Abstract: An electronic product includes a substrate and a bonding pad structure. The bonding pad structure is disposed on the substrate, and the bonding pad structure includes a first metal layer, a first insulating layer, at least one first connecting hole and a transparent conductive layer. The first metal layer and the first insulating layer are disposed on the substrate. The first connecting hole is situated in the first insulating layer, and the first connecting hole exposes a portion of the first metal layer. The transparent conductive layer is disposed on the first insulating layer, and the transparent conductive layer has a first edge and a second edge opposite to the first edge, wherein the transparent conductive layer is electrically connected to the first metal layer through the first connecting hole. A spacing between the first edge and the first connecting hole is greater than or equal to 100 ?m.

Abstract: A liquid display device is provided. The liquid crystal display device includes a first base substrate, a first signal line disposed on the first base substrate and extended in a first direction, a second signal line disposed on the first base substrate, extended in a second direction intersecting the first direction, and insulated from the first signal line, a thin film transistor disposed on the first base substrate and electrically connected to the first signal line and the second signal line, a pixel electrode electrically connected to the thin film transistor, and a shield pattern disposed on a same layer as but spaced apart from the pixel electrode, overlapped with the thin film transistor, and including a material same as a material of the pixel electrode.

Abstract: A pixel array substrate structure includes: first and second planarizing films sequentially stacked on a substrate where a circuit unit is formed; and a relay wire formed between the first and second planarizing films, in which the relay wire electrically connects a first contact portion formed on the first planarizing film and connected to the circuit unit with a second contact portion formed at a position different from the first contact portion when seen from above, on the second planarizing film.

Abstract: The present disclosure provides an AMOLED back plate and a method for manufacturing the same. The manufacturing method includes: forming source and drain electrodes and a first via hole on a substrate having a light shielding layer and a buffer layer formed thereon, by a patterning process; depositing an active layer film and a gate insulating layer film sequentially, and forming an active layer, a gate insulating layer and a second via hole by a patterning process, wherein the active layer connected with the light shielding layer by the first via hole; forming a gate electrode and a transparent anode sequentially, wherein the transparent anode is arranged in a light emitting area and connected with one of the source and drain electrodes through the second via hole.

Abstract: To form a sufficiently large storage capacitor, a liquid crystal display device includes a liquid crystal display panel having a first substrate, a second substrate, and a liquid crystal held between the first substrate and the second substrate, the liquid crystal display panel having multiple pixels arranged in matrix. The first substrate has, in a transmissive display area provided in each of the pixels, a laminated structure containing a first transparent electrode, a first insulating film, a second transparent electrode, a second insulating film, and a third transparent electrode which are laminated in this order. The first transparent electrode and the second transparent electrode are electrically insulated from each other and together form a first storage capacitor through the first insulating film, and the second transparent electrode and the third transparent electrode are electrically insulated from each other and together form a second storage capacitor through the second insulating film.

Abstract: The present disclosure discloses a display panel and a display device. The display panel includes an array substrate and an opposite substrate arranged opposite to each other; the array substrate includes a box alignment area facing the opposite substrate, a circuit test area located on a side of the box alignment area; the opposite substrate includes a base substrate, a conductive black matrix arranged on a side of the base substrate facing the array substrate; the display panel further includes an electrostatic discharging layer electrically connected respectively with the conductive black matrix and a GND wire in the circuit test area; the conductive black matrix is provided with a thickened area in at least an area in contact with the electrostatic discharging layer; a thickness of the thickened area of the conductive black matrix is more than a thickness of other areas of the conductive black matrix.

Abstract: A blue phase liquid crystal panel is disclosed, which includes an upper substrate, a lower substrate, and blue phase liquid crystal that is arranged between the upper substrate and the lower substrate. The upper substrate is provided with a first electrode base layer which has a plurality of first protrusions, and the lower substrate is provided with a second electrode base layer which has a plurality of second protrusions. The first protrusions each extend to a position between two adjacent second protrusions, and the second protrusions each extend to a position between two adjacent first protrusions. The first protrusion is provided with a common electrode, and the second protrusion is provided with a pixel electrode. The driving voltage of blue phase liquid crystal in the panel can be reduced.

Abstract: An in-cell touch display panel and an electronic device are provided. The in-cell touch display panel includes a plurality of photo spacers (PSs) configured to stand on a protection layer along a direction in which dummy lines extend. The dummy lines are disconnected in standing locations of the PSs. The PSs are arrange to avoid a metallic wiring layer, and the standing locations of PSs are flatter. As such, supporting height of the PSs are the same, and a cell thickness is made uniform. The dark stripe issue caused by the configuration of the PSs may be avoided, and so does the un-recoverable Push Mura, water ripple, and bright and dark spots. At the same time, the surface pressure and the display performance of the in-cell touch display panel may be enhanced.

Abstract: An exemplary embodiment of the present invention provides a liquid crystal display including a first insulation substrate. A pixel electrode is disposed on the first insulation substrate. A first alignment layer is disposed on the pixel electrode. A second insulation substrate faces the first insulation substrate. A common electrode is disposed on a surface of the second insulation substrate, which the surface of the second insulation substrate faces the first insulation substrate. A second alignment layer is disposed on a surface of the common electrode, which the surface of the common electrode faces the first insulation substrate. A liquid crystal layer is disposed between the first alignment layer and the second alignment layer. The liquid crystal layer includes liquid crystal molecules. Liquid crystal molecules adjacent to at least one of the first alignment layer and the second alignment layer have a pre-tilt angle.

Abstract: A display device includes a plurality of pixels that is arrayed in a first direction and a second direction. Each pixel includes; a first sub-pixel, a second sub-pixel that is disposed to be adjacent to the first sub-pixel in the first direction, a third sub-pixel that is disposed to be adjacent to at least one of the first sub-pixel and the second sub-pixel in the second direction, and a light shielding portion that is disposed corresponding to the position on which the third sub-pixel is disposed, so as to limit a viewing angle of the third sub-pixel in the first direction.

Abstract: A liquid crystal display (LCD) is provided, a liquid crystal display comprising: a first substrate and a second substrate that are opposite to each other; a liquid crystal layer arranged between the first substrate and the second substrate; a light blocking pattern including a first light blocking pattern and a second light blocking pattern arranged to extend along one direction on the first substrate; and a column spacer formed on the first light blocking pattern on the first substrate, wherein the light blocking pattern includes an open portion disposed between the first light blocking pattern and the second light blocking pattern, and formed to be spaced apart from the column spacer for a predetermined distance.

Abstract: A display device includes a substrate, an encapsulation unit opposite to the substrate, a display unit disposed between the substrate and the encapsulation unit and including a pixel, a camera unit disposed on one side of the substrate and including at least one camera module, and a mirror member disposed on one side of the encapsulation unit.

Abstract: For improved high-definition of liquid crystal display devices and the use thereof in bright places, luminance of backlights is being increased. Thus, when a light-shielding layer is employed for suppressing a light leakage current, characteristic fluctuations of transistors are caused, which may result in showing faulty display. In a dual-gate thin film transistor having a floating light-shielding layer, the layout is designed in such a manner that the film thickness of the insulating layer is equal to or more than 200 nm and equal to or less than 500 nm and that Sg/Sd becomes 4.7 or more, provided that an opposing area between the light-shielding layer and a drain region in a place at the outermost side of the active layer is Sd and the opposing area between the light-shielding layer and the gate electrode is Sg.

Abstract: An array substrate, a method for manufacturing the array substrate and a display apparatus are provided. The array substrate includes: a display region; a common bus line disposed at all edges of the display region. The common bus line comprises a first and a second regions which are opposite to each other. A plurality of gate lines, each of which is configured to drive a row of sub pixels. The gate lines are parallel to the direction from the first region to the second region of the common bus line. At least one gate line intersects one or both of the first region and the second region of the common bus line.

Abstract: Embodiments relate to a liquid crystal display and a manufacturing method thereof, and more particularly, to a liquid crystal display including an alignment layer pattern and a manufacturing method thereof. The liquid crystal display includes a lower panel including a first alignment layer and a signal line. An upper panel faces the lower panel and uncovers an end portion of the signal line of the lower panel. A sealant is positioned between the lower panel and the upper panel and couples the lower panel and the upper panel with each other. The first alignment layer includes a first portion and a second portion that are separated from each other in a first direction, and the sealant is disposed between the first portion and the second portion and separated from the first portion and the second portion in the first direction.

Abstract: An array substrate and a display device are provided. The array substrate comprises a plurality of signal lines (40), a plurality of connecting lines (50) and a driving module (60) in a peripheral region (1) outside a display region (2); the connecting lines (50) are configured for connecting the signal lines (40) and the driving module (60), to transmit signal from the signal lines (40) to the driving module (60), wherein, at least one of the connecting lines (50) and at least one of the signal lines (40) are designed to intersect with and insulated from each other in a first region (N). The at least one of the signal lines (40) includes, in a second region (0) other than the first region (N), a first electrode line layer (401) and a second electrode line layer (402), while, in the first region (N), includes the first electrode line layer (401) but does not include the second electrode line layer (402).

Abstract: Embodiments of the disclosure provide a manufacturing method of a TFT array substrate, a TFT array substrate and a display device. The TFT array substrate comprises a thin film transistor and a pixel electrode formed on a base substrate, the pixel electrode is electrically connected with a drain electrode of the thin film transistor. The array substrate further comprises an light-shielding pattern provided above the thin film transistor.

Abstract: A semiconductor device (100) includes: a substrate (10); and a thin film transistor (5) supported on the substrate, the thin film transistor including a gate electrode (12), an oxide semiconductor layer (18), a gate insulating layer (20) provided between the gate electrode and the oxide semiconductor layer, and a source electrode (14) and a drain electrode (16) electrically connected to the oxide semiconductor layer, wherein: the drain electrode is shaped so as to project toward the oxide semiconductor layer; a width W1 and a width W2 satisfy a relationship |W1?W2|?1 ?m, where the width W1 is a width of the oxide semiconductor layer in a channel width direction of the thin film transistor, and the width W2 is a width of the drain electrode in a direction perpendicular to a direction in which the drain electrode projects; and the width W1 and the width W2 are 3 ?m or more and 6 ?m or less.

Abstract: A flexible display device including a flexible substrate and a conductive pattern. The flexible substrate includes a bending part in which a bending occurs. At least a portion of the conductive pattern is disposed on the bending part and the conductive pattern includes grains. Each grain has a grain size of about 10 nm to about 100 nm.

Abstract: A display substrate includes a base substrate having a display area and a non-display area surrounding the display area; a gate line disposed on the base substrate and extending in a first direction; a data line disposed on the base substrate and extending in a second direction; a thin film transistor connected to the gate line and the data line; a color filter disposed on the thin film transistor in the display area; a pixel electrode disposed on the color filter and connected to the thin film transistor; a black matrix pattern disposed to correspond to the gate line and the data line; a black border pattern disposed in the non-display area, and including a first border pattern having a first thickness and a second border pattern having a second thickness that is less than the first thickness; and a gate metal pattern disposed below the second border pattern.

Abstract: A display device includes a first base substrate, first through n-th gate lines, first through (m+1)-th data lines, and a plurality of pixels. Each of the first through n-th gate lines extends in a first direction. Each of the first through (m+1)-th data lines extends in a second direction crossing the first direction. The plurality of pixels is arranged in a matrix form. Each of the plurality of pixels is coupled to a corresponding one of the gate lines and a corresponding one of the data lines. Each pixel in the first column among the plurality of pixels is independently driven from each pixel in the second column among the plurality of pixels. Pixels in the first column and pixels in the m-th column are provided in the non-display area. Pixels coupled to the first data line and pixels coupled to the (m+1)-th data line display a black image.

Abstract: A method of manufacturing a display device includes: forming an active layer on a substrate; forming a first insulation layer covering the active layer; forming a gate metal line on the first insulation layer; forming a third insulation layer covering the gate metal line and including a silicon oxide; forming a fourth insulation layer including a silicon nitride on the third insulation layer; forming a fifth insulation layer including a silicon oxide on the fourth insulation layer; arranging a blocking member over a region in which the active layer and the gate metal line overlap; forming a fifth auxiliary insulation layer by doping nitrogen ions in the fifth insulation layer; and exposing a part of an upper surface of the fourth insulation layer by removing a portion of a fifth main insulation layer of the fifth insulation layer which does not overlap the fifth auxiliary insulation layer.

Abstract: A pixel structure is provided. The pixel structure includes an active device, a first pixel electrode, a second pixel electrode, and a conductive line. The first pixel electrode is electrically connected to the active device. The second pixel electrode and the first pixel electrode are electrically insulated. The conductive line is located below the first pixel electrode and the second pixel electrode. The active device is electrically connected to the first pixel electrode through the conductive line. The conductive line is coupled to the second pixel electrode to form a coupling capacitance.

Abstract: A display device may include a floating electrode, a common-voltage electrode, a transistor, and a pixel electrode. The floating electrode may be electrically floating. The common-voltage electrode may be electrically connected to a voltage source. The pixel electrode may be electrically connected to the transistor. A first portion of the pixel electrode may overlap neither of the floating electrode and the common-voltage electrode in a direction perpendicular to at least one of the pixel electrode and an image display side of the display device. A second portion of the pixel electrode may overlap the common-voltage electrode. A third portion of the pixel electrode may overlap the floating electrode.

Abstract: The present disclosure provides an array substrate, a method for manufacturing the same, and a display device relating to the technical field of the array substrate. The array substrate includes a base, a plurality of leads and a plurality of inclined supporting surfaces, wherein the inclined supporting surfaces are strip-like and are inclined relative to the base, and a length direction of each of the inclined supporting surfaces is parallel to the base; and at least a part of the leads are inclined leads, and at least a part of each of the inclined leads is arranged on the corresponding inclined supporting surface and extends in the length direction of the inclined supporting surface.

Abstract: An array substrate for a display device includes a first substrate which includes a display region and a non-display region enclosing a periphery of the display region, a second substrate facing the first substrate which includes the display region and the non-display region enclosing a periphery of the display region, a color filter disposed on the first substrate, a liquid crystal layer disposed on the color filter and a black matrix disposed on the first substrate in the non-display region and at least a part of the display region, where the black matrix has a thickness ranging from about 2.5 micrometers to about 6.0 micrometers.

Abstract: Even when a light shielding film is provided between a transistor and a substrate, a threshold voltage of the transistor can be prevented or suppressed from being shifted. A display device includes light shielding films provided between a substrate and a semiconductor layer of a transistor including a gate electrode and the semiconductor layer. The semiconductor layer includes a source region and a drain region. Both of the light shielding films overlap the semiconductor layer when seen in a plan view, and are spaced apart from each other in a direction.

Abstract: Discussed are a glass patterned retarder stereoscopic 3D display device and a method for fabricating the same. The device is capable of enhancing a viewing angle in upper and lower directions and an aperture ratio by forming light shielding patterns on a rear surface of a color filter substrate. Further, the device is capable of preventing scratches occurring on the light shielding patterns due to a polishing belt, by forming high hardness polymer on the light shielding patterns and removing stair-steps of a rear indium tin oxide (ITO).

Abstract: An array substrate comprising a plurality of sub-pixel unit pairs and a display device are provided. Each sub-pixel unit pair comprises two adjacent sub-pixel units located in a same row. Two sub-pixel units in a same sub-pixel unit pair are mirror-symmetrical with respect to each other in structure, and a first common electrode forming an opaque region is arranged between said two sub-pixel units.

Abstract: A display device includes a substrate, a gate wiring on the substrate, the gate wiring including a gate line and a gate electrode, a data wiring which is disposed on the substrate and insulated from the gate wiring, the data wiring including a data line, a source electrode, and a drain electrode, a pixel electrode which is disposed on the substrate and insulated from the data wiring, the pixel electrode being connected to the drain electrode through a contact hole, and a backlight shielding electrode below the contact hole.

Abstract: A liquid crystal display device is provided with a thin film transistor which includes a gate electrode film that is provided in a first electrode layer located over a first insulating layer, a semiconductor film that is disposed over the gate electrode film via a second insulating layer, a drain electrode and a source electrode that are provided in a second electrode layer located over the semiconductor film and are in contact with an upper surface of the semiconductor film, and a light blocking film that is disposed under the first insulating layer. At least a part thereof overlaps the semiconductor film and the gate electrode film in a plan view. One of the drain electrode and the source electrode is connected to a gate line, and the light blocking film is electrically connected to the source electrode.

Abstract: A thin film transistor array substrate for a display device generally includes: a substrate; a plurality of gate lines and a plurality of data lines arranged on the substrate intersecting with and insulated from each other; and a plurality of pixel elements arranged in areas defined by the gate lines and the data lines. At least one of the pixel elements includes: a switch element; an insulation layer located on the switch element; and a pixel electrode located at the insulation layer. The insulation layers of the pixel elements define a plurality of vias. The pixel electrodes of two adjacent pixel elements are electrically coupled with the corresponding switch elements of the two adjacent pixel elements through a common via defined by the insulation layers of the two adjacent pixel elements. The two adjacent pixel elements are disposed along extensions of the plurality of the gate lines.

Abstract: A method of manufacturing a display device, the method including: forming, on a first surface of a substrate, a gate line and a gate electrode; forming a first dielectric layer on the gate line and the gate electrode; forming a data line, a source electrode and a drain electrode on the first dielectric layer; forming a black matrix layer on the first dielectric layer, the data line, the source electrode, and the drain electrode; radiating ultraviolet light on a second surface of the substrate opposing the first surface, the ultraviolet light developing exposed parts of the black matrix layer to form a black matrix pattern; and etching the first dielectric layer using the black matrix pattern as an etching mask to respectively form a first dielectric pattern on the gate line and a gate dielectric pattern on the gate electrode.

Abstract: A display device includes an insulating substrate, a semiconductor layer formed of polycrystalline silicon, including a first impurity area, a second impurity area, and a channel area, an insulating film which covers the semiconductor layer, a gate electrode formed on the insulating film and opposed to the channel area, a source line electrically connected to the first impurity area, an electrode electrically connected to the second impurity area, and a light-shielding film located between the insulating substrate and the semiconductor layer, disposed at a position displaced from a position opposed to the source line, and opposed to an area including a boundary between the channel area and the second impurity area.

Abstract: A liquid crystal display includes a substrate, a gate line, a data line, first and second reference voltage lines disposed on the substrate, first and second subpixel electrodes disposed in one pixel area, and first to third switching elements. The first and second reference voltage lines apply first and second reference voltages. The first and second subpixel electrodes include a plate portion and a plurality of branch portions extending from the plate portion. The first and second reference voltage lines include a first portion overlapping the first subpixel electrode and the second subpixel electrode. The first portion overlaps the plate portion of the first and second subpixel electrodes. A voltage difference between the first subpixel electrode and a common voltage is larger than a voltage difference between the second subpixel electrode and the common voltage.

Abstract: A liquid crystal display device, including: an array substrate including: a first pixel electrode, first and second source lines arranged in a first direction and extending in a second crossing direction, a first gate line, an auxiliary capacitance line, a second gate line arranged in the second direction and extending in the first direction, and a switching element including a semiconductor layer which includes a first portion overlapping the first source line and extending in the second direction and a second portion overlapping the auxiliary capacitance line and extending in the first direction. The auxiliary capacitance line includes a branch portion extending along the first source line toward the second gate line and formed on a layer between the first source line and the semiconductor layer. The array substrate includes first and second shield layers, and the first shield layer formed larger than the second shield layer.

Abstract: According to one embodiment, provided is a thin film transistor with which it is possible to reduce the leakage current and thereby, for a liquid crystal display device, to ensure a good display quality. The thin film transistor includes a semiconductor layer, gate electrodes, first light-blocking electrodes, and second light-blocking electrodes. The first light-blocking electrodes are disposed opposite to the gate electrodes with respect to the semiconductor layer and opposed to channel regions to block light incident into the channel regions. The second light-blocking electrodes are disposed opposite to the semiconductor layer with respect to the gate electrodes, arranged to block light incident into the channel regions, and electrically connected with one of a signal line and a pixel electrode.

Abstract: An array substrate, a manufacturing method thereof, a liquid crystal panel and a liquid crystal display.

Abstract: Provided is a manufacturing method of an array substrate with an etching stop layer. The method includes: forming a pattern including a gate, a gate line and a common electrode line on a substrate through a first patterning process; forming a gate insulation layer, an active layer film and an etching stop layer through a second patterning process; wherein, the etching stop layer corresponds to a gap between a source and a drain which are to be formed, and a via hole exposing the common electrode line is formed above the common electrode line; forming at least an active layer, a pattern including source, drain and data line and a protection layer through a third patterning process; wherein, the protection layer exposes a part of the drain; and forming at least a pixel electrode through a fourth patterning process; wherein, the pixel electrode is electrically connected with the drain.

Abstract: Embodiments of the present invention provide a touch screen, an electronic device comprising the same and a method for manufacturing the same. The touch screen comprises driving electrode layers, a transparent organic polymer layer and metal bridges conductively communicated with two adjacent driving electrode layers, and protective layers covering the metal bridges to prevent the oxidation of the metal bridges are disposed between the driving electrode layers and the metal bridges. In the touch screen provided by the embodiment of the present invention, as the metal bridges are respectively covered by the protective layers, the metal bridges will not undergo oxidation reaction due to the contact of transparent organic polymers, and thus the electric conductivity of the metal bridges can be effectively guaranteed; the increase of the impedance of oxide layers can be avoided; and the product yield of the touch screen can be improved.

Abstract: An array substrate for LCD devices and a method of manufacturing the same are provided. By using a structure where an empty space is secured in a data line area as in a DRD structure in which the number of data lines is reduced by half, a capacitance is sufficiently secured by forming a sub storage capacitor in the data line area of the empty space, and thus, an area of a main storage capacitor can be reduced. Accordingly, the cost can be reduced, and moreover, an aperture ratio can be enhanced.

Abstract: A thin film transistor includes: an organic semiconductor layer which is formed from a metal-containing material containing at least one of a metallic element and a semi-metallic element capable of reacting with an etching gas; a source electrode and a drain electrode spaced apart from each other; and an organic conductive layer which is inserted between the organic semiconductor layer and the source and drain electrodes in the regions where the organic semiconductor layer overlaps with the source and drain electrodes and which is formed from a non-metal-containing material not containing at least one of a metallic element and a semi-metallic element capable of reacting with the etching gas.

Abstract: The present invention provides an array substrate, a method of fabricating the array substrate, and a display device. The array substrate includes a base substrate and pixel units arranged in a matrix-type manner on the base substrate, a thin film transistor, a first electrode and a second electrode are provided in the pixel unit, the thin film transistor includes a gate, a first insulation layer, an active layer, a source and a drain. The array substrate further includes a black matrix provided above the first electrode, and the black matrix covers a non-display region of each pixel unit.

Abstract: An electrooptic device includes: a first substrate member; an TFT disposed on the first substrate member; a capacitor element which is connected with the TFT and in which an insulation film is sandwiched between a pair of electrodes; a first electric wire electrically connected with one of the pair of electrodes; a second electric wire electrically connected with the other one of the pair of electrodes; a contact hole electrically connected with the first electric wire; and another contact hole electrically connected with the second electric wire. Further, the above two contact holes are provided in an insulation layer that is disposed on the first and second electric wires.

Abstract: An embodiment provides a display module comprising: a first substrate comprising a red filter, a green filter, a blue filter, and a white filter; a second substrate disposed facing the first substrate and comprising a first switching device and a first transparent electrode being formed corresponding to a position where the red filter is disposed, a second switching device and a second transparent electrode being formed corresponding to a position where the green filter is disposed, a third switching device and a third transparent electrode being formed corresponding to a position where the blue filter is disposed, and a fourth switching device and a reflective part being formed corresponding to a position where the white filter is disposed; and a liquid crystal layer formed between the first substrate and the second substrate.

Abstract: A thin film transistor array panel includes a substrate; a plurality of gate lines that are formed on the substrate; a plurality of data lines that intersect the gate lines; a plurality of thin film transistors that are connected to the gate lines and the data lines; a plurality of color filters that are formed on upper parts of the gate lines, the data lines, and the thin film. transistors; a common electrode that is formed on the color filters and that includes a transparent conductor; a passivation layer that is formed on an upper part of the common electrode; and a plurality of pixel electrodes that are formed on an upper part of the passivation layer and that are connected to a drain electrode of each of the thin film transistors.

Abstract: The invention provides a thin film transistor that can reduce an off-current flowing in end-parts in a channel width direction of a channel layer and a manufacturing method therefor.

Abstract: A TFT array substrate is disclosed. The TFT array substrate includes an array of TFT switches including scan lines, data lines intersecting the scan lines, and TFT switches. Each of the TFT switches includes a gate electrode electrically connected to a scan line, a source electrode electrically connected to a data line, and a drain electrode. The TFT array substrate also includes an array of pixel electrodes, each of the pixel electrodes is electrically connected to the drain electrode of a corresponding TFT switch. At least one first pixel electrode is disposed in the array of the pixel electrodes, and each first pixel electrode has an overlapping portion overlapped by at least one of the scan lines and the data lines. In addition, in the overlapping portion, a shielding electrode layer is located between the first pixel electrode and at least one of the scan line and the data line overlapping the first pixel electrode.

Abstract: A color filtering array substrate and the manufacturing method thereof are disclosed. The color filtering array substrate includes a glass substrate (20) having a display area and a non-display area, a first metallic layer above the glass substrate, an insulation layer (22) above the first metallic layer, a second metallic layer above the insulation layer (22), a color filtering layer (23) formed between the insulation layer (22) and the second metallic layer, and a transparent conductive layer above the second metallic layer. The first metallic layer is for forming a first peripheral metallic layer (21) in the non-display area and to form a first internal metallic layer in the display area. The second metallic layer is for forming a second peripheral metallic layer (26) in the non-display area and to form a second internal metallic layer in the display area.

Abstract: A semiconductor device is provided in which ESD is less likely to occur in a manufacturing process thereof. In manufacture of a semiconductor device including a long lead wiring A, during steps with direct exposure to a plasma atmosphere, a plurality of island-shaped wirings is formed for the wiring A and then electrically connected to one another in series. Specifically, a plurality of island-shaped wirings is formed, covered with an insulating layer, and electrically connected to one another in series by a wiring formed over the insulating layer. The island-shaped wiring and the wiring formed over the insulating layer are electrically connected to each other through an opening formed in the insulating layer.