Abstract: Opto-electronic modules include masking features that can help reduce the visibility of interior components or enhance the outer appearance of the module or of an appliance incorporating the module as a component. The modules can include an optical diode or saturable optical absorber.

Abstract: A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

Abstract: A scanning illuminating device includes an emission center from which radiation is emitted in an illuminating sector. A cylindrical ring is centered on the source and is rotatably movable about a first axis. The ring includes a plurality of slits regularly distributed about its axis of rotation and having the same angular amplitude ?. A cylinder portion is centered on the source and is rotatably movable about a second axis crossing the first axis at the center and forming a nonzero angle therewith. The cylinder portion includes a slit having an angular amplitude ?. A first device control of the rotation of the ring, defining an elementary angular step as such that an integer N1 other than 1 meets the condition ?=N1·??. A second device controls the rotation of the ring portion defining an angular step ?? such that an integer N2 other than 1 meets the condition ?=N2·??.

Abstract: A scanning-type projection device is provided with an emitted-light-intensity control unit for controlling the light intensity of a laser light emitted by a laser light source unit, a polarization direction control unit for controlling the polarization direction of the laser light, a scanning unit for scanning the laser light and generating a display image, and a divergence unit on which the laser light scanned by the scanning unit is incident. The emitted-light-intensity control unit has a polarization control element for controlling the polarization state of the laser light, and a polarizing plate on which the laser light emitted from the polarization control element is incident, and the polarization direction control unit adjusts the polarization direction of display light incident on a projection surface by controlling the polarization direction of the laser light emitted by the emitted-light-intensity control unit.

Abstract: An illumination system having a refractive optical element that compensates for dependence in irradiance of images of objects captured by a photosensor is provided. The refractive optical element may structure the light such that similar objects in the same spherical surface in the field of view of the camera have the same irradiance on the camera photosensor. The illumination system may have an image sensor, a light source, and a refractive optical element. The image sensor has a photosensor that captures images of objects in a field of view. The irradiance of images of objects having a given exitance that are captured by the photosensor may depend on angular displacement from an optical axis of the image sensor. The refractive optical structures light from the light source to illuminate the field of view to compensate for the dependence of irradiance on angular displacement from the optical axis.

Abstract: An illumination optical system can form a pupil intensity distribution with a desired beam profile. The illumination optical system for illuminating an illumination target surface with light from a light source is provided with a spatial light modulator which has a plurality of optical elements arrayed on a predetermined surface and individually controlled and which variably forms a light intensity distribution on an illumination pupil of the illumination optical system; a divergence angle providing member which is arranged in a conjugate space including a surface optically conjugate with the predetermined surface and which provides a divergence angle to an incident beam and emits the beam; and a polarizing member which is arranged at a position in the vicinity of the predetermined surface or in the conjugate space and which changes a polarization state of a partial beam of a propagating beam propagating in an optical path.

Abstract: Projection objectives, such as projection objectives of lithography projection exposure apparatuses, as well as related systems, components and methods, such as methods of revising and/or repairing such objectives, are disclosed.

Abstract: In an image forming apparatus, a photoconductor cartridge including a photoconductor is removably installed in a housing, a transfer unit configured to transfer a developer image onto a sheet in a transfer position is disposed in contact with the photoconductor, a developer cartridge is removably installed in the housing, and a fixing unit is configured to fix a developer image on the sheet in a fixing position. The housing has a first opening provided behind the transfer unit opposite to the photoconductor, and a second opening provided separate from the first opening. The photoconductor cartridge can be removed from and installed into the housing through the to first opening. The developer cartridge can be removed from and installed into the housing through the second opening. The photoconductor cartridge includes a chute that extends between the transfer position and the fixing unit to guide the sheet toward the fixing unit.

Abstract: A focus monitor structure on a reticle includes a lithographic feature region, a horizontal grating region including a horizontal grating located on one side of the lithographic feature region, and a vertical grating region including a vertical grating located on the opposite side of the lithographic feature region. A polarized illumination beam causes a printed image of the lithographic feature region to shift either toward the direction of the horizontal grating region or toward the direction of the vertical grating region in a manner that depends on the sign of the focus offset of the photoresist layer relative to the lens of an exposure tool. The magnitude and sign of the focus offset can be monitored to provide a real-time feedback on the focus offset of the exposure tool by measuring the shift of the printed image of the lithographic feature region.

Abstract: A lithography illumination system, along the transmission direction of the laser light, successively having a laser light source, a collimating and expanding unit, a pupil shaping unit, a first micro-lens array, a micro-integrator rod array, a micro-scanning slit array, a second micro-lens array, a condenser lens group, a mask, and and a motion control unit for controlling the motion of the micro scanning slit array.

Abstract: According to one embodiment, a spatial light modulator unit is used in the illumination optical system for illuminating an illumination target surface with light from a light source and comprises: a spatial light modulator with a plurality of optical elements arrayed in a predetermined plane and controlled individually; a spatial light modulation element which applies spatial light modulation to the incident light from the light source and which makes rays of intensity levels according to positions of the respective optical elements, incident on the plurality of optical elements; and a control unit which individually controls the plurality of optical elements on the basis of information about the intensity levels of the rays incident on the respective optical elements.

Abstract: There is provided a multilayer mirror (80) comprising a layer of a first material (84) and a layer of silicon (82). The layer of the first material and the layer of silicon form a stack of layers. An exposed region of the layer of silicon comprises a modification that is arranged to improve the robustness of the exposed region of silicon.

Abstract: An optical system of a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes a polarization-influencing optical arrangement including a first lambda/2 plate and at least one additional lambda/2 plate.

Abstract: A method and apparatus are provided for determining apodization properties of a projection system in a lithographic apparatus. The method comprises allowing light from a given point in an illumination field to pass through the projection system along at least three different optical paths, and then determining the difference in the intensity of light received in a projection field from the two different optical paths, and calculating apodization properties of the projection system from the intensity difference. It is not necessary to know the intensity distribution in the illumination field. To provide the different optical paths a pinhole reticle provided with wedges of different orientations is used.

Abstract: A system and method for illuminating a surface, comprising: providing a reflective layer around said surface; directing an electromagnetic beam to be incident on said layer; aligning said layer, said beam, and said surface so that said beam undergoes a plurality of reflections on said layer for illuminating a predetermined region of said surface, whereby the size of said region is larger than the size of said beam, and the intensity of illumination on said region is higher than the value obtained by multiplying the intensity of said beam and the ratio of the size of said beam to the size of said region.

Abstract: An opto-electronic apparatus with a metallic structure is provided, and includes a light-permissible medium and a metallic structure. The metallic structure is disposed inside or over the light-permissible medium, and is formed from arrangement of at least one metallic unit. Each metallic unit includes at least three metallic blocks of which centers of mass define a polygon. After passing through the metallic structure, an electromagnetic wave has a distribution curve of transmittance versus wavelength, wherein the distribution curve has at least one transmittance peak value corresponding to at least one wavelength in a one-to-one manner. The area of the polygon is smaller than or equal to ?2, the minimum side length (dmin) is smaller than or equal to ?, and an averaged width (W) satisfies the following relationship: 0.01?<W<dmin, in which ? represents one of the aforementioned at least one wavelength.

Abstract: An optical module of an atomic oscillator includes: a surface emitting laser adapted to emit light; a depolarization element irradiated with the light emitted from the surface emitting laser, and adapted to dissolve a polarization state of the light irradiated; a polarization element irradiated with light having been transmitted through the depolarization element; a ?/4 plate irradiated with light having been transmitted through the polarization element, and having a fast axis disposed so as to rotate by 45 degrees with respect to a polarization transmission axis of the polarization element; a gas cell encapsulating an alkali metal gas, and irradiated with light having been transmitted through the ?/4 plate; and a light detection section adapted to detect intensity of light having been transmitted through the gas cell.

Abstract: A spectral purity filter is configured to allow transmission therethrough of extreme ultraviolet (EUV) radiation and to refract or reflect non-EUV secondary radiation. The spectral purity filter may be part of a source module and/or a lithographic apparatus.

Abstract: Disclosed are herein an apparatus and method for extreme ultraviolet (EUV) spectroscope calibration. The apparatus for EUV spectroscope calibration includes an EUV generating module, an Al filter, a diffraction grating, a CCD camera, a spectrum conversion module, and a control module that compares a wavelength value corresponding to a maximum peak among peaks of the spectrum depending on the order of the EUV light converted from the spectrum conversion module with a predetermined reference wavelength value depending on an order of high-order harmonics to calculate a difference value with the closest reference wavelength value, and controls the spectrum depending on the order of the EUV light converted from the spectrum conversion module to be moved in a direction of wavelength axis by the calculated difference value. Thus, it is possible to accurately measure a wavelength of a spectrum of EUV light used in EUV exposure technology and mask inspection technology.

Abstract: A lithographic apparatus includes an illumination system for providing a beam of extreme ultra-violet radiation, a masking device for controlling the illumination of a patterning device by the beam of radiation, a support for supporting the patterning device, the patterning device configured to impart a pattern to the beam of radiation, a substrate table for holding a substrate, and a projection system for projecting the patterned beam of radiation onto a target portion of the substrate. The masking device includes a masking blade including a masking edge configured to delimit a boundary of an illumination region on the patterning device. The masking blade is configured to reflect extreme ultra-violet radiation incident on the masking blade such that at least a portion of the reflected radiation is not captured by the projection system.

Abstract: An optical system of a microlithographic projection exposure apparatus comprises at least one mirror arrangement, having a plurality of mirror elements which are adjustable independently of one another for varying an angular distribution of the light reflected by the mirror arrangement, a polarization-influencing optical arrangement, by which, for a light beam passing through during the operation of the projection exposure apparatus, different polarization states can be set via the light beam cross section, and a retarder arrangement, which is arranged upstream of the polarization-influencing optical arrangement in the light propagation direction and at least partly compensates for a disturbance of the polarization distribution that is present elsewhere in the projection exposure apparatus, wherein the polarization-influencing optical arrangement has optical components which are adjustable in their relative position with respect to one another, wherein different output polarization distributions can be produc

Abstract: An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, and a polarization member made of optical material with optical rotatory power, which is arranged in the optical path on an incidence side of the optical integrator, and which changes a polarization state of the illumination light. The illumination light from the polarization member is irradiated onto the pattern through a pupil plane of the illumination optical apparatus.

Abstract: An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, and a polarization member made of optical material with optical rotatory power, which is arranged in the optical path on an incidence side of the optical integrator, and which changes a polarization state of the illumination light. The illumination light from the polarization member is irradiated onto the pattern through a pupil plane of the illumination optical apparatus.

Abstract: An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, and a polarization member made of optical material with optical rotatory power, which is arranged in the optical path on an incidence side of the optical integrator, and which changes a polarization state of the illumination light. The illumination light from the polarization member is irradiated onto the pattern through a pupil plane of the illumination optical apparatus.

Abstract: The disclosure relates to an illumination system of a microlithographic projection exposure apparatus. The illumination system can include a depolarizer which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarization of polarized light impinging on the depolarizer. The illumination system can also include a microlens array which is arranged upstream of the light mixing system in the light propagation direction. The microlens array can include a plurality of microlenses arranged with a periodicity. The depolarizer can be configured so that a contribution afforded by interaction of the depolarizer with the periodicity of the microlens array to a residual polarization distribution occurring in a pupil plane arranged downstream of the microlens array in the light propagation direction has a maximum degree of polarization of not more than 5%.

Abstract: Light-field image data is processed in a manner that reduces projection artifacts in the presence of variation in microlens position by calibrating microlens positions. Approximate centers of disks in a light-field image are identified, and gridded calibration is performed, by fitting lines to disk centers along orthogonal directions, and then fitting a rigid grid to the light-field image. For each grid region, a corresponding disk center is computed, and a displacement vector is generated. For each grid region, the final disk center is computed as the vector sum of the grid region's geometric center and displacement vector. Calibration data, including displacement vectors, is then used in calibrating disk centers for more accurate projection of light-field images. In at least one embodiment, the imaging geometry is arranged so that disks are separated by a gap, so as to limit or eliminate ghosting.

Abstract: A lithographic apparatus includes an illumination system, support constructed to support patterning device, a projection system, an interferometric sensor and a detector. The interferometric sensor is designed to measure one or more wavefronts of a radiation beam projected by the projection system from an adjustable polarizer. The interferometric sensor includes a diffractive element disposed at a level of a substrate in the lithographic apparatus and a detector spaced apart from the diffractive element, the diffractive element being arranged to provide shearing interferometry between at least two wavefronts mutually displaced in a direction of shear. The detector is designed to determine, from the wavefront measurements, information on polarization affecting properties of the projection system.

Abstract: An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, and a polarization member made of optical material with optical rotatory power, which is arranged in the optical path on an incidence side of the optical integrator, and which changes a polarization state of the illumination light. The illumination light from the polarization member is irradiated onto the pattern through a pupil plane of the illumination optical apparatus.

Abstract: A structure including a circuit board including a plane and a pin-in-hole component; and a heat transfer device, where the heat transfer device is thermally connected to the plane at a leading edge of the circuit board, the heat transfer device transfers heat from a wave of molten solder to the plane.

Abstract: A lithographic apparatus comprises a beam modifying apparatus mounted in the path of a beam of radiation. The beam modifying apparatus comprises a conduit configured to allow the flow of a fluid through it, the conduit being arranged such that, in use, the beam of radiation passes through the conduit and the fluid flowing through it. The beam modifying apparatus further comprises a heat exchanger in thermal communication with a portion of the conduit located upstream, having regard to the direction of the fluid flow, of the location at which the beam of radiation passes through the conduit.

Abstract: An exposure method and apparatus that illuminates a pattern with an illumination system to expose a substrate through a projection system are provided. The pattern is illuminated with illumination light having a light amount distribution, which is set such that an amount of light is larger in an on-axis area substantially including an optical axis and in a plurality of off-axis areas arranged out of the optical axis than in an area other than the on-axis area and the plurality of off-axis areas on a pupil plane of the illumination system. The polarization states of the illumination light are different between the on-axis area and the off-axis areas.

Abstract: A method for adjusting an optical system in a microlithographic projection exposure apparatus includes establishing, for a given actual position of a polarization-influencing component, a distribution of IPS values in a pupil plane of the projection exposure apparatus. Each IPS value denotes the degree of realization of a predetermined polarization state for a light ray reflected at a respective mirror element of the mirror arrangement. The method also includes changing the position of the polarization-influencing component on the basis of the established distribution.

Abstract: This microlens array comprises hexagonal field diaphragms in inverted-image-forming positions, i.e., microlenses, a plurality of which are arranged in the direction perpendicular to a direction of scanning, and from which rows of microlenses are configured. Further, for three rows of microlenses, microlens rows are arranged with offset by (a length S) in a direction perpendicular to the direction of scanning such that triangular portions of the hexagonal field diaphragms overlap in the direction of scanning. Furthermore, microlens row groups, which are configured from three microlens rows, are arranged with offset in the direction perpendicular to the direction of scanning in increments of a minute amount of shifting F (for example, 2 ?m). Thereby, this scanning exposure device using a microlens array is capable of preventing exposure ununiformity even in the direction perpendicular to the direction of scanning.

Abstract: According to one embodiment, a transmission optical system which guides light in a nearly parallel beam state emitted from an optical outlet port of a light source, to an optical inlet port of an exposure apparatus body and which injects the light in the nearly parallel beam state into the optical inlet port is provided with a condensing optical system which keeps the optical outlet port and the optical inlet port in an optical Fourier transform relation, and an angle distribution providing element which is arranged in an optical path between the optical outlet port and the condensing optical system and which provides an emergent beam with an angle distribution in a range larger than a range of an angle distribution of an incident beam.

Abstract: An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at least part of the beam. The illumination system further includes an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member, and a controller configured to control movement of the first and second polarization modifiers such that the first and second polarization modifiers intersect with different portions of the radiation beam.

Abstract: An illumination system of a microlithographic projection exposure apparatus can include at least one transmission filter which has a different transmittance at least at two positions and which is arranged between a pupil plane and a field plane. The transmittance distribution can be determined such that it has field dependent correcting effects on the ellipticity. In some embodiments the telecentricity and/or the irradiance uniformity is not affected by this correction.

Abstract: The disclosure provides a projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask. The mask has a first pattern area with a first subpattern, and at least one second pattern area, arranged laterally offset from the first pattern area, with a second subpattern. The first subpattern is irradiated during a first illumination time interval with a first angular distribution, adapted to the first subpattern, of the illumination radiation. Thereafter, the second subpattern is irradiated during the second illumination time interval with a second angular distribution, adapted to the second subpattern, of the illumination radiation, said second angular distribution differing from the first angular distribution.

Abstract: A lithographic apparatus including a uniformity correction system is disclosed. The lithographic apparatus comprises an illumination system configured to condition a beam of radiation. The illumination system comprises a uniformity correction system located at a plane configured to receive a substantially constant pupil when illuminated with the beam of radiation. The uniformity correction system includes fingers configured to be movable into and out of intersection with a radiation beam so as to correct an intensity of respective portions of the radiation beam. A linear motor actuator arrangement drives the fingers to their respective appropriate positions to compensate for non-uniform illumination. Control is provided by a control system that precisely manipulates carriers of the fingers.

Abstract: An optical membrane element for an optical device in lithography, especially EUV (extreme ultraviolet) lithography, includes at least one membrane layer and a frame, which at least partially surrounds the membrane layer and at which at least part of the rim of the membrane layer is mounted. At least one tautening element is provided, which facilitates tautening of the membrane layer and wherein the optical membrane element can be used in a projection exposure system, especially for EUV lithography, such that the membrane layer of the membrane element can be adjustably tautened, such that the membrane layer is flat. A method for manufacturing a corresponding optical membrane element includes generating a tautening element lithographically together with the membrane layer.

Abstract: A beam pointing and positioning system includes a first lens, movable in a first plane perpendicular to a nominal optical axis, which receives and positions a light beam. The system also includes a second lens, movable in a second plane perpendicular to the nominal optical axis, which receives and points the positioned light beam. The system is thereby capable of directing the light beam to a desired location at a desired angle. The system may also include a beam splitter that receives, transmits, and reflects the pointed light beam, one or more sensors that receive the reflected light beam, and a controller coupled to the sensor(s) and first and second lenses. The controller may control the positioning of the first and second lenses based on beam position and pointing data and/or signals received from the sensor(s). A method of positioning and pointing a light beam is also presented.

Abstract: An imaging apparatus includes: an image sensor having a plurality of light receiving elements arranged therein; a light shielding member disposed between an imaging optical system and the image sensor, the light shielding member configured to make only a light flux, which has passed through a predetermined area of the imaging optical system, incident on a first light receiving element which is a part of the plurality of light receiving elements; and an image generation device configured to generate an image of a subject from an imaging signal of the first light receiving element, in which the light shielding member is a plate-shaped member having a first light shielding material configured to shield a light flux, which has passed through an area other than the predetermined area, formed therein.

Abstract: An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings.

Abstract: According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 ?m.

Abstract: A system of an extreme ultraviolet lithography (EUVL) is disclosed. The system includes a mask having reflective phase-shift-grating-blocks (PhSGBs). The system also includes an illumination to expose the mask to produce a resultant reflected light from the mask. The resultant reflected light contains mainly diffracted lights. The system also has projection optics to collect and direct resultant reflected light to expose a target.

Abstract: A method of structuring a photosensitive material is disclosed. The method includes illuminating a first object structure and projecting a pattern of the first object structure onto a photosensitive material such that the projected pattern of the first object structure is focussed at a first focus position with respect to the photosensitive material. The method also includes illuminating a second object structure and projecting a pattern of the second object structure onto the photosensitive material such that the projected pattern of the second object structure is focussed at a second focus position with respect to the photosensitive material. The respective patterns are projected in the same projection direction.

Abstract: In a laser interference lithography apparatus, a laser source provides a first laser beam, and an optics assembly is optically coupled to the laser source and receives and processes the first laser beam into one or multiple second laser beams. An exposure stage carries a to-be-exposed object. The fiber assembly receives and processes the second laser beam(s) into one or multiple single mode and stable coherent third laser beams without spatial noise. An interference pattern is generated on the to-be-exposed object using the third laser beam(s). The apparatus is configured without a pin hole spatial filter and a beam expander being disposed on an optical path from an output end of the laser source to the exposure stage.

Abstract: The present disclosure provides a method for extreme ultraviolet lithography (EUVL) process. The method includes loading a binary phase mask (BPM) to a lithography system, wherein the BPM includes two phase states and defines an integrated circuit (IC) pattern thereon; setting an illuminator of the lithography system in an illumination mode according to the IC pattern; configuring a pupil filter in the lithography system according to the illumination mode; and performing a lithography exposure process to a target with the BPM and the pupil filter by the lithography system in the illumination mode.

Abstract: An exemplary embodiment of the present invention provides an interference projection exposure system comprising a beam-providing subsystem and an objective lens subsystem that can provide a plurality of light beams which intersect and interfere at an image plane to produce a high spatial frequency periodic optical-intensity distribution. The interference projection system can further comprise a pattern mask that can alter the periodic optical-intensity distribution so as to incorporate functional elements within the periodic optical-intensity distribution. The beam providing subsystem can comprise a beam generating subsystem, a beam conditioning subsystem and a beam directing subsystem. Another exemplary embodiment of the present invention provides for a method of producing a high spatial frequency periodic optical-intensity distribution using a interference projection exposure system.

Abstract: An illumination optical apparatus has an optical unit. The optical unit has a light splitter to split an incident beam into two beams; a first spatial light modulator which can be arranged in an optical path of a first beam; a second spatial light modulator which can be arranged in an optical path of a second beam; and a light combiner which combines a beam having passed via the first spatial light modulator, with a beam having passed via the second spatial light modulator; each of the first spatial light modulator and the second spatial light modulator has a plurality of optical elements arranged two-dimensionally and controlled individually.

Abstract: The present invention relates to an apparatus which allows producing elements with individually patterned anisotropic properties, where the pattern may vary from element to element. An apparatus according to the invention comprises a support for a substrate and an exposure unit for providing spatially modulated aligning light with a first polarization plane, wherein the exposure unit contains a light source, a spatial light modulator, which can be controlled electronically, for example by a computer, and a projection lens. The present invention furthermore relates to a method for fast production of elements with individually patterned anisotropic properties using such an apparatus.