Gas Ionization Type (e.g., Ion Pump Or Gauge Source) Patents (Class 315/111.91)
  • Patent number: 8508134
    Abstract: A Hall-current ion source with a narrow ion beam energy distribution is presented. A narrow ion beam energy distribution is provided by a utilization of a multi-chamber anode through which a working gas is applied and delivers a uniform working gas distribution in a discharge channel. Introduction of a working gas through a lower part of anode makes applied electric potential in a narrow area and leading to enhanced conditions for a working gas ionization, high ion beam current, high translation of a discharge voltage into a “monochromatic” ion beam mean energy distribution. A multi-chamber anode with a slit exit for introduction of a working gas into area under anode is utilized to prevent a backflow of insulating and dielectric depositions on anode parts, and under anode area makes a nominal operation with reactive gases without a phenomenon called as “anode poisoning” during long operating hours.
    Type: Grant
    Filed: July 29, 2010
    Date of Patent: August 13, 2013
    Inventors: Evgeny Vitalievich Klyuev, Viacheslav Vasilievich Zhurin
  • Patent number: 8481965
    Abstract: The process of the present application facilitates the production of electric energy by the deliberate extraction of electrons from atoms and molecules of a gas, vapor, liquid, particulate solid, or any other form of matter that can be passed along the surface or through the electron extraction unit. The extracted electrons are captured, collected and controlled or regulated for distribution as electric energy. It is an energy efficient process for the extraction and capture of electrons for the production of electric energy with positive atomic or molecular ions as byproducts. The product ions can then be confined in a coherent beam or restricted to a magnetic enclosure or by other confinement methods, expelled to the atmosphere, another environment or to ground, or modified into useful molecules. These results are accomplished by the forcible extraction and capture of electrons from the object particles by electrically charged particles in a strong electric field.
    Type: Grant
    Filed: February 8, 2011
    Date of Patent: July 9, 2013
    Inventor: Eugene B. Pamfiloff
  • Patent number: 8481980
    Abstract: An ion beam machining and observation method relevant to a technique of cross sectional observation of an electronic component, through which a sample is machined by using an ion beam and a charged particle beam processor capable of reducing the time it takes to fill up a processed hole with a high degree of flatness at the filled area. The observation device is capable of switching the kind of gas ion beam used for machining a sample with the kind of a gas ion beam used for observing the sample. To implement the switch between the kind of a gas ion beam used for sample machining and the kind of a gas ion beam used for sample observation, at least two gas introduction systems are used, each system having a gas cylinder a gas tube, a gas volume control valve, and a stop valve.
    Type: Grant
    Filed: April 23, 2008
    Date of Patent: July 9, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroyasu Shichi, Satoshi Tomimatsu, Kaoru Umemura, Noriyuki Kaneoka, Koji Ishiguro
  • Patent number: 8471201
    Abstract: Disclosed are methods, apparatus, systems, processes and other inventions relating to: ion sources with controlled electro-pneumatic superposition, ion source synchronized to RF multipole, ion source with charge injection, optimized control in active feedback system, radiation supported charge-injection liquid spray, ion source with controlled liquid injection as well as various embodiments and combinations of each of the foregoing.
    Type: Grant
    Filed: May 30, 2011
    Date of Patent: June 25, 2013
    Inventor: Andreas Hieke
  • Patent number: 8466624
    Abstract: Performance of an electrohydrodynamic fluid accelerator device may be improved and adverse events such as sparking or arcing may be reduced based, amongst other things, on electrode geometries and/or positional interrelationships of the electrodes. For example, in a class of EHD devices that employ a longitudinally elongated corona discharge electrode (often, but not necessarily, a wire), a plurality of generally planar, collector electrodes may be positioned so as to present respective leading surfaces toward the corona discharge electrode. The generally planar collector electrodes may be oriented so that their major surfaces are generally orthogonal to the longitudinal extent of the corona discharge electrode. In such EHD devices, a high intensity electric field can be established in the “gap” between the corona discharge electrode and leading surfaces of the collector electrodes.
    Type: Grant
    Filed: September 3, 2009
    Date of Patent: June 18, 2013
    Assignee: Tessera, Inc.
    Inventors: Nels Jewell-Larsen, Kenneth A. Honer, Matt Schwiebert, Hongyu Ran, Piyush Savalia, Yan Zhang
  • Publication number: 20130140453
    Abstract: An ion source (12, 102) for a mass spectrometer comprising an ionizer (18, 106) receiving an ionizer gas from an ionizer gas supply (16), a conditioner (20) in communication with the ionizer (18, 106), a reactor (22, 110) in communication with the conditioner (20) and adapted for communication with the mass spectrometer, the reactor (22, 110) adapted to receive a sample from a sample supply in communication with the reactor (22, 110), wherein the conditioner (20) is sized to remove fast diffusing electrons from a flow of the ionizer gas from the glow discharge ionizer (18, 106) to the reactor (22, 110).
    Type: Application
    Filed: August 19, 2011
    Publication date: June 6, 2013
    Applicant: LECO Corporation
    Inventors: Anatoly N. Verenchikov, Anatoly Zamyatin
  • Patent number: 8450698
    Abstract: An ion airflow generating device includes a number of generator stages, each of which includes a number of generators. Each generator includes a needle-shaped emitter and a ring-shaped receiver. The receivers in the same stage are arranged in an array. Each receiver defines a groove in an outer circumferential surface thereof along a direction parallel to the central axis thereof. Each two adjacent receivers in a former generator stage connect with each other, and the grooves thereof cooperatively define a hole for holding an emitter in a next generator stage. The receivers in the next generator stage symmetrically offset from the receivers in the former generator stage such that each emitter aligns to the center of a corresponding receiver.
    Type: Grant
    Filed: October 18, 2010
    Date of Patent: May 28, 2013
    Assignee: Ampower Technology Co., Ltd.
    Inventors: Tsung-Liang Hung, Chi-Hsiung Lee, Yu-Hsiao Chao, Nai-Chun Chang
  • Patent number: 8450699
    Abstract: To obtain a SEM capable of both providing high resolution at low acceleration voltage and allowing high-speed elemental distribution measurement, a SE electron source including Zr—O as a diffusion source is shaped so that the radius r of curvature of the tip is more than 0.5 ?m and less than 1 ?m, and the cone angle ? of a conical portion at a portion in the vicinity of the tip at a distance of 3r to 8r from the tip, is more than 5° and less than (8/r)°. Another SE electron source uses Ba—O and includes a barium diffusion supply means composed of a sintered metal and a barium diffusion source containing barium oxide.
    Type: Grant
    Filed: December 4, 2009
    Date of Patent: May 28, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takashi Ohshima, Satoshi Tomimatsu
  • Publication number: 20130119252
    Abstract: To provide a gas field ion source having a high angular current density, the gas field ion source is configured such that at least a base body of an emitter tip configuring the gas field ion source is a single crystal metal, such that the apex of the emitter tip is formed into a pyramid shape or a cone shape having a single atom at the top, and such that the extraction voltage in the case of ionizing helium gas by the single atom is set to 10 kV or more.
    Type: Application
    Filed: July 13, 2011
    Publication date: May 16, 2013
    Inventors: Yoshimi Kawanami, Shinichi Matsubara, Hironori Moritani, Noriaki Arai, Hiroyasu Shichi, Tomihiro Hashizume, Hiroyasu Kaga, Norihide Saho, Hiroyuki Muto, Yoichi Ose
  • Patent number: 8411435
    Abstract: In thermal management systems that employ EHD devices to motivate flow of air between ventilated boundary portions of an enclosure, it can be desirable to have some heat transfer surfaces participate in electrohydrodynamic acceleration of fluid flow while providing additional heat transfer surfaces that may not. In some embodiments, both collector electrodes and additional heat transfer surfaces are thermally coupled into a heat transfer path. Collector electrodes then contribute both to flow of cooling air and to heat transfer to the air flow so motivated. The collector electrodes and additional heat transfer surfaces may be parts of a unitary, or thermally coupled, structure that is introduced into a flow path at multiple positions therealong. In some embodiments, the collector electrodes and additional heat transfer surfaces may be proximate each other along the flow path. In some embodiments, the collector electrodes and additional heat transfer surfaces may be separate structures.
    Type: Grant
    Filed: November 10, 2009
    Date of Patent: April 2, 2013
    Assignee: Tessera, Inc.
    Inventors: Nels Jewell-Larsen, Kenneth A. Honer, Matt Schwiebert, Hongyu Ran, Piyush Savalia, Yan Zhang
  • Patent number: 8399865
    Abstract: An ion implantation system and process, in which the performance and lifetime of the ion source of the ion implantation system are enhanced, by utilizing isotopically enriched dopant materials, or by utilizing dopant materials with supplemental gas(es) effective to provide such enhancement.
    Type: Grant
    Filed: August 6, 2012
    Date of Patent: March 19, 2013
    Assignee: Advanced Technology Materials, Inc.
    Inventors: Robert Kaim, Joseph D. Sweeney, Anthony M. Avila, Richard S. Ray
  • Patent number: 8389953
    Abstract: A focused ion beam apparatus includes an ion gun unit having an emitter tip, a gas supply unit that supplies gas to the tip, and an ion source gas supply source. An extracting electrode ionizes the gas adsorbed onto the surface of the tip and extracts ions by applying a voltage between the extracting electrode and the tip. A cathode electrode accelerates the ions toward a sample. An aperture member has an opening that passes therethrough a part of the ion beam ejected from the ion gun unit, and a lens system focuses the ion beam onto the sample.
    Type: Grant
    Filed: February 15, 2011
    Date of Patent: March 5, 2013
    Assignee: SII NanoTechnology Inc.
    Inventors: Takashi Ogawa, Kenichi Nishinaka, Yoshihiro Koyama
  • Patent number: 8378576
    Abstract: [Objection of the invention]An ion beam generator, a thermal distortion in a grid assembly is reduced. [Structure to solve the objection]Thermal expansion coefficients ?P, ?M and ?G, for a sidewall (1A) of a discharge chamber, mounting platform (40) and extraction grid electrode assembly (20) are selected to have a relation: ?P>?M??G. For example, the material of discharge chamber sidewall is stainless steel o aluminum, the material of grids is Mo, W or C and the material of platform is Ti or Mo.
    Type: Grant
    Filed: October 4, 2010
    Date of Patent: February 19, 2013
    Assignee: Canon Anelva Corporation
    Inventors: Einstein Noel Abarra, Yasushi Miura, Eiji Fujiyama, Naoyuki Suzuki, Yasuyuki Taneda, Yasushi Kamiya
  • Publication number: 20130026917
    Abstract: A Hall effect thruster with an annular discharge channel that includes inner and outer sidewall electrodes located at an axial position that is downstream from the anode. The Hall effect thruster may also include shielding elements configured to shield the inner and outer sidewall electrodes from electrons in the annular discharge channel. The shielding elements may be magnetic shielding elements.
    Type: Application
    Filed: July 27, 2012
    Publication date: January 31, 2013
    Inventors: Mitchell L.R. Walker, Kunning Gabriel Xu
  • Patent number: 8294369
    Abstract: A plasma generator for delivering a generated plasma to an area that is a distance from the area where the plasma is initially generated, including a dielectric tube portion extending from a gas inlet to a discharge aperture; an anode formed at least substantially around a portion of the discharge tube, wherein the anode is electrically coupled, via an electrical connection, to a power supply; a cathode formed at least substantially around a portion of the discharge tube, wherein the cathode is electrically coupled, via an electrical connection, to the power supply; and an elongate discharge tube attached or coupled to the discharge aperture such that when a generated plasma is produced, the generated plasma flows through the discharge tube.
    Type: Grant
    Filed: August 18, 2009
    Date of Patent: October 23, 2012
    Assignee: Old Dominion University
    Inventor: Mounir Laroussi
  • Patent number: 8293173
    Abstract: Improved electron beam sterilization apparatus and shielding techniques for use in are provided. A controller modulates an electron beam when sterilizing an interior to an object to ensure that adequate dose is received. Sterilization carousels are configured with input/discharge feeds to reduce the possibility of humans being exposed to dangerous levels of radiation. The system reduces the amount of shielding required to thereby lower cost of installation.
    Type: Grant
    Filed: July 22, 2010
    Date of Patent: October 23, 2012
    Assignee: Hitachi Zosen Corporation
    Inventors: Michael Lawrence Bufano, Steven Raymond Walther, Peter F. Hays, William Frederick Thomson, Arthur Wayne Sommerstein, Gerald Martin Friedman, P. Michael Fletcher, Stephen Whittaker Into, Anne Testoni, Brian S. Phillips
  • Patent number: 8294120
    Abstract: The process of the present application differs substantially from the prior art, as it facilitates the deliberate extraction of electrons from atoms and molecules during the production of positive ions, as compared with occasionally and accidentally knocking them away. It is an energy efficient process for the extraction and capture of electrons, production of positive ions and negative ions, the construction of molecules and the selective decomposition of molecules. These results are accomplished by the forcible extraction of electrons from the object molecules and atoms. The present process is superior to any other intended for the production of positive ions and the composition and the decomposition of molecules, because it not only simplifies the process, but it also speeds the process, allowing a continuous stream or beam of particles to be so converted to positive ions.
    Type: Grant
    Filed: July 26, 2010
    Date of Patent: October 23, 2012
    Inventor: Eugene B. Pamfiloff
  • Patent number: 8274228
    Abstract: A flow tube apparatus may include a flow tube having a first opening and a second opening, a corona electrode provided in the flow tube, a collecting electrode provided in the flow tube, and at least one focusing electrode provided in the flow tube to guide ions and thereby provide an ionic wind. In at least one embodiment, the flow tube apparatus may be provided in an electronic apparatus to provide an air flow.
    Type: Grant
    Filed: December 24, 2009
    Date of Patent: September 25, 2012
    Assignee: Intel Corporation
    Inventors: Mark MacDonald, Rajiv K. Mongia, David B. Go
  • Patent number: 8232728
    Abstract: The invention relates to a method for igniting and generating an expanding diffuse microwave plasma and to a device for carrying out such a method. The method is particularly suited for generating microwave plasmas for the purpose of carrying out plasma treatment of surfaces and substances, particularly three-dimensional objects as well as particles under atmospheric pressure. The aim of the invention is to provide a method for igniting and generating these plasmas that is, particularly under normal and high pressure, easy and operationally safe as well as, in principle, carried out without a flow of gas. The invention also relates to a method and device for carrying out plasma treatment of surfaces and substances by means of such a plasma, which makes an effective plasma treatment possible due to its high stability with regard to plasma generation and maintenance, low gas consumption and a high plasma volume.
    Type: Grant
    Filed: September 7, 2006
    Date of Patent: July 31, 2012
    Assignee: INP Institut Fuer Niedertemperatur-Plasmaphysik e.V.
    Inventors: Udo Krohmann, Torsten Neumann, Joerg Ehlbeck, Kristian Rackow
  • Patent number: 8154210
    Abstract: An ion source is disclosed incorporating various aspects of the invention including i) a vaporizer, ii) a vaporizer valve, iii) a gas feed, iv) an ionization chamber, v) an electron gun, vi) a cooled mounting frame, and vii) an ion exit aperture. The ion source includes means for introducing gaseous feed material into the ionization chamber, means for vaporizing solid feed materials and introducing their vapors into the ionization chamber, means for ionizing the introduced gaseous feed materials within the ionization chamber, and means for extracting the ions thus produced from an ion exit aperture adjacent to the ionization region. In addition, means for accelerating and focusing the exiting ions are provided. The vaporizer, vaporizer valve, gas feed, ionization chamber, electron gun, cooled mounting frame, and ion exit aperture are all integrated into a single assembly in preferred embodiments of the novel ion source.
    Type: Grant
    Filed: December 18, 2009
    Date of Patent: April 10, 2012
    Assignee: SemEquip, Inc.
    Inventors: Thomas Neil Horsky, John Noel Williams
  • Patent number: 8143590
    Abstract: An ion source apparatus has an ion source assembly and a neutralizer. The ion source assembly has a body, a heat-dissipating device, an anode chunk and a gas distributor. The heat-dissipating device has a thermal transfer plate and a first thermal side sheet. The thermal transfer plate has a top, a protrusion and an annular disrupting recess. The protrusion is formed at the top of the thermal transfer plate. The disrupting recess is radially formed around the protrusion. The first thermal side sheet surrounds the protrusion. The gas distributor is mounted securely in the protrusion. Because the protrusion is located between the gas distributor and the first thermal side sheet and the disrupting recess is radially formed around the protrusion, accumulated ions, molecules and deposition film particles are longitudinally disrupted and do not form a short circuit between the gas distributor and the first thermal side sheet.
    Type: Grant
    Filed: July 16, 2010
    Date of Patent: March 27, 2012
    Inventors: Tsai-Cheng Wang, Chin-Chung Yang, An-Ting Hsiao, Yu-Li Tsai
  • Patent number: 8139354
    Abstract: Airflow in a computer chassis may be enhanced or reduced to affect cooling of heat generating devices using an ionic air moving device. A plurality of ionic air moving devices enhance or reduce airflow through a plurality of fluidically parallel airflow zones of the computer chassis in an airflow direction established by a nonionic air moving device. Each ionic air moving device comprises an ion emitter electrode disposed a spaced distance from a collector electrode, wherein a controller independently controls an electrical potential between the emitter and collector electrodes of each ionic air moving device for affecting the rate of airflow through one or more of the plurality of airflow zones.
    Type: Grant
    Filed: May 27, 2010
    Date of Patent: March 20, 2012
    Assignee: International Business Machines Corporation
    Inventors: Michael S. June, Chunjian Ni, Mark E. Steinke
  • Patent number: 8129913
    Abstract: In a closed electron drift thruster, a magnetic circuit for creating a magnetic field in a main annular channel comprises at least one axial magnetic core surrounded by a first coil and an inner upstream pole piece forming a body of revolution, together with a plurality of outer magnetic cores surrounded by outer coils. The magnetic circuit further comprises an essentially radial outer first pole piece defining a concave inner peripheral surface and an essentially radial second pole piece defining a convex outer peripheral surface. The concave inner peripheral surface and the convex outer peripheral surface present respective adjusted profiles that are distinct from circular cylindrical surfaces so as to form between them a gap of varying width presenting zones of maximum value in register with the outer coils and zones of minimum value in between the outer coils so as to create a uniform radial magnetic field.
    Type: Grant
    Filed: January 26, 2010
    Date of Patent: March 6, 2012
    Assignee: SNECMA
    Inventors: Olivier Duchemin, Dominique Valentian
  • Patent number: 8110990
    Abstract: Disclosed is an atmospheric pressure plasma apparatus for enhancing and or controlling the dissociation of a secondary gas by converting a source gas into a plasma state at atmospheric pressure and controlling the interaction between that plasma and the secondary gas using porous metal, and ceramic tubes to create a path having controllable isolation from the region where plasma is generated.
    Type: Grant
    Filed: December 9, 2008
    Date of Patent: February 7, 2012
    Assignees: Korea Institute of Industrial Technology, Board of Regents, The University of Texas System
    Inventors: Bum Ho Choi, Jong Ho Lee, Jung Chan Bae, Yong-Seok Park, Chun-Seong Park, Woo Sam Kim, Gil Sik Lee, Lawrence John Overzet, Byeong Jun Lee
  • Publication number: 20120025710
    Abstract: A Hall-current ion source with a narrow ion beam energy distribution is presented. A narrow ion beam energy distribution is provided by a utilization of a multi-chamber anode through which a working gas is applied and delivers a uniform working gas distribution in a discharge channel. Introduction of a working gas through a lower part of anode makes applied electric potential in a narrow area and leading to enhanced conditions for a working gas ionization, high ion beam current, high translation of a discharge voltage into a “monochromatic” ion beam mean energy distribution. A multi-chamber anode with a slit exit for introduction of a working gas into area under anode is utilized to prevent a backflow of insulating and dielectric depositions on anode parts, and under anode area makes a nominal operation with reactive gases without a phenomenon called as “anode poisoning” during long operating hours.
    Type: Application
    Filed: July 29, 2010
    Publication date: February 2, 2012
    Inventors: Evgeny Vitalievich Klyuev, Viacheslav Vasilievich Zhurin
  • Patent number: 8101922
    Abstract: A gas field ion source is described. The gas field ion source includes an emitter module. The emitter module includes an emitter holder, an emitter structure, a detachably connectable electrical connection assembly of the emitter module, and a detachably connectable gas supply connection assembly of the emitter module. The gas field ion source further includes a supply module, wherein the supply module includes an electrical conductor for providing voltage and/or current, a gas supply conduit, a thermal conductor, a detachably connectable electrical connection assembly of the supply module, and a detachably connectable gas supply connection assembly of the supply module. The emitter module and the supply module are detachably connectable by the detachably connectable connection assemblies of the emitter module and the detachably connectable connection assemblies of the supply module.
    Type: Grant
    Filed: July 3, 2008
    Date of Patent: January 24, 2012
    Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
    Inventors: Dieter Winkler, Thomas Jasinski, Udo Weigel
  • Patent number: 8053747
    Abstract: A method for cleaning a substrate processing apparatus in which a first ion beam generator and a second ion beam generator are arranged opposite to each other to sandwich a plane on which a substrate is to be placed, and which processes two surfaces of the substrate, comprises steps of retreating the substrate from a position between the first ion beam generator and the second ion beam generator, and cleaning the second ion beam generator by emitting an ion beam from the first ion beam generator to the second ion beam generator.
    Type: Grant
    Filed: October 15, 2009
    Date of Patent: November 8, 2011
    Assignee: Canon Anelva Corporation
    Inventors: Einstein Noel Abarra, Masahiro Shibamoto
  • Patent number: 8049426
    Abstract: An electrostatic fluid accelerator includes an electrode array comprising an array of corona discharge electrodes and an array of accelerating electrodes for moving a fluid. A detector is configured to sense a constituent component of the fluid. A control circuit supplies power to the electrode array and operates the electrostatic fluid accelerator in response to an output from the detector.
    Type: Grant
    Filed: August 8, 2008
    Date of Patent: November 1, 2011
    Assignee: Tessera, Inc.
    Inventors: Igor A. Krichtafovitch, Jacob L. Oharah, Volodymyr A. Bibikov, Christopher A. Martin, Vladimir L. Gorobets, Maciej R. Ziomkowski, Terence Tak-Shing Tam
  • Patent number: 8044348
    Abstract: An ion source and method for providing ionized particles to a molecular/atomic analyser, such as a mass spectrometer, are disclosed. The ion source includes a vessel defining a channel; a gas inlet extending from the gas source into the channel, for introducing a gas flow into the channel; a sample inlet extending into the channel for introducing sample within the channel; and an ionizer to ionize the sample in the channel. The vessel is sufficiently sealed to allow the channel to be pressurized, at a pressure in excess of 100 Torr. At least one gas source maintains the pressure of the channel at a pressure in excess of 100 Torr and the pressure exterior to the channel at a pressure in excess of 0.1 Torr and provides a gas flow that sweeps across the ionizer to guide and entrain ions from the ionizer to the outlet.
    Type: Grant
    Filed: December 18, 2009
    Date of Patent: October 25, 2011
    Assignee: Ionics Mass Spectrometry Group Inc.
    Inventors: Charles Jolliffe, Gholamreza Javahery, Lisa Cousins, Serguel Savtchenko
  • Patent number: 7948185
    Abstract: An apparatus for producing light includes a chamber that has a plasma discharge region and that contains an ionizable medium. The apparatus also includes a magnetic core that surrounds a portion of the plasma discharge region. The apparatus also includes a pulse power system for providing at least one pulse of energy to the magnetic core for delivering power to a plasma formed in the plasma discharge region that forms a secondary circuit of a transformer. The plasma has a localized high intensity zone.
    Type: Grant
    Filed: January 12, 2007
    Date of Patent: May 24, 2011
    Assignee: Energetiq Technology Inc.
    Inventors: Donald K. Smith, Stephen F. Horne, Matthew M. Besen, Paul A. Blackborow, Ron Collins
  • Patent number: 7911146
    Abstract: Gas flows of modest velocities are generated when an organized ion flux in an electric field initiates an ion-driven wind of neutral molecules. When a needle in ambient air is electrically charged to a potential sufficient to produce a corona discharge near its tip, such a gas flow can be utilized downstream of a ring-shaped or other permeable earthed electrode. In view of the potential practical applications of such devices, as they represent blowers with no moving parts, a methodology for increasing their flow velocities includes exploitation of the divergence of electric field lines, avoidance of regions of high curvature on the second electrode, control of atmospheric humidity, and the use of linear arrays of stages, terminating in a converging nozzle. The design becomes particularly advantageous when implemented in mesoscale domains.
    Type: Grant
    Filed: May 31, 2006
    Date of Patent: March 22, 2011
    Assignee: The Regents of the University of California
    Inventors: Derek Dunn-Rankin, Matthew J. A. Rickard
  • Patent number: 7910896
    Abstract: A micro discharge device (MDD) ionizer and a method for fabricating the MDD ionizer are disclosed. The MDD ionizer includes a dielectric barrier having a first open end connected to an electrically conductive capillary tube and a second open end connected to a sample collection capillary tube. A circular high voltage electrode can be positioned around the dielectric barrier in close linear proximity to the conductive capillary tube and sealed by a non-conductive epoxy. A plasma discharge can be formed in a flow path through the dielectric barrier when an AC potential is applied between the high voltage electrode and the electrically conductive capillary tube utilizing an electronic controller. Such a plasma discharge in the flow path of the sample achieves soft ionization of gaseous sample molecules. The high pressure region generally occurs in the plasma region (where the ionization occurs). The ions thus are drawn (i.e.
    Type: Grant
    Filed: July 25, 2008
    Date of Patent: March 22, 2011
    Assignee: Honeywell International Inc.
    Inventors: Terry M. Marta, Fouad Nusseibeh, Adam Dewey McBrady, Michael Rhodes
  • Patent number: 7872422
    Abstract: An ion source capable of generating and/or emitting an ion beam which may be used to deposit a layer on a substrate or to perform other functions is provided. The ion source includes at least one anode and at least one cathode. In certain example embodiments, the anode may have a recess formed therein in which ions to be included in the ion beam may accelerate. Walls of the recess optionally may be insulated using, for example, ceramic. One or more holes may be provided to allow a supply of gas to flow into the recess, and those holes optionally may be tapered such that they narrow towards the recess. Thus, certain example embodiments produce an ion source having a higher energy efficiency (e.g., having increasing ion energy).
    Type: Grant
    Filed: July 18, 2006
    Date of Patent: January 18, 2011
    Assignee: Guardian Industries Corp.
    Inventor: Nestor P. Murphy
  • Patent number: 7855513
    Abstract: A plasma reactor is provided, which includes a discharge chamber with dimensional characteristics and configuration of dielectric and electrodes so as to enhance efficiency based on the characteristics of the corona discharge streamers generated. Upon application of a pulsed high voltage potential, the discharge chamber enables formation of plasma where surface streamers play a greater role in the overall energy density of the discharge chamber than gas streamers. The formation of gas streamers is constrained. Because surface streamers have a higher energy density, the present invention is able to achieve improved energy efficiency while preserving effectiveness for gas treatment.
    Type: Grant
    Filed: October 5, 2007
    Date of Patent: December 21, 2010
    Assignee: Old Dominion University Research Foundation
    Inventors: Muhammed Arif Malik, Karl H. Schoenbach
  • Patent number: 7853364
    Abstract: An ion source, often used for materials processing applications in a vacuum processing chamber, is provided with an adaptive control system. The adaptive control system has a microprocessor and memory that regulate the inputs of power and gas flow into the ion source. The adaptive control system monitors and stores the dynamic input impedance properties and status of input devices to the ion source. The adaptive control system may additionally control magnetic fields within the ion source. The adaptive control system provides a multivariable control for driving any combination of input power, gas flow, magnetic field, or electrostatic ion beam extraction or acceleration field into the ion source.
    Type: Grant
    Filed: November 29, 2007
    Date of Patent: December 14, 2010
    Assignee: Veeco Instruments, Inc.
    Inventors: James D. Deakins, Dennis J. Hansen, Leonard J. Mahoney, Tolga Erguder, David M. Burtner
  • Patent number: 7847241
    Abstract: In various aspects, ion sources, mass spectrometer systems, and a power supply circuit coupled to a feedback circuit are provided. A power supply is provided that includes at least the power supply circuit and is operable to transfer charge to a load. The feedback circuit is responsive to a DC component of an output voltage supplied by the power supply in a first feedback loop and an AC component of the output voltage in a second feedback loop to produce a feedback signal representative of at least one of: a value of the output voltage before a charge transfer from a capacitor of the power supply to a load; the value of the output voltage during the charge transfer from the capacitor of the power supply to the load; or the value of the output voltage after the charge transfer from the capacitor of the power supply to the load.
    Type: Grant
    Filed: January 8, 2009
    Date of Patent: December 7, 2010
    Assignee: DH Technololgies Development PTE. Ltd.
    Inventor: Stephen C. Gabeler
  • Publication number: 20100294648
    Abstract: The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.
    Type: Application
    Filed: February 11, 2010
    Publication date: November 25, 2010
    Applicant: FEI COMPANY
    Inventors: John Keller, Noel Smith, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland
  • Patent number: 7825601
    Abstract: The present patent letters discloses a Hall Current accelerator with a solenoid Hall field, a collimated gas source, an anode, intermediate Hall effect ionization magnetic field structures and intermediate acceleration electrodes. The Hall field in this case is the end fringe field(s) of a common solenoid magnetic field.
    Type: Grant
    Filed: November 28, 2007
    Date of Patent: November 2, 2010
    Inventor: Mark Edward Morehouse
  • Publication number: 20100264825
    Abstract: An ion source for generating a particle beam includes a plasma chamber and an electrode, which extends up to the plasma chamber. A gas that is to be ionized is introduced into the ion source via a gas line, which extends over the entire length of the electrode in parallel with the electrode such that the gas flows out of the gas line in immediate proximity to an entry to the plasma chamber.
    Type: Application
    Filed: April 12, 2010
    Publication date: October 21, 2010
    Inventor: THOMAS UHL
  • Patent number: 7812542
    Abstract: The object of an arrangement and a method for generating extreme ultraviolet radiation by an electrically operated gas discharge is to improve the adjustment of the layer thickness and, in particular, to prevent an uncontrolled accumulation of the metal layer to be applied to the rotary electrodes during pauses in the pulse operation for generating radiation when, e.g., liquid flows through these rotary electrodes for efficient cooling. In this connection, the rotating speed of the rotary electrodes can be increased in particular until there is always a freshly coated surface region of the electrodes in the discharge area at repetition frequencies of several kilohertz. An edge area to be coated on at least one electrode has at least one receiving area which extends in a closed circumference along the electrode edge on the electrode surface and which is formed so as to be wetting for the molten metal.
    Type: Grant
    Filed: January 23, 2008
    Date of Patent: October 12, 2010
    Assignee: XTREME technologies Gmbh
    Inventors: Guido Hergenhan, Christian Ziener, Mike Moeritz
  • Patent number: 7800312
    Abstract: A direct electron impact ion source is disclosed that includes a vaporizer for producing a process gas; an electron source for generating an electron beam; and an ionization chamber. The electron source is located outside the ionization chamber. Aligned apertures are provided in opposing walls of the ionization chamber to allow an electron beam to pass through the ionization chamber. The process gas is directed into the ionization chamber and ionized and extracted from the ionization chamber by way of an extraction aperture. In one embodiment, the direct electron impact ion source is configured with a form factor to enable it to be retrofit into the volume of an existing ion source , for example, an arc discharge type ion source. Alternatively, the direct electron impact ion source may be used together with an arc discharge ion source to create a dual mode or universal ion source.
    Type: Grant
    Filed: September 26, 2006
    Date of Patent: September 21, 2010
    Assignee: SemEquip, Inc.
    Inventor: Thomas Neil Horsky
  • Patent number: 7791019
    Abstract: A compact, low power ambient pressure pyroelectric ionization source. The source can be constructed using a z-cut lithium niobate or lithium tantalate crystal with an attached resistive heater mounted in front of the atmospheric pressure inlet of an ion trap mass spectrometer. Positive and negative ion formation alternately results from thermally cycling the crystal over a narrow temperature range. Ionization of molecules such as 1,1,1,3,3,3-hexafluoroisopropanol or benzoic acid results in the observation of the singly deprotonated species and their clusters in the negative ion mass spectrum. Ionization of molecules such as triethylamine or triphenylamine with the source results in observation of the corresponding singly protonated species of each in the positive ion mass spectrum. The pyroelectric crystals are thermally cycled by as little as 30 K from ambient temperature. Ion formation is largely unaffected by contamination of the crystal faces. This ion source is robust.
    Type: Grant
    Filed: January 11, 2008
    Date of Patent: September 7, 2010
    Assignee: California Institute of Technology
    Inventors: Jesse L. Beauchamp, Evan L. Neidholdt
  • Patent number: 7791350
    Abstract: An ionization vacuum gauge includes a linear cathode, an anode, and an ion collector. The linear cathode, the anode, and the ion collector are concentrically aligned and arranged from center to outer, in that order. The linear cathode includes a linear base and a field emission film deposited coating on the linear base. The ionization vacuum gauge with low power consumption can be used in a high vacuum system and/or some special vacuum system that is sensitive to heat and light. Such a gauge can be used to determine, simply yet accurately, pressures at relatively high vacuum levels.
    Type: Grant
    Filed: October 23, 2007
    Date of Patent: September 7, 2010
    Assignees: Tsinghua University, Hon Hai Precision Industry Co., Ltd.
    Inventors: Lin Xiao, Pi-Jin Chen, Zhao-Fu Hu, Yang Wei, Liang Liu, Shou-Shan Fan
  • Patent number: 7786455
    Abstract: An apparatus for producing light includes a chamber and an ignition source that ionizes a gas within the chamber. The apparatus also includes at least one laser that provides energy to the ionized gas within the chamber to produce a high brightness light. The laser can provide a substantially continuous amount of energy to the ionized gas to generate a substantially continuous high brightness light.
    Type: Grant
    Filed: April 2, 2007
    Date of Patent: August 31, 2010
    Assignee: Energetiq Technology, Inc.
    Inventor: Donald K. Smith
  • Patent number: 7768267
    Abstract: An ionization gauge that eliminates a hot cathode or filament, but maintains a level of precision of gas density measurements approaching that of a hot cathode ionization gauge. The ionization gauge includes a collector electrode disposed in an ionization volume, an electron source without a heated cathode, and an electrostatic shutter that regulates the flow of electrons between the electron source and the ionization volume. The electrostatic shutter controls the flow of electrons based on feedback from an anode defining the ionization volume. The electron source can be a Penning or glow discharge ionization gauge.
    Type: Grant
    Filed: July 11, 2007
    Date of Patent: August 3, 2010
    Assignee: Brooks Automation, Inc.
    Inventors: Richard A. Knott, Gerardo A. Brucker, Paul C. Arnold
  • Patent number: 7750314
    Abstract: An elevated temperature RF ion source system, comprising an ion source body, an RF antenna coil external to the ion source body, a vacuum enclosure surrounding both the outside surface of the ion source body and the RF antenna coil, at least one power supply, a gas delivery system operatively coupled to the ion source body, a vacuum condition between the outside surface of the ion source body and the RF antenna coil, the RF antenna coil operatively coupled to the at least one power supply, and a water cooling system operatively coupled to the RF antenna coil and the vacuum enclosure.
    Type: Grant
    Filed: July 31, 2008
    Date of Patent: July 6, 2010
    Assignee: Axcelis Technologies, Inc.
    Inventor: William F. DiVergilio
  • Patent number: 7687784
    Abstract: An implanter is equipped with an ion beam current detector, a temperature sensor, a temperature controller and a cooling system to increase the ratio of a specific ion cluster in the ion source chamber of the implanter. Therefore, the implanting efficiency for a shallow ion implantation is increased consequently.
    Type: Grant
    Filed: May 23, 2008
    Date of Patent: March 30, 2010
    Assignees: Advanced Ion Beam Technology, Inc., Advanced Ion Beam Technology, Inc.
    Inventors: Nai-Yuan Cheng, Yun-Ju Yang, Cheng-Hui Shen, Junhua Hong, Jiong Chen, Tienyu Sheng, Linuan Chen
  • Patent number: 7674337
    Abstract: The present invention provides methods, systems, and apparatus for epitaxial film formation that includes an epitaxial chamber adapted to form an epitaxial layer on a substrate; a deposition gas manifold adapted to supply at least one deposition gas and a carrier gas to the epitaxial chamber; and an etchant gas manifold, separate from the deposition gas manifold, and adapted to supply at least one etchant gas and a carrier gas to the epitaxial chamber. Numerous other aspects are disclosed.
    Type: Grant
    Filed: April 6, 2007
    Date of Patent: March 9, 2010
    Assignee: Applied Materials, Inc.
    Inventors: David Ishikawa, Craig R. Metzner, Ali Zojaji, Yihwan Kim, Arkadii V. Samoilov
  • Publication number: 20100052540
    Abstract: Performance of an electrohydrodynamic fluid accelerator device may be improved and adverse events such as sparking or arcing may be reduced based, amongst other things, on electrode geometries and/or positional interrelationships of the electrodes. For example, in a class of EHD devices that employ a longitudinally elongated corona discharge electrode (often, but not necessarily, a wire), a plurality of generally planar, collector electrodes may be positioned so as to present respective leading surfaces toward the corona discharge electrode. The generally planar collector electrodes may be oriented so that their major surfaces are generally orthogonal to the longitudinal extent of the corona discharge electrode. In such EHD devices, a high intensity electric field can be established in the “gap” between the corona discharge electrode and leading surfaces of the collector electrodes.
    Type: Application
    Filed: September 3, 2009
    Publication date: March 4, 2010
    Applicant: Tessera, Inc.
    Inventors: Nels Jewell-Larsen, Kenneth A. Honer, Matt Schwiebert, Hongyu Ran, Piyush Savalia, Yan Zhang
  • Patent number: 7659505
    Abstract: An ion source and method for providing ionized particles to a molecular/atomic analyser, such as a mass spectrometer, are disclosed. The ion source includes a vessel defining a channel; a gas inlet extending from the gas source into the channel, for introducing a gas flow into the channel; a sample inlet extending into the channel for introducing sample within the channel; and an ionizer to ionize the sample in the channel. The vessel is sufficiently sealed to allow the channel to be pressurized, at a pressure in excess of 100 Torr. At least one gas source maintains the pressure of the channel at a pressure in excess of 100 Torr and the pressure exterior to the channel at a pressure in excess of 0.1 Torr and provides a gas flow that sweeps across the ionizer to guide and entrain ions from the ionizer to the outlet.
    Type: Grant
    Filed: February 1, 2008
    Date of Patent: February 9, 2010
    Assignee: Ionics Mass Spectrometry Group Inc.
    Inventors: Charles Jolliffe, Gholamreza Javahery, Lisa Cousins, Serguei Savtchenko