Barrier Layer Or Semiconductor Device Making Patents (Class 29/25.01)
  • Patent number: 10784138
    Abstract: There is provided a substrate processing system, including: a carrier transfer region in which a carrier that accommodates a substrate is transferred to a substrate processing apparatus, and a substrate transfer region in which the substrate accommodated in the carrier is transferred to a processing furnace, the substrate transfer region being partitioned from the carrier transfer region by a partition wall; a transfer port formed in the partition wall and through which the substrate is transferred between the carrier transfer region and the substrate transfer region; an opening/closing door configured to open and close the transfer port; and a pressure equalizing part configured to substantially equalize a pressure of the substrate transfer region and a pressure of a space surrounded by the carrier and the opening/closing door.
    Type: Grant
    Filed: February 9, 2018
    Date of Patent: September 22, 2020
    Inventor: Takahiro Abe
  • Patent number: 10781530
    Abstract: A cleaning apparatus is provided. This cleaning apparatus includes an inlet, an outlet, a first conveyance path, a second conveyance path, a cleaning unit disposed on the first conveyance path and configured to clean the target object in a non-contacting manner, and a drying unit disposed on the first conveyance path and configured to dry the target object in a non-contacting manner. The first conveyance path and the second conveyance path are vertically arranged side by side. The second conveyance path is positioned above the first conveyance path and connected with the outlet at an end point. The second conveyance path functions as a stocker configured to temporarily store the target object.
    Type: Grant
    Filed: June 28, 2017
    Date of Patent: September 22, 2020
    Inventor: Junitsu Yamakawa
  • Patent number: 10658222
    Abstract: A substrate processing system includes a processing chamber and a pedestal arranged in the processing chamber. An edge coupling ring is arranged adjacent to a radially outer edge of the pedestal. A first actuator is configured to selectively move the edge coupling ring to a raised position, relative to the pedestal to provide clearance between the edge coupling ring and the pedestal to allow a robot arm to remove the edge coupling ring from the processing chamber.
    Type: Grant
    Filed: May 6, 2015
    Date of Patent: May 19, 2020
    Inventors: Haoquan Yan, Robert Griffith O'Neill, Raphael Casaes, Jon McChesney, Alex Paterson
  • Patent number: 10629445
    Abstract: A wafer processing method for processing a wafer having devices on the front side is provided. The wafer processing method includes a back grinding step of grinding the wafer to form a recess and an annular reinforcing portion surrounding the recess on the back side of the wafer, and a dividing step of cutting the wafer along division lines formed on the front side of the wafer. In the back grinding step, a taper surface is formed between the bottom surface of the recess and the annular reinforcing portion. The taper surface is inclined with respect to a direction perpendicular to the bottom surface of the recess. In the dividing step, a cutting blade is lowered to start cutting at a position radially inside the outer circumference of the wafer and is subsequently raised to stop cutting at another position radially inside the outer circumference of the wafer.
    Type: Grant
    Filed: June 27, 2018
    Date of Patent: April 21, 2020
    Inventors: Katsuhiko Suzuki, Hisashi Arakida, Tomoaki Sugiyama
  • Patent number: 10612631
    Abstract: The integrated circuit chip programming apparatus comprises a fixing device, an actuating device and a flexible device. The fixing device comprises a supporting part and a cover. One end of the cover is coupled with one end of the supporting part and comprises an accommodation space for accommodating a chip therein. The cover selectively covers or uncovers the supporting part so as to close or expose the accommodation space. The flexible device is coupled between the fixing device and the actuating device. When a force is against the forced end, the actuating device is rotated to drive the cover to expose the accommodation space. When no force is against the forced end or the force against the forced end is stopped, the flexible device provides a recovery force to allow the actuating device to rotate to drive the cover to close the accommodation space of the supporting part.
    Type: Grant
    Filed: January 12, 2018
    Date of Patent: April 7, 2020
    Inventor: Chong-Yung Tsao
  • Patent number: 10553469
    Abstract: An electronic device manufacturing system is disclosed. The system includes a processing tool having one or more processing chambers each adapted to perform an electronic device manufacturing process on one or more substrates; a substrate carrier adapted to couple to the system and carry one or more substrates; and a component adapted to create a sealed environment relative to at least a portion of the substrate carrier and to substantially equalize the sealed environment with an environment within the substrate carrier. Methods of the invention are described as are numerous other aspects.
    Type: Grant
    Filed: January 15, 2018
    Date of Patent: February 4, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Michael Robert Rice, Jeffrey C. Hudgens
  • Patent number: 10508355
    Abstract: A plating apparatus enabling a user to conduct maintenance of a substrate holder while an operation of the plating apparatus is being performed is disclosed. The plating apparatus includes: a processing section for plating a substrate; a storage container configured to store the substrate holder for holding the substrate; a transport machine configured to transport the substrate holder between the processing section and the storage container; a maintenance area adjacent to the storage container; and a substrate-holder carrier supported by the storage container. The substrate-holder carrier is movable between the storage container and the maintenance area while supporting the substrate holder.
    Type: Grant
    Filed: July 27, 2017
    Date of Patent: December 17, 2019
    Inventors: Akihiro Yazawa, Kenichi Kobayashi, Yasuyuki Miyasawa, Tsuyoshi Soma
  • Patent number: 10505515
    Abstract: A ladder filter includes a piezoelectric substrate, an antenna terminal, a transmission terminal, and ground terminals on the piezoelectric substrate, and IDT electrodes. Each of the IDT electrodes is disposed on the piezoelectric substrate and includes a plurality of electrode fingers and a pair of busbars to which first ends of the plurality of electrode fingers are connected commonly. The IDT electrodes define elastic wave resonators. The ladder filter further includes an interlayer insulating film disposed on at least one of the busbars and a thermally conductive member made of a material with thermal conductivity higher than that of the interlayer insulating film and disposed on the interlayer insulating film. The thermally conductive member is in contact with at least one of the antenna terminal, the transmission terminal, and the ground terminals.
    Type: Grant
    Filed: January 27, 2017
    Date of Patent: December 10, 2019
    Assignee: Murata Manufacturing Co., Ltd.
    Inventor: Daisuke Ajima
  • Patent number: 10468278
    Abstract: A substrate transfer method of a substrate processing apparatus that includes a load lock chamber including a drive unit that is capable of forming, between a first opening at an atmospheric side and a second opening connected to a transfer chamber of a housing of the load lock chamber, each of a first space in which a single substrate is capable of being transferred, and a second space in which a plurality of substrates are capable of being transferred, the substrate transfer method including selecting either of the first space or the second space of the load lock chamber in accordance with process statuses of substrates at a plurality of processing chambers, and controlling the drive unit based on the selected result to form either of the first space or the second space.
    Type: Grant
    Filed: March 14, 2016
    Date of Patent: November 5, 2019
    Assignee: Tokyo Electron Limited
    Inventor: Shigeru Ishizawa
  • Patent number: 10236406
    Abstract: A targeted-annealing system can automatically cure a conductive paste that may bind cascaded strips of a string. The targeted-annealing system can include a first heat-treating bar that may be heated to a first curing temperature, and can include a second heat-treating bar that may be heated to a second curing temperature. During operation, a controller of the targeted-annealing system can activate one or more actuators to conform the first heat-treating bar to a top surface of two cascaded strips, and conform the second heat-treating bar to a bottom surface of two cascaded strips. The first and second heat-treating bars may be aligned along an overlap portion between the two cascaded strips, and can heat the overlap portion to 160 degrees Celsius.
    Type: Grant
    Filed: September 25, 2015
    Date of Patent: March 19, 2019
    Assignee: SolarCity Corporation
    Inventors: Pablo Gonzalez, Bobby Yang
  • Patent number: 10230017
    Abstract: A string-forming system is described. The string-forming system may include at least a first cell-lifting mechanism and a second cell-lifting mechanism that can automatically arrange a set of strips of a photovoltaic structure into a cascaded formation. During operation, a controller can cause the first cell-lifting mechanism to lift a first strip from a first platform, and can cause the second cell-lifting mechanism to lift, from the first platform, a second strip that may follow the first strip on the first platform. The controller may then activate a first shifting actuator of the first cell-lifting mechanism or a second shifting actuator of the second cell-lifting mechanism to place a leading edge of the second strip above a trailing edge of the first strip.
    Type: Grant
    Filed: March 6, 2017
    Date of Patent: March 12, 2019
    Assignee: SolarCity Corporation
    Inventors: Pablo Gonzalez, Bobby Yang
  • Patent number: 10224151
    Abstract: A capacitor assembly that is capable of performing under extreme conditions, such as at high temperatures and/or high voltages, is provided. The ability to perform at high temperature is achieved in part by enclosing and hermetically sealing the capacitor element within a housing in the presence of a gaseous atmosphere that contains an inert gas, thereby limiting the amount of oxygen and moisture supplied to the solid electrolyte of the capacitor element. Furthermore, the present inventors have also discovered that the ability to perform at high voltages can be achieved through a unique and controlled combination of features relating to the formation of the anode, dielectric, and solid electrolyte. For example, the solid electrolyte is formed from a combination of a conductive polymer and a hydroxy-functional nonionic polymer.
    Type: Grant
    Filed: March 6, 2014
    Date of Patent: March 5, 2019
    Assignee: AVX Corporation
    Inventors: Martin Biler, Jan Petrzilek
  • Patent number: 10153184
    Abstract: A plurality of support pins that support a semiconductor wafer are located upright on a top surface of a susceptor. A condenser lens is located on a bottom surface of the susceptor opposite to the support pins with respect to the susceptor. The condenser lens is located such that its optical axis coincides with the central axis of the corresponding support pin. Of light emitted from halogen lamps from below, light entering the condenser lens is condensed at a contact portion between the corresponding support pin and the semiconductor wafer, so that the vicinity of the contact portion rises in temperature. The vicinity of the contact portion of the semiconductor wafer in contact with the support pin in which the temperature tends to drop is relatively intensely heated in order to suppress the temperature drop, and an in-plane temperature distribution of the semiconductor wafer during light irradiation can thus be made uniform.
    Type: Grant
    Filed: May 10, 2016
    Date of Patent: December 11, 2018
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Kazuhiko Fuse, Yoshio Ito
  • Patent number: 10134613
    Abstract: A system and method for a cluster tool apparatus for processing a semiconductor product including processing modules located adjacent each other and configured to process a semiconductor module, loadlocks configured to retain and dispense unprocessed semiconductor products and each positioned adjacent one of the processing modules, a robot configured to load, transfer and unload a semiconductor product to and from the processing modules, a hardware controller in communication with the robot and executing a method to close down the cluster tool apparatus to an idle state, the method including determining a status of the processing modules, determining if a close down process is required based on the status or based on a close down signal, and, if required, determining a schedule for a close down process based on a semiconductor product residency parameter, and controlling the operation of the robot based on the schedule to perform the close down process.
    Type: Grant
    Filed: September 22, 2016
    Date of Patent: November 20, 2018
    Inventors: Yan Qiao, Mengchu Zhou, Naiqi Wu, Zhiwu Li, Qinghua Zhu
  • Patent number: 10062592
    Abstract: A substrate processing apparatus includes a substrate retaining mechanism; a detecting unit detecting a placed state of the substrate retained by the substrate retaining mechanism; a first determination unit comparing detection data of the substrate obtained by the detecting unit with master data that is a reference to determine if the detection data is within a first allowed value; a confirmation unit confirming substrate type; a second determination unit comparing the detection data of the substrate with the master data to determine if the detection data is within a second allowed value; and a transfer control unit controlling the substrate retaining mechanism depending on a determination result of the second determination unit when substrate type is confirmed as a predetermined type by the confirmation unit when it is determined that the detection data is not within the first allowed value as determined by the first determination unit.
    Type: Grant
    Filed: January 30, 2017
    Date of Patent: August 28, 2018
    Inventors: Junichi Kawasaki, Hajime Abiko
  • Patent number: 10043693
    Abstract: Implementations described herein generally relate to a method and apparatus for processing substrates in a processing system. The method includes identifying, in a buffer chamber coupled to a transfer chamber of a processing system, a first substrate that has been in the buffer chamber longer than a predetermined duration and identifying a first destination chamber of the processing system for the first substrate. After identifying the first substrate, a buffer chamber time-out operation is performed. The buffer time out operation includes suspending movement of substrates from a load lock chamber to the transfer chamber and removing the first substrate from the buffer chamber.
    Type: Grant
    Filed: June 6, 2017
    Date of Patent: August 7, 2018
    Inventors: Jaeyoung Kim, James Hoffman, Atsushi Kitani, Young Taek Kwon
  • Patent number: 10037869
    Abstract: A plasma processing device may include a plasma processing chamber, a plasma electrode assembly, a wafer stage, a plasma producing gas inlet, a plurality of vacuum ports, at least one vacuum pump, and a multi-port valve assembly. The multi-port valve assembly may comprise a movable seal plate positioned in the plasma processing chamber. The movable seal plate may comprise a transverse port sealing surface that is shaped and sized to completely overlap the plurality of vacuum ports in a closed state, to partially overlap the plurality of vacuum ports in a partially open state, and to avoid substantial overlap of the plurality of vacuum ports in an open state. The multi-port valve assembly may comprise a transverse actuator coupled to the movable seal plate and a sealing actuator coupled to the movable seal plate.
    Type: Grant
    Filed: October 9, 2015
    Date of Patent: July 31, 2018
    Assignee: Lam Research Corporation
    Inventors: Daniel A. Brown, Michael C. Kellogg, Leonard J. Sharpless, Allan K. Ronne, James E. Tappan
  • Patent number: 10007198
    Abstract: A method includes providing a semiconductor processing system that includes a plurality of units. Each unit has a configuration that defines a predetermined orientation of a wafer that is provided in the unit and includes a plurality of wafer handling elements. An arrangement of the plurality of wafer handling elements of the unit relative to the predetermined orientation of the wafer is adjustable. For each of the plurality of units, the arrangement of the plurality of wafer handling elements of the unit is adjusted relative to the predetermined orientation of the wafer. For each of the plurality of units, an arrangement of the plurality of wafer handling elements relative to the predetermined orientation of the wafer is provided that is different from the arrangement of the plurality of wafer handling elements relative to the predetermined orientation of the wafer in one or more other units of the plurality of units.
    Type: Grant
    Filed: June 8, 2016
    Date of Patent: June 26, 2018
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Heiko Wagner, Sidheswara Mahapatra
  • Patent number: 10001773
    Abstract: The scheduling problem of a multi-cluster tool with a tree topology whose bottleneck tool is process-bound is investigated. A method for scheduling the multi-cluster tool to thereby generate an optimal one-wafer cyclic schedule for this multi-cluster tool is provided. A Petri net (PN) model is developed for the multi-cluster tool by explicitly modeling robot waiting times such that a schedule is determined by setting the robot waiting times. Based on the PN model, sufficient and necessary conditions under which a one-wafer cyclic schedule exists are derived and it is shown that an optimal one-wafer cyclic schedule can be always found. Then, efficient algorithms are given to find the optimal cycle time and its optimal schedule. Examples are used to demonstrate the scheduling method.
    Type: Grant
    Filed: October 21, 2015
    Date of Patent: June 19, 2018
    Assignee: Macau University of Science and Technology
    Inventors: Naiqi Wu, Qinghua Zhu, Yan Qiao, Mengchu Zhou
  • Patent number: 9998095
    Abstract: A SAW filter includes a substrate, an upper bus bar arranged on the substrate, a lower bus bar arranged on the substrate so as to face the upper bus bar, a first finger IDT arranged so as to be connected to the upper bus bar at one end, a second finger IDT arranged so as to be connected to the lower bus bar at one end, a passivation part formed on the first finger IDT and the second finger IDT, a first metal part formed on the passivation part and including all area of the upper bus bar and a partial area of the first finger IDT, and a second metal part formed on the passivation part and including all area of the lower bus bar and a partial area of the second finger IDT.
    Type: Grant
    Filed: March 31, 2016
    Date of Patent: June 12, 2018
    Assignee: WISOL CO., LTD.
    Inventor: Dong Jun You
  • Patent number: 9972519
    Abstract: A substrate transporting apparatus includes a first light emitting sensor emitting a first sensing light in a first direction, a first light receiving sensor receiving the first sensing light, a second light emitting sensor emitting a second sensing light in a second direction different than the first direction, a second light receiving sensor receiving the second sensing light, a substrate transporting loader passing through traveling lines of the first sensing light and the second sensing light, a state information storage unit storing state information of the substrate transporting loader, and an operation information computing unit computing operation information of the substrate transporting loader based on the state information.
    Type: Grant
    Filed: January 14, 2015
    Date of Patent: May 15, 2018
    Inventors: Nam-Su Yuk, Jae-Won Jeong, Ho-Youl Lee, Ju-No Park, Jae-Young Eom
  • Patent number: 9934992
    Abstract: A heater or cooler chamber for a batch of more than one workpiece includes a heat storage block. In the block a multitude of pockets are provided, whereby each of the pockets may be closed or opened by a controllably operated door. A heater or cooler arrangement is applied. The pockets are tailored to surround a workpiece applied therein in a non-contact closely spaced manner.
    Type: Grant
    Filed: December 10, 2015
    Date of Patent: April 3, 2018
    Assignee: EVATEC AG
    Inventor: Jurgen Weichart
  • Patent number: 9761471
    Abstract: A manufacturing line for a semiconductor device according to the invention is a manufacturing line for manufacturing a semiconductor device by circulating a workpiece along a conveyance route on which a plurality of treatment devices are arranged. The conveyance route includes a first route on which the treatment devices with a large number of times of treatment are arranged, and a second route on which the treatment devices with a small number of times of treatment are arranged. Besides, the conveyance route makes a changeover between the conveyance of the workpiece that has moved along the first route to the first route in a continuous manner, and the conveyance of the workpiece that has moved along the first route to the second route.
    Type: Grant
    Filed: June 12, 2015
    Date of Patent: September 12, 2017
    Inventor: Daisuke Sugizaki
  • Patent number: 9728432
    Abstract: A method of degassing semiconductor substrates includes sequentially loading a plurality of semiconductor substrates into a degas apparatus, and degassing the semiconductor substrates in parallel, the degassing of each semiconductor substrate commencing at a different time related to the time at which the semiconductor substrate was loaded into the degas apparatus. The method further includes unloading a semiconductor substrate from the degas apparatus when the semiconductor substrate has been degassed, while semiconductor substrates which were loaded later in the sequence are still being degassed. The degassing of the semiconductor substrates is performed at pressure of less than 10?4 Torr, and the degas apparatus is pumped continuously during the degassing of the semiconductor substrates.
    Type: Grant
    Filed: November 24, 2015
    Date of Patent: August 8, 2017
    Inventors: Stephen R Burgess, Anthony Paul Wilby
  • Patent number: 9728431
    Abstract: The present invention provides a technique for improving the productivity of a processing apparatus including a plurality of process chambers. There is provided a technique including a method for manufacturing a semiconductor device including: (a) transferring a last remaining substrate stored in an xth storage unit of a plurality of storage units to an empty nth chamber in an mth processing unit of a plurality of processing units; and (b) transferring a first one of a plurality of substrates stored in an (x+1)th storage unit of the plurality of storage units to one of chambers in an (m+1)th processing unit of the plurality of processing units (where x, m and n are natural numbers).
    Type: Grant
    Filed: December 28, 2015
    Date of Patent: August 8, 2017
    Inventors: Naofumi Ohashi, Toshiyuki Kikuchi, Shun Matsui, Tadashi Takasaki
  • Patent number: 9659799
    Abstract: Embodiments of the present disclosure can help increase throughput and reduce resource conflicts and delays in semiconductor processing tools. An exemplary method according to various aspects of the present disclosure includes analyzing, by a computer program operating on a computer system, a plurality of expected times to complete each of a respective plurality of actions to be performed by a semiconductor processing tool, the semiconductor processing tool including a first process module and a second process module.
    Type: Grant
    Filed: August 28, 2012
    Date of Patent: May 23, 2017
    Assignee: ASM IP Holding B.V.
    Inventors: Keith R. Lawson, Michael E. Givens
  • Patent number: 9624594
    Abstract: A plating apparatus is described. The apparatus includes: a substrate holder configured to hold a substrate in a vertical position; at least one processing bath configured to process the substrate held by the substrate holder; a transporter configured to grip and horizontally transport the substrate holder; at least one lifter configured to receive the substrate holder from the transporter, lower the substrate holder to place the substrate holder in the processing bath, elevate the substrate holder from the processing bath after processing of the substrate, and transfer the substrate holder to the transporter; and a controller configured to control operations of the transporter and the lifter.
    Type: Grant
    Filed: February 28, 2014
    Date of Patent: April 18, 2017
    Assignee: Ebara Corporation
    Inventors: Yoshio Minami, Ryuya Koizumi
  • Patent number: 9607871
    Abstract: An object is to prevent down flow gas from entering into a pod in an open state in an EFEM system. An upper canopy is provided along the upper edge of an opening portion on the mini-environment side to block down flow along the opening portion. The upper canopy provides a space in which inert gas supplied through a supply port provided in the pod flows into the mini-environment through the opening of the pod after circulating inside the pod. The down flow has no effect in this space, and the entrance of down flow into the pod can be prevented.
    Type: Grant
    Filed: March 23, 2015
    Date of Patent: March 28, 2017
    Assignee: TDK Corporation
    Inventor: Tadamasa Iwamoto
  • Patent number: 9564317
    Abstract: A method of fabricating a semiconductor device is disclosed. The method includes forming a first material layer over a substrate. The first material layer has a sidewall defining a first opening, wherein the first opening has a first shape. The method also includes forming a sacrificial feature within the first opening and the sacrificial feature has a second shape, which is different than the first shape such that there is a cavity between an edge of the sacrificial feature and the sidewall of the first material layer. The method also includes filling in cavity with a second material layer, removing the sacrificial feature to form a second opening, filling in the second opening with a third material layer, removing the second material layer to reveal the cavity and forming a conductive feature within the cavity.
    Type: Grant
    Filed: December 2, 2015
    Date of Patent: February 7, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yee-Chia Yeo, Blandine Duriez, Martin Christopher Holland
  • Patent number: 9499908
    Abstract: A thin film deposition system for depositing a thin film on a moveable substrate using atmospheric pressure atomic-layer deposition includes a chamber and a moveable substrate having a levitation stabilizing structure located on the moveable substrate that defines an enclosed interior impingement area of the moveable substrate. A stationary support, located in the chamber, supports the moveable substrate. The stationary support extends beyond the enclosed interior impingement area. A pressurized-fluid source provides a fluid flow through the stationary support that impinges on the moveable substrate within the enclosed interior impingement area of the moveable substrate sufficient to levitate the moveable substrate and expose the moveable substrate to the fluid while restricting the lateral motion of the moveable substrate with the levitation stabilizing structure.
    Type: Grant
    Filed: February 13, 2015
    Date of Patent: November 22, 2016
    Inventors: Kurt D. Sieber, Kam Chuen Ng, Ronald Steven Cok
  • Patent number: 9454684
    Abstract: According to an exemplary embodiment, a method of detecting edge cracks in a die under test is provided. The method includes the following operations: receiving a command signal; providing power from the command signal; providing a response signal based on the command signal; and self-destructing based on the command signal.
    Type: Grant
    Filed: May 28, 2014
    Date of Patent: September 27, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: Huang-Ting Hsiao, An-Tai Xu, Pei-Haw Tsao, Cheng-Hung Tsai, Tsui-Mei Chen, Nai-Cheng Lu
  • Patent number: 9437433
    Abstract: Embodiments of method for cooling a wafer in an ion implantation process are provided. A method for cooling the wafer in the ion implantation process includes placing the wafer in a process module. The method also includes performing the ion implantation process on the wafer and simultaneously cooling the wafer in the process module. The method further includes removing the wafer from the process module. In addition, the method includes heating up the wafer.
    Type: Grant
    Filed: February 3, 2014
    Date of Patent: September 6, 2016
    Inventors: Kuo-Yuan Ho, Jung-Wei Lee, Ming-Te Chen
  • Patent number: 9385016
    Abstract: In a processing system of a linear tool in which plural carrying robots are arranged in carrying mechanical units to which processing modules are coupled and a processing target is delivered and received between the plural carrying robots, in the case where there are plural carrying routes on which the processing target is carried, the present invention provides a technique for determining the carrying route on which the highest throughput can be obtained. In the processing system of a linear tool, in the case where there are plural carrying routes on which the processing target is carried, the throughputs of the respective carrying routes are compared to each other, and the carrying route is determined by a unit for selecting the carrying route with the highest throughput.
    Type: Grant
    Filed: December 13, 2010
    Date of Patent: July 5, 2016
    Inventors: Teruo Nakata, Hideaki Kondo, Keita Nogi
  • Patent number: 9378896
    Abstract: A solid electrolytic capacitor includes a porous sintered body made of a valve metal, a dielectric layer on the porous sintered body, a solid electrolyte layer on the dielectric layer, and a cathode layer on the solid electrolyte layer. The solid electrolyte layer includes an inner electrode layer covering the dielectric layer inside the porous sintered body and an outer electrode layer covering the inner electrode layer outside the porous sintered body. The outer electrode layer includes a solid particle containing layer formed by applying a dispersion material liquid containing a conductive polymer dispersion material, solid particles and a solvent to the inner electrode layer and then removing the solvent.
    Type: Grant
    Filed: November 8, 2013
    Date of Patent: June 28, 2016
    Assignee: ROHM CO., LTD.
    Inventor: Naotsugu Sugimura
  • Patent number: 9293268
    Abstract: A method for fabricating an EDLC includes (a) coating a porous activated carbon material onto current collector sheets to form carbon-based electrodes, (b) drying the carbon-based electrodes, (c) winding or stacking carbon-based electrodes interleaved with separator sheets to fabricate a jelly roll or prismatic electrode assembly, (d) inserting the electrode assembly into a package and forming electrical connections between the electrode assembly and package terminals, (e) filling the package with a liquid electrolyte, and (f) sealing the package. Steps (a)-(f) are performed in an atmosphere having a low moisture content. The atmosphere may be vacuum or purged with dry gas.
    Type: Grant
    Filed: November 22, 2013
    Date of Patent: March 22, 2016
    Assignee: Corning Incorporated
    Inventors: John Paul Krug, Kamjula Pattabhirami Reddy, James Scott Sutherland, Todd Marshall Wetherill
  • Patent number: 9272926
    Abstract: A membrane enhanced deionized capacitor (MEDC) device, consisting of insulating plates (6,7) and a series of MEDC unit cells, is provided. The MEDC unit cell includes a cation and anion ion-exchange membranes (2,4), one pair of carbon electrodes (1-1,1-2), a spacer (3) and an insulating holder (5) and is assembled in the order of [(1-1)/(2)/(3)/(5)/(4)/(1-2)]. The cation-exchange membrane combined with one electrode is used as negative electrosorptive electrode while the anion-exchange membrane combined with another electrode is used as positive electrode. Unit cells can be connected with each other in series, or in parallel. The devices can be made as either stack type or roll type.
    Type: Grant
    Filed: December 18, 2011
    Date of Patent: March 1, 2016
    Inventors: Zhuo Sun, Likun Pan, Haibo Li, Yi Sun
  • Patent number: 9245783
    Abstract: A robot for use in vacuum chambers is disclosed. The robot may be mounted within an oblong transfer chamber and may be translated within the transfer chamber by an umbilical arm operating in conjunction with a linear motion guide and carriage. Motors or drive systems for the robot may be housed in atmospheric conditions, and the transfer chamber may be kept at a vacuum. The robot may include one or more arms configured for wafer handling. The robot may include one or more motors or drive systems and a multi-axial seal to realize independent extension/retraction of each arm and overall simultaneous rotation of the arm assembly.
    Type: Grant
    Filed: May 24, 2013
    Date of Patent: January 26, 2016
    Assignee: Novellus Systems, Inc.
    Inventor: Richard M. Blank
  • Patent number: 9147592
    Abstract: In some embodiments, a linked processing tool system is provided that includes (1) a first processing tool having at least a first transfer chamber configured to couple to a plurality of processing chambers; (2) a second processing tool having at least a second transfer chamber configured to couple to a plurality of processing chambers; (3) a third transfer chamber coupled between the first and second processing tools and configured to transfer substrates between the first and second processing tools; and (4) a single sequencer that controls substrate transfer operations between the first processing tool, the second processing tool and the third transfer chamber of the linked processing tool system. Numerous other aspects are provided.
    Type: Grant
    Filed: August 7, 2013
    Date of Patent: September 29, 2015
    Assignee: Applied Materials, Inc.
    Inventors: Eric A. Englhardt, Steve Szudarski, Andrew Scott Cornelius, Amitabh Puri, Michael Robert Rice, Jeffrey C. Hudgens, Steven V. Sansoni, Robert Irwin Decottignies, Dean C. Hruzek, Peter Irwin, Nir Merry
  • Patent number: 9138980
    Abstract: The present invention relates to an apparatus for the manufacture of semiconductor devices wherein the apparatus includes a bonding module that has a vacuum chamber to provide bonding of wafers under pressure below atmospheric pressure; and a loadlock module connected to the bonding module and configured for wafer transfer to the bonding module. The loadlock module is also connected to a first vacuum pumping device configured to reduce the pressure in the loadlock module to below atmospheric pressure. The bonding and loadlock modules remain at a pressure below atmospheric pressure while the wafer is transferred from the loadlock module into the bonding module.
    Type: Grant
    Filed: September 21, 2012
    Date of Patent: September 22, 2015
    Assignee: SOITEC
    Inventors: Marcel Broekaart, Ionut Radu
  • Patent number: 9117048
    Abstract: A layout pattern generating apparatus and a layout pattern generating method for an element used for layout design of a semiconductor integrated circuit (LSI) provide a reduction in time for generating a layout pattern with high versatility. The layout pattern generating apparatus for generating a layout pattern of each of elements included in a semiconductor integrated circuit, includes, for example, a storage, a basic figure generator, an additional figure generator, a display unit and an operation input unit. The apparatus and method also utilize at least terminal figure relative position information, figure adjustment value information, and additional figure relative position information, the additional figure being a figure other than the basic figure. The basic figure generator generates the effective area figure and the terminal figure of the layout pattern generation target element, and the additional figure generator generates the additional figure of the layout pattern generation target element.
    Type: Grant
    Filed: June 16, 2011
    Date of Patent: August 25, 2015
    Assignee: LAPIS Semiconductor Co., Ltd.
    Inventor: Yukio Shimizu
  • Patent number: 9099506
    Abstract: A bridging chamber is constructed between adjacent substrate processing workstation systems and connected by ports constructed in the adjacent substrate processing workstation systems. Transport mechanisms are used to move the substrates into and out of the bridging chamber to bypass primary transport systems.
    Type: Grant
    Filed: March 30, 2005
    Date of Patent: August 4, 2015
    Assignee: Brooks Automation, Inc.
    Inventor: Clinton M. Haris
  • Patent number: 9076716
    Abstract: The present invention provides methods and systems for discretized, combinatorial processing of regions of a substrate such as for the discovery, implementation, optimization, and qualification of new materials, processes, and process sequence integration schemes used in integrated circuit fabrication. A substrate having an array of differentially processed regions thereon is processed by delivering materials to or modifying regions of the substrate.
    Type: Grant
    Filed: November 11, 2013
    Date of Patent: July 7, 2015
    Assignee: Intermolecular, Inc.
    Inventors: Thomas R. Boussie, Tony P. Chiang, Alexander Gorer, David E. Lazovsky
  • Patent number: 9059223
    Abstract: A combinatorial processing system having modular dispense heads is provided. The modular dispense heads are disposed on a rail system enabling an adjustable pitch of the modular dispense heads for the combinatorial processing. The modular dispense heads are configured so that sections of the modular dispense heads are detachable in order to accommodate various processes through a first section without having to completely disconnect and re-connect facilities to a second section.
    Type: Grant
    Filed: December 11, 2008
    Date of Patent: June 16, 2015
    Assignee: Intermolecular, Inc.
    Inventors: Kurt Weiner, Aaron Francis, Ken Williams
  • Publication number: 20150143677
    Abstract: A solid solution-comprising ceramic article useful in semiconductor processing, which article may be in the form of a solid, bulk ceramic, or may be in the form of a substrate having a ceramic coating of the same composition as the bulk ceramic material on at least one outer surface. The ceramic article is resistant to erosion by halogen-containing plasmas and provides advantageous mechanical properties. The solid solution-comprising ceramic article is formed from a combination of yttrium oxide and zirconium oxide. The ceramic-comprising article includes ceramic which is formed from zirconium oxide at a molar concentration ranging from about 96 mole % to about 91 mole %, and yttrium oxide at a molar concentration ranging from about 4 mole % to about 9 mole %.
    Type: Application
    Filed: November 26, 2013
    Publication date: May 28, 2015
    Applicant: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Ren-Guan Duan, Jie Yuan, Li Xu, Kenneth S. Collins
  • Publication number: 20150143678
    Abstract: The present invention relates to a method of manufacturing an optical device for a back light unit, and an optical device and an optical device array manufactured by the method, in which optical device chips constituting the optical device array are each laid the sides thereof on a printed circuit board in such a manner that light can be emitted from the optical device chips in a lateral direction, thus reducing the overall thickness of the back light unit.
    Type: Application
    Filed: January 30, 2015
    Publication date: May 28, 2015
    Inventors: Bum Mo Ahn, Seung Ho Park, Ki Myung Nam
  • Publication number: 20150149713
    Abstract: An improved memory interface design is provided. In some implementations, an integrated circuit includes a first cache memory unit, a second cache memory unit located in parallel with the first cache memory unit, and a floorsweeping module configured to be able to select between the first cache memory unit and the second cache memory unit for cache requests, wherein the selection is based at least partially on the presence or absence of one or more manufacturing defects in the first cache memory unit or the second cache memory unit.
    Type: Application
    Filed: November 22, 2013
    Publication date: May 28, 2015
    Applicant: Nvidia Corporation
    Inventors: Michael Asbury Woodmansee, J. Arjun Prabhu
  • Publication number: 20150148794
    Abstract: Medical devices and methods for making and using medical devices are disclosed. An example medical device for sympathetic nerve ablation may include a catheter shaft. An expandable balloon may be coupled to the catheter shaft. The balloon may be capable of shifting between an unexpanded configuration and an expanded configuration. The balloon may include a first layer and a second layer. The first layer may include a convertible circuit. An electrode may be coupled to the balloon and may be in electrical contact with the convertible circuit.
    Type: Application
    Filed: November 20, 2014
    Publication date: May 28, 2015
  • Publication number: 20150131940
    Abstract: An optical subassembly includes a thru optical via (104) formed through a semiconductor substrate (102), an optoelectronic component (108) secured to the substrate (102) such that an active region (106) of the optoelectronic component is aligned with the thru optical via (104), and circuitry (110) formed into the substrate (102), the circuitry to connect to and operate in accordance with the optoelectronic component (108).
    Type: Application
    Filed: April 16, 2012
    Publication date: May 14, 2015
    Inventors: Paul Kessler Rosenberg, Michael Renne Ty Tan, Sagi Varghese Mathai, Joseph Straznicky
  • Publication number: 20150130547
    Abstract: A manufacturing method of an oscillator is a manufacturing method of an oscillator which includes a vibrator and a semiconductor circuit device including an oscillation part connected to the vibrator and a control part to switch an operation mode between a normal mode in which the oscillation part performs an oscillation operation and an inspection mode in which characteristics of the vibrator are inspected, and the manufacturing method includes preparing the semiconductor circuit device in which the operation mode is set to the inspection mode, connecting the semiconductor circuit device and the vibrator electrically, and inspecting the characteristics of the vibrator which is in a state electrically connected to the semiconductor circuit device.
    Type: Application
    Filed: November 10, 2014
    Publication date: May 14, 2015
    Inventors: Masayuki ISHIKAWA, Yosuke ITASAKA, Takehiro YAMAMOTO, Akihiro FUKUZAWA
  • Publication number: 20150129662
    Abstract: A chip card device including a card-like carrier having received therein a semiconductor substrate in the form of a chip, the semiconductor substrate including at least a memory element and is provided with contact surfaces which are accessible on the surface of the card-like carrier to enable reading of the memory element therewith. The card-like carrier including a linear fold line configured for placing, on or close to a card part including the contact surfaces, a further card part situated on the side of the fold line remote from the card part.
    Type: Application
    Filed: May 21, 2013
    Publication date: May 14, 2015
    Inventor: Louis Rinze Henricus Adrianus Willemsen