Lamp Beam Direction Or Pattern Patents (Class 356/121)
  • Patent number: 7274442
    Abstract: A system capable of determining wavefront characteristics, such as air induced wavefront aberrations, includes a field programmable gate array (FPGA) device executing a phase diversity algorithm. The FPGA device can be a stand-alone device or comprise multiple FPGAs. The device receives an “in-focus” and an “out-of-focus” image having a known optical difference from that of the “in-focus” image. The device then performs as many phase diversity algorithm iterations as desired to reach an expression for the wavefront aberrations induced on the collected image data. The resulting wavefront data may be used to produce an enhanced image of the original image data. Example applications include remote sensors and targeting systems, and both passive imaging and active projection systems that compensate for wavefront anomalies.
    Type: Grant
    Filed: May 16, 2005
    Date of Patent: September 25, 2007
    Assignee: The Boeing Company
    Inventors: Jean J. Dolne, Harold B. Schall, Paul J. Menicucci
  • Patent number: 7256879
    Abstract: An array tester (10) characterizes individual ones (111) of a semiconductor devices of an array (11) based on polarization-resolving an optical far-field measurement of the individual chips (111) as a function of angular position. Two pairs of TM and TE detectors (41a-b and 42a-b) or one pair displaceable by ninety degrees, move in vertical and horizontal arc paths or fixed around a fixed position of a selected device of an array to sample the far-fields.
    Type: Grant
    Filed: December 11, 2003
    Date of Patent: August 14, 2007
    Assignee: Corning Incorporated
    Inventors: Benjamin L. Hall, Martin Hu, Mike J. White, Chung-En Zah
  • Patent number: 7256880
    Abstract: A hemispherical goniophotometer is disclosed, in which two pivoting arms are articulated on a revolving rotating arm and are each fitted with a measurement head. The geometry of the arrangement is chosen such that the measurement heads can move along the envelope surface of a hemisphere during rotating of the rotating arm through 360° and pivoting of the pivoting arms through 180°.
    Type: Grant
    Filed: July 20, 2005
    Date of Patent: August 14, 2007
    Assignee: Patent-Treuhand-Gesellschaft fur Elektrische Gluehlampen mbH
    Inventors: Ulrich Binder, Georg Sauter, Walter Steudtner, Gerhard Trebbin, Norbert Wagner
  • Patent number: 7239379
    Abstract: An assembly is provided for the direct measurement of a vertical intensity profile through a plane of focus of a confocal microscope, a determination of a depth of the confocal plane and a maximum intensity of the intensity profile. The assembly includes a transparent substrate in which is embedded a scale having a graduated length, wherein the scale is inclined relative to a local portion of an illuminating beam on an illuminating path of the confocal microscope. The graduated scale is configured to be illuminated with an intensity corresponding to the position within the plane of focus along the axis of the illuminating beam. The inclination of the scale and the path of the illuminating beam are at a predetermined angle. The graduated scale can be fluorescently dyed to illuminate with an absorption frequency relevant to a light source or illuminating beam of the confocal microscope. An algorithm employing trigonometric functions and calculating the confocal plane depth of the specimen is disclosed.
    Type: Grant
    Filed: September 12, 2005
    Date of Patent: July 3, 2007
    Assignee: Technology Innovations, LLC
    Inventor: Joel C. Wojciechowski
  • Patent number: 7193693
    Abstract: A mechanism for always measuring the spatial intensity distribution of a laser beam and displacement of the optical axis of the laser beam is provided so that a measured signal is processed when the laser beam incident on a laser beam shaping optical element is out of a predetermined condition. The shape, diameter and incidence position of the laser beam incident on the laser beam shaping optical element are always kept in the predetermined condition by a spatial filter disposed at the position of a focal point of lenses forming a beam expander disposed in the optical axis, on the basis of a result of the signal processing. In this manner, silicon thin films uniform in crystallinity can be formed stably with a high yield on an insulating substrate which forms display panels of flat panel display devices.
    Type: Grant
    Filed: November 19, 2004
    Date of Patent: March 20, 2007
    Assignee: Hitachi Displays, Ltd.
    Inventors: Akio Yazaki, Mikio Hongo, Mutsuko Hatano, Takeshi Noda
  • Patent number: 7173707
    Abstract: A system for the automated determination of retroreflectivity values for reflective surfaces disposed along a roadway repeatedly illuminates an area along the roadway that includes at least one reflective surface using a strobing light source. Multiple light intensity values are measured over a field of view which includes at least a portion of the area illuminated by the light source. A computer processing system is used to identifying a portion of the light intensity values associated with a reflective surface and analyze the portion of the light intensity values to determine at least one retroreflectivity value for that reflective surface.
    Type: Grant
    Filed: May 3, 2006
    Date of Patent: February 6, 2007
    Assignee: Facet Technology Corporation
    Inventors: James E. Retterath, Robert A. Laumeyer
  • Patent number: 7161128
    Abstract: An improved wavefront sensor for characterizing phase distortions in incident light including optical elements that spatially sample the incident light and form a dispersed spot with a fringe pattern corresponding to samples of the incident light. An imaging device captures an image of the dispersed spot with said fringe pattern formed by said optical elements. And an image processor that analyzes the spectral components of the fringe pattern of a given dispersed spot to derive a measure of the local phase distortion without ambiguity in the corresponding sample of incident light. The optical elements may comprise refractive elements, diffractive elements or a combination thereof (such as a grism). The wavefront sensor may be part of an adaptive optic system (such as a large-aperture space telescope) to enable the measurement and correction of large phase steps across adjacent mirror segments of a deformable mirror.
    Type: Grant
    Filed: August 25, 2003
    Date of Patent: January 9, 2007
    Assignee: Adaptive Optics Associates, Inc.
    Inventor: Allan Wirth
  • Patent number: 7130033
    Abstract: The invention relates to a device for measuring the light intensity of an object or object portion. The device comprises a dioptric central portion and a catadioptric peripheral portion that are independent from each other and that are suitable for delivering, from the light diffused by the object, two non-intersecting beams of the same kind, and a two-dimensional video sensor associated with an imaging device in order to obtain an image of the beams.
    Type: Grant
    Filed: October 4, 2005
    Date of Patent: October 31, 2006
    Assignee: Optis
    Inventor: Jacques Delacour
  • Patent number: 7113707
    Abstract: This invention provides a dynamic interconnection system which allows to couple a pair of optical beams carrying modulation information. In accordance with this invention, two optical beams emanate from transceivers at two different locations. Each beam may not see the other beam point of origin (non-line-of-sight link), but both beams can see a third platform that contains the system of the present invention. Each beam incident on the interconnection system is directed into the reverse direction of the other, so that each transceiver will detect the beam which emanated from the other transceiver. The system dynamically compensates for propagation distortions preferably using closed-loop optical devices, while preserving the information encoded on each beam.
    Type: Grant
    Filed: May 3, 2001
    Date of Patent: September 26, 2006
    Assignee: HRL Laboratories, LLC
    Inventor: David M. Pepper
  • Patent number: 7113268
    Abstract: An optical field sensing system and an associated method are provided that are tolerant of scintillation. The system includes a wavefront sensor that measures gradients across a wavefront at a first resolution defined by the subapertures of the wavefront sensor. The system also includes an intensity sensor that measures the intensity across the wavefront at a higher resolution. The system further includes a wavefront processor that determines respective phases across the wavefront. In addition to the gradients and the intensity measurements, the wavefront processor may determine the respective phases based also upon the noise affiliated with the measurements. In this regard, the wavefront processor may determine the respective phases across the wavefront at least partially based upon the gradients as adjusted by weights that are based upon the intensity measured by the intensity sensor and are influenced by evidence of scintillation.
    Type: Grant
    Filed: January 12, 2004
    Date of Patent: September 26, 2006
    Assignee: The Boeing Company
    Inventors: David Roderick Gerwe, Harold Barry Schall, James Preston Stone
  • Patent number: 7092079
    Abstract: An agile optical beam profiler using a two-dimensional small tilt digital micromirror device/chip, a translation stage, and single photodetector or pair of photodetectors. A method of profiling an optical beam includes positioning a programmable spatial light modulator in an incident optical beam and sequentially moving the spatial light modulator to at least one position in a first planar direction in a displacement increment less than a pixel width of the spatial light modulator. The method also includes directing respective portions of the optical beam to a photodetector at each position of the spatial light modulator. The method may also include calibrating the photodetectors by directing a portion of the beam to the photodetector, then directing the entire beam, or a remaining portion of the beam, to the photodetector, and normalizing the detected power of the portion with the detected power of the entire beam, or remaining portion, respectively.
    Type: Grant
    Filed: September 8, 2003
    Date of Patent: August 15, 2006
    Assignee: Nuonics, Inc.
    Inventors: Nabeel Agha Riza, Muhammad Junaid Mughal
  • Patent number: 7092080
    Abstract: A light intensity distribution measuring method for measuring the light intensity distribution of a laser beam emitted by a semiconductor laser comprises the steps of measuring light intensities at a plurality of locations in a laser beam emitted by a semiconductor laser and applying their measurement results to a t distribution function to calculate the light intensity distribution. A light intensity distribution measuring device is also described.
    Type: Grant
    Filed: November 19, 2003
    Date of Patent: August 15, 2006
    Assignee: NIDEC Sankyo Corporation
    Inventor: Hiroshi Sakai
  • Patent number: 7075633
    Abstract: An object pattern is imaged by an imaging system onto the image plane of the imaging system at a location where a reference pattern suited to the object pattern is situated in order to measure the imaging fidelity of an optical imaging system, for example, an eyeglass lens, a photographic lens, or a projection lens, for use in the visible spectral range. The resultant, two-dimensional, superposition pattern is detected in a spatially resolved manner in order to determine imaging parameters therefrom. The object pattern is generated with the aid of at least one electronically controllable pattern generator that serves as a self-luminous, electronically configurable, incoherent light source and may, for example, have a color monitor. The measuring system allows rapidly, flexibly, checking optical imaging systems with minimal time and effort spent on the mechanical setup required.
    Type: Grant
    Filed: October 25, 2002
    Date of Patent: July 11, 2006
    Assignee: Carl Zeiss SMT AG
    Inventor: Ulrich Wegmann
  • Patent number: 7039553
    Abstract: A method and apparatus for quantitative determination of the phase of a radiation wave field is disclosed. A representative measure of the rate of change of intensity of the radiation wave field over a selected surface extending generally across the wave field is transformed to produce a first integral transform representation. A first filter is applied to the first integral transform representation corresponding to the inversion of a first differential operator reflected in the measure of rate of change of intensity to produce a first modified integral transform representation. An inverse of the first integral transform is applied to the first modified integral transform representation to produce an untransformed representation. The untransformed representation is corrected based on a measure of intensity over said selected surface and again transformed to produce a second integral transform representation.
    Type: Grant
    Filed: November 2, 2004
    Date of Patent: May 2, 2006
    Assignee: The University of Melbourne
    Inventors: Keith Nugent, David Paganin, Anton Barty
  • Patent number: 7027155
    Abstract: A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.
    Type: Grant
    Filed: March 27, 2002
    Date of Patent: April 11, 2006
    Assignee: GSI Lumonics Corporation
    Inventors: James J. Cordingley, Joseph J. Griffiths, Donald V. Smart
  • Patent number: 7023551
    Abstract: A method, system and computer program product for assembling an optical module incorporates a far field pattern (FFP) optical measurement system and optionally a near field pattern (NFP) optical measurement system to obtain information about the axis and/or the divergent angle of light output from the optical elements to be assembled as part of the optical module. The optical elements include a light-emitting element, such as a laser diode, and at least one optical component, such as a collimating lens or a focusing lens. The system for assembling the optical module further includes a stage having the light-emitting element mounted thereon, a holding mechanism configured to hold and position the optical components to desired positions based on the measurements from the FFP and/or NFP optical measurement systems. A controller can control the stage, the holding mechanism and a fixing device configured to fix the positions of the optical elements once the optical elements are positioned in the desired positions.
    Type: Grant
    Filed: May 1, 2001
    Date of Patent: April 4, 2006
    Assignee: The Furukawa Electric Co., Ltd.
    Inventors: Shinichiro Iizuka, Toshio Kimura
  • Patent number: 6985218
    Abstract: A method of determining at least one parameter that is characteristic of the angular distribution of light illuminating an object in a projection exposure apparatus is described. This parameter may be, for example, a pupil asymmetry. The method comprises the step of inserting a filter element in or in close proximity of a pupil plane of an illumination system that is arranged between a light source and the object. The filter element has a filter function that varies in an azimuthal direction with respect to the optical axis of the illumination system. Then the intensity of the light in a plane downstream of the pupil plane is measured. After rotating the filter element around the optical axis by an angle ?, the measurement of the intensity is repeated. From the filter function, the angle ? and the measured intensities the parameter is measured.
    Type: Grant
    Filed: May 27, 2004
    Date of Patent: January 10, 2006
    Assignee: Carl Zeiss SMT AG
    Inventor: Nils Dieckmann
  • Patent number: 6985217
    Abstract: An area CCD scanner (image reader) comprises an LED unit (light source), an area CCD and an image-forming lens. The LED unit includes a large number of light emitting elements of each color of blue, green, red and infrared. Light emitted from the LED unit and having passed through a photographic film is received by the area CCD and is converted into an electric signal, which is outputted as photographic image data. When the light source is inspected, a focal point of the image-forming lens is adjusted to a light emitting surface of the LED unit. Then, the LED unit is turned on without setting the photographic film to receive the light thereof with the area CCD. On the basis of the obtained electric signal, a light-emission state of the LED unit is shown on a display.
    Type: Grant
    Filed: February 11, 2002
    Date of Patent: January 10, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Tatsuya Konagaya
  • Patent number: 6982786
    Abstract: In an optical characteristic measuring method for measuring an optical characteristic of a projection optical system (10a), a reticle (9) having a plurality of patterns (TP) is supplied, and scattered light from an aperture is directed to the plurality of patterns (TP), whereby light beams are projected onto the plurality of patterns in mutually different directions, by which images of the plurality of patterns are formed through the projection optical system (10a). Positions of images of the plurality of patterns, respectively, are detected and, by use of the result of detection, the optical characteristic of the projection optical system is detected. This accomplishes an optical characteristic measuring method and a reticle to be used therefor, which are suitable for measuring an optical characteristic of an optical system such as wavefront aberration, for example, at high precision.
    Type: Grant
    Filed: December 3, 2002
    Date of Patent: January 3, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventor: Yoshihiro Shiode
  • Patent number: 6982785
    Abstract: This invention provides a radiation directing device, including a screen having a mirrored surface interrupted by one or more pin holes that pass through the screen, the pin holes having an elliptical shape. The invention further provides an apparatus, including (a) a screen having a mirrored surface interrupted by one or more pin holes passing through the screen; and (b) a detector for detecting radiation reflected by the mirrored surface, wherein the detector determines a position of a radiation beam relative to the pin hole.
    Type: Grant
    Filed: May 1, 2001
    Date of Patent: January 3, 2006
    Inventor: Gerrrit J. Van den Engh
  • Patent number: 6980290
    Abstract: An optical sampling waveform measuring apparatus can measure waveform of a high-speed signal light P8 sensitively, accurately, and in high time resolution, Raman shift light which is generated from a light pulse having a narrower pulse width than the signal light to be measured is used as a sampling light pulse.
    Type: Grant
    Filed: August 27, 2002
    Date of Patent: December 27, 2005
    Assignee: Yokogawa Electric Corporation
    Inventors: Hiroshi Ohta, Makoto Yoshida
  • Patent number: 6975387
    Abstract: Before measuring a wavefront aberration of a projection optical system, an image formation position of an image of a pattern of a test reticle which is formed on a predetermined surface is detected by an AF sensor. Based on a result of this detection, the position of an incident surface of a wavefront aberration measurement unit is adjusted, and a position of an image of the pattern with respect to the incident surface is adjusted. After this adjustment, the image of the pattern formed through the projection optical system is detected by the wavefront aberration measurement unit, and a wavefront aberration detection section is used to obtain wavefront aberration information of the projection optical system based on a result of this detection.
    Type: Grant
    Filed: January 29, 2003
    Date of Patent: December 13, 2005
    Assignee: Nikon Corporation
    Inventor: Yasushi Mizuno
  • Patent number: 6972836
    Abstract: There is disclosed a measuring method of illuminance unevenness of an exposure apparatus in which the illuminance unevenness resulting from a projection optical system, to project the light passed through the photomask onto the finite area on the photosensitive substrate via the projection optical system and to expose the photomask to the light, the method comprising calculating an average value of transmittance of the projection optical system of each path of the light emitted from one point of the photomask and reaching an imaging point for each of a plurality of imaging points in the finite area on the photosensitive substrate, and calculating the illuminance unevenness in the finite area on the photosensitive substrate from the average value of the transmittance obtained for each imaging point.
    Type: Grant
    Filed: April 25, 2002
    Date of Patent: December 6, 2005
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kazuya Sato, Soichi Inoue, Satoshi Tanaka
  • Patent number: 6947130
    Abstract: In evaluating whiteness of light from a light source or a luminaire, whiteness W is given by the following equation, W=?5.3C+100, wherein chroma C is determined by the CIE 1997 Interim Color Appearance Model (Simple Version).
    Type: Grant
    Filed: June 13, 2001
    Date of Patent: September 20, 2005
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kenji Mukai, Toshio Mori, Yoshio Manabe, Yoshinori Ootaka, Masaaki Hama
  • Patent number: 6937340
    Abstract: A piezoelectric sensor (7) is dedicated to making a precise measurement of the light amplitude of pulses (2) from a laser (1), so that quantitative measurements such as photo-acoustic spectroscopy can be used to precisely measure the concentration of some bodies in a solution.
    Type: Grant
    Filed: October 22, 2001
    Date of Patent: August 30, 2005
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Danièle Roudil, Laurent Couston, Jacques Delage, Mathieu Brutel
  • Patent number: 6922232
    Abstract: A test system for positioning and measuring the far-field pattern of a laser diode under test (LDUT) using a single objective lens and two relay lenses. Positioning is achieved by passing light from the LDUT through a video microscope formed by the objective lens and a first relay lens, which focuses the light onto an image plane for capture by a first camera. Far-field pattern measurement is performed by reflecting a portion of the focused light through a second relay lens, which collimates the light and directs the unfocused light onto an infinity image plane, where it is captured by a second video camera. Angular orientation is achieved using a laser collimator that reflects beam energy from a datum plane of the LDUT. The reflected beam energy forms a point image at the infinity image plane that is used to determine and/or adjust the angular orientation of the LDUT.
    Type: Grant
    Filed: September 24, 2002
    Date of Patent: July 26, 2005
    Assignee: Infineon Technologies North America Corp.
    Inventor: Stephen W. Farnsworth
  • Patent number: 6922233
    Abstract: An optical beam profiler using a spatial light modulator and photodetector. In an embodiment, the spatial light modulator is a two-dimensional (2-D) small tilt digital micromirror device. The profiler features fast speed, digital controls, low polarization sensitivity, and high measurement repeatability. The 2-D multi-pixel device-based profiler allows the use of several beam profile measurement concepts including moving knife edge, scanning slit, moving pinhole, variable aperture, and 2-D photodiode array. The proposed digital optical beam profiler can be implemented with any type of digitally operated 2-D spatial light modulator device such as using liquid crystals, magneto-optics, multiple quantum wells, electro-optic polymers, and photonic crystals.
    Type: Grant
    Filed: February 7, 2003
    Date of Patent: July 26, 2005
    Assignee: Nuonics, Inc.
    Inventor: Nabeel Agha Riza
  • Patent number: 6917426
    Abstract: The system includes a first polarizing element; an electro-optically driven birefringent element; a second polarizing element; an optical assembly; and, an optical-to-electronic imaging sensor assembly. The first polarizing element receives an incoming optical wavefront and provides a linearly polarized output therefrom. The electro-optically driven birefringent element receives the linearly polarized output and produces two polarization eigenwaves, an output of the birefringent element being elliptically polarized. The second polarizing element has a polarization axis perpendicular to a polarization axis of the first polarizing element. The second polarizing element receives the output from the birefringent element and provides a linearly polarized output. The optical assembly receives the output of the second polarizing element and forms a real image therefrom.
    Type: Grant
    Filed: January 29, 2002
    Date of Patent: July 12, 2005
    Assignee: The Boeing Company
    Inventor: Jeffrey H. Hunt
  • Patent number: 6885442
    Abstract: A method of quantitative determination of the phase of a radiation wave field including the steps of producing a representative measure of the rate of change of intensity of the radiation wave field over a selected surface extending generally across the wave field; producing a representative measure of intensity of the radiation wave filed over the selected surface; transforming the measure of rate of change of intensity to produce a first integral transform representation and applying to the first integral transform representation a first filter corresponding to the inversion of a first differential operator reflected in the measure of rate of change of intensity to produce a first modified integral transform representation; applying an inverse of the first integral transform to the first modified integral transform representation to produce an untransformed representation; applying a correction based on the measure of intensity over the selected surface to the untransformed representation; transforming the
    Type: Grant
    Filed: November 1, 1999
    Date of Patent: April 26, 2005
    Assignee: The University of Melbourne
    Inventors: Keith Nugent, David Paganin, Anton Barty
  • Patent number: 6873405
    Abstract: A propagation measuring apparatus for measuring propagation characteristics of an object to be measured includes a first light source for outputting a first optical signal of a first frequency, a second light source for outputting a second optical signal of a second frequency, a terahertz light outputting unit for generating terahertz light of a frequency, which is equal to a difference between the first and second frequencies, by using the first and second optical signals and radiating the terahertz light to the object to be measured, a first detecting unit for detecting the terahertz light passing through the object to be measured and a measuring unit for measuring the propagation characteristics of the object to be measured based on the terahertz light detected by the first detecting unit.
    Type: Grant
    Filed: December 19, 2003
    Date of Patent: March 29, 2005
    Assignee: Advantest Corporation
    Inventors: Takashi Kido, Shoji Niki
  • Patent number: 6856387
    Abstract: A device for determining the intensity and phase of a coherent light beam (F) in a cross-section of the beam comprises a calculator (1), a camera (2), a detector plane (3), an optical sampling element (4), and two mirrors (5, 6). The device measures the intensity Ii (i=1, . . . N) of the beam in N planes (N?3). The camera (2) is equipped with a single detector plane (3). The optical sampling element (4) and the two mirrors (5, 6) assemble N distinct elementary beams, generated based on the coherent light beam (F), on N distinct zones of the single detector plane (3).
    Type: Grant
    Filed: March 31, 2003
    Date of Patent: February 15, 2005
    Assignee: Commissariat a l'Energie Atomique
    Inventor: Laurent Bruel
  • Patent number: 6853445
    Abstract: A device for detecting the direction of a light source. The device has a pin-hole lens that allows a collimated light beam to excite a light sensing surface behind the lens. The output from the light sensing surface is passed to a processor that determines the position of the surface that has been excited and the direction of the light source. When the position of one or more light sources is known, the device may further determine its own position. The devices may be used in a location system to provide known reference points to a network of other devices. The light sources may be modulated, in which the device can select or identify a particular light source based upon its modulation pattern.
    Type: Grant
    Filed: January 7, 2002
    Date of Patent: February 8, 2005
    Assignee: Motorola, Inc.
    Inventors: Matthew R. Perkins, Tzer-Hso Lin, Neal K. Patwari
  • Patent number: 6836319
    Abstract: A method for adjusting an optical system of an energy beam apparatus by using a mark signal that is obtained by one-dimensionally or two-dimensionally scanning a mark on a sample with an energy beam. The mark has a one-dimensional or two-dimensional periodic structure. A first mark signal is detected by scanning the mark with a beam. The mark is set on the optical axis of the optical system. A second mark signal is detected by scanning the mark with a beam. The mark is located at a position that is deviated from the optical axis. A deviation of a deflection position is determined based on a phase difference between the first and second mark signals.
    Type: Grant
    Filed: April 7, 2004
    Date of Patent: December 28, 2004
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Munehiro Ogasawara, Jun Takamatsu, Hitoshi Sunaoshi, Naoharu Shimomura
  • Publication number: 20040257559
    Abstract: A method of determining at least one parameter that is characteristic of the angular distribution of light illuminating an object in a projection exposure apparatus is described. This parameter may be, for example, a pupil asymmetry. The method comprises the step of inserting a filter element in or in close proximity of a pupil plane of an illumination system that is arranged between a light source and the object. The filter element has a filter function that varies in an azimuthal direction with respect to the optical axis of the illumination system. Then the intensity of the light in a plane downstream of the pupil plane is measured. After rotating the filter element around the optical axis by an angle &PHgr;, the measurement of the intensity is repeated. From the filter function, the angle &PHgr; and the measured intensities the parameter is measured.
    Type: Application
    Filed: May 27, 2004
    Publication date: December 23, 2004
    Inventor: Nils Dieckmann
  • Patent number: 6831766
    Abstract: A projection exposure apparatus for imaging and printing a pattern, formed on a first object, upon a second object through a projection optical system. The projection exposure apparatus includes a storing device for storing information related to light intensity distribution on a pupil plane of the projection optical system in a reference state, and a detecting device for detecting a wavefront of the projection optical system in an arbitrary state, on the basis of the stored information.
    Type: Grant
    Filed: June 4, 2003
    Date of Patent: December 14, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventor: Ryo Sasaki
  • Publication number: 20040227932
    Abstract: A wavefront sensor for measuring a wavefront contains an array of lenslets, a detector array, and a mask having a temporally fixed pattern containing one or more opaque regions that are substantially opaque to light from the wavefront. The mask comprises one or more transmissive regions that are transmissive of light from the wavefront. The mask and the array of lenslets are disposed such that light from the wavefront that is transmitted by the transmissive regions is focused by onto the detector array by the array of lenslets. The mask is adapted to be selectably disposed to any one of a plurality of predetermined positions, wherein a different group of lenslets from the array focuses light from the wavefront onto the detector array depending on which of the plurality of predetermined positions is selected.
    Type: Application
    Filed: February 13, 2004
    Publication date: November 18, 2004
    Inventor: Geunyoung Yoon
  • Publication number: 20040196450
    Abstract: The invention concerns a device for analysing a wavefront with enhanced resolution. The inventive wavefront analysing device, of the Hartmann or Shack-Hartmann type, comprises in particular a set of sampling elements arranged in an analysis plane, and forming as many micro-lenses for sampling the incident wavefront, and a diffraction plane wherein are analysed the Airy discs of the different micro-lenses illuminated by the incident wavefront. The invention is characterised in that the shape of each micro-lens is such that the associated diffraction figure has in the diffraction plane one or several preferential axe(s), and the micro-lenses are oriented in the analysis plane such that the preferential axe(s) of the diffraction figure of a micro-lens are offset relative to the preferential axes of the diffraction figures of neighbouring micro-lenses, thereby enabling to limit the overlapping of the diffraction figures.
    Type: Application
    Filed: May 14, 2004
    Publication date: October 7, 2004
    Inventors: Xavier Jean-Francois Levecq, Fabrice Harms
  • Patent number: 6801875
    Abstract: Methods of measuring widths of illumination spots and distances between two points, and predicting detected signal widths are provided. Systems, software, and kits for performing the methods of the invention are also provided.
    Type: Grant
    Filed: April 17, 2002
    Date of Patent: October 5, 2004
    Assignee: Caliper Life Sciences, Inc.
    Inventors: Jeffrey A. Wolk, Irina Kazakova, Morten J. Jensen
  • Publication number: 20040190006
    Abstract: A method for adjusting an optical system of an energy beam apparatus by using a mark signal that is obtained by one-dimensionally or two-dimensionally scanning a mark on a sample with an energy beam. The mark has a one-dimensional or two-dimensional periodic structure. A first mark signal is detected by scanning the mark with a beam. The mark is set on the optical axis of the optical system. A second mark signal is detected by scanning the mark with a beam. The mark is located at a position that is deviated from the optical axis. A deviation of a deflection position is determined based on a phase difference between the first and second mark signals.
    Type: Application
    Filed: April 7, 2004
    Publication date: September 30, 2004
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Munehiro Ogasawara, Jun Takamatsu, Hitoshi Sunaoshi, Naoharu Shimomura
  • Patent number: 6788398
    Abstract: A method and apparatus for rapid measurements of far-field radiation profiles having a large dynamic range from an optical source is disclosed. Some embodiments of the apparatus include a collector coupled to a rotating hub so that the rotation of an entrance to the collector defines a plane, a detector coupled to receive light captured at the entrance to the collector, and detector electronics having a programmable gain coupled to receive a signal from the detector, Some embodiments may include a rotatable entrance mirror for reflecting light from the optical source into the plane of the entrance of the collector. In some embodiments, the optical source is fixed relative to the plane of the entrance of the collector. In some embodiments, the optical source is rotatable in the plane defined by the entrance of the collector. In some embodiments, the source can be an optical fiber. In some embodiments, the source can be a material irradiated by a laser.
    Type: Grant
    Filed: October 27, 2000
    Date of Patent: September 7, 2004
    Assignee: Photon, Inc.
    Inventor: Jeffrey L. Guttman
  • Patent number: 6788397
    Abstract: A technique for measuring the modal power distribution of an optical source (for example, a laser) launching pulses into a multimode fiber involves a characterization of the multimode fiber itself in terms of its differential modal delay. A reverse differential mode delay measurement is then performed to characterize the interaction of the optical source with the multimode fiber. By knowing these characteristics, the modal power distribution of the source into the fiber can then be determined by using a reconstruction algorithm.
    Type: Grant
    Filed: February 28, 2000
    Date of Patent: September 7, 2004
    Assignee: Fitel U.S.A. Corp.
    Inventors: Steven Eugene Golowich, William Alfred Reed
  • Patent number: 6784408
    Abstract: A two-dimensional array of lateral-effect detectors (or position-sensing devices) is used to simultaneously measure multi-point centroidal locations at high speed. It is one of the primary components of a high-speed optical wavefront sensor design comprising a Shack-Hartmann-type lenslet array and associated analog circuitry including analog-to-digital (A/D) converters, and digital micro-processors. The detector array measures the centroidal location of each incident beam emerging from the lenslet array and calculates the local wavefront slope based on the beam deviations from their respective subaperture centers. The wavefront sensor is designed for high temporal bandwidth operation and is ideally suited for applications such as laser-beam propagation through boundary-layer turbulence, atmospheric turbulence, or imperfect optics. The wavefront sensor may be coupled with a deformable mirror as primary components of an adaptive optics system.
    Type: Grant
    Filed: April 24, 2002
    Date of Patent: August 31, 2004
    Assignee: Oceanit Laboratories, Inc.
    Inventors: Ken C. K. Cheung, Ronald J. Hugo
  • Patent number: 6781680
    Abstract: A method for adjusting an optical system of an energy beam apparatus by using a mark signal that is obtained by one-dimensionally or two-dimensionally scanning a mark on a sample with an energy beam. The mark has a one-dimensional or two-dimensional periodic structure. A first mark signal is detected by scanning the mark with a beam. The mark is set on the optical axis of the optical system. A second mark signal is detected by scanning the mark with a beam. The mark is located at a position that is deviated from the optical axis. A deviation of a deflection position is determined based on a phase difference between the first and second mark signals.
    Type: Grant
    Filed: June 25, 2003
    Date of Patent: August 24, 2004
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Munehiro Ogasawara, Jun Takamatsu, Hitoshi Sunaoshi, Naoharu Shimomura
  • Publication number: 20040156040
    Abstract: A light intensity distribution measuring method for measuring the light intensity distribution of a laser beam emitted by a semiconductor laser comprises the steps of measuring light intensities at a plurality of locations in a laser beam emitted by a semiconductor laser and applying their measurement results to a t distribution function to calculate the light intensity distribution. A light intensity distribution measuring device is also described.
    Type: Application
    Filed: November 19, 2003
    Publication date: August 12, 2004
    Inventor: Hiroshi Sakai
  • Patent number: 6774988
    Abstract: The optical system of the present invention includes a lens system assembly, a spectral filter material and a pixel array configured such that small, distant, light sources can be reliably detected. The optical system of the present invention provides accurate measurement of the brightness of the detected light sources and identification of the peak wavelength and dominant wavelength of the detected light sources. Use of the optical system of the present invention provides the ability to distinguish headlights of oncoming vehicles and taillights of leading vehicles from one another, as well as, from other light sources.
    Type: Grant
    Filed: July 30, 2002
    Date of Patent: August 10, 2004
    Assignee: Gentex Corporation
    Inventors: Joseph S. Stam, Jon H. Bechtel, Spencer D. Reese, Darin D. Tuttle, Gregory S. Bush, Harold C. Ockerse
  • Patent number: 6768537
    Abstract: A projection optical system for forming an image of a pattern in a first plane onto a second plane using exposure light in a wavelength region of shorter than 200 nm. When a projection pattern placed in the first plane and having a dark pattern and a light pattern around the dark pattern is projected onto the second plane, an average illuminance in a area where a projected image of the dark pattern is formed in the second plane is 8 or less, where an illuminance of an image of the light pattern around the dark pattern in the second plane is set to be 100.
    Type: Grant
    Filed: April 17, 2003
    Date of Patent: July 27, 2004
    Assignee: Nikon Corporation
    Inventors: Takeshi Suzuki, Hideki Komatsuda, Yasuhiro Omura
  • Patent number: 6768553
    Abstract: The present invention provides a continuous-zoom imaging device of an interferometer. Reflected lights of a reference plane and a test plane interfere with each other to generate an interference pattern. A collimation device converts a parallel light of the interference pattern into a convergent light. An optical path adjustment means guides the light to a polarizing beam splitter. A continuous-zoom device adjusts the magnification ratio of the interference pattern on the imaging passageway and to output an object image, which is then imaged on a charge-coupled device. The present invention can improve the quality of the interference pattern without using any rotating diffuser, and thus has the characteristics of reduced number of components, lowered cost, and shrunk volume. Besides, the present invention can utilize a joint device to connect the continuous-zoom device and an attenuator so as to achieve automatic light adjustment and convenient operation.
    Type: Grant
    Filed: July 23, 2002
    Date of Patent: July 27, 2004
    Assignee: K Laser Technology, Inc.
    Inventors: Mang Ou-Yang, Shin-Gwo Shiue, Shin-Maio Tseng, Kevin S.H. Kuo, Hsin-Chu Liu, I-Pen Chien, Jim Chung
  • Patent number: 6765660
    Abstract: A system is disclosed for analyzing an illumination field of a line of laser illumination. The system includes a first movable unit, a second movable unit, and a sensor unit. The first movable unit includes a first opening through which at least a portion of the illumination field may pass. The first movable unit is adapted for movement in a first direction. The sensor unit is adapted to receive illumination and to produce a sensor output signal representative a characteristic of the illumination field. The second movable unit includes a second opening through which at least a portion of the illumination field may pass. The second movable unit is positioned between the first movable unit and the sensor unit and is adapted for movement between at least a first position in which very little or no light from the illumination field may reach the sensor unit, and a second position in which a relatively high amount of light from the illumination field may reach the sensor unit.
    Type: Grant
    Filed: April 28, 2003
    Date of Patent: July 20, 2004
    Assignee: Agfa Corporation
    Inventor: John F. Nolan
  • Publication number: 20040130705
    Abstract: A system and method of wavefront sensing with a Shack-Hartmann wavefront sensor precisely locates focal spots on a detector array, and determines the location of the lenslet array with respect to the detector array.
    Type: Application
    Filed: July 9, 2003
    Publication date: July 8, 2004
    Inventor: Daniel M. Topa
  • Publication number: 20040125361
    Abstract: An agile optical beam profiler using a two-dimensional small tilt digital micromirror device/chip, a translation stage, and single photodetector or pair of photodetectors. A method of profiling an optical beam includes positioning a programmable spatial light modulator in an incident optical beam and sequentially moving the spatial light modulator to at least one position in a first planar direction in a displacement increment less than a pixel width of the spatial light modulator. The method also includes directing respective portions of the optical beam to a photodetector at each position of the spatial light modulator. The method may also include calibrating the photodetectors by directing a portion of the beam to the photodetector, then directing the entire beam, or a remaining portion of the beam, to the photodetector, and normalizing the detected power of the portion with the detected power of the entire beam, or remaining portion, respectively.
    Type: Application
    Filed: September 8, 2003
    Publication date: July 1, 2004
    Inventors: Nabeel Agha Riza, Muhammad Junaid Mughal