Abstract: Apparatuses, capacitor arrays, and methods for generating therapeutic compressed acoustic waves (e.g., shock waves). In the apparatuses and at least some of the methods, a plurality of electrodes can disposed in a chamber that is defined by a housing and configured to be filled with liquid, and a plurality of capacitors can be electrically connected to the electrodes and can be carried by (e.g., physically coupled to) the housing. Voltage pulses can be applied simultaneously to the plurality of electrodes (e.g., to begin to vaporize and ionize portions of the liquid to provide at least one inter-electrode conductive path between the plurality of electrodes) and to the capacitors to charge the plurality of capacitors). The plurality of capacitors can be configured to, upon reaching a threshold charge, discharge to the plurality of electrodes (e.g.

Abstract: A composite electrode foil roll for manufacturing an electrolytic capacitor, including: bands of electrode foils; strips of an isolating material positioned along a width of the composite electrode foil roll at a plurality of locations. The plurality of locations are at equal distances and correspond to a length of an inner cavity of a case of the electrolytic capacitor. The bands of electrode foils and strips of an isolating material are alternating. A method of manufacturing the composite electrode foil roll including alternating bands of electrode foils and strips of an isolating material. The strips are positioned along a width of the composite electrode foil roll at repeated locations. The repeated locations are at equal distances corresponding to a length of an inner cavity of a case of the electrolytic capacitor.

Abstract: The invention relates to a method for operating a high-voltage pulse system (1), preferably a system (1) for the fragmenting and/or weakening of material (2) by means of high-voltage discharges, with an energy store (3) for providing the energy for the high-voltage pulses and a charging device (4) for charging the energy store (3). According to the method, in the intended high-voltage pulse operation, a sequence of high-voltage pulses is generated with the system (1) and thereby the energy store (3) is discharged completely at each high-voltage pulse and is only after the expiry of a charging pause (LP) recharged again for the next high-voltage pulse by means of supplying charging energy with the charging device (4). By means of the operating method according to the invention, a time window is created between two successive high-voltage pulses each, in which the energy store(s) are substantially completely discharged and no charging-voltage is applied.

Abstract: Described herein are systems and methods for ensuring plasma homogeneity in a discharge cell. The discharge cell may include a first hollow electrode and a second hollow electrode spaced away from the first electrode to define a discharge gap therebetween. A fluid inlet port may in fluid communication with an internal bore of the first electrode. A fluid outlet port may be in fluid communication with the discharge gap. A first pair of viewports may define a first optic pathway through the discharge gap. A second pair of viewports may define a second optic pathway through the discharge gap. A third pair of viewports may define a third optic pathway through the discharge gap, the third optic pathway defined through the hollow interior of the first and second electrodes.

Abstract: The present invention relates to a device, system and a method for high pressure shockwave treatment of biological tissue having a large treatment zone and in particular to such a device, system and method in which a large biological treatment area in treated in a non-drug, non-surgical treatment protocol utilizing ballistic shockwave generating device.

Abstract: An improved ANAB system or process substantially or fully eliminating contaminant particles from reaching a beam target by adding to the usual primary (first) ionizer of the ANAB system or process an additional (second) ionizer to ionize contaminant particles and means to block or retard the ionized particles to prevent their reaching the beam target.

Abstract: A circuit tuning radio frequency (RF) power. The circuit includes a low to mid frequency (LF/HF) tuning circuit including a variable LF/MF capacitor coupled in series with an LF/MF inductor. The LF/MF tuning circuit is coupled between ground and a common node configured to receive an RF input. The circuit includes a high frequency (HF) tuning circuit coupled in parallel to the LF/MF tuning circuit between ground and the common node. The HF tuning circuit includes a variable HF capacitor coupled in series with an HF inductor. Cross parallel isolation occurs between the LF/MF inductor of the LF/MF tuning circuit and the HF inductor of the HF tuning circuit when adjusting the variable LF/MF capacitor or variable HF capacitor.

Abstract: The present invention relates to an apparatus for controlling an output current provided from an inverter to a plant according to a current command. The apparatus includes a calculation unit to decide a current error between the current command and the output current, output an output voltage by applying a gain including a control frequency of the current command to the current error, and output an output current from the output voltage.

Abstract: A circuit assembly (12) includes a direct voltage supply (13) providing a direct voltage (Ucc), a step-up converter circuit (16), and a control unit (17). The step-up converter circuit (16) contains a series circuit consisting of an inductor (18) and a controllable switch (19), wherein the inductor (18) is connected between a pole (21) of the direct voltage supply (13) and a first electrode (D) of the switch (19). The control unit (17) controls the switch (19) with a high-frequency to generate high-frequency energy with a periodic pulse-like output voltage (UDS) at the first electrode (D) of the switch (19), said output voltage having a peak value larger than the value of the direct voltage (Ucc). The high-frequency energy is directly output without transformation at an output connection (24) designed to directly connect to an electrode (8) of the vacuum chamber (2).

Abstract: For the purpose of providing a transportable linear accelerator system which can restrain entering of losing ion beams deviated from a trajectory therefor, to thereby efficiently achieve reduction in radioactivity at low cost, and a transportable neutron source equipped therewith, a transportable linear accelerator system is configured to be provided with a beam chopper just before an inlet of a post-accelerator, thereby to cut off, from the proton beams pre-accelerated by a pre-accelerator, uncontrolled proton beams, and thus to radiate only the controlled proton beams to the post-accelerator, so that the proton beams are prevented from hitting an acceleration electrode, etc. of the post accelerator.

Abstract: A system provides post-match control of microwaves in a radial waveguide. The system includes the radial waveguide, and a signal generator that provides first and second microwave signals that have a common frequency. The signal generator adjusts a phase offset between the first and second signals in response to a correction signal. The system also includes first and second electronics sets, each of which amplifies a respective one of the first and second microwave signals. The system transmits the amplified, first and second microwave signals into the radial waveguide, and matches an impedance of the amplified microwave signals to an impedance presented by the waveguide. The system also includes at least two monitoring antennas disposed within the waveguide. A signal controller receives analog signals from the monitoring antennas, determines the digital correction signal based at least on the analog signals, and transmits the correction signal to the signal generator.

Abstract: An array of carbon nanotube micro-tip structure includes an insulating substrate and a plurality of patterned carbon nanotube film structures. The insulating substrate includes a surface. The surface includes an edge. A plurality of patterned carbon nanotube film structures spaced from each other. Each of the plurality of patterned carbon nanotube film structures is partially arranged on the surface of the insulating substrate. Each of the plurality of patterned carbon nanotube film structures comprises two strip-shaped arms joined together forming a tip portion protruding and suspending from the edge of the surface of the insulating substrate. Each of the two strip-shaped arms comprises a plurality of carbon nanotubes parallel to the surface of the insulating substrate.

Abstract: A variable frequency microwave pulse generator that includes a high voltage charger for charging with a high voltage, a high pressure gas tank for supplying insulation gas, and an electrode discharge unit. The electrode discharge unit includes a case, an accommodation section defined inside the case, and a pair of electrode sections disposed at one side and the other side of the accommodation section so as to face each other. The pair of electrode sections is spaced apart from each other to define a spark gap therebetween where the insulation gas supplied from the high pressure gas tank is loaded. An annular resonance recess is defined at the central portion of one electrode section of the pair of electrode sections, the depth of the resonance recess being variable in response to an adjustment knob disposed on the case being manipulated.

Abstract: A low-temperature, atmospheric-pressure microplasma generator comprises at least one strip of metal on a dielectric substrate. A first end of the strip is connected to a ground plane and the second end of the strip is adjacent to a grounded electrode, with a gap being defined between the second end of the strip and the grounded electrode. High frequency power is supplied to the strip. The frequency is selected so that the length of the strip is an odd integer multiple of ¼ of the wavelength traveling on the strip. A microplasma forms in the gap between the second end of the strip and the grounded electrode due to electric fields in that region. A microplasma generator array comprises a plurality of strongly-coupled resonant strips in close proximity to one another. At least one of the strips has an input for high-frequency electrical power. The remaining strips resonate due to coupling from the at least one powered strip. The array can provide a continuous line or ring of plasma.

Abstract: A switchable ion gun switchable between a cluster mode setting for producing an ion beam substantially comprising ionised gas clusters and an atomic mode setting for producing an ion beam substantially comprising ionised gas atoms, comprising: a source chamber having a first gas inlet; a gas expansion nozzle for producing gas clusters in the presence of gas atoms by expansion of a gas from the source chamber through the nozzle; an ionisation chamber for ionising the gas clusters and gas atoms; wherein the ionisation chamber has a second gas inlet for admitting gas directly into the ionisation chamber to form ionised gas atoms; and a variable mass selector for mass selecting the ionised gas clusters and ionised gas atoms to produce an ion beam variable between substantially comprising ionised gas clusters and substantially comprising ionised gas atoms.

Abstract: A structural body is provided in fluid, perpendicular to a typical flow direction of the fluid. The structural body includes a cylindrical insulating body having at least one hollow portion and at least one conducting body positioned in the hollow portion of the insulating body. In a cross section of the insulating body having a normal line in an axial direction of the insulating body, the following relationship is satisfied: 1.5×Diy?Dix?15×Diy where Dix is a length of the insulating body in the typical flow direction (direction x) and Diy is a maximum value of a length of the insulating body in a direction (direction y) perpendicular to the typical flow direction.

Abstract: A device is described herein which may comprise a chamber, a fluid line, a pressurized source material in the fluid line, a component restricting flow of the source material into the chamber, a sensor measuring flow of a fluid in the fluid line and providing a signal indicative thereof, and a pressure relief valve responsive to a signal to reduce a leak of source material into the chamber in the event of a failure of the component.

Abstract: Embodiments provide a ceramic metal halide (CMH) lamp and methods for making the same that provide or achieve, during lamp operation, a correlated color temperature (CCT) greater than 5000 K, a color rendering index (CRI) of 85 or greater, a lumen maintenance percentage (LM %) greater than 90%, and a life of at least 15,000 hours.

Abstract: One embodiment of a particle accelerator includes: a vacuum container with its inside evacuated to produce vacuum, the vacuum container being formed with a laser beam entrance window for allowing a laser beam to enter; a target arranged in the vacuum container so as to be irradiated with a laser beam to generate ions; and a condenser lens for focusing the laser beam onto the target. The condenser lens is arranged at the laser beam entrance window of the vacuum container, and takes a role of a vacuum bulkhead.

Abstract: A plasma generating apparatus includes: a power supply one of whose electrodes is connected to vacuum chamber walls of N vacuum chambers; an oscillator which outputs a pulse signal at every predetermined period; N pulse amplifying circuits which are connected in parallel to the oscillator as well as to the other electrode of the power supply, and each of which amplifies the pulse signal and supplies the amplified pulse signal to a corresponding one of N electrodes disposed in the N vacuum chambers; and at least (N-1) timing generating circuits which are connected between the oscillator and at least (N-1) pulse amplifying circuits, and which delay the pulse signal by respectively different delay times so that at any specific time, the pulse signal is supplied to only one of the pulse amplifying circuits.

Abstract: A hybrid plasma reactor includes a first plasma chamber for providing a first ring-shaped plasma discharge space, second plasma chambers providing a second plasma discharge space connected to the first plasma discharge space and coupled to magnetic flux channels, a hybrid plasma source including magnetic cores, which partially surround the first plasma chamber and have magnetic entrances forming the magnetic flux channels, and primary winding coils wound in the magnetic cores and complexly generating ring-shaped transformer-coupled plasma in the first plasma discharge space and magnetic flux channel coupled plasma in the second plasma discharge space, and an AC switching power supply for supplying plasma generation power to the primary winding coils. The hybrid plasma reactor can complexly generate magnetic flux channel coupled plasma and transformer coupled plasma so that it has a high control capability for plasma ion energy and a wide operation region from a low-pressure region to a high-pressure region.

Abstract: Provided is an ion beam treatment apparatus including the target. The ion beam treatment apparatus includes a substrate having a first surface and a second surface opposed to the first surface, and including a cone type hole decreasing in width from the first surface to the second surface to pass through the substrate, wherein an inner wall of the substrate defining the cone type hole is formed of a metal, an ion generation thin film attached to the second surface to generate ions by a laser beam incident into the cone type hole through the first surface and strengthen, and a laser that emits a laser beam to generate ions from the ion generation thin film and project the ions onto a tumor portion of a patient. The laser beam incident into the cone type hole is focused by the cone type hole and is strengthened.

Abstract: Ion sources and methods for generating an ion bean with a controllable ion current density distribution. The ion source includes a discharge chamber having an optical grid position proximate at a first end and a re-entrant vessel positioned proximate a second end that opposes the first end. A plasma shaper extends from the re-entrant vessel and into the plasma discharge chamber. A position of the plasma shaper is adjustable relative to the grid-based ion optic such that the plasma shaper may operably change a plasma density distribution within the discharge chamber.

Abstract: A particle beam generating device includes at least one accelerator unit for generating a particle beam and at least one emission unit for the output of the at least one particle beam onto a workpiece. The device is configured to release at least two particle beams including hadronic particles with at least one of a different mass or a different charge.

Abstract: A physical vapor deposition system may include an RF generator configured to transmit an AC process signal to a physical vapor deposition chamber via an RF matching network. A detector circuit may be configured to sense the AC process signal and output a DC magnitude error signal and a DC phase error signal. A controller may be coupled to the detector circuit and the RF matching network and configured to receive the DC magnitude and phase error signals and to vary an impedance of the RF matching network in response to the DC magnitude and phase error signals.

Abstract: Systems and methods in accordance with embodiments of the invention implement microscale digital vacuum electronic gates. In one embodiment, a microscale digital vacuum electronic gate includes: a microscale field emitter that can emit electrons and that is a microscale cathode; and a microscale anode; where the microscale field emitter and the microscale anode are disposed within at least a partial vacuum; where the microscale field emitter and the microscale anode are separated by a gap; and where the potential difference between the microscale field emitter and the microscale anode is controllable such that the flow of electrons between the microscale field emitter and the microscale anode is thereby controllable; where when the microscale anode receives a flow of electrons, a first logic state is defined; and where when the microscale anode does not receive a flow of electrons, a second logic state is defined.

Abstract: Micro discharge devices, methods, and systems are described herein. One device includes a non-conductive material, a channel through at least a portion of the non-conductive material having a first open end and a second open end, a first electrode proximate to a first circumferential position of the channel between the first open end and the second open end, a second electrode proximate to a second circumferential position of the channel between the first open end and the second open end, a discharge region defined by a portion of the channel between the first electrode and the second electrode, an optical emission collector positioned to receive an optical emission from the discharge region; and a discharge shielding component between the discharge region and the optical emission collector.

Abstract: An ion beam machining and observation method relevant to a technique of cross sectional observation of an electronic component, through which a sample is machined by using an ion beam and a charged particle beam processor capable of reducing the time it takes to fill up a processed hole with a high degree of flatness at the filled area. The observation device is capable of switching the kind of gas ion beam used for machining a sample with the kind of a gas ion beam used for observing the sample. To implement the switch between the kind of a gas ion beam used for sample machining and the kind of a gas ion beam used for sample observation, at least two gas introduction systems are used, each system having a gas cylinder, a gas tube, a gas volume control valve, and a stop valve.

Abstract: Biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) is processed to produce useful products, such as fuels. For example, systems can use feedstock materials, such as cellulosic and/or lignocellulosic materials and/or starchy materials, to produce ethanol and/or butanol, e.g., by fermentation.

Abstract: Apparatus and methods for generating and optimizing a plasma discharge are provided. The device includes a plasma generating device, one or more sensors, and at least one controller for adjusting the plasma in light of the sensed characteristics. Methods for optimizing a plasma, particularly a spatially disoriented plasma discharge include generating a plasma, sensing one or more plasma characteristics, modifying one or more plasma generating properties to optimize the plasma.

Abstract: In one embodiment an ion source includes an arc chamber and an emitter having a surface disposed in the arc chamber, where the emitter is configured to generate a plasma in the arc chamber. The ion source further includes a repeller having a repeller surface positioned opposite the emitter surface, and a hollow cathode coupled to the repeller and configured to provide a feed material into the arc chamber.

Abstract: Biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) is processed to produce useful products, such as fuels. For example, systems can use feedstock materials, such as cellulosic and/or lignocellulosic materials and/or starchy materials, to produce ethanol and/or butanol, e.g., by fermentation.

Abstract: Embodiments of the present invention generally provide a plasma source apparatus, and method of using the same, that is able to generate radicals and/or gas ions in a plasma generation region that is symmetrically positioned around a magnetic core element by use of an electromagnetic energy source. In general, the orientation and shape of the plasma generation region and magnetic core allows for the effective and uniform coupling of the delivered electromagnetic energy to a gas disposed in the plasma generation region. In general, the improved characteristics of the plasma formed in the plasma generation region is able to improve deposition, etching and/or cleaning processes performed on a substrate or a portion of a processing chamber that is disposed downstream of the plasma generation region.

Abstract: A plasma processing system for generating plasma to process at least a wafer. The plasma processing system includes a coil for conducting a current for sustaining at least a portion of the plasma. The plasma processing system also includes a sensor coupled with the coil for measuring a magnitude of a supplied current to provide a magnitude measurement without measuring any phase angle of the supplied current. The supplied current is the current or a total current that is used for providing a plurality of currents (e.g., including the current). The plasma processing system also includes a controller coupled with the sensor for generating a command using the magnitude measurement and/or information derived using the magnitude measurement, without using information related to phase angle measurement, and for providing the command for controlling the magnitude of the supplied current and/or a magnitude of the total current.

Abstract: A cathode assembly and a method for generation of pulsed plasma are disclosed. The cathode assembly comprises a cathode holder connected to multiple longitudinally aligned cathodes, preferably of the same diameter, and different lengths. The method is characterized by forming an electric arc between the cathodes in the assembly and an anode by passing DC current of a predetermined magnitude. Once the arc is established the current is reduced to the magnitude sufficient to sustain an electric arc, or a slightly larger magnitude, thereby reducing the area of arc attachment to a single cathode. Once the area of attachment has been reduced, the current is raised to the operational level of the pulse, while the area of attachment does not increase significantly.

Abstract: An inductively coupled plasma ion source for a focused ion beam (FIB) system is disclosed, comprising an insulating plasma chamber with a feed gas delivery system, a compact radio frequency (RF) antenna coil positioned concentric to the plasma chamber and in proximity to, or in contact with, the outer diameter of the plasma chamber. In some embodiments, the plasma chamber is surrounded by a Faraday shield to prevent capacitive coupling between the RF voltage on the antenna and the plasma within the plasma chamber. High dielectric strength insulating tubing is heat shrunk onto the outer diameter of the conductive tubing or wire used to form the antenna to allow close packing of turns within the antenna coil. The insulating tubing is capable of standing off the RF voltage differences between different portions of the antenna, and between the antenna and the Faraday shield.

Abstract: A plasma generator has a first member 2 containing a dielectric material, and an electrode group composed of a plurality of electrodes and including a first assembly 6 partially including a plurality of electrodes and a second assembly 7 partially including a plurality of electrodes. In accordance with an AC voltage, the first assembly 6 generates a plasma in a first space 23 contacting the first member 2. In accordance with a DC voltage, the second assembly 7 generates an electric field in a second space 24 contacting the first member 2 and communicating with the first space 23. At least one or more electrodes of a portion of the first assembly 6 and at least one or more electrodes of a portion of the second assembly 7 are provided on the surface of or in the inside of the first member 2.

Abstract: A switching module capable of adjusting a visual angle is disclosed. The switching module includes an edge-type optical substrate, a light source disposed by a side of the edge-type optical substrate, and an optical modulating component disposed between the light source and the edge-type optical substrate. The edge-type optical substrate has an emitting surface. The light source includes a plurality of light units. Each light unit can emit a beam to the edge-type optical substrate according to a predetermined angle. The optical modulating component can modulate divergence of the beam emitted from the light unit, so that the beam can be guided out of the edge-type optical substrate via the emitting surface according to the predetermined angle.

Abstract: A thermionic emission device includes an insulating substrate, a patterned carbon nanotube film structure, a positive electrode and a negative electrode. The insulating substrate includes a surface. The surface includes an edge. The patterned carbon nanotube film structure is partially arranged on the surface of the insulating substrate. The patterned carbon nanotube film structure includes two strip-shaped arms joined at one end to form a tip portion protruded from the edge of the surface of the insulating substrate and suspended. The patterned carbon nanotube film structure includes a number of carbon nanotubes parallel to the surface of the insulating substrate. The patterned carbon nanotube film structure is connected between the positive electrode and the negative electrode in series.

Abstract: There is provided a plasma processing apparatus for generating inductively coupled plasma in a processing chamber and performing a process on a substrate accommodated in the processing chamber. The plasma processing apparatus includes an upper cover installed to cover a top opening of the processing chamber and having a dielectric window; a high frequency coil installed above the dielectric window at an outer side of the processing chamber; a gas supply mechanism supported by the upper cover and installed under the dielectric window. Here, the gas supply mechanism includes a layered body including plates having through holes. Further, the gas supply mechanism is configured to supply a processing gas into the processing chamber in a horizontal direction via groove-shaped gas channels installed between the plates or between the plate and the dielectric window, and end portions of the groove-shaped gas channels are opened to edges of the through holes.

Abstract: A system for improving ion beam quality is disclosed. According to one embodiment, the system comprises an ion source, having a chamber defined by a plurality of chamber walls; an RF antenna disposed on a first wall of the plurality of chamber walls; a second wall, opposite the first wall, the distance between the first wall and the second wall defining the height of the chamber; an aperture disposed on one of the plurality of chamber walls; a first gas inlet for introducing a first source gas to the chamber; and a second gas inlet for introducing a second source gas, different from the first source gas, to the chamber; wherein a first distance from the first gas inlet to the second wall is less than 35% of the height; and a second distance from the second gas inlet to the first wall is less than 35% of the height.

Abstract: A surface wave plasma (SWP) source is described. The SWP source comprises an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the EM wave launcher adjacent the plasma. The EM wave launcher comprises a slot antenna having at least one slot. The SWP source further comprises a first recess configuration and a second recess configuration formed in the plasma surface, wherein at least one first recess of the first recess configuration differs in size and/or shape from at least one second recess of the second recess configurations. A power coupling system is coupled to the EM wave launcher and configured to provide the EM energy to the EM wave launcher for forming the plasma.

Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.

Abstract: A gas conversion system using microwave plasma is provided. The system includes: a microwave waveguide; a gas flow tube passing through a microwave waveguide and configured to transmit microwaves therethrough; a temperature controlling means for controlling a temperature of the microwave waveguide; a temperature sensor disposed near the gas flow tube and configured to measure a temperature of gas flow tube or microwave waveguide; an igniter located near the gas flow tube and configured to ignite a plasma inside the gas flow tube so that the plasma converts a gas flowing through the gas flow tube during operation; and a plasma detector located near the gas flow tube and configured to monitor the plasma.

Abstract: Provided is an ion generating device for an air-conditioner duct, which can be easily attached to the inside of an existing air conditioner duct and can ensure a desired ion generation quantity. The ion generating elements of the sub-units (3, 4, 5) of the ion generating device are connected to the drive circuit of the ion generating device main unit (2), and are driven by the drive circuit.

Abstract: A distance from a negative output terminal of a secondary winding of the transformer to a feeding terminal of the cathode plate is longer than a distance from a positive output terminal of the secondary winding to a feeding terminal of the anode. The anode side feeding path electrically connects the feeding terminal of the anode bar to the positive output terminal of the secondary winding. The cathode side feeding path electrically connects the feeding terminal of the cathode plate to the negative output terminal of the secondary winding. A path length of the cathode side feeding path is longer than a path length of the anode side feeding path. The housing is formed by an electric conductor and is electrically connected to the cathode side feeding path.

Abstract: An apparatus for generating plasma, comprises: a microwave generator configured to generate a microwave; a wave guide which is connected to the microwave generator, wherein the wave guide is elongated in a traveling direction of the microwave and has a hollow shape having a rectangular section in a direction perpendicular to the traveling direction; a gas feeder which is connected to the wave guide and feeds process gas into the wave guide; and an antenna unit which is a part of the wave guide and discharges plasma generated by the microwave to the outside, wherein the antenna unit has one or more slots formed on a wall constituting a short side in a section of the antenna unit, plasmarizes the process gas fed into the wave guide under an atmospheric pressure in the slots by the microwave, and discharges the plasma out of the slots.

Abstract: The invention is related to a gas discharge-based radiation source which emits short-wavelength radiation, wherein an emitter is ionized and compressed by pulse-shaped currents between two electrodes arranged in a vacuum chamber and is excited to form an emitting plasma. According to the invention, the plasma is preserved by means of a high-frequency sequence of pulse-shaped currents the pulse repetition period of which is adjusted so as to be shorter than a lifetime of the plasma so that the plasma is kept periodically alternating between a high-energy state of an emitting compressed plasma and a low-energy state of a relaxing plasma. For exciting the relaxing plasma to the compressed plasma, excitation energy is coupled into the relaxing plasma by making use of pulse-shaped currents with repetition frequencies between 50 kHz and 4 MHz and pulse widths equal to the pulse repetition period.

Abstract: A glow discharge spectrometer discharge lamp includes: a lamp body having a vacuum enclosure connected to pump elements and to injector elements for injecting an inert gas into the enclosure; a hollow cylindrical first electrode of longitudinal axis X-X?; a second electrode for receiving a sample for analysis and for holding the sample facing one end of the cylindrical electrode; electric field generator including an applicator for applying to the terminals of the electrodes an electric field that is continuous, pulsed, radiofrequency, or hybrid, and suitable for generating a glow discharge plasma in the presence of the gas; coupler elements for coupling the discharge lamp to a spectrometer suitable for measuring at least one component of the plasma; and magnetic field generator elements for generating a magnetic field having field lines oriented along the axis X-X?, the magnetic field being uniform in orientation and in intensity over an area of the sample that is not less than the inside area of the hollow

Abstract: An ion beam source that emits an ion beam in a direction of a substrate is provided. A cathode with a discharge opening defined therein is included. An anode is also included and spaced apart from the cathode. Ions are set to be emitted in an area proximate to the discharge opening in a direction similar to the direction from the anode to the discharge opening. First and second ceramic walls at least partially define a discharge channel between the anode and the cathode. At least one magnet generates a magnetic field in an area proximate to the discharge opening.