Having Predetermined Light Transmission Regions (e.g., Holes, Aperture, Multiple Material Articles) Patents (Class 356/237.6)
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Patent number: 8295581Abstract: A method is disclosed for detecting defects in an optical component to be tested, such as a lens comprising the steps of: providing a structured pattern, recording the reflected or transmitted image of the pattern on the optical component to be tested, phase shifting the pattern and recording again similarly the reflected or transmitted image, calculating the local phase and amplitude images of the optical component to be tested, calculating a model image of a defect free optical component and determining corresponding phase and amplitude images of the defect free model optical component, comparing phase and amplitude images of both optical component to be tested and defect free model optical component, determining suspect zones in the optical component to be tested, and applying a metrics to separate dust and noise from other defects.Type: GrantFiled: April 14, 2008Date of Patent: October 23, 2012Assignee: Essilor International (Compagnie Generale d'optique)Inventors: Frédéric Dubois, Fabrice Gibrat, Guy Schott, Philippe Raulot
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Patent number: 8289526Abstract: An exemplary system and method for analyzing rolling stock wheels helps allow a wheel to be analyzed at speed, reducing any need for manual inspections or other related delays. An exemplary system may include one or more strobe lights and one or more high-speed cameras to capture images of the rolling stock wheel(s) at speed. The images may include one or more markers to assist in analyzing various parameters of the rolling stock wheel. The exemplary system may include one or more backface illumination plates to assist in illuminating the rolling stock wheel(s) and/or the one or more marker(s).Type: GrantFiled: July 17, 2008Date of Patent: October 16, 2012Assignee: LynxRail CorporationInventors: Krzysztof Kilian, Vladimir Mazur, Stuart Hall
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Patent number: 8274652Abstract: In an inspection subject substrate, there is a problem that a defect signal is overlooked due to scattered light from a pattern and sensitivity decreases in an irregular circuit pattern part. The inventors propose a defect inspection method, characterized by comprising: an illumination step of guiding light emitted from a light source to a predetermined area on an inspection subject substrate under a plurality of predetermined optical conditions; a detection step of obtaining an electric signal by guiding scattered light components propagating in a predetermined range of azimuthal angle and in a predetermined range of elevation angle to a detector for each of a plurality of scattered light distributions occurred correspondingly to the plurality of optical conditions in the predetermined area; and a defect determination step of determining a defect based on the plurality of electric signals obtained in the detection step.Type: GrantFiled: April 25, 2008Date of Patent: September 25, 2012Assignee: Hitachi High-Technologies CorporationInventors: Yuta Urano, Kaoru Sakai, Shunji Maeda
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Patent number: 8269960Abstract: Computer-implemented methods for inspecting and/or classifying a wafer are provided. One computer-implemented includes detecting defects on a wafer using one or more defect detection parameters, which are determined based on a non-spatially localized characteristic of the wafer that is determined using output responsive to light scattered from the wafer generated by an inspection system. Another computer-implemented method includes classifying a wafer based on a combination of a non-spatially localized characteristic of the wafer determined using output responsive to light scattered from the wafer generated by an inspection system and a spatially localized characteristic of the wafer determined using the output.Type: GrantFiled: July 24, 2008Date of Patent: September 18, 2012Assignee: KLA-Tencor Corp.Inventors: Juergen Reich, Louis Vintro, Prasanna Dighe, Andrew Steinbach, Daniel Kavaldjiev, Stephen Biellak
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Patent number: 8228493Abstract: A test object carrying device for use in an appearance inspection device for checking the appearance of the test objects, which includes a back/front reversal unit for turning over the test objects being conveyed by the forward conveying means and supplying them to the returning unit; the back/front reversal means is provided with a first drum for rotating and conveying the test objects unit while holding the test objects on the peripheral surface thereof, and a second drum for rotating and conveying the test objects being conveyed by the first drum while holding the test objects on the peripheral surface thereof; wherein at least one of the first drum and the second drum is structured so that the test objects are transferred in parallel to the forward conveying unit and returning unit by rotating and conveying the test objects while holding them on the peripheral surface thereof.Type: GrantFiled: April 25, 2008Date of Patent: July 24, 2012Assignee: Qualicaps Co., Ltd.Inventors: Motohiro Yagyu, Kenichi Kasai, Ken Sato, Junsuke Yasui, Akira Nagao, Tetsuhisa Ishida
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Patent number: 8199320Abstract: A method for testing a part mounting status on a substrate, the method comprises preparing the part including a retroreflection portion for occurring reflect light by retroreflection; irradiating light onto the retroreflection portion; receiving the reflect light from the retroreflection portion; and determining whether the part exist by the use of the reflect light from the retroreflection portion.Type: GrantFiled: August 3, 2009Date of Patent: June 12, 2012Assignee: Fujitsu LimitedInventor: Hideaki Takahashi
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Patent number: 8144973Abstract: A method for scanning a surface with a number of different illumination configurations, the method comprises capturing a plurality of images in a sequential manner during a single sweep, each image including one or more lines of pixels, sequentially altering an illumination configuration used to capture the plurality of images according to a predefined sequence of illumination configurations and shifts of the relative position of the imaging unit for capturing each of the plurality of images, and repeating the sequence of illumination configurations settings and associated image capture positions until a desired area of the surface is scanned, wherein said predefined shift is between 10 pixels and less then one pixel.Type: GrantFiled: March 24, 2009Date of Patent: March 27, 2012Assignee: Orbotech Ltd.Inventors: Tamir Margalit, Ram Oron, Amir Noy
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Patent number: 8139842Abstract: An inspection apparatus for inspecting a rechargeable battery electrode plate-connected structure to check whether electrode plates are properly connected to a current collector plate by filters.Type: GrantFiled: November 24, 2008Date of Patent: March 20, 2012Assignee: Panasonic EV Energy Co., Ltd.Inventors: Sakae Sotooka, Fusayoshi Nomura
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Patent number: 8135204Abstract: Computer-implemented methods, carrier media, and systems for creating a defect sample for use in selecting one or more parameters of an inspection recipe are provided. One method includes separating defects into bins based on regions in which the defects are located, defect types, and values of the defects for parameter(s) of a detection algorithm. The method also includes determining a number of the defects to be selected from each bin by distributing a user-specified target number of defects across the bins. In addition, the method includes selecting defects from the bins based on the determined numbers thereby creating a defect sample for use in selecting values of parameter(s) of the detection algorithm for use in the inspection recipe.Type: GrantFiled: September 21, 2007Date of Patent: March 13, 2012Assignee: KLA-Tencor Technologies Corp.Inventors: Chien-Huei (Adam) Chen, Barry Becker, Hong Chen, Michael Van Riet, Chris Maher, Stephanie Chen, Suryanarayana Tummala, Yong Zhang
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Patent number: 8125651Abstract: An object is to provide a substrate conveyance apparatus and a substrate detection device capable of improving flexibility in arrangement layout. The substrate detection device includes a projector 41 for projecting inspection light 40 so as to pass through a predetermined position on a path of a substrate 4 conveyed by conveyance belts 26, a light receiver 42 for receiving the inspection light 40 projected by the projector 41, and a detector (a control device 15) for detecting that the substrate 4 reaches the predetermined position based on a decrease in the amount of received light of the inspection light 40 received by the light receiver 42 when the substrate 4 conveyed by the conveyance belts 26 reaches the predetermined position and a portion of the inspection light 40 is blocked by the substrate 4.Type: GrantFiled: January 14, 2009Date of Patent: February 28, 2012Assignee: Panasonic CorporationInventors: Shuzo Yagi, Masao Nakane, Yoshinori Isobata
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Patent number: 8111389Abstract: Disclosed herein is a method of inspecting defects in a circuit pattern of a substrate. At least one laser beam radiation unit for radiating a laser beam onto an inspection target circuit pattern of a substrate in a non-contact manner is prepared. A probe beam radiation unit for radiating a probe beam onto a connection circuit pattern to be electrically connected to the inspection target circuit pattern in a non-contact manner is prepared. The laser beam is radiated onto the inspection target circuit pattern using the laser beam radiation unit. The probe beam is radiated onto the connection circuit pattern using the probe beam radiation unit, thus measuring information about whether the probe beam is diffracted, and a diffraction angle. Accordingly, the method can solve problems such as erroneous measurements caused by contact pressure and can reduce the time required for measurements.Type: GrantFiled: March 4, 2010Date of Patent: February 7, 2012Assignee: Samsung Electro-Mechanics Co., Ltd.Inventors: Seung Seoup Lee, Tak Gyum Kim, Jin Won Park
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Patent number: 8077307Abstract: Apparatus for optical inspection includes an illumination assembly, including multiple parallel rows of light sources for emitting light and illumination optics associated with each row for directing the light onto an object under inspection. The multiple parallel rows include at least a first row with first illumination optics including a first array of prisms that are configured to reflect the light emitted by the light sources in the first row, and at least a second row with second illumination optics including a second array of prisms that are configured to refract the light emitted by the light sources in the second row. An imaging assembly is configured to capture an image of the object under illumination by the multiple parallel rows of the light sources.Type: GrantFiled: April 9, 2008Date of Patent: December 13, 2011Assignee: Orbotech Ltd.Inventors: Ehud Pertzov, Michael Matusovsky, Yaron Bar-Tal, Ilia Lutsker, Ofer Ish-Shalom
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Patent number: 8072589Abstract: An IREM image of an IC is obtained. The emission intensity at each emission site is measured/calculated and is compared to reference intensity. The calculated intensity may be plotted against reference intensities. In general, the majority of the plotted intensities would lie in a given range within a straight line. However, for devices that exhibit an abnormal emission, the plot would result in an easily observable deviation from the line. The calculated intensity is used to make a determination of logical “1” or “0” for each device, which is automatically stored together with the corresponding test vector. The calculated logical states are then tabulated and compared against tabulation of reference logical states.Type: GrantFiled: December 2, 2008Date of Patent: December 6, 2011Assignee: DCG Systems, Inc.Inventor: Neeraj Khurana
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Patent number: 8049878Abstract: Systems (50) and methods are disclosed for detecting defects (DEF1-DEF5) in a ceramic filter body (10) having a honeycomb structure (12) that defined multiple channels (20). Plugs (30) are used to seal select channel ends (22, 24). The methods include using a first light source unit (52) and a first detector unit (62) operably arranged at respective first and second ends (16, 18) of the honeycomb structure so as to be capable of being in optical communication. Light beams (LB) are transmitted from the first light source unit to the first detector unit through multiple channels. Defects in a given plug allow a detectable portion (LBD) of the corresponding light beam to be detected. Multiple detector elements (64) are used to detect the detectable light beam portion to provide location and intensity variation information, which helps deduce the precise location and nature of the defect.Type: GrantFiled: August 22, 2008Date of Patent: November 1, 2011Assignee: Corning IncorporatedInventor: Leon Robert Zoeller, III
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Patent number: 8045145Abstract: Systems and methods for acquiring information about a defect on a specimen are provided. One system includes an optical subsystem configured to acquire topography information about the defect. The system also includes an electron beam subsystem configured to acquire additional information about the defect. One method includes acquiring first data for the defect using an optical technique and second data for the defect using an electron beam technique. The first and second data is acquired while the specimen is disposed in a single vacuum chamber. The method also includes determining topography information about the defect from the first data. In addition, the method includes determining additional information about the defect from the second data.Type: GrantFiled: June 6, 2007Date of Patent: October 25, 2011Assignee: KLA-Tencor Technologies Corp.Inventors: Dave Bakker, Gabor Toth, Varoujan Chakarian
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Patent number: 8031931Abstract: A spatial mask printer may be used in conjunction with an optical inspection tool. The tool can be used to obtain a Fourier image of an inspected object, and a filter mask image can be designed to block certain aspects of the object's image in the Fourier plane corresponding to repetitive aspects of the imaged object. The filter mask image can then be printed and used in the tool during the inspection process. The mask image may be designed by hand or by computer and may be stored for later use. Filters may be automatically placed into the optical path of the inspection tool by a filter wheel, or may be housed in other filter banks. The printer may be configured to operate in a clean room environment, and may be integrated into the optical inspection tool.Type: GrantFiled: April 24, 2006Date of Patent: October 4, 2011Assignee: Applied Materials South East Asia Pte. Ltd.Inventors: Dan T. Fuchs, Shai Silberstein
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Patent number: 8027037Abstract: In a measuring system, a method for evaluating parameters of a workpiece includes measuring a periodic structure, such as a grating, on the workpiece to produce image data. An orientation of features in the image data, produced by higher order diffractions from the periodic structure, is identified. An orientation of the periodic structure is determined based on the orientation of the features in the image data. The image data is then modified, based on the orientation of the periodic structure, to correlate with, and for comparison to, simulated image data to ascertain parameters of the workpiece. Alternatively, optical components in the measuring system, or the workpiece itself, are adjusted to provide a desired alignment between the optical components and the periodic structure. A microstructure on the workpiece may then be measured, and the resulting image data may be compared to the simulated image data to ascertain parameters of the microstructure.Type: GrantFiled: January 28, 2010Date of Patent: September 27, 2011Assignee: Nanometrics IncorporatedInventors: Mike Littau, Darren Forman, Chris Raymond, Steven Hummel
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Patent number: 7990536Abstract: There are disclosed a system and a method for measuring reflectance of an object. The system for measuring reflectance of an object according to the present invention includes: a light source unit including a light source irradiating light to the object; a light source position adjusting unit that adjusts a position and a direction of the light source unit; a light receiving unit that acquires image data by detecting light reflected on the object; and a reflectance acquiring unit that acquires the reflectance of the object from the image data. According to the present invention, it is possible to more precisely acquire the reflectance of the object within a shorter time.Type: GrantFiled: August 5, 2009Date of Patent: August 2, 2011Assignee: Gwangju Institute of Science and TechnologyInventors: Kwan Heng Lee, Duck Bong Kim, Kang Su Park, Kang Yeon Kim, Myoung Kook Seo
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Patent number: 7944554Abstract: A pair of angular contact bearings 20A, 20B are disposed between a bearing house 16b of an inspection head 16 and a head supporting tube 8, and a spacer 25 and a spring bearing ring 26 are disposed between outer races 20o of the bearings 20A, 20B. The spacer 25 and the spring bearing ring 26 are urged by a coil spring 27 toward the side of the outer race 20o. An O-ring 28 is disposed between the spacer 25 and the outer race 20o of the bearing 20B, and the outer circumference of the O-ring is brought into closely contact with the inner circumference of the bearing house 16b. The outer races 20o are constrained by a step part 16f in the bearing house 16b and an end cap 29 screwed into the inspection head 16. Removing the end cap 29 makes it possible to take out the bearing housing 16b and a main shaft part 16c integrally from atop of the bearings 20A, 20B.Type: GrantFiled: May 16, 2007Date of Patent: May 17, 2011Assignee: Kirin Techno-System Company, LimitedInventors: Kazuhiro Horiuchi, Tatsunari Arito
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Patent number: 7945087Abstract: A method for micromachining a material, including configuring an optical system to provide illumination of an illumination wavelength to a site via a given element of the optical system, the illumination generating returning radiation from the site. The method further includes configuring the optical system to receive the returning radiation via the given element, and to form an image of the site therefrom, calculating an actual position of a location at the site from the image and outputting a signal indicative of the actual position of the location, generating a beam of micromachining radiation having a micromachining wavelength different from the illumination wavelength, positioning the beam to form an aligned beam with respect to the location in response to the signal, and conveying the aligned beam to the location via at least the given element of the optical system so as to perform a micromachining operation at the location.Type: GrantFiled: June 25, 2007Date of Patent: May 17, 2011Assignee: Orbotech Ltd.Inventors: Zvi Kotler, Eliezer Lipman, Golan Hanina, Boris Greenberg, Michael Zenou
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Patent number: 7907268Abstract: A surface inspection method inspects a surface of a wafer having a repeated pattern formed by double patterning. The method includes: a first step (S121) which applies an inspection light to a surface of a wafer; a second step (S122) which detects a diffracted light from the surface of the wafer to which the inspection light has been applied; and a third step (S123) which checks whether a defect is present in the repeated pattern according to the diffracted light detected in the second step. The second step detects a diffracted light corresponding to a pattern having a pitch multiplied by 2 with respect to the pitch of the repeated pattern.Type: GrantFiled: March 25, 2010Date of Patent: March 15, 2011Assignee: Nikon CorporationInventors: Yoshihiko Fujimori, Yuji Kudo
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Publication number: 20110051124Abstract: A method of aligning a die when the die is held with a circuit pattern on a first side of the die facing away from an infrared light source, wherein infrared light from the infrared light source is projected onto a second side of the die opposite to the first side such that the infrared light passes through a body of the die. From the second side of the die, an image of the infrared light reflected from the circuit pattern is detected and captured. Thereafter, an alignment of the die from the captured image of the die is determined.Type: ApplicationFiled: September 2, 2009Publication date: March 3, 2011Inventors: Ran Shi WANG, Wing Hong LEUNG, Siu Wing LAU
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Patent number: 7872743Abstract: In a defect inspection system using a plurality of detectors such as an upright detector and an oblique detector, if illumination light and wafer height are adjusted to the detection field of view of one detector, a defocused image is detected by other remaining detectors, resulting in degradation of the detection sensitivity. The present invention solves this problem. When a plurality of detectors such as an upright detector and an oblique detector are used in the defect inspection system, the reduction of the inspection sensitivity can be prevented by correcting the field positions of the other remaining detectors with respect to the field of view of the one detector. Further, the variation in optical axis for each inspection system due to the variation in parts and assembly errors can be reduced.Type: GrantFiled: December 15, 2008Date of Patent: January 18, 2011Assignee: Hitachi High-Technologies CorporationInventors: Koichi Taniguchi, Yuzo Morita
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Patent number: 7869023Abstract: A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.Type: GrantFiled: May 19, 2008Date of Patent: January 11, 2011Assignee: KLA-Tencor CorporationInventors: Guoheng Zhao, Stanley Stokowski, Mehdi Vaez-Iravani
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Patent number: 7869021Abstract: A system for on-the-fly inspection of components is provided. The system includes a prism structure disposed below an inspection item transit path. An image data system is disposed below the prism structure. A lighting assembly provides a first lighting source to illuminate a plurality of sides of an inspection item and a second lighting source to illuminate a bottom of the inspection item.Type: GrantFiled: May 9, 2008Date of Patent: January 11, 2011Assignee: ASTI Holdings LimitedInventors: Ajharali Amanullah, Han Cheng Ge, Huek Choy Tan, Hing Tim Lai
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Patent number: 7850801Abstract: A defect detection method of a layered film having a polarizing plate and an optical compensation layer includes steps of: applying light from a light source arranged at the polarizing plate layer side of the film surface of the layered film; a step of imaging a transmitting light image of the layered film by an imaging unit arranged at the optical compensation layer side of the film surface; and a defect detection step for detecting a defect existing on the layered film according to the transmitting light image captured by the imaging unit. The imaging unit performs imaging via an inspection polarizing filter arranged on the optical path between the light source and the imaging unit and adjacent to the imaging unit; and an inspection phase difference filter arranged on the optical path between the light source and the imaging unit and between the inspection polarizing filter and the layered film.Type: GrantFiled: January 10, 2007Date of Patent: December 14, 2010Assignee: Nitto Denko CorporationInventors: Takamasa Kobayashi, Michihiro Hagiwara, Yuuki Yano, Kouji Shizen
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Patent number: 7839497Abstract: An apparatus comprising a phase compensator and an optical condenser in communication with the phase compensator. The phase compensator provides for phase shifting a portion of an electromagnetic wave. The optical condenser is shaped to direct the electromagnetic wave to a focal region of the optical condenser.Type: GrantFiled: July 13, 2006Date of Patent: November 23, 2010Assignee: Seagate Technology LLCInventors: Tim Rausch, Michael A. Seigler, Edward C. Gage, William A. Challener, Robert E. Rottmayer, Chubing Peng
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Patent number: 7768633Abstract: A system for inspecting components is provided. The system includes a prism having a first end, a second end, a first reflecting surface, and a second reflecting surface. The first end of the prism is located in a plane that is parallel to and axially separated from a plane of one or more of a plurality of inspection pieces. An image data system is disposed beyond the second end of the prism and generates image data of one or more of the inspection piece that includes a top surface of at least one of the inspection pieces and at least one side of at least one of the inspection pieces. An inspection piece transportation system, such as a pick and place tool or conveyor, moves a plurality of inspection pieces past the first end of the prism through an inspection area.Type: GrantFiled: April 5, 2007Date of Patent: August 3, 2010Assignee: ASTI Holdings LimitedInventors: Ajharali Amanullah, Han Cheng Ge, Huek Choy Tan, Hing Tim Lai
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Patent number: 7769225Abstract: Computer-implemented methods and systems for detecting defects in a reticle design pattern are provided. One computer-implemented method includes acquiring images of a field in the reticle design pattern. The images illustrate how the field will be printed on a wafer at different values of one or more parameters of a wafer printing process. The field includes a first die and a second die. The method also includes detecting defects in the field based on a comparison of two or more of the images corresponding to two or more of the different values. In addition, the method includes determining if individual defects located in the first die have substantially the same within die position as individual defects located in the second die.Type: GrantFiled: December 20, 2005Date of Patent: August 3, 2010Assignee: KLA-Tencor Technologies Corp.Inventors: Sagar A. Kekare, Ingrid B. Peterson, Moshe E. Preil
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Patent number: 7755752Abstract: The capabilities of the Modulated Optical Reflectance (MOR) technology in dopant metrology applications are combined with the sensitivity of the PhotoReflectance (PR) method in the present system to provide stress and other measurements in semiconductor samples. Such combination enhances the measurement performance of MOR based systems in ion implant applications (implantation dose and energy) and expands system capabilities into a new area of structural parameters measurements, for example, strain in silicon wafers.Type: GrantFiled: April 7, 2008Date of Patent: July 13, 2010Assignee: KLA-Tencor CorporationInventors: Alexei Salnik, Lena Nicolaides
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Patent number: 7755750Abstract: A method of detecting a defect in a porous body (1) includes applying a light beam (13) to fine particles (12) discharged from the porous body (1), and detecting the light and shade of scattered light caused by the fine particles (12) to detect the position of a defect, wherein the light and shade of the scattered light is detected at a position facing the light beam (13).Type: GrantFiled: September 22, 2008Date of Patent: July 13, 2010Assignee: NGK Insulators, Ltd.Inventor: Shigeki Kato
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Patent number: 7733506Abstract: An optical arrangement includes a position sensitive optical detector, a collimated optical source, and a processor configured to monitor the inclination of an object. The collimated optical source is configured to transmit a collimated beam towards the object. The position sensitive optical detector is configured to detect the specific location of incidence of an optical signal received from the object, and the processor is configured to generate information relating to the inclination of the object from processing optical signals received at the position sensitive optical detector.Type: GrantFiled: March 29, 2007Date of Patent: June 8, 2010Assignee: Hong Kong Applied Science and Technology Research Institute Co., Ltd.Inventor: Kwok Sing Cheng
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Patent number: 7724359Abstract: Many electronic entities such as integrated circuits and discrete power devices have contact pads formed from successively deposited layers of nickel and a second metal such as gold. The resulting pad structure is used to make external electrical connection such as solder connection. Problems associated with failure of such connections are avoidable by inspecting the surface of the nickel layer for excessive small particle formation.Type: GrantFiled: May 27, 2008Date of Patent: May 25, 2010Assignee: Agere Systems Inc.Inventors: Ahmed Nur Amin, Mark Adam Bachman, Frank A. Baiocchi, John Michael DeLucca, John William Osenbach
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Patent number: 7714995Abstract: A material independent profiler system and method for measuring a slope on the surface of an object such as a thin film disk, a silicon wafer, or a glass substrate is disclosed.Type: GrantFiled: March 1, 2007Date of Patent: May 11, 2010Assignee: KLA-Tencor CorporationInventor: Steven W. Meeks
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Patent number: 7710556Abstract: A substrate inspection system of a type that receives substrates disposed within a cassette and inspects a planar surface of the substrates with a read head, where the substrates are inspected while they are disposed within the cassette, and the read head is of a size to fit between adjacent substrates within the cassette. In this manner, the substrates do not need to be removed from the cassette, and no robotic arm is required to do so.Type: GrantFiled: May 24, 2007Date of Patent: May 4, 2010Assignee: KLA-Tencor CorporationInventor: Mark A. McCord
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Patent number: 7701569Abstract: A dark field lighting testing device, for detecting a surface defect of an object having mirror surfaces, includes a cavity, the interior surface of which is made of a light-absorbing material; an opening arranged on a top of the cavity; a tape body arranged on the interior surface of the cavity; a plurality of lighting elements arranged on the tape body and electrically connected to each other; and a plate body arranged right above the opening of the cavity. During testing procedure, light emitted from each lighting element is incident upon the surface of the tested object, from which the diffusively reflected or refracted light forms an image on the surface of the plate body, thus a defect on the surface of the tested body and a position thereof being able to be detected.Type: GrantFiled: July 30, 2007Date of Patent: April 20, 2010Assignee: Lumos Technology Co., Ltd.Inventor: Chih-Yi Yang
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Patent number: 7701570Abstract: A system and method for detecting defective cells in honeycomb bodies which includes a light source which launches and couples light into cells at a first end face of the honeycomb body, and a projection medium which receives the light at a second end face of the honeycomb body. The light source is preferably a collimated light source.Type: GrantFiled: December 12, 2005Date of Patent: April 20, 2010Assignee: Corning IncorporatedInventors: Patrick Michael Gargano, Babak Robert Raj, William Paul Ryszytiwskyj, John Charles Speeckaert, David John Worthey
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Patent number: 7679738Abstract: A molding die has through holes composed of feed holes and slit grooves for producing honeycomb structure bodies. The slit groove is formed in at least a part of each through hole. In a method of inspecting the molding die, a light is irradiated into the feed holes side to pass through the through holes. A camera is disposed at the slit groove formation side of the molding die to photograph the amount of light output from the slit groove side. A difference in intensity of the amount of light output from the slit grooves is calculated in order to detect at least the presence of a defective slit groove having an abnormal part. In another method of repairing the defective slit groove, a modifier made of abrasive grains and clay mother material is forcedly provided into the defective slit groove in order to repair or remove the abnormal part.Type: GrantFiled: December 4, 2007Date of Patent: March 16, 2010Assignee: Denso CorporationInventors: Shoichi Nagatoshi, Susumu Takahashi, Akihiko Takasu
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Patent number: 7679735Abstract: A surface inspection of the system applies a first oblique illumination beam and may also apply a second illumination beam to illuminate a surface either sequentially or simultaneously. Radiation reflected or scattered is collected by preferably three collection channels and detected by three corresponding detector arrays, although a different number of channels and detector arrays may be used. One or both illumination beams are focused to a line on the surface to be inspected and each line is imaged onto one or more detector arrays in the up to three or more detection and collection channels. Relative motion is caused between the lines and the surface inspected in a direction perpendicular to the lines, thereby increasing throughput while retaining high resolution and sensitivity. The same detection channels may be employed by detecting scattered or reflected radiation from both illumination beams. Fourier filters may be employed to filter out diffraction at one or more different spatial frequencies.Type: GrantFiled: March 20, 2008Date of Patent: March 16, 2010Assignee: KLA-Tencor CorporationInventors: Isabella Lewis, Mehdi Vaez-Iravani
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Patent number: 7674309Abstract: A apparatus and method for detecting defects in a honeycomb body. In operation, the particulates emerge at an outlet end face of the honeycomb body through defects, if any, in the honeycomb walls and/or plugs and passes though a permeable member, such as a screen, where they are illuminated. The permeable member is disposed adjacent to and preferably in contact with the outlet end. Use of the permeable member improves the signal-to-noise ratio (SNR) such that defects may be more readily detected. The permeable member preferably includes an anti-reflective surface.Type: GrantFiled: March 31, 2006Date of Patent: March 9, 2010Assignee: Corning IncorporatedInventors: Patrick Michael Gargano, Babak Robert Raj, William Paul Ryszytiwskyj, John Charles Speeckaert, David John Worthey
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Patent number: 7675614Abstract: A wafer inspecting method including the steps of scanning the surface of a wafer along a street by using a line sensor having a plurality of elements arranged in a line, and determining a deposited condition of foreign matter on the surface of the wafer near electrodes formed on both sides of the street according to image information obtained by the above scanning step. By the use of the linear sensor, it is possible to efficiently determine whether or not the electrodes are good.Type: GrantFiled: April 16, 2008Date of Patent: March 9, 2010Assignee: Disco CorporationInventor: Kazuma Sekiya
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Patent number: 7646478Abstract: An apparatus for examining spectral characteristics of an object may include a chuck configured to support and releasably fix the object, wherein the chuck is larger than the object, a first light source assembly integral with the chuck and configured to illuminate a bottom surface of the object with light having a predetermined spectrum and intensity, and a transmission analysis unit for collecting and analyzing light transmitted through the object. The first light source assembly may include multiple and/or adjustable light sources. A second light source assembly may illuminate a top surface of the object, and a reflection analysis unit may collect resultant reflected light.Type: GrantFiled: February 7, 2007Date of Patent: January 12, 2010Assignee: Samsung Electronics Co., Ltd.Inventors: Koung-Su Shin, Dong-Su Ha, Chung-Sam Jun
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Patent number: 7636155Abstract: A method for isolating the emitting devices may be applied to various emission and laser microscopy systems. A point spread function is convolved with CAD data of devices involved in the emission. The calculated signal intensity of the devices is varied until the difference between the calculated signal and the measured signal provides best fit. The best fit is performed for each on/off state for all configurations of the involved devices. The variance of the best curve fit for all of the configurations is used to assign probability to each state. The best fit indicates the correct state of each of the involved devices, thereby indicating which devices emit. At times, when the transistors are extremely close, a weighted solution is calculated. The weights are based on the probability of each solution.Type: GrantFiled: January 18, 2007Date of Patent: December 22, 2009Assignee: DCG Systems, Inc.Inventor: Neeraj Khurana
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Patent number: 7636649Abstract: An optical metrology model for the structure is obtained. The optical metrology model comprising one or more profile parameters, one or more process parameters, and a dispersion. A dispersion function that relates the dispersion to at least one of the one or more process parameters is obtained. A simulated diffraction signal is generated using the optical metrology model and a value for the at least one of the process parameters and a value for the dispersion. The value for the dispersion is calculated using the value for the at least one of the process parameter and the dispersion function. A measured diffraction signal of the structure is obtained using an optical metrology tool. The measured diffraction signal is compared to the simulated diffraction signal to determine one or more profile parameters of the structure. The fabrication tool is controlled based on the determined one or more profile parameters of the structure.Type: GrantFiled: September 21, 2007Date of Patent: December 22, 2009Assignee: Tokyo Electron LimitedInventors: Shifang Li, Hanyou Chu, Manuel Madriaga
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Patent number: 7630087Abstract: Measurement of a profile of a scatterometry object on top of one or more product layers on a substrate is disclosed. To prevent an unknown parameters of one or more product layers having an effect on the measurement of the object profile, the thickness of the one or more product layers is measured prior to measuring the profile of the scatterometry object on the layer(s). In an embodiment, each of a plurality of product layers is measured as it is exposed so that only the degree of freedom of the most recently exposed product layer is unknown at each measurement step. When each of a plurality of product layers has been measured, and a scatterometry object is placed at the top of the layers, only the degrees of freedom of that scatterometry object should be unknown and only the profile of the object should need to be measured.Type: GrantFiled: November 22, 2006Date of Patent: December 8, 2009Assignee: ASML Netherlands B.V.Inventors: Leonardus Henricus Marie Verstappen, Antoine Gaston Marie Kiers, Goce Naumoski
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Patent number: 7630070Abstract: To detect whether a substrate is in a focal plane of a scatterometer, a cross-sectional area of radiation above a certain intensity value is detected both in front of and behind a back focal plane of the optical system of the scatterometer. The detection positions in front of and behind the back focal plane should desirably be equidistant from the back focal plane along the path of the radiation redirected from the substrate so that a simple comparison may determine whether the substrate is in the focal plane of the scatterometer.Type: GrantFiled: November 30, 2007Date of Patent: December 8, 2009Assignee: ASML Netherlands B.V.Inventor: Ronald Franciscus Herman Hugers
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Patent number: 7619646Abstract: An optical system is effective to illuminate and scan an interior wall of an object having an interior bore, such as a stent. The system includes a light source, an object support having a light conducting portion, an image taking lens, and a line scan camera. The interior bore and the light conducting portion of the object support are in axial alignment with a center optical axis of the image taking lens. A drive mechanism engages the object without impacting the axial alignment. Various aspect of this optical system include a rotating wheel or transparent plate as the drive mechanism. The object support may be an opaque rod having a light conducting portion or a transparent rod.Type: GrantFiled: March 6, 2007Date of Patent: November 17, 2009Assignee: Visicon Inspection Technologies LLCInventors: Daniel Freifeld, John B. Burnett
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Patent number: 7602486Abstract: A vehicle cylinder head coolant passage inspection device and a method for inspecting vehicle cylinder head coolant passages therewith. A device and method of the present invention can be used to detect blockages present within such coolant passages. A device and method of the present invention uses one or more fiber-optic probes that can both emit and receive light. The probe(s) are used with a sensor that can register light reflected by a blockage and received by a probe(s) while in a coolant passage. Reflected light readings registered by the sensor can be used to determine whether a blockage is present.Type: GrantFiled: March 30, 2007Date of Patent: October 13, 2009Assignee: Honda Motor Co., Ltd.Inventors: Marc McDaniel, Charles Hoke, Chad J. Miller, Stephen A. Schumann
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Patent number: 7599050Abstract: A method of inspecting an inspection target surface comprises: irradiating an irradiation light having a predetermined pattern on the inspection target surface; imaging the surface irradiated with the irradiation light; and inspecting the inspection target surface based on an obtained image of the inspection target surface. The irradiation light irradiated from an irradiation face has a mesh-like pattern including meshes of a same shape. Each mesh has an irradiation area smaller than a non-irradiation area in a plane normal to the optical axis. The inspection target surface is inspected based on lightness/darkness information of an image area in the obtained image corresponding to a non-irradiated area in the inspection target surface. A light point having intermediate brightness and formed in a dark face formed within the mesh is extracted as a defect candidate.Type: GrantFiled: October 20, 2004Date of Patent: October 6, 2009Assignee: Daihatsu Motor Co., Ltd.Inventors: Chie Ishikawa, Makoto Iwata, Mamoru Sakaue, Keisuke Kuroki
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Patent number: 7583376Abstract: It is possible to detect with high precision a plurality of types of nonuniformity defects that occur in patterns formed on the surface of an examination object. A device (10) for examination of nonuniformity defects that has a light source (12) for emitting light to a photomask 50 whose surface is provided with a repeating pattern (51) in which unit patterns (53) are arrayed in a regular fashion, and a photodetector (13) for photodetecting and converting into photodetection data scattered light from the photomask, so that the photodetection data is observed to detect nonuniformity defects that have occurred in the repeating pattern, in the device further having a wavelength filter (14) for selecting and extracting one or a plurality of desired wavelength bands from the light of a plurality of wavelength bands, wherein nonuniformity defects of the repeating pattern are detected using the selected and extracted light of the wavelength band.Type: GrantFiled: November 17, 2004Date of Patent: September 1, 2009Assignee: Hoya CorporationInventors: Junichi Tanaka, Noboru Yamaguchi