Condensation Of Gas Or Vapor Patents (Class 34/468)
  • Patent number: 7251905
    Abstract: Disclosed is a drawer structure for storing condensed water generated during the drying procedure. The drawer prevents the condensed water form being leaked out of the dryer though the condensed water is fully filled in the drawer and overflowed from the drawer. Thus, a user may not throw away the condensed water whenever the laundry is dried.
    Type: Grant
    Filed: December 17, 2004
    Date of Patent: August 7, 2007
    Assignee: LG Electronics Inc.
    Inventors: Young Jin Doh, Chang Wook Kim
  • Patent number: 7197838
    Abstract: A condenser of a condensing-type dryer is provided. In the condensing-type dryer, a hydrophilic film is formed on a heat emission plate by a plasma discharge. In the heat emission plate, an indoor air can be heat exchanged with a circulation air cycling in a drum. A contact angle of a condensed waterdrop formed on the heat emission plate is decreased through the hydrophilic film, thereby making it possible to decrease a flow resistance due to the condensed waterdrop.
    Type: Grant
    Filed: September 23, 2004
    Date of Patent: April 3, 2007
    Assignee: LG Electronics Inc.
    Inventor: Seong Jin Jo
  • Patent number: 7159334
    Abstract: A web coating machine for coating a web of material having first and second faces and a web travel path, the web coating machine including a tension zone in a portion of the web travel path, a fixed port structure over which the web travels, and a web positioning device including at least one gas flow port in the port structure capable of generating a vacuum that brings the first face of the web of material into contact with a portion of the port structure immediately surrounding one of more of the gas flow ports and reduces, retards or arrests longitudinal travel of the web of material through the web coating machine.
    Type: Grant
    Filed: July 20, 2005
    Date of Patent: January 9, 2007
    Assignee: 3M Innovative Properties Company
    Inventors: William Blake Kolb, Don W. Hendrickson, Gary L. Huelsman
  • Patent number: 7070393
    Abstract: The invention relates to a method for regulating a compressor installation with at least one compressor element (6) driven by a motor and, in the pressure conduit (11) thereof, a dryer (2) of the type comprising a pressure vessel (24) with a drying zone (3) and a regeneration zone (4), and a rotor (25) continuously rotated in this pressure vessel (24) by a motor (33), which rotor is filled with a regenerable drying agent. A portion of the compressed air is supplied, by means of a branch (15), to the regeneration zone (4) and, after cooling down and separation of the condensed water, is fed back to the pressure conduit (11). The speed of both motors (9, 33) is regulated by a regulation device (13) in function of the pressure in the pressure conduit (11).
    Type: Grant
    Filed: October 29, 2001
    Date of Patent: July 4, 2006
    Assignee: Atlas Copco Airpower, naamloze vennootschap
    Inventor: Danny Etienne Andrée Vertriest
  • Patent number: 6904702
    Abstract: The substrate drying apparatus has a substrate processing vessel 1, a substrate supporting section for supporting plural substrates 2 in a standing condition and lined up condition in the interior of the substrate processing vessel 1, fluid reservoir section 3 for drying provided at an upward predetermined position of the substrate processing vessel 1, a first inert gas supplying section 4 for blowing inert gas against the drying fluid 6 pooled in the fluid reservoir section 3 for drying so as to generate droplet of the drying fluid, and for guiding the droplet towards the center of the substrate processing vessel 1, and a second inert gas supplying section 5 for supplying inert gas vertically and downwardly so as to supply the generated droplet of the drying fluid towards the substrates 2, consequently safety is improved without providing special safety device, and sufficient amount of drying fluid is supplied to the dipping boundary face of the substrate and the cleaning liquid.
    Type: Grant
    Filed: May 15, 2003
    Date of Patent: June 14, 2005
    Assignees: Toho Kasei, Ltd, Daikin Industries, Ltd.
    Inventors: Takazo Sotojima, Norio Maeda
  • Patent number: 6886273
    Abstract: A system for separating hydrocarbons from a material which includes a process chamber, a process pan operatively connected to the process chamber and removable therefrom, a blower operatively connected to the process chamber and to a heat source, the blower adapted to force heated air into the process chamber through the material disposed on the process pan, the forced heated air adapted to vaporize hydrocarbons and other contaminants disposed on the material, and at least one condenser operatively connected to the process chamber and adapted to condense the vaporized hydrocarbons and other contaminants is disclosed. Further, a method for separating hydrocarbons from a material which includes passing a stream of heated air over the material to volatilize the hydrocarbons, passing the stream of heated air containing the hydrocarbons through at least one condenser to form liquid hydrocarbons, collecting the liquid hydrocarbons, and recirculating the heated air is disclosed.
    Type: Grant
    Filed: November 24, 2003
    Date of Patent: May 3, 2005
    Assignee: M-I L.L.C.
    Inventors: Gary E. Fout, Jerry T. Connaughton
  • Patent number: 6780225
    Abstract: Reflow solder oven gas management system introduces an inert gas into and removes contaminated gas from a reflow oven tunnel (42) at predetermined points (6, 8) to influence the oven tunnel gas flow and to dilute and expel excess oxygen. The contaminated gas is ducted to a flux separation system (34) to be cleaned, for example remove flux vapors, and returned in part to the tunnel (42) for recirculation and with the remainder routed to end baffle boxes (54) for tunnel end pressurization and exhaust. The system has sufficient pressure to supply end baffle boxes (54) with clean gas to create a gas barrier to effectively seal off the tunnel ends from air infiltration or migration into the tunnel making the system insensitive to external pressure and/or temperature variations. The invention also includes alternative embodiments, low flow oxygen bleed valves (72) to maintain low oxygen content in the oven process tunnel.
    Type: Grant
    Filed: June 27, 2002
    Date of Patent: August 24, 2004
    Assignee: Vitronics Soltec, Inc.
    Inventors: Russell G. Shaw, Roy J. Palhof
  • Patent number: 6739073
    Abstract: A method for performing multiple cleaning and vacuum drying operations in enclosed vessels uses cleaning and vacuum drying apparatus, low-dissolved-air cleaning solution, and drain-to-vacuum process to produce vacuum in a cleaning vessel, so that influence of air pressure on the operations is minimized. The method utilizes physical features that boiling points of general liquids lower with reduced pressure, that liquid saturated vapor pressure reduces with lowered temperature, and that two vacuum vessels of different working temperatures would have a pressure differential between their saturated vapor pressures, and uses heat control units and heat egress units to regulate temperature and pressure in the vacuumized cleaning vessel, so that wet clean, dry clean, vacuum heat drying, and vacuum freeze drying can be performed on the same apparatus, and low-pressure gas used in the dry clean and cleaning solution and waste solution can be recovered to achieve environment protection and energy saving.
    Type: Grant
    Filed: July 29, 2002
    Date of Patent: May 25, 2004
    Inventor: Cheng-Ming Chou
  • Patent number: 6692579
    Abstract: A method for cleaning a semiconductor structure using vapor phase condensation with a thermally vaporized cleaning agent, a hydrocarbon vaporized by pressure variation, or a combination of the two. In the thermally vaporized cleaning agent process, a semiconductor structure is lowered into a vapor blanket in a thermal gradient cleaning chamber at atmospheric pressure formed by heating a liquid cleaning agent below the vapor blanket and cooling the liquid cleaning agent above the vapor blanket causing it to condense and return to the bottom of the thermal gradient cleaning chamber. The semiconductor structure is then raised above the vapor blanket and the cleaning agent condenses on all of the surfaces of the semiconductor structure removing contaminants and is returned to the bottom of the chamber by gravity.
    Type: Grant
    Filed: January 19, 2001
    Date of Patent: February 17, 2004
    Assignee: Chartered Semiconductor Manufacturing Ltd.
    Inventors: Sudipto Ranendra Roy, Yi Xu, Simon Chooi, Yakub Aliyu, Mei Sheng Zhou, John Leonard Sudijono, Paul Kwok Keung Ho, Subhash Gupta
  • Patent number: 6658764
    Abstract: An apparatus and a method for preventing solvent droplets from falling on wafers during a solvent drying process of a semiconductor wafer. The apparatus is constructed by a body having a cavity therein for holding a wafer, means for introducing a solvent vapor in the cavity, a plurality of condenser coils on an inside wall of the cavity, and a plurality of condensing plates attached to the plurality of condenser coils on a surface facing the wafer for condensing solvent vapor and flowing condensed solvent into a reservoir thus preventing solvent droplets from falling on the wafer surface.
    Type: Grant
    Filed: May 10, 2002
    Date of Patent: December 9, 2003
    Assignee: Taiwan Semiconductor Manufacturing Co. Ltd.
    Inventor: Feng Chia Hsu
  • Publication number: 20030208922
    Abstract: An apparatus and a method for preventing solvent droplets from falling on wafers during a solvent drying process of a semiconductor wafer. The apparatus is constructed by a body having a cavity therein for holding a wafer, means for introducing a solvent vapor in the cavity, a plurality of condenser coils on an inside wall of the cavity, and a plurality of condensing plates attached to the plurality of condenser coils on a surface facing the wafer for condensing solvent vapor and flowing condensed solvent into a reservoir thus preventing solvent droplets from falling on the wafer surface.
    Type: Application
    Filed: May 10, 2002
    Publication date: November 13, 2003
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventor: Feng Chia Hsu
  • Publication number: 20030097763
    Abstract: A portable, atmospheric dehydrator and water condenser for dehydrating fruits and vegetables while producing pure atmospheric condensation from humidity found in the air and purifying the water for dispensing and drinking purposes.
    Type: Application
    Filed: June 10, 2002
    Publication date: May 29, 2003
    Inventors: Michael Morgan, Janet Morgan
  • Publication number: 20030079370
    Abstract: A system for separating hydrocarbons from a material which includes a process chamber, a process pan operatively connected to the process chamber and removable therefrom, a blower operatively connected to the process chamber and to a heat source, the blower adapted to force heated air into the process chamber through the material disposed on the process pan, the forced heated air adapted to vaporize hydrocarbons and other contaminants disposed on the material, and at least one condenser operatively connected to the process chamber and adapted to condense the vaporized hydrocarbons and other contaminants is disclosed. Further, a method for separating hydrocarbons from a material which includes passing a stream of heated air over the material to volatilize the hydrocarbons, passing the stream of heated air containing the hydrocarbons through at least one condenser to form liquid hydrocarbons, collecting the liquid hydrocarbons, and recirculating the heated air is disclosed.
    Type: Application
    Filed: October 25, 2001
    Publication date: May 1, 2003
    Inventors: Gary E. Fout, Jerry T. Connaughton
  • Patent number: 6553689
    Abstract: A vapor collection method and apparatus capable of capturing vapor compositions without substantial dilution. The method and apparatus utilize a material that has a surface with an adjacent gas phase. A chamber is positioned in close proximity to a surface of the material. The position of the chamber creates a relatively small gap between the surface of the material and the chamber. The adjacent gas phase between the chamber and the surface define a region possessing an amount of mass. At least a portion of the mass is drawn through the region by induced flow. The utilization of a small gap limits the flow of mass that is external to the chamber from being swept through the chamber by induced flow.
    Type: Grant
    Filed: September 21, 2001
    Date of Patent: April 29, 2003
    Assignee: 3M Innovative Properties Company
    Inventors: Nirmal K. Jain, Peter T. Benson, James L. Capps, William Blake Kolb, Eldon E. Lightner, Norman L. Rogers, Jr., Robert A. Yapel
  • Patent number: 6546647
    Abstract: A method and an appliance are disclosed for the non-thermal drying of articles, in particular motor vehicle bodies, freshly painted with a water-based paint. The articles to be dried are subjected to dry air by forced convection in a drying tunnel and the moisture-laden air is dried in an air drying device by condensation to a specific target value of absolute residual moisture. So that fluctuations in the incidence of moisture can be leveled out with a low degree of inertia, with the high condensation performance remaining unchanged, only a fraction of the circulated air which is adapted in size, as required, is dried in the air drying device to a residual moisture markedly below the circulating-air target moisture, and the remaining untreated part of the circulated air is led back into the drier housing after being intermixed with the dried part-air stream.
    Type: Grant
    Filed: June 21, 2001
    Date of Patent: April 15, 2003
    Assignee: DaimlerChrysler AG
    Inventor: Hans-Joachim Speck
  • Publication number: 20020112369
    Abstract: A method of removing water from the surface of a silicon wafer or other substrate subjected to wet processing which includes a step of water rinsing. In this method a silicon wafer whose surface includes liquid water is disposed in an atmosphere saturated with water vapor. The water vapor is removed from the surface of the silicon wafer by a stream of water-saturated gas. Upon removal of liquid water from the surface of the silicon wafer the water vapor in the water vapor saturated atmosphere is removed by evaporation.
    Type: Application
    Filed: February 16, 2001
    Publication date: August 22, 2002
    Applicant: International Business Machines Corporation
    Inventors: Russell H. Arndt, Glenn Walton Gale, James Willard Hannah, Kenneth T. Settlemyer
  • Patent number: 6430840
    Abstract: A method of and an apparatus for drying a wafer using the Marangoni effect quickly forms an isopropyl alcohol layer on a cleaning liquid in which the wafer is submerged. The isopropyl alcohol is first heated and then supplied in a fluid state onto the cleaning liquid. The isopropyl alcohol liquid thus diffuses rapidly to form the isopropyl alcohol layer. The wafer is thoroughly dried by removing it from the cleaning liquid through the isopropyl alcohol while only supplying more of the heated nitrogen gas into the ambient above the cleaning liquid.
    Type: Grant
    Filed: March 9, 2001
    Date of Patent: August 13, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Jae-Hyung Jung
  • Patent number: 6398875
    Abstract: A process of drying a semiconductor wafer which includes at least one microelectric structure disposed thereon which includes contacting a water-containing thin film-covered semiconductor wafer with a composition which includes liquid or supercritical carbon dioxide and a surfactant.
    Type: Grant
    Filed: June 27, 2001
    Date of Patent: June 4, 2002
    Assignee: International Business Machines Corporation
    Inventors: John Michael Cotte, Dario L. Goldfarb, Kenneth John McCullough, Wayne Martin Moreau, Keith R. Pope, John P. Simons, Charles J. Taft
  • Publication number: 20020038521
    Abstract: A method and an appliance are disclosed for the non-thermal drying of articles, in particular motor vehicle bodies, freshly painted with a water-based paint. The articles to be dried are subjected to dry air by forced convection in a drying tunnel and the moisture-laden air is dried in an air drying device by condensation to a specific target value of absolute residual moisture. So that fluctuations in the incidence of moisture can be leveled out with a low degree of inertia, with the high condensation performance remaining unchanged, only a fraction of the circulated air which is adapted in size, as required, is dried in the air drying device to a residual moisture markedly below the circulating-air target moisture, and the remaining untreated part of the circulated air is led back into the drier housing after being intermixed with the dried part-air stream.
    Type: Application
    Filed: June 21, 2001
    Publication date: April 4, 2002
    Inventor: Hans-Joachim Speck
  • Patent number: 6138381
    Abstract: A process of treating moist fuel, particularly biomass fuel, in connection with a power production process, comprises drying moist fuel (7) by means of combustion air (3), which is thereafter supplied to the power production process combustion section (1). Flue gas (11) from the combustion section, which as a result of said drying has become moisture-laden, is condensed (13) while recovering heat (15), which may be used as drying heat. In accordance with a preferred embodiment, the flue gas condensation is used to humidify (31) the combustion air.
    Type: Grant
    Filed: April 16, 1998
    Date of Patent: October 31, 2000
    Assignee: Vattenfall AB (Publ.)
    Inventor: Tomas .ANG.byhammar
  • Patent number: 6094840
    Abstract: A method for the heat treatment of textiles, particularly advantageous for textiles wound on cops or bobbins, comprises applying a vacuum to a steamer chamber in which the textiles have been placed. When a sufficient vacuum has been reached a treatment liquid is introduced and the vacuum source shut off maintains the vacuums. The treatment liquid is then heated to generate a saturated steam treatment for the textiles. The liquid and steam are then pumped out of the chamber and a vacuum re-instituted for evacuation, cooling and drying, after which the chamber is returned to ambient. Subsequent cycles may be performed with other liquid treatments. An apparatus for carrying out the method may be in the form of a closed system in which the vessels from which the liquid treatment are drawn are coupled to the treatment chamber to allow return of the liquids when the liquids are pumped out. Liquid loss is thus minimized and efficiency increased.
    Type: Grant
    Filed: May 13, 1999
    Date of Patent: August 1, 2000
    Assignee: Xorella AG
    Inventor: Freddy Wanger
  • Patent number: 5970625
    Abstract: An automated air filtration and drying system including an energy and environmental management system for controlling, monitoring and supervising the operation and performance of the air filtration and drying system, a capture apparatus for capturing and controlling overspray, and a drying/curing control module for rapidly drying a painted article using a continuously filtered and dehumidified flow of recycled air.
    Type: Grant
    Filed: June 24, 1997
    Date of Patent: October 26, 1999
    Assignee: Optimum Air Corporation
    Inventors: Fred G. Scheufler, Richard D. Scheufler, William H. Bayard
  • Patent number: 5953828
    Abstract: An apparatus for removing oxide from a silicon substrate having a silicon substrate temperature including an evaporation chamber having at least one inlet and at least one outlet, whereby a carrier gas can be passed through the evaporation chamber from the inlet to the outlet, means for introducing a preselected charge of a hydrous cleaning solution into the evaporation chamber, means for heating the preselected charge of the liquid cleaning solution to evaporate the charge completely and thereby form a mixture of vapors with the carrier gas flowing through the evaporation chamber, a heat exchanger connected to the outlet of the evaporation chamber for lowering the temperature or the mixture to below the silicon substrate temperature, a process chamber for holding the silicon substrate, the process chamber having an inlet connected to the heat exchanger and an outlet and an exhaust controller connected to the outlet of the process chamber for removing gas mixture from the process chamber.
    Type: Grant
    Filed: April 7, 1998
    Date of Patent: September 21, 1999
    Assignee: S.sup.3 Service Support Specialties, Inc.
    Inventor: Gary Hillman
  • Patent number: 5657553
    Abstract: A substrate drying apparatus comprises a treatment vessel for containing IPA in the form of liquid, an IPA source for supplying IPA into the treatment vessel, a first heat exchanger which is equipped with a heat exchanger tube dipped in IPA and allowing steam to pass therein, the first heat exchanger allowing the steam and IPA to perform heat exchange therebetween to thereby evaporate IPA, and a second heat exchanger provided on or above an upper portion of the treatment vessel and equipped with a heat exchanger tube for allowing a coolant to pass therein, the second heat exchanger allowing the coolant and the evaporated IPA to perform heat exchange therebetween to thereby condense the evaporated IPA.
    Type: Grant
    Filed: November 28, 1995
    Date of Patent: August 19, 1997
    Assignees: Sharp Kabushiki Kaisha, Kimmon Quartz Co., Ltd.
    Inventors: Tetsuya Tarui, Hiromitsu Asano, Hajime Onoda
  • Patent number: 5544427
    Abstract: A process for the production of pourable and free flowing granules of materials or mixtures thereof which are suitable for use as wetting agents, detergents or cleaning products wherein an aqueous solution or suspension of the wetting agents, detergents or cleaning products is dried using a hot gas stream of superheated steam. Drying is terminated before the granules are damaged by heat, and the hot gas stream is freed from entrained particles of the materials by means of filters.
    Type: Grant
    Filed: August 12, 1994
    Date of Patent: August 13, 1996
    Assignee: Henkel Kommanditgesellschaft auf Aktien
    Inventors: Wilfried Raehse, Wilhelm Beck, Dieter Jung, Dieter Sonnemann
  • Patent number: 5456022
    Abstract: A drier having a boxlike housing (12) for receiving a hopper (13) therein which contains a batch of wet sludge. The hopper (13) cooperates with the housing, when closed therein, to define a closed air recirculation system which supplies dry pressurized warm air into an air-receiving chamber (79) located at the bottom of the hopper. The air passes upwardly through a perforated bottom wall (78) into and through the sludge to remove moisture therefrom. The moist air passes upwardly through the open top of the hopper, through a filter and is supplied to a drying unit (34) located in the housing for removing moisture therefrom, which moisture is externally discharged. The drying unit resupplies the dry air back to the drying chamber formed in the hopper.
    Type: Grant
    Filed: July 13, 1994
    Date of Patent: October 10, 1995
    Assignee: JWI, Inc.
    Inventors: David P. McLeod, David J. Spyker, Daniel De Haan, Greg De Haan, Wesley G. Koops, James E. Roelofs
  • Patent number: 5383289
    Abstract: A drying system for drying textiles. The textile drying system includes an enclosed dryer having heating elements located therein, a feed system for continuously feeding textiles through the dryer, and a dehumidifier for directing conditioned air into the dryer. The textiles are dried in the dryer due to a combination of the heating elements located in the dryer and the conditioned air directed into the dryer by the dehumidifier. The dehumidifier conditions the ambient air to a selected temperature and relative humidity, and directs this air into the dryer. An exhaust port located in the dryer provides an opening for air within the dryer to exit to the atmosphere. The speed at which textiles are advanced through the dryer by the feed system is controlled by a moisture sensor which senses the moisture content of the textile goods exiting the dryer 12 and controls the speed of the feed system accordingly.
    Type: Grant
    Filed: May 28, 1993
    Date of Patent: January 24, 1995
    Assignee: Sara Lee Corporation
    Inventors: Phillip S. Webb, Andrew R. Messner, John A. Street, Richard S. Gardner
  • Patent number: 5361511
    Abstract: Exhaust air from a clothes dryer is dried in an air treatment unit and returned to the dryer. The air treatment unit is manually portable and separate from the dryer. Air is circulated through the air treatment unit by means of the dryer fan. The dryer heating mechanism can be deactivated so that drying is effected by very dry, unheated air. Recirculation fans can be provided in the treatment unit for recirculating air a number of times through each compartment.
    Type: Grant
    Filed: July 30, 1993
    Date of Patent: November 8, 1994
    Inventor: John R. Brown