With Etching Or Machining Of Magnetic Material Patents (Class 29/603.15)
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Patent number: 8171618Abstract: A method of forming a write pole for a magnetic recording device is provided. The method comprises providing a layer of magnetic material covered with a secondary hard mask layer and a patterned primary hard mask, milling at a first milling angle to transfer a pattern from the patterned primary hard mask to the secondary hard mask, and milling at a second milling angle to transfer the pattern from the secondary hard mask to the layer of magnetic material to form the write pole. The second milling angle is greater than the first milling angle. The method further comprises milling at a third milling angle to adjust a side wall angle of the write pole to about a desired side wall angle, and milling at a fourth milling angle to reduce a track width of the write pole to a desired track width.Type: GrantFiled: June 17, 2009Date of Patent: May 8, 2012Assignee: Western Digital (Fremont), LLCInventors: Lei Wang, Ge Yi
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Patent number: 8166630Abstract: To provide a manufacturing method which can adjust the lengths of a recording element and a reproducing element for enabling manufacture of high-quality magnetic head sliders. The manufacturing method comprises: a stacked-layer forming step which stacks magnetic heads on a substrate; a lapping step which cuts out a bar block having a plurality of connected magnetic head sliders, and polishes a flying surface; and a slider cutting step which cuts out individual magnetic head sliders from the bar block. The stacked-layer forming step forms a reproducing-element polish amount detecting sensor on a same layer as that of the reproducing element, and forms a recording-element polish amount detecting sensor on a same layer as that of the recording element. The lapping step carries out polishing based on each output value of the reproducing-element polish amount detecting sensor and the recording-element polish amount detecting sensor.Type: GrantFiled: November 3, 2008Date of Patent: May 1, 2012Assignee: SAE Magnetics (H.K.) Ltd.Inventors: Ryuji Fujii, Ikuhito Onodera, Quan Bao Wang, Masahiro Kuribayashi
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Patent number: 8166632Abstract: A method and system for providing a PMR transducer including an intermediate layer. The method and system include providing a hard mask layer on the intermediate layer. The hard mask layer is for a reactive ion etch of the intermediate layer. The method and system also include providing a bottom antireflective coating (BARC) layer on the hard mask layer. The BARC layer is also a masking layer for the hard mask layer. The method and system also include forming a trench in the intermediate layer using at least one reactive ion etch (RIE). The trench has a bottom and a top wider than the bottom. The method and system also include providing a PMR pole. At least a portion of the PMR pole resides in the trench.Type: GrantFiled: March 28, 2008Date of Patent: May 1, 2012Assignee: Western Digital (Fremont), LLCInventors: Jinqiu Zhang, Liubo Hong, Yong Shen, Donghong Li
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Patent number: 8166631Abstract: A method provides a magnetic transducer that includes an underlayer and a nonmagnetic layer on the underlayer. The method includes providing a plurality of trenches in the nonmagnetic layer. A first trench of corresponds to a main pole, while at least one side trench corresponds to at least one side shield. The method also includes providing mask covering the side trench(es) and providing the main pole. At least a portion of the main pole resides in the first trench. The method also includes removing at least a portion of the nonmagnetic layer residing between the side trench(es) and the main pole. The method also includes providing at least one side shield. The shield(s) extend from at least an air-bearing surface location to not further than a coil front location.Type: GrantFiled: August 27, 2008Date of Patent: May 1, 2012Assignee: Western Digital (Fremont), LLCInventors: Ut Tran, Zhigang Bai, Kevin K. Lin
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Patent number: 8166633Abstract: A method for manufacturing an extraordinary magnetoresistive sensor (EMR sensor) having reduced size and increased resolution is described. The sensor includes a plurality of electrically conductive leads contacting a magnetically active layer and also includes an electrically conductive shunt structure. The electrically conductive leads of the sensor and the shunt structure can be formed in a common photolithographic masking and etching process so that they are self aligned with one another. This avoids the need to align multiple photolithographic processing steps, thereby allowing greatly increased resolution and reduced lead spacing. The EMR sensor can be formed with a magnetically active layer that can be close to or at the air bearing surface (ABS) for improved magnetic spacing with an adjacent magnetic medium of a data recording system.Type: GrantFiled: December 17, 2010Date of Patent: May 1, 2012Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Thomas Dudley Boone, Jr., Liesl Folks, Bruce Alvin Gurney, Jordan Asher Katine, Ernesto E. Marinero, Neil Smith
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Patent number: 8161627Abstract: A method in one embodiment includes forming an electric lapping guide layer; forming a write pole; forming a first gap layer over the write pole; masking a portion of the first gap layer for defining a window over the write pole and at least a portion of the electric lapping guide layer; and forming a bump over the write pole in the window. Additional methods and systems are presented.Type: GrantFiled: April 28, 2008Date of Patent: April 24, 2012Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Christian Rene Bonhote, Jeffrey S. Lille, Vladimir Nikitin, Aron Pentek, Neil Leslie Robertson
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Patent number: 8151442Abstract: Magnetoresistive (MR) elements having flux guides defined by the free layer. The MR element includes a free layer, a spacer/barrier layer, a pinned layer, and a pinning layer. A back edge of the free layer (opposite the sensing surface of the MR element) extends past a back edge of the spacer/barrier layer. The portion of the free layer extending past the back edge of the spacer/barrier layer defines a continuous flux guide. The flux guide is processed to reduce the conductive characteristics of the flux guide, thereby reducing current shunt loss in the flux guide.Type: GrantFiled: March 31, 2010Date of Patent: April 10, 2012Assignee: Hitachi Global Strorage Technologies Netherlands, B.V.Inventor: Hardayal S. Gill
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Patent number: 8146236Abstract: A method and system for providing a perpendicular magnetic recording (PMR) transducer from pole layer(s) are disclosed. First and second planarization stop layers are provided on the pole layer(s). A mask is provided on the second planarization stop layer. A first portion of the mask resides on a portion of the pole layer(s) used to form the PMR pole. The PMR pole is defined after the mask is provided. An intermediate layer surrounding at least the PMR pole is provided. A first planarization is performed on at least the intermediate layer. A portion of the second planarization stop layer is removed during the first planarization. A remaining portion of the second planarization stop layer is removed. A second planarization is performed. A portion of the first planarization stop layer remains after the second planarization. A write gap and shield are provided on the PMR pole and write gap, respectively.Type: GrantFiled: March 28, 2008Date of Patent: April 3, 2012Assignee: Western Digital (Fremont), LLCInventors: Guanghong Luo, Liubo Hong, Honglin Zhu, Yun-Fei Li, Yingjian Chen
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Patent number: 8146237Abstract: In a magnetic head manufacturing method, a floated surface of each block having plural magnetic head elements formed and arranged on a substrate is ground and lapped in a grinding/lapping step. The grinding/lapping step contains an angle adjusting step for adjusting the angle of the floated surface of the block with reference to a magnetic-head-element formed surface of a substrate and grinding the floated surface concerned, and a finishing lapping step of lapping the floated surface at an angle adjusted in the angle adjusting step.Type: GrantFiled: April 28, 2009Date of Patent: April 3, 2012Assignee: SAE Magnetics (H.K.) Ltd.Inventors: Yoshiaki Ito, Osamu Fukuroi, Hiroyasu Tuchiya, Kenji Kodaka
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Patent number: 8141235Abstract: A method for manufacturing a perpendicular magnetic recording transducer is described. A metallic underlayer, an insulator on the metallic underlayer, and a metal mask on the insulator are provided. The metal mask has an aperture therein. A trench is formed in the insulator. The trench's bottom is narrower than its top and includes part of the metallic underlayer. The top has a width of not more than 0.28 micron. A nonmagnetic seed layer that substantially covers at least the trench bottom and sides and that has a thickness of at least five hundred Angstroms is provided. A perpendicular magnetic pole material is plated on at least part of the seed layer. A CMP is performed, removing part of the perpendicular magnetic pole material. A remaining portion of the perpendicular magnetic pole material forms a perpendicular magnetic recording pole. The nonmagnetic seed layer is a stop layer for the CMP.Type: GrantFiled: June 9, 2006Date of Patent: March 27, 2012Assignee: Western Digital (Fremont), LLCInventor: Lei Larry Zhang
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Patent number: 8136227Abstract: A magnetic head having non-GMR shunt for perpendicular recording and method for making magnetic head having non-GMR shunt for perpendicular recording is disclosed. A shunt is provided for shunting charge from a read sensor. The shunt is formed co-planar with the read sensor and is fabricated using non-GMR materials.Type: GrantFiled: October 11, 2005Date of Patent: March 20, 2012Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Michael Feldbaum, Quang Le, Edward H. Lee, Neil L. Robertson, Charles G. Seegel, III
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Patent number: 8137570Abstract: A method for manufacturing a magnetic write head having a wrap around magnetic trailing shield and a very narrow track width. A magnetic write pole is formed by forming a mask over a magnetic write pole material and performing a first ion milling to define the write pole. The mask includes a hard mask layer such as diamond like carbon (DLC) and further mask layers formed over the hard mask layer. In order to facilitate manufacture at very narrow track widths processes are employed to remove re-deposited material and the remaining portions of the mask structure (except the hard mask). Further processing can then be employed without the risk of a very narrow mask structure and redep bending or breaking during later manufacturing steps.Type: GrantFiled: April 9, 2008Date of Patent: March 20, 2012Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventor: Quang Le
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Patent number: 8136228Abstract: A method for manufacturing a magnetic write head that avoids the challenges associated with the formation of fence structures during write pole definition. A magnetic write pole material is deposited. A mask structure is deposited over the magnetic write pole material. The mask structure includes a first hard mask, a marker layer, a physically robust, inorganic RIEable image transfer layer, a second hard mask structure over the image transfer layer and a photoresist layer over the second hard mask. A reactive ion etching process can be used to transfer the image of the photoresist mask and second hard mask layer onto the image transfer layer. An ion milling is performed to define the write pole. A layer of non-magnetic material such as alumina is deposited. An ion milling is performed until the marker layer has been reached, and another reactive ion etching is performed to remove the remaining hard mask.Type: GrantFiled: December 24, 2008Date of Patent: March 20, 2012Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Aron Pentek, Sue Siyang Zhang, Yi Zheng
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Patent number: 8117738Abstract: A perpendicular magnetic recording (PMR) head is fabricated with a self-aligned pole tip shielded laterally by a separated pair of side shields and shielded from above by an upper shield. The side shields are formed from a shield layer by a RIE process characterized by a mask and gases producing a variety of etch rates. The differential in etch rates maintains the opening dimension within the mask and allows the formation of a wedge-shaped trench within the shield layer that then separates the layer into two shields. The pole tip is then plated within the trench and an upper shield is formed above the side shields and pole.Type: GrantFiled: February 28, 2011Date of Patent: February 21, 2012Assignee: Headway Technologies, Inc.Inventors: Cherng-Chyi Han, Min Li, Fenglin Liu, Jiun-Ting Lee
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Patent number: 8117737Abstract: A manufacturing method for a magnetic head includes the steps of: forming a structure on a lower shield, the structure including a lower gap, a main magnetic pole and first and second side gaps; forming first and second side shields; forming an upper gap; and forming an upper shield. In the step of forming the structure, an initial lower gap layer is formed on the lower shield, the initial lower gap layer including a pre-lower-gap portion, and two to-be-removed portions that are located on opposite sides of the pre-lower-gap portion. Then, a protrusion including the main magnetic pole and the first and second side gaps is formed on the pre-lower-gap portion. With the top surface of the protrusion covered with a mask, the initial lower gap layer is etched in part to thereby form the lower gap.Type: GrantFiled: November 30, 2009Date of Patent: February 21, 2012Assignee: TDK CorporationInventors: Hisayoshi Watanabe, Masachika Hashino, Michitoshi Tsuchiya, Koichi Otani, Tatsuhiro Nojima, Tsutomu Nishinaga, Hideyuki Ukita
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Patent number: 8108985Abstract: A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole, and then depositing a refill layer. A mask structure can be formed over the writ pole and refill layer, the mask structure being configured to define a stitched pole. An ion milling or reactive ion milling can then be performed to remove portions of the refill layer that are not protected by the mask structure. Then a magnetic material can be deposited to form a stitched write pole that defines a secondary flare point. The stitched pole can also be self aligned with an electrical lapping guide in order to accurately locate the front edge of the secondary flare point relative to the air bearing surface of the write head.Type: GrantFiled: November 2, 2007Date of Patent: February 7, 2012Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Yi Zheng, Yimin Hsu, Wen-Chien David Hsiao, Ming Jiang, Aron Pentek, Sue Siyang Zhang, Edward Hin Pong Lee, Hung-Chin Guthrie, Ning Shi, Vladimir Nikitin, Prabodh Ratnaparkhi, Yinshi Liu
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Patent number: 8108986Abstract: A method for manufacturing a magnetic write head for perpendicular magnetic recording, the write head having a write pole with an increased bevel (taper) angle. The write pole is constructed by forming a mask structure over a magnetic write pole material, and then performing a combination of sweeping or rotation with static (non-rotating, non-sweeping) ion milling at an angle relative to normal. The ion milling is performed while moving the wafer laterally within the ion milling tool to ensure that the ion milling is performed uniformly across the wafer during static milling.Type: GrantFiled: December 28, 2007Date of Patent: February 7, 2012Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventor: Yinshi Liu
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Patent number: 8104166Abstract: A method is provided for fabricating a read element with leads that overlay a top surface of a sensor of the read element. The method includes forming a mask over a sensor layer, then using the mask to define the sensor from the sensor layer. The mask is then narrowed and a lead layer is formed that overlays both ends of the top surface of the sensor without covering a center portion of the top surface.Type: GrantFiled: December 19, 2003Date of Patent: January 31, 2012Assignee: Western Digital (Fremont), LLCInventors: Jinqiu Zhang, Ming Zhao, Mohamad T. Krounbi, Henry Yuan, Lien-Chang Wang
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Patent number: 8091210Abstract: A method provides a structure in a magnetic recording transducer. The structure resides on an underlayer. The method includes providing a protective layer and providing layer(s) for the structure. The protective layer covers a field region but exposes a device region in which the structure is to reside. A first portion of the layer(s) reside in the device region, while a second portion of the layer(s) reside in the field region. The method also includes removing the second portion of the layer(s) using an over-removal condition. The underlayer is covered by a remaining portion of the protective layer after the removing step is completed. The method also includes removing the remaining portion of the protective layer. An underlayer removal rate is substantially less than a protective layer during the step of removing of the protective layer.Type: GrantFiled: March 5, 2008Date of Patent: January 10, 2012Assignee: Western Digital (Fremont), LLCInventors: Keith Y. Sasaki, Christopher T. Ngo
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Patent number: 8087157Abstract: Using a beam of xenon ions together with a suitable mask, a MTJ stack is ion milled until a part of it, no more than about 0.1 microns thick, has been removed so that a pedestal, having sidewalls comprising a vertical section that includes all of the free layer, has been formed. This is followed by formation of the longitudinal bias and conductive lead layers in the usual way. Using xenon as the sputtering gas enables the point at which milling is terminated to be more precisely controlled.Type: GrantFiled: October 18, 2007Date of Patent: January 3, 2012Assignees: Headway Technologies, Inc., TDK CorporationInventors: Stuart Kao, Chunping Luo, Chaopeng Chen, Takahiko Machita, Daisuke Miyauchi, Jeiwei Chang
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Patent number: 8082658Abstract: Methods of lapping rows of recording heads are described after an air bearing surface (ABS) damascene process is performed. The ABS damascene process uses a selective etching process to form voids in the row of recording heads where conductive material forms a feature in the recording head, such as a wrap around shield. The conductive material is then deposited on the ABS of the row to fill the voids, and the row is lapped. According to methods provided herein, the resistance of one or more lapping guides in the row of recording heads is monitored to determine when the conductive material is removed by the lapping process. When the monitored resistance indicates that the conductive material is removed, the lapping process is stopped. The resistance across one or more lapping guides may also be used to control the lapping process to uniformly lap the conductive material from the ABS.Type: GrantFiled: February 25, 2008Date of Patent: December 27, 2011Assignee: Hitachi Global Storage Technologies Netherlands, B.V.Inventors: Thomas D. Boone, Jr., Glenn P. Gee, Paul A. Goddu, John P. Herber, Hicham M. Sougrati, Huey-Ming Tzeng
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Method for manufacturing an electrical lapping guide for magnetic write head core width optimization
Patent number: 8082657Abstract: A method for manufacturing a magnetic write head that allows the location of the flare point of a write pole to be accurately located relative to the air bearing surface. The method includes the construction of a lapping guide having an edge feature that is easily and accurately located relative to the flare point of the write pole. This edge feature provides an abrupt change in electrical resistance across the lapping guide at a point when lapping should be terminated. And, since this feature can accurately located relative to the flare point, this provides an easily discernable ending point for lapping.Type: GrantFiled: December 30, 2008Date of Patent: December 27, 2011Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Edward Hin Pong Lee, Vladimir Nikitin, Michael Ming Hsiang Yang, Yuan Yao -
Patent number: 8079135Abstract: A method for providing a perpendicular magnetic recording (PMR) transducer is described. The PMR transducer provided includes a PMR pole and yoke structure coupled with the PMR pole. The method includes providing a hard mask and an intermediate layer. A first portion of the hard mask resides on the PMR pole. A second portion of the hard mask resides on another structure. The intermediate layer surrounds at least the PMR pole. The method also includes performing a planarization on at least the intermediate layer, removing the first portion of the hard mask on the PMR pole without completely removing the second portion of the hard mask on the other structure. The method further includes removing a remaining portion of the hard mask on the other structure, providing a write gap on the PMR pole, and providing a shield on the write gap.Type: GrantFiled: December 13, 2007Date of Patent: December 20, 2011Assignee: Western Digital (Fremont), LLCInventors: Yong Shen, Liubo Hong, Guanghong Luo, Honglin Zhu, Lei Wang, Yingjian Chen
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Patent number: 8074345Abstract: A method of measuring a bevel angle in a write pole comprises the step of providing a mask over a wafer containing the write pole. The mask has a first opening over the write pole and a second opening over a sacrificial region of the wafer. The sacrificial region comprises a same material as the write pole. The method further comprises the steps of performing a beveling operation on the write pole and the sacrificial region to form a first bevel in the write pole and a second bevel in the sacrificial region, and measuring an angle of the second bevel in the sacrificial region to determine the bevel angle of the write pole.Type: GrantFiled: May 18, 2009Date of Patent: December 13, 2011Assignee: Western Digital (Fremont), LLCInventors: Alexandre Anguelouch, Donghong Li
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Patent number: 8065787Abstract: A thermally assisted magnetic head is formed by performing a head forming process, a mounting part forming process and a light source mounting process in that order. In the head forming process, a planned area is secured on a light source placing surface of a slider substrate, then a magnetic head part is formed on a head area other than the planned area and a spacer for securing a mounting space for the laser diode is formed on the planned area. In the mounting part forming process, a light source mounting part is formed by removing the spacer. In the light source mounting process, a laser diode is mounted on the light source mounting part formed by the mounting part forming step.Type: GrantFiled: March 17, 2010Date of Patent: November 29, 2011Assignees: Headway Technologies, TDK CorporationInventors: Yoshitaka Sasaki, Hiroyuki Ito, Atsushi Iijima
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Patent number: 8065786Abstract: Provided is a manufacturing method of heat-assisted magnetic recording head, in which a light source unit can be easily joined to a slider with sufficiently high accuracy, under avoiding the excessive mechanical stress. The manufacturing method comprises the steps of: moving relatively the light source unit and the slider, while applying a sufficient voltage between an upper electrode of the light source and an electrode layer provided in the slider; and setting the light source unit and the slider in desired positions in a direction perpendicular to the element-integration surface of the slider substrate. The desired positions are positions where the light source just emits due to a surface contact between: the protruded portion of the lower surface of the light source; and the upper surface of the electrode layer, which is a portion of the wall surface of a step formed on the head part.Type: GrantFiled: April 23, 2008Date of Patent: November 29, 2011Assignee: TDK CorporationInventors: Koji Shimazawa, Yasuhiro Ito, Eiji Komura, Seiichi Takayama, Kosuke Tanaka
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Patent number: 8065788Abstract: A method for manufacturing a magnetic head for magnetic data recording, that allows a lapping termination point to be easily and accurately determined during lapping. The method includes constructing a lapping guide that has an electrically is formed to provide an abrupt change in resistance at a point where lapping should be terminated. This point of abrupt resistance change is located relative to the flare point of the write pole that the distance between the flare point and the air bearing surface can be accurately maintained. This abrupt resistance change also makes it possible to monitor both a stripe height defining rough lapping and an angled kiss lapping process using a single measurement channel.Type: GrantFiled: December 30, 2008Date of Patent: November 29, 2011Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Unal Murat Guruz, Edward Hin Pong Lee, Vladimir Nikitin, Michael Ming Hsiang Yang, Yuan Yao
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Patent number: 8056214Abstract: A magnetic head includes a pole layer, first and second side shields, and an encasing layer having a pole groove that accommodates the pole layer and first and second side shield grooves that accommodate the first and second side shields. In a manufacturing method for the magnetic head, the pole groove and first and second initial side shield grooves are formed in a nonmagnetic layer using an etching mask layer having first to third openings. In the manufacturing method, a wall face of the first initial side shield groove that is closer to the pole groove and a wall face of the second initial side shield groove that is closer to the pole groove are etched by dry etching to thereby complete the first and second side shield grooves.Type: GrantFiled: August 19, 2009Date of Patent: November 15, 2011Assignees: Headway Technologies, Inc., SAE Magnetics (H.K.) Ltd.Inventors: Yoshitaka Sasaki, Kazuo Ishizaki, Hironori Araki, Hiroyuki Ito, Shigeki Tanemura, Atsushi Iljima
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Patent number: 8056213Abstract: A PMR head comprises a substrate, a magnetic pole formed over the substrate, the pole having a pole tip having a cross-sectional tapered shape wherein the pole tip is surrounded by a write gap layer, an integrated shield comprising side shields on the substrate laterally surrounding the pole tip and a trailing shield overlying the pole tip and integral with the side shields.Type: GrantFiled: February 25, 2008Date of Patent: November 15, 2011Assignee: Headway Technologies, Inc.Inventors: Cherng-Chyi Han, Lijie Guan, Joe Smyth, Moris Dovek
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Patent number: 8051552Abstract: A wrap around shield of a write head is fabricated in multiple processes, with side shields fabricated in one process, and a trailing shield formed in another process. These multiple processes form a stitched wrap around shield, resulting in more flexible and accurate placement of the trailing shield and side shields with respect to the write pole. These processes also independently form the dimensions (shapes and sizes) of the side shields and the trailing shield which allows better control of writeability, saturation, and adjacent track interference of the perpendicular recording write head.Type: GrantFiled: May 11, 2007Date of Patent: November 8, 2011Assignee: Hitachi Global Storage Technologies Netherlands, B.V.Inventors: Ming Jiang, Yi Zheng
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Patent number: 8051551Abstract: A method for fabricating a magnetic head having multiple readers includes forming a plurality of generally laterally positioned lower shields; forming a lower gap layer above each lower shield; forming a sensor above each lower gap layer; forming an upper gap layer above each sensor; and forming an upper shield above each upper gap layer; wherein an overall gap thickness is defined between vertically aligned pairs of the upper and lower shields, wherein the overall gap thickness between one of the pairs of upper and lower shields is thicker than the overall gap thickness between another of the pairs of upper and lower shields.Type: GrantFiled: May 25, 2010Date of Patent: November 8, 2011Assignee: International Business Machines CorporationInventor: Peter Vandersalm Koeppe
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Publication number: 20110258841Abstract: A method is provided for forming a plurality of regions of magnetic material in a substrate having a first approximately planar surface. The method comprises the steps of fabricating projections in the first surface of the substrate, depositing onto the first surface a magnetic material in such a way that the tops of the projections are covered with magnetic material, and depositing filler material atop the substrate so produced. The filler material may then be planarized, for example by chemical-mechanical polishing. In an alternative embodiment magnetic material is deposited on a substrate and portions of it are removed, leaving islands of material. Filler material is then deposited, which may be planarized.Type: ApplicationFiled: April 7, 2011Publication date: October 27, 2011Inventors: Zvonimir Z. Bandic, Elizabeth Ann Dobisz, Jui-Lung Li, Henry Hung Yang
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Patent number: 8042259Abstract: A magnetic recording head and a method of manufacturing the same. The magnetic recording head includes a stack containing a main pole and a return pole. The stack includes a first magnetic layer having a groove formed therein; an insulating layer covering a surface of the groove; and a second magnetic layer pattern filling the groove covered with the insulating layer.Type: GrantFiled: February 18, 2010Date of Patent: October 25, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Hoo-san Lee, Young-hun Im, Yong-su Kim
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Patent number: 8028399Abstract: Write elements and methods of fabricating magnetic write poles are described. For one method, a vertical mask structure is formed on a magnetic layer in locations of a pole tip and a yoke of a write pole. The vertical mask structure may be formed by coating vertical surfaces of resists with an atomic layer deposition (ALD) process or a similar process. A removal process is then performed around the vertical mask structure to define the pole tip and part of the yoke of the write pole, and the vertical mask structure is removed. A lower portion of the pole tip is them masked while the upper portion of the pole tip and the part of the yoke is exposed. The upper portion of the pole tip and the part of the yoke are then expanded with magnetic material, such as with a plating process.Type: GrantFiled: December 16, 2007Date of Patent: October 4, 2011Assignee: Hitachi Global Storage Technologies Netherlands, B.V.Inventors: Amanda Baer, Jeffrey S. Lille, Aron Pentek
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Patent number: 8028400Abstract: A method for forming a tapered, electroplated structure. The method involves forming a first mask structure having an opening. A shrink material is deposited into the opening, such that the thickness of the shrink material is less than the thickness of the first mask structure. The first mask structure and the shrink material are then heated causing the sides of the opening in the mask structure to bulge inward. The shrink material is then removed, and a first electrically conductive material can then be electroplated into the opening to a thickness that is much less than the thickness of the mask. The bulbous shaped of the deformed photoresist mask forms a taper on the first electrically conductive material. The first mask can then be removed and a second electrically conductive material can be electroplated over the first electrically conductive material.Type: GrantFiled: March 6, 2008Date of Patent: October 4, 2011Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Christian Rene Bonhote, Jeffrey S. Lille, Scott Arthur MacDonald
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Patent number: 8015693Abstract: A method of forming a thin-film magnetic head comprises a lower magnetic pole layer forming step of forming a lower magnetic pole layer; a lower magnetic pole projection forming step of forming the lower magnetic pole layer with a lower magnetic pole projection; a gap layer forming step of laminating a nonmagnetic gap layer on the lower magnetic pole projection; and an upper magnetic pole forming step of forming an upper magnetic pole on the nonmagnetic gap layer. The lower magnetic pole projection forming step forms the lower magnetic pole projection by simultaneously etching an area including parts adjacent to a part to become the lower magnetic pole projection on both sides in a track width direction and a part adjacent to the part to become the lower magnetic pole projection on the side opposite from a medium-opposing surface in a surface of the lower magnetic pole layer.Type: GrantFiled: October 18, 2007Date of Patent: September 13, 2011Assignee: TDK CorporationInventors: Hiraku Hirabayashi, Yoshiyuki Mizoguchi
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Patent number: 8015692Abstract: A method for providing a perpendicular magnetic recording head includes providing a metal underlayer and forming a trench in the metal underlayer. The trench has a bottom and a top wider than the bottom. The method also includes providing a PMR pole. At least a portion of the PMR pole resides in the trench. The method also includes providing a write gap on the PMR pole and providing a top shield on at least the write gap.Type: GrantFiled: November 7, 2007Date of Patent: September 13, 2011Assignee: Western Digital (Fremont), LLCInventors: Lei Larry Zhang, Yong Shen, Honglin Zhu, Yizhong Wang
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Method for making a scissoring-type current-perpendicular-to-the-plane (CPP) magnetoresistive sensor
Patent number: 8015694Abstract: A “scissoring-type” current-perpendicular-to-the-plane (CPP) magnetoresistive sensor with dual ferromagnetic sensing or free layers separated by a nonmagnetic spacer layer has improved stability as a result of etch-induced uniaxial magnetic anisotropy in each of the free layers. Each of the two ferromagnetic free layers has an etch-induced uniaxial magnetic anisotropy and an in-plane magnetic moment substantially parallel to its uniaxial anisotropy in the quiescent state, i.e., the absence of an applied magnetic field. The etch-induced uniaxial anisotropy of each of the free layers is achieved either by direct ion etching of each of the free layers, and/or by ion etching of the layer on which each of the free layers is deposited. A strong magnetic anisotropy is induced in the free layers by the etching, which favors generally orthogonal orientation of the two free layers in the quiescent state.Type: GrantFiled: December 18, 2007Date of Patent: September 13, 2011Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Matthew J. Carey, Jeffrey R. Childress, Stefan Maat, Neil Smith -
Patent number: 8011084Abstract: A method for manufacturing a manufacturing a magnetoresistive sensor that allows the sensor to be constructed with a very narrow and well controlled track width. The method includes depositing a layer of diamond like carbon over a series of sensor layers. A first mask is then formed to define a sensor, and an ion milling is performed to remove sensor material not protected by the first mask. Then, a second mask is formed, and a hard bias layer is deposited to the thickness of the sensor layers. The second mask is then lifted off and a CMP is performed to remove the first mask structure. Because all areas other than the area directly over the sensor are substantially planar a quick, gentle CMP can be used to remove the first mask layer even if the first mask is small, such as for definition of a very narrow track-width sensor.Type: GrantFiled: July 31, 2008Date of Patent: September 6, 2011Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Quang Le, Jui-Lung Li
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Patent number: 8003304Abstract: A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method provides for accurate definition of a device feature such as a write pole flare point. A functional lapping guide is formed to determine when a lapping operation should be terminated to define an air bearing surface of a slider. In order to provide accurate compensation for manufacturing variations in the functional lapping guide, a dummy lapping guide is provided. An amount of variation of a front edge of the dummy lapping guide, which is defined by the same process step as a writer pole flare point, can be calculated by measuring the width (stripe height) of the dummy lapping guide based on its electrical resistance.Type: GrantFiled: January 31, 2008Date of Patent: August 23, 2011Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Vladimir Nikitin, Yi Zheng
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Patent number: 7996986Abstract: An apparatus includes: a first layer having a near field transducer positioned in a waveguide cladding; a second layer having a magnetic pole piece; a third layer including a solid immersion mirror; a first lapping guide positioned in the first layer; a second lapping guide positioned in the second layer; and a third lapping guide positioned in the third layer.Type: GrantFiled: February 13, 2009Date of Patent: August 16, 2011Assignee: Seagate Technology LLCInventor: Nils Jan Gokemeijer
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Patent number: 7995308Abstract: A magnetic head incorporates: a medium facing surface; a coil; a pole layer; first and second shields disposed to sandwich the pole layer therebetween; a first gap layer disposed between the first shield and the pole layer; a second gap layer disposed between the second shield and the pole layer; and a substrate. The first shield is located closer to the substrate than the second shield. The first shield has a first layer and a second layer disposed between the first layer and the first gap layer.Type: GrantFiled: April 6, 2007Date of Patent: August 9, 2011Assignees: TDK Corporation, SAE Magnetics (H.K.) Ltd.Inventors: Koichi Otani, Naoto Matono, Tatsuya Harada, Kenji Yokoyama, Hidetaka Kawano
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Patent number: 7992287Abstract: A system for fabricating a transducer for an ink jet imaging device comprises a transducer assembly including a transducer overlying at least a portion of a flexible carrier. The transducer has a top surface extending a first distance from the carrier. A spacer overlies a portion of the carrier not covered by the transducer. The spacer has a top surface extending a second distance form the carrier. The second distance is less than the first distance and corresponds to a target thickness for the transducer. A lapping tool is configured to lap the top surface of the transducer. The system includes a detector for detecting when the lapping tool contacts the lapping spacer.Type: GrantFiled: November 6, 2007Date of Patent: August 9, 2011Assignee: Xerox CorporationInventors: Pinyen Lin, John Richard Andrews
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Patent number: 7979978Abstract: A process for forming the write pole of a PMR head is described. This write pole is symmetrically located relative to its side shields, This is accomplished, not through optical alignment, but by coating the pole with a uniform layer of non-magnetic material of a predetermined and precise thickness, followed by the formation of the shield layer around this.Type: GrantFiled: March 27, 2007Date of Patent: July 19, 2011Assignee: Headway Technologies, Inc.Inventors: Cherng-Chyi Han, Min Li, Fenglin Liu, Chen-Jung Chien
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Publication number: 20110146061Abstract: A method for manufacturing a magnetoresistive sensor that results in the sensor having a very flat top magnetic shield. The process involves depositing a plurality of sensor layers and then depositing a thin high density carbon CMP stop layer over the sensor layers and forming a mask over the CMP stop layer. An ion milling is performed to define the sensor. Then a thin insulating layer and magnetic hard bias layer are deposited. A chemical mechanical polishing is performed to remove the mask and a reactive ion etching is performed to remove the remaining carbon CMP stop layer. Because the CMP stop layer is very dense and hard, it can be made very thin. This means that when it is removed by reactive ion etching, there is very little notching over the sensor, thereby allowing the upper shield (deposited there-over) to be very thin.Type: ApplicationFiled: December 22, 2009Publication date: June 23, 2011Inventors: Shin Funada, Quang Le, Thomas L. Leong, Jui-Lung Li, Chang-Man Park, Ning Shi, Hicham M. Sougrati
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Patent number: 7963024Abstract: A method for manufacturing a magnetic write head for perpendicular magnetic data recording. The method allows an upper write coil to be formed directly on a conformally deposited layer of non-magnetic material such as alumina which has been deposited over a magnetic shaping layer and write pole. The method allows the write coil to be constructed without the need for the deposition of a thick alumina fill layer and subsequent chemical mechanical polishing. This, therefore, avoids the necessity of such a chemical mechanical polishing step.Type: GrantFiled: October 10, 2007Date of Patent: June 21, 2011Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventor: Aaron Neuhaus
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Patent number: 7963023Abstract: An electrical lapping guide for a magnetic tape head is provided with a resistive transverse stripe with a longitudinal height affixed to a substrate. A pair of leads extend from the stripe with a notch formed therebetween. The notch has a height corresponding to a lapping target limit for associated tape head elements. During material removal of the transverse stripe and the tape head elements, resistance is measured across the stripe and a dramatic increase in resistance indicates that the material removal has reached the notch. A method for accurately machining a magnetic tape head is provided by depositing tape head elements and a resistive stripe with a notch on a substrate. Resistance is measured across leads on either side of the notch for discontinuing machining of the stripe due to a dramatic increase in resistance.Type: GrantFiled: November 16, 2007Date of Patent: June 21, 2011Assignee: Oracle America, Inc.Inventor: Ritz Mingho Lau
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Patent number: 7950138Abstract: A main pole layer is deposited within an opening in a patterned photoresist layer on a substrate. The photoresist is thinned to expose an upper portion of a pole tip region that is then trimmed to a rectangular shape while a lower portion retains an inverted trapezoidal shape. Thereafter, a second trimming process forms a pole tip with a first width in the upper rectangular portion and a second thickness and second width which is less than the first width in the lower portion. A CMP step subsequently thins the upper portion to a first thickness of 0.04 to 0.08 microns while the second thickness remains at 0.16 to 0.32 microns. The bottom surface of the lower portion along the ABS becomes the trailing edge in a recording operation. The pole tip has a consistent first width (track width) that is not influenced by CMP process variations.Type: GrantFiled: February 8, 2010Date of Patent: May 31, 2011Assignee: Headway Technologies, Inc.Inventors: Donghong Li, Yoshitaka Sasaki
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Patent number: 7950137Abstract: A method for manufacturing a write pole for perpendicular magnetic recording for accurately defining a side shield throat height and write pole flare point. The magnetic structure includes a write pole portion and first and second side shield portions. The side shields portions are magnetically connected with the write pole portion in a region in front of an intended air bearing surface plane (e.g. in the direction from which lapping will progress). The side shields portions are each separated from the write pole portion in a region behind the intended air bearing surface plane by notches that terminate at a desired location relative to the intended air bearing surface plane and which open up in a region behind the intended air bearing surface plane.Type: GrantFiled: June 21, 2007Date of Patent: May 31, 2011Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Christian Rene Bonhote, Thomas Dudley Boon, Jr., Ming Jiang, Jordan Asher Katine, Quang Le, Yinshi Liu, Xhavin Sinha, Sue Siyang Zhang, Yi Zheng
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Patent number: 7950136Abstract: A process to manufacturing a TMR read head with improved voltage breakdown is performed by laying down the AP1 layer as two or more layers. Each AP1 sub-layer is exposed to a low energy plasma for a short time before the next layer is deposited. This results in a smooth surface, onto which to deposit the tunneling barrier layer, with no disruption of the surface crystal structure of the completed AP1 layer.Type: GrantFiled: May 12, 2008Date of Patent: May 31, 2011Assignee: Headway Technologies, Inc.Inventors: Tong Zhao, Chyu-Jiuh Torng, Hui-Chuan Wang