Abstract: The present disclosure relates to an imaging device, a method for manufacturing an imaging device, and an electronic device capable of reducing light entering an electric-charge holding unit in a back-illuminated imaging device. An imaging device includes: a photoelectric conversion unit; an electric-charge holding unit; a semiconductor substrate; a wiring layer; an insulation film layer; a first light-shielding film; and a second light-shielding film. The insulation film layer, the first light-shielding film, and the wiring layer are stacked on a second surface of the semiconductor substrate. The second light-shielding film includes: a first light-shielding portion extending from the first surface of the semiconductor substrate to a middle of the semiconductor substrate; a second light-shielding portion penetrating the semiconductor substrate; and a third light-shielding portion covering a part of the first surface of the semiconductor substrate.

Abstract: The present disclosure relates to a solid-state imaging device and an electronic apparatus that make it possible to estimate a normal vector to one direction with high accuracy with a simple configuration. A polarization image sensor includes a plurality of polarizers disposed on a chip and having different polarization directions, and a plurality of photoelectric conversion sections having light reception regions for receiving light transmitted through the polarizers, the light reception regions being symmetrical. The present disclosure can be applied, for example, to a polarization image sensor or the like that estimates a surface and a shape of an imaging object.

Abstract: A method of forming a deep trench isolation in a radiation sensing substrate includes: forming a trench in the radiation sensing substrate; forming a corrosion resistive layer in the trench, in which the corrosion resistive layer includes titanium carbon nitride having a chemical formula of TiCxN(2-x), and x is in a range of 0.1 to 0.9; and filling a reflective material in the trench and over the corrosion resistive layer.

Abstract: Various embodiments of the present application are directed towards an image sensor including a wavelength tunable narrow band filter, as well as methods for forming the image sensor. In some embodiments, the image sensor includes a substrate, a first photodetector, a second photodetector, and a filter. The first and second photodetectors neighbor in the substrate. The filter overlies the first and second photodetectors and includes a first distributed Bragg reflector (DBR), a second DBR, and a first interlayer between the first and second DBRs. A thickness of the first interlayer has a first thickness value overlying the first photodetector and a second thickness value overlying the second photodetector. In some embodiments, the filter is limited to a single interlayer. In other embodiments the filter further includes a second interlayer defining columnar structures embedded in the first interlayer and having a different refractive index than the first interlayer.

Abstract: An image sensor includes a substrate having a first surface and a second surface opposite to each other, a photoelectric conversion region provided in the substrate, and a polarizer provided at the first surface of the substrate. The polarizer includes a lower structure comprising at least one trench recessed from the first surface of the substrate toward the photoelectric conversion region, and a plurality of upper patterns provided on the lower structure and spaced apart from each other in a first direction parallel to the first surface.

Abstract: A semiconductor layer is doped with a first doping type and has an upper surface. A first electrode insulated from the semiconductor layer extending through the semiconductor layer from the upper surface. A second electrode insulated from the semiconductor layer extends through the semiconductor layer from the upper surface. The first and second electrodes are biased by a voltage to produce an electrostatic field within the semiconductor layer causing the formation of a depletion region. The depletion region responds to absorption of a photon with an avalanche multiplication that produces charges that are collected at first and second oppositely doped regions within the semiconductor substrate.

Abstract: Various embodiments of the present disclosure are directed towards a method for manufacturing a semiconductor structure. The method includes forming photodetectors within a semiconductor substrate. A charge release layer is deposited over the semiconductor substrate. A conductive contact is formed over the charge release layer such that a contact protrusion of the conductive contact extends through the charge release layer. The charge release layer is disposed along opposing sidewalls of the conductive contact. The charge release layer is electrically coupled to ground via the conductive contact.

Abstract: Provided are an imaging device that is inconspicuous from the outside, can easily apply design, and can obtain a clear image, and a laminate. The imaging device includes: an imaging unit that includes an image pickup element; and a transflective film that is disposed on a side of the imaging unit where light is incident into the image pickup element and reflects a part of the incident light, in which the transflective film includes at least one of a cholesteric liquid crystal layer or a multi-layer polymer film, when seen from a direction perpendicular to a surface of the image pickup element where light is incident, a peripheral region surrounding the imaging unit satisfies L*?50 in a CIE-Lab (D50) color space, and when seen from the direction perpendicular to the surface of the image pickup element where light is incident, the transflective film is disposed to cover at least the imaging unit and the peripheral region.

Abstract: A camera module shielded against electromagnetic interference but of reduced size comprises a voice coil motor, a circuit board, and a base between voice coil motor and circuit board. The voice coil motor comprises conductive housing. The circuit board comprises a conductive wire itself comprising shielded wire, ground pad, and a surrounding and grounded closed ground loop. The base comprises a main body and a conductive loop sleeved thereon. A first side of the conductive loop is electrically connected to the conductive housing, a second side of the conductive loop is electrically connected to the closed ground loop. The conductive housing, the conductive loop, and the closed ground loop form a shield against electromagnetic interference. The disclosure further provides an electronic device including the camera module.

Abstract: The present technology relates to, in a stacked lens structure formed by stacking wafer substrates, the stacked lens structure that enables implementation of a diaphragm function and a method of manufacturing the same, and an electronic device. In the stacked lens structure, substrates with lens each having a lens resin portion disposed inside a through hole formed in a substrate are directly bonded and stacked. The stacked lens structure includes a black resin having a transmittance distribution monotonously decreasing from a lens center toward a peripheral portion on an upper surface or a lower surface of the lens resin portion of at least one of the substrates with lens. The present technology can be applied to, for example, a camera module in which a plurality of lenses is stacked and the like.

Abstract: The present technology relates to a light reception device and a distance measurement module. The light reception device includes an on-chip lens, a wiring layer, and a semiconductor layer between the on-chip lens and the wiring layer. The semiconductor layer includes a first voltage application portion to which a first voltage is applied, a second voltage application portion to which a second voltage different from the first voltage is applied, a first charge detection portion, a second charge detection portion, and a through electrode extending through the semiconductor layer. The light reception device is configured such that a third voltage is applied through the through electrode to a film formed on a face of the semiconductor layer on the on-chip lens side. The present technology can be applied to a light reception device that generates distance information, for example, by a ToF method or the like.

Abstract: An image-sensor device is provided. The image-sensor device includes a semiconductor substrate and a radiation-sensing region in the semiconductor substrate. The image-sensor device also includes a doped isolation region in the semiconductor substrate and a dielectric film extending into the doped isolation region from a surface of the semiconductor substrate. A portion of the doped isolation region is between the dielectric film and the radiation-sensing region.

Abstract: An image sensor device is provided. The image sensor device includes a semiconductor substrate having a first side, a second side opposite to the first side, and at least one light-sensing region close to the first side. The image sensor device includes a dielectric feature covering the second side and extending into the semiconductor substrate. The dielectric feature in the semiconductor substrate surrounds the light-sensing region. The image sensor device includes a reflective layer in the dielectric feature in the semiconductor substrate, wherein a top portion of the reflective layer protrudes away from the second side, and a top surface of the reflective layer and a top surface of the insulating layer are substantially coplanar.

Abstract: Various embodiments of the present disclosure are directed towards an image sensor having a substrate including a plurality of sidewalls that define a plurality of protrusions along a first side of the substrate. The substrate has a first index of refraction. A photodetector is disposed within the substrate and underlying the plurality of protrusions. A plurality of micro-lenses overlying the first side of the substrate. The micro-lenses have a second index of refraction that is less than the first index of refraction. The micro-lenses are respectively disposed laterally between and directly contact an adjacent pair of protrusions in the plurality of protrusions. Further, the micro-lenses respectively comprise a convex upper surface.

Abstract: Various embodiments of the present disclosure are directed towards an integrated chip including a protective ring structure overlying a grating coupler structure. A waveguide structure is disposed within a semiconductor substrate and comprises the grating coupler structure. An interconnect structure overlies the semiconductor substrate. The interconnect structure includes a contact etch stop layer (CESL) and a conductive contact over the semiconductor substrate. The conductive contact extends through the CESL. The protective ring structure extends through the CESL and has an upper surface aligned with an upper surface of the conductive contact.

Abstract: A multi-axis MEMS assembly includes a micro-electrical-mechanical system (MEMS) actuator configured to provide linear three-axis movement. The micro-electrical-mechanical system (MEMS) actuator includes: an in-plane MEMS actuator, and an out-of-plane MEMS actuator. An optoelectronic device is coupled to the micro-electrical-mechanical system (MEMS) actuator. The out-of-plane MEMS actuator includes a multi-morph piezoelectric actuator.

Abstract: A back-illuminated type solid-state image pickup unit in which a pad wiring line is provided on a light reception surface and which is capable of improving light reception characteristics in a photoelectric conversion section by having a thinner insulating film in a pixel region. The solid-state image pickup unit includes a sensor substrate having a pixel region in which photoelectric conversion sections are formed in an array, and a drive circuit is provided on a surface opposed to a light reception surface for the photoelectric conversion sections of the sensor substrate. A through hole via reaching the drive circuit from the light reception surface of the sensor substrate is provided in a peripheral region located outside the pixel region. A pad wiring line directly laminated on the through hole via is provided on the light reception surface in the peripheral region.

Abstract: An image sensor pixel array comprises a plurality of image pixel units to gather image information and a plurality of phase detection auto-focus (PDAF) pixel units to gather phase information. Each of the PDAF pixel units includes two of first image sensor pixels covered by two micro-lenses, respectively. Each of the image pixel units includes four of second image sensor pixels adjacent to each other, wherein each of the second image sensor pixels is covered by an individual micro-lens. A coating layer is disposed on the micro-lenses and forms a flattened surface across the whole image sensor pixel array. A PDAF micro-lens is formed on the coating layer to cover the first image sensor pixels.

Abstract: The backside illuminated image sensor comprises a substrate of semiconductor material, detector elements arranged at a main surface, a dielectric layer on or above the main surface, a first capacitor layer and a second capacitor layer above the main surface, the capacitor layers forming a capacitor (C1, C2). A peripheral circuit is integrated in the substrate apart from the detector elements, the peripheral circuit being configured for one or more operations of the group consisting of voltage regulation, charge pump operation and stabilization of clock generation, and the capacitor layers are electrically connected with contact regions of the peripheral circuit.

Abstract: The present disclosure relates to a solid-state imaging element, a manufacturing method, and an electronic apparatus capable of suppressing an adverse effect of high-order light of diffracted light on image quality. A glass plate material is bonded to a semiconductor substrate on which a pixel region in which a plurality of pixels is arranged is formed so that a gap is not provided between the glass plate material and the pixel region, and a low refractive index layer having a refractive index lower than that of the glass substrate is arranged on a resin layer between a low reflection film formed on a front surface of an on-chip lens arranged for every pixel and the glass plate material. The low refractive index layer is formed by a hole layer that includes a plurality of fine holes having a diameter smaller than a pitch of the pixels and a film that is formed so as to close the plurality of fine holes as hollows.

Abstract: An optical device and a method for fabricating an optical device are described. The optical device may be a light emitting diode (LED) device, e.g. a micro-LED (?LED) device, or a photodiode (PD) device, e.g. an imager. The method comprises processing, on a first semiconductor wafer, an array including a plurality of compound semiconductor LEDs or compound semiconductor PDs and a plurality of first contacts, each first contact being electrically connected to one of the LEDs or PDs. The method further comprises processing, on a second semiconductor wafer, a CMOS IC and a plurality of second contacts electrically connected to the CMOS IC. The method further comprises hybrid bonding the first semiconductor wafer to the second semiconductor wafer such that the plurality of LEDs or PDs are individually connected to the CMOS IC via the first and second contacts.

Abstract: Sputtering targets including molybdenum, niobium and tantalum are found to be useful for sputtering films for electronic devices. Sputtering targets with about 88 to 97 weight percent molybdenum show improved performance, particularly with respect to etching, such as when simultaneously etching an alloy layer including the Mo, Nb, and Ta, and a metal layer (e.g., an aluminum layer). The targets are particularly useful in manufacturing touch screen devices.

Abstract: An endoscope includes an objective lens provided at a distal end portion of an insertion portion, an image sensor in which a light receiving area is formed on a surface facing the objective lens, and a drive circuit substrate that is disposed on a back side of the image sensor and includes a drive circuit to drive the image sensor, the endoscope further including an electromagnetic shield that houses the image sensor and the drive circuit substrate, in which the electromagnetic shield includes: a first shield member including a cylinder that covers a side portion of the image sensor, a structure that is disposed between the image sensor and the objective lens and that has an opening that allows entrance of light from the objective lens, and a wiring pattern that is formed on an inner peripheral surface of the cylinder and the structure.

Abstract: The invention provides a camera module of an electronic device, which includes a circuit board, a chip, an image sensor and a connection frame. The chip is arranged on the circuit board, and the image sensor is arranged on the chip. The connection frame is arranged on the periphery of the chip, and the chip is electrically connected with the circuit board by the connection frame, and the image sensor is located in the space surrounded by the connection frame. The invention also provides an electronic device.

Abstract: An image sensor comprising pixels each includes, an photoelectric conversion unit, a first inner-layer lens, a second inner-layer lens, and an on-chip microlens. A light-shielding wall around the second inner-layer lens is provided between adjacent pixels. A first positional difference between center positions of the first inner-layer lens and the photoelectric conversion unit, a second positional difference between center positions of the second inner-layer lens and the photoelectric conversion unit, and a third positional difference between center positions of the on-chip microlens and the photoelectric conversion unit satisfy: the second positional difference<the first positional difference<the third positional difference.

Abstract: There is provided an imaging apparatus including: a solid state image sensor configured to generate a pixel signal by photoelectric conversion in accordance with a light amount of an incoming light; an integrated configuration unit configured to integrate a function for fixing the solid state image sensor and a function for removing an infrared light of the incoming light.

Abstract: Methods and apparatus for forming a bond pad of a semiconductor device such as a backside illuminated (BSI) image sensor device are disclosed. The substrate of a device may have an opening at the backside, through the substrate reaching the first metal layer at the front side of the device. A buffer layer may be formed above the backside of the substrate and covering sidewalls of the substrate opening. A pad metal layer may be formed above the buffer layer and in contact with the first metal layer at the bottom of the substrate opening. A bond pad may be formed in contact with the pad metal layer. The bond pad is connected to the pad metal layer vertically above the substrate, and further connected to the first metal layer of the device at the opening of the substrate.

Abstract: A camera module, a method for assembling the camera module, and a mobile terminal are provided. The camera module includes a flexible circuit board; a chip, stacked on the flexible circuit board; an image sensor, stacked on the chip; a connection wire, where one end of the connection wire is connected to a wiring region of the flexible circuit board, the other end of the connection wire is connected to an interface region of a first surface of the chip, and the first surface is a surface of the chip away from the flexible circuit board; and a first protective structure, arranged on the interface region of the first surface of the chip.

Abstract: According to an aspect, an image sensor package includes a transparent member, a substrate, and an interposer disposed between and coupled to the transparent member and the substrate, where the interposer defines a first cavity area and a second cavity area. The image sensor package includes an image sensor die disposed within the first cavity area of the interposer, where the image sensor die has a sensor array configured to receive light through the transparent member and the second cavity area. The image sensor package includes a bonding material that couples the image sensor die to the interposer within the first cavity area.

Abstract: A wafer structure, a method for manufacturing the wafer structure, and a chip structure. A front surface of a first chip provided with a photosensitive array is bonded to a front surface of a second chip provided with a logic device. An electrical-connection through-hole is provided on a back surface of the first chip at a pad region. The electrical-connection through-hole runs from the back surface of the first chip, via a top wiring layer in the first chip, to a top wiring layer in the second chip. A pad is provided on the electrical-connection through-hole. Hence, integration of a photosensitive device of a stacked type is achieved. There are advantages of a high integration degree and a simple structure. Transmission efficiency of a device is effectively improved, and complexity of a manufacturing process is reduced.

Abstract: The present disclosure refers to a multispectral image sensor and a manufacturing method thereof. The multispectral image sensor comprises a front-end structure used for photoelectric conversion and processing, and a pixel layer provided on the front-end structure. The pixel layer comprises N pixel units, and N?4, the pixel units are arranged in a plurality of arrays, a photosensitive wavelength of each pixel unit in each array is different. Whereby, multispectrals can be detected simultaneously, and therefore the efficiency is improved, costs are reduced, and miniaturization is achieved.

Abstract: Implementations of semiconductor packages may include: a semiconductor die having a first side and a second side and an active area on the second side of the die. The semiconductor packages may also include two or more bumps coupled to two or more die pads on a second side of the die. The semiconductor packages may include an optically transmissive lid coupled to the semiconductor die through an adhesive, two or more bumps, and a first redistribution layer (RDL). The semiconductor package may include a second redistribution layer (RDL) coupled with the first RDL on the second side of the semiconductor die. The second RDL may extend to the first side of the semiconductor die. The first RDL may extend to an edge of the semiconductor die.

Abstract: A solid-state imaging device includes a semiconductor layer on which a plurality of pixels are arranged along a light-receiving surface being a main surface of the semiconductor layer, photoelectric conversion units provided for the respective pixels in the semiconductor layer, and a trench element isolation area formed by providing an insulating layer in a trench pattern formed on a light-receiving surface side of the semiconductor layer, the trench element isolation area being provided at a position displaced from a pixel boundary between the pixels.

Abstract: Provided is an imaging apparatus having: an imaging optical system including at least one optical element; an image sensor configured to capture an object image formed by the imaging optical system; a substrate on which an image sensor is mounted; a holding member configured to hold the imaging optical system, the holding member including a substrate bonding face that is bonded to the substrate; a first bonding member configured to bond at least a part of a first face of the substrate, that faces the substrate bonding face, to the substrate bonding face; and a second bonding member configured to bond at least a part of a second face of the substrate, that is opposite to the first face of the substrate, to the substrate bonding face.

Abstract: The invention describes a device (1) and a method (100) for bio metric identification of an object with a significantly improved signal-to-noise ratio.

Abstract: A display device comprises a substrate, a data link line, a power link line, and a dummy pattern. The substrate includes a display area in which pixels are arranged and a non-display area outside the display area. The data link line is positioned in the non-display area to deliver a predetermined signal to the pixels. The power link line is spaced apart from the data link line at a predetermined distance in the non-display area and delivers a predetermined power to the pixels. The dummy pattern is positioned between the data link line and the power link line in the non-display area.

Abstract: The present disclosure discloses a method for manufacturing a backside-illuminated CMOS image sensor structure, the method comprises: providing a silicon substrate which has been subjected to a frontside processing and a back thinning; forming grid-shaped deep trenchs on the back of the silicon substrate; forming an insulating layer on the inner wall surface of the deep trenchs to form a grid-shaped deep trenchs isolation structure; forming a diffusion barrier layer on the surface of the insulating layer; filling metal in the deep trenchs to form a grid-shaped composite structure in which the Metal grid is combined with the deep trenchs isolation structure.

Abstract: The light emitting device includes: a light emitting element, a covering member, a pair of electrode layers, and a pair of electrode terminals. The light emitting element has an electrode-formed surface on which a pair of electrode posts are formed. The covering member covers an electrode-formed surface of the light emitting element while forming an exposed portion of each of the pair of electrode posts which is exposed from the covering member. The pair of electrode layers are provided on a surface of the covering member and electrically connected to the exposed portions of the pair of electrode posts. The pair of electrode terminals are electrically connected to the pair of electrode layers, and provided on the surface of the covering member. The pair of electrode terminals are thicker than the pair of electrode layers, and are disposed at an interval larger than an interval between the pair of electrode posts.

Abstract: A semiconductor structure is provided. The semiconductor structure includes metallization structure, a plurality of conductive pads, and a dielectric layer. The plurality of conductive pads is over the metallization structure. The dielectric layer is on the metallization structure and covers the conductive pad. The dielectric layer includes a first dielectric film, a second dielectric film, and a third dielectric film. The first dielectric film is on the conductive pad. The second dielectric film is on the first dielectric film. The third dielectric film is on the second dielectric film. The a refractive index of the first dielectric film is smaller than a refractive index of the second dielectric film, and the refractive index of the second dielectric film is smaller than a refractive index of the third dielectric film.

Abstract: The present disclosure relates to a solid-state image pickup device and an electronic apparatus by which a phase-difference detection pixel that avoids defects such as lowering of sensitivity to incident light and lowering of phase-difference detection accuracy can be realized. A solid-state image pickup device as a first aspect of the present disclosure is a solid-state image pickup device in which a normal pixel that generates a pixel signal of an image and a phase-difference detection pixel that generates a pixel signal used in calculation of a phase-difference signal for controlling an image-surface phase difference AF function are arranged in a mixed manner, in which, in the phase-difference detection pixel, a shared on-chip lens for condensing incident light to a photoelectric converter that generates a pixel signal used in calculation of the phase-difference signal is formed for every plurality of adjacent phase-difference detection pixels.

Abstract: In a pixel 110, a microlens layer 112 includes a microlens for each pixel region. A color filter layer 114 allows passage of light of a given color. A polarizer layer 116 includes a polarizer that allows passage of a polarization component in a given direction in some or all pixel regions and acquires a normal vector of a subject through a detection value thereof. A photoelectric conversion layer 118 includes a plurality of photodiodes in the pixel regions. A distance to a feature point of the subject is acquired through phase difference based on the detection value.

Abstract: A semiconductor structure for a CMOS image sensor includes a semiconductor substrate having a first side and a second side. A photodiode is disposed in the semiconductor substrate proximate to the first side. The photodiode accumulates image charge photogenerated in the photodiode in response to incident light directed through the second side. A deep trench isolation structure enclosing the photodiode. The deep trench isolation structure extends from the second side toward the first side. The deep trench isolation structure includes a light absorption region disposed at a first end of the deep trench isolation structure toward the first side.

Abstract: An optical mode converter is disclosed. The optical mode converter includes a substrate and a luminescent layer on the substrate. The luminescent layer includes an optical waveguide and an inclined mirror at an end of the optical waveguide. A light signal passes through the optical waveguide and is reflected by the inclined mirror to penetrate into the substrate. A method for manufacturing the optical mode converter is also disclosed.

Abstract: An integrated device and related instruments and systems for analyzing samples in parallel are described. The integrated device may include sample wells arranged on a surface of where individual sample wells are configured to receive a sample labeled with at least one fluorescent marker configured to emit emission light in response to excitation light. The integrated device may further include photodetectors positioned in a layer of the integrated device, where one or more photodetectors are positioned to receive a photon of emission light emitted from a sample well. The integrated device further includes one or more photonic structures positioned between the sample wells and the photodetectors, where the one or more photonic structures are configured to attenuate the excitation light relative to the emission light such that a signal generated by the one or more photodetectors indicates detection of photons of emission light.

Abstract: In some embodiments, an image sensor is provided. The image sensor includes a photodetector disposed in a semiconductor substrate. A wave guide filter having a substantially planar upper surface is disposed over the photodetector. The wave guide filter includes a light filter disposed in a light filter grid structure. The light filter includes a first material that is translucent and has a first refractive index. The light filter grid structure includes a second material that is translucent and has a second refractive index less than the first refractive index.

Abstract: The present disclosure, in some embodiments, relates to an integrated chip. The integrated chip includes an image sensing element disposed within a semiconductor substrate. One or more isolation structures are arranged within one or more trenches disposed along a first surface of the semiconductor substrate. The one or more isolation structures are separated from opposing sides of the image sensing element by non-zero distances. The one or more trenches are defined by sidewalls and a horizontally extending surface of the semiconductor substrate. A doped region is laterally arranged between the sidewalls of the semiconductor substrate defining the one or more trenches and is vertically arranged between the image sensing element and the first surface of the semiconductor substrate.

Abstract: A driving method of a semiconductor device that takes three-dimensional images with short duration is provided. In a first step, a light source starts to emit light, and first potential corresponding to the total amount of light received by a first photoelectric conversion element and a second photoelectric conversion element is written to a first charge accumulation region. In a second step, the light source stops emitting light and second potential corresponding to the total amount of light received by the first photoelectric conversion element and the second photoelectric conversion element is written to a second charge accumulation region. In a third step, first data corresponding to the potential written to the first charge accumulation region is read. In a fourth step, second data corresponding to the potential written to the second charge accumulation region is read.

Abstract: A color filter structure includes a material stack disposed on a substrate, a material stack disposed in the substrate, a first trench penetrating the material stack and exposing a first metal pad, a scribe line trench penetrating the material stack and exposing a scribe line metal pad, a first filling material partially filling the first trench and substantially filling up the scribe line trench, a second filling material partially filling the first trench and the first filling material and the second filling material together substantially fill up the first trench, and a color filter material covering an optical uniform surface which the material stack, the first filling material and the second filling material together form.

Abstract: An image sensing device includes a substrate layer structured to include photoelectric conversion elements, grid structures disposed over the substrate layer to divide space above the substrate into different sensing regions, and color filter layers disposed over the photoelectric conversion elements between the grid structures. The grid structures includes an air layer, a light guide layer disposed over the air layer, and a capping film configured to cover the air layer and the light guide layer.

Abstract: A high degree of phase difference detection accuracy can be obtained using a phase difference pixel with a simpler configuration. A solid-state image-capturing device includes a pixel array unit in which a plurality of pixels including a phase difference pixel which is a pixel for focal point detection and an image-capturing pixel which is a pixel for image generation are arranged in a two-dimensional array. In this case, a predetermined layer between a light shielding layer and a micro lens formed in the image-capturing pixel has a higher refraction index than a refraction index of the predetermined layer formed in the phase difference pixel. The technique of the present disclosure can be applied to, for example, a back-illuminated-type solid-state image-capturing device and the like.