Abstract: The operation control data about the component device constituting the synchrotron 13 are structured to include an initial acceleration control data item, a plural extraction control data items, a plural energy change control data items that connect the plural extraction control data items. The plural extraction control data items include extraction condition setting data items and extraction condition cancellation data items corresponding to the plural extraction control data items. As a result, a particle beam irradiation system capable of controlling changes in beam energy, updating operation cycle, and extracting beam in a short time can be provided.

Abstract: An example particle therapy system includes a particle accelerator to output a particle beam, where the particle accelerator includes: a particle source to provide pulses of ionized plasma to a cavity, where each pulse of the particle source has a pulse width corresponding to a duration of operation of the particle source to produce the corresponding pulse, and where the particle beam is based on the pulses of ionized plasma; and a modulator wheel having different thicknesses, where each thickness extends across a different circumferential length of the modulator wheel, and where the modulator wheel is arranged to receive a precursor to the particle beam and is configured to create a spread-out Bragg peak for the particle beam.

Abstract: An electron beam irradiation device which can irradiate an electron beam uniformly to an entire outer surface of an object of irradiation by using a small-sized low-energy electron accelerator with a narrow irradiation window is provided. The device has electron beam irradiation means forming an electron beam irradiation zone and gripping/moving means gripping a part of an object of irradiation and causing the object of irradiation to pass through the electron beam irradiation zone, and the whole surface of the object of irradiation can uniformly pass through the electron beam irradiation zone by combining re-gripping of the object of irradiation by two gripping mechanisms provided on the gripping/moving means, rotation of the object of irradiation by two rotation mechanisms, and movement of the object of irradiation by two moving mechanisms.

Abstract: An improved method of preparing ultra-thin TEM samples that combines backside thinning with an additional cleaning step to remove surface defects on the FIB-facing substrate surface. This additional step results in the creation of a cleaned, uniform “hardmask” that controls the ultimate results of the sample thinning, and allows for reliable and robust preparation of samples having thicknesses down to the 10 nm range.

Abstract: A Helical Resonator Ion Accelerator in which ions are injected into a hollow dielectric pipe forming a vacuum chamber along which the ions are accelerated. The pipe is wrapped with a coil and positioned inside a metal pipe. The dielectric pipe, the coil and the metal pipe are arranged coaxially on an axis along which ions are accelerated. The metal pipe is positioned within a high intensity 0.5-3.0 Tesla solenoid. A pulse generator is coupled to the coil to generate a voltage wave pulse. The pulse travels down the axis of the accelerator on the helix formed by the coil. An ion source injects deuteron ions along the axis of the vacuum chamber. A traveling voltage wave is accelerated by tapering the characteristic velocity of the accelerator in the direction of wave propagation by tapering the coil and the outer metal pipe together in a constant ratio.

Abstract: A method of irradiating a target in a patient comprising directing a beam of radiation from an external source of radiation 24 at the target in the patient from numerous directions in a broad solid angle by longitudinally rotating the external source of radiation 24 around a central axis and simultaneously or sequentially, in either order, latitudinally rotating the external source of radiation 24; a globe gantry 21 comprising (i) a front opening ring 22 with its origin on the central axis of the globe gantry 21, (ii) at least one arc-shaped, gantry support arm 23, which has a front end and a rear end and is part of a circle, (iii) an external source of radiation 24, which is mounted on at least one arc-shaped, gantry support arm 23, (iv) a rear rotational axle 25 with an axis along the central axis of the globe gantry 21, (v) a support base 27, and (vi) a rear housing 26 comprising a source of power, mechanisms for moving components of the globe gantry 21, and controllers for controlling the movement of the

Abstract: A method of sterilizing containers, wherein the containers are conveyed along a pre-set conveying path by a conveying device, and wherein an irradiation device is introduced by a relative movement between the container and the irradiation device in a longitudinal direction of the container into the interior of the container to be sterilized and emits a charge carrier irradiation to sterilize the inner wall of the container by the charge carrier irradiation, wherein an aperture region situated on the outside of the container is also sterilized.

Abstract: A charged particle beam treatment apparatus includes: an accelerator configured to emit a charged particle beam by accelerating charged particles; an irradiation portion configured to irradiate an irradiation object with the charged particle beam through a scanning method; a transport line configured to transport the charged particle beam emitted from the accelerator to the irradiation portion; an energy adjusting portion configured to adjust energy of the charged particle beam; an electromagnet which is provided in the irradiation portion or the transport line; an electromagnet power source which is connected to the electromagnet; and a control portion. Semiconductors are connected between the electromagnet power source and the electromagnet in series. When switching a layer of the irradiation object to be irradiated with the charged particle beam, the control portion reduces the energy of the charged particle beam by controlling the energy adjusting portion and increases a resistance of the semiconductors.

Abstract: An electron therapy unit for delivering therapeutic electrons to a patient during an operation that is made up of a movable and stowable beam head that may be connected permanently or temporarily to either a base cabinet or a fixed structure using one or more optionally pivotable arms is provided. In an exemplary embodiment, the inventive electron therapy unit is a mobile unit suitable for in-hospital use or for shared use between hospitals or clinics. The unit is self-contained, small, light and easy to use. It has a very reliable, compact design, allowing for easy stowing to a small rugged configuration for transport. In another exemplary embodiment, the inventive electron therapy unit is a stationary unit. An ion chamber for use with such an optionally transportable electron therapy unit is also provided. The ion chamber employs two or more collector plates and associated bias plates, each having a centrally located hole that extends through the plate.

Abstract: A method for producing an irradiation plan for a target volume includes preparing a modulation curve that characterizes modulation of particle numbers at target points in the target volume that lie one behind another in a direction of the beam. The method also includes determining a current position of the target volume and defining a plurality of target points that fully cover the target volume in the current position. Particle numbers are assigned to the plurality of current target points using the modulation curve.

Abstract: System for sterilization of objects (B) by electron bombardment comprising a chamber (2) provided with an inlet (4) and an outlet (6) through which objects (B) are input and output, said system between the inlet (4) and the outlet (6) comprising a treatment zone (II), a routing zone (I) upstream from the treatment zone (II) and an evacuation zone (III) downstream from the treatment zone (II), and means of conveying objects (B) from the inlet (4) to the outlet (6), the treatment zone (II) comprising at least one electron accelerator and a conveyor (9), the routing zone (I) and the evacuation zone (III) each including at least one radiation shielding wall (16) protecting against ionizing radiation and means allowing objects (B) to pass over the radiation shielding wall (16) passing over the top of said radiation shielding wall (16).

Abstract: A system and a method improve a quality of beam delivery in proton therapy by pencil beam scanning of a predeterminable volume within a patient that minimizes beam position errors. The system has a proton source generating a proton beam, a number of proton beam bending/focusing units, a beam nozzle having an outlet for the proton beam to penetrate the predetermined volume, a beam bending magnet, and a couple of sweeper magnets to sweep the proton beam in both lateral directions. A position-sensitive detector is aligned with the nozzle to control the position of the proton beam and control logic controls the position and the energy of the proton beam and has a beam steering data set. A correction logic is aligned with the control logic for correcting beam position errors by comparing an expected beam position with the actual beam position detected and generates beam position correction data.

Abstract: Multi-layered carbon nanoparticles of the fulleroid type having an inter-layer distance in a range of from 0.34 to 0.36 nm, wherein the nanoparticles have a toroidal shape, a ratio between an outer diameter and a thickness of a multi-layered body of said toroidal nanoparticles being comprised in a range of from 10:1 to 3:1, and an averaged size being in a range of from 15 to 100 nm as measured by transmission electron microscope.

Abstract: An accelerator system includes a plurality of cells. Each cell includes a focus magnet and a defocus magnet each configured to create a magnetic field so as to confine and accelerate a particle beam, the focus magnet being configured to focus the particle beam in a horizontal direction and defocus the particle beam in a vertical direction, and the defocus magnet being configured to focus the particle beam in a vertical direction and defocus the particle beam in a horizontal direction. Each of the plurality of cells is configured to confine the particle beam in an isochronous orbit during acceleration. The accelerator system is a non-scaling fixed field alternating gradient particle accelerator (FFAG).

Abstract: To provide a preferred device configuration and arrangement capable of forming a large irradiation field, miniaturizing a gantry and reducing weight of the gantry. A gantry includes a bending magnet configured to bend a beam orbit, a plurality of horizontal direction scanning magnets which are first scanning magnets configured to scan the beam orbit in a horizontal direction which is a first direction, and a vertical direction scanning magnet which is a second scanning magnet configured to scan the beam orbit in a vertical direction which is a second direction. The plurality of horizontal direction scanning magnets is arranged so that ? is equal to or less than 90° when it is assumed that a phase difference between the horizontal direction scanning magnets is 180n°±?. The bending magnet is arranged between the plurality of horizontal direction scanning magnets.

Abstract: In gantry type particle beam irradiation system comprising a gantry and being configured to irradiate a particle beam, which has small emittance in X direction and large emittance in Y direction at an extraction position of a circular accelerator, from an irradiation nozzle installed in the gantry to an irradiation target, the irradiation nozzle has a ridge filter which is installed so as for a direction in which emittance in X direction is maintained to tilt to a direction which is perpendicular to a ridge of the ridge filter by a predetermined angle in the state where the gantry is a reference angle.

Abstract: A charged particle beam transport system is characterized in that in a fixed transport unit, a phase of a phase space distribution of a charged particle beam at an inlet of a rotating deflection unit that rotates around an gantry rotation axle of a rotating gantry coincides with a phase determined by a calculation based on an average value of a first phase advance and a second phase advance. The first phase advance is defined as a change in a phase, of the phase space distribution, that changes when the charged particle beam travels from the inlet of the rotating deflection unit to an isocenter in the case where a gantry angle is a gantry reference angle; the second phase advance is defined as a change in a phase at a time when the gantry angle is pivoted by 90° from the gantry reference angle.

Abstract: A plasma flood gun for an ion implantation system includes an insulating block portion and first and second conductive block portions disposed on opposite sides of the insulating block portion. Conductive straps can be coupled between the first and second conductive block portions. The conductive block portions and the central body portion include recesses which form a closed loop plasma chamber. A power source is coupled to the conductive block portions for inductively coupling radio frequency electrical power into the closed loop plasma chamber to excite the gaseous substance to generate a plasma. The respective recess in the second conductive block portion includes a pinch region having a cross-sectional dimension that is smaller than a cross-sectional area of portion of the closed loop plasma chamber directly adjacent the pinch region. The pinch region can be positioned immediately adjacent an outlet portion formed in the second conductive block portion.

Abstract: A control unit is provided with, a retaining section that retains a plurality of operation patterns each being a pattern of operation to be periodically repeated by an accelerator, the operation patterns having respective operation conditions adjusted for different emission times of an particle beam, to cause a deflection electromagnet in the accelerator to have an intended magnetic field intensity even under a presence of a hysteresis; a reading section for a plurality of slices of an irradiation target in a depth direction, which reads an irradiation condition for each of the slices; a selection section that selects the operation pattern suitable for each of the slices, on the basis of the read irradiation condition; and a main control section that controls, for each of the slices, the accelerator on the basis of the selected operation pattern and an irradiation device on the basis of the irradiation condition.

Abstract: A charged particle irradiation system is capable of shortening the irradiation time and the treatment time by performing efficient irradiation even when irregular variation occurs in the irradiation object during the gating irradiation. The extraction of the beam is stopped upon reception of a regular extraction permission end signal which is outputted based on a regular movement signal. An extractable state maintaining function operates upon the reception of the extraction permission end signal. When a preset standby time elapses without receiving an extraction permission start signal again during the standby time, the extractable state maintaining function finishes its operation and a charged particle beam generator decelerates the beam. Also, the extraction of the beam is stopped due to reception of an irregular extraction permission end signal during the irradiation. When the extraction permission start signal is received again during the standby time, the extraction of the beam is restarted.

Abstract: The invention comprises a charged particle beam acceleration method and apparatus used as part of multi-axis charged particle radiation therapy of cancerous tumors. The accelerator includes a synchrotron having advances in turning magnets, edge focusing magnets, magnetic field concentration magnets, and extraction and intensity control elements that minimize the overall size of the synchrotron, provide a tightly controlled proton beam, directly reduce the size of required magnetic fields, directly reduces required operating power, and allows independent energy and intensity control of extracted charged particles from the synchrotron.

Abstract: An array of spatially separated beamlets is produced by a corresponding array of charged particle emitters. Each emitter is at an electrostatic potential difference with respect to an immediately adjacent emitter in the array. The beamlets are converged laterally to form an charged particle beam. The beam is modulated longitudinally with infrared radiation to form a modulated beam. The charged particles in the modulated beam are bunched longitudinally to form a bunched beam. The bunched beam may be modulated with an undulator to generate a coherent radiation output. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract: The invention concerns a process for the deposition of an intended dose distribution in a cyclically moved target region moving cyclically (102) by means of multiple irradiations with a beam (105) approaching matrix points of a target matrix in at least two scannings, wherein in each of the scannings, matrix points are approached sequentially. It is characterized through the steps: establishing the maximal tolerance level for local deviation from the intended dose distribution, de-synchronizing the sequence of the irradiation and the cyclical motion of the target region (102), and partitioning the irradiation of the target region (102) in a sufficient number of scannings such that local deviations from the intended dose distribution correspond at most to the maximal tolerance level of deviation from the intended dose distribution.

Abstract: An apparatus for monitoring beam currents of an implanter is provided. The apparatus includes a beam-sensing unit for sensing the beam currents; a position-determining unit for determining scan positions; and a computing unit. The computing unit is configured to perform the functions of receiving the beam currents from the beam-sensing unit; receiving the scan positions from the position-determining unit; and determining a drift status of the implanter from the beam currents, wherein the computing unit is configured to receive the beam currents and the scan position periodically between a starting time and an ending time of a scan process of the implanter.

Abstract: One embodiment relates to an apparatus for electron beam lithography which includes a linear array of reflection electron beam lithography columns and a rotary stage. Each column is separately controllable to write a portion of a lithographic pattern onto a substrate. The rotary stage is configured to hold multiple substrates and to be rotated under the linear array of reflection electron beam lithography columns. Another embodiment relates to a method of electron beam lithography which includes simultaneously rotating and linearly translating a stage holding a plurality of wafers, and writing a lithography pattern using a linear array of reflection electron beam lithography columns over the stage. Each said column traverses a spiral path over the stage as the stage is rotated and linearly translated. Other embodiments, aspects and feature are also disclosed.

Abstract: According to an example embodiment, a machine includes, among other things, a housing and a support situated for supporting a work piece in a selected position relative to the housing. A radiation source is situated for emitting a beam of radiation in the housing. A magnetic field generator is situated for generating a magnetic field in the housing near the support. The magnetic field has a selectively variable strength at a plurality of locations in the housing for selectively steering the beam of radiation toward the support.

Abstract: Apparatus for performing electron radiation therapy on a breast cancer patient preferably includes an intraoperative electron radiation therapy machine, an intraoperative electron radiation therapy collimator tube connected to the intraoperative electron radiation therapy machine, and a plurality of filters made of a material having substantially the same density as human breast tissue for placement between the machine and the patient to change the energy of a monoenergetic beam after the beam has left the machine, allowing a filter to be chosen to reduce the energy traveling through the tube to a desired amount of energy to treat the patient.

Abstract: In a pattern inspection of a semiconductor circuit, to specify a cause of a process defect, not only a distribution on and across wafer of the number of defects but also more detailed, that is, the fact that how many defects occurred where on the semiconductor pattern is needed to be specified in some cases. Accordingly, the present invention aims to provide an apparatus capable of easily specifying a cause of a process defect based upon a positional relationship of a distribution of defect occurrence frequency and a pattern.

Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.

Abstract: In one embodiment, a system for patterning a substrate includes a plasma chamber; a power source to generate a plasma within the plasma chamber; and an extraction plate system comprising a plurality of apertures and disposed along a side of the plasma chamber. The extraction plate system is configured to receive an extraction voltage that biases the extraction plate system with respect to the plasma chamber wherein the plurality of apertures are configured to extract a plurality of respective charged particle beamlets from the plasma. The system further includes a projection optics system to direct at least one of the plurality of charged particle beamlets to the substrate.

Abstract: An apparatus for implanting ions of a selected species into a semiconductor wafer includes an ion source, an accelerator, and an magnetic structure. The ion source is configured to generate an ion beam. The accelerator is configured to accelerate the ion beam, where the accelerated ion beam includes at least a first portion having a first energy and a second portion having a second energy. The magnetic structure is configured to deflect the first portion of the accelerated ion beam in a first path trajectory and the second portion of the accelerated ion beam in a second path trajectory. The first and second path trajectories have a same incident angle relative to a surface region of the semiconductor wafer.

Abstract: A pattern measuring apparatus which can identify a kind of gaps formed by a manufacturing process having a plurality of exposing steps such as SADP, particularly, which can suitably access a gap even if a sample has the gap that is not easily accessed is disclosed. A feature amount regarding one end side of a pattern having a plurality of patterns arranged therein and a plurality of kinds of feature amounts regarding the other end side of the pattern are extracted from a signal detected on the basis of scanning of a charged particle beam. With respect to proper kinds of feature amounts among the plurality of kinds of feature amounts, the feature amount on one side of the pattern and that on the other end side of the pattern are compared. On the basis of the comparison, the kinds of spaces among the patterns are determined.

Abstract: An apparatus for hydrogen and helium implantation is disclosed. The apparatus includes a plasma source system to generate helium ions and hydrogen molecular ions comprising H3+ ions. The apparatus further includes a substrate chamber adjacent the plasma source system and in communication with the plasma source system via one or more apertures, an extraction system to extract the hydrogen molecular ions and helium ions from the plasma source system, and an acceleration system to accelerate extracted helium and hydrogen molecular ions to a predetermined energy and direct the extracted helium ions and hydrogen molecular ions to a substrate.

Abstract: First ions and second ions that are heavier than first ions are generated in an ion source. One kind of ions of the first ions and second ions is injected into an accelerator by action of a switching magnet and accelerated in the accelerator. An ion beam including the one kind of ions is extracted from the accelerator to a beam transport system and a tumor volume of a patient is irradiated with the ion beam from an irradiation nozzle. In the irradiation of the ion beam, a tumor volume depth and the largest underwater range of each ion species are compared, and an ion species in which the tumor volume depth becomes the longest underwater range or lower is injected into the accelerator, and accelerated by the accelerator. The tumor volume is irradiated with the ion species.

Abstract: A charged particle beam writing apparatus includes a dose calculation unit to calculate, for each of a plurality of first small regions made by virtually dividing a writing region of a target object to be mesh-like regions each having a size larger than an influence radius of forward scattering of a charged particle beam, a dose of the charged particle beam shot in a first small region concerned of the plurality of first small regions, by using a dose formula which is different depending on a shot type classified by whether a shot figure formed by the charged particle beam is at an edge of a figure pattern or inside the figure pattern in the first small region concerned, and a writing unit to write, for each of the plurality of first small regions, the figure pattern with a dose calculated by the dose formula.

Abstract: The invention relates generally to treatment of solid cancers. More particularly, the invention relates to a multi-field imaging and/or a multi-field charged particle cancer therapy method and apparatus coordinated with patient respiration via use of feedback sensors used to monitor and/or control patient respiration. Preferably, the multi-field imaging, such as X-ray imaging, and the charged particle therapy are performed on a patient in a partially immobilized and repositionable position. X-ray and/or proton delivery is timed to patient respiration via control of charged particle beam injection, acceleration, extraction, and/or targeting methods and apparatus.

Abstract: A compact high-gradient, very high energy electron (VHEE) accelerator and delivery system (and related processes) capable of treating patients from multiple beam directions with great speed, using all-electromagnetic or radiofrequency deflection steering is provided, that can deliver an entire dose or fraction of high-dose radiation therapy sufficiently fast to freeze physiologic motion, yet with a better degree of dose conformity or sculpting than conventional photon therapy. In addition to the unique physical advantages of extremely rapid radiation delivery, there may also be radiobiological advantages in terms of greater tumor or other target control efficacy for the same physical radiation dose.

Abstract: An ion implantation system and process, in which the performance and lifetime of the ion source of the ion implantation system are enhanced, by utilizing isotopically enriched dopant materials, or by utilizing dopant materials with supplemental gas(es) effective to provide such enhancement.

Abstract: In a particle therapy treatment planning system for creating treatment plan data, the movement of a target (patient's affected area) is extracted from plural tomography images of the target, and the direction of scanning is determined by projecting the extracted movement on a scanning plane scanned by scanning magnets. Irradiation positions are arranged on straight lines parallel with the scanning direction making it possible to calculate a scanning path for causing scanning to be made mainly along the direction of movement of the target. The treatment planning system can thereby realize dose distribution with improved uniformity.

Abstract: Systems and apparatuses for providing particle beams for radiation therapy with a compact design and suitable to a single treatment room. The radiation system comprises a stationary cyclotron coupled to a rotating gantry assembly through a beam line assembly. The system is equipped with a single set of dipole magnets that are installed on the rotating gantry assembly and undertakes the dual functions of beam energy selection and beam deflection. The energy degrader may be exposed to the air pressure. The beam line assembly comprises a rotating segment and a stationary segment that are separated from each other through an intermediate segment that is exposed to an ambient pressure.

Abstract: Biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) is processed to produce useful products, such as fuels. For example, systems can use feedstock materials, such as cellulosic and/or lignocellulosic materials and/or starchy or sugary materials, to produce ethanol and/or butanol, e.g., by fermentation.

Abstract: A system to control an ion beam in an ion implanter includes a detector to perform a plurality of beam current measurements of the ion beam along a first direction perpendicular to a direction of propagation of the ion beam. The system also includes an analysis component to determine a beam current profile based upon the plurality of beam current measurements, the beam current profile comprising a variation of beam current along the first direction; and an adjustment component to adjust a height of the ion beam along the first direction when the beam current profile indicates the beam height is below a threshold.

Abstract: An intensity modulator for controlling the intensity of ions, such as protons, controllably block a portion of sub-areas of an area beam to control the average intensity within that sub-area. A fan beam is then created by a focusing process that reforms the area beam while blurring intensity variations in each sub-area to a corresponding beamlet in the fan beam of uniform intensity.

Abstract: A method for sterilizing an implantable sensor for sensing an analyte in a body tissue. The implantable sensor has a sensor part which can be introduced into the body tissue, at least one sensor electrode for sensing the analyte, and at least one electronics part. The electronics part has at least one electronic component and is connected to the sensor part. The method includes (a) introducing the implantable sensor into a package, the package sealing the implantable sensor from bacteria and accommodating a radiation shield, (b) irradiating the implantable sensor in the package with sterilizing radiation from at least one irradiating direction, in particular with electron radiation, the radiation shield shielding the electronic component of the electronics part from the sterilizing radiation, the radiation shield being arranged in such a way that the sensor part is sterilized by the sterilizing radiation.

Abstract: A drawing apparatus performs drawing on a first partial region and a second partial region. The first and second partial regions having an overlap region in which the first and second partial regions overlap each other. The apparatus includes a transformation device configured to transform first pattern data for the first partial region into first quantized pattern data in accordance with a first transformation rule, and to transform second pattern data for the second partial region into second quantized pattern data in accordance with a second transformation rule different from the first transformation rule, and a controller configured to control the drawing on the first partial region based on the first quantized pattern data, and to control the drawing on the second partial region based on the second quantized pattern data.

Abstract: An ion beam scanner includes a first scanner stage having a first opening to transmit an ion beam, the first scanner stage to generate, responsive to a first oscillating deflection signal, a first oscillating deflecting field within the first opening; a second scanner stage disposed downstream of the first scanner stage and having a second opening to transmit the ion beam, the second scanner stage to generate, responsive to a second oscillating deflection signal, a second oscillating deflecting field within the second opening that is opposite in direction to the first oscillating deflecting field, and a scan controller to synchronize the first oscillating deflection signal and second oscillating deflection signal to generate a plurality of ion trajectories when the scanned ion beam exits the second stage that define a common focal point.

Abstract: The present invention provides a drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, including an aperture array configured to include a plurality of apertures for shaping the respective charged particle beams, a deflection unit configured to include a plurality of first deflectors which are arranged on a side, with respect to the aperture array, of a charged particle source for radiating a charged particle beam and which deflect the respective charged particle beams, and to individually change irradiated positions of the respective charged particle beams on the aperture array by driving the respective first deflectors, and a controller configured to control deflection of the charged particle beams by the first deflectors to reduce a dispersion of intensities of the respective charged particle beams on the substrate.

Abstract: An electron beam emitter comprises a housing enclosing a cathode capable of emitting electrons within the housing and a window for allowing the emitted electrons to exit the housing, wherein the housing has an opening adapted to be at least partly engaged with a high voltage connector assembly, the assembly being adapted to connect the cathode to a power supply, the electron beam emitter further comprising a cooling flange surrounding the opening and having an interior channel extending between an inlet port and an outlet port for receiving cooling fluid for cooling the high voltage connector assembly. The invention further relates to a method of cooling an electron beam device.

Abstract: Systems and methods of controlling characteristics of a proton beam emitted from a nozzle of a proton treatment system including one or more beam modifying members to define a characteristic of an emitted proton beam, and a clamping member mounted to the nozzle, the clamping member having one or more receiving portions to receive the one or more beam modifying members therein. In some embodiments, the beam modifying members comprise plate structures and the receiving portions include a plurality of slots spaced apart from one another on opposing surfaces of the clamping member to receive opposing ends of the plate structures.

Abstract: The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.