
    Abstract: Provided is a charged particle beam apparatus or charged particle microscope capable of observing an observation target sample in an air atmosphere or a gas environment without making significant changes to the configuration of a conventional high vacuum charged particle microscope. In a charged particle beam apparatus configured such that a thin film (10) is used to separate a vacuum environment and an air atmosphere (or a gas environment), an attachment (121) capable of holding the thin film (10) and whose interior can be maintained at an air atmosphere or a gas environment is inserted into a vacuum chamber (7) of a high vacuum charged particle microscope. The attachment (121) is vacuum-sealed and fixed to a vacuum partition of the vacuum sample chamber. Image quality is further improved by replacing the atmosphere in the attachment with helium or a light-elemental gas that has a lower mass than atmospheric gases such as nitrogen or water vapor.
    Type: Grant
    Filed: February 27, 2014
    Date of Patent: December 30, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yusuke Ominami, Sukehiro Ito, Tomohisa Ohtaki
  • Patent number: 8912506
    Abstract: Disclosed is a device for sustaining different vacuum degrees for an electron column, including an electron emitter, a lens part, and a housing for securing them, to maintain the electron column and a sample under different vacuum degrees. The device comprises a column housing coupling part coupled to the housing to isolate a vacuum; a hollow part defined through the center portion of the device to allow an electron beam emitted from the electron column to pass therethrough; and a vacuum isolation part having a structure of a gasket for vacuum coupling, wherein a difference of no less than 10 torr in a vacuum degree is maintained between both sides of the device by selecting an appropriate diameter of a lens electrode layer which is finally positioned in a path along which the electron beam is emitted or by using the hollow part.
    Type: Grant
    Filed: February 2, 2007
    Date of Patent: December 16, 2014
    Assignee: CEBT Co., Ltd.
    Inventor: Ho Seob Kim
  • Patent number: 8884222
    Abstract: A mount for a scanning probe sensor package (27) comprises a support structure (1, 5) defining a plane within the mount and at least one movable snap joint element (9) designed for interacting with a respective counterpart (43) in a scanning probe sensor package (27). The snap joint element (9) is movable to a first position in which it exerts a force on a mounted scanning probe sensor package (27) so as to force said scanning probe sensor package (27) in a normal direction of said plane towards the support structure (1,5) and to a second position in which it allows a scanning probe sensor package (27) to be mounted to or dismounted from the support structure (1, 5) along normal direction of said plane.
    Type: Grant
    Filed: October 5, 2010
    Date of Patent: November 11, 2014
    Assignee: SPECS Surface Nano Analysis GmbH
    Inventor: Joerg Rychen
  • Patent number: 8878144
    Abstract: The electron beam apparatus sample holding means has a diaphragm which is placed on upper and lower sides of a sample to form a cell for separating a gas atmosphere and a vacuum atmosphere of a sample chamber and sealing an ambient atmosphere of the sample; a gas supply means for supplying gas to an inside of the cell; and exhaust means for exhausting gas. The exhaust means includes a gas exhaust pipe provided in the inside of the cell and an openable/closable exhaust hole provided in a sidewall of the sample holding means so as to pass through the cell. The diaphragm is an amorphous film made of light elements which can transmit an electron beam, such as carbon films, oxide films, and nitride films.
    Type: Grant
    Filed: December 1, 2010
    Date of Patent: November 4, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Toshie Yaguchi, Yasuhira Nagakubo, Akira Watabe
  • Patent number: 8872128
    Abstract: A novel specimen holder for specimen support specimen support devices for insertion in electron microscopes is provided. The novel specimen holder of the invention provides mechanical support for specimen support devices and as well as electrical contacts to the specimens or specimen support devices.
    Type: Grant
    Filed: June 18, 2013
    Date of Patent: October 28, 2014
    Assignee: Protochips, Inc.
    Inventors: John Damiano, Jr., Stephen E. Mick, David P. Nackashi, Montie Roland, Paul Hakenewerth
  • Patent number: 8859992
    Abstract: In a charged particle beam device, such as an electron microscope, a beam generating apparatus generates a focussed charged particle beam e? that is incident on a specimen in a specimen chamber which holds the specimen in a gaseous environment. A pressure limiting aperture provides partial gaseous isolation of the specimen chamber from the beam generating means, and is located in a lens of the latter. The device includes a conduit, such as an intermediate chamber in the lens, through which, in use, gas is supplied to set up a flow of gas from the region of the lens towards the specimen, thereby to prevent material released from the specimen from impinging on the pressure limiting aperture, to prevent contamination of the latter. The device can be used in a method of scanning a specimen with a charged particle beam, for example in a method of electron microscopy.
    Type: Grant
    Filed: October 14, 2011
    Date of Patent: October 14, 2014
    Assignee: Carl Zeiss NTS Limited
    Inventor: Stewart John Bean
  • Patent number: 8835872
    Abstract: A sample stage device (10) is so configured as to calculate ideal position information xtg(i), tg(i) per predetermined period that is unaffected by drive conditions relating to gaps (25, 26), etc., and to determine, per predetermined cycle and in real time, deviations dx(i), dy(i) between real-time measured positions x(i), y(i) by position detectors comprising laser interferometers (33, 34), etc., and ideal position information xtg(i), tg(i). In addition, it calculates, based on deviations dx(i), dy(i) thus determined, such speed command values vx(i), vy(i) for motors (27, 28) that measured values x(i), y(i) would follow ideal position information xtg(i), tg(i), and performs stable and high-speed positioning control for a sample table (11) through feedback control that controls speed in real time.
    Type: Grant
    Filed: June 23, 2011
    Date of Patent: September 16, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventor: Takashi Kobayashi
  • Patent number: 8829470
    Abstract: The invention relates to a charged-particle apparatus having a charged particle source with an optical axis; a magnetic immersion lens comprising a first lens pole and a configurable magnetic circuit; and a first sample stage movable with respect to the optical axis. The apparatus has a first configuration to position the sample, mounted on the first stage, with respect to the optical axis and a second configuration, having a second lens pole mounted on the first stage and intersecting the optical axis, equipped with a second sample stage to position the sample between the two lens poles and is movable with respect to the optical axis, causing the optical properties of the magnetic immersion lens to differ in the two configurations, and can, in the second configuration, be changed by positioning the second lens pole using the first stage, thus changing the magnetic circuit.
    Type: Grant
    Filed: October 22, 2013
    Date of Patent: September 9, 2014
    Assignee: FEI Company
    Inventors: Lubomir T{dot over (u)}ma, Josef {hacek over (S)}esták
  • Patent number: 8829425
    Abstract: A portable or handheld mass spectrometer making use of a cryogenic pumping, ion pumping or getter pumping system. The portable mass spectrometer contains a cryopump, ion pump, or getter pump, and operates in conjunction with a fixed docking station. The docking station contains a backing pump to bring the mass spectrometer manifold down to operating pressure prior to being placed into portable operation using the cryopump, ion pump, or getter pump. The individual pumps may be operated either separately or simultaneously. This configuration permits the portable mass spectrometer module to be small, lightweight and rugged, and yet be easily and quickly recharged and regenerated for use in either a field or laboratory environment.
    Type: Grant
    Filed: March 28, 2014
    Date of Patent: September 9, 2014
    Assignee: BaySpec, Inc.
    Inventors: William (Wei) Yang, Charlie Zhang, Ming Chai, Yongqiang Qiu, Doneil Hoekman
  • Patent number: 8829469
    Abstract: A novel sample holder for specimen support devices for insertion in electron microscopes. The novel sample holder of the invention allows for the introduction of gases or liquids to specimens for in situ imaging, as well as electrical contacts for electrochemical or thermal experiments.
    Type: Grant
    Filed: August 2, 2011
    Date of Patent: September 9, 2014
    Assignee: PROTOCHIPS, Inc.
    Inventors: John Damiano, Jr., David P. Nackashi, Stephen E. Mick
  • Patent number: 8822952
    Abstract: Charged particle beam apparatus arrangements in which either a first noise absorber which provides noise absorbing performance specialized for a first frequency range including the natural frequency of the charged particle beam apparatus as reference, or a second noise absorber which provides noise absorbing performance specialized for a second frequency range including the frequency of acoustic standing waves generated within the cover as reference, or both of the first and second noise absorbers is/are disposed within a cover of the charged particle beam apparatus.
    Type: Grant
    Filed: October 14, 2011
    Date of Patent: September 2, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Daisuke Muto, Masanori Watanabe, Masaru Matsushima, Shuichi Nakagawa, Masahiro Akatsu, Yusuke Tanba, Satoshi Okada
  • Patent number: 8822951
    Abstract: The present invention relates to a carrier device for transporting one or more manipulators into a vacuum specimen chamber of an electron microscope, characterized in that the carrier device comprises: (i) a platform having securing means for detachably securing the one or more manipulators to the platform, and (ii) electrical connectors secured to the platform for the electrical connection of the one or more manipulators. The present invention also relates to a method for transporting the carrier device into the vacuum specimen chamber of the electron microscope without altering the vacuum of the vacuum specimen chamber comprising transporting the carrier device of the invention through the specimen exchange chamber of the electron microscope and into the vacuum specimen chamber.
    Type: Grant
    Filed: April 7, 2010
    Date of Patent: September 2, 2014
    Inventors: Yu Sun, Changai Ru, Yong Zhang
  • Patent number: 8779358
    Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.
    Type: Grant
    Filed: April 18, 2012
    Date of Patent: July 15, 2014
    Inventor: Dov Shachal
  • Patent number: 8759765
    Abstract: A method for processing a sample in a charged-particle beam microscope. A sample is collected from a substrate and the sample is attached to the tip of a nanomanipulator. The sample is optionally oriented to optimize further processing. The nanomanipulator tip is brought into contact with a stabilizing support to minimize drift or vibration of the sample. The attached sample is then stabilized and available for preparation and analysis.
    Type: Grant
    Filed: August 6, 2012
    Date of Patent: June 24, 2014
    Assignee: Omniprobe, Inc.
    Inventors: Cheryl D. Hartfield, Thomas M. Moore, Brian P. Miller
  • Patent number: 8735814
    Abstract: The electron beam device includes a source of electrons and an objective deflector. The electron beam device obtains an image on the basis of signals of secondary electrons, etc. which are emitted from a material by an electron beam being projected. The electron beam device further includes a bias chromatic aberration correction element, further including an electromagnetic deflector which is positioned closer to the source of the electrons than the objective deflector, and an electrostatic deflector which has a narrower interior diameter than the electromagnetic deflector, is positioned within the electromagnetic deflector such that the height-wise position from the material overlaps with the electromagnetic deflector, and is capable of applying an offset voltage. It is thus possible to provide an electron beam device with which it is possible to alleviate geometric aberration (parasitic aberration) caused by deflection and implement deflection over a wide field of view with high resolution.
    Type: Grant
    Filed: October 5, 2011
    Date of Patent: May 27, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yasunari Sohda, Takeyoshi Ohashi, Tasuku Yano, Muneyuki Fukuda, Noritsugu Takahashi
  • Patent number: 8729497
    Abstract: Provided is a sample device for a charged particle beam, which facilitates the delivery of a sample between an FIB and an SEM in an isolated atmosphere. An atmosphere isolation unit 10 for putting a lid 9 on an atmosphere isolation sample holder 7 isolated from the air and taking the lid 9 off the sample holder, is provided in a sample exchanger 5 that communicates with a sample chamber 4 of the FIB 1 or the SEM through a gate; and the lid 9 is taken off only by pushing a sample exchange bar 11, and thereby only the sample holder 7 is set in the sample chamber 4.
    Type: Grant
    Filed: October 5, 2011
    Date of Patent: May 20, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yasuhira Nagakubo, Toshiaki Tanigaki, Hideki Hirota, Katsuji Ito, Takayuki Asakawa
  • Patent number: 8716683
    Abstract: An ion beam processing system (100) processes the sample (S) mounted on a sample stage (30) by irradiating the sample with an ion beam in a sample chamber (2). The system has a sample container (20) including a cover portion (26) formed to be detachably mountable to a base portion (24), the sample stage (30) on which the container (20) is detachably mountable, and cover mounting/dismounting apparatus (40) for mounting and dismounting the cover portion (26) from outside the sample chamber (2).
    Type: Grant
    Filed: November 19, 2012
    Date of Patent: May 6, 2014
    Assignee: JEOL Ltd.
    Inventor: Tsutomu Negishi
  • Patent number: 8710439
    Abstract: Provided is a charged particle beam apparatus or charged particle microscope capable of observing an observation target sample in an air atmosphere or a gas environment without making significant changes to the configuration of a conventional high vacuum charged particle microscope. In a charged particle beam apparatus configured such that a thin film (10) is used to separate a vacuum environment and an air atmosphere (or a gas environment), an attachment (121) capable of holding the thin film (10) and whose interior can be maintained at an air atmosphere or a gas environment is inserted into a vacuum chamber (7) of a high vacuum charged particle microscope. The attachment (121) is vacuum-sealed and fixed to a vacuum partition of the vacuum sample chamber. Image quality is further improved by replacing the atmosphere in the attachment with helium or a light-elemental gas that has a lower mass than atmospheric gases such as nitrogen or water vapor.
    Type: Grant
    Filed: March 2, 2012
    Date of Patent: April 29, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yusuke Ominami, Sukehiro Ito, Tomohisa Ohtaki
  • Patent number: 8674324
    Abstract: A charged particle beam apparatus includes: a sample chamber; a sample stage; an electron beam irradiation system for irradiating the sample with an electron beam; a focused ion beam irradiation system for irradiating the sample with a focused ion beam; a sample stage drive unit having a rotational axis orthogonal to at least one of an irradiation axis of the electron beam irradiation system and an irradiation axis of the focused ion beam irradiation system; and a sample transporting mechanism for transporting the sample to the sample stage. The sample transporting mechanism includes a transportation path provided in the sample stage drive unit in a direction parallel to the rotational axis of the sample stage drive unit, and is configured to transport the sample to the sample stage through the transportation path.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: March 18, 2014
    Assignee: Hitachi High-Tech Science Corporation
    Inventor: Masakatsu Hasuda
  • Patent number: 8653477
    Abstract: A lithography apparatus includes a stage on which a target object is placed; a chamber in which the stage is arranged and which has one side surface in which an opening having a size which is enough to carry the stage in or out is formed, the opening being closed with an independent lid; an electro-optic lens barrel arranged on the chamber; and a rib portion formed to have a shape that is convex on an upper portion of the side surface of the chamber in which the opening is formed.
    Type: Grant
    Filed: February 16, 2010
    Date of Patent: February 18, 2014
    Assignee: NuFlare Technology, Inc.
    Inventor: Hiroyasu Saito
  • Patent number: 8637836
    Abstract: An elongated member is formed which has a frontal and a distal end, and a length axis. The frontal end satisfies vacuum sealing and maneuverability specifications of a sample holder for a particle beam microscope. The elongated member includes a tubular section defining an axial cavity along the length axis, and having an orifice toward the distal end of the elongated member. The resulting device is characterized as being a sample holder for use in particle beam microscopes. The sample holder enables the examination of high aspect ratio samples by accommodating them in its axial cavity. The examination can take place without prior modification of the high aspect ratio samples.
    Type: Grant
    Filed: October 23, 2012
    Date of Patent: January 28, 2014
    Assignee: International Business Machines Corporation
    Inventors: John A. Ott, Mark C. Reuter
  • Publication number: 20140021346
    Abstract: A method of examining a sample comprises mounting the sample on a sample holder; directing a beam of radiation onto a location on the sample, thereby causing a flux of stimulated photonic radiation to emanate from said location; examining said flux using a multi-channel photon-counting detector, thus accruing a measured spectrum for said location; automatically repeating said directing and examining steps for a series of successive locations, the method of which comprises choosing a beam parameter of the input beam that will influence a magnitude of said flux of stimulated photonic radiation; for each location within a first set of locations on the sample, accruing a spectrum using a first value of said beam parameter; for each location within a second set of locations on the sample, accruing a spectrum using a second value of said beam parameter.
    Type: Application
    Filed: July 19, 2013
    Publication date: January 23, 2014
    Applicant: FEI Company
    Inventor: Sander Richard Marie Stoks
  • Patent number: 8633439
    Abstract: System and method for EMI shielding for a CD-SEM are described. One embodiment is a scanning electron microscope (“SEM”) comprising an electron gun for producing an electron beam directed toward a sample; a secondary electron (“SE”) detector for detecting secondary electrons reflected from the sample in response to the electron beam; and a dual-layer shield disposed around and enclosing the SE detector. The shield comprises a magnetic shielding lamina layer and a metallic foil layer.
    Type: Grant
    Filed: July 1, 2011
    Date of Patent: January 21, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Chi Tsao, Syun-Jie Jhan, Yi-Cheng Shih, Chwen Yu
  • Publication number: 20140014835
    Abstract: The present invention makes it possible, even when using an ordinary electron beam device (not an environment-controlled electron beam device), to create locally a low vacuum condition in the vicinity of a sample and cool said sample by means of a sample holder alone, without modifying the device or adding equipment such as a gas cylinder. The sample to be observed is placed in a sample holder provided with: a vessel that can contain a substance to serve as a gas source; and a through-hole in the bottom of a sample mount on said vessel. Via the through-hole, gas evaporating or volatilizing from the vessel is supplied to the sample under observation, thereby creating a localized low-vacuum state at or in the vicinity of the sample. Also, the heat of vaporization required for volatilization can be used to cool the sample.
    Type: Application
    Filed: October 28, 2011
    Publication date: January 16, 2014
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Kotaro Hosoya, Masaomi Ohno, Haruhiko Hatano
  • Patent number: 8629410
    Abstract: Disclosed is a high resolution and high throughput charged particle radiation device that attenuates the natural vibration of an ion pump in a short time, excited by a reaction force at the time of driving the stage, and prevents occurrence of a loop of force and a loop of current. The charged particle radiation device includes a sample chamber (4) for disposing a sample (3) therein, a charged particle radiation optical lens tube (1) for irradiating the sample (3) with charged particle radiation (10), ion pumps (2a, 2b) for evacuating the charged particle radiation optical lens tube (1), a frame (16) fixedly attached to the sample chamber (4), the frame (16) facing one end of each of the ion pumps (2a, 2b), and vibration absorbers provided between the frame (16) and the one end of each of the ion pumps (2a, 2b), each of the vibration absorbers including a layered structure which includes a viscoelastic sheet (20a, 20b) sandwiched between metal plates (18a, 18b, 21a, 21b).
    Type: Grant
    Filed: June 3, 2010
    Date of Patent: January 14, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroshi Tsuji, Kouji Ishiguro, Ichiro Tachibana, Naomasa Suzuki, Katsunori Onuki
  • Patent number: 8610061
    Abstract: A seal member to be contacted with an observation object is provided at an open end of a lens barrel so that the observation object can be attracted to the lens barrel via the seal member and fixed in direct and close contact with the lens barrel when a vacuum is created in the lens barrel by a vacuum pump. In other words, instead of providing a sample chamber, the observation object is fixed in close contact with the lens barrel to prevent relative movement therebetween by a suction force even without a sample chamber. In this configuration, the interior of the lens barrel can be maintained in a vacuum state despite the absence of a sample chamber and no adverse effect occurs during observation because the lens barrel and the observation object are not moved relative to each other by vibration.
    Type: Grant
    Filed: December 7, 2011
    Date of Patent: December 17, 2013
    Assignee: Honda Motor Co., Ltd.
    Inventor: Kenji Matsumoto
  • Patent number: 8604429
    Abstract: An object of the invention is to provide an electron beam device and a sample holding device for the electron beam device that can observe the reaction between a sample and a gas at high resolution while a gas atmosphere is maintained even by using thin diaphragms. To solve one of the problems described above, in an electron beam device having the function of separately exhausting an electron beam irradiation portion of an optical column, a sample chamber and an observation chamber, a gas supply means for supplying a gas to a sample and an exhaust means for exhausting a gas are provided to sample holding means, diaphragms are disposed above and below the sample to separate the gas atmosphere and vacuum of the sample chamber and to constitute a cell sealing the atmosphere around the sample, and a mechanism for spraying a gas is provided to the outside of the diaphragms. The gas sprayed outside the diaphragms has low electron beam scattering performance such as hydrogen, oxygen or nitrogen.
    Type: Grant
    Filed: January 20, 2010
    Date of Patent: December 10, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Toshie Yaguchi, Yasuhira Nagakubo, Takeo Kamino, Akira Watabe
  • Patent number: 8604445
    Abstract: Method and system are offered which evacuate a sample holder such that a sample can be inserted into the electron optical column of a microscope while certainly preventing exposure to the atmosphere. The system has pumping control means for controlling a vacuum pumping sequence. The inside of a microscope goniometer is evacuated to a given low vacuum state while the pressure inside a hermetic sample chamber is kept constant by the pumping control means. Then, the partition valve of the sample chamber is opened by the pumping control means and the sample chamber is brought to the low vacuum state. Then, the goniometer and sample chamber are brought to a high vacuum state by the pumping control means. Then, the sample is brought into the front end of the goniometer, and the sample holder is inserted into the electron optical column.
    Type: Grant
    Filed: December 28, 2011
    Date of Patent: December 10, 2013
    Assignee: JEOL Ltd.
    Inventor: Kazuya Yamazaki
  • Patent number: 8592786
    Abstract: An ion implanter includes a platen having a clamping surface configured to support a wafer for treatment with ions, the platen also having at least one pair of electrodes under the clamping surface, a clamping power supply configured to provide an AC signal to the at least one pair of electrodes and a sensed signal representative of the AC signal, and a controller. The controller is configured to receive the sensed signal from the clamping power supply when no wafer is clamped to the clamping surface. The controller is further configured to monitor the sensed signal and determine if the sensed signal is representative of deposits on the clamping surface exceeding a predetermined deposit threshold.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: November 26, 2013
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: David E. Suuronen, Julian G. Blake, Kurt Decker-Lucke, James Carroll, Klaus Petry