Abstract: Techniques improving the performance and extending the lifetime of an ion source with gas mixing are disclosed. In one particular exemplary embodiment, the techniques may be realized as a method for improving performance and extending lifetime of an ion source in an ion implanter. The method may comprise introducing a predetermined amount of dopant gas into an ion source chamber. The dopant gas may comprise a dopant species. The method may also comprise introducing a predetermined amount of diluent gas into the ion source chamber. The diluent gas may dilute the dopant gas to improve the performance and extend the lifetime of the ion source. The diluent gas may further comprise a co-species that is the same as the dopant species.

Abstract: Ion accelerating devices including connection mechanisms with integrated shielding electrode and related methods are disclosed. According to an embodiment, an ion accelerating device of an ion implantation system comprises: a first element; a first connection system within the first element, the first connection system including a first connector and a first encapsulated shielding electrode around the first connector; and a second connection system within a second element other than the first element, the second connection system being coupled to the first connector; wherein the first encapsulated shielding electrode includes a first shielding portion adjacent to a first interface surface of the first element where the second connection system interfaces with the first element, in a cross-sectional view, the first shielding portion being substantially U-shaped.

Abstract: An electrostatic fluid accelerator having a multiplicity of closely spaced corona electrodes. The close spacing of such corona electrodes is obtainable because such corona electrodes are isolated from one another with exciting electrodes. Either the exciting electrode must be placed asymmetrically between adjacent corona electrodes or an accelerating electrode must be employed. The accelerating electrode can be either an attracting or a repelling electrode. Preferably, the voltage between the corona electrodes and the exciting electrodes is maintained between the corona onset voltage and the breakdown voltage with a flexible top high-voltage power supply. Optionally, however, the voltage between the corona electrodes and the exciting electrodes can be varied, even outside the range between the corona onset voltage and the breakdown voltage, in to vary the flow of fluid.

Abstract: Ion implantation with high brightness, ion beam by ionizing gas or vapor, e.g. of dimers, or decaborane, by direct electron impact ionization adjacent the outlet aperture (46, 176) of the ionization chamber (80; 175)). Preferably: conditions are maintained that produce a substantial ion density and limit the transverse kinetic energy of the ions to less than 0.7 eV; width of the ionization volume adjacent the aperture is limited to width less than about three times the width of the aperture; the aperture is extremely elongated; magnetic fields are avoided or limited; low ion beam noise is maintained; conditions within the ionization chamber are maintained that prevent formation of an arc discharge. With ion beam optics, such as the batch implanter of FIG. (20), or in serial implanters, ions from the ion source are transported to a target surface and implanted; advantageously, in some cases, in conjunction with acceleration-deceleration beam lines employing cluster ion beams.

Abstract: Embodiments of the present invention pertain to an electronic portion of a MEMs ion gauge with ion collectors bowed out of plane to form a three dimensional arrangement and a method for forming an electronic portion of a MEMs ion gauge with ion collectors bowed out of plane to form a three dimensional arrangement. In one embodiment, an ion gauge substrate is formed. The electronic portion of the MEMs ion gauge is assembled by coupling a plurality of ion collectors with the ion gauge substrate, wherein the coupling of the plurality of ion collectors with the ion gauge substrate further comprises performing an operation that causes the plurality of ion collectors to be bowed out of plane to form a three dimensional arrangement.

Abstract: An ion source element includes a cold cathode, a grid electrode, and an ion accelerator. The cold cathode, the grid electrode, and the ion accelerator are arranged in that order and are electrically separated from one another. A space between the cold cathode and the grid electrode is essentially smaller than a mean free path of electrons at an operating pressure. The ion source element is thus stable and suitable for various applications.

Abstract: A plasma accelerating apparatus and a plasma processing system having the same are provided. The apparatus includes a channel comprising an inner wall, an outer wall spaced apart from the inner wall by a distance for encircling the inner wall, and an end wall connected to an end of the inner wall and the outer wall to form an outlet port at the other ends of the walls; a gas supply portion to supply a gas to an inside of the channel; and a plasma generating and accelerating portion to supply ionization energy to the gas to generate a plasma beam and to accelerate the generated plasma beam toward the outlet port, wherein a coating layer comprising a first layer composed of a carbon nano tube is formed on at least one of the inner wall, the outer wall, and the end wall of the channel.

Abstract: An ion source is capable of generating and/or emitting an ion beam which may be used to deposit a layer on a substrate or to perform other functions. In certain example embodiments, techniques for reducing the costs associated with producing ion sources and/or elements thereof are provided. Such techniques may include, for example, forming the inner and/or outer cathode(s) from 1018 mild steel and/or segmented pieces. Such techniques also or instead include, for example, forming the ion source body from a single steel U-channel, or from segmented pieces making up the same. These techniques may be used alone or in various combinations.

Abstract: The present invention is directed to an arrangement for switching high electric currents by way of a gas discharge at high voltages or for generating gas discharge plasma emitting EUV radiation. It is the object of the invention to find a novel possibility for generating a hollow cathode plasma that permits a longer life of the cathodes of short wavelength-emitting gas discharge radiation sources and pseudospark switches, also in high-power operation. This object is met in that the metal wall between the hollow cathode space and the discharge space has a thickness on the order of the centimeter range so that the openings of the metal wall change into relatively long channels and in that substantially radially extending cooling channels are introduced in the metal wall to reduce the ion erosion of the metal wall of the hollow cathode through efficient cooling.

Abstract: A closed drift ion source is disclosed. The ion source has an open end 1 and a central axis 150 around which are arranged outer magnetic pole piece 3, inner magnetic pole piece 5, anode 2, shield 6 and back magnetic shunt 17. In one embodiment the anode 2 and inner magnetic pole piece 5 are annular. Permanent magnets 7 are located behind the shield 6 and in contact with outer magnetic pole piece 3 and the back magnetic shunt 17. As a result the magnetic field lines pass through the magnetic pole pieces and a mirror magnetic field is set up in the discharge region between them. The inner magnetic pole piece 5 is hollow which facilitates production of the mirror magnetic field.

Abstract: An improved air-breathing electrostatic ion thruster specially configured for use in low-Earth atmosphere comprises a housing having an electrically conductive inner surface defining an ionization chamber. Ambient atmospheric gas passes through a forward screen electrode at the chamber inlet to be ionized by an inner electrode disposed in the chamber. The ions are directed rearward through the aligned apertures of a rearward screen electrode and an accelerator electrode at the chamber outlet to generate thrust. A source of electrical power, which can be solar cells, a battery and/or a generator, provides current of a first polarity to the inner surface, forward screen electrode and rearward screen electrode and current of a second polarity to the inner electrode and accelerator electrode. A controller controls the amount and/or polarity of the current. Magnets disposed about the chamber improve ionization. A neutralizing mechanism near the chamber outlet keeps the ion thruster electrically neutral.

Abstract: A power supply system for an ion implantation system. In one particular exemplary embodiment, the system may be realized as a power supply system that includes a low frequency power inverter, a stack driver and a high voltage power generation unit that receives source power from the power inverter. The high voltage generation unit may include a high voltage transformer for providing an output power that is multiplied to a desired output level and delivered to an input terminal of an ion beam accelerator. The power supply system may also include a dielectric enclosure that encases at least a portion of the high voltage power generation unit, thereby preventing variation in the break down strength of the internal components.

Abstract: A power supply apparatus for controlling a Hall thruster which is an ion accelerator includes an anode power supply for applying anode voltage Va to an anode of the Hall thruster, inner and outer coil power supplies for supplying coil current Ic to each of inner and outer magnetic field generating coils of the Hall thruster, a gas flow rate controller for regulating gas flow rate Q via a gas flow rate regulator, and a control unit. The control unit adjusts the magnitude of ion acceleration by the Hall thruster by controlling the anode voltage Va, the gas flow rate Q and the coil current Ic according to a quantity expressed by a function related to the anode voltage Va and the coil current Ic.

Abstract: An electron beam source device is provided in which the disconnection and deterioration of a filament of the electron beam source device can be accurately predicted and determined, so as to avoid an unnecessary resource waste and increase of cost due to a premature replacement of a still-functional filament in a conventional device. Additionally, disorganization caused by a sudden disconnection or by the subsequent recovery procedure when the deformation of the filament occurs can be avoided to, reduce the measuring time, the maintenance and management man-hour. A filament current is measured at all time through a filament current measuring circuit 11, and a ratio of the filament current when the light-on time is zero to the current filament current is calculated at all time through an operational circuit 12.

Abstract: A system and method for producing electrons and ions are disclosed. One embodiment includes an outer electrode with a discharge chamber; an inner electrode positioned inside the discharge chamber, the inner electrode positioning forming a upper portion of the discharge chamber and a lower portion of the discharge chamber; and a gas inlet positioned in the lower portion of the discharge chamber; wherein a plasma formed within the lower portion of the discharge chamber provides priming particles usable to form a plasma in the upper portion of the discharge chamber.

Abstract: An ion implantation is disclosed that includes an ionization chamber having a restricted outlet aperture and configured so that the gas or vapor in the ionization chamber is at a pressure substantially higher than the pressure within an extraction region into which the ions are to be extracted external to the ionization chamber. The vapor is ionized by direct electron impact ionization by an electron source that is in a region adjacent the outlet aperture of the ionization chamber to produce ions from the molecules of the gas or vapor to a density of at least 1010 cm?3 at the aperture while maintaining conditions that limit the transverse kinetic energy of the ions to less than about 0.7 eV. The beam is transported to a target surface and the ions of the transported ion beam are implanted into the target.

Abstract: A plasma treatment apparatus for thin-film deposition includes a reactor chamber; a pair of parallel-plate electrodes disposed inside the chamber; and a radio-frequency power supply system used for transmitting radio-frequency power to one of the parallel-plate electrodes via multiple supply points provided on the one of the parallel-electrodes. The radio-frequency power supply system includes a radio-frequency transmission unit which includes an inlet transmission path and multiple branches branched off from the inlet transmission path multiple times. Each branch is connected to the supply point and has a substantially equal characteristic impedance value.

Abstract: An apparatus and method for achieving an efficient central cathode in a Hall effect thruster is disclosed. A hollow insert disposed inside the end of a hollow conductive cathode comprises a rare-earth element and energized to emit electrons from an inner surface. The cathode employs an end opening having an area at least as large as the internal cross sectional area of the rare earth insert to enhance throughput from the cathode end. In addition, the cathode employs a high aspect ratio geometry based on the cathode length to width which mitigates heat transfer from the end. A gas flow through the cathode and insert may be impinged by the emitted electrons to yield a plasma. One or more optional auxiliary gas feeds may also be employed between the cathode and keeper wall and external to the keeper near the outlet.

Abstract: A gridless ion source operates from a control system (201) that generates an anode voltage (215) comprising a mains rectified signal such that the anode voltage modulates between a first voltage above a threshold and a second voltage below the threshold. The mains rectified signal is provided by transformer (210) receiving a mains input (211). The output of the transformer (213) is rectified by a bridge rectifier (214). In preferred embodiments, the threshold is an ionization threshold such that the ion current is initiated and extinguished in every cycle.

Abstract: In various aspects, ion sources, mass spectrometer systems, and a power supply circuit coupled to a feedback circuit are provided. A power supply is provided that includes at least the power supply circuit and is operable to transfer charge to a load. The feedback circuit is responsive to a DC component of an output voltage supplied by the power supply in a first feedback loop and an AC component of the output voltage in a second feedback loop to produce a feedback signal representative of at least one of: a value of the output voltage before a charge transfer from a capacitor of the power supply to a load; the value of the output voltage during the charge transfer from the capacitor of the power supply to the load; or the value of the output voltage after the charge transfer from the capacitor of the power supply to the load.

Abstract: A gas distributor is easily removable and replaceable in an ion source. The ion source has a removable anode assembly, including the gas distributor, that is separable and from a base assembly to allow for ease of servicing consumable components of the anode assembly. The gas distributor may be mounted to a thermal control plate in the anode assembly with several set screws. The gas distributor may be disk-shaped with counterbores in a surface to recess the heads of the set screws. Alternately, the gas distributor may be clamped or held in place by other structures or components of the ion source.

Abstract: There is disclosed a method and apparatus of driving a plasma display panel that is adaptive for reducing discharge delay upon reset discharge. A driving method and apparatus of a plasma display panel according to an embodiment of the present invention applies a plurality of pulses to the plasma display panel for the reset period in order to reduce a discharge delay.

Abstract: An exemplary ion source for creating a stream of ions has an aluminum alloy arc chamber body that at least partially bounds an ionization region of the arc chamber. The arc chamber body is used with a hot filament arc chamber housing that either directly or indirectly heats a cathode to sufficient temperature to cause electrons to stream through the ionization region of the arc chamber. A temperature sensor monitors temperatures within the arc chamber and provides a signal related to sensed temperature. A controller monitors sensed temperature as measured by the sensor and adjusts the temperature to maintain the sensed temperature within a range.

Abstract: Ion accelerating devices including connection mechanisms with integrated shielding electrode and related methods are disclosed. According to an embodiment, an ion accelerating device of an ion implantation system comprises: a first element; a first connection system within the first element, the first connection system including a first connector and a first encapsulated shielding electrode around the first connector; and a second connection system within a second element other than the first element, the second connection system being coupled to the first connector; wherein the first encapsulated shielding electrode includes a first shielding portion adjacent to a first interface surface of the first element where the second connection system interfaces with the first element, in a cross-sectional view, the first shielding portion being substantially U-shaped.

Abstract: A flat display panel in which a field emission principle of ferroelectrics is applied to improve the luminous efficiency with a low driving voltage, and a method of driving the same.

Abstract: A modular ion source design relies on relatively short modular core ALS components, which can be coupled together to form a longer ALS while maintaining an acceptable tolerance of the anode-cathode gap. Many of the modular components may be designed to have common characteristics so as to allow use of these components in ion sources of varying sizes. A flexible anode can adapt to inconsistencies in the ion source body and module joints to hold a uniform anode-cathode gap along the length of the ALS. A clamp configuration fixes the cooling tube to the ion source body, thereby avoiding heat-introduced warping to the source body during manufacturing.

Abstract: An electrostatic fluid accelerator includes an electrode array including an array of corona discharge electrodes and an array of accelerating electrodes. A detector is configured to sense a constituent component of the fluid as present in an output from the electrode array. A control circuit supplies power to the electrode array, the control circuit being responsive to an output from the detector for operating the electrode array responsive a level of the constituent component.

Abstract: A device for remediation of gaseous or aerosol streams includes an elongated duct, at least one high potential electrode and at least one low potential electrode. The elongated duct defines a bore through which axially flows a gaseous or aerosol stream which is treated by the device to remove pollutants or particulates therefrom. A shaft rotatable within the bore of the duct includes a plurality of pins extending radially therefrom, the shaft and the pins constituting the high potential electrode. The duct may similarly include a plurality of pins extending radially into the interior bore of the duct, whereby the duct and the pins constitute the low potential electrode. The shaft is rotated by a motor relative to the duct, or the duct and shaft may be rotated together by the motor. The high and low potential electrodes are connected to a high voltage power source to effect a corona discharge between the high and low potential electrodes.

Abstract: In certain example embodiments of this invention, there is provided an ion source including an anode and a cathode. In certain example embodiments, a multi-piece outer cathode is provided. The multi-piece outer cathode allows precision adjustments to be made, thereby permitting adjustment of the magnetic gap between the inner and outer cathodes. This allows improved performance to be realized, and/or prolonged operating life of certain components. This may also permit multiple types of gap adjustment to be performed with different sized outer cathode end pieces. In certain example embodiments, cathode fabrication costs may also be reduced.

Abstract: An ion source, often used for materials processing applications in a vacuum processing chamber, is provided with an adaptive control system. The adaptive control system has a microprocessor and memory that regulate the inputs of power and gas flow into the ion source. The adaptive control system monitors and stores the dynamic input impedance properties and status of input devices to the ion source. The adaptive control system may additionally control magnetic fields within the ion source. The adaptive control system provides a multivariable control for driving any combination of input power, gas flow, magnetic field, or electrostatic ion beam extraction or acceleration field into the ion source.

Abstract: Various mechanisms are provided relating to plasma-based light source that may be used for lithography as well as other applications. For example, a device is disclosed for producing extreme ultraviolet (EUV) light based on a sheared plasma flow. The device can produce a plasma pinch that can last several orders of magnitude longer than what is typically sustained in a Z-pinch, thus enabling the device to provide more power output than what has been hitherto predicted in theory or attained in practice. Such power output may be used in a lithography system for manufacturing integrated circuits, enabling the use of EUV wavelengths on the order of about 13.5 nm. Lastly, the process of manufacturing such a plasma pinch is discussed, where the process includes providing a sheared flow of plasma in order to stabilize it for long periods of time.

Abstract: An apparatus for analyzing a sample material includes a desorption mechanism configured to desorb molecules from the sample material, a metastable generator separate from the desorption mechanism and configured to generate a metastable species, and an interaction region configured for metastable species ionization of the desorbed molecules so as to produce gas-phase ions of the sample material.

Abstract: There is disclosed a method and apparatus of driving a plasma display panel that is adaptive for improving its contrast and enabling its high speed driving. A driving method of a plasma display panel according to an embodiment of the present invention applies a setup voltage with a first gradient to the scan electrode for the reset period; and applies the setup voltage with a second gradient to the sustain electrode while a voltage on the scan electrode rises.

Abstract: Provided is an image display apparatus, including: a vacuum container which includes an electron source and an anode electrode opposed to the electron source; and an ion pump arranged so as to communicate through the vacuum container, in which: an ion pump container is composed of a non-electroconductive material; and an electroconductive film is formed on an external surface of the vacuum container on a side on which the ion pump container is mounted or on an internal surface of the ion pump container. The image display apparatus achieves: a reduction in weight of the ion pump; an improvement in compatibility to the vacuum container; and the prevention of an adverse effect of discharge inside the ion pump on image display.

Abstract: A novel plasma reactor is provided that includes a discharge chamber with dimensional characteristics and configuration of dielectric and electrodes that optimize efficiency based on the characteristics of the corona discharge streamers generated. Upon application of a pulsed high voltage potential, the discharge chamber enables formation of plasma where surface streamers play a greater role in the overall energy density of the discharge chamber than gas streamers. The formation of gas streamers is constrained. Because surface streamers have a higher energy density, the present invention is able to achieve improved energy efficiency while preserving effectiveness for gas treatment.

Abstract: Provided is an image display apparatus including: a vacuum container having an electron source enclosed therein for displaying an image; an ion pump communicating with the vacuum container for discharging air therefrom and decreasing pressure therein; and a resistor connected in series with the ion pump with respect to a power supply for driving the ion pump. Even if internal resistance of the ion pump undergoes order-of-magnitude changes according to its operating state, current consumption can be suppressed and the ion pump can be driven efficiently.

Abstract: A cooling apparatus is provided with an electrostatic flow modifier to be complementarily positioned relative to a cooling fluid flow to modify at least one characteristic of the cooling fluid flow to enhance an amount of heat the cooling fluid flow removes from an electronic component.

Abstract: A closed drift ion source which includes a channel having an open end, a closed end, and an input port for an ionizable gas. A first magnetic pole is disposed on the open end of the channel and extends therefrom in a first direction. A second magnetic pole disposed on the open end of the channel and extends therefrom in a second direction, where the first direction is opposite to the second direction. The distal ends of the first magnetic pole and the second magnetic pole define a gap comprising the opening in the first end. An anode is disposed within the channel. A primary magnetic field line is disposed between the first magnetic pole and the second magnetic pole, where that primary magnetic field line has a mirror field greater than 2.

Abstract: An ionization electrode consists of a plate-like positive pole (31a) formed with plural pointed ends (31b) on its outer edge, and a spheric negative pole (32a) opposing a flat surface of the positive pole (31a). Since the pointed ends (31b) of the positive pole (31a) are not in direct face-to-face relation with the negative pole (32a), corona discharge is prevented from concentrating on some of the pointed ends (31b) that are closer to the negative pole (32b) than the rest due to the working errors or mounting errors of the poles. Therefore, the corona discharge occurs in a stable manner.

Abstract: Excimers are formed in a gas (30,130) by applying a pulsed potential between a first electrode (14,114) and a counter electrode (26, 126) so that corona discharge occurs, substantially without arcing, when the potential is on. The pulses or on-times of the potential desirably are about 100 microseconds or less. Use of a pulsed potential provides greater efficiency than a constant potential. Where the excimer-forming gas is a pure inert gas, the gas desirably contains less than 10 ppm water vapor.

Abstract: A waveguide of the present invention comprises a waveguide main body made of a material selected from a boron nitride or an aluminum oxide, and a thin film made of a titanium nitride to cover an outer peripheral surface of the waveguide main body. The waveguide of the present invention can efficiently guide an electromagnetic wave such as a microwave, and has high physical and chemical durability.

Abstract: An electrostatic air cleaning device includes an array of electrodes. The electrodes include corona electrodes connected to a suitable source of high voltage so as to generate a corona discharge. Laterally displaced collecting electrodes include one or more bulges that have aerodynamic frontal “upwind” surfaces and airflow disrupting tailing edges downwind that create quite zones for the collection of particulates removed from the air. The bulges may be formed as rounded leading edges on the collecting electrodes and/or as ramped surfaces located, for example, along a midsection of the electrodes. Repelling electrodes positioned between pairs of the collecting electrodes may include similar bulges such as cylindrical or semi-cylindrical leading and/or trailing edges.

Abstract: According to a first embodiment of the invention, a dual cathode electrode for generating EUV light is disclosed. The dual cathode electrode may include a first outer cathode, a second inner cathode, and an anode disposed between the inner and outer cathodes. The dual cathode electrode also includes a plasma disposed in between the cathodes that emits EUV photons when it is excited by an arc between the anode and the cathodes. According to a second embodiment of the invention, several Dense Plasma Focus (DPF) electrodes are placed along a circle. The DPF electrodes, when activated, will emit electron photons from the circle in which they are placed thereby avoiding obscuration used to protect UV mirrors against debris.

Abstract: This invention relates to a device for switching and controlling an electron dose emitted by a micro-emitter comprising a sensor module (30) that receives the output current from the micro-emitter and a voltage to adjust the polarization point of the said device, a comparator module that receives a threshold voltage to adjust the quantity of charges to be emitted, a logical module to initialize the electron emission, and to define whether or not the micro-emitter should emit, a control module that generates the voltages necessary for initialization and extinction of the micro-emitter current pulse, means of varying the threshold voltage.

Abstract: Disclosed herein is a plasma generator, in which a plasma forming space, into which the air is introduced, is provided, band plate-like first and second electrodes are arranged in opposed relation to each other through a dielectric in the plasma forming space, and plasma is generated by discharge caused by applying voltage between the first and second electrodes, wherein the first and second electrodes are arranged in a state relatively displaced in a surface direction of the dielectric so as to satisfy the specific relationship.

Abstract: A releasable anode liner that is fitted within the interior of the anode of an ion source. The cover permits electrons to be projected into the anode wherein any insulating deposits adhere to the interior of the anode liner, thereby increasing the effective life of the anode without premature replacement or repair.

Abstract: A cold-cathode closed-drift ion source includes an anode, a cathode and a power supply. In certain example embodiments, neither the positive nor negative terminals of the power supply are connected to ground, and the anode and cathode are also not connected to ground. Thus, the ion source operates in a floating mode. As a result, the likelihood of formation of a problematic secondary circuit from the source to the power supply through the walls can be reduced and/or eliminated (or suppressed). Therefore, the chance of drawing a net positive charge from the ion source which induces a positive charge on dielectric or other surfaces proximate the wall(s) can be suppressed and/or reduced.

Abstract: A high efficiency plasma pump for use in a plasma processing system that includes a plasma processing device having a first plasma density proximate a processing region and a second plasma density proximate an exit region is disclosed. The plasma pump includes an inter-stage plasma (ISP) source fluidly coupled to the plasma processing device proximate the exit region, the ISP source comprising an inter-stage plasma region having a third plasma density; and a plasma pump fluidly coupled to the ISP, the plasma pump having a fourth plasma density, wherein pumping speed is dependent upon the third plasma density and the fourth plasma density. The ISP source increasing the third plasma density to increase the pumping efficiency.

Abstract: The invention generates high-energy particles, or quantum energy, from a quantum macro object. The method used comprises: (a) isolating a gaseous substance within a bounded area; (b) energizing the gaseous substance, causing the gaseous substance to transition into a glow discharge plasma state; (c) increasing the gas pressure within the bounded area to transition the glow discharge plasma to a quantum macro object comprising a positively charged nucleus surrounded by an electron cloud; (d) inducing an active impact upon the quantum macro object such that the potential energy existing within the quantum macro object is converted and released in the form of quantum energy in a continuous and inexhaustible manner. The bounded area is typically created by a dielectric of various sorts, such as within a dielectric container or properly charged air.

Abstract: A closed drift ion source which includes a channel having an open end, a closed end, and an input port for an ionizable gas. A first magnetic pole is disposed on the open end of the channel and extends therefrom in a first direction. A second magnetic pole disposed on the open end of the channel and extends therefrom in a second direction, where the first direction is opposite to the second direction. The distal ends of the first magnetic pole and the second magnetic pole define a gap comprising the opening in the first end. An anode is disposed within the channel. A primary magnetic field line is disposed between the first magnetic pole and the second magnetic pole, where that primary magnetic field line has a mirror field greater than 2.