Abstract: A lens plate includes a transparent substrate wafer, and a plurality of lenses and spacers that are formed of a single portion of material on the transparent substrate wafer. An assembly includes a first lens plate that includes a first transparent substrate wafer, a plurality of first lenses and a plurality of spacers, the first lenses and spacers being formed of a single portion of material on said first transparent substrate wafer. The assembly also includes a second lens plate that includes a second transparent substrate wafer and a plurality of second lenses formed thereon, each of the plurality of second lenses corresponding to a respective one of the plurality of first lenses. The lens plates are aligned such that each of the plurality of first lenses aligns with the respective one of the plurality of second lenses, and the lens plates are bonded to one another.

Abstract: An infrared (IR) light device is provided comprising: a main casing filled with a gas to prevent condensation from forming on an interior surface of the visible light filter; and a plurality of IR light emitting diodes (LEDs) mounted in the main casing, wherein the casing includes heat dissipating features.

Abstract: A method for determining the absorption of a blank (2) for producing an optical element (3), including: radiating a heating light ray (8) through the blank (2) for the purpose of heating the blank (2), and determining the absorption in the blank (2) by measuring at least one property of a measurement light ray (10) influenced by the heating of the blank (2). In the method, either the heating light ray (8) and the measurement light ray (10) or the heating light ray and a further heating light ray are oriented to enter into the blank (2) through a first polished surface (2a) or a second polished surface (2b), situated opposite the first surface, and meet one another exclusively in the interior of the blank (2), preferably in a volume (12) used for the production of the optical element (3). An associated measuring apparatus (1), optical element (3), and optical arrangement are also disclosed.

Abstract: The present invention relates to a high resolution optical system. The optical system of the present invention includes, sequentially from an object side, a first lens having a positive refractive power and an object-side surface convex toward the object side; a second lens having a negative refractive power and an upwardly concave upper surface; a third lens having a positive refractive power; a fourth lens having a negative refractive power; a fifth lens having a positive refractive power and an upwardly convex upper surface; and a six lens having a negative refractive power and an upwardly concave upper surface.

Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

Abstract: A switchable lens device, a method of manufacturing the same, and a 2-dimensional (2D) and 3-dimensional (3D) image display device using the same are disclosed. The switchable lens device includes a first base film, a first lens layer which is formed on the first base film, has a first refractive index in a first direction, has a second refractive index less than the first refractive index in a second direction vertical to the first direction, and has concave surfaces, a second lens layer which has convex surfaces filled in the concave surfaces of the first lens layer and has the first refractive index, and a second base film attached to the second lens layer.

Abstract: The present invention provides a curable, organic polymeric photochromic composition comprising: a photochromic amount of at least one photochromic material; a polymeric polyol having carbonate groups along its backbone and having a number average molecular weight greater than 5000 g/mole; and a curing agent having reactive functional groups capable of reacting with hydroxyl groups on the polymeric polyol. After curing and after the Photochromic Performance Test the composition demonstrates a T1/2 fade rate of less than 200 seconds. Also provided is a photochromic article comprising a rigid substrate and a photochromic organic polymeric coating applied to a surface of the substrate. The photochromic organic polymeric coating comprises the composition described above.

Abstract: An IR-cut filter includes a substrate and an infrared filtering film. The substrate is made of sapphire, and includes a first surface and a second surface opposite to the first surface. The infrared filtering film covers the first surface of the substrate and increases the reflectivity in relation to infrared light, thus filtering out the infrared light. The infrared filtering film includes a number of first high refraction index layers and a number of first low refraction index layers alternately stacked on the first surface of the substrate.

Abstract: An EUV light source is configured for generating an EUV light for an exposure device. The EUV light source includes a chamber, a target supply device configured for supplying a target into the chamber, an optical system for introducing laser light from a driver laser into the chamber and irradiating the target with the laser light to turn the target into plasma from which EUV light is emitted, and an EUV collector mirror in the chamber. The EUV collector mirror may include a multilayered reflecting surface with grooves and collect the EUV light from the plasma to a focal spot. The grooves can be arranged in a concentric fashion, and be configured for diffracting at least light at a wavelength which is the same as that of the laser light from the driver laser.

Abstract: The present invention relates to laminated solar concentration devices and to the production thereof from polymeric materials. The inventive solar concentration devices can be employed in photovoltaic systems or in solar thermal energy systems. The inventive solar concentration devices comprise Fresnel lenses and enable the efficient concentration of solar radiation onto objects such as solar cells or absorber units, irrespective of the geometry thereof. This relates, for example, to the area of a high-performance solar cell as used in concentrated photovoltaics (CPV), and equally to absorbers which are used in concentrated solar thermal energy systems (CSP). The invention in particular relates to the use of an UV- and weathering-stabilizer package for said laminated solar concentration devices, for improving optical lifetime and weathering resistance, and for preventing delamination.

Abstract: An optical arrangement of lenses configured for use with an ultra wide band optical sensor is provided herein. The optical arrangement is associated with a back focal plane and further includes a first, a second, a third, a fourth, a fifth, and a sixth lens ordered from first to sixth along a common optical axis such that the first lens is farthest from the back focal plane and the sixth lens is closest to the back focal plane, wherein the first and the second lenses are made of zinc sulfide, the third and the sixth lenses are made of barium fluoride, the fourth lens is made of magnesium oxide, and the fifth lens is made of calcium fluoride, and wherein the lenses are selected to transfer any light within a wavelength range that contains 0.42 ?m to 3.6 ?m.

Abstract: An optical element includes a substrate and a film. The substrate made of sapphire. The film is covered on the substrate and is configured for increasing reflectivity of ultraviolet lights and filtering the ultraviolet lights. The film includes a plurality of high refractive index layers and a plurality of low refractive index layers alternately stacked on the substrate.

Abstract: A lens plate includes a transparent substrate wafer, and a plurality of lenses and spacers that are formed of a single portion of material on the transparent substrate wafer. An assembly includes a first lens plate that includes a first transparent substrate wafer, a plurality of first lenses and a plurality of spacers, the first lenses and spacers being formed of a single portion of material on said first transparent substrate wafer. The assembly also includes a second lens plate that includes a second transparent substrate wafer and a plurality of second lenses formed thereon, each of the plurality of second lenses corresponding to a respective one of the plurality of first lenses. The lens plates are aligned such that each of the plurality of first lenses aligns with the respective one of the plurality of second lenses, and the lens plates are bonded to one another.

Abstract: An optical element includes a transparent substrate and an infrared absorbing layer on an object-side surface of the transparent substrate. The infrared absorbing layer is a thermo sensitive ink printed or deposited on the transparent substrate. The thermo sensitive ink is cured to blue color.

Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

Abstract: According to one embodiment, a lens array of this embodiment is equipped with a plurality of lenses formed on a substrate, and light-blocking films including a plurality of layers, are formed by using an ultraviolet curable ink deposited between the lenses.

Abstract: According to one embodiment, a lens array is provided with a plurality of lenses, which are formed in an effective area of a substrate, a dam structure, which is formed in an outer periphery of the plurality of lenses, and light-blocking films, which are formed using an ink and positioned between the plurality of lenses and between the plurality of lenses and the dam structure.

Abstract: A lens module (10) for image capture comprises a first positive meniscus lens (16) having a focal length F1 and comprising a first convex optical surface (18) facing the object side (12), and a second concave optical surface (20) facing the image side (14), and a second positive meniscus lens (22) having a focal length F2 and comprising a third concave optical surface (24) facing the object side (12), and a fourth convex optical surface (26) facing the image side (14). The four surfaces follow the Equations: Zi=CURVi Yi2/(1+(1?(1?Ki) CURVi2 Yi2)1/2)+(Ai) Yi2+(Bi) Yi4+(Ci) Yi6+(Di) Yi8 and Mi=1?(1+Ki)(CURVi)2(Ri)2 wherein: i is the surface number, Ki is the conic constant of the i-th surface, CURVi is the curvature of the i-th surface at the optical axis, Ai, Bi, Ci, and Di are aspheric coefficients of the i-th surface, and Ri is the effective radius of the aperture of the i-th surface. The following relations can be satisfied: 0.70<F1/F2<1.

Abstract: The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided upon the front surface of a mirror, and blazed grooves are formed in this multi layer. Radiation which is incident from a light source device is incident upon this mirror, and is reflected or diffracted. Since the reflected EUV radiation (including diffracted EUV radiation) and the radiation of other wavelengths are reflected or diffracted at different angles, accordingly their directions of progression are different. By eliminating the radiation of other wavelengths with an aperture and/or a dumper, it is possible to irradiate a mask only with EUV radiation of high purity.

Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

Abstract: The invention relates to a beam line (30) for a source of extreme ultraviolet (EUV) radiation, wherein a EUV-radiating plasma is generated by irradiating droplets of a suitable target material with a focused laser beam (5) at a plasma generation point, said beam line (30) comprising within a vacuum chamber (7): a beam delivery system (2) comprising a focusing lens and means for cooling and shielding said focusing lens; a EUV mirror collector (1), which collects and focuses the radiated EUV in a EUV beam (6) at an intermediate focus (IF); a beam dump (3) capable of damping at least a portion of the laser beam (5) without imposing a shadow on the collected and focused EUV beam (6); and an intermediate focus module (4) for blocking particles from leaving the vacuum chamber (7) with the EUV beam (6).

Abstract: Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17), and a third partial objective (19) imaging the second intermediate image onto the image field. The second partial objective is a catadioptric objective having exactly one concave mirror and having at least one lens (L21, L22). A first folding mirror (23) deflects the radiation from the object plane toward the concave mirror and a second folding mirror (25) deflects the radiation from the concave mirror toward the image plane. At least one surface of a lens (L21, L22) of the second partial objective has an antireflection coating having a reflectivity of less than 0.

Abstract: Disclosed is an optical element for use in an optical apparatus having a light source which emits a light flux with a wavelength ? (350 nm???450 nm), the optical element containing: a molded portion formed by molding a resin; and one or a plurality of anti-reflection layers formed on the molded portion, wherein at least one of the anti-reflection layers is made of SixOy; and an elemental ratio r (r=y/x) designating an ratio of O to Si in the molecule of SixOy satisfies a requirement represented by Formula (1): 1.40?r?1.80.

Abstract: A lens module includes a lens barrel, at least one lens, and a filter element. The lens barrel includes an object-side end and an image-side end opposite to the object-side end. The at least one lens is received in the lens barrel. The filter element is received in the lens barrel, and includes a transparent substrate, an anti-reflection film, and an infrared filtering film. The transparent substrate includes an object-side surface facing the object-side end and an image-side surface facing the image-side end. The anti-reflection film is coated on the object-side surface, and the infrared filtering film is coated on the image-side surface.

Abstract: The invention relates to a dual-field (NF and WF) imaging system comprising an optronic detector (1) and an optical combination of narrow-field focal length FNF having, an optical axis a front lens, a narrow-field entrance pupil situated in the vicinity of the front lens, a real wide-field entrance pupil, that is to say situated upstream of the front lens, an intermediate focal plane (IFP). The optical combination has, on the optical axis, the following refractive groups: a convergent front group G1 of focal length F, where F<FNF/2, this group G1 comprising the front lens, a divergent field-change group G2 that can move along the optical axis, this group being situated upstream of the IFP in NF configuration and downstream of the IFP in WF configuration, a relay group G3 imaging the IFP on the focal plane of the detector.

Abstract: This invention provides an NIR imaging lens assembly comprising a lens element with refractive power made of a visible-light-absorbable material, and a filter or a filter film formed on one lens element with refractive power for filtering out infrared light, wherein the number of lens elements with refractive power in the NIR imaging lens assembly is N, and wherein N?2. The above lens arrangement allows light in a specific NIR wavelength range to pass through the lens assembly, thereby reducing interferences or influences from light in the other wavelength ranges. As a result, the resolution of the imaging lens assembly is improved, and its total track length is reduced effectively so that the entire lens system can be compact.

Abstract: A confocal scanning microscope including: an objective system (second objective lens 23 and objective lens 24) illuminating a sample SA with illumination light; a scanning mechanism 31 scanning the sample SA to obtain an intensity signal; and a scanning optical system 32 provided between the scanning mechanism and the objective system. The scanning optical system composed of, in order from the scanning mechanism side, a first positive lens group G1, a second negative lens group G2, and a third positive lens group G3. The third lens group has two chromatic aberration correction portions each formed by a positive lens and a negative lens or negative lens and positive lens. Glass materials are selected such that one performs chromatization and the other performs achromatization, thereby providing a confocal scanning microscope capable of correcting lateral chromatic aberration generated in the objective system in the specific wavelength region by the scanning optical system.

Abstract: An objective having a plurality of optical elements arranged to image a pattern from an object field to an image field at an image-side numerical aperture NA>0.8 with electromagnetic radiation from a wavelength band around a wavelength ? includes a number N of dioptric optical elements, each dioptric optical element i made from a transparent material having a normalized optical dispersion ?ni=ni(?0)?ni(?0+1 pm) for a wavelength variation of 1 pm from a wavelength ?0. The objective satisfies the relation ? ? i = 1 N ? ? ? ? n i ? ( s i - d i ) ? ? 0 ? NA 4 ? A for any ray of an axial ray bundle originating from a field point on an optical axis in the object field, where si is a geometrical path length of a ray in an ith dioptric optical element having axial thickness di and the sum extends on all dioptric optical elements of the objective. Where A=0.2 or below, spherochromatism is sufficiently corrected.

Abstract: An optical information recording/reproducing optical system, comprising a light source; an optical element converting a laser beam into a substantially collimated beam; and an objective lens, wherein a wavelength ? (unit: nm) of the laser beam falls within a range of 400<?<410, the optical element and the objective lens are made of same resin materials or different resin materials having a glass transition temperature of Tg>115° C., each of optical surfaces is configured not to have an optical thin film which contains at least one of or elements of titanium, tantalum, hafnium, zirconium, niobium, molybdenum and chromium, each of optical surfaces of the optical element is provided with an antireflection film made of one of or a mixture of at least two of silicon oxide, aluminum oxide, aluminum fluoride and magnesium fluoride, and a following condition is satisfied ? i = 1 n - 1 ? ( 1 - R ( BL ) ? i 100 ) - ? i = 1 n - 1 ? ( 1 - R ( UV ) ? i 100 ) > 0.

Abstract: A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.

Abstract: A projection lens of a projection exposure apparatus, for imaging a mask which can be positioned in an object plane onto a light-sensitive layer which can be positioned in an image plane, includes a housing, in which at least one optical element is arranged, at least one partial housing which is arranged within said housing and which at least regionally surrounds light passing from the object plane as far as the image plane during the operation of the projection lens, and a reflective structure, which reduces a light proportion which reaches the image plane after reflection at the at least one partial housing, by comparison with an analogous arrangement without said reflective structure.

Abstract: Various embodiments provide an optical system including a first lens group having a plurality of lenses, the first lens group being configured to correct for an axial chromatic aberration; a second lens group having a least one lens, the second lens group being disposed adjacent the first lens group; and a third lens group having a plurality of lenses, the third lens group being configured to correct for a lateral chromatic aberration and field curvature, the third lens group being disposed adjacent the second lens group. The first, second and third lens groups are configured to provide a wide field of view greater than approximately 20 deg., and an f-number of less than approximately F/2 in a wavelength range between approximately 8 ?m and approximately 12 ?m.

Abstract: Plasmonic condensers for generating surface plasmon at an evanescent wave surface can include a substrate layer, a metal layer comprising the evanescent wave surface; and a media layer disposed between the metal layer and the substrate layer. The media layer can be active or passive and can include a source of radiation that interacts with the metal layer to create surface plasmons that are not substantially optically detectable as far field radiation until an interfering object is brought into proximity with the evanescent wave surface. When an interfering object such as a sample or specimen is brought into proximity with the evanescent wave surface, it causes coupling of at least some of the surface plasmons into propagating radiation detectable by an objective lens. Systems, methods, and the like are disclosed, as are features of a plasmonic meta-materials illuminator.

Abstract: An optical lens assembly having a fluorescent layer is disclosed, which includes a partition frame with a partition ring protruding inwardly from an inner wall surface of the partition frame, two optical lenses, and a fluorescent layer, wherein a slot space is defined by the two optical lenses and the partition ring of the partition frame, and the fluorescent layer is accommodated within the slot space. The top optical lens can be a flat slab lens, or a convex lens. When the optical lens assembly having a fluorescent layer is used in the optical device, the moisture can be prevented from entering the fluorescent layer, and thus the optical performance of the fluorescent layer can be maintained over a long period.

Abstract: Fresnel lenses are prepared from a transparent substrate and a structured polyurethane layer. The structured polyurethane layer includes a curable reaction mixture. The curable reaction mixture includes a polyol, a polyisocyanate, a catalyst, and at least one UV stabilizer. The Fresnel lenses may be used in panel arrays and in solar power generation devices.

Abstract: The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided upon the front surface of a mirror, and blazed grooves are formed in this multi layer. Radiation which is incident from a light source device is incident upon this mirror, and is reflected or diffracted. Since the reflected EUV radiation (including diffracted EUV radiation) and the radiation of other wavelengths are reflected or diffracted at different angles, accordingly their directions of progression are different. By eliminating the radiation of other wavelengths with an aperture and/or a dumper, it is possible to irradiate a mask only with EUV radiation of high purity.

Abstract: The invention proposes numerous aspects for improving greenhouses which may lead to durable improvement of the worldwide climate system.

Abstract: A method of manufacturing a polarization-modulating optical element is provided. The element causes, for light passing through the element and due to stress-induced birefringence, a distribution of retardation between orthogonal states of polarization. The method includes joining a first component and a second component. A non-plane surface of the first component is provided with a defined height profile is joined with a plane surface of the second component. A mechanical stress causing the stress-induced birefringence is produced in the such formed polarization-modulating optical element.

Abstract: The EUV light source device eliminates radiation other than EUV radiation from the light which it emits, and supplies only the EUV radiation to an exposure device. A composite layer consisting of a plurality of Mo/Si pair layers is provided upon the front surface of an EUV collector mirror, and blazed grooves are formed in this composite layer. Radiation emitted from a plasma is incident upon this EUV collector mirror, and is reflected or diffracted. The reflected EUV radiation (including diffracted EUV) proceeds towards an intermediate focal point IF. The radiation of other wavelengths proceeds towards some position other than this focal point IF, because its reflection angle or diffraction angle is different. A SPF shield having an aperture portion is provided at the focal point IF. Accordingly, only the EUV radiation passes through the aperture portion and is supplied to the exposure device, while the other radiation is intercepted by the shield.

Abstract: Provided is a solar control composition comprising an infrared absorbing phthalocyanine compound or naphthalocyanine compound and a resin having a modulus from 20,000 psi (138 MPa) to 1000 psi (7 MPa) and solar control laminates comprising the solar control composition of the invention.

Abstract: An imaging microoptics, which is compact and robust, includes at least one aspherical member and has a folded beam path. The imaging microoptics provides a magnification |??| of >800 by magnitude. Furthermore, a system for positioning a wafer with respect to a projection optics includes the imaging microoptics, an image sensor positionable in the image plane of the imaging microoptics, for measuring a position of an aerial image of the projection optics, and a wafer stage with an actuator and a controller for positioning the wafer in dependence of an output signal of the image sensor.

Abstract: There is provided an imaging lens including: a transparent substrate; an upper lens disposed on a top of the transparent substrate; and a lower lens disposed on a bottom of the transparent substrate to correspond to the upper lens, wherein one of the upper and lower lenses includes a lens element and a partition wall formed higher than the lens element to surround the lens element. Also, there is provided a method of manufacturing the same. In the imaging lens, the partition wall is replicated together with the lens element on one or both surfaces of the transparent substrate. The partition wall is formed higher than the lens element and has a flat top surface. Therefore, when another lens element is replicated on an opposite surface of the transparent substrate, the previously replicated lens element is prevented from deformation.

Abstract: Selective fractionation and separation of melanin and use of fractionated or separated melanin in connection with light filters is disclosed. Further, light filters that use yellow melanin or melanin like materials prepared to have a yellow color and a melanin transmission spectrum in combination with a photochromic dye are disclosed. The yellow form of melanin has minimal impact on the perception of light intensity with transmission values greater than 80%. The combination allows for a single light filter suitable for both night driving and sunglass applications and which also preserve color perception.

Abstract: UV curing of adhesives with light beam shaping utilizes a spot curing process that focuses a limited amount of UV light onto a target area, such as glue dots. A focusing lens may be used to direct the UV light beam to the target area. The target areas have different geometrical shapes, and the UV light is advantageously concentrated in a more efficient manner. Beam-shaping optics or lenses are used to facilitate re-shaping and re-defining the UV-light beam. The UV beam may be defined and limited to a rectangular spot to improve the spot process quality and efficiency.

Abstract: Light filters that use yellow melanin or melanin like materials prepared to have a yellow color and a melanin transmission spectrum in combination with a photochromic dye are disclosed. The yellow form of melanin has minimal impact on the perception of light intensity with transmission values greater than 80%. The combination allows for a single light filter suitable for both night driving and sunglass applications and which also preserve color perception.

Abstract: According to one embodiment, an optical head includes a light emitting substrate emitting light and allow light of specific wavelength to pass; a mounting base to which the light emitting substrate is fixed and which includes a groove formed in an area overlapping the light emitting substrate; an adhesive filled in the groove of the mounting base and cured by receiving the light having the specific wavelength; and a lens condensing the light emitted from the light emitting substrate.

Abstract: An IR camera comprising an optical system further comprises an additional optical element arranged in the form of a disk that is transparent to the infrared radiation in the beam path and at least a first motor arranged to tilt the additional optical element around a first axis substantially perpendicular to the beam path, and a control device for controlling said at least first motor in dependence of a first registered movement of the camera.

Abstract: The present invention relates to a micro-composite pattern lens and to a method for manufacturing same. The micro-composite pattern lens of the present invention has a micro-composite pattern with one or more protrusions formed on one side of the lens having a predetermined curvature, and optical polymer nanoparticles arranged in the lens. The micro-composite pattern of the lens may form a wider angle of light emission, thus enabling an LED source, which is a point light source, to be converted into a surface light source having superior luminous intensity uniformity. The lens of the present invention is advantageous in that a single lens may serve as a light guide plate, a prism plate, and a diffusion plate, this eliminating the necessity of stacking optical plates, which might otherwise be required for conventional backlight units.

Abstract: A spectral purity filter is configured to allow transmission therethrough of extreme ultraviolet (EUV) radiation and to refract or reflect non-EUV secondary radiation. The spectral purity filter may be part of a source module and/or a lithographic apparatus.

Abstract: Various embodiments related to rear-projection image display are disclosed. For example, one disclosed embodiment provides a projector for projecting an image and a screen configured to display the image. The screen comprises a filter layer having a light reception side and an image display side. The filter layer includes an array of trapezoidal transmissive elements and an array of trapezoidal absorption elements, where a wider base of each of the trapezoidal transmissive elements faces the light reception side of the filter layer, and where a wider base of each of the trapezoidal absorption elements faces the image display side of the filer layer.