Abstract: A method for treating substrates, such as silicon wafers, wherein the substrates are immersed for some time in a bath containing a liquid and are taken therefrom so slowly that practically all of the liquid remains in the bath. The substrates are brought from the liquid directly into contact with a vapor of an organic solvent which is mixed with a carrier gas and introduced from gas leads having outlet nozzles. The vapor is miscible with the liquid to yield a mixture having a surface tension lower than that of the liquid, and which does not condense on the substrates. No drying marks with organic or metallic residues or other contaminations remain on the substrates.

Abstract: A method for heating bulk materials, especially granular plastic material, in which the bulk material is fed to a vessel and exits the vessel based on the consumption. A heat-transfer gas flow is simultaneously fed to the vessel and conducted either cocurrently with or countercurrently to the flow of granular material. The gas inlet temperature or quantity of gas are thereby varied in such a way that the temperature of the granular material at the outlet corresponds to a target temperature value required for the granular material.

Abstract: A portable hand truck mounted drying assembly for the drying of an elevated enclosed space which has been subjected to flooding, the drying assembly having an inlet path for the introduction of ambient air into the enclosed space, the ambient air being preheated in a heat exchanger by moisture laden air removed from the enclosed space, the preheated ambient air being subjected to further heating before introduction into the enclosed space, the portable hand truck mounted unit being positioned within the enclosed space and having a plurality of conduits in communication with the enclosed space for the introduction of dry heated air and the removal of moisture laden air.

Abstract: Process and apparatus for drying a material web. The process includes guiding the material web to at least one heated area having a jacket surface of a cylinder having a diameter of between about 4-10 meters, setting the material web, having a dry content of between about 45-55%, onto the at least one heated area, maintaining the material web in uninterrupted contact with the at least one heated area at least until the material web achieves a firmness sufficient for detaching the material web from the heated area, and detaching the material web from the at least one heated area with a dry content of between about 55%-65%.

Abstract: The method is used for drying solid insulation for an electrical appliance by means of the condensation heat emitted from the vapor of a solvent. When the solvent vapor condenses on the solid insulation, a vapor mixture is formed which contains solvent and water. This vapor mixture is supplied at a controlled flow rate from an evacuated autoclave to a condenser which is arranged outside the autoclave, and is condensed.

Abstract: A method and system for cleaning a metal article. The system is used to employ a method that comprises placing the article in a means defining a chamber; subjecting the article to a gaseous atmosphere in the means defining a chamber, where the gaseous atmosphere consisting essentially of carbon, hydrogen, and fluorine; and subjecting the article to the gaseous atmosphere at a temperature in a range from about 815° C. to about 1100° C. to clean the article.

Abstract: An apparatus and method for cleaning objects having generally irregular surface features, such as reloadable photographic cameras, has a partial enclosure having opposing side walls, and a top wall joining the opposing side walls. An air ionizing element composed of an ion emitter and an air knife is arranged in the enclosure for electrostatically neutralizing the object with ions entrained in a curtain-like stream of air directed onto the object.

Abstract: A wafer dryer for drying a wafer includes a chamber and a support adapted to support the wafer in the chamber. A spray nozzle is disposed in the chamber. A source gas supply tank is in fluid communication with the spray nozzle. At least one heater is operable to heat the chamber and the source gas supply tank. A pumping line is in fluid communication with the chamber. Drive means are operable to rotate the chamber and the spray nozzle. A method for drying a wafer using a wafer dryer including a chamber and a revolving spray nozzle includes the steps of: loading the wafer in the chamber; reducing the pressure in the chamber in which the wafer is loaded to a near vacuum state; creating a temperature controlled atmosphere in the pressure-reduced chamber to quicken drying of the wafer; and spraying the source gas on the wafer while rotating the chamber and the revolving spray nozzle in opposite directions in the pressure-reduced temperature controlled atmosphere.

Abstract: A portable trailer mounted drying assembly for the drying of an enclosed space which has been subjected to flooding, the drying assembly having an inlet path for the introduction of ambient air into the enclosed space, the ambient air being preheated in a heat exchanger by moisture laden air removed from the enclosed space, the preheated ambient air being subjected to further heating before introduction into the enclosed space, the portable trailer mounted unit being positioned proximate to the enclosed space and having a plurality of conduits in communication with the enclosed space for the introduction of dry heated air and the removal of moisture laden air.

Abstract: A portable trailer mounted drying assembly for the drying of an enclosed space which has been subjected to flooding, the drying assembly having an inlet path for the introduction of ambient air into the enclosed space, the ambient air being preheated in a heat exchanger by moisture laden air removed from the enclosed space, the preheated ambient air being subjected to further heating before introduction into the enclosed space, the portable trailer mounted unit being positioned proximate to the enclosed space and having a plurality of conduits in communication with the enclosed space for the introduction of dry heated air and the removal of moisture laden air.

Abstract: A drying cylinder for drying a fibrous web, the cylinder having an inner chamber connected to a pressurized air source; and an outer cylinder jacket having an air-permeable region which is adapted to contact the fibrous material web. Also a drying section for drying a fibrous web, including at least one drying cylinder having an inner chamber and an outer cylinder jacket having an air-permeable region; a circulating belt arranged to press the fibrous web against the outer cylinder jacket and belt being arranged to partially wrap around the drying cylinder; and a pressurized air source connected to the inner chamber is described.

Abstract: A method of and an apparatus for drying a wafer using the Marangoni effect quickly forms an isopropyl alcohol layer on a cleaning liquid in which the wafer is submerged. The isopropyl alcohol is first heated and then supplied in a fluid state onto the cleaning liquid. The isopropyl alcohol liquid thus diffuses rapidly to form the isopropyl alcohol layer. The wafer is thoroughly dried by removing it from the cleaning liquid through the isopropyl alcohol while only supplying more of the heated nitrogen gas into the ambient above the cleaning liquid.

Abstract: The device (10) and method are used for ventilating an offset pocket space (12) located in a drying section of a papermaking machine by injecting air from a heated dry air supply inlet (11). The offset pocket space (12) is situated between a set of three axially-parallel drying cylinders (20) over which consecutively runs a paper web (14). A first and a third of these cylinders (20) are vertically spaced from a second one. The paper web (14) is pressed against the first and the third cylinder (20) by a felt (16) which further runs around a felt roll (26) having a rotation axis parallel to that of the cylinders (20). The felt roll (26) is disposed between the three cylinders (20) in an offset position which is closer to the first cylinder (20) than the third cylinder (20).

Abstract: An apparatus and a method for reducing solvent residue in a solvent-type dryer for drying semiconductor wafers have been disclosed. The apparatus is constructed by a tank body, a wafer carrier, an elevator means, a tank cover, a solvent vapor conduit and an exhaust means. The exhaust means is provided for fluid communication with a compartment in the tank cover such that any residual solvent vapor or any organic residue in the compartment left from the wafer drying cycle can be evacuated to a factory exhaust system. The present invention novel method for reducing solvent or organic residue in the dryer can be carried out, after the removal of the dried wafers from the dryer, by evacuating the compartment in the tank cover for a time period of between about 30 sec. and about 300 sec. until all residual solvent vapor or organic residue is evacuated.

Abstract: A drying apparatus comprises a drying vessel, a treatment liquid feeder-discharger for feeding pure water into the drying vessel, a vapor supplier for supplying an organic solvent vapor to the space over the pure water, inert gas suppliers for supplying an inert gas with which the organic solvent vapor is diluted, and a heated organic solvent supplier for forming a film of the organic solvent on a liquid level of the pure water. After the wafer is immersed in the pure water, the pure water is gradually discharged from the drying vessel by means of the treatment liquid feeder-discharger. Since the wafer passes through the organic solvent film as it is exposed above the liquid level, the organic solvent of the film adheres to the surface of the wafer, and the organic solvent vapor is condensed on the surface of the wafer that is exposed above the liquid level.

Abstract: A method for drying wafers after a wet bench process is disclosed. In the method, a wafer is first immersed in a volume of DI water held in a container. A mixture of alcohol vapor/inert gas is then flown into the upper portion of the container that is not filled with the volume of DI water at a flow rate of less than 20 l/min. The wafer is then withdrawn from the DI water into the upper portion of the container filled with the alcohol vapor/inert gas mixture and thereby driving DI water molecules off the surface of the wafer without leaving organic residue on the wafer surface.

Abstract: To produce a catalytically active material, titanium dioxide, together with an oxide or with a dissolved compound of tungsten and/or vanadium, is processed into a shapeable material. The shapeable material is dried to form a shaped body, and the shaped body is calcined. After the calcining, the shaped body is additionally impregnated with a dissolved compound of titanium and vanadium and is dried again. A catalytically active material of this type has a high catalytic activity with regard to breaking down dioxins and/or furans even in a temperature range of below 250° C. The catalytically active material is particularly suitable for producing dioxin and/or furan catalytic converters.

Abstract: A process for producing a drying gas for drying one or more disk-like objects, in which a carrier gas and an active substance are mixed, as well as a drying process that uses the drying gas that is produced in this manner. Also, a drying-gas production device that is suitable for mixing a carrier gas and an active substance.

Abstract: A drying structure and process has a wet or damp mass to be dried in a container. Hot dry gas is fed into the container to flow over and/or through the mass to be dried, and the vapor-containing gas which is produced by contact with the mass is discharged from the container to the input of a vortex tube. The vortex tube separates the humid vapor into a liquid which may be discharged, and a dried gas which is recirculated back to the container for further drying of the mass.

Abstract: A tank stores a drying liquid for drying a semiconductor wafer. A boat vertically holds a plurality of target semiconductor wafers to be dried. The semiconductor wafers which are held by the boat are entirely soaked in the drying liquid. After this, the semiconductor wafers are lifted from the drying liquid at a rate in a range from 1 to 3 mm/min, so as to be dried. At this time, the surface of the drying liquid is divided with using a dividing liquid at each side of the semiconductor wafer. The dividing plate divides the surface of the drying liquid, thereby to prevent particles, which are once removed from the semiconductor wafer, from being again adhered onto the semiconductor wafer.

Abstract: A dryer for drying a substrate includes: a bath containing a fluid; a chamber; and a delivery system supplying a polar organic compound, such as isopropyl alcohol, and a hydrophobic organic compound, such as hydrofluoroether, to the interface between the substrate and the fluid as the substrate is removed from the fluid of the bath into the chamber. The dryer further includes a chamber environment control system that supplies a gas into the chamber to dry the substrate and controls temperature and humidity in the chamber and a chamber heater attached to the chamber to transfer thermal energy into the chamber. A drying method includes: immersing a substrate into a fluid contained in a bath; removing the substrate from the fluid into a chamber; and supplying isopropyl alcohol and hydrofluoroether to an interface between the substrate and the fluid.

Abstract: A method and apparatus for drying a tennis court or other surface removes water from the tennis court and heats the surface of the tennis court to facilitate evaporation of water from the court.

Abstract: A calendering method which enhances the smoothness of surface sized paper/paperboard by a combination of temperature and moisture gradient calendering processes without the fiber sticking/picking problems that affect runnability and without using waterboxes. The moisture gradient calendering is performed so that the cross direction moisture profile can be corrected and high smoothness levels can be obtained. Heated calender rolls form a hot pressure nip having a temperature greater than the temperature of the moisturized web. Lubricant is applied to both sides of the web to prevent fiber sticking/picking in the hot nip. The lubricant may be applied by the size press, by the moisturizing showers or by separate lubricant showers. The smoothness developed by moisturizing and hot nip calendering is substantially irreversible.

Abstract: The present invention discloses a generic method for producing void and gas occlusion free materials, as well as apparatuses for batch and continuous production of same. This generic method can be utilized in the production of a wide variety of polymeric compounds and composites and specifically encompasses the two ends of the polymeric composite spectrum, that is, polymer concretes on the one hand, and fiber-reinforced polymer composites on the other. The composite materials of the present invention are characterized by visual count as being void and gas occlusion free to the level of 1 micron at 1250× magnification. Concomitantly, the invention produces useful polymer concrete materials which exhibit substantially improved integrity for easy machining at high speeds, and high dielectric and mechanical strength, as compared with composite materials produced by conventional methods.

Abstract: A method is provided for washing, drying, applying a curable coating, and effecting the cure of such coating on a variety of substrates, such as metal, for example steel, plastic and wood. A particularly effective drying procedure based on the generation of a dehumidified and filtered air stream directed substantially parallel to the wet substrate allows for a significant decrease in drying time while maintaining coating effectiveness.

Abstract: The heating/dryer apparatus includes a casing having a top and a bottom, a heating element inside a tubular member incorporated in the casing and frictionally engaged therewith, a fan incorporated in a housing in the casing located above the heating element, feet attached to the bottom of the casing and an electrical extension adapted to activate the heating element and the fan. The heating/dryer apparatus may be mounted on the end of a flexible arm attached to a mounting device having a base with a suction cup mounted therein.

Abstract: A method of reducing the purge gas consumption, dry-down time, or both required for start-up and operation of a gas phase fluidized bed reactor system. The method involves contacting a stream of cycle gas having water and/or a polar hydrocarbon with an adsorbing material while the cycle gas is in a closed circulation loop.

Abstract: A device and method cures an adhesive by means of UV radiation in an inert-gas atmosphere. The adhesive is interposed as an adhesive layer between two superposed layers of a disc-shaped optical information carrier. The device includes a UV source, a supply for an inert gas, and a holder for holding the information carrier in a centered position with respect to a centering axis. The inert-gas supply has discharge openings for inert gas, situated in a circular zone around the centering axis, at a distance from the centering axis which substantially corresponds to the radius of the peripheral edge of the information carrier, so that inert gas flows past the peripheral edge during curing. As a result locally present oxygen which would interfere with curing is expelled.

Abstract: A method and an arrangement is provided for treating substrates, such as, for example, silicon wafers (1), in which the latter are immersed for some time in a bath (2) containing a liquid (1) and are then taken therefrom so slowly that practically the whole quantity of liquid remains in the bath (2). According to the invention, the substrates (1) are brought from the liquid (3) directly into contact with a vapor not condensing thereon via leads (17) with outlet nozzles (18). The vapor is of a substance miscible with the liquid (3), which, when mixed therewith, yields a mixture having a surface tension lower than that of the liquid. It has been found that no drying marks with organic or metallic residues or other contaminations then remain on the substrates (1).

Abstract: A wafer transfer apparatus used during the processes of manufacturing semiconductor devices has a chuck assembly which includes at least a pair of retainers for accommodating a group of wafers, each wafer retainer having a wafer guide with a plurality of slots formed at regularly spaced intervals and a guide supporter for supporting the wafer guide. At least one nozzle is formed on the wafer guide and is connected to a gas supply member for supplying gas. When the chuck assembly moves downwardly so as to load wafers into a quartz boat, the nozzle sprays the gas so that quartz particles deposited in the slots can be blown off, thereby preventing contamination.

Abstract: A system and method using landfill gas to dry wet sludge to inexpensively produce fertilizer or dry waste for disposal, while acting to conserve natural gas resources. The system and method are expected to provide dry sludge as an end product at approximately one-fifth of the cost of conventional methods.

Abstract: An apparatus for processing a solid-liquid material comprises a housing formed with a series of interconnected chambers defined by chamber walls with at least two drums mounted in series within the chambers. Each chamber receives one of the at least two drums for rotatable movement therein. Each chamber and the associated drum are dimensioned to define a region therebetween to retain the solid-liquid material. The regions of adjacent chambers communicate with each other to define a continuous passage from drum to drum through the apparatus. An inlet in the housing admits the solid-liquid material to the passage, and an outlet permits extraction of a processed solid-liquid material from the passage. Each drum rotates in a direction opposite to the adjacent drum to advance the solid-liquid material through the passage from drum to adjacent drum in a sinuous path such that the curvature of the solid-liquid material changes when passing from drum to adjacent drum.

Abstract: An improved system is disclosed drying interior layers of sheathing by reducing moisture in narrow wall spaces, particularly between layers of sheathing and/or insulation board. The method involves inserting a special nozzle into a hole drilled into the wall. The nozzle has a depth gauge in the form of a shoulder, calibrated screw threads or other equivalent means to control the placement of a drying substance into the space without damaging the insulation board or blocking the outlet for the drying substance which may be warm, low humidity air.

Abstract: The present invention is intended to artificially break pit membranes in cell membranes of cells constituting wood and then to readily attain dryness of the wood. In view of the fact that one pit or the other pit of pits in the form of a pair is blocked with the torus 1 in felled wood to cause poor removal of water in cells, it is intended to prevent the blockage of the pit membrane, i.e., to break the pit membrane per se, thereby facilitating easy escapement of water in cells after the breaking. In the present invention, wood fuel is burned, and subject wood is allowed to stand in a treatment chamber filled with smoky wood gas generated by the combustion for a predetermined period of time, to expose the subject wood to far-infrared radiation and components contained in the wood gas.

Abstract: Apparatus and method are provided for improved washing and drying of semiconductor wafers utilizing an enhanced "Marangoni effect" flow of liquid off of the wafers for superior prevention of watermarks (water spots) on integrated circuits (ICs) on the wafers. The apparatus includes a housing 12 which may be hermetically sealed, an open-top wash tank 60 within a lower part of the housing, a moveable rack 16 for holding the wafers either in the tank for washing or in an upper part of the housing for drying, apparatus 34 for supplying chilled (near freezing) de-ionized water (DIW) to a lower part of the tank, the DIW flowing within the tank and overflowing the top thereof, a pump 20 for draining overflowing DIW from the housing, and apparatus 40 for supplying to the housing organic vapor such as isopropyl alcohol (IPA) in a dry gas such as nitrogen. During wafer drying operation of the apparatus the pressure within the housing is kept at about one Torr or less.

Abstract: A process for the protective or decorative coating of a continuously moving metal sheet, in which the sheet, after having received its coating, is heated by electromagnetic induction in a tunnel oven in order to evaporate the solvents and to cure the coating. The solvents are continuously extracted from the chamber of the oven, wherein a gas at a temperature greater than the dew point of the solvents is injected into the oven and which is gastight and thermally insulated in order to keep the hot internal walls above this dew point.

Abstract: The invention relates to a procedure applicable for drying substrate surfaces of a large number of materials, such as semiconductors, metals, plastics and, in particular, silicon. The silicon (1) is dipped into a liquid bath (2) and the silicon (1) is separated from the liquid (3), the liquid of the bath (2) consisting of an aqueous HF solution (3) with a concentration between 0.001 and 50%. By adding a gas mixture containing O.sub.2 /O.sub.3 immediately after the drying process is finished, the silicon surface is hydrophilized. By adding a gas mixture containing O.sub.2 /O.sub.3 during the drying process, cleaning takes place as the ozone enters the solution on the liquid surface.

Abstract: A recirculating batch peanut drying apparatus including a drying station for heating the peanuts, a tempering station for cooling the peanuts after heating, and a recirculating device which transports the peanuts in a continuous flow between the drying station and the tempering station.

Abstract: A method of and apparatus for adjusting and controlling the moisture content of carbonaceous fuel components used in making smoking articles comprises a mass flow accumulator and a dryer through which the fuel components are conveyed. Unheated air is flowed over the fuel components in the accumulator to adjust and maintain the moisture content of the fuel components to a level which permits cutting of the fuel components without chipping or cracking. After the fuel components are cut into individual fuel elements and combined with an aerosol generator or substrate they are conveyed through the dryer where heated air is flowed over them to further reduce the moisture content to a desired level for further processing and manufacture into smoking articles.

Abstract: Apparatus for creating a flow of air in a hollow wall or ceiling to aid in drying a wall or ceiling which has become wet generally through a disaster such as broken pipes, flooding, leaking roof, includes a conduit having a first end sized and configured to fit and be secured over and around an opening in a wall or ceiling which has an electrical box mounted therein. The conduit will generally be provided with holes positioned to be aligned with the usual cover plate mounting holes in a wall switch or outlet, or fixture mounting holes in the box itself, through which screws can be positioned to effect securement of the conduit. A second end of the conduit is configured to accept the end of an air supply hose or a vacuum supply hose, such as extending from the outlet or the inlet, respectively, of a usual air blower, and an air flow passage extends from the second end to the first end to direct air into or draw air from the wall or ceiling through and around the electrical box.

Abstract: A system for the solid phase polymerization of polymers comprising a crystallizer, and wherein cold amorphous polymer is introduced to the crystallizer. A source of infrared radiation is associated with the crystallizer, and the polymer is heated by applying infrared radiation thereto. The degree of heating is controlled so that the polymer reaches the crystallization or polymerization temperature without exceeding the polymer melting point.

Abstract: A process for passivating a metal surface to enhance the stability of a gas mixture containing one or more gaseous hydrides in low concentration in contact therewith, which comprises:a) purging gas in contact with said metal surface with inert gas to remove the purged gas,b) exposing the metal surface to an amount of a gaseous passivating agent comprising an effective amount of a gaseous hydride of silicon, germanium, tin or lead and for a time sufficient to passivate said metal surface, andc) purging said gaseous passivating agent using inert gas.

Abstract: The interior of a gas cylinder is cleaned using a supercritical fluid. A treating material, such as carbon dioxide, is injected into the cylinder, and the pressure in the cylinder is increased until the pressure of the treating material exceeds its critical pressure. Then, the cylinder is heated until the temperature of the treating material exceeds its critical temperature. The treating material therefore becomes a supercritical fluid. The treating material is maintained in its supercritical state while the cylinder is rolled for a period of time, while the supercritical fluid dissolves contaminants on the interior surface of the cylinder, and on objects within the cylinder. Then, the supercritical fluid is vented from the cylinder, preferably while the fluid in the cylinder is maintained in its supercritical state.

Abstract: Apparatus for directing pressurized drying air into a hollow wall or ceiling to aid in drying a wall or ceiling which has become wet generally through a disaster such as broken pipes, flooding, leaking roof, etc., without removing a portion of the structure, but by merely removing a standard wall switch or outlet cover plate, includes a conduit having a first end sized and configured to fit over and around an electrical box as installed in a wall or ceiling and to be secured thereover. The conduit will generally be provided with holes positioned to be aligned with the usual cover plate mounting holes in a wall switch or outlet, or fixture mounting holes in the box itself, through which screws can be positioned to effect securement of the conduit.

Abstract: The present invention relates to a fluidized bed reactor in which olefins are polymerized or copolymerized in a bed formed by particles being polymerized and fluidized with the aid of a circulating gas. In the reactor, a circulating gas is fed from a gas space above the fluidized bed into the lower part of the reactor. The lower part of the reactor includes an annular space having an defined by an upwards tapering rotating conical surface and an outer wall defined by a downwards tapering rotating conical surface.

Abstract: The invention relates to a process for the drying and granulation of aspartame through the thermal treatment of a wet mass of aspartame crystals using a hot carrier gas, characterized in that a wet mass of aspartame crystals is supplied, in a continuous process, to a high-speed paddle dryer fitted with a jacket heated to a temperature of 80.degree.-190.degree. C. and with paddles, mounted on a central shaft with a controllable speed of rotation, at an adjustable distance from and angle to the jacket, which are positioned so that the required particle size of the granules is realized, the speed of rotation being chosen so that the Froude number is higher than 1, and the supplied product is treated in the paddle dryer for 15-600 seconds, with the simultaneous presence of a carrier gas having an inlet temperature of 100.degree.-200.degree. C.

Abstract: Offal material, such as shrimp or crab shells, fish offal, etc, is dried to produce a fine-grained base material or additive for use in foodstuffs and animal fodder by subjecting a starting material in a chamber to a turbulent air current which accelerates the material lumps into various paths of movement. Hereby the material lumps continuously collide with each other, thereby constantly exposing new surfaces or rupture. The chamber is supplied with air, having a temperature which partly depends on the temperature of the starting material and partly depends on the comminution rate, in an amount adjusted according to the amount of starting material introduced per time unit. Hereby it is achieved that free water is immediately removed from the exposed surfaces of rupture by evaporation. By exerting a counter-pressure, the material is retained in the chamber until a desired particle size has been achieved.

Abstract: A paint baking oven utilizes air flow throughout the oven to ventilate solvents and/or resins which evaporate off during the paint baking process. Air is continuously introduced through air seals located along the paint baking oven at various points. This ventilation air is directed toward the center of the paint baking oven where it is exhausted at a rate proportional to the rate at which the ventilation air is introduced into the paint baking oven. Removing the solvent and/or resin laden air from the paint baking oven results in a more desirable final finish on the component being baked.