Abstract: A method, includes illuminating a structure of a metrology target with radiation having a linear polarization in a first direction, receiving radiation redirected from the structure to a polarizing element, wherein the polarizing element has a polarization splitting axis at an angle to the first direction, and measuring, using the sensor system, an optical characteristic of the redirected radiation.

Abstract: Underwater navigational systems and methods utilizing sunlight polarized via scattering through the water column that does not require an underwater vehicle to surface or use a global position system to maintain precise navigational positions and headings. These navigational systems and methods may be employed by manned or unmanned underwater vehicles and may be utilized by individual units and by units operating in a swarm.

Abstract: An ellipsometer includes a focusing system that uses an image of the measurement spot to determine a best focal position for the ellipsometer. The focus signal is produced by splitting off the ellipsometer measurement spot before the signal is analyzed by a polarizer thereby avoiding imagining the spot with a modulated intensity. The focus signal is imaged on a sensor array and based on the position of the spot on the sensor array, the focal position of the ellipsometer may be determined. A single image may be used to determine the focal position of the ellipsometer permitting a real time focus position measurement.

Abstract: A sensor arrangement characterizes particles. The arrangement has an emitter with a laser source that generates a laser beam; a mode converter that generates a field distribution of the laser beam, which at each position has a different combination of a local intensity and a local polarization direction of the laser beam; and focusing optics that focus the field distribution of the laser beam onto at least one measurement region, through which the particles pass, in a focal plane. A receiver is also provided with analyzer optics configured to determine polarization-dependent intensity signals of the field distribution of the laser beam in the at least one measurement region; and an evaluator configured to characterize the particles, including the particle position, the particle velocity, the particle acceleration, or the particle size, using the polarization-dependent intensity signals.

Abstract: An optical metrology device uses a multi-wavelength beam of light that has azimuthally varying polarization states and/or phase states, referred to as a vortex beam. The metrology device focuses the vortex beam on a sample under test over a large range of angles of incidence. The metrology device may detect an image of the vortex beam reflected from the sample and measure the polarization state of the return light as function of the angle of incidence and the azimuth angle, which may be further measured at a plurality of different wavelengths. The vortex beam includes azimuthally varying polarization states, thereby enabling measurement of all desired polarization states without requiring the use of moving optical components. The polarization state information detected over multiple angles of incidence and wavelengths provides data with which an accurate determination of one or more characteristics of a sample may be determined.

Abstract: An ellipsometer uses a broadband light source and a Fresnel cone to produce a simultaneous broadband polarization state generator with no moving parts. The detector of the ellipsometer includes a diffractive element to spatially separate the wavelengths of the light from the sample. The wavelengths may be spatially separated sufficiently that there is no overlap of bands of wavelengths when imaged by a two-dimensional sensor or may be temporally separated. Additionally, the detector separates and simultaneously analyzes the polarizations states of the light from the sample so there is no overlap of polarization states when imaged by a two-dimensional sensor and no moving parts are used. The resulting image with separated wavelengths and polarization states may be used to determine at least a partial Mueller matrix for the sample.

Abstract: Methods, systems, and non-transitory computer readable medium are described for prescriptive analytics in highly collinear response space. A method includes receiving film property data associated with manufacturing parameters of manufacturing equipment. The method further includes determining that the film property data is correlated and is different from target data. The method further includes selecting a set of data points of the film property data that are orthogonal to the target data. The method further includes performing feature extraction on the set of data points. The method further includes determining, based on the feature extraction, updates to one or more of the manufacturing parameters to meet the target data.

Abstract: A method to change an etch parameter of a substrate etching process, the method including: making a first measurement of a first metric associated with a structure on a substrate before being etched; making a second measurement of a second metric associated with a structure on a substrate after being etched; and changing the etch parameter based on a difference between the first measurement and the second measurement.

Abstract: Provided is a culture-medium-monitoring apparatus including: an optical measurement unit that includes an illumination light source and a collecting lens that radiate an illumination light onto a culturing liquid, a retroreflective member that has an array in which micro-reflective elements are arrayed, that is disposed so as to sandwich the vessel between the retroreflective member, and the illuminating light source and the collecting lens, and that reflects the illumination light passed through the culturing liquid in the vessel, and a light detector that detects an intensity of the illumination light passed through the culturing liquid in the vessel after being reflected by the retroreflective member; and a control portion that causes the intensity of the illumination light to be repeatedly detected at a prescribed timing, and that determines a state of the culturing liquid on the basis of a change over time in the intensity of the illumination light.

Abstract: A film thickness measurement device includes a light output unit that outputs measurement light, a spectroscopic detection unit that detects detection light, and an analysis unit that compares a measured reflectance for each wavelength of a measurement object with a theoretical reflectance and analyzes a film thickness of a first film and a film thickness of a second film. The analysis unit acquire candidates for optimal solutions of the film thicknesses using a result of comparison between the measured reflectance and the theoretical reflectance for each wavelength of the measurement object in a first wavelength range and determines the optimal solutions of the film thicknesses out of the candidates for the optimal solutions using a result of comparison between the measured reflectance and the theoretical reflectance for each wavelength of the measurement object in a second wavelength range.

Abstract: Disclosed are a modulated terahertz (THz) signal deflector and a preparation method thereof. The modulated THz signal deflector includes: a first transparent substrate and a second transparent substrate that are oppositely disposed, a liquid crystal layer, a transparent electrode layer, and a photo-alignment layer, wherein the photo-alignment layer has a control graph in which a molecule director is periodically and gradiently distributed along a specific direction, and the control graph is configured to control a liquid crystal molecule director in the liquid crystal layer to be periodically and gradiently distributed along a specific direction to form a blazed-grating phase distribution based on a geometric phase, and deflect an incident circularly polarized THz signal to a specific angle. The deflector provided in the present disclosure can deflect a THz signal to a specific angle, and can switch signal deflection and non-deflection functions by powering up a transparent electrode.

Abstract: Included are: a laser light source which emits a plurality of laser beams; an aspherical lens which the plurality of laser beams emitted from the laser light source enters and which converts the plurality of laser beams into convergent beams; and a phosphor which is irradiated with the convergent beams from the aspherical lens as excitation beams to generate fluorescence, wherein the plurality of laser beams have different spread angles in a horizontal direction and a vertical direction and enter the aspherical lens while arranged in a direction in which the spread angle is smaller, from among the horizontal direction and the vertical direction, and the aspherical lens has a function of equalizing a light intensity in a direction in which the spread angle is larger, from among the horizontal direction and the vertical direction.

Abstract: A terahertz spectrum test device and system includes a femtosecond fiber laser configured to generate a pump light and a probe light. The pump light excites a terahertz transmitter to generate terahertz waves which are transmitted to a sample suspension device to irradiate a suspended to-be-tested sample, and the probe light is directly transmitted to a terahertz detector. The terahertz detector receives the terahertz waves transmitted from the sample suspension device, and then transmits the terahertz waves and the probe light together to a signal processing circuit to obtain a corresponding terahertz time-domain spectrum. By adoption of the terahertz spectrum test device and system, the to-be-tested sample need not be fixed with a clamp or other instruments, so that terahertz waves will not irradiate to the instrument used for fixing the to-be-tested sample during a terahertz spectrum test, which may otherwise affect the test result.

Abstract: A method for X-ray scatterometry includes receiving a first distribution of an X-ray beam scattered from a sample. The first distribution exhibits asymmetry with respect to a reference axis. A correction is applied to the first distribution, so as to produce a second distribution in which a level of the asymmetry is reduced relative to the first distribution. One or more parameters of the sample are estimated based on the second distribution.

Abstract: A method and apparatus are provided for registering a base recorded image (9) of an object or terrain with a secondary recorded image (10) of the object or terrain, using a base image sensor model (12), secondary image sensor model (13) and elevation information (11). A plurality of biases (24) and respective matched biases (29) are applied to the secondary image sensor (model 13) and base image sensor model (12), to determine a plurality of corrected sensor models (26) and respective nominally corrected base image sensor models (31). Each corrected sensor model (26) and respective nominally corrected base image sensor model (31) is used to reproject (27) the secondary recorded image (10), and in each case the reprojected secondary recorded image is correlated (19) with the base recorded image (12) to ascertain a correlation score (20) and adjustments to the bias corrections (32). The correlation score being evaluated to determine optimally corrected sensor models and and/or an optimally transformed image.

Abstract: An image forming apparatus includes an image holding unit that holds an image that is formed of a developer, the image being intended to be transferred onto a medium, and an image that is not intended to be transferred onto a medium, a transfer unit that transfers the image that is intended to be transferred onto a medium onto a medium, a removing unit that removes the image that is not intended to be transferred onto a medium from the image holding unit, and a forming unit that forms the image that is not intended to be transferred onto a medium onto the image holding unit by using a developer and that has a first forming mode for a first medium and a second forming mode for a second medium that has a transfer sensitivity lower than a transfer sensitivity of the first medium, the forming unit being configured to use a larger amount of the developer in formation of the image that is not intended to be transferred onto a medium in the first forming mode than in the second forming mode.

Abstract: A method for controlling a semiconductor fabrication process includes determining a representative feature within a given area on a wafer. The representative feature has a critical dimension (CD) response to a specified process control parameter that is correlated to a CD response to the specified process control parameter of other features within the given area on the wafer. A CD adjustment is determined for the representative feature to achieve a target CD for the representative feature. The CD response to the specified process control parameter for the representative feature and the CD adjustment for the representative feature are used to determine an adjustment to the specified process control parameter that will drive a CD of the representative feature to the target critical dimension for the representative feature. A process controller is updated to implement the adjustment to the specified process control parameter during subsequent processing of another wafer.

Abstract: Techniques are disclosed for depth map generation in a structured light system where an optical transmitter is tilted relative to an optical receiver. The optical transmitter has a transmitter optical axis around which structured light spreads, and the optical receiver has a receiver optical axis around which a reflection of the structured light can be captured. The transmitter optical axis and the receiver optical axis intersect one another. A processing circuit compensates for the angle in the tilt in the reflected pattern to generate the depth map.

Abstract: Systems and methods for home monitoring and detection of febrile neutropenia in a patient are provided. The system includes a photoplethysmographic sensor for sensing photoplethysmographic signals of the patient, and one or more blood borne parameter sensors for sensing parameters in the patient's blood. A febrile neutropenia monitoring application receives information sensed by the photoplethysmography sensor and the one or more blood borne parameter sensors and determines, based on the received information, the presence or deterioration of febrile neutropenia.

Abstract: A surgical navigation system is provided. The surgical navigation system comprises a camera system comprising at least one camera. The camera system is capable of capturing images of light that is filtered through at least three different polarization angles. The surgical navigation system further comprises a processor having access to three dimensional image data of a surgical object. The processor is configured to determine first surface normals from the three dimensional image data of the surgical object. The processor is further configured to determine second surface normals from at least three images captured by the camera system of the surgical object under different polarization angles. The processor is configured to align the first surface normals with the second surface normals. Furthermore, a method for operating a surgical navigation system is provided.

Abstract: The present inventive concepts comprises linearly polarizing light, splitting the linearly polarized light into a first light and a second light, modulating the first light and the second light to have a phase difference to produce an output wave light, converting the output wave light to have a linear shape in a first direction to radiate the converted output wave light to a measured object, receiving a measurement light coming out of the measured object and linearly polarizing the first light and the second light of the measurement light to generate an interference light, and obtaining from the interference light an image of the measured object. The measured object can be scanned in a second direction intersecting the first direction or may be scanned rotationally about an axis in a third direction perpendicular to the first and second directions.

Abstract: A computer program product, a computerized method for configuring an inspection system and an inspection system. The inspection system may include an image acquisition module that comprises illumination optics and collection optics, a controller; and a processor. The image acquisition module may be arranged to acquire a group of first images of an object segment. Different first images of the group of first images are acquired while the inspection system is configured with different polarization configurations that belong to a first group of polarization configurations.

Abstract: A method for annealing a semiconductor die is provided. Information regarding layout of the semiconductor die is received. At least one annealing orbit on the semiconductor die is obtained according to the received information. An alignment procedure is performed on a plurality of alignment marks of the semiconductor die according to the received information. The semiconductor die is positioned according to the alignment marks. A laser beam with a first laser parameter is projected onto the positioned semiconductor die along the annealing orbit, so as to anneal a first portion of the positioned semiconductor die covered by the annealing orbit. The positioned semiconductor die is partially covered by the annealing orbit.

Abstract: A multi-angle colorimeter includes an index calculation unit that calculates, based on a predetermined calculation formula, an index corresponding to a particle diameter of a glittering material, which is used for metallic coating or pearl coating, using optical parameters used in color evaluation of the metallic coating or pearl coating on a surface of an object.

Abstract: A spectroscope includes a first substrate and a second substrate opposite to each other; a light introducing assembly on a side of the first substrate facing away from the second substrate; a temperature adjusting assembly between the first substrate and the second substrate; a liquid crystal dimming assembly between the first substrate and the second substrate, wherein the temperature adjusting assembly is configured to adjust a temperature of the liquid crystal dimming assembly, so as to adjust spectrum of light passing through the liquid crystal dimming assembly; a spectroscopic grating on the first substrate; a reflector on the second substrate and configured to reflect incident light introduced by the light introducing assembly to the spectroscopic grating; and a plurality of sensors configured to receive the incident light after being subjected a light splitting by the spectroscopic grating. A wavelength of the incident light received by each sensor is different.

Abstract: An inspection apparatus, method, and system are described herein. An example inspection apparatus includes an optical system and an imaging system. The optical system may be configured to output an illumination beam incident on a target including one or more features, the illumination beam polarized with a first polarization when incident on the target. The imaging system may be configured to obtain intensity data representing at least a portion of the illumination beam scattered by the one or more features, where the portion of the illumination beam has a second polarization orthogonal to the first polarization. The inspection apparatus may be further configured to generate image data representing an image of each of the feature(s) based on the intensity data, and determine a measurement of a parameter of interest associated with the feature(s) based on an amount of the portion of the illumination beam having the second polarization.

Abstract: In cycle etching in which a depo process and an etching process are repeated, a depo film thickness over a pattern is controlled precisely, and etching is executed to have a desired shape stably for a long time.

Abstract: A detection system for measuring one or more conditions within a predetermined area includes a fiber harness having at least one fiber optic cable for transmitting light. The at least one fiber optic cable defines a node arranged to measure the one or more conditions. A control system is operably coupled to the fiber harness such that a signal indicative of scattered light associated with the node is transmitted to the control system. The control system analyzes the signal associated with the node in one or more of a frequency domain, time-frequency domain, time domain, and spatial domain, to determine at least one of a presence and magnitude of the condition within the predetermined area.

Abstract: Devices and methods for sampling an analog signal to perform data analysis are disclosed. The sampling devices and corresponding methods include a detector module that measures a response generated from a sample, an analog to digital converter that samples the analog signal, received from the detector module, and converting it into a digital signal, a sampling rate of the converter being faster than the response of the sample; and a logic circuit coupled to the converter that processes the digital signal in a frequency domain to generate a reduced digital data signal, the logic circuit processing the digital signal acquired from the converter to generate a continuous data transfer to a processing system.

Abstract: An optical metrology device produces beams of light with varying wavelengths in a spectral range for measurement of a sample that is at least partially transparent to the spectral range. The light is obliquely incident on the sample, where a portion of the light is reflected off the top surface and a portion is transmitted through the sample and is reflected off the bottom surface. The incident light and/or reflected light is polarized and a phase modulator, such as a photoelastic modulator or electrooptic modulator, is adjusted based on the wavelengths in each beam of light to produce a same retardation of polarization for each beam of light. The reflected light that is received by a detector does not include light reflected from the bottom surface of the sample. A characteristic of a buried structure below the top surface of the sample is determined using the detected reflected light.

Abstract: In order to distinguish between a deterioration in a received optical signal strength resulting from optical axis deviation, and a deterioration in the received optical signal strength due to the effects of dust and the like, this detecting system is provided with: a transmitter provided with a light emitting unit for transmitting a first optical signal and a second optical signal having mutually different wavelengths and divergence angles; and a receiver provided with a detecting unit for receiving the first and second optical signals and outputting a first reception signal indicating the reception strength of the first optical signal, and a second reception signal indicating the reception strength of the second optical signal, and an identification unit for determining a state of propagation of the first and second optical signals on the basis of an amount of variation in the first and second reception signals.

Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.

Abstract: An integrated system operation method is disclosed that includes the following steps: the film of a substrate is measured by a metrology apparatus to obtain a film information. The substrate is moved from the metrology apparatus to a process apparatus adjacent to the transfer apparatus. The film information is sent to the process apparatus. A film treatment is applied to the substrate in accordance with the film information.

Abstract: A method for determining a property of an object positioned on a photo-sensitive polyimide layer, wherein the photo-sensitive polyimide layer is positioned on a lower layer that is a radiation reflecting layer, the method may include illuminating, by an illumination unit, an area of the photo-sensitive polyimide layer with first ultraviolet radiation; sensing, by a first sensor, a first reflected ultraviolet radiation that was reflected from the area; and determining, by a processor, based at least in part on the first reflected ultraviolet radiation, the property of the object.

Abstract: An object capturing device configured to capture an object present in a measurement target space includes a light emission unit, a light receiving unit, a light scanning unit configured to cause measurement light emitted at a predetermined wavelength from the light emission unit to head toward a measurement target space to perform scanning, and to guide reflected light from an object present in the measurement target space with respect to the measurement light to the light receiving unit, and a polarization filter disposed in the light scanning unit, the polarization filter including a polarizer configured to allow only light vibrating in a first direction in the measurement light to transmit, and an analyzer configured to allow only light vibrating in a second direction perpendicular to the first direction in the reflected light to transmit.

Abstract: Methods and systems for performing co-located measurements of semiconductor structures with two or more measurement subsystems are presented herein. To achieve a sufficiently small measurement box size, the metrology system monitors and corrects the alignment of the measurement spot of each metrology subsystem with a metrology target to achieve maximum co-location of the measurement spots of each metrology subsystem with the metrology target. In another aspect, measurements are performed simultaneously by two or more metrology subsystems at high throughput at the same wafer location. Furthermore, the metrology system effectively decouples simultaneously acquired measurement signals associated with each measurement subsystem. This maximizes signal information associated with simultaneous measurements of the same metrology by two or more metrology subsystems.

Abstract: An exemplary optical apparatus includes a coherent source of light having a frequency controlled by command signals. One surface of a spiral phase plate resonator receives the light and the light exits from different regions of another surface dependent on the frequency of the light. A fixed reflector is mounted adjacent the another surface to reflect the exiting light at about a 90 degree angle relative to the path of the exiting light. A source of the command signals sends different values of the command signals to the coherent light source to produce corresponding frequencies of the light that determine a particular region from which the light exits the another surface and hence a location on the fixed reflector where the light will be reflected. By changing the frequency of the light, the light is output in a plane by the optical apparatus with no physically moving components.

Abstract: A distance measuring method and an electronic laser distance measuring module, for determining a distance to a target object, wherein the transmitted signal is emitted with selected polarization states by a transmitting unit of the laser distance measuring module. The transmitted signal is emitted and the received signal is acquired such that a polarization identifier of the polarization state of the transmitted signal adheres to the received signal and an evaluation of the received signal is derived based on the polarization identifier, to take into consideration multiple reflections during the processing of the received signal to determine the distance.

Abstract: This optical analyzing device is provided with a light source, a detector, a substrate having a metal film on at least one surface thereof, and an optical element for introducing a light beam from the light source to the substrate and delivering the light beam from the substrate toward the detector. A plurality of sample regions for holding samples are provided on the metal film; and a portion of the light beam from the light source is irradiated to any one of the sample regions, is reflected, at least once, by the surface of the substrate on the opposite side of the side on which the sample regions are provided, and is not irradiated to a sample region other than the aforementioned sample region in the path thereof until the portion of the light beam is delivered by the optical element.

Abstract: Methods and systems for optimizing a set of measurement library control parameters for a particular metrology application are presented herein. Measurement signals are collected from one or more metrology targets by a target measurement system. Values of user selected parameters of interest are resolved by fitting a pre-computed measurement library function to the measurement signals for a given set of library control parameters. Values of one or more library control parameters are optimized such that differences between the values of the parameters of interest estimated by the library based measurement and reference values associated with trusted measurements of the parameters of interest are minimized. The optimization of the library control parameter values is performed without recalculating the pre-computed measurement library.

Abstract: Apparatuses and methods are disclosed for assessing the texture of skin using images thereof. In exemplary embodiments, a texture map of an area of skin is generated from a combination of a standard white light image, a parallel-polarized image, and a cross-polarized image of the area of skin. The texture map is then flattened to remove the underlying curvature of the skin. A texture roughness metric is then generated based on the flattened texture map. An image of the texture map and the metric can be displayed to provide visual and alphanumeric representations of the texture of skin, thereby facilitating the comparison of baseline and follow-up images of the skin, such as those taken before and after treatment.

Abstract: A method, includes illuminating a structure of a metrology target with radiation having a linear polarization in a first direction, receiving radiation redirected from the structure to a polarizing element, wherein the polarizing element has a polarization splitting axis at an angle to the first direction, and measuring, using the sensor system, an optical characteristic of the redirected radiation.

Abstract: A material transport property measurement system includes an ellipsometry system, a heat capacity measurement system, and a controller. The ellipsometry system has a light source to generate a light which passes through a polarizer and shines on a sample. The sample reflects the light to an integrated polarization analyzer, which includes multiple polarizers with different polarization angles distributed from 0 to 180 degrees. A detector assembly includes multiple detectors corresponding to the multiple polarizers to detect light passing through the respective polarizers and generate multiple first electrical signals. The heat capacity measurement system measures a temperature parameter of the sample using a non-contact method, and outputs a second electrical signal. The controller analyzes the second and the multiple first electrical signals to obtain the transport properties of the material. A material transport property measurement method is also provided.

Abstract: A broadband radiation source is disclosed. The system may include a plasma containment vessel configured to receive laser radiation from a pump source to sustain a plasma within gas flowed through the plasma containment vessel. The plasma containment vessel may be further configured to transmit at least a portion of broadband radiation emitted by the plasma. The system may also include a recirculation gas loop fluidically coupled to the plasma containment vessel. The recirculation gas loop may be configured to transport heated gas from an outlet of the plasma containment vessel, and further configured to transport cooled gas to an inlet of the plasma containment vessel.

Abstract: An apparatus includes a reactive species source, a spectral measurement volume, a light source to emit a light beam into the spectral measurement volume, a spectrometer to receive the light beam from the spectral measurement volume. The apparatus includes an a controller configured to, when a reactive species is present in the spectral measurement volume, control the light source to emit the light beam into the spectral measurement volume and the spectrometer to determine an environment spectrum using the light beam, and when the reactive species is not present in the spectral measurement volume, control the light source to emit the light beam into the spectral measurement volume and the spectrometer to determine a baseline spectrum using the light beam, calculate a net spectrum based on a difference between the environment spectrum and the baseline spectrum, and estimate a concentration of the reactive species based on the net spectrum.

Abstract: An optical testing circuit on a wafer includes an optical input configured to receive an optical test signal and photodetectors configured to generate corresponding electrical signals in response to optical processing of the optical test signal through the optical testing circuit. The electrical signals are simultaneously sensed by a probe circuit and then processed. In one process, test data from the electrical signals is simultaneously generated at each step of a sweep in wavelength of the optical test signal and output in response to a step change. In another process, the electrical signals are sequentially selected and the sweep in wavelength of the optical test signal is performed for each selected electrical signal to generate the test data.

Abstract: Systems and methods for providing efficient modeling and measurement of critical dimensions and/or overlay registrations of wafers are disclosed. Efficiency is improved in both spectral dimension and temporal dimension. In the spectral dimension, efficiency can be improved by allowing different numerical aperture (NA) models to be used for different wavelengths in electromagnetic calculations, effectively providing a balance between computation speed and accuracy. In the temporal dimension, different NA models may be used at different iterations/stages in the process, effectively improving the computation speed without sacrificing the quality of the final result.

Abstract: A micro object detection apparatus (11) includes an optical system (50). The first optical system (50) includes a first reflection region (101), a second reflection region (102), and a light reception element (6). The first reflection region (101) has an ellipsoidal shape, and reflects scattered light scattered when irradiation light hits a particle (R) to direct the scattered light to the light reception element (6), by utilizing two focal point positions of the ellipsoidal shape. The second reflection region (102) reflects scattered light coming from the particle (R) to direct the scattered light to the first reflection region (101), so that the scattered light is directed to the light reception element (6) by utilizing the ellipsoidal shape of the first reflection region (101). The light flux diameter of the scattered light reflected by the second reflection region (102) is larger than the particle (R), at the position of the particle (R) at which the scattered light is generated.

Abstract: Methods and systems are presented to reduce the illumination spot size projected onto a measurement target and associated spillover onto area surrounding a measurement target. In one aspect, a spatial light modulator (SLM) is located in the illumination path between the illumination light source and the measurement sample. The SLM is configured to modulate amplitude, phase, or both, across the path of the illumination light to reduce wavefront errors. In some embodiments, the desired state of the SLM is based on wavefront measurements performed in an optical path of the metrology system. In another aspect, an illumination aperture having an image plane tilted at an oblique angle with respect to a beam of illumination light is employed to overcome defocusing effects in metrology systems that employ oblique illumination of the measurement sample. In some embodiments, the illumination aperture, objective lens, and specimen are aligned to satisfy the Scheimpflug condition.

Abstract: An optical scanning system includes a radiating source capable of outputting a light beam, a first time varying beam reflector that is configured to reflect the light beam through a scan lens towards a transparent sample at an incident angle that is not more than one degree greater or less than Brewster's angle of the transparent sample, and a second time varying beam reflector that is configured to reflect the light beam reflected from the transparent sample after passing through a de-scan lens onto a phase retardance detector. The output of the phase retardance detector is usable to determine if a defect is present on the transparent sample. The first time varying beam reflector causes a first phase retardance of the light beam and the second time varying beam reflector causes a second phase retardance of the reflected light beam in the opposite direction of the first phase retardance.