Plasma Generating Patents (Class 315/111.21)
  • Patent number: 10779389
    Abstract: Provided is a hand-type low temperature microwave plasma generator that is configured to implement plasma even in a low power state, and be easily applied to various small devices using microwave plasma including medical treatment and the like of wound treatment or cell treatment.
    Type: Grant
    Filed: February 13, 2020
    Date of Patent: September 15, 2020
    Assignee: PSM Inc.
    Inventor: Keun-Ho Lee
  • Patent number: 10777385
    Abstract: Embodiments of systems and methods for RF power distribution in a multi-zone electrode array are described. A system may include a plasma source configured to generate a plasma field. Also, the system may include an RF power source coupled to the plasma source and configured to supply RF power to the plasma source. The system may also include a source controller coupled to the RF power source and configured to control modulation of the RF power supplied to the plasma source to enhance uniformity of a plasma field generated by the plasma source.
    Type: Grant
    Filed: July 12, 2017
    Date of Patent: September 15, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Sergey Voronin, Alok Ranjan
  • Patent number: 10755895
    Abstract: A method for slope control of ion energy is described. The method includes receiving a setting indicating that an etch operation is to be performed using a radio frequency (RF) pulse signal. The RF pulse signal includes a first state and a second state. The first state has a higher power level than the second state. The method further includes receiving a pulse slope associated with the RF pulse signal. The pulse slope provides a transition between the first state and the second state. Also, the pulse slope is other than substantially infinite for reducing an amount of ion energy during the etch operation. The method includes determining power levels and timings for achieving the pulse slope and sending the power levels and the timings to an RF generator to generate the RF pulse signal.
    Type: Grant
    Filed: December 2, 2016
    Date of Patent: August 25, 2020
    Assignee: Lam Research Corporation
    Inventors: Alexei Marakhtanov, Zhigang Chen, John Patrick Holland
  • Patent number: 10704161
    Abstract: A plasma processing apparatus includes a toroidal-shape plasma vessel comprising a process chamber. A magnetic core surrounds a portion of the toroidal-shape plasma vessel. An RF power supply having an output that is electrically connected to the magnetic core energizes the magnetic core, thereby forming a toroidal plasma loop discharge in the plasma chamber. A workpiece holder is positioned in the toroidal-shape plasma vessel and includes at least one face. A plasma guiding structure is shaped and dimensioned so as to constrain a section of plasma in the toroidal plasma loop to travel substantially perpendicular to a normal to the at least one face.
    Type: Grant
    Filed: August 30, 2019
    Date of Patent: July 7, 2020
    Assignee: Plasmability, LLC
    Inventors: William Holber, Robert J. Basnett
  • Patent number: 10707054
    Abstract: In a plasma processing apparatus of an exemplary embodiment, a radio frequency power source generates radio frequency power for plasma generation. A bias power source periodically applies a pulsed negative direct-current voltage to a lower electrode to draw ions into a substrate support. The radio frequency power source supplies the radio frequency power as one or more pulses in a period in which the pulsed negative direct-current voltage is not applied to the lower electrode. The radio frequency power source stops supply of the radio frequency power in a period in which the pulsed negative direct-current voltage is applied to the lower electrode. Each of the one or more pulses has a power level that gradually increases from a point in time of start thereof to a point in time when a peak thereof appears.
    Type: Grant
    Filed: January 24, 2020
    Date of Patent: July 7, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Shinji Kubota
  • Patent number: 10707057
    Abstract: In one embodiment, an RF impedance matching circuit is disclosed. The matching circuit is coupled between a plasma chamber and an RF source providing an RF signal having a frequency. The matching circuit includes a first electronically variable capacitor having a first variable capacitance and a second electronically variable capacitor having a second variable capacitance. A control circuit determines a first parameter related to the plasma chamber, and then determines, based on the first parameter, a first capacitance value for the first electronically variable capacitor and a second capacitance value for the second electronically variable capacitor. The control circuit then generates a control signal to alter the first variable capacitance and the second variable capacitance accordingly, causing the RF power reflected back to the RF source to decrease while the frequency of the RF source is not altered.
    Type: Grant
    Filed: October 28, 2019
    Date of Patent: July 7, 2020
    Assignee: RENO TECHNOLOGIES, INC.
    Inventors: Imran Ahmed Bhutta, Michael Gilliam Ulrich
  • Patent number: 10707560
    Abstract: A display device structure includes a back film, a display panel attached on the back film, and at least one antenna. The display panel defines a central area and a peripheral area on the back film. The antenna may be a 5G antenna, and is disposed on the peripheral area of the back film. The peripheral area of the back film is folded toward a back side of the display device structure. The display device may be disposed in a housing, which has a dielectric window located at a side surface thereof, such that each of the at least one antenna disposed on the folded peripheral area directly faces the dielectric window.
    Type: Grant
    Filed: April 25, 2019
    Date of Patent: July 7, 2020
    Assignee: A.U. VISTA, INC.
    Inventors: Tsung-Ying Ke, Chun-Hsin Liu, Chih-Hsiang Yang, Hung-Chieh Hung
  • Patent number: 10697954
    Abstract: The invention relates to a sample-holding element (20) for a liquid sample for the simultaneous analysis of three or more chemico-physical parameters of the liquid by means of an analysis device. The sample-holding element (20) has a sample-holding chamber (31), which can be filled with the liquid, wherein the sample-holding element (20) has at least three measurement points (24, 25, 26, 26N, 27) arranged adjacent to each other, which are distributed over the sample-holding chamber (31), wherein two of the measurement points (24, 25) are a photonic measurement point (24) and a refractive-index measurement point (25) and wherein the at least one further measurement point is selected from the group comprising at least a pH measurement point (26), a conductivity measurement point (27) and a germ measurement point.
    Type: Grant
    Filed: July 28, 2017
    Date of Patent: June 30, 2020
    Assignee: Fuchs Petrolub SE
    Inventors: Christine Fuchs, Heinz Gerhard Theis
  • Patent number: 10663491
    Abstract: A voltage-current sensor enables more accurate measurement of the voltage, current, and phase of RF power that is delivered to high-temperature processing region. The sensor includes a planar body comprised of a non-organic, electrically insulative material, a measurement opening formed in the planar body, a voltage pickup disposed around the measurement opening, and a current pickup disposed around the measurement opening. Because of the planar configuration and material composition of the sensor, the sensor can be disposed proximate to or in contact with a high-temperature surface of a plasma processing chamber.
    Type: Grant
    Filed: February 9, 2018
    Date of Patent: May 26, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Zheng John Ye, Jay D. Pinson, II, Juan Carlos Rocha, Abdul Aziz Khaja
  • Patent number: 10649006
    Abstract: Apparatuses, systems, and techniques for characterizing asymmetry effects caused by cathode designs, ESC designs, cable routing, and process chamber geometries are provided. Such apparatuses, systems, and techniques may include, for example, a rotatable RF probe assembly in physical contact to a conductive plate disposed on a surface of a pedestal.
    Type: Grant
    Filed: October 6, 2017
    Date of Patent: May 12, 2020
    Assignee: Lam Research Corporation
    Inventors: Maolin Long, Alex Paterson
  • Patent number: 10619237
    Abstract: A method and a device for plasma treatment of containers by means of a plurality of treatment segments each having at least one plasma station on a plasma module comprising a plasma wheel, wherein, during an operational malfunction and/or a cut-out in at least one of the plasma stations, the process gas, before being supplied to the plasma station in question, is carried off into the respective plasma chamber and/or the container held therein, by means of at least one bypass line.
    Type: Grant
    Filed: March 16, 2017
    Date of Patent: April 14, 2020
    Assignee: KHS CORPOPLAST GMBH
    Inventors: Alexander Disterhof, Michael Herbort, Sebastian Kytzia
  • Patent number: 10620648
    Abstract: Examples of an insulation system include a digital isolator for receiving supply of a first power supply on an input side thereof and receiving supply of a second power supply on an output side thereof, and an output adjusting unit for receiving supply of the second power supply, directly outputting an output of the digital isolator when a voltage of the second power supply is larger than a predetermined voltage, and stopping data output irrespective of the output of the digital isolator when the voltage of the second power supply is smaller or equal to the predetermined voltage.
    Type: Grant
    Filed: May 23, 2019
    Date of Patent: April 14, 2020
    Assignee: ASM IP Holding B.V.
    Inventors: Phuc Hong Ninh, Tsutomu Makino
  • Patent number: 10615004
    Abstract: Embodiments of the disclosure provide a plasma source assembly and process chamber design that can be used for any number of substrate processing techniques. The plasma source may include a plurality of discrete electrodes that are integrated with a reference electrode and a gas feed structure to generate a uniform, stable and repeatable plasma during processing. The plurality of discrete electrodes include an array of electrodes that can be biased separately, in groups or all in unison, relative to a reference electrode. The plurality of discrete electrodes may include a plurality of conductive rods that are positioned to generate a plasma within a processing region of a process chamber. The plurality of discrete electrodes is provided RF power from standing or traveling waves imposed on a power distribution element to which the electrodes are connected.
    Type: Grant
    Filed: June 6, 2019
    Date of Patent: April 7, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Kenneth S. Collins, Michael R. Rice, Kartik Ramaswamy, James D. Carducci, Yue Guo, Olga Regelman
  • Patent number: 10616988
    Abstract: Approaches herein provide a plasma arc torch including a tip surrounding an electrode, the electrode having a proximal end and a distal end, and a shield surrounding the tip, the shield including an exit orifice proximate the distal end of the electrode. The torch may further include a linear actuating device coupled to the electrode for actuating the electrode such that the distal end of the electrode moves axially relative to the tip and the exit orifice of the shield. In some approaches, the linear actuating device is operable to actuate the electrode along a central longitudinal axis extending through the tip. In some approaches, the linear actuating device may include one of: a micro linear drive motor, a micro linear stepper motor, a voice coil, a solenoid coil, and a magnetostrictive actuator. In some approaches, the electrode is actuated during a welding or cutting cycle of the torch.
    Type: Grant
    Filed: June 20, 2017
    Date of Patent: April 7, 2020
    Assignee: The ESAB Group Inc.
    Inventors: Andrew Raymond, David A. Tatham, Leonid Pekker, Daniel A. Cote, Geoffrey H. Putnam, Ryan Lynaugh
  • Patent number: 10607815
    Abstract: Methods of operating and assembling a plasma chamber are disclosed. An operating method includes tuning a match network of a plasma chamber while running a non-plasma discharge recipe. A hardware impedance of the plasma chamber is calculated from the match network settings from the tuning. A match loss for the plasma chamber is also calculated according to match network settings. A radio frequency (RF) power setting for the first plasma chamber is set according to the calculated hardware impedance and the calculated match loss. Such methods can be utilized to provide chamber-to-chamber performance matching across different plasma chambers. Certain disclosed methods of operating the plasma chamber can be utilized to identify hardware faults during operation and/or assembly processes.
    Type: Grant
    Filed: June 29, 2018
    Date of Patent: March 31, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Sathyendra Ghantasala, Hyun-Ho Doh, Vijayakumar C. Venugopal
  • Patent number: 10595365
    Abstract: Embodiments of the invention generally provide a lid heater for a plasma processing chamber. In one embodiment, a lid heater assembly is provided that includes a thermally conductive base. The thermally conductive base has a planar ring shape defining an inner opening. The lid heater assembly further includes a heating element disposed on the thermally conductive base, and an insulated center core disposed across the inner opening of the thermally conductive base.
    Type: Grant
    Filed: October 5, 2011
    Date of Patent: March 17, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Alan H. Ouye, Graeme Scott, Keven Kaisheng Yu, Michael N. Grimbergen
  • Patent number: 10573493
    Abstract: Methods and apparatus for plasma processing are provided herein. In some embodiments, a plasma processing apparatus includes a process chamber having an interior processing volume; a first RF coil disposed proximate the process chamber to couple RF energy into the processing volume; and a second RF coil disposed proximate the process chamber to couple RF energy into the processing volume, the second RF coil disposed coaxially with respect to the first RF coil, wherein the first and second RF coils are configured such that RF current flowing through the first RF coil is out of phase with RF current flowing through the RF second coil.
    Type: Grant
    Filed: March 15, 2016
    Date of Patent: February 25, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Valentin N. Todorow, Samer Banna, Ankur Agarwal, Zhigang Chen, Tse-Chiang Wang, Andrew Nguyen, Martin Jeff Salinas, Shahid Rauf
  • Patent number: 10553465
    Abstract: A system for controlling of wafer bow in plasma processing stations is described. The system includes a circuit that provides a low frequency RF signal and another circuit that provides a high frequency RF signal. The system includes an output circuit and the stations. The output circuit combines the low frequency RF signal and the high frequency RF signal to generate a plurality of combined RF signals for the stations. Amount of low frequency power delivered to one of the stations depends on wafer bow, such as non-flatness of a wafer. A bowed wafer decreases low frequency power delivered to the station in a multi-station chamber with a common RF source. A shunt inductor is coupled in parallel to each of the stations to increase an amount of current to the station with a bowed wafer. Hence, station power becomes less sensitive to wafer bow to minimize wafer bowing.
    Type: Grant
    Filed: June 30, 2017
    Date of Patent: February 4, 2020
    Assignee: Lam Research Corporation
    Inventors: Edward Augustyniak, David French, Sunil Kapoor, Yukinori Sakiyama, George Thomas
  • Patent number: 10545118
    Abstract: A dielectric barrier discharge ionization detector (BID) capable of achieving a high level of signal-to-noise ratio in a stable manner is provided. In a BID having a high-voltage electrode, upstream-side ground electrode and downstream-side ground electrode circumferentially formed on the outer circumferential surface of a cylindrical dielectric tube, a heater for heating the cylindrical dielectric tube or tube-line tip member attached to the upper end of the same tube is provided. Increasing the temperature of the cylindrical dielectric tube by this heater improves the stability of the electric discharge, whereby the amount of noise is reduced and a high level of signal-to-noise is achieved.
    Type: Grant
    Filed: September 7, 2017
    Date of Patent: January 28, 2020
    Assignee: Shimadzu Corporation
    Inventor: Kei Shinada
  • Patent number: 10548210
    Abstract: Non-disperse, periodic microplasmas are generated in a volume lacking interfering structures, such as electrodes, to enable photonic interaction between incident electromagnetic energy and the non-disperse, periodic microplasmas. Preferred embodiments leverage 1D, 2D, 3D and super 3D non-disperse, periodic microplasmas. In preferred embodiments, the non-disperse, periodic microplasmas are elongate columnar microplasmas. In other embodiments, the non-disperse, periodic microplasmas are discrete isolated microplasmas. The photonic properties can change by selectively activating groups of the periodic microplasmas.
    Type: Grant
    Filed: September 28, 2016
    Date of Patent: January 28, 2020
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: J. Gary Eden, Paul V. Braun, Sung-Jin Park, Hee Jun Yang, Peng Sun, Runyu Zhang
  • Patent number: 10475624
    Abstract: In frequency control where impedance matching is performed by frequency sweep in an RF power supply device, a frequency sweep direction is specified, allowing a reflection coefficient and/or reflected power to move to a minimum, whereby it is possible to reduce a time length required until detecting the frequency that enables the reflection coefficient and/or the reflected power to be minimized. The frequency control for impedance matching in the RF power supply device is performed according to the following two-stage control; A) phase control that specifies the frequency sweep direction that allows the reflection coefficient and/or the reflected power to move to a minimum, based on the phase state of oscillating frequency, and that starts increasing or decreasing the frequency in thus specified sweep direction; and B) reflected power control where the reflection coefficient or the reflection amount is used as a control end condition for completing the frequency control.
    Type: Grant
    Filed: September 7, 2016
    Date of Patent: November 12, 2019
    Assignee: KYOSAN ELECTRIC MFG. CO., LTD.
    Inventors: Itsuo Yuzurihara, Ryosuke Ohma
  • Patent number: 10471465
    Abstract: The invention provides a method for forming regular polymer thin films on a substrate using atmospheric plasma discharges. In particular, the method allows for the deposition of functional polymer thin films which require a high regularity and a linear polymer structure.
    Type: Grant
    Filed: May 6, 2015
    Date of Patent: November 12, 2019
    Assignee: Luxembourg Institute of Science and Technology (LIST)
    Inventors: Nicolas Boscher, Patrick Choquet, David Duday, Florian Hilt
  • Patent number: 10468233
    Abstract: Methods of operating a plasma enhanced substrate processing system using pulsed radio frequency (RF) power are provided herein. In some embodiments, a method of operating a plasma enhanced substrate processing system using pulsed radio frequency (RF) power includes providing a first pulsed RF power waveform to a process chamber at a first power level during a first time period, providing a second pulsed RF power waveform at a first power level to the process chamber during the first time period, obtaining a first reflected power created by the first and second pulsed RF power waveforms provided during the first time period, and performing a first load leveling process to adjust the first power level of the first pulsed RF power waveform to compensate for the obtained reflected power during the first time period to produce a delivered power at a preset power level.
    Type: Grant
    Filed: August 29, 2017
    Date of Patent: November 5, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Katsumasa Kawasaki, Justin Phi, Sergio Shoji
  • Patent number: 10462889
    Abstract: The invention relates to a pulse generator comprising an inductor that is intended to store energy that is delivered, during a charge phase, by a DC voltage source to two power supply terminals of the generator, and to transfer the energy to the dielectric-barrier discharge device during a discharge phase via a transformer, the generator further comprising: an arrangement of a first and of a second circuits in series that are connected at a node N of the generator; the first circuit comprising two branches, one of the two branches comprising the inductor, and the other branch comprising a diode and the transformer, the secondary being connected to the dielectric-barrier discharge device; the second circuit comprising a controlled switch.
    Type: Grant
    Filed: August 24, 2017
    Date of Patent: October 29, 2019
    Assignee: CLARTEIS
    Inventor: Sounil Bhosle
  • Patent number: 10446374
    Abstract: A plasma processing apparatus for plasma processing a substrate comprising includes a chamber having one or more walls, in which a portion of the walls of the chamber is an electrode structure formed from a metallic material and configured to act as a primary winding of an inductively coupled plasma source, and an electrical signal supply device for supplying an electrical signal that drives the electrode structure as a primary winding of an inductively coupled plasma source to sustain an inductively coupled plasma within the chamber.
    Type: Grant
    Filed: March 1, 2017
    Date of Patent: October 15, 2019
    Assignee: SPTS TECHNOLOGIES LIMITED
    Inventor: Paul Bennett
  • Patent number: 10420852
    Abstract: The invention relates to a method (S) for generating a plurality of cold-plasma jets at atmospheric pressure in order to treat a target (2), wherein said method includes the following steps: producing (S1) a primary cold-plasma jet (3) at atmospheric pressure using a plasma source (10); placing (S2) a substrate (20, 21, 30, 32, 34) near the target (2) to be treated, said substrate (20, 21, 30, 32, 34) including at least two through-holes; and passing (S3) the plasma through the through-holes (22) of the substrate (20) such as to generate at least two secondary cold-plasma jets (4) at atmospheric pressure.
    Type: Grant
    Filed: November 26, 2015
    Date of Patent: September 24, 2019
    Assignees: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS), UNIVERSITE D'ORLEANS, INEL
    Inventors: Jean-Michel Pouvesle, Eric Robert, Sebastien Dozias, Michel Hugnot, Vanessa Sarron, Thibault Darny
  • Patent number: 10411510
    Abstract: A surgical instrument system and method are disclosed. The surgical instrument system includes an instrument case and a charging plate that may be placed in a sterile surgical field. The charging plate is configured to receive electrical power from outside the sterile surgical field and transmit that electrical power to other devices within the sterile field.
    Type: Grant
    Filed: November 15, 2017
    Date of Patent: September 10, 2019
    Assignee: DePuy Synthes Products, Inc.
    Inventors: Jason T. Sherman, Sherrod A. Woods, Matthew R. Dressler
  • Patent number: 10410835
    Abstract: A plasma impedance matching unit for a plasma power supply system includes a first power connector for coupling the matching unit to a RF power source, a second power connector for coupling the matching unit to a plasma load, a data link interface for directly coupling the matching unit to another plasma impedance matching unit via a data link, and a controller configured to control the matching unit to match an impedance from the first power connector to an impedance at the second power connector, to operate as a master for at least one other impedance matching unit and/or at least one RF power source of the plasma power supply system, and to communicate via the data link interface with the at least one other impedance matching unit and/or the at least one RF power source of the plasma power supply system.
    Type: Grant
    Filed: November 3, 2017
    Date of Patent: September 10, 2019
    Assignee: TRUMPF Huettinger Sp. z o. o.
    Inventors: Wojciech Glazek, Rafal Bugyi
  • Patent number: 10356888
    Abstract: A plasma generation device and/or a plurality of plasma generation modules are provided. Responsive to a first plasma generation module of the plurality of plasma generation modules being attached to the plasma generation device, the plasma generation device is configured to supply a first voltage to a first electrode of the first plasma generation module and conduct process gas from a tank to the first plasma generation module in order to generate a first type of plasma at the first plasma generation module. Alternatively and/or additionally, responsive to a second plasma generation module of the plurality of plasma generation modules being attached to the plasma generation device, the plasma generation device is configured to supply a second voltage to a second electrode of the second plasma generation module in order to generate a second type of plasma at the second plasma generation module.
    Type: Grant
    Filed: November 24, 2018
    Date of Patent: July 16, 2019
    Inventors: Hamed Nikmaram, Mahmood Ghoranneviss, Nikou Nikmaram
  • Patent number: 10340915
    Abstract: Systems and methods for frequency and match tuning in one state S1 and frequency tuning in another state S2 are described. The systems and methods include determining one or more variables for the states S1 and S2, and tuning a frequency for the state S1 of a radio frequency (RF) generator based on the one or more variables.
    Type: Grant
    Filed: May 9, 2018
    Date of Patent: July 2, 2019
    Assignee: Lam Research Corporation
    Inventor: Ying Wu
  • Patent number: 10327322
    Abstract: PROBLEM: To improve the stability of the process of the plasma ignition, by allowing a high current to pass through an induction coil without increasing the power-supply voltage in the process of the plasma ignition. SOLUTION: An impedance conversion circuit 16 including an inductor 17 and a capacitor 18 is arranged between a full-bridge drive circuit 13 for switching DC voltage and an LC resonance circuit 19 including an induction coil 21 for plasma generation. The capacitance of the capacitor 18 can be varied between two levels, with a switching driver 23 serving as a switcher. When the plasma is to be ignited, the capacitance of the capacitor 18 is set at the higher level to allow a high current to be supplied to the LC resonance circuit 19. After the plasma is brought into a steady state of lighting, the capacitance of the capacitor 18 is changed to the lower level at which an impedance matching is achieved so as to maximize the power efficiency.
    Type: Grant
    Filed: March 2, 2015
    Date of Patent: June 18, 2019
    Assignee: SHIMADZU CORPORATION
    Inventor: Toshiya Habu
  • Patent number: 10297422
    Abstract: A control system is provided and includes a memory and a conversion module. The memory is configured to store position data of first positions of a first variable capacitor of a first match network of a first plasma processing system. Each of the first positions of the first variable capacitor corresponds to a respective one of multiple loads experienced by the first match network. The conversion module is configured to: obtain the position data stored in the memory; determine reference capacitor positions based on the position data; determine a calibrated conversion model based on the reference capacitor positions, where the calibrated conversion model converts second positions of the first variable capacitor to comparable capacitor positions, and where the second positions are positions of the first variable capacitor existing subsequent to the determination of the calibrated conversion model; and store the calibrated conversion model.
    Type: Grant
    Filed: October 27, 2016
    Date of Patent: May 21, 2019
    Assignee: LAM RESEARCH CORPORATION
    Inventor: Arthur H. Sato
  • Patent number: 10296676
    Abstract: Systems and methods for tuning an impedance matching network in a step-wise fashion are described. By tuning the impedance matching network in a step-wise fashion instead of directly to achieve optimum values of a radio frequency (RF) and a combined variable capacitance, processing of a wafer using the tuned optimal values becomes feasible.
    Type: Grant
    Filed: March 4, 2016
    Date of Patent: May 21, 2019
    Assignee: Lam Research Corporation
    Inventors: Arthur M. Howald, John C. Valcore, Jr., Andrew Fong, David Hopkins
  • Patent number: 10290470
    Abstract: An apparatus and method for the creation of negative ion beams is disclosed. The apparatus includes an RF ion source, having an extraction aperture. An antenna disposed proximate a dielectric window is energized by a pulsed RF power supply. While the RF power supply is actuated, a plasma containing primarily positive ions and electrons is created. When the RF power supply is deactivated, the plasma transforms into an ion-ion plasma. Negative ions may be extracted from the RF ion source while the RF power supply is deactivated. These negative ions, in the form of a negative ribbon ion beam, may be directed toward a workpiece at a specific incident angle. Further, both a positive ion beam and a negative ion beam may be extracted from the same ion source by pulsing the bias power supply multiple times each period.
    Type: Grant
    Filed: July 10, 2017
    Date of Patent: May 14, 2019
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Daniel Distaso, Svetlana B. Radovanov, Joseph P. Dzengeleski
  • Patent number: 10283875
    Abstract: A system and method to control active and adaptive antenna arrays processes information to determine one or more areas of interest for subsequent transmission. The method includes selecting one or more antennas among a set of available antennas in different locations of a vehicle to perform the subsequent transmission. Each of the one or more antennas includes one or more antenna elements. The method also includes assigning a magnitude and phase for the subsequent transmission by each of the one or more antenna elements of each of the one or more antennas.
    Type: Grant
    Filed: July 19, 2017
    Date of Patent: May 7, 2019
    Assignee: GM GLOBAL TECHNOLOGY OPERATIONS LLC
    Inventors: Ofer Givati, Igal Kotzer
  • Patent number: 10283859
    Abstract: Aspects of this disclosure relate to selectively shielded radio frequency modules. A radio frequency module can include a package substrate, a radio frequency shielding structure extending above the package substrate, a radio frequency component over the package substrate and in an interior of the radio frequency shielding structure, and an antenna on the package substrate external to the radio frequency shielding structure. The shielding structure can include a shielding layer providing a shield over the radio frequency component and leaving the radio frequency module unshielded over the antenna.
    Type: Grant
    Filed: April 18, 2017
    Date of Patent: May 7, 2019
    Assignee: Skyworks Solutions, Inc.
    Inventors: Hoang Mong Nguyen, Anthony James LoBianco, Gregory Edward Babcock, Darren Roger Frenette, George Khoury
  • Patent number: 10271418
    Abstract: An electron accelerator is provided. The electron accelerator comprises a resonant cavity comprising a hollow closed conductor, an electron source configured to inject a beam of electrons, and an RF system. The electron accelerator further comprises a magnet unit, comprising a deflecting magnet. The deflecting magnet is configured to generate a magnetic field in a deflecting chamber in fluid communication with the resonant cavity by a deflecting window. The magnetic field is configured to deflect an electron beam emerging out of the resonant cavity through the deflecting window along a first radial trajectory in the mid-plane (Pm) and to redirect the electron beam into the resonant cavity through the deflecting window towards the central axis along a second radial trajectory. The deflecting magnet is composed of first and second permanent magnets positioned on either side of the mid-plane (Pm).
    Type: Grant
    Filed: November 7, 2017
    Date of Patent: April 23, 2019
    Assignee: Ion Beam Applications S.A.
    Inventors: Michel Abs, Willem Kleeven, Jarno Van De Walle, Jérémy Brison, Denis Deschodt
  • Patent number: 10262845
    Abstract: Within an ion pump, accelerated ions leave the center portion of an anode tube due to the anode tube symmetry and the generally symmetrical electric fields present. The apparent symmetry within the anode tube may be altered by making the anode tube longitudinally segmented and applying independent voltages to each segment. The voltages on two adjacent segments may be time varying at different rates to achieve a rasterizing process. In various embodiments, one or more wire internal to the anode structure and having a time-varying electric potential may alter the trajectory of the ions leaving the anode tube, as may the shape of the anode near the ends of the anode tube.
    Type: Grant
    Filed: October 2, 2015
    Date of Patent: April 16, 2019
    Assignee: HAMILTON SUNDSTRAND CORPORATION
    Inventors: Ben D. Gardner, David E. Burchfield
  • Patent number: 10256535
    Abstract: Selectively shielded radio frequency modules are disclosed. A radio frequency module can include a package substrate, a radio frequency component on the package substrate, a multi-layer antenna, a radio frequency shielding structure configured to provide shielding between the multi-layer antenna and the radio frequency component. The radio frequency shielding structure can include a shielding layer providing a shield over the radio frequency component and leaving the radio frequency module unshielded over the antenna.
    Type: Grant
    Filed: April 18, 2017
    Date of Patent: April 9, 2019
    Assignee: Skyworks Solutions, Inc.
    Inventors: Hoang Mong Nguyen, Anthony James LoBianco, Gregory Edward Babcock, Darren Roger Frenette, George Khoury, René Rodriguez
  • Patent number: 10256078
    Abstract: Systems and methods for tuning a radio frequency (RF) generator are described. One of the methods includes supplying, by a high frequency RF generator, a high frequency RF signal to the IMN. The method includes accessing a plurality of measurement values of a variable measured at an output of the high frequency RF generator to generate a parameter. The variable is measured during a plurality of cycles of operation of a low frequency RF generator. The measurement values are associated with a plurality of values of power supplied by the high frequency RF generator. The method includes determining, for one of the cycles, a value of a frequency of the high frequency RF generator and a value of a factor associated with a shunt circuit of the IMN for which there is an increase in efficiency in power delivered by the high frequency RF generator.
    Type: Grant
    Filed: May 22, 2018
    Date of Patent: April 9, 2019
    Assignee: Lam Research Corporation
    Inventors: Arthur M. Howald, John C. Valcore, Jr., Bradford J. Lyndaker
  • Patent number: 10249485
    Abstract: A pulsed plasma analyzer includes a pulse modulator that controls an off-time of a pulsed plasma that includes a target radical, an optical spectrometer that measures optical emissions of the pulsed plasma after the off-time to determine optical emission data, and a concentration estimating module that estimates a concentration of the target radical during the off-time based on an initial optical emission value of the optical emission data that changes as a function of the off-time, and outputs an estimated concentration.
    Type: Grant
    Filed: October 6, 2017
    Date of Patent: April 2, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Vladimir Volynets, Protopopov Vladimir, Young Do Kim, Yuri Barsukov, Sang Heon Lee, Sung Ho Jang
  • Patent number: 10217612
    Abstract: A plasma processing apparatus includes a processing vessel; a carrier wave group generating unit configured to generate a carrier wave group including multiple carrier waves having different frequencies belonging to a preset frequency band centered around a predetermined center frequency; and a plasma generating unit configured to generate plasma within the processing vessel by using the carrier wave group.
    Type: Grant
    Filed: May 10, 2016
    Date of Patent: February 26, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Shinji Kubota
  • Patent number: 10197015
    Abstract: A feedstock delivery system transfers a carbonaceous material, such as municipal solid waste, into a product gas generation system. The feedstock delivery system includes a splitter for splitting bulk carbonaceous material into a plurality of carbonaceous material streams. Each stream is processed using a weighing system for gauging the quantity of carbonaceous material, a densification system for forming plugs of carbonaceous material, a de-densification system for breaking up the plugs of carbonaceous material, and a gas and carbonaceous material mixing system for forming a carbonaceous material and gas mixture. A pressure of the mixing gas is reduced prior to mixing with the carbonaceous material, and the carbonaceous material to gas weight ratio is monitored. A transport assembly conveys the carbonaceous material and gas mixture to a first reactor where at least the carbonaceous material within the mixture is subject to thermochemical reactions to form the product gas.
    Type: Grant
    Filed: August 30, 2016
    Date of Patent: February 5, 2019
    Assignee: ThermoChem Recovery International, Inc.
    Inventors: Ravi Chandran, Daniel A. Burciaga, Daniel Michael Leo, Shawn Robert Freitas, Dave G. Newport, Justin Kevin Miller, Kaitlin Emily Harrington, Brian Christopher Attwood, Emily Jane Schultheis, Kelly Ann Kishton
  • Patent number: 10197014
    Abstract: A feedstock delivery system transfers a carbonaceous material, such as municipal solid waste, into a product gas generation system. The feedstock delivery system includes a splitter for splitting bulk carbonaceous material into a plurality of carbonaceous material streams. Each stream is processed using a weighing system for gauging the quantity of carbonaceous material, a densification system for forming plugs of carbonaceous material, a de-densification system for breaking up the plugs of carbonaceous material, and a gas and carbonaceous material mixing system for forming a carbonaceous material and gas mixture. A pressure of the mixing gas is reduced prior to mixing with the carbonaceous material, and the carbonaceous material to gas weight ratio is monitored. A transport assembly conveys the carbonaceous material and gas mixture to a first reactor where at least the carbonaceous material within the mixture is subject to thermochemical reactions to form the product gas.
    Type: Grant
    Filed: August 30, 2016
    Date of Patent: February 5, 2019
    Assignee: ThermoChem Recovery International, Inc.
    Inventors: Ravi Chandran, Daniel A. Burciaga, Daniel Michael Leo, Shawn Robert Freitas, Dave G. Newport, Justin Kevin Miller, Kaitlin Emily Harrington, Brian Christopher Attwood, Emily Jane Schultheis, Kelly Ann Kishton
  • Patent number: 10187968
    Abstract: Traditional plasma voltage generator circuits consist mainly of fly-back or pulse forming networks. These systems tend supply plasma generating pulses to plasma reactors at frequencies less than 30 kHz with most being less than 5 kHz. In addition these traditional plasma voltage generators are limited in the ability to adjust to dynamic reactor conditions, are energy inefficient and are limited in the amount of material ionized. An innovative drive system is presented herein that is energy efficient, can operate at frequencies below and well above 30 kHz, and can react to dynamic conditions in the plasma reactor allowing much greater flexibility and enhanced operating capabilities.
    Type: Grant
    Filed: October 7, 2016
    Date of Patent: January 22, 2019
    Assignee: Ion Inject Technology LLC
    Inventors: Walter Riley Buchanan, Grant William Forsee
  • Patent number: 10181406
    Abstract: In an inductively-coupled plasma torch unit, a coil, a first ceramic block, and a second ceramic block are arranged parallel to one another, and an elongated chamber has an annular shape. Plasma generated inside the chamber is ejected toward a substrate through an opening portion in the chamber. The substrate is processed by relatively moving the elongated chamber and the substrate in a direction perpendicular to a longitudinal direction of the opening portion. A rotating ceramic pipe having a cylindrical shape is provided so as to cause a refrigerant to flow into a cavity formed inside the ceramic pipe. Accordingly, it becomes possible to apply greater high-frequency power, thereby enabling fast plasma processing.
    Type: Grant
    Filed: September 1, 2015
    Date of Patent: January 15, 2019
    Assignee: Panasonic Intellectual Property Management Co., Ltd.
    Inventors: Tomohiro Okumura, Satoshi Suemasu
  • Patent number: 10147586
    Abstract: The present invention discloses an inductively coupled coil and an inductively coupled plasma device using the same. The inductively coupled coil comprises an internal coil and an exterior coil which are respective from each other and coaxially arranged, internal coil comprising a plurality of internal respective branches having the same configurations which are nested together, the plurality of internal respective branches being arranged symmetrically with respect to an axis of the inductively coupled coil; the external coil comprising a plurality of external respective branches having the same configurations which are nested together, the plurality of external respective branches being arranged symmetrically with respect to the axis of the inductively coupled coil. The inductively coupled coil is located on the reaction chamber of the inductively coupled plasma device and is connected to a RF source.
    Type: Grant
    Filed: December 14, 2016
    Date of Patent: December 4, 2018
    Assignee: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
    Inventors: Qiaoli Song, Jianhui Nan
  • Patent number: 10139283
    Abstract: Methods and systems for performing non-contact temperature measurements of optical elements with long wavelength infrared light are described herein. The optical elements under measurement exhibit low emissivity to long wavelength infrared light and are often highly reflective or highly transmissive to long wavelength infrared light. In one aspect, a material coating having high emissivity, low reflectivity, and low transmission at long wavelength IR wavelengths is disposed over selected portions of one or more optical elements of a metrology or inspection system. The locations of the material coating are outside the direct optical path of the primary measurement light employed by the metrology or inspection system to perform measurements of a specimen. Temperature measurements of the front and back surfaces of an IR-transparent optical element are performed with a single IR camera. Temperature measurements are performed through multiple optical elements in an optical path of a primary measurement beam.
    Type: Grant
    Filed: November 23, 2016
    Date of Patent: November 27, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Anatoly Shchemelinin, Ilya Bezel, Kenneth P. Gross
  • Patent number: 10128118
    Abstract: An apparatus for plasma processing a substrate is provided. The apparatus comprises a processing chamber, a substrate support disposed in the processing chamber, and a lid assembly coupled to the processing chamber. The lid assembly comprises a conductive gas distributor coupled to a power source. A tuning electrode may be disposed between the conductive gas distributor and the chamber body for adjusting a ground pathway of the plasma. A second tuning electrode may be coupled to the substrate support, and a bias electrode may also be coupled to the substrate support.
    Type: Grant
    Filed: September 23, 2013
    Date of Patent: November 13, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Juan Carlos Rocha-Alvarez, Amit Kumar Bansal, Ganesh Balasubramanian, Jianhua Zhou, Ramprakash Sankarakrishnan, Mohamad A. Ayoub, Jian J. Chen
  • Patent number: 10102321
    Abstract: Systems and methods for defining a refined RF model of an RF transmission path includes identifying a selected initial term in the RF model having a least significant impact on a goodness of fit of the RF model with the selected initial term removed from the RF model. The initial term having the least significant impact on the goodness of fit is removed from the RF model. A selected non-initial term having a most significant impact on the goodness of fit of the RF model is identified and added to the RF model. The non-initial term being selected from a set of terms describing corresponding elements of the RF transmission path. The initial terms and non-initial terms having the most significant impact of goodness of fit are selected for a refined RF model.
    Type: Grant
    Filed: November 10, 2014
    Date of Patent: October 16, 2018
    Assignee: Lam Research Corporation
    Inventors: Henry S. Povolny, John C. Valcore, Jr.