Abstract: A system and a method for determining positions of structures on a substrate are disclosed. The system includes at least one measurement table (20) movable in the X-coordinate direction and in the Y-coordinate direction, a measurement objective (9) and a camera for determining the positions of the structures (3) on the substrate (2). The position of the measurement objective (9) and/or the measurement table (20) may be determined by at least one interferometer (24). The system is surrounded by a housing representing a climatic chamber (50) provided with an active pressure regulation.

Abstract: A lithographic apparatus includes a position measurement system to determine along a measurement path a position of a first part of the lithographic apparatus with respect to a position of a second part of the lithographic apparatus. The position determination system comprises a plurality of temperature sensors to measure a temperature of a medium along the measurement path. The position measurement system corrects the determined position making use of the temperature as measured by the temperature sensors.

Abstract: A method for step-and-align interference lithography is provided in the present invention, by which a displacement error relating to the moving of an interference light beam as the source of the interference light beam is being carried to move by a carrier is measured before interference lithography, and then the displacement error is used as a reference to compensate a positioning error between adjacent interference patterns during step-and-align interference lithography.

Abstract: Example embodiments are directed to a mask-less exposure apparatus configured to expose a pattern on a substrate using a light modulation device and a multi-head alignment method thereof. According to example embodiments, a beam measurement device measures positions and focuses of at least three beams from among a plurality of beams emitted from multiple heads, the measurement enabling alignment of a position and an angle of a lens barrel deviated from a reference position according to an error in position and focus of the measured at least three beams.

Abstract: A coordinate measuring machine (1) for measuring structures (3) on a substrate (2) including a measurement table (20) movable in the X-coordinate direction and in the Y-coordinate direction, a measurement objective (9), at least one laser interferometer (24) for determining the position of the measurement table (20) and the measurement objective (9) wherein the measurement table (20), the measurement objective (9) and the at least one laser interferometer (24) are arranged in a vacuum chamber (50).

Abstract: A system for determining positions of structures on a substrate is disclosed. The system includes a plurality of stations enclosed by a housing. At least one of the stations inside the housing is designed to be movable. The housing is provided with a filter fan unit generating an air flow in the housing. Air-directing elements are provided in the housing so that an invariable flow may be achieved irrespective of the at least one movable station.

Abstract: A method and a coordinate measuring machine (1) are provided, wherein the non-linearities of an interferometer (24) can be corrected. A measuring stage (20) traversable in a plane (25a) is provided for measurement. The substrate (2) is placed in a measuring stage (20); wherein the position of the measuring stage (20) along each of the motion axes is determined by at least one interferometer (24) in each case. A computer (16) is provided for compensating the non-linearity inherent in each of the interferometers (24), wherein the position of the measuring stage (20) to be determined by the interferometers (24) is arranged along a trajectory (52, 60, 67) of the measuring stage (20), which is composed at least partially of components of the axes.

Abstract: A tracking type laser gauge interferometer includes: a first recursive reflector configured to reflect light parallel to incident light; a second recursive reflector attached to a measurement object; a main body part configured to guide light emitted from a laser light source to the first recursive reflector; a rotating mechanism configured to rotate the main body part; and a control unit configured to control the rotating mechanism based on the light emergent from the main body part and reflected at the second recursive reflector, wherein: the main body part includes a light receiving element configured to receive the light reflected at the first recursive reflector and detect a position of the received light; and the control device includes: an angle acquisition unit configured to acquire a rotational angle of the rotating mechanism; and an correction unit configured to correct a motion error of the rotating mechanism.

Abstract: A positioning apparatus, which positions a stage, includes a measurement system that measures a position of the stage. The measurement system includes a plurality of measuring devices that are spaced apart from each other along a first direction and measure a position of the stage in a second direction. A switching unit switches between the measuring devices to measure the position of the stage when the stage moves in at least the first direction. A correction unit corrects, based on an acceleration of the stage, the value measured by the measurement system. When the switching unit switches between the plurality of measuring devices, the correction unit corrects, based on a value obtained by the correction, a value measured by a measuring device after the switching.

Abstract: A system for positioning a product, comprising a chuck for supporting the product, an intermediate stage supporting said chuck, and a stationary base supporting said intermediate stage. The chuck can move with respect to the intermediate stage in a first direction X, and the intermediate stage can move with respect to said stationary base in a second direction Y. The system furthermore comprises at least one laser interferometer for measuring the position of the chuck relative to the stationary base. The main part of the laser interferometer is attached to the intermediate stage, so that it can measure the distance between a reflector on the chuck and a reflector on the stationary base.

Abstract: A device for determining the position of a structure (3) on an object (2) in relation to a coordinate system is disclosed. The object (2) is placed on a measuring table (20) which is movable in one plane (25a), wherein a block (25) defines the plane (25a). At least one optical arrangement (40, 50) is provided for transmitted light illumination and/or reflected light illumination. The optical arrangement (40, 50) comprises an illumination apparatus (41, 51) for reflected light illumination and/or transmitted light illumination and at least one first or second optical element (9a, 9b), wherein at least part of the at least one optical element (9a, 9b) extends into the space (110) between the block (25) and an optical system support (100). The block (25) and/or the optical system support (100) separates the illumination apparatus (41, 51) spatially from the plane (25a) in which the measuring table (20) is movable.

Abstract: Methods are disclosed wherein the structural health of a civil structure, such as, but not limited to, a bridge or the like is measured by electronic distance measurement from a plurality of stable locations to a plurality of cardinal points on the structure in a methodical manner. By measuring the coordinates of the cardinal points, the dynamic and long-term static behavior of the structure provide an indication of the health of the structure. Analysis includes; comparison to a Finite Element Model (FEM), comparison to historical data, linearity, hysteresis, symmetry, creep, damping coefficient, and harmonic terms.

Abstract: Disclosed herein are an automatic landing method for a scanning probe microscope and an automatic landing apparatus using the same. The method comprises irradiating light to a cantilever using a light source; collecting interference fringes generated by the light being diffracted from the edge of the cantilever and then being incident to a surface of the sample; driving the tip in the sample direction until the pattern of the interference fringes reaches a predetermined pattern region (first driving); and driving the tip in the sample direction after the interference fringe pattern reached the predetermined pattern region (second driving). The method in accordance with the present invention is very effective particularly for samples having a large surface area, because it enables automatic landing of a tip according to recognition and selection of an optimal time point for individual landing steps, irrespective of adverse changes in landing conditions, such as surface irregularities of samples.

Abstract: Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage relative to a lithographic optical system. An exemplary apparatus includes a stage that places a workpiece relative to the tool, and that is movable in at least one direction relative to the tool. At least one first interferometer system is situated relative to the stage to determine stage position in a movement direction relative to the process position. A movement-measuring device determines displacement of the tool from the process position. Using data from the interferometer system and movement-measuring device a processor determines a position of the stage relative to the tool. The processor also corrects the determined position for displacement of the tool.

Abstract: A device for measuring the position of at least one structure on a substrate is disclosed. The substrate to be measured is positioned in a mirror body. A flat insert is provided in the mirror body and is formed such that the substrate and the insert together always have the same optical thickness, irrespective of the mechanical thickness of the substrate.

Abstract: A positioning apparatus comprises a first measuring device measuring a position of the stage in a first measuring range, a second measuring device measuring a position of the stage in a second measuring range having an overlapping range overlapping the first measuring range, a third measuring device measuring a position of the stage in the overlapping range, and a controller controlling the first measuring device to take over the measurement value obtained by the second measuring device in the overlapping range in moving the stage from the second measuring range to the first measuring range, thereby switching from measurement by the second measuring device to measurement by the first measuring device. The controller performs correction processing based on the measurement by the third measuring device so as to reduce an error of the measurement value obtained by the first measuring device after the switching.

Abstract: A method is disclosed whereby a laser-based spherical coordinate measurement system is dynamically calibrated. A mechanical oscillator, such as, but not limited to, a Foucault pendulum is used to generate periodic motions which can be fitted to Fourier series models. The residuals between the experimental measurements and the model can provide information which can be used to calibrate the instrument. The calibration information is used to augment the ASME B89.4.19-2006 standard to improve sensitivity to cyclic errors and include the servo systems.

Abstract: A method for determining a change in a position of a support is described. The method includes determining the change in the position of the support used in an imaging system, where determining the change includes computing the position by operating a photodetector configured to detect laser energy that provides information regarding the position.

Abstract: In general, in a first aspect, the invention features a method that includes using an interferometry assembly to provide three different output beams, each output beam including an interferometric phase related to an optical path difference between a corresponding first beam and a corresponding second beam, each first beam contacting a measurement object at least once, monitoring the interferometric phases for each of the three different output beams, and deriving information about variations in the optical properties of a gas in the first beam paths from the three monitored phases.

Abstract: The disclosure features multiple degree-of-freedom interferometers (e.g., non-dispersive interferometers) for monitoring linear and angular (e.g., pitch and/or yaw) displacements of a measurement object with compensation for variations in the optical properties of a gas in the interferometer measurement (and/or reference) beam paths. The disclosure also features interferometry systems that feature an array of interferometers (e.g., including one or more multiple degree-of-freedom interferometer), each configured to provide different information about variations in the optical properties of the gas in the system. Multiple degree-of-freedom interferometers are also referred to as multi-axis interferometers.

Abstract: In general, in one aspect, the invention features a system that includes a moveable stage, an interferometer configured to provide information about a first degree of freedom of the stage, an encoder configured to provide information about a second degree of freedom of the stage, and an electronic processor configured to monitor the position of the stage based on the information about the first and second degrees of freedom.

Abstract: A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the lithographic apparatus, the method including measuring a position of the moveable support using an interferometer; and calibrating the encoder based on the position of the moveable support measured by the interferometer.

Abstract: A level sensor for determining a height of a substrate. In one configuration, the level sensor forms part of a lithographic apparatus that includes a projection lens system. The level sensor generates one or more measurement beams and directs the measurement beam to a measurement spot on a substrate having a first reflecting surface, and produces a reflected measurement beam. The level sensor also generates one or more reference beams. A detector detects both the reflected measurement beam and the reference beam, respectively, and produces a measurement signal and a reference signal, respectively, the measurement signal being indicative for the height at the measurement spot. A processor that receives these signals and corrects the measurement signal based on the reference signal.

Abstract: A position measuring system includes a laser interferometer, and a wavelength detection unit detecting the wavelength change of a laser beam. A phase compensation unit compensates for the wavelength change detected by the wavelength detection unit based on the phase difference of aerial vibration between the wavelength detection unit and the optical path of the laser interferometer, which is determined based on the difference in length between a first path of the aerial vibration from the aerial vibration source of an air conditioner to the wavelength detection unit and a second path of the aerial vibration from the aerial vibration source to the optical path of the laser interferometer. A position measuring unit compensates for a measurement value obtained by the laser interferometer on the basis of the compensated wavelength change. In the position measuring system, the first path is designed to be shorter than the second path.

Abstract: An exposure apparatus includes a stage configured to hold an original thereon and to move in a horizontal direction, a first interferometer configured to emit first measurement light used for measuring a position of the stage in a vertical direction thereof, a first mirror provided on a bottom surface of the stage, and a second mirror provided directly below the first mirror. The second mirror is disposed so as to guide the first measurement light emitted from the first interferometer to the first mirror.

Abstract: An exposure apparatus comprises an optical system support supporting a projection optical system, a stage surface plate, first stage and second stages, a first interferometer configured to measure stage position in a first area, a second interferometer configured to measure stage position in a second area, a third interferometer which is interposed between the first interferometer and the second interferometer, a gap sensor configured to measure a gap between the optical system support and the stage surface plate, and a control unit configured to pass, in the swapping, the measurement result obtained by one of the first interferometer and the second interferometer to the other one of the first interferometer and the second interferometer using the measurement result obtained by the third interferometer, and to correct the passed measurement result based on the measurement result obtained by the gap sensor.

Abstract: A fast translation stage for a scanning probe microscope is provided. The stage includes at least one axis of translation driven at the natural resonant frequency of the translation stage such that distortion associated with rapid changes in scan direction is avoided. In one embodiment, the stage includes a sample plate or support that is driven, preferably by one or more piezoelectric actuator elements, so that the plate translates along the fast scan frequency at its resonant frequency.

Abstract: An XY stage apparatus capable of reducing a measurement error due to air fluctuations is provided. The XY stage apparatus includes a stage that moves in the XY directions, a laser interferometer to measure a position of the stage, and a measuring optical path barrel mechanism having a fixed barrel that covers at least a portion of a measuring optical path between the stage and the laser interferometer, is provided on a side of the laser interferometer of the measuring optical path, and is fixed to the laser interferometer and a movable barrel that covers at least a potion of the measuring optical path, is provided on the side of the stage of the measuring optical path, and moves together with movement of the stage, wherein an end of one of the fixed barrel and the movable barrel is inserted into that of the other.

Abstract: An interferometer system for tracking a position of a movable object in a pattern generator is provided. The interferometer system includes an interferometer configured to generate an interference signal indicative of at least one instantaneous position of an object, and a control system. The control system generates raw position data based on the generated interference signal, selects a subset of position data from the raw position data, and extrapolates at least a third position of the object based on the selected subset of position data.

Abstract: An interferometric device for position measurement of an element moveable in a plane is disclosed. A laser light source measures the position of the moveable element and emits the required measuring light. A beam splitter splits the measuring light into a first partial beam path and a second partial beam path, which each impinge on a reflecting surface of the moveable element via an interferometer. Herein, at least the beam splitter, which splits the measuring light into a first partial beam path and a second partial beam path, and the beam splitter, which directs the third partial beam path onto an etalon via an interferometer, have a respective beam trap associated with them, which traps the light returning from the respective interferometers.

Abstract: A positioning apparatus includes a stage base, a stage moving along a surface of the stage base, a cable having one end connected to the stage, and a straightening structure configured to straighten air currents around the cable. The straightening structure is provided to at least one of the stage and the cable.

Abstract: A method for step-and-align interference lithography is provided in the present invention, by which a displacement error relating to the moving of an interference light beam as the source of the interference light beam is being carried to move by a carrier is measured before interference lithography, and then the displacement error is used as a reference to compensate a positioning error between adjacent interference patterns during step-and-align interference lithography.

Abstract: A static/dynamic multi-function measuring device for linear unit, includes a foundation, a multi-direction sliding unit having eddy current detector, a linear motor, a linear unit with a sensing element and an optical measuring unit; the static/dynamic multi-function measuring device uses the linear motor to drive the multi-direction sliding unit with low friction to provide a non-contact measurement of a parallel alignment of the linear unit, a linear accuracy measurement of the linear unit, and a vibration measurement of the linear unit to detect the parallel alignment of the linear unit and the linear accuracy of a slide rail and so on, the static/dynamic multi-function measuring device also measures errors of the linear unit and a slide block moving in the vibrating and the rolling direction.

Abstract: In general, in one aspect, the invention features a system that includes a first object mounted relative to a second object, the first object being moveable with respect to the second object. The system includes a plurality of interferometers each configured to derive a first wavefront and a second wavefront from input radiation and to combine the first and second wavefronts to provide output radiation including information about an optical path length difference between the paths of the first and second wavefronts, each interferometer including a reflective element positioned in the path of the first wavefront, and at least one of the interferometer's reflective element is mounted on the first object. The system also includes a plurality of fiber waveguides and an electronic controller. Each fiber waveguide is configured to deliver the input radiation to a corresponding interferometer or deliver the output radiation from the corresponding interferometer to a corresponding detector.

Abstract: An interference signal S(t) is provided from interference between two beams directed along different paths. The signal S(t) is indicative of changes in an optical path difference n{tilde over (L)}(t) between the different paths, where n is an average refractive index along the different paths, {tilde over (L)}(t) is a total physical path difference between the different paths, and t is time. An error signal is provided to reduce errors in an estimate of {tilde over (L)}(t). The error signal is derived at least in part based on one or more collective properties of a distribution of multi-dimensional values. At least one of the multi-dimensional values in the distribution is generated from a plurality of samples of the signal S(t) (e.g., samples of the signal captured at different times).

Abstract: A movable body apparatus is equipped with a Y measuring system equipped with an encoder and an interferometer that measure the position of a stage in one axis (Y-axis) direction. The interferometer irradiates a reflection surface arranged on the stage with a measurement light close to a measurement light of the encoder, and receives its reflected light. In this case, the encoder and the interferometer commonly use an optical member fixed to the stage. Accordingly, the Y interferometer and the Y encoder have substantially the equal measurement axis.

Abstract: In the tracking type laser interferometer including: a laser interferometer; an optical axis deviation detection sensor for detecting a deviation of an optical axis of the laser interferometer; a two-axis turning mechanism for turning the laser interferometer to any optional direction; an angle sensor for detecting a turning angle of the two-axis turning mechanism; a retroreflector for reflecting its reflected light to a direction parallel to the incident light; and a controller for driving the two-axis turning mechanism so as to track the retroreflector based on signals of the optical axis deviation detection sensor and the angle sensor, stop of the retroreflector is detected, and a target distance is calculated from the turning center of the laser interferometer to the center of the retroreflector based on the total sum of deviation of an optical axis during movement, which is obtained by the optical axis deviation detection sensor, and a turning angle during movement, which is obtained by the angle sensor.

Abstract: Movement-sensitive equipment (10), for example an electron beam lithography machine, is provided with an optical measuring system operable to measure the position of the equipment in a reference plane (A) so as to detect unintended displacement of the equipment in that plane, for example thermally induced shift of the lower end of an otherwise fixed electron beam column (11) of such a lithography machine. The system comprises an integral plate (17) of vitreous material provided with two mutually orthogonal reflective faces (19), with high optical accuracy, for reflecting laser or other measuring light beams. The plate (17) is adjustably and releasably mounted on the equipment (10) by a plurality of mounts (17) which permit accurate setting of the faces (19) relative to the plane (A) and allow removal of the plate as desired. The mounts (17) are designed to clamp the plate (17) in such a way as to avoid creation of stresses potentially causing cracks.

Abstract: A lithographic projection apparatus includes a substrate table to hold a substrate, a projection system to project a patterned beam of radiation onto the substrate and a liquid confinement structure to confine a liquid in a space between the projection system and the substrate, the substrate, the substrate table, or both, to form a part of a boundary of the space. In addition, a closing plate forms a part of a boundary of the space in place of the substrate, the substrate table, or both, when moved without substantially disturbing the liquid, the liquid confinement structure, or both.

Abstract: A first portion of a beam including a first frequency component is directed along a first path. A second portion of the beam is frequency shifted to generate a shifted beam that includes a second frequency component different from the first frequency component and one or more spurious frequency components different from the first frequency component. At least a portion of the shifted beam is directed along a second path different from the first path. An interference signal S(t) from interference between the beam portions directed along the different paths is measured. The signal S(t) is indicative of changes in an optical path difference n{tilde over (L)}(t) between the paths, where n is an average refractive index along the paths, {tilde over (L)}(t) is a total physical path difference between the paths, and t is time.

Abstract: An apparatus includes an interferometer having a polarizing beam splitter to split an input beam into a measurement beam and a reference beam, the measurement beam contacting a measurement object, the reference beam contacting a reference object. The interferometer includes at least one thin retarder on a surface of the interferometer.

Abstract: In general, in one aspect, the invention features an apparatus including a multi-axis interferometer configured to produce at least three output beams each including interferometric information about a distance between the interferometer and a measurement object along a corresponding measurement axis, wherein at least three of the measurement axes are in a common plane, wherein the output beams each include a component that makes a pass to the measurement object along a common beam path.

Abstract: A method for the high-precision measurement of coordinates on a substrate is disclosed. The substrate is placed on a stage moveable in X/Y coordinate directions. First, a plurality of images of a structure on a substrate are imaged by means of a 2-dimensional detector during the relative movement of a measuring objective in Z coordinate direction and the simultaneous movement of the stage in X and Y coordinate directions.

Abstract: A method of measuring a 3D shape includes the steps of measuring a brightness of a first illumination source 41a, measuring a phase-to-height conversion factor, measuring a 3D shape of a circuit board 62 according to the normal inspection mode, and determining whether bare board information about the circuit board 62 is included. If the information is not included, performing bare board teaching to acquire the information. Then, the 3D shape of target objects on the circuit board 62 are measured, when the bare board information is included or bare board teaching information is generated. Next, the circuit board 62 is analyzed to determine if it is normal or abnormal by using 3D shape information.

Abstract: A displacement interferometer system comprises: a light source for generating a laser beam of a predetermined wavelength; an incidence unit for allowing the laser beam, generated in the light source to be incident on a target object to be measured; a detector for measuring a distance of the target object to be measured, using a measurement laser beam which is incident on the target object by the incidence unit; and a correction unit connected to the incidence unit so that a correction laser beam is incident in a direction parallel to the measurement laser beam which is incident on the target object to be measured. When the correction laser beam and the measurement laser beam which yaw from an initially set direction are incident in any one direction, the correction unit corrects the correction laser beam and the measurement laser beam to be incident in the initially set direction.

Abstract: A method for the high-precision measurement of coordinates of at least one structure on a substrate. A stage traversable in X/Y coordinate directions is provided, which is placed in an interferometric-optical measuring system. The structure on the substrate is imaged on at least one detector (34) via a measuring objective (21) having its optical axis (20) aligned in the Z coordinate direction. The structure is imaged with the so-called Dual Scan. Systematic errors can thereby be eliminated.

Abstract: In general, in one aspect, the invention features interferometry systems that include an interferometer configured to direct a first beam and a second beam derived from common light source along different paths and to combine the two beams to form an output beam including information related to an optical path difference between the different paths, wherein the path of the first beam contacts a measurement object. The interferometry systems also include an afocal system positioned in the path of the first beam and configured to increase a dimension of the first beam as it propagates from the interferometer towards the measurement object and reduces the dimension of the first beam as it returns from the measurement object propagating towards the interferometer.

Abstract: A system for determining positions of structures on a substrate is disclosed. The system includes a plurality of stations enclosed by a housing. At least one of the stations inside the housing is designed to be movable. The housing is provided with a filter fan unit generating an air flow in the housing. Air-directing elements are provided in the housing so that an invariable flow may be achieved irrespective of the at least one movable station.

Abstract: Improved systems, apparatus, and methods for detecting positions of moving stages and a reference position of a beam column are provided. For some embodiments, independent discrete interferometers may be utilized for distance measurements in each axis, rather than a cumbersome monolithic multi-axis interferometer utilized in conventional systems.

Abstract: Multidirectional retroreflectors and methods of reflecting light beams from multiple directions are provided. The multidirectional retroreflectors utilize a four-mirror retroreflector with a common virtual reflection point.