Abstract: A semiconductor wafer may include a dummy field configured to enable overlay measurements. The enhanced dummy field may include a plurality of encoding blocs that enable OVL measurements to be made throughout the enhanced dummy field.

Abstract: A sensor system and method for analyzing a feature in a sensing volume. The system imaging the feature with a first sensor and a second sensor that cooperate to form a contiguous sensing volume.

Abstract: A target (16) for a metrology system (10) that monitors the position of an object (12) includes a target housing (18) and a detector assembly (20). The target housing (18) is substantially spherically shaped and includes a first detector region (218F). The target housing (18) includes a housing interior (228). A light beam (22A) impinging on the target housing (18) results in light energy within the housing interior (228). The detector assembly (20) includes a first detector (220A) secured to the first detector region (218F). The first detector (220?) generates a first signal when the light beam (22A) impinges on the target housing (18) that relates to the light energy within the housing interior (228).

Abstract: To position electronic devices in a rack, one of the electronic devices in the rack emits an optical signal. One of a plurality of optical receivers mounted to the rack receives the optical signal. An indication from the optical receiver is provided to specify that the optical receiver has received the first optical signal.

Abstract: A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal.

Abstract: Methods are disclosed wherein the structural health of a civil structure, such as, but not limited to, a bridge or the like is measured by electronic distance measurement (EDM) from a plurality of stable locations to a plurality of cardinal points on the structure in a methodical manner. By measuring the coordinates of the cardinal points, the dynamic and long-term static behavior of the structure provide an indication of the health of the structure. Analysis includes: comparison to a Finite Element Model (FEM); comparison to historical data; and modeling based on linearity, hysteresis, symmetry, creep, damping coefficient, and harmonic analysis.

Abstract: A position detection apparatus includes an imaging system, an illumination system including a rotary table having first and second aperture stops, both of which can be positioned on the pupil plane of the illumination system, a first image sensor that detects the image of the mark formed by the imaging system, a second image sensor that senses an image of the aperture stop for the imaging system and that of the first aperture stop, and a controller. The controller corrects the first aperture stop so as to reduce the adverse influence of a displacement of the first aperture stop, based on sensed images of the aperture stop for the imaging system and the first aperture stop. Based on the detected position of the image of the mark, the apparatus detects the position of an object to be detected using the illumination light having passed through the corrected first aperture stop.

Abstract: A three-dimensional position observation apparatus provided with a lens system having focusing and diaphragm mechanisms, for forming an image on an imaging plane by light from an observation object includes a beam steering member disposed in a light path extending from the observation object to the imaging plane, for changing a traveling direction of observation light into a plurality of different directions, and an image analyzing unit for analyzing a position of the observation object based on a positional relation between a plurality of images on the imaging plane formed by light passing through the beam steering member.

Abstract: Methods and apparatus for determining deflection of an equipment foundation, for example, a steam turbine foundation, are disclosed. The apparatus includes a laser beam source positioned to direct a laser beam above a surface of the foundation to be monitored, a plurality of targets positioned above the surface of the foundation, a detector adapted to detect a position of each if the targets relative to a position of the laser beam; and a device for comparing the detected position of each of the targets with a predetermined position to determine changes in the position to determine deflection of the foundation. Methods and various targets for implementing the invention are also disclosed.

Abstract: While a wafer stage linearly moves in a Y-axis direction, a multipoint AF system detects surface position information of the wafer surface at a plurality of detection points that are set at a predetermined distance in an X-axis direction and also a plurality of alignment systems that are arrayed in a line along the X-axis direction detect each of marks at positions different from one another on the wafer. That is, detection of surface position information of the wafer surface at a plurality of detection points and detection of the marks at positions different from one another on the wafer are finished, only by the wafer stage (wafer) linearly passing through the array of the plurality of detection points of the multipoint AF system and the plurality of alignment systems, and therefore, the throughput can be improved.

Abstract: A system for overlay offset measurement in semiconductor manufacturing including a radiation source, a detector, and a calculation unit. The radiation source is operable to irradiate an overlay offset measurement target. The detector is operable to detect a first reflectivity and a second reflectivity of the irradiated overlay offset measurement target. The calculation unit is operable to determine an overlay offset using the detected first and second reflectivity by determining a predetermined overlay offset amount which provides an actual offset of zero.

Abstract: A laser based coordinate measuring device measures a position of a remote target. The laser based coordinate measuring device includes a stationary portion, a rotatable portion, and at least a first optical fiber. The stationary portion has at least a first laser radiation source and at least a first optical detector, and the rotatable portion is rotatable with respect to the stationary portion. The first optical fiber system, which optically interconnects the first laser radiation source and the first optical detector with an emission end of the first optical fiber system, has the emission end disposed on the rotatable portion. The emission end emits laser radiation to the remote target and receives laser radiation reflected from the remote target with the emission direction of the laser radiation being controlled according to the rotation of the rotatable portion.

Abstract: An apparatus and a method for ascertaining a gap between a stationary member and a rotating member are disclosed. At least a reference beam and a signal beam, which have different focal lengths or which diverge/converge at different rates, are fixed to the stationary member and proximate to each other. The beams are projected across a gap between the stationary member and the rotating member toward the rotating member. The reference and signal beams are reflected by the translating member when it intersects the reference and signal beam, and the reflected reference and signal pulses are obtained. One or more features of the reflected reference pulse and the reflected signal pulse, such as a rise time of the pulses, a fall time of the pulses, a width of the pulses and a delay between the reflected reference pulse and the reflected signal pulse, among other factors, are obtained. The width of the gap is obtained using at least one of these factors.

Abstract: An imaging microoptics, which is compact and robust, includes at least one aspherical member and has a folded beam path. The imaging microoptics provides a magnification |??| of >800 by magnitude. Furthermore, a system for positioning a wafer with respect to a projection optics includes the imaging microoptics, an image sensor positionable in the image plane of the imaging microoptics, for measuring a position of an aerial image of the projection optics, and a wafer stage with an actuator and a controller for positioning the wafer in dependence of an output signal of the image sensor.

Abstract: A method is provided for determining the position of a structure within an image relative to a reference point, in which the structure has a center of symmetry, the method comprising: providing an image which comprises the structure and which has a reference point, carrying out at least one symmetry operation of the image with respect to the reference point, by means of which at least one mirror image is obtained which has a mirrored structure congruent relative to the structure, determining at least one displacement vector between a structure and a mirrored structure or two mirrored structures, and calculating the position of the structure as a position of the center of symmetry of the structure relative to the reference point from the at least one displacement vector.

Abstract: A position detection apparatus includes an imaging system, an illumination system including a rotary table having first and second aperture stops, both of which can be positioned on the pupil plane of the illumination system, a first image sensor that detects the image of the mark formed by the imaging system, a second image sensor that senses an image of the aperture stop for the imaging system and that of the first aperture stop, and a controller. The controller corrects the first aperture stop so as to reduce the adverse influence of a displacement of the first aperture stop, based on sensed images of the aperture stop for the imaging system and the first aperture stop. Based on the detected position of the image of the mark, the apparatus detects the position of an object to be detected using the illumination light having passed through the corrected first aperture stop.

Abstract: A marker device is described for vehicle measurement and has at least one mark that is optically detectable by a measurement camera, and it also has at least one level gauge connected to the mark. The level gauge is configured so that it enables a determination of the spatial orientation of the mark.

Abstract: The invention relates to a method for picking up semiconductor chips from a wafer table and, optionally, their mounting on a substrate by means of a pick-and-place system. The position and orientation of the semiconductor chip to be mounted next are determined by means of a first camera and made available in the form of positional data relating to a first system of coordinates. The position and orientation of the substrate place on which the semiconductor chip will be mounted are determined by means of a second camera and made available in the form of positional data relating to a second system of coordinates. The conversion of coordinates of the first or second system of coordinates into coordinates of motion of the pick-and-place system occurs by means of two fixed mapping functions and two changeable correction vectors. The correction vectors are readjusted on the occurrence of a predetermined event.

Abstract: An index detection unit (110) detects the image coordinates of indices from a captured image. An index allocation information updating unit (160) calculates the position and orientation of an image capturing apparatus using the image coordinates of the indices and allocation information of each of these indices. Furthermore, the index allocation information updating unit (160) re-calibrates allocation information of an unreliable index having a reliability indicating that the allocation information is unreliable. The index allocation information updating unit (160) updates allocation information held by an allocation information holding unit (140) in association with the unreliable index to the re-calibrated allocation information and a reliability indicating that the allocation information is reliable.

Abstract: The disclosed subject matter relates to a method and apparatus for position judgment, which can include a plurality of light sources and a photo-detector. The plurality of light sources can be configured to emit a plurality of pulsed lights towards an object from different directions, and a photo-detector can be configured to serially detect the light reflected from the object. A determination of whether the object is moving further away or coming closer to the apparatus can be judged by calculating at least one of a position, an area and a brightness of the object from the reflected light and comparing the data with the previous data for the same value(s). Thus, because the method of the disclosed subject matter does not require a measurement of time as in the conventional methods, the method can result in providing a similar apparatus with a simple configuration and at a low cost, and can be used as a sensor for detecting an obstacle and the like in a vehicle, alarm system, etc.

Abstract: An automatic scan and mark apparatus has a machine tool, a location detection module, a laser detector, an ink jet and a control computer. The machine tool has a movable module and a stage. The stage mounts and holds a specimen having a scraped surface. The control computer controls the location detection module to determine a position of the movable module, controls the laser detector to detect a surface morphology of the scraped surface in a measurement range, and activates the ink jet to eject inks on high points of the scraped surface of the specimen. Thus, the surface morphology is built automatically and high points are screened out and marked by colored ink. Manufacturer may easily redo scraping of determined high points based on the marked location on the specimen without burdensome measurement.

Abstract: A method detects a center of a wafer having a notch when aligning the wafer mounted on a movable mounting table. The method includes capturing an image of the wafer by using an imaging unit, the image including the notch; extracting an edge line from the image of the wafer; detecting a shape of the notch from the edge line; and calculating the center of the wafer based on the shape of the notch.

Abstract: A method for predicting imaging characteristics fluctuation of a projection optical system in an exposure apparatus which projects a pattern formed on a mask onto a photosensitive substrate through the projection optical system is provided. In a measurement step, the projection optical system is irradiated with exposure light under a first exposure condition to measure first imaging characteristics fluctuation of the projection optical system. Then, before an imaging characteristics value is restored to an initial value at the start of irradiation after irradiation is stopped, the projection optical system is irradiated with the exposure light under a second exposure condition to measure second imaging characteristics fluctuation of the projection optical system. Approximate expressions of the measured first and second imaging characteristics fluctuations are calculated based on an imaging characteristics model.

Abstract: A position measuring device includes a plurality of concave marks, a light source portion, a light receiving portion, and a concave portion measuring portion. The concave marks are formed on an external wall of an object to be a measuring target. Each of the plurality of the concave marks includes a plurality of concave portions disposed on a concentric circle with a preset concave mark central position to be a center of the concentric circle. The concave portions are provided so that densities of the concave portions become lower as distances from the concave mark central position become longer in each of the concave marks. The light source portion irradiates the object with an irradiating light. The light receiving portion receives a reflected light from the object, the refracted light being originated from the irradiating light. The concave portion measuring portion measures each three-dimensional position of the concave marks.

Abstract: An overlay mark is described, including N sets of parallel x-directional linear patterns respectively defined by N (?2) exposure steps and N sets of parallel y-directional linear patterns respectively defined by the N exposure steps, and a set of parallel x-directional photoresist bars and a set of parallel y-directional photoresist bars both formed in a lithography process. The N sets of x-directional linear patterns and the set of x-directional photoresist bars are arranged in parallel. The N sets of y-directional linear patterns and the set of y-directional photoresist bars are arranged in parallel.

Abstract: A sensor system and method for analyzing a feature in a sensing volume. The system projecting a pattern onto the feature and imaging the pattern where the pattern intersects with the feature, where the pattern is a series of lines that are encoded to identify at least one line of the series of lines.

Abstract: A system and method of characterizing a parameter of an ultra thin film, such as a gate oxide layer. A system is disclosed that includes a structure having a pseudo substrate positioned below an ultra thin film, wherein the pseudo substrate includes an optical mirror for enhancing an optical response; and a system for characterizing the ultra thin film by applying a light source to the ultra thin film and analyzing the optical response.

Abstract: A method of forming a monitor mark includes forming an insulating film on a semiconductor substrate, and forming a first repetitive line pattern group and a second repetitive line pattern group by patterning the insulating film on the semiconductor substrate, such that the first repetitive line pattern group and the second repetitive line pattern group face each other with a predetermined space therebetween.

Abstract: The position of a product is measured using an alignment mark on the product. Radiation is transmitted towards the alignment mark and diffracted by a pattern in the alignment mark. Position information is determined from phase relations of the diffracted radiation. The alignment mark comprises a set of mutually parallel conductor tracks from which the diffracted radiation is collected, the pattern being defined by a pattern of variation of the pitch between successive tracks as a function of position along the surface of the product. Thus, for example the pattern comprises alternating first and second areas wherein the pitch has a first and second value, respectively. Because the tracks in the different parts of the pattern, such as the first and second areas, are parallel to each other improved measurements are possible.

Abstract: The invention relates to a device for capturing the rotary position (D) of at least one rotary device (4) provided for receiving a container (3) by means of at least one sensor unit (5), wherein the rotary device (4) is provided for driving the container (3) about a rotary axis (DA), and the at least one sensor unit (5) is advantageously designed for non-contact capturing of the rotary position (D) of the rotary device (4) relative to the rotary axis (DA).

Abstract: While a wafer stage linearly moves in a Y-axis direction, a multipoint AF system detects surface position information of the wafer surface at a plurality of detection points that are set at a predetermined distance in an X-axis direction and also a plurality of alignment systems that are arrayed in a line along the X-axis direction detect each of marks at positions different from one another on the wafer. That is, detection of surface position information of the wafer surface at a plurality of detection points and detection of the marks at positions different from one another on the wafer are finished, only by the wafer stage (wafer) linearly passing through the array of the plurality of detection points of the multipoint AF system and the plurality of alignment systems, and therefore, the throughput can be improved, compared with the case where a detection operation of the marks and a detection operation of the surface position information (focus information) are independently performed.

Abstract: An exposure method capable of performing accurate exposure without using a large photomask. The exposure method performs exposure while relatively moving a photomask above a substrate and includes a step of performing position correction of the photomask by performing, on a front side of the photomask relatively moved in a moving direction, image recognition of a pattern prearranged on the substrate such as a line and a black matrix and by correcting deviation of the photomask with respect to the pattern, and a step of checking the position correction of the photomask by performing image recognition of a reference mark arranged on the photomask and by determining whether or not the position correction of the photomask is accurately performed in the step of performing the position correction of the photomask.

Abstract: An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.

Abstract: An apparatus measures properties, such as overlay error, of a substrate divided into a plurality of fields. The apparatus includes a radiation source configured to direct radiation onto a first target of each field of the substrate. Each first target (T4G) has at least a first grating and a second grating having respective predetermined offsets, the predetermined offset (+d) of the first grating being in a direction opposite the predetermined offset (?d) of the second grating. A detector is configured to detect the radiation reflected from each first target and to obtain an asymmetry value for each first target from the detected radiation.

Abstract: An image-forming device includes an image-forming unit, a sensor, a screening unit, an excluding unit, and a determining unit. The image-forming unit forms a plurality of marks on an object. The sensor detects a light reflected on the object, the reflected light including a plurality of waveforms. The screening unit screens the plurality of waveforms into a plurality of mark waveforms corresponding to the plurality of marks respectively and a plurality of noise waveforms other than the plurality of mark waveforms. The excluding unit excludes a mark waveform adjacent to the noise waveform from the plurality of mark waveforms. The determining unit determines a position of each mark based on the plurality of mark waveforms from which the mark waveform adjacent to the noise waveform is excluded.

Abstract: A sensor system for analyzing a feature in a sensing volume. The sensor system includes a laser source and a sensor. The first laser source projects a laser line into the sensing volume and onto the feature forming a laser stripe on the feature. The sensor images the laser stripe where the laser line intersects with the feature. The relationship between the sensor and the first laser source is precalibrated. The sensor uses the laser stripe to determine the position and/or orientation of the feature.

Abstract: An article recognition apparatus includes a marker having four or more unit pattern marks which are provided at a predetermined positional relationship on an article to be recognized and which are formed in such a way that a density pattern sequentially changes from a center position to a periphery of the pattern marker. The article recognition apparatus also includes an imaging tool that is disposed opposite the article to be recognized and that captures an image of the marker; a supporting mechanism that supports the imaging tool so as to enable setting of the imaging tool at least at a non-face-up measurement position; and a layout information recognition block that recognizes layout information about a position and an attitude of the article to be recognized.

Abstract: An alignment apparatus for a planar member includes, an image capturing unit which captures an image of a rotationally asymmetrical alignment mark provided on the planar member, a position detection unit which detects a position of the alignment mark from the image, a position adjusting unit which adjusts, based on the detected position of the alignment mark, the position of the planar member relative to a reference position, and an orientation detection unit which detects an orientation of the planar member based on the rotational asymmetry of the alignment mark captured in the image.

Abstract: According to the invention, the system comprises an infrared detector (7) for alternately generating images (5?) of sources of light (5) in the near infrared emitted by a missile flying towards a target and thermal images of the observed scene, said thermal images being visible on the display means (11).

Abstract: A pattern generator includes: a writing tool and a calibration system. The writing tool is configured to generate a pattern on a workpiece arranged on a stage. The calibration system is configured to determine a correlation between a coordinate system of the writing tool and a coordinate system of a calibration plate on one of the stage and the workpiece. The calibration system is also configured to determine the correlation at least partly based on an optical correlation signal, or pattern, in a form of at least one optical beam being reflected from at least one reflective pattern on the surface of the calibration plate.

Abstract: A method of effecting a purchasing transaction includes providing a printed form having printed thereon coded data distributed over an area; capturing an image of the form using a sensing device, the captured image showing a portion of the coded data; decoding at least some of the coded data within the captured image; determining from the coded data an identity of the form, a position of the coded data on the form, and a parameter of the purchasing transaction; determining a position of the sensing device relative to the form from a distortion of the captured image and the determined position of the coded data; compiling the identify of the form, the position of the sensing device, and the parameter of the purchasing transaction as indicating data; receiving in a computer system the indicating data; and identifying, in the computer system and from the indicating data, at least one parameter relating to a purchasing transaction.

Abstract: Measurement targets for use on substrates, and overlay targets are presented. The targets include an array of first regions alternating with second regions, wherein the first regions include structures oriented in a first direction and the second regions include structures oriented in a direction different from the first direction. The effective refractive index of the two sets of regions are thereby different when experienced by a polarized beam, which will act as a TM-polarized beam when reflected from the first set of regions, but as a TE-polarized beam when reflected from the second set of regions.

Abstract: An image forming apparatus including an image carrying member, a detecting section, and a linear-speed deriving section. The image carrying member carries a toner image. The detecting section detects passages of a mark, provided on the image carrying member, at a plurality of predetermined detection positions. The linear-speed deriving section determines a linear speed of the image carrying member from times at which the detecting section detects the passage of the mark.

Abstract: A sensor system and a reverse clamp is provided. The reverse clamp may include a back portion, a first arm, and a second arm. The first and second arm extending from the back portion to form an opening configured to receive a cylindrical arm.

Abstract: An optical position-measuring device for detecting the position of two objects movable relative to each other in at least one measuring direction includes a measuring standard which is joined to one of the two objects and possesses an incremental graduation extending in the measuring direction, as well as at least one reference marking at a reference position. The reference marking includes two reference-marking subfields disposed in mirror symmetry with respect to a reference-marking axis of symmetry, each of the subfields being made up of a structure extending in the measuring direction and having a locally changeable graduation period. In addition, the position-measuring device has a scanning unit which is joined to the other of the two objects and to which a scanning device is assigned that is used to generate at least one reference signal at the reference position.

Abstract: A liquid crystal display device includes: a component substrate including a transistor device; an opposing substrate disposed so as to face the component substrate through a liquid crystal layer; a back light disposed on a side of the component substrate located opposite to the opposing substrate; first and second measurement portions formed on a surface of the component substrate and the opposing substrate, respectively, located on the liquid crystal layer side and used for measuring a difference between bonding positions of the component substrate and the opposing substrate; a measurement opening portion disposed on the second measurement portion side; and a light shielding layer disposed between the component substrate and the second measurement portion and preventing transmission of light from the back light through the measurement opening portion.

Abstract: A method for determining the centrality of masks is disclosed. The mask is positioned in a coordinate measuring device on a measurement table displaceable in a direction perpendicular to the optical axis of an imaging measurement system in an interferometrically measurable way. The position of a mask coordinate system with respect to the measuring device coordinate system is determined based on at lest two structures on the mask. The relative distance from one of the at least first and second outer edges to the at least two structures is determined. The coordinate measuring machine determines the actual coordinates of the at least two structures with respect to the respective outer edges, which must not exceed a predetermined deviation from a desired value.

Abstract: A laser imaging system and method of projecting a laser template on a surface, including independently determining a position and orientation of the surface using an external metrology device, independently determining a position and orientation of a laser projector using the metrology device, generating a signal from the metrology device to a computer and orienting the laser projector relative to the surface to project a laser template. The apparatus includes a plurality of metrology transmitters at fixed locations, a plurality of metrology receivers at fixed locations relative to the surface and a plurality of metrology receivers at fixed locations relative to either the laser projector or laser targets within a field of view of the laser projector. A laser projector and frame assembly is also disclosed, wherein the metrology receivers are located on the frame and the frame includes laser targets for correcting laser drift.

Abstract: The invention teaches using a directional light source to direct light at a target having directional indicia thereon. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract: The system for surface inspection is arranged to detect relative displacement and/or vibration features of a plurality of points of a plurality of elements (51) forming part of a mechanical structure (5), such as a micro- or nanomechanical structure. A light beam is displaced along the mechanical structure along a first trajectory (A), so as to detect a plurality of subsequent reference positions (C) along said first trajectory (A), and the light beam is further displaced along the mechanical structure along a plurality of second trajectories (B), each of said second trajectories (B) being associated with one of said reference positions (C). The invention further relates to a corresponding method and to a program for carrying out the method.