Abstract: A method of decomposing pattern layout for generating patterns on photomasks is disclosed. The method includes decomposing features of an integrated circuit layout into discrete patterns based on the relation between these features. The features include first features and second features. The first features are then classified into a first feature pattern and a second feature pattern, and the second features are classified into third, fourth, fifth and sixth feature patterns. The spacings of the second features in the fifth and sixth feature patterns are greater than a minimum exposure limits. Finally, the first feature pattern is outputted to a first photomask, the second feature pattern is outputted to a second photomask, the third and fifth feature patterns are outputted to a third photomask, and the fourth and sixth feature patterns are outputted to a fourth photomask.

Abstract: A rotary drive arrangement for a machine for printing containers includes a turntable configured to hold the container to be printed and a format adapter connected to the turntable and configured to transmit a rotational movement to the turntable. A rotary drive is configured to drive the format adapter in rotation about an axis of rotation by means of a transmission element that engages with the format adapter, wherein, in an engagement portion of the transmission element, the format adapter is designed to match an outer periphery of a surface of the container to be printed.

Abstract: The present invention relates to the field of computation and simulation and covers methods to optimize the fiducial marker positions in optical object tracking systems, by simulating the visibility.

Abstract: A process for calibrating and correcting errors in laser measurement systems in situ, either remotely over the Internet or where the laser measurement system is physically located. In one embodiment, a number of targets are arrayed around the scanner and read by the software of a system. The laser scanner is rotated 180 degrees and the positions of the targets are read again. A correction factor is determined by calculation and displayed to show the expected improvement in accuracy of the laser measurement system. In a second embodiment, the laser scanner is positioned under a vehicle with targets at reference positions for which the measurements are known. The scanner readings are checked against the known values and a correction factor developed. This could be applied on a one-time basis or it can be programmed in the host computer where evaluation and compensation occur automatically.

Abstract: An interactive virtual care system may include a user sensory module to acquire multi-modal user data related to user movement. A data analysis module may compare the multi-modal user data to predetermined historical user data and/or statistical norm data for users to identify an anomaly in the user movement.

Abstract: A detector detects positions of a moving body in a travel direction at a position shifted from a center of control of travel of the moving body in a direction different than the travel direction of the moving body. Positions of the center of control in the travel direction relative to the output of the detector is stored in a storage unit for at least a curved section of a travel route of the moving body, and the travel of the moving body is controlled by a controller, based on the positions of the center of control read out from the storage unit.

Abstract: A method uses a lithographic apparatus to form an inspection target structure upon a substrate. The method comprises forming the periphery of the inspection target structure so as to provide a progressive optical contrast transition between the inspection target structure and its surrounding environment. This may be achieved by providing a progressive change in the optical index at the periphery of the target structure.

Abstract: A color measurement system laterally determines chromatic characteristics of a printed substrate. A measurement carriage includes a measurement head for laterally moving across the printed substrate and a measurement magnetic coupler slidably mounts onto a measurement rail positioned on a first side of the printed substrate. A backing carriage includes backing surface(s) and backing magnetic coupler(s). Each backing magnetic coupler is associated with a respective backing surface. Each backing magnetic coupler can be coupled with the measurement magnetic coupler for coupling the measurement carriage with the backing carriage. The backing carriage slidably mounts onto a backing rail positioned on a second opposite side of the printed substrate. The measurement carriage or backing carriage includes a motor for moving across a respective measurement rail or backing rail.

Abstract: A positioning module of calculating a coordinate of a touch medium is disclosed in the present invention. The positioning module includes at least one image detecting unit, a first light source, a second light source and a processor. The image detecting unit includes a lateral side and an upper side. The image detecting unit captures an image reflected from a reflection component. The first light source is disposed on the lateral side and outputs a first beam. The second light source is disposed on the upper side and outputs a second beam. The processor is electrically connected to the image detecting unit. The processor determines a touch status of the touch medium according to a first image generated by the first beam, and further determines a touch coordinate of the touch medium according to a second image generated by the second beam.

Abstract: An overlay mark for checking alignment accuracy between a former layer and a later layer on a wafer is described, including a former pattern as a part of the former layer, and a later pattern as a part of a patterned photoresist layer defining the later layer. The former pattern has two parallel opposite edges each forming a sharp angle ? with the x-axis of the wafer. The later pattern also has two parallel opposite edges each forming the sharp angle ? with the x-axis of the wafer.

Abstract: Disclosed are systems and methods for characterizing interactions or proton beams in tissues. In certain embodiments, charged particles emitted during passage of protons, such as those used for therapeutic and/or imaging purposes, can be detected at relatively large angles. In situations where beam intensity is relatively low, such as in certain imaging applications, characterization of the proton beam with charged particles can provide sufficient statistics for meaningful results while avoiding the beam itself. In situations where beam intensity is relatively high, such as in certain therapeutic applications, characterization of the proton beam with scattered primary protons and secondary protons can provide information such as differences in densities encountered by the beam as it traverses the tissue and dose deposited along the beam path. In certain situations, such beam characterizations can facilitate more accurate planning and monitoring of proton-based therapy.

Abstract: A lithographic process is used to form a plurality of target structures (92, 94) distributed at a plurality of locations across a substrate and having overlaid periodic structures with a number of different overlay bias values distributed across the target structures. At least some of the target structures comprise a number of overlaid periodic structures (e.g., gratings) that is fewer than said number of different overlay bias values. Asymmetry measurements are obtained for the target structures. The detected asymmetries are used to determine parameters of a lithographic process. Overlay model parameters including translation, magnification and rotation, can be calculated while correcting the effect of bottom grating asymmetry, and using a multi-parameter model of overlay error across the substrate.

Abstract: An exemplary embodiment of the present disclosure illustrates a proximity sensing method used in a controller of a proximity sensing device. Firstly, a cross talk value is initialized. After the cross talk value is initialized, whether the cross talk value should be updated is judged at least according to a first sensing value currently received from a sensing unit of the proximity sensing device. When the cross talk value is judged to be updated, the cross talk value is updated at least according to a first sensing value. Then, a compensated sensing value is obtained by subtracting the cross talk value from the first sensing value.

Abstract: A measuring apparatus measures a position of each of shot regions formed on a substrate. The apparatus includes a detector configured to detect a mark formed with respect to a shot region on the substrate, and a processor configured to obtain a position of each of the shot regions based on an output of the detector. The processor is configured to obtain a coefficient of a regression equation for obtaining a position of each of the shot regions, based on an output of the detector with respect to each of a plurality of sample shot regions on the substrate, and obtain, if the coefficient satisfies a tolerable condition for a discrepancy between the coefficient and a reference value thereof, the position of each of the shot regions using each offset amount that is obtained beforehand to correct the position of each of the shot regions obtained based on the regression equation.

Abstract: Various gun sights and related methods are provided. In one embodiment, a gun sight includes a light source adapted to project light, a user-viewable interface, and an optical element. The optical element includes a first surface adapted to pass the light to provide a reticle at the user-viewable interface. The optical element also includes a second surface adapted to refract the light to provide a light guide at a peripheral area of the user-viewable interface to aid a user to substantially align the user's eye with the reticle. Various mechanisms for aligning gun sights, attaching gun sights, related methods, and other embodiments are also provided.

Abstract: The invention relates to a device for capturing the rotary position (D) of at least one rotary device (4) provided for receiving a container (3) by means of at least one sensor unit (5), wherein the rotary device (4) is provided for driving the container (3) about a rotary axis (DA), and the at least one sensor unit (5) is advantageously designed for non-contact capturing of the rotary position (D) of the rotary device (4) relative to the rotary axis (DA).

Abstract: Methods, systems, and apparatuses are provided for estimating a location on an object in a three-dimensional scene. Multiple radiation patterns are produced by spatially modulating each of multiple first radiations with a distinct combination of one or more modulating structures, each first radiation having at least one of a distinct radiation path, a distinct source, a distinct source spectrum, or a distinct source polarization with respect to the other first radiations. The location on the object is illuminated with a portion of each of two or more of the radiation patterns, the location producing multiple object radiations, each object radiation produced in response to one of the multiple radiation patterns. Multiple measured values are produced by detecting the object radiations from the location on the object due to each pattern separately using one or more detector elements. The location on the object is estimated based on the multiple measured values.

Abstract: A target includes a contact element having a region of spherical curvature, a retroreflector rigidly connected to the contact element, a transmitter configured to emit an electromagnetic signal, a temperature sensor disposed on the target, configured to measure an air temperature, and configured to send the measured air temperature to the transmitter.

Abstract: Methods for performing a scheme that results in a refined measurement pattern within an optical grid are provided. Physically adjusting spacing of elements within an optical grid to achieve enhanced resolution is historically unfeasible, as reduction of the spacing causes light sensors of the optical grid to pick up false signals when reading light beams. Technology introduced by the present invention generates a virtual reduced spacing of the elements within the optical grid by using two signals that are slightly different. These slightly different signals can accomplish, at least, quarter-grid spacing resolution within the optical grid. Additionally, the enhanced resolution derived from the virtual reduced spacing is employed to govern movement of a motor. The motor movement is in response to one or more changes of direction such that the motor is operating in its linear range.

Abstract: The throughput of the alignment in an alignment apparatus is improved. There is provided an alignment apparatus for aligning a substrate having an alignment mark, including a first aligner that aligns the substrate to a first reference position, a second aligner that aligns a substrate holder to a second reference position before the substrate holder holds the substrate, and a position detector that detects a position of the alignment mark of the substrate after the substrate holder holds the substrate.

Abstract: A reflective optical sensor includes at least three light-emitting elements; a lighting optical system that guides light emitted from the light-emitting elements to a toner pattern; and at least three light-receiving elements that receive the beams of light reflected by the toner pattern. The lighting optical system has a lateral magnification m that satisfies m?P/S, where S is the size of the light-emitting elements and P is the arrangement pitch of the light-emitting elements.

Abstract: An automated testing system includes systems and methods to facilitate inline production testing of samples at a micro (multiple microns) or less scale with a mechanical testing instrument. In an example, the system includes a probe changing assembly for coupling and decoupling a probe of the instrument. The probe changing assembly includes a probe change unit configured to grasp one of a plurality of probes in a probe magazine and couple one of the probes with an instrument probe receptacle. An actuator is coupled with the probe change unit, and the actuator is configured to move and align the probe change unit with the probe magazine and the instrument probe receptacle. In another example, the automated testing system includes a multiple degree of freedom stage for aligning a sample testing location with the instrument. The stage includes a sample stage and a stage actuator assembly including translational and rotational actuators.

Abstract: A target is provided having a retroreflector. A body is provided having a spherical exterior portion, the body containing a cavity. The cavity is sized to hold the retroreflector, the cavity open to the exterior of the body and having at least one surface opposite the opening, the retroreflector at least partially disposed in the cavity, wherein the retroreflector and at least one surface define a space therebetween. A transmitter is configured to emit an electromagnetic signal. A first actuator is configured to initiate emission of the electromagnetic signal, wherein the transmitter and the first actuator are affixed to the body.

Abstract: Methods, systems, and structures for monitoring incident beam position in a wafer inspection system are provided. One structure includes a feature formed in a chuck configured to support a wafer during inspection by the wafer inspection system. The chuck rotates the wafer in a theta direction and simultaneously translates the wafer in a radial direction during the inspection. An axis through the center of the feature is aligned with a radius of the chuck such that a position of the axis relative to an incident beam of the wafer inspection system indicates changes in the incident beam position in the theta direction.

Abstract: A method of operating a dimensioning system to determine dimensional information for objects is disclosed. A number of images are acquired. Objects in at least one of the acquired images are computationally identified. One object represented in the at least one of the acquired images is computationally initially selected as a candidate for processing. An indication of the initially selected object is provided to a user. At least one user input indicative of an object selected for processing is received. Dimensional data for the object indicated by the received user input is computationally determined.

Abstract: A position measuring apparatus with at least one material measure comprised of an optical structure of an arrangement of 3-D reflectors, at least one light receiver arranged at a distance from the material measure, a light source arranged at a distance from the material measure and at a distance from the light receiver, and at least one transparent substrate present between the material measure and the light receiver, wherein the light receiver is deposited directly on the transparent substrate, on the side of the substrate opposite the material measure in the form of a thin-film structure consisting of several layers arranged one above another. A supporting plate is provided with circuit-board conductors, on which the substrate is arranged, wherein the transparent substrate and the supporting plate are joined solidly together by a Flip-Chip assembly process.

Abstract: The present disclosure relates to an accommodating device for a dispensing or infusion device, comprising: a displaceable element which is displaced within the accommodating device when a cartridge is inserted into the accommodating device; and at least one sensor which can detect the presence or absence of the displaceable element or a detection element disposed on or in the displaceable element.

Abstract: A system for performing sample probing. The system including an topography microscope configured to receive three-dimensional coordinates for a sample based on at least three fiducial marks; receive the sample mounted in a holder; and navigate to at least a location on the sample based on the at least three fiducial marks and the three-dimensional coordinates.

Abstract: A reflective optical sensor includes at least three light-emitting elements; a lighting optical system that guides light emitted from the light-emitting elements to a toner pattern; and at least three light-receiving elements that receive the beams of light reflected by the toner pattern. The lighting optical system has a lateral magnification m that satisfies m?P/S, where S is the size of the light-emitting elements and P is the arrangement pitch of the light-emitting elements.

Abstract: In various embodiments, an arrangement is provided. The arrangement may include a plurality of chips; a chip carrier carrying the plurality of chips, the chip carrier including a chip carrier notch; and encapsulation material encapsulating the chip carrier and filling the chip carrier notch; wherein the outer circumference of the encapsulation material is free from a recess.

Abstract: While a wafer stage linearly moves in a Y-axis direction, a multipoint AF system detects surface position information of the wafer surface at a plurality of detection points that are set at a predetermined distance in an X-axis direction and also a plurality of alignment systems that are arrayed in a line along the X-axis direction detect each of marks at positions different from one another on the wafer. That is, detection of surface position information of the wafer surface at a plurality of detection points and detection of the marks at positions different from one another on the wafer are finished, only by the wafer stage (wafer) linearly passing through the array of the plurality of detection points of the multipoint AF system and the plurality of alignment systems, and therefore, the throughput can be improved.

Abstract: Method and apparatus (1a) for optical detection of the position of large-area printed products (10). The apparatus (1a) has conveyance means (2a) for movement of the printed products (10) along a conveyor path (4) past at least one contrasting light source (30), and at least one optical sensor (16). The conveyance means (2, 2a), the contrasting light source (30) and optical sensor (16) are arranged such that the printed products (10) can be conveyed between the contrasting light source (30) and the optical sensor (16).

Abstract: A dark field diffraction based overlay metrology device illuminates an overlay target that has at least three pads for an axis, the three pads having different programmed offsets. The overlay target may be illuminated using two obliquely incident beams of light from opposite azimuth angles or using normally incident light. Two dark field images of the overlay target are collected using ±1st diffraction orders to produce at least six independent signals. For example, the +1st diffraction order may be collected from one obliquely incident beam of light and the ?1st diffraction order may be collected from the other obliquely incident beam of light. Alternatively, the ±1st diffraction orders may be separately detected from the normally incident light to produce the two dark field images of the overlay target. The six independent signals from the overlay target are used to determine an overlay error for the sample along the axis.

Abstract: An optical position-measuring device for detecting the position of two objects movable relative to each other in at least one measuring direction includes a measuring standard which is joined to one of the two objects and possesses an incremental graduation extending in the measuring direction, as well as at least one reference marking at a reference position. The reference marking includes two reference-marking subfields disposed in mirror symmetry with respect to a reference-marking axis of symmetry, each of the subfields being made up of a structure extending in the measuring direction and having a locally changeable graduation period. In addition, the position-measuring device has a scanning unit which is joined to the other of the two objects and to which a scanning device is assigned that is used to generate at least one reference signal at the reference position.

Abstract: A drilling apparatus and control method is disclosed. An auxiliary device can be connected to a drilling machine. The auxiliary device includes a camera aligned in a working direction for recording an image of a working surface and a drill hole generated by the drilling machine. An image processing device is provided for identifying the drill hole in the image. Based on a distance from the drill hole to a reference point in the image, an evaluation device determines a distance from the drilling machine to the workpiece. A display device serves to indicate the determined distance.

Abstract: In a method for inspecting a conductor crimping portion of a crimping terminal, a laser displacement meter is disposed on a final stage of the terminal manufacturing line, and an upper surface of the flat-shaped bottom plate of the conductor crimping portion of a conveyed crimping terminal is measured, thereby acquiring, as an inspection result, data pertaining to at least one of items; namely, a width of the interior surface of a bottom plate, a width of the serrations, and a depth of the serrations.

Abstract: A combined metrology mark, a system, and a method for calculating alignment on a semiconductor circuit are disclosed. The combined metrology mark may include a mask misregistration structure and a wafer overlay mark structure.

Abstract: In an embodiment of the disclosure, there is provided an apparatus for calibrating a laser projection system. The apparatus has a structural frame assembly extending along three mutually orthogonal axes. The apparatus further has a plurality of non-movable reflective targets disposed on the structural frame assembly. The apparatus further has at least three positioning stages coupled to the structural frame assembly respectively about each of the three mutually orthogonal axes. At least one movable reflective target is disposed on each positioning stage. The non-movable reflective targets and the at least one movable reflective target are each configured to reflect a laser beam from a laser projection system.

Abstract: According to an example embodiment, a method to determine an exposure start position and orientation includes loading a substrate on a moving table. The substrate includes at least one alignment mark of a first set of alignment marks of a first pattern layer patterned thereon. At least one alignment mark of a second set of alignment marks of a second pattern layer is exposed on the substrate using maskless lithography. A position of the at least one alignment mark of the first set of alignment marks and a position of the at least one alignment mark of the second set of alignment marks on the substrate is measured. A relative orientation difference between a desired exposure start orientation and an obtained exposure start orientation is acquired using the measured positions of the at least one alignment mark of the first set of alignment marks and the at least one alignment mark of the second set of alignment marks.

Abstract: One embodiment of a method for finding an aim position of a measuring device may include building a color model for an imaging device, initializing a color encoding image, displaying or printing the image on the imaging device, acquiring measurement with the measuring device, converting the measurement into imaging device code values using the color model, calculating said aim position from said device code values. The color encoding image sets one-to-one relationship between coordinates and colors. The image is output on the imaging device and measured by the measuring device. The measurement is converted using the color model to the device code values. The aim position then calculated from position of the device code values in the encoding image.

Abstract: The invention relates to a method and an apparatus for measuring masks for photolithography. In this case, structures to be measured on the mask on a movable mask carrier are illuminated and imaged as an aerial image onto a detector, the illumination being set in a manner corresponding to the illumination in a photolithography scanner during a wafer exposure. A selection of positions at which the structures to be measured are situated on the mask is predetermined, and the positions on the mask in the selection are successively brought to the focus of an imaging optical system, where they are illuminated and in each case imaged as a magnified aerial image onto a detector, and the aerial images are subsequently stored. The structure properties of the structures are then analyzed by means of predetermined evaluation algorithms. The accuracy of the setting of the positions and of the determination of structure properties is increased in this case.

Abstract: A method is provided for determining the position of a structure within an image relative to a reference point, in which the structure has a center of symmetry, the method comprising: providing an image which comprises the structure and which has a reference point, carrying out at least one symmetry operation of the image with respect to the reference point, by means of which at least one mirror image is obtained which has a mirrored structure congruent relative to the structure, determining at least one displacement vector between a structure and a mirrored structure or two mirrored structures, and calculating the position of the structure as a position of the center of symmetry of the structure relative to the reference point from the at least one displacement vector. Furthermore, a position measuring device is provided for determining the position of a structure within an image relative to a reference point.

Abstract: The invention relates to a laser receiver for detecting a relative position of a defined zero point of said laser receiver with respect to a reference laser beam. Therefore, the laser receiver comprises a laser light photo sensor having a plurality of photo sensitive elements providing an electrical output when illuminated by said reference laser beam, a circuitry connected to said photo sensor for determination of said relative position and a visible readout for indication of said relative position, in particular for indicating if said zero point is on-grade with respect to said reference laser beam. According to the invention, at least a first laser fan emitter, with a laser light source and at least one fan-generating optical element, is provided for projecting a visible laser line onto a target surface, particularly in order to re-project a sharp marking-line through the vertical center of the reference laser beam.

Abstract: The invention relates to a method for detecting the transverse position of at least one sealing section (1, 2) on a packaging material (4), in particular a film wrapping, and/or the transverse position of the packaging material (4), wherein the packaging material (4) is displaced along a running direction (L), wherein the transverse position of the at least one sealing section (1, 2) or the packaging material (4) relative to the running direction (L) is detected by means of at least one sensor unit (5).

Abstract: In an embodiment a method for position determination of an object in a spatial area is provided in which the object is illuminated with at least one light beam. The light beam does not cover the complete spatial area and is guided into a part of the spatial area in which the object is present depending on the position of the object. In another aspect a method for measuring a surface is provided.

Abstract: The electro-optical system for determining position and orientation of a mobile part comprises a fixed projector having a center of projection (O) and a mobile part. The projector is rigidly linked with a virtual image plane, and the mobile part is rigidly linked with two linear sensors defining a first and a second direction vector. The fixed part projects onto the image plane and onto the sensors patterns, not represented, forming at least two secant networks of at least three segments that are each parallel. The two electro-optical devices are coplanar and their directions secant, the orientation and the position of the mobile part are determined by calculating the positions of the projections on the image plane of a first triple of points comprising the projections of three points.

Abstract: We propose a high precision positional system that uses optical encoder and photo sensor to provide coarse position. We add a camera, secured to photo sensor, and set the magnification to view a few dozen marks on the encoder. With vision processing we can obtain precise interpolation with respect to pitch.

Abstract: A system for inspecting a depth relative to a layer using a sensor with a fixed focal plane. A focus sensor senses the surface of the substrate and outputs focus data. In setup mode the controller scans a first portion of the substrate, receives the focus data and XY data, and stores correlated XYZ data for the substrate. In inspection mode the controller scans a second portion of the substrate, receives the focus data and XY data, and subtracts the stored Z data from the focus data to produce virtual data. The controller feeds the virtual data plus an offset to the motor for moving the substrate up and down during the inspection, thereby holding the focal plane at a desired Z distance.

Abstract: An apparatus and method for providing image contrast enhancement is disclosed. A mobile object is equipped with a laser source, polarization filter, and imaging apparatus. The reflection of the laser source output passes through the filter and is received by the imaging apparatus. If the output of the laser source impinges a metallic marker plate located at a pre-determined location, the filter decreases the intensity level of image components not associated with the reflection of the laser source output. The imaging apparatus uses such filtered image components to determine the position and/or orientation of the mobile object.

Abstract: The present invention provides an exposure apparatus including a projection optical system configured to project a pattern of a reticle located on an object plane onto a substrate located on an image plane, a phase shift type mark mounted on a stage which holds the substrate, an image sensor which is set at one of a position of the object plane and a position optically conjugate to the object plane, and is configured to capture an image of the mark via the projection optical system, and a controller configured to control the stage based on an interval between edge images, formed by a pair of edge portions, in the image of the mark captured by the image sensor.