Of Surface Reflection Patents (Class 356/369)
  • Patent number: 9942464
    Abstract: A method and apparatus are provided for capturing video on an electronic device having a touch screen. The method involves detecting a contact with the touch screen at a first predefined location corresponding to an image capture key, detecting movement of the contact, while continuous contact with the touch screen is maintained, from a first predefined location, and initiating video capture if the moving of the image capture key on the touch-sensitive display results in movement of the image capture key from the first predefined location to a second predefined location on the touch-sensitive display.
    Type: Grant
    Filed: September 2, 2014
    Date of Patent: April 10, 2018
    Assignee: THOMSON Licensing
    Inventor: Neil D Voss
  • Patent number: 9933357
    Abstract: An ellipsometer system with polarization state generator and polarization state analyzer components inside at least one internal environment supporting encasement, said at least one encasement being present inside said environmental chamber.
    Type: Grant
    Filed: February 3, 2017
    Date of Patent: April 3, 2018
    Assignee: J. A. WOOLLAM CO., INC.
    Inventors: Ping He, Gregory K. Pribil, Martin M. Liphardt
  • Patent number: 9933250
    Abstract: A lithographic apparatus is disclosed. The lithographic apparatus includes a scatterometer configured to measure a property of the substrate. The scatterometer includes a radiation source configured to produce a radiated spot on a target on the substrate, where the radiated spot includes positions on the target. The scatterometer further includes a detector configured to generate measurement signals that correspond to respective ones of the positions of the radiated spot and a processor configured to output, based on the measurement signals, a single value that is representative of the property of the substrate.
    Type: Grant
    Filed: November 10, 2014
    Date of Patent: April 3, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Henricus Petrus Maria Pellemans, Arie Jeffrey Den Boef
  • Patent number: 9904079
    Abstract: An alignment apparatus and an alignment method are provided. The alignment apparatus is configured to align a polarizer. The alignment apparatus comprises an angle adjustment device. The angle adjustment device is configured to: adjust an angle of the polarizer to be aligned according to an angle offset of the polarizer to be aligned in a plane where the polarizer to be aligned is located. The alignment apparatus and the alignment method reduce difficulty in alignment of non-rectangular polarizer.
    Type: Grant
    Filed: June 5, 2015
    Date of Patent: February 27, 2018
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventor: Zhouping Wang
  • Patent number: 9903806
    Abstract: An optical metrology device, such as an ellipsometer, includes a focusing system that adjusts the focal position of the metrology device in real time so that focus may be maintained during movement of the measurement locations on the sample, e.g., using closed loop control. A filtered focus signal may be used to adjust the focal position while moving to a measurement location. Additionally, the focus signal may be coarsely filtered and finely filtered, where a coarse filtered focus signal is used to adjust the focal position while moving to a measurement location and a fine filtered focus signal is used to adjust the focal position when at the measurement location. An open loop control may be used in which once at the measurement location, a filtered focus signal is used to adjust the focal position when the filtered focus signal has no offset with respect to the focus signal.
    Type: Grant
    Filed: December 17, 2013
    Date of Patent: February 27, 2018
    Assignee: Nanometrics Incorporated
    Inventor: Amit Shachaf
  • Patent number: 9879977
    Abstract: Methods and systems for achieving a small measurement box size specification across a set of metrology system parameters are presented. The small measurement box size specification is achieved by selectively constraining one or more of the sets of system parameters during measurement. A subset of measurement system parameters such as illumination wavelength, polarization state, polar angle of incidence, and azimuth angle of incidence is selected for measurement to maintain a smaller measurement box size than would otherwise be achievable if the full, available range of measurement system parameters were utilized in the measurement. In this manner, control of one or more factors that affect measurement box size is realized by constraining the measurement system parameter space. In addition, a subset of measurement signals may be selected to maintain a smaller measurement box size than would otherwise be achievable if all available measurement signals were utilized in the measurement.
    Type: Grant
    Filed: November 6, 2013
    Date of Patent: January 30, 2018
    Assignee: KLA-Tencor Corporation
    Inventor: Andrei V. Shchegrov
  • Patent number: 9874526
    Abstract: Disclosed are methods and apparatus for inspecting a semiconductor sample. This system comprises an illumination optics subsystem for generating and directing an incident beam towards a defect on a surface of a wafer. The illumination optics subsystem includes a light source for generating the incident beam and one or more polarization components for adjusting a ratio and/or a phase difference for the incident beam's electric field components. The system further includes a collection optics subsystem for collecting scattered light from the defect and/or surface in response to the incident beam, and the collection optics subsystem comprises an adjustable aperture at the pupil plane, followed by a rotatable waveplate for adjusting a phase difference of electric field components of the collected scattered light, followed by a rotatable analyzer.
    Type: Grant
    Filed: March 24, 2017
    Date of Patent: January 23, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Sheng Liu, Guoheng Zhao
  • Patent number: 9847262
    Abstract: A method is provided for in-situ monitoring of etch uniformity during plasma etching, on the basis of the detection of interferometry patterns. The method is applicable to a reactor wherein a plasma is created in the area between the surface to be etched and a counter-surface arranged essentially parallel to the surface to be etched. The occurrence of interference patterns is detected at a location that is placed laterally with respect to the area between the surface to be etched and the counter-surface. The presence of an interference pattern at a particular wavelength is observed through the detection of oscillations of the light intensity measured by an optical detector, preferably by the standard Optical Emission Spectrometry tool of the reactor. When these oscillations are no longer detectable, non-uniformity exceeds a pre-defined limit. The counter surface is arranged such that the oscillations are detected.
    Type: Grant
    Filed: December 3, 2015
    Date of Patent: December 19, 2017
    Assignees: IMEC VZW, Katholeike Universiteit Leuven, KU Leuven R & D
    Inventors: Vladimir Samara, Jean-Francois de Marneffe
  • Patent number: 9835800
    Abstract: A state of polarization (SOP) controller allows a randomly polarized input beam to be converted to a single linear polarization, while transferring substantially all of the power to the output. The input beam is split into orthogonal components and one of the components rotated and a phase difference between the components compensated for. The phase aligned components may then be recombined into a single output. The phase shifters may be reset during a reset period during which the impact on data transmission is reduced.
    Type: Grant
    Filed: March 11, 2016
    Date of Patent: December 5, 2017
    Assignee: HUAWEI TECHNOLOGIES CO., LTD.
    Inventors: Mohammad Mehdi Mansouri Rad, Hamid Mehrvar, Dominic John Goodwill
  • Patent number: 9823065
    Abstract: The invention discloses a technique that estimates micro roughness from a total sum of detection signals from plural detection systems and signal ratios, using a light scattering method. The technique rotates and translates a wafer at high speed to measure the entire surface of the wafer with high throughput. The relationship between the micro roughness and the intensity of scattered light varies according to a material of the wafer and a film thickness thereof. Moreover, calibration of an apparatus is also necessary. Thus, for instance, the invention provides a technique that has a function of correcting an optically acquired detection result using a sample which is substantially the same as a measurement target and makes the optically acquired detection result come close to a result measured by an apparatus, such as an AFM, using a different measurement principle.
    Type: Grant
    Filed: January 10, 2014
    Date of Patent: November 21, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takanori Kondo, Takahiro Jingu, Masaaki Ito, Masami Ikota
  • Patent number: 9798250
    Abstract: A lithographic apparatus including an inspection apparatus can measure the overlay error of a target in a scribelane is measured. The overlay error of the required feature in the chip area may differ from this due to, for example, different responses to the exposure process. A model is used to simulate these differences and thus a more accurate measurement of the overlay error of the feature determined.
    Type: Grant
    Filed: September 13, 2016
    Date of Patent: October 24, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Marcus Adrianus Van De Kerkhof, Leonardus Henricus Marie Verstappen
  • Patent number: 9784573
    Abstract: According to one embodiment, an adjusting unit adjusts a refracting angle of incident light with respect to a substrate, a detector detects reflected light from the substrate, and a calculating unit calculates positional deviation of the pattern based on patterns respectively reflected in reflected lights obtained from the incident light generating N number of refracting angles with respect to the substrate, where N is an integer of two or greater.
    Type: Grant
    Filed: June 11, 2015
    Date of Patent: October 10, 2017
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Hidenori Sato, Yosuke Okamoto, Nobuhiro Komine, Manabu Takakuwa
  • Patent number: 9784622
    Abstract: A photon entanglement router comprises a modified birefringent spectral filter followed by a polarization beam splitter (PBS). Frequency degenerate or non-degenerate entangled photons, generated by a collinear laser source and incident on one input port of the photon entanglement router, are comprised of congruent photons and/or incongruent photons. The invention adds a plurality of additional filter stacks at each output port such that they invert the action of the first birefringent stack at the input port. Intermediate output photons from the invention is input to two ports of an additional PBS where they are spatially projected according to their frequencies and polarizations. Two congruent photons of an entangled photon pair exit as an entangled pair in one direction, while two incongruent photons exit as an entangled pair in the orthogonal direction. If one photon is congruent and the other photon incongruent, the photons remain entangled but are spectrally divided into orthogonal directions.
    Type: Grant
    Filed: February 7, 2017
    Date of Patent: October 10, 2017
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventors: David H. Hughes, Reinhard Erdmann
  • Patent number: 9717416
    Abstract: Exemplary embodiments disclose an optical zoom probe including an aperture adjuster configured to adjust an aperture in which light transmitted by a light transmitter passes, a focus adjuster configured to focus the light passed through the aperture and adjust a focal length to an ultra-close location and a close location, and a filter which includes a center region in which incident light passes without change, and a filter region which surrounds the center region and increases a depth of focus (DOF) of light that is focused on the ultra-close location.
    Type: Grant
    Filed: December 13, 2013
    Date of Patent: August 1, 2017
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Seung-wan Lee, Eun-sung Lee, Jong-hyeon Chang, Kyu-dong Jung, Min-seog Choi
  • Patent number: 9702693
    Abstract: A metrology system for determining overlay is disclosed. The system includes an optical assembly for capturing images of an overlay mark and a computer for analyzing the captured images to determine whether there is an overlay error. The mark comprises first and second regions that each include at least two separately generated working zones, juxtaposed relative to one another, configured to provide overlay information in a first direction, and include a periodic structure having coarsely segmented elements. The mark comprises third and fourth regions that each include at least two separately generated working zones, juxtaposed relative to one another, configured to provide overlay information in a second direction, and include a periodic structure having coarsely segmented elements.
    Type: Grant
    Filed: April 22, 2016
    Date of Patent: July 11, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: Mark Ghinovker, Michael Adel, Walter D. Mieher, Ady Levy, Dan Wack
  • Patent number: 9678006
    Abstract: In an optical sensor, a light emission system emits an irradiated light of a linear polarization in a first polarization direction toward a surface of a target object having a sheet shape from an incident direction which is inclined with respect to a normal direction of the surface. A first light detection system includes a first light detector arranged on a first light path of a specular reflected light, which is emitted from the light emission system and is specularly reflected from the target object. A second light detection system includes a second light detector arranged on a second light path of a diffuse reflected light which is diffusely reflected from an incident plane on the target object. The second light detector receives second light passed by an optical element which passes a linear polarization component of a second polarization direction perpendicular to the first polarization direction.
    Type: Grant
    Filed: September 9, 2016
    Date of Patent: June 13, 2017
    Assignee: RICOH COMPANY, LTD.
    Inventors: Yoshihiro Ohba, Satoru Sugawara, Toshihiro Ishii, Fumikazu Hoshi
  • Patent number: 9671327
    Abstract: Systems and methods biochemically sense a concentration of a ligand using a sensor having a substrate having a metallic nanoparticle array formed onto a surface of the substrate. A light source is incident on the surface. A matrix is deposited over the nanoparticle array and contains a protein adapted to binding the ligand. A detector detects s-polarized and p-polarized light from the reflective surface. Spacing of nanoparticles in the array and wavelength of light are selected such that plasmon resonance occurs with an isotropic point such that ?s and ?p polarizations of the incident light result in substantially identical surface Plasmon resonance, wherein binding of the ligand to the protein shifts the resonance such that differences between the ?S and ?P polarizations give in a signal indicative of presence of the ligand.
    Type: Grant
    Filed: March 16, 2012
    Date of Patent: June 6, 2017
    Assignee: The Regents of the University of Colorado, A Body Corporate
    Inventor: Anatoliy Pinchuk
  • Patent number: 9664566
    Abstract: A photon entanglement router comprises a modified birefringent spectral filter followed by a polarization beam splitter (PBS). Frequency degenerate or non-degenerate entangled photons, generated by a collinear laser source and incident on one input port of the photon entanglement router, are comprised of congruent photons and/or incongruent photons. The invention adds a plurality of additional filter stacks at each output port such that they invert the action of the first birefringent stack at the input port. Intermediate output photons from the invention is input to two ports of an additional PBS where they are spatially projected according to their frequencies and polarizations. Two congruent photons of an entangled photon pair exit as an entangled pair in one direction, while two incongruent photons exit as an entangled pair in the orthogonal direction. If one photon is congruent and the other photon incongruent, the photons remain entangled but are spectrally divided into orthogonal directions.
    Type: Grant
    Filed: August 12, 2015
    Date of Patent: May 30, 2017
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventors: David H. Hughes, Reinhard Erdmann
  • Patent number: 9664734
    Abstract: Methods and systems for monitoring band structure characteristics and predicting electrical characteristics of a sample early in a semiconductor manufacturing process flow are presented herein. High throughput spectrometers generate spectral response data from semiconductor wafers. In one example, the measured optical dispersion is characterized by a Gaussian oscillator, continuous Cody-Lorentz model. The measurement results are used to monitor band structure characteristics, including band gap and defects such as charge trapping centers, exciton states, and phonon modes in high-K dielectric layers and embedded nanostructures. The Gaussian oscillator, continuous Cody-Lorentz model can be generalized to include any number of defect levels. In addition, the shapes of absorption defect peaks may be represented by Lorentz functions, Gaussian functions, or both. These models quickly and accurately represent experimental results in a physically meaningful manner.
    Type: Grant
    Filed: May 19, 2016
    Date of Patent: May 30, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: Natalia Malkova, Leonid Poslavsky
  • Patent number: 9658168
    Abstract: The invention relates to a method for determining optical properties by measuring intensities on a thin layer, wherein light is irradiated onto a carrier (105) that has said thin layer and that is at least partially transparent. Interferences on the at least one thin layer are measured as the relative intensity of at least one superpositioned wave, optionally using filter arrangements (113, 115, 117) provided for this purpose, whereupon the reflection coefficient(s) and/or the transmission coefficient(s) from the reflection and/or the transmission on the thin layer are determined. Preferably, the intensity of at least two superpositioned waves is measured. The light may be irradiated directly onto the carrier. The invention also relates to a device for determining optical properties by measuring intensities on a thin layer, said device comprising an analysis unit which stores at least one lookup table. The method and the device are preferably used in the area of homeland security.
    Type: Grant
    Filed: May 5, 2010
    Date of Patent: May 23, 2017
    Assignee: Biametrics GmbH
    Inventors: Johannes Landgraf, Günther Proll, Florian Pröll
  • Patent number: 9645074
    Abstract: An image processing apparatus includes an illumination unit in which illumination axes of first and second illumination light substantially coincide with an imaging axis and which illuminates an object with the first and second illumination light alternately, the first and second illumination light being respectively polarized in a first direction and a second direction that crosses the first direction; a splitter that divides returning light into at least two returning light components; and first and second polarization imaging devices that receive the returning light components. The first polarization imaging device obtains first and second polarization images polarized in the first direction while the object is being illuminated with the first and second illumination light, respectively. The second polarization imaging device obtains third and fourth polarization images polarized in the second direction while the object is being illuminated with the first and second illumination light, respectively.
    Type: Grant
    Filed: January 26, 2015
    Date of Patent: May 9, 2017
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventor: Katsuhiro Kanamori
  • Patent number: 9613300
    Abstract: Multiple pixels are selected from one or more images of an object fabricated from an unknown material captured from one or more viewing directions and one or more trained classification engines are applied to the selected pixels so as to obtain initial estimates of the material at each selected pixel. The one or more trained classification engines are each trained at a training direction and are each characterized by performance characteristics that vary based at least in part on directional deviation from that training direction. A posterior probability for the collection of selected multiple pixels is calculated, wherein the posterior probability is calculated based at least in part on the performance characteristics and directional deviation of a surface normal of the object at a selected pixel from the one or more training directions. The material of the object is classified based on the calculated posterior probability.
    Type: Grant
    Filed: June 17, 2015
    Date of Patent: April 4, 2017
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Siu-Kei Tin, Sandra Skaff
  • Patent number: 9594316
    Abstract: A surface position detecting apparatus includes a light projection system that projects a beam from an oblique direction onto a detection target surface, and a light reception system that receives a beam reflected on the detection target surface, said surface position detecting apparatus adapted to detect a surface position of the detection target surface based on an output from the light reception system. At least one of the light projection system and the light reception system includes a total reflection prism member including an internal reflection surface which totally reflects an incident beam. Upon detection of the surface position of the detection target surface, a refractive index of an optical material forming the total reflection prism member and an angle of incidence of the incident beam to the internal reflection surface of the total reflection prism member are set so as to satisfy a predetermined relation.
    Type: Grant
    Filed: March 21, 2013
    Date of Patent: March 14, 2017
    Assignee: NIKON CORPORATION
    Inventor: Yasuhiro Hidaka
  • Patent number: 9593940
    Abstract: In an optical measuring method, a first spectrum and a second spectrum are obtained from a pattern and a thin layer formed on the pattern by a deposition process using an ellipsometer respectively. A skew spectrum is obtained between the first spectrum and the second spectrum. A fourier transform operation is performed on the skew spectrum to calculate a thickness of the thin layer on the pattern.
    Type: Grant
    Filed: April 28, 2015
    Date of Patent: March 14, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Dong-Min Seo, Jang-Ik Park
  • Patent number: 9568366
    Abstract: A multidimensional spectrometer encodes frequency information into laser pulses so that a frequency insensitive detector may be used to collect data for a multi-dimensional spectrograph only from intensity information and knowledge of a modulation providing the encoding. In one embodiment the frequency encoding may be done by a conventional interferometer greatly simplifying construction of the spectrometer.
    Type: Grant
    Filed: May 15, 2015
    Date of Patent: February 14, 2017
    Assignees: Wisconsin Alumni Research Foundation, University of Zurich
    Inventors: Martin Thomas Zanni, Peter Hamm, Jan Helbing
  • Patent number: 9563946
    Abstract: The present disclosure provides an overlay metrology method, an overlay control method and an overlay control system. The overlay metrology method includes capturing a current layer image of a current overlay mark on a current layer with a current focal length and capturing a previous layer image of a previous overlay mark on a previous layer with a previous focal length. Then, the overlay metrology method further includes combining the current layer image with the previous layer image to form an overlay mark image and determining an overlay error between the current overlay mark and the previous overlay mark based on the overlay mark image.
    Type: Grant
    Filed: July 22, 2014
    Date of Patent: February 7, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yung-Yao Lee, Ying-Ying Wang, Shang-Wern Chang, Heng-Hsin Liu
  • Patent number: 9542595
    Abstract: An electronic device for analyzing a skin of a subject and identifying a cosmetic product for the subject includes one or more processors and memory storing one or more programs for execution by the one or more processors. The device transfers a digital image of at least a portion of a face of the subject. The digital image includes a plurality of pixels. Skin pixels in the plurality of pixels are identified. Color space values are identified from the skin pixels. A cosmetic product is identified at least based on the color space values. The device transfers information of the cosmetic product.
    Type: Grant
    Filed: March 25, 2014
    Date of Patent: January 10, 2017
    Assignee: BrighTex Bio-Photonics LLC
    Inventors: Rajeshwar Chhibber, Ashutosh Chhibber, Shefali Sharma
  • Patent number: 9535005
    Abstract: An instrument for measuring and analyzing surface plasmon resonance (SPR) and/or surface plasmon coupled emission on an electro-optic grating-coupled sensor surface is described herein. The sensor chip achieves SPR through a grating-coupled approach, with variations in the local dielectric constant at regions of interest (ROI) at the sensor surface detected as a function of the intensity of light reflecting from these ROI. Unlike other grating-based approaches, the metal surface is sufficiently thin that resonant conditions are sensitive to dielectric constant changes both above and below the metal surface (like the Kretschmann configuration). Dielectric constant shifts that occur as mass accumulates on the surface can be returned to reference intensities by applying voltage across the underlying electro-optic polymer.
    Type: Grant
    Filed: July 1, 2016
    Date of Patent: January 3, 2017
    Assignee: Ciencia, Inc.
    Inventors: William Page, George N. Gibson, Ernest F. Guignon
  • Patent number: 9528949
    Abstract: In a method of detecting inhomogeneity of a layer, an incident light may be irradiated to at least two regions of the layer at a first incident angle position. First reflected lights reflected from the two regions of the layer may be sensed. The incident light may be irradiated to the at least two regions of the layer at a second incident angle position. Second reflected lights reflected from the two regions of the layer may be sensed. The first reflected lights and the second reflected lights may be compared with each other to obtain the inhomogeneity of the layer. Thus, the layer having a spot may be found.
    Type: Grant
    Filed: March 5, 2014
    Date of Patent: December 27, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-Hoon Kim, Jin-A Ryu, Chang-Ho Lee, Dong-Won Kim, Jae-Ho Kim, Jung-Dae Park, Nae-Ry Yu, Pil-Kwon Jun
  • Patent number: 9500843
    Abstract: A method of calibrating a reflective focusing optics to provide a system that minimizes the effect of multiple beam reflections therewithin on polarization state reflective optics system that preferably requires the presence of both convex and a concave mirrors that have beam reflecting surfaces, the application of which achieves focusing of a beam of electromagnetic radiation onto a sample, (which can be along a locus differing from that of an input beam), with minimized effects on a polarization state of an input beam state of polarization based on adjusted angles of incidence and reflections from the various mirrors involved.
    Type: Grant
    Filed: August 8, 2016
    Date of Patent: November 22, 2016
    Assignee: J.A. WOOLLAM CO., INC
    Inventors: Martin M. Liphardt, Jeffrey S. Hale, Ping He, Galen L. Pfeiffer
  • Patent number: 9500582
    Abstract: An arrangement for optically detecting buried layers of flat objects having a plurality of layers, in particular wafers, containing a radiation source for illuminating the surface of the object at an angle; a polarization filter arranged in the beam path; and a detector for detecting radiation reflected by the surface of the object or transmitted by the object; is characterized in that that layer of the object which is closest to the radiation source at least partially transmits the radiation from the radiation source; the polarization filter transmits only radiation which is polarized parallel to the plane of incidence; and the surface of the object is illuminated at the Brewster angle. The surface of the object is preferably illuminated with unpolarized radiation and the polarization filter is arranged in the beam path between the surface of the object and the detector.
    Type: Grant
    Filed: September 29, 2014
    Date of Patent: November 22, 2016
    Assignee: HSEB Dresden GmbH
    Inventors: Bernd Srocka, Ralf Langhans
  • Patent number: 9442063
    Abstract: The present invention includes generating a three-dimensional design of experiment (DOE) for a plurality of semiconductor wafers, a first dimension of the DOE being a relative amount of a first component of the thin film, a second dimension of the DOE being a relative amount of a second component of the thin film, a third dimension of the DOE being a thickness of the thin film, acquiring a spectrum for each of the wafers, generating a set of optical dispersion data by extracting a real component (n) and an imaginary component (k) of the complex index of refraction for each of the acquired spectrum, identifying one or more systematic features of the set of optical dispersion data; and generating a multi-component Bruggeman effective medium approximation (BEMA) model utilizing the identified one or more systematic features of the set of optical dispersion data.
    Type: Grant
    Filed: June 15, 2012
    Date of Patent: September 13, 2016
    Assignee: KLA-Tencor Corporation
    Inventors: Ming Di, Torsten Kaack, Qiang Zhao, Xiang Gao, Leonid Poslavsky
  • Patent number: 9442016
    Abstract: A reflective optics system that preferably requires the presence of both convex and a concave mirrors that have beam reflecting surfaces, the application of which achieves focusing of a beam of electromagnetic radiation onto a sample, (which can be along a locus differing from that of an input beam), with minimized effects on a polarization state of an input beam state of polarization based on adjusted angles of incidence and reflections from the various mirrors involved.
    Type: Grant
    Filed: November 4, 2014
    Date of Patent: September 13, 2016
    Assignee: J.A. WOOLLAM CO., INC
    Inventors: Martin M. Liphardt, Jeffrey S. Hale, Ping He, Galen L. Pfeiffer
  • Patent number: 9404872
    Abstract: The present invention may include an illumination source configured to illuminate a surface of a sample, a detector configured to detect at least a portion of light reflected from the surface of the sample, a selectably configurable optical system comprising: a rotatable polarizing element disposed in the illumination arm of the optical system, an analyzing element disposed in the collection arm of the optical system, and a rotatable-translatable compensator element disposed in the collection arm of the optical system, and a control system communicatively configured to selectably configure the optical system in the a rotating compensator (RCSE) mode, a rotating polarizer (RPSE) mode, or a rotating polarizer and compensator (RPRC) mode.
    Type: Grant
    Filed: June 29, 2012
    Date of Patent: August 2, 2016
    Assignee: KLA-Tencor Corporation
    Inventors: Haiming Wang, Guorong V. Zhuang, Shankar Krishnan, Klaus Flock, Johannes D. de Veer
  • Patent number: 9395406
    Abstract: An inspection method for a semiconductor light-emitting device includes an image capturing step for irradiating light to the semiconductor light emitting device so as to excite an active layer and capturing an image of photoluminescence released from the active layer, an inspection region extracting step for extracting an inspection region of the captured image, a luminance average determination step for, determining as defective when a luminance average is smaller than a predetermined threshold, a luminance variance determination step for determining as defective when a luminance variance is larger than a predetermined threshold, and a total determination step for totally determining the semiconductor light-emitting device as defective when determined the semiconductor light emitting device as defective in at least one of the two determination results.
    Type: Grant
    Filed: January 30, 2014
    Date of Patent: July 19, 2016
    Assignee: NICHIA CORPORATION
    Inventor: Masatoshi Abe
  • Patent number: 9383570
    Abstract: An image analysis method includes acquiring images of spatially different analysis regions. Each of the images of the analysis regions is constituted by pixels including a plurality of data acquired simultaneously or time-serially. The method further includes obtaining a cross-correlation between two analysis regions by using data of pixels of images of the analysis regions.
    Type: Grant
    Filed: October 30, 2014
    Date of Patent: July 5, 2016
    Assignee: OLYMPUS CORPORATION
    Inventor: Akemi Suzuki
  • Patent number: 9373052
    Abstract: The disclosure concerns processing of electronic images, such as hyperspectral, or multispectral images. In particular, but is not limited to, a method, software and computer for estimating shape information or a photometric invariant of a location of image of a scene. The image data (300) indexed by wavelength ? and polarization filter angle ?. For each wavelength ? index, a polarization angle ? is estimated from the image data (300) by the processor (810). The processor (810) then also estimates the shape information (such as azimuth ?, such as zenith ?, or surface normal) or photometric invariants (such as refractive index) based on the estimated polarization angle ? for each wavelength index ?. Greater accuracies can be achieved in the estimated shape information and/or photometric invariants by using wavelength-indexed data. Further, surface information or photometric invariant can be estimated based upon polarization in a single-view hyperspectral or multi-spectral imagery.
    Type: Grant
    Filed: April 20, 2011
    Date of Patent: June 21, 2016
    Assignee: NATIONAL ICT AUSTRALIA LIMITED
    Inventors: Antonio Robles-Kelly, Cong Phuoc Huynh
  • Patent number: 9360302
    Abstract: A measurement unit comprising a light source and a photodetector may be formed in a cavity in a substrate. The light source produces light that impinges a material layer and is reflected back to the photodetector. Through methods such as interferometry and ellipsometry, the thickness of the material layer may be calculated from the light intensity data measured by the photodetector. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
    Type: Grant
    Filed: November 16, 2012
    Date of Patent: June 7, 2016
    Assignee: KLA-Tencor Corporation
    Inventors: Earl Jensen, Kevin O'Brien, Farhat Quli, Mei Sun
  • Patent number: 9360369
    Abstract: A system for easily determining average ellipsometric parameters based on data obtained from two different locations on a planar or non-planar shaped object, along with its method of use.
    Type: Grant
    Filed: June 20, 2015
    Date of Patent: June 7, 2016
    Assignee: J.A. WOOLLAM CO., INC
    Inventors: Galen L. Pfeiffer, Martin M. Liphardt
  • Patent number: 9354118
    Abstract: A multiple wavelength ellipsometer system for use in thin film characterization is disclosed. The light source for the system may include sequentially scanned multiple light emitting diodes or laser diodes. The polarization state detector may comprise no moving parts, and utilizes economical uncoated glass plates as beam splitters. The system compensates for potential measurement errors induced by misalignment of the input beam angle to the polarization state detector via a paired arrangement of the beam splitters. To provide improved accuracy in the analysis of data acquired by the system, methods herein actively compensate for the relatively large bandwidth of a preferable light emitting diode source.
    Type: Grant
    Filed: February 6, 2014
    Date of Patent: May 31, 2016
    Assignee: Film Sense, LLC
    Inventors: Blaine D. Johs, Bruce A. Hadwiger
  • Patent number: 9339180
    Abstract: An ophthalmic optical power measurement device can include a light source configured to direct an input beam of light into the eye of a patient. The ophthalmic optical power measurement device can also include an aperture configured to receive an output beam that consists of light from the input beam that scatters from a location on the retina of the eye and exits through the pupil of the eye. The ophthalmic optical power measurement device can also include a detector configured to receive the output beam after it has passed through the aperture. A processor can be configured to determine the size of a spot created by the output beam on the detector, and to determine the optical power of the eye based upon the size of the spot.
    Type: Grant
    Filed: June 1, 2015
    Date of Patent: May 17, 2016
    Assignee: WaveTec Vision Systems, Inc.
    Inventors: Richard J. Michaels, Aric K. Plumley
  • Patent number: 9341833
    Abstract: A device for increasing the depth discrimination of optical imaging systems includes elements for structuring illumination light in an illumination beam of the optical imaging system by application of a grating-like pattern in a conjugate object plane of the optical imaging system. The device further elements for varying the position of the grating-like patterns along an optical axis of the illuminating beam, and elements that vary the position of an image of the grating-like pattern on a specimen in an object plane. The invention may include a grating changer connected to an electronic control system or to a control program of the optical imaging system for automatically changing the grating-like pattern to at least one further grating-like pattern and/or for removing the grating like pattern from the illuminating beam path.
    Type: Grant
    Filed: September 13, 2011
    Date of Patent: May 17, 2016
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Joerg Schaffer, Tim Plohnke
  • Patent number: 9297745
    Abstract: The present invention provides a measuring apparatus which measures a shape of an object to be measured, comprising an emitting unit configured to emit pattern light, an optical system configured to irradiate the object with the pattern light emitted from the emitting unit, a deflection unit configured to deflect light emitted from the optical system, an image sensing unit configured to sense an image of the object irradiated with the pattern light, and a processing unit configured to determine the shape of the object based on the image of the object sensed by the image sensing unit, wherein the deflection unit includes a deflection element, wherein the measuring apparatus irradiates the object with light deflected by the deflection element, and a direction deflected by the deflection element differs depending on a polarization state of incident light in the deflection element.
    Type: Grant
    Filed: November 6, 2014
    Date of Patent: March 29, 2016
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Akihiro Hatada, Yoshiyuki Kuramoto
  • Patent number: 9261501
    Abstract: A biosensor system for the detection of particles includes a biosensor cartridge having a sensor surface. A biosensor magnet assembly is disposed on one side of the cartridge for generating a magnetic field effective at the cartridge and the sensor surface. The biosensor magnet assembly includes at least two magnetic sub-units separated by a gap. A first optical detection system detects the particles arranged at the same side of the cartridge as the magnet assembly. The magnet assembly and the first optical sensor are disposed such that the optical detection is accomplished through the gap of the magnet assembly.
    Type: Grant
    Filed: August 8, 2014
    Date of Patent: February 16, 2016
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventors: Johannes Joseph Hubertina Barbara Schleipen, Joannes Baptist Andrianus Dionisius Van Zon, Derk Jan Wilfred Klunder, Toon Hendrik Evers, Josephus Arnoldus Henricus Maria Kahlman, Ron Martinus Laurentius Van Lieshout, Mikhail Mikhaylovich Ovsyanko
  • Patent number: 9244008
    Abstract: A surface plasmon resonance sensor element includes a thin metallic layer, an optical construction disposed on the thin metallic layer for directing light to and away from the thin metallic layer, and an absorptive layer disposed on the thin metallic layer opposite the optical construction. The absorptive layer includes a polymer of intrinsic microporosity having an average pore volume of at least 0.4 cubic nanometers.
    Type: Grant
    Filed: June 13, 2012
    Date of Patent: January 26, 2016
    Assignee: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: Myungchan Kang, Bing Hao, Brian K. Nelson
  • Patent number: 9240350
    Abstract: A technique for forming 3D structures is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for forming 3D structures. The method may comprise providing a substrate comprising at least two vertically extending fins that are spaced apart from one another to define a trench; depositing a dielectric material in the trench between the at least two vertically extending fins; providing an etch stop layer within the dielectric material, the etch stop layer having a first side and a second opposite side; removing the dielectric material near the first side of the etch stop layer.
    Type: Grant
    Filed: May 15, 2012
    Date of Patent: January 19, 2016
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Ludovic Godet, Christopher R. Hatem, George D. Papasouliotis
  • Patent number: 9214035
    Abstract: There is provided an image processing device including a body hair detection unit that detects a body hair region corresponding to body hair from a process target image that includes skin, a texture structure estimation unit that estimates a structure of skin texture in the process target image, and an interpolation unit that interpolates the body hair region detected by the body hair detection unit based on the structure of the skin texture estimated by the texture structure estimation unit.
    Type: Grant
    Filed: December 16, 2014
    Date of Patent: December 15, 2015
    Assignee: Sony Corporation
    Inventors: Yusuke Nakamura, Shinichiro Gomi, Masaru Suzuki
  • Patent number: 9200998
    Abstract: Methods and systems are provided to avoid the rotation action with the polarizer and the analyzer in complex ellipsometric measurement and repeated processes. In particular, methods and systems are provided which polarize the incident light in a fixed azimuthal angle then illuminate the polarized light onto the target surface, analyze the surface polarized characteristics light in a fixed azimuthal angle, and obtain the light intensity and phase information corresponding to the target surface. Then, based on the relationship between the characteristic information detected by electromagnetic wave and the light intensity information, the disclosed methods and systems obtain the characteristic information of the target surface.
    Type: Grant
    Filed: September 3, 2009
    Date of Patent: December 1, 2015
    Assignee: RAINTREE SCIENTIFIC INSTRUMENTS (SHANGHAI) CORPORATION
    Inventors: Jiang-tao Dang, Ningning Pan, Haijun Gao
  • Patent number: 9188875
    Abstract: Disclosed are methods, apparatuses, and lithographic systems for calibrating an inspection apparatus. Radiation is projected onto a pattern in a target position of a substrate. By making a plurality of measurements of the pattern and comparing the measured first or higher diffraction orders of radiation reflected from the pattern of different measurements, a residual error indicative of the error in a scatterometer may be calculated. This error is an error in measurements of substrate parameters caused by irregularities of the scatterometer. The residual error may manifest itself as an asymmetry in the diffraction spectra.
    Type: Grant
    Filed: December 1, 2009
    Date of Patent: November 17, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Hugo Augustinus Joseph Cramer, Maurits Van Der Schaar
  • Patent number: 9184102
    Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.
    Type: Grant
    Filed: September 24, 2014
    Date of Patent: November 10, 2015
    Assignee: NOVA MEASURING INSTRUMENTS LTD.
    Inventors: Moshe Finarov, Boaz Brill