Abstract: Systems and methods are provided for optimizing operation of an integrated circuit. In one implementation, a system is provided for optimizing operation of an integrated circuit by adjusting an operational parameter of the integrated circuit based on a reference count stored in non-volatile memory fabricated on the integrated circuit. In another implementation, a method is provided for optimizing operation of an integrated circuit by generating, during operation of the integrated circuit, a first oscillator count of an oscillator, comparing the first oscillator count with at least one reference count stored on the integrated circuit, and activating, a control circuit to adjust an operational parameter of the integrated circuit based on a result of the comparison.

Abstract: Structures that include an identification marking and fabrication methods for such structures. A chip is formed within a usable area of a wafer, and a marking region is formed on the wafer. The marking region is comprised of a conductor used to form a last metal layer of an interconnect structure for the chip. The identification marking is formed in the conductor of the marking region. After the identification marking is formed, a dielectric layer is deposited on the marking region. The dielectric layer on the marking region is planarized.

Abstract: A method of testing a fuse in apparatus for monitoring electrical insulation surrounding first and second electrical conductors in a cable, the fuse being connected to the conductors, comprises: applying an electrical signal, with respect to a reference, to the fuse from a source; obtaining a value for the resistance of the insulation with respect to the reference; determining if the resistance value is greater than a fuse test resistance threshold and, if it is, causing the application of the signal to cease; and monitoring the decay of the signal to determine if the time for it to decay below a set value exceeds a set time limit, indicative of the fuse being satisfactory, or is less than the limit indicative of the fuse being blown.

Abstract: A memory device includes a memory component that store data. The memory device also includes a processor that receives a signal indicating that the memory component is coupled to the processor and retrieves information from the memory component. The information may include one or more algorithms capable of being performed by the memory component. The processor may then receive one or more packets associated with one or more data operations regarding the memory component. The processor may then perform the one or more data operations by using the memory component to employ the one or more algorithms.

Abstract: Embodiments of the present invention provide an authenticating service of a chip having an intrinsic identifier (ID). In a typical embodiment, an authenticating device is provided that includes an identification (ID) engine, a self-test engine, and an intrinsic component. The intrinsic component is associated with a chip and includes an intrinsic feature. The self-test engine retrieves the intrinsic feature and communicates it to the identification engine. The identification engine receives the intrinsic feature, generates a first authentication value using the intrinsic feature, and stores the authentication value in memory. The self-test engine generates a second authentication value using an authentication challenge. The identification engine includes a compare circuitry that compares the first authentication value and the second authentication value and generates an authentication output value based on the results of the compare of the two values.

Abstract: An object provided with a particular alignment arrangement for use in aligning the object and a further object with respect to each other is disclosed. The alignment arrangement includes a first fine alignment mark in the form of a substantially regular grating, and a second coarse alignment mark located in the same area as the first alignment mark.

Abstract: A NAND flash memory has word lines in a memory array area and contact pads and lead lines in a word line hookup area, each of the word lines connected to a corresponding contact pad by a lead line. The word lines in the memory array area have a first height and low-profile areas of lead lines in the word line hookup area have a second height that is less than the first height.

Abstract: A contact element (25) (electroformed product) is produced by electroforming. The contact element (25) has a surface on which an insulating film (28) having been formed by use of a dry film resist or the like is provided. In a process of producing the contact element (25), the insulating film (28) is provided after a step of producing the contact element 25. This makes it possible to provide electroformed components configured so that respective electroformed products (contact terminals) are arranged at narrow pitches while maintaining electrical insulation of the electroformed products from each other.

Abstract: A first alignment mark is given to a substrate, and a second alignment mark is given to a mask. The mask forms an electronic circuit pattern on the substrate. A control unit performs alignment of the mask and the substrate based on the first and second alignment marks. The second alignment mark is formed to surround the first alignment mark. The second alignment mark has a step pattern therein.

Abstract: The present invention relates a packaging structure including: a carrier board and a cementing layer on the surface of the carrier board; chips and passive devices having functional side thereof attached to the cementing layer; and a sealing material layer for packaging and curing, the sealing material being formed on the carrier board on the side attached to the chips and the passive devices. The present invention integrates chips and passive devices and then packages the chips and the passive devices together, and is therefore a packaged product having not single-chip functionality but integrated-system functionality. The present invention is highly integrated, reduces interfering factors such as system-internal electric resistance and inductance, and accommodates growing demand for lighter, thinner, shorter, and smaller semiconductor packaging.

Abstract: Apparatus, systems, and methods are provided to generate markings on the side of a substrate. The markings represent information. In an embodiment, the information provided in the markings may be used to collect information during an assembly process.

Abstract: A method of manufacturing a semiconductor device includes providing a wafer, grinding a backside of the wafer, disposing a backside film on the backside of the wafer, cutting the wafer to singulate a plurality of dies from the wafer, and forming a mark on the backside film disposed on each of the plurality of dies by a laser operation.

Abstract: A physical unclonable function is provided 100, comprising a plurality of bus-keepers 110, each bus-keeper of the plurality of bus-keepers 110 being configured to settle into one of at least two different stable states upon power-up, the particular stable state into which a particular bus-keeper of the plurality of bus-keepers settles being dependent at least in part upon the at least partially random physical characteristics of the particular bus-keeper, and a reading circuit 120 for reading the plurality of stable states into which the plurality of bus-keepers settled after a power-up, the plurality of bus-keepers being read-only.

Abstract: A device is provided that includes a first die having a first alignment structure that includes a plurality of first transmission columns arranged in a pattern and a second die positioned on the first die, the second die having a second alignment structure that includes a plurality of second transmission columns arranged in the same pattern as the first transmission columns. The first and second transmission columns are each coplanar with a first surface and a second surface of the first and second die, respectively.

Abstract: Methods of the present disclosure can include a method for estimating a spatial characteristic of an integrated circuit (IC), the method comprising: calculating a correlation between a dimension of a photoresist layer and exposure to a scanning electron microscope (SEM) for at least one reference IC pattern in the photoresist layer, the correlation providing a relationship between the dimension of the photoresist and the spatial characteristic, wherein the calculating is based on: an SEM image of the at least one reference IC pattern produced from reducing the dimension of the photoresist layer with the SEM from an initial value to a reduced value, the initial value of the dimension, and the reduced value of the dimension; and estimating the spatial characteristic of a target IC based on the correlation.

Abstract: Embodiments of the invention provide a method to detect pick and place indexing errors on each manufacturing batch (lot) of semiconductor wafer processed during a die attach process using a preselected skeleton of check die. The known locations of the check skeleton die are verified during picking of die from the wafer. If the check skeleton cannot be correctly verified at the known locations, then a pick error is indicated. The embodiments may be implemented on existing die attach equipment.

Abstract: A wafer includes a plurality of chips, each of the chips being spaced from each other by kerf-line regions including a reduced width.

Abstract: Provided is a technology capable of inhibiting a shield film formed over a surface of a sealing body from peeling from the surface of the sealing body, and inhibiting a part of the shield film from bulging from the surface of the sealing body. The present invention is characterized in that a peeling-prevention-mark formation region is provided so as to surround a product-identification-mark formation region, and a plurality of peeling prevention marks are formed in the peeling-prevention-mark formation region. That is, the present invention is characterized in that the region of the surface region of the sealing body which is different from the product-identification-mark formation region is defined as the peeling-prevention-mark formation region, and the peeling prevention marks are formed in the peeling-prevention-mark formation region.

Abstract: Semiconductor devices are provided with dual passivation layers. A semiconductor layer is formed on a substrate and covered by a first passivation layer (PL-1). PL-1 and part of the semiconductor layer are etched to form a device mesa. A second passivation layer (PL-2) is formed over PL-1 and exposed edges of the mesa. Vias are etched through PL-1 and PL-2 to the semiconductor layer where source, drain and gate are to be formed. Conductors are applied in the vias for ohmic contacts for the source-drain and a Schottky contact for the gate. Interconnections over the edges of the mesa couple other circuit elements. PL-1 avoids adverse surface states near the gate and PL-2 insulates edges of the mesa from overlying interconnections to avoid leakage currents. An opaque alignment mark is desirably formed at the same time as the device to facilitate alignment when using transparent semiconductors.

Abstract: A method for manufacturing a semiconductor device includes a first photolithography step of forming a first device pattern corresponding to a first pattern, and a plurality of alignment marks corresponding to a plurality of marks, upon a step of exposing the entire device region in one shot using a first mask including the first pattern and the plurality of marks, and a second photolithography step of, after the first photolithography step, forming second device patterns respectively corresponding to second patterns in a plurality of divided regions which form the device region, upon steps of individually exposing the plurality of divided regions using second masks each including the second pattern corresponding thereto.

Abstract: A semiconductor device includes a backing plate, a semiconductor wafer, and integrated devices. The semiconductor wafer includes a plurality of semiconductor die having edges oriented along a reference line, a front surface facing the backing plate, and a backside surface. The backside surface is formed opposite the front surface and includes linear grind marks oriented along the reference line and diagonal with respect to the edges of the plurality of semiconductor die. The linear grind marks are formed by a linear motion of an abrasive surface, such as by a cylinder or wheel having an abrasive surface, and in one embodiment are oriented at 45 degrees with respect to the reference line. The linear grind marks increase a strength of the plurality of semiconductor die to resist cracking. Integrated devices are formed on the front surface of the semiconductor wafer.

Abstract: A method for tracking an interposer die of a stacked silicon interconnect technology (SSIT) product includes forming a plurality of dummy components on the interposer die, and modifying one or more of the plurality of dummy components on the interposer die to form a unique identifier for the interposer die. An apparatus for a stacked silicon interconnect technology (SSIT) product includes an interposer die, and a plurality of dummy components at the interposer die. One or more of the plurality of dummy components is modifiable to form a unique identifier for the interposer die.

Abstract: Sensor packages and methods for making a sensor device package for side mounting on a circuit board. A sensor device(s) in a mechanical layer of silicon is sandwiched between first and second layers of glass to create a wafer. A first via(s) is created in the first or second layers to expose a predefined area of the mechanical layer of silicon. A second via(s) is created in the first or second layers. The least one second via has a depth dimension that is less than a depth dimension of the first via. A metallic trace is applied between the exposed area on the mechanical layer and a portion of the second via. The wafer is sliced such that the second via is separated into two sections, thereby creating a sensor die. The sensor die is then electrically and mechanically bonded to a circuit board at the sliced second via.

Abstract: Integrating a semiconductor component with a substrate through a low loss interconnection formed through adaptive patterning includes forming a cavity in the substrate, placing the semiconductor component therein, filling a gap between the semiconductor component and substrate with a fill of same or similar dielectric constant as that of the substrate and adaptively patterning a low loss interconnection on the fill and extending between the contacts of the semiconductor component and the electrical traces on the substrate. The contacts and leads are located and adjoined using an adaptive patterning technique that places and forms a low loss radio frequency transmission line that compensates for any misalignment between the semiconductor component contacts and the substrate leads.

Abstract: An integrated structure with a silicon-through via includes a substrate, a through-silicon via penetrating the substrate, a conductive protective structure surrounding the through-silicon via and a first and a second conductive dummy patterns with different shapes disposed between the through-silicon via and the conductive protective structure.

Abstract: A semiconductor substrate is provided in which an alignment mark is formed that can be used for an alignment even after the formation of an impurity diffused layer by the planarization of an epitaxial film. A trench is formed in an alignment region of an N?-type layer formed on an N+-type substrate. This trench is used to leave voids after the formation of a P?-type epitaxial film on the N?-type layer. Then, the voids formed in the N?-type layer can be used as an alignment mark. Thus, such a semiconductor substrate can be used to provide an alignment in the subsequent step of manufacturing the semiconductor apparatus. Thus, the respective components constituting the semiconductor apparatus can be formed at desired positions accurately.

Abstract: A method for manufacturing a semiconductor chip stack device is provided. The method includes forming a first connecting element array on a surface of a first semiconductor chip; forming a second connecting element array on a surface of a second semiconductor chip, the second array comprising more connecting elements than the first array and the pitch of the first array being a multiple of the pitch of the second array; applying the first chip against the second chip; and setting up test signals between the first and second chips to determine the matching between the connecting elements of the first array and the connecting elements of the second array.

Abstract: Methods for forming RX pads having gate alignment marks configured to enable noise reduction between layers while resulting in little or no non-uniformity of CMP processes for the IC, and the resulting devices, are disclosed. Embodiments include: providing, on a substrate, a RX pad having a SPM with a SPM horizontal and vertical positions at horizontal and vertical midpoints, respectively, of the first RX pad; providing a second RX pad abutting the first RX pad and a first STI pad abutting the second RX pad, each having a vertical midpoint at the SPM vertical position; forming a first gate alignment mark on the second RX pad and having vertical endpoints horizontally aligned with vertical endpoints of the second RX pad; and forming a second gate alignment mark on the first STI pad and having vertical endpoints horizontally aligned with vertical endpoints of the first STI pad.

Abstract: An embodiment of an interposer is disclosed. For this embodiment of the interposer, a first circuit portion is created responsive to a first printing region. A second circuit portion is created responsive to a second printing region. The interposer has at least one of: (a) a length dimension greater than a maximum reticle length dimension, and (b) a width dimension greater than a maximum reticle width dimension.

Abstract: An SOI wafer according to the present invention includes a support substrate and an insulating layer formed on the support substrate, a predetermined cavity pattern being formed on one of main surfaces of the support substrate on which the insulating layer is provided, further includes an active semiconductor layer formed on the insulating layer with the cavity pattern being closed, the active semiconductor layer not being formed in an outer peripheral portion of the support substrate, and further includes a plurality of superposition mark patterns formed in the outer peripheral portion on the one of the main surfaces of the support substrate for specifying a position of the cavity pattern.

Abstract: A wafer includes a plurality of chips arranged as rows and columns. A first plurality of scribe lines is between the rows of the plurality of chips. Each of the first plurality of scribe lines includes a metal-feature containing scribe line comprising metal features therein, and a metal-feature free scribe line parallel to, and adjoining, the metal-feature containing scribe line. A second plurality of scribe lines is between the columns of the plurality of chips.

Abstract: The present invention relates to a method for thermal stress reduction on a wafer, comprising the steps of providing a patterned wafer with saw lanes between adjacent dies, forming thin holes within the silicon substrate, which holes create a dotted groove in the saw lanes, and wherein no second layer on an opposing side of the wafer is formed, a patterned wafer obtained by said method. The forming of the holes is preferably combined with other processing steps or another step to avoid additional operations and manipulations prior to, or after standard wafer processing, and it therefore optimizes fabrication quality and costs. Preferably the holes within the silicon substrate having a depth of more than 3 to 50 ?m, preferably from 5-40 ?m, like 20 ?m.

Abstract: A semiconductor device has a semiconductor die with a plurality of bumps formed on contact pads disposed over its active surface. An encapsulant is formed over the semiconductor die. An interconnect structure is formed over the semiconductor die and encapsulant. The semiconductor die is mounted to a translucent tape with the bumps embedded in the translucent tape. The translucent tape has layers of polyolefin, acrylic, and polyethylene terephthalate. A back surface of the semiconductor die undergoes backgrinding to reduce die thickness. The tape undergoes UV curing. A laminate layer is formed over the back surface of the semiconductor die. The laminate layer undergoes oven curing. The laminate layer is laser-marked while the tape remains applied to the bumps. The tape is removed after laser-marking the laminate layer. Alternately, the tape can be removed prior to laser-marking. The tape reduces die warpage during laser-marking.

Abstract: Sacrificial optical test structures are constructed upon a wafer of pre-cleaved optical chips for testing the optical functions of the pre-cleaved optical chips. The sacrificial optical structures are disabled upon the cleaving the optical chips from the wafer and the cleaved optical chips can be used for their desired end functions. The test structures may remain on the cleaved optical chips or they may be discarded.

Abstract: Embodiments of the present invention include a substrate package, a method for multi-chip packaging, and a multi-chip package. For example, the substrate package includes a first set of reference markers and a second set of reference markers. The first set of reference markers is disposed on the substrate package, where the first set of reference markers is configured to provide a first alignment for positioning a first integrated circuit (IC) and a second alignment for positioning a second IC on the substrate package. Further, the second set of reference markers is disposed at a different location on the substrate package than the first set of reference markers, where the second set of reference markers is configured to provide confirmation of the first alignment and the second alignment.

Abstract: In accordance with an embodiment, a structure comprises a substrate having a first area and a second area; a through substrate via (TSV) in the substrate penetrating the first area of the substrate; an isolation layer over the second area of the substrate, the isolation layer having a recess; and a conductive material in the recess of the isolation layer, the isolation layer being disposed between the conductive material and the substrate in the recess.

Abstract: A circuit layout structure includes a wafer having at least a cell region and a scribe line region defined thereon, a metal pattern formed in a first insulating layer in the scribe line region, a second insulating layer and a hard mask layer formed on the metal pattern and the first insulating layer, and at least a dummy pattern formed in the second insulating layer and the hard mask layer in the scribe line region. The dummy pattern has a transmission rate between 0% and 1%.

Abstract: A die includes a first plurality of edges, and a semiconductor substrate in the die. The semiconductor substrate includes a first portion including a second plurality of edges misaligned with respective ones of the first plurality of edges. The semiconductor substrate further includes a second portion extending from one of the second plurality of edges to one of the first plurality of edges of the die. The second portion includes a first end connected to the one of the second plurality of edges, and a second end having an edge aligned to the one of the first plurality of edges of the die.

Abstract: An imaging system may include an imager integrated circuit with frontside components such as imaging pixels and backside components such as color filters and microlenses. The imager integrated circuit may be mounted to a carrier wafer with alignment marks. Bonding marks on the carrier wafer and the imager integrated circuit may be used to align the carrier wafer accurately to the imager integrated circuit. The alignment marks on the carrier wafer may be read, by fabrication equipment, to align backside components of the imager integrated circuit, such as color filters and microlenses, with backside components of the imager integrated circuit, such as photodiodes.

Abstract: A wide-gap semiconductor substrate includes a narrow-gap semiconductor layer, a wide-gap semiconductor layer and an alignment mark. The narrow-gap semiconductor layer has a main surface. The wide-gap semiconductor layer is epitaxially grown on the narrow-gap semiconductor layer. The alignment mark is preliminarily carved in a prescribed position on the main surface so that the alignment mark is preliminarily buried in the wide-gap semiconductor substrate.

Abstract: An arrangement for improving adhesive attachment of micro-components in an assembly utilizes a plurality of parallel-disposed slots formed in the top surface of the substrate used to support the micro-components. The slots are used to control the flow and “shape” of an adhesive “dot” so as to quickly and accurately attach a micro-component to the surface of a substrate. The slots are formed (preferably, etched) in the surface of the substrate in a manner that lends itself to reproducible accuracy from one substrate to another. Other slots (“channels”) may be formed in conjunction with the bonding slots so that extraneous adhesive material will flow into these channels and not spread into unwanted areas.

Abstract: Methods and apparatus are provided for an electronic panel assembly (EPA) (82, 83), comprising: providing one or more electronic devices (30) with primary faces (31) having electrical contacts (36), opposed rear faces (33) and edges (32) therebetween. The devices (30) are mounted primary faces (31) down on a temporary support (60) in openings (44) in a warp control sheet (WCS) (40) attached to the support (60). Plastic encapsulation (50) is formed at least between lateral edges (32, 43) of the devices (30) and WCS openings (44). Undesirable panel warping (76) during encapsulation is mitigated by choosing the WCS coefficient of thermal expansion (CTE) to be less than the encapsulation CTE. After encapsulation cure, the EPA (82) containing the devices (30) and the WCS (40) is separated from the temporary support (60) and, optionally, mounted on another carrier (70) with electrical contacts (36) exposed.

Abstract: An overlay mark suitable for use in manufacturing nonplanar circuit devices and a method for forming the overlay mark are disclosed. An exemplary embodiment includes receiving a substrate having an active device region and an overlay region. One or more dielectric layers and a hard mask are formed on the substrate. The hard mask is patterned to form a hard mask layer feature configured to define an overlay mark fin. Spacers are formed on the patterned hard mask layer. The spacers further define the overlay mark fin and an active device fin. The overlay mark fin is cut to form a fin line-end used to define a reference location for overlay metrology. The dielectric layers and the substrate are etched to further define the overlay mark fin.

Abstract: A misalignment detection device comprising a first substrate, at least one integrated circuit, a second substrate, a third substrate, and at least one detection unit. The at least one integrated is disposed on the first substrate in a first pressing region. The third substrate is disposed on the first substrate in a second pressing region and on the second substrate on the second substrate in a third pressing region. The at least one detection unit outputs a fault signal in response to a positioning shift occurring in at least one of the first, second, and third pressing regions.

Abstract: An embodiment integrated circuit includes a first device supporting a first back end of line layer, the first back end of line layer including a first alignment marker, and a second device including a spin-on glass via and supporting a second back end of line layer, the second back end of line layer including a second alignment marker, the spin-on glass via permitting the second alignment marker to be aligned with the first alignment marker using ultraviolet light.

Abstract: A semiconductor device and a method of fabricating the semiconductor device is provided. In the method, a semiconductor substrate defining a device region and an outer region at a periphery of the device region is provided, an align trench is formed in the outer region, a dummy trench is formed in the device region, an epi layer is formed over a top surface of the semiconductor substrate and within the dummy trench, a current path changing part is formed over the epi layer, and a gate electrode is formed over the current path changing part. When the epi layer is formed, a current path changing trench corresponding to the dummy trench is formed over the epi layer, and the current path changing part is formed within the current path changing trench.

Abstract: A semiconductor assembly includes a first subassembly comprising a heat sink and a first patterned polymer layer disposed on a surface of the heat sink to define an exposed portion of the first surface. The exposed portion of the first surface extends radially inward along the heat sink surface from the first layer. The subassembly also includes a second patterned polymer layer disposed on a radially outer portion of the first patterned polymer layer. The first and second layers define a cell for accommodating a power semiconductor die. Solder material is disposed on the exposed portion of the heat sink surface and in the cell. A power semiconductor die is located within the cell on a radially inward portion of the first layer and thermally coupled to the heat sink by the solder material.

Abstract: A method and device for pattern alignment are disclosed. The device can include an exposure field; a die within the exposure field, wherein the die comprises an integrated circuit region, a seal ring region, and a corner stress relief region; and a die alignment mark disposed between the seal ring region and the corner stress relief region.

Abstract: A semiconductor device includes a die pad including a first surface and a second surface opposite to the first surface, a first chip arranged in a first area on the first surface, the first chip including a first side and a second side crossing to the first side, a second chip arranged in a second area on the first surface, the second chip including a third side and a fourth side crossing to the third side, a plurality of first marks formed on the first surface, the first marks including a third mark and a fourth mark, a plurality of second marks formed on the first surface, the second marks including a fifth mark and sixth mark. The semiconductor device also includes a wire and a resin encapsulating the first chip, the second chip, and the wire.

Abstract: Disclosed are overlay targets having flexible symmetry characteristics and metrology techniques for measuring the overlay error between two or more successive layers of such targets. Techniques for imaging targets with flexible symmetry characteristics and analyzing the acquired images to determine overlay or alignment error are disclosed.