Abstract: An inspection apparatus includes an illumination system that receives a first beam and produces second and third beams from the first beam and a catadioptric objective that directs the second beam to reflect from a wafer. A first sensor detects a first image created by the reflected second beam. A refractive objective directs the third beam to reflect from the wafer, and a second sensor detects a second image created by the reflected third beam. The first and second images can be used for CD measurements. The second beam can have a spectral range from about 200 nm to about 425 nm, and the third beam can have a spectral range from about 425 nm to about 850 nm. A third sensor may be provide that detects a third image created by the third beam reflected from the wafer. The third image can be used for OV measurements.

Abstract: A catadioptric unit includes, in order from an object side to an image side, a first optical element including a first transmissive unit having positive refractive power disposed in the vicinity of an optical axis and, on the object side thereof, a first reflective unit disposed at an outer circumference relative to the first transmissive unit and having a reflective surface; and a second optical element including a second transmissive unit having negative refractive power in the vicinity of the optical axis and, on the image side thereof, a second reflective unit disposed at an outer circumference relative to the second transmissive unit and having a reflective surface. Radii of curvature of object-side and image-side surfaces of the second optical element, a thickness along the optical axis and a refractive index of a material of the second optical element are set to satisfy predetermined conditions.

Abstract: A catadioptric projection objective for imaging an off-axis object field arranged in an object surface of the projection objective onto an off-axis image field arranged in an image surface of the projection objective has a front lens group, a mirror group comprising four mirrors and having an object side mirror group entry, an image side mirror group exit, and a mirror group plane aligned transversely to the optical axis and arranged geometrically between the mirror group entry and the mirror group exit; and a rear lens group. The mirrors of the mirror group are arranged such that at least one intermediate image is positioned inside the mirror group between mirror group entry and mirror group exit, and that radiation coming from the mirror group entry passes at least four times through the mirror group plane and is reflected at least twice on a concave mirror surface of the mirror group prior to exiting the mirror group at the mirror group exit.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.

Abstract: The catadioptric system includes a first optical imaging system (catadioptric part) causing a light flux from an object to form an intermediate image and a second optical imaging system (dioptric part) causing the light flux from the intermediate image to form an image. In the first optical imaging system, the light flux sequentially passes a first transmissive portion, a second reflective portion, a first reflective portion and a second transmissive portion. In the second optical imaging system, consecutive four lens surfaces among plural lens surfaces placed between an aperture stop and an image surface have a negative combined refractive power, and a condition of ?0.52<?4n—max·Ymax<?0.14 is satisfied, ?4n—max represents a maximum value of the negative combined refractive power, and Ymax represents a maximum object height in a field-of-view of the catadioptric system at the object.

Abstract: A catadioptric projection objective for imaging a pattern onto an image plane includes: a first objective part for imaging the pattern into a first intermediate image; a second objective part for imaging the first intermediate image into a second intermediate image; and a third objective part for imaging the second intermediate image onto the image plane. A first concave mirror having a continuous mirror surface and a second concave mirror having a continuous mirror surface are upstream of the second intermediate image. A pupil surface is formed between the object plane and the first intermediate image, between the first and the second intermediate image, and between the second intermediate image and the image plane. A plate having essentially parallel plate surfaces is positioned in the first objective part near the pupil surface. At least one plate surface is aspherized to correct for aberrations.

Abstract: A reflection mirror assembly for use in a catadioptric imaging optical system includes two curved reflection mirrors, each including a reflection surface expressed by equation (a), where y represents height in a direction perpendicular to the optical axis, z represents distance (sag amount) along the optical axis from a tangent plane at a vertex of the reflection surface to a position on the reflection surface at height y, r represents a vertex curvature radius, and R represents a conical coefficient; z=(y2/r)/[1+{1?(1+?)·y2/r2}1/2]??(a), wherein ?1<k<0.

Abstract: An apparatus is provided that includes a field reflector and a plurality of pairs of object reflectors. The apparatus also includes a plurality of source and detector port pairs, where each source port is configured to pass a beam of radiation, and each detector port is configured to receive a beam of radiation. The source and detector ports of each pair are positioned proximate an outer edge of the field reflector such that an optical axis of the field reflector lies between the respective source port and detector port. The object reflectors and source and detector port pairs are arranged such that each source and detector port pair is associated with a respective pair of object reflectors forming a distinct channel, where the source and detector port pair, and centers of the associated pair of object reflectors, of each channel lie in a distinct plane.

Abstract: An extended depth-of-field (EDOF) surveillance imaging system (8) that has a lens system (10) with a total lens power ?T and an amount of spherical aberration SA where 0.2??SA?2?. The lens system includes first lens group (G1) and a second lens group (G2). The first lens group has first and second confronting meniscus lens elements (L1, L2) that have an overall optical power ?1 such that |?1/?T|?0.05. The second lens group has a doublet (D1) and a most imagewise positive lens element (L5). An aperture stop (AS) is arranged either between the first and second lens groups or within the second lens group. An image sensor (30) is arranged to receive the image and form therefrom a digitized electronic raw image. An image processor receives and digitally filters the digitized electronic raw image to form a digitized contrast-enhanced image.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.

Abstract: Various embodiments provide an optical system including a plurality of mirrors, each mirror having a rotational axis of symmetry; and a detector configured to detect an image formed by the plurality of mirrors. The plurality of mirrors are configured to scan an object space along a first direction. The plurality of mirrors are configured and arranged so that a focal length of the plurality of mirrors along the first direction is greater than a focal length of the plurality of mirrors in a second direction perpendicular to the first direction so as to obtain a ratio of anamorphism greater than approximately 1.5.

Abstract: The disclosure generally relates to imaging optical systems that include a plurality of mirrors, which image an object field lying in an object plane in an image field lying in an image plane, where at least one of the mirrors has a through-hole for imaging light to pass through. The disclosure also generally relates to projection exposure installations that include such im-aging optical systems, methods of using such projection exposure installa-tions, and components made by such methods.

Abstract: A new and useful optical system is provided, which is particularly useful as an optical relay for an aerial imaging system (AIS). The optical system preferably comprises a two element catadioptric lens where a beam transmitted by makes two reflections before leaving the first solid glass (catadioptric) element, then reflects off the second (mirror) element, makes a fourth reflection off the outside surface of the first element and then passes through a hole in the center of the second element. When the optical system is used as an AIS relay, it substantially captures the NA of the projection lens with which it is associated, and simplifies the structure of the AIS relay. In addition, the AIS relay is configured to minimize the affects of stray light.

Abstract: A wide angle catoptric telescope comprises five successive off-axis mirrors. The first mirror or entrance mirror of the five mirrors is concave. The entrance pupil of the telescope is real and situated in front of this said first mirror. The second and the fourth mirror are convex. The third and the fifth mirror are concave. The optical combination is telecentric, and the image field is plane.

Abstract: A catadioptric optical system includes a first imaging optical system that includes a catadioptric part that collects a light beam from an object to form an intermediate image of the object, and a second imaging optical system that includes a refractive part that images the intermediate image on an image plane. The first imaging optical system includes a first optical element, a second optical element, and a negative lens in an optical path between the first and second optical elements, and the first and second optical elements are disposed so that reflection parts of the first and second optical element face each other. A power pn of the negative lens, radii of curvature R1n and R2n of lens surfaces of the negative lens at an object side and an image side, respectively, and a power ?1 of the first imaging optical system are appropriately set.

Abstract: New families of two mirror unobscured telescopes with compact Schiefspiegler, eccentric pupil Cassegrain geometries, incorporating aspheres, tilted and decentered secondaries, and tilted decentered focal surfaces. These variables allow control of focal surface tilt. All embodiments, from f/5 to f/16, are totally reflecting, fully baffled systems, with wide diffraction limited FOVs and unobscured aperture MTFs. Systems optimized with the focal plane normal to the gut ray are well suited for visual and general use. They can incorporate a variable iris for f/number control and allow focusing along the gut ray with minimal field tilt. Systems optimized with a fixed focal plane tilt are well suited for high resolution, wide field collimators and IR scene generators. Any light reflected at focus can be trapped, eliminating Narcissus or “cats eye” effects. Additionally, this reflection can be used to provide a uniform “background” irradiance field.

Abstract: A method for correcting at least one image defect of a projection objective of a lithography projection exposure machine, the projection objective comprising an optical arrangement composed of a plurality of lenses and at least one mirror, the at least one mirror having an optically operative surface that can be defective and is thus responsible for the at least one image defect, comprises the steps of: at least approximately determining a ratio VM of principal ray height hMH to marginal ray height hMR at the optically operative surface of the at least one mirror, at least approximately determining at least one optically operative lens surface among the lens surfaces of the lenses, at which the magnitude of a ratio VL of principal ray height hLH to marginal ray height hLR comes at least closest to the ratio VM, and selecting the at least one determined lens surface for the correction of the image defect.

Abstract: In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength ? from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about ? or more at one or more locations of the rotationally-asymmetric surface.

Abstract: A catadioptric optical system includes a first imaging optical system including a catadioptric part configured to condense a light flux from an object and to form an intermediate image of the object, and a second imaging optical system including a dioptric part configured to form an image of the intermediate image on an image surface. The light flux from the object passes through the light transmission part of the first optical element, the negative lens, the backside reflection part of the second optical element, the negative lens, the backside reflection part of the first optical element, the negative lens, and the light transmission part of the second optical element, in this order, and is emitted to the second imaging optical system. An Abbe number of a material of the negative lens is larger than that of a material of the second optical element.

Abstract: Various embodiments provide a Cassegrain-like telescope. The Cassegrain-like telescope includes a primary mirror; a secondary mirror spaced apart from the primary mirror, the primary mirror and the second mirror configured to form a focal surface; and an optical aberrations corrector having a plurality of lenses, the optical aberrations corrector being disposed between the secondary mirror and the focal surface, the optical aberration corrector being configured to correct optical aberrations of the primary mirror and the secondary mirror. A material of the plurality of lenses is selected to transmit radiation in a wavelength range between approximately 0.4 ?m and approximately 12 ?m, and is selected to have variations in refractive index below about 0.05 so as to reduce chromatic aberration to a level such that an average root mean square of wave front error (RMS WFE) is less than approximately 0.08.

Abstract: A projection type image display apparatus includes: a light source; an illumination optical system that uniformly illuminates beams, which are emitted from the light source, on a surface of an image modulation element as a primary image plane; and a projection optical system that projects image information of the primary image plane modulated by the image modulation element on a screen as a secondary image plane in an enlarged manner. The projection optical system includes a first optical system having a positive refractive power and including a plurality of transmissive surfaces, and a second optical system having a positive refractive power and including a concave reflective surface. The first optical system has a first reflective surface disposed between any surfaces of the plurality of transmissive surfaces, and a second reflective surface disposed between the first optical system and second optical system.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.

Abstract: A spectrometer having substantially increased spectral and spatial fields.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.

Abstract: In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength ? from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about ? or more at one or more locations of the rotationally-asymmetric surface.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective. The projection objective includes a first objective part that includes one or more refractive optical elements to image the pattern provided in the object plane into a first intermediate image, a second objective part that consists of reflective optical elements including at least one concave mirror to image the first intermediate image into a second intermediate image, and a third objective part that includes one or more refractive optical elements to image the second intermediate imaging onto the image plane. The projection objective includes at lease one double asphere having a first aspheric surface and a second aspheric surface immediately adjacent to the first aspheric surface, the double asphere being formed by facing adjacent aspheric surfaces of two consecutive lenses.

Abstract: An reflective imaging optical system of the far pupil type, which is applicable to an exposure apparatus using for example the EUV light, forms on a second plane an image of a predetermined area on a first plane and is provided with first to eighth reflecting mirrors arranged in an order of reflection from the first plane toward the second plane. An entrance pupil of reflective imaging optical system is positioned on a side opposite to the reflective imaging optical system with the first plane intervening therebetween; and the following condition is fulfilled provided that PD represents a distance along an optical axis between the entrance pupil and the first plane, TT represents a distance along the optical axis between the first plane and the second plane, and R represents an angle of incidence of a main light beam coming into the first plane: ?14.3<(PD/TT)/R<?2.5.

Abstract: A stand for a surgical microscope is suggested, comprising a vertical support, at least one horizontal support, a first vertical articulation unit that is connected the horizontal support, a second articulation unit determining an oblique pivot axis, a displacement unit that is attached to the second articulation unit and has multiple degrees of freedom for displacement and balancing of an optics carrier carrying the surgical microscope, at least one pivot support encompassed by the displacement unit, and a displacer for displacing the optics carrier in an X direction extending horizontally and transversely to the oblique pivot axis. The pivot support comprises a pivotable parallelogram support and a holding arm that is attached to the pivotable parallelogram support and is configured such that it simultaneously serves as a displacer for displacing the optics carrier in the X direction.

Abstract: A lens and reflector unit for optical measurements includes first and second convex surface sections of the lens and reflector unit. Both have their respective central normal lines. A first flat surface section has a normal direction that divides the angle between the central normal lines into equal halves. A third convex surface section has a third central normal line, and the fourth convex surface section has a fourth central normal line. A second flat surface section has a normal direction that divides the angle between the third and fourth central normal lines into to equal halves.

Abstract: A three-mirror anastigmatic with at least one non-rotationally symmetric mirror is disclosed. The at least one non-rotationally symmetric mirror may be an electroformed mirror shell having a non-rotationally symmetric reflective surface formed by a correspondingly shaped mandrel.

Abstract: An imaging optical system has a plurality of mirrors, which via a beam path for imaging light, image an object field in an object plane into an image field in an image plane. The imaging optical system has an exit pupil obscuration. At least one of the mirrors has no opening for passage of the imaging light. The fourth to last mirror in the beam path is concave, resulting in an imaging optical system having improved imaging properties without compromise in throughput.

Abstract: An imaging optics has at least six mirrors, which image an object field in an object plane in an image field in an image plane. An entry pupil of the imaging optics is arranged in the imaging beam path in front of the object field. At least one of the mirrors has a through-opening for the passage of imaging light. A mechanically accessible pupil, in which an obscuration stop is arranged for the central shading of the pupil of the imaging optics, is located in a pupil plane in the imaging beam path between the object field and a first of the through-openings. A first imaging part beam directly after a second mirror in the imaging beam path after the object field and a second imaging part beam directly after a fourth mirror in the imaging beam path after the object field intersect one another in an intersection region. The result is an imaging optics, in which a handleable combination of small imaging errors, manageable production and a good throughput for the imaging light is achieved.

Abstract: The disclosure provides a catadioptric projection objective which includes a plurality of optical elements, including first, second and third refractive objection parts. Optical elements arranged between an object surface and a first pupil surface form a Fourier lens group that includes a negative lens group arranged optically close to the first pupil surface. The Fourier lens group is configured such that a Petzval radius RP at the first pupil surface satisfies the condition: |RP|>150 mm.

Abstract: A catadioptric projection objective for imaging an off-axis object field arranged in an object surface of the projection objective onto an off-axis image field arranged in an image surface of the projection objective has a front lens group, a mirror group comprising four mirrors and having an object side mirror group entry, an image side mirror group exit, and a mirror group plane aligned transversly to the optical axis and arranged geometrically between the mirror group entry and the mirror group exit; and a rear lens group. The mirrors of the mirror group are arranged such that at least one intermediate image is positioned inside the mirror group between mirror group entry and mirror group exit, and that radiation coming from the mirror group entry passes at least four times through the mirror group plane and is reflected at least twice on a concave mirror surface of the mirror group prior to exiting the mirror group at the mirror group exit.

Abstract: An optical system may include an objective having at least four mirrors including an outermost mirror with aspect ratio <20:1 and focusing optics including a refractive optical element. The objective provides imaging at numerical aperture >0.7, central obscuration <35% in pupil. An objective may have two or more mirrors, one with a refractive module that seals off an outermost mirror's central opening. A broad band imaging system may include one objective and two or more imaging paths that provide imaging at numerical aperture >0.7 and field of view >0.8 mm. An optical imaging system may comprise an objective and two or more imaging paths. The imaging paths may provide two or more simultaneous broadband images of a sample in two or more modes. The modes may have different illumination and/or collection pupil apertures or different pixel sizes at the sample.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.

Abstract: Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the projection objective and the photoresist or another photosensitive layer to be exposed. Projection objectives that are designed for immersion operation and are therefore also referred to as immersion objective may reach numerical apertures of more than 1, for example 1.3 or 1.4. The term “immersion liquid” shall, in the context of this application, relate also to what is commonly referred to as “solid immersion”. In the case of solid immersion, the immersion liquid is in fact a solid medium that, however, does not get in direct contact with the photoresist but is spaced apart from it by a distance that is only a fraction of the wavelength used. This ensures that the laws of geometrical optics do not apply such that no total reflection occurs.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax (Y??NA2) and wherein the condition COMP1<10 holds.

Abstract: In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.

Abstract: A catadioptric imaging optical system of a high numerical aperture in which various aberrations are properly corrected without using a reflection surface having an aspherical shape of high order or a reciprocal optical element. The catadioptric imaging optical system forms an image of a first plane on a second plane and includes a first imaging system for forming a first intermediate image of the first plane based on light from the first plane, a second imaging system having two concave reflection mirrors for forming a second intermediate image of the first plane based on light from the first intermediate image, and a third imaging system for forming a final image of the first plane on the second plane based on light from the second intermediate image. The two concave reflection mirrors have prolate spheroidal-shaped reflection surfaces.

Abstract: A telescope design having an integrated baffle is disclosed herein. The integrated baffle is configured as both a baffle and a mirror support. The integrated baffle can be shaped to the F-cone between the primary and secondary mirrors of a given telescope design. The baffle design can be adjusted to minimize or otherwise reduce the total obscuration of the baffle to improve the optical throughput. The interior facing surfaces of the integrated baffle can be configured with corner reflectors, so that the detector views itself, instead of the baffle.

Abstract: Projection objectives, projection exposure apparatuses and related systems and components are disclosed.

Abstract: A first sub-lens having two opposite first surfaces is provided. One of the first surfaces has a central bulged first optical surface for refracting light rays passing therethrough and defining a first optical axis. The other first surface defines a recess that defines a flat bottom surface. A second sub-lens having two opposite second surfaces is provided. One of the second surfaces has a central bulged second optical surface for refracting light rays passing therethrough and defining a second optical axis. The other second surface is flat and substantially similar to the bottom surface of the first sub-lens in shape and size and is glued to the bottom surface of the first sub-lens in a manner that the first axis is coaxial with the second axis.

Abstract: Disclosed is an absorbent sanitary article for absorbing body fluids which comprises a matrix containing metallic silver, wherein the silver is present bound to a fiber 24 exclusively on the surface thereof.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.

Abstract: A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a second substantially refractive optical group more image forward than the first optical group having a number of lenses. The second optical group has a negative overall magnifying power for providing image reduction. The first optical group provides compensative aberrative correction for the second optical group. The objective forms an image with a numerical aperture of at least substantially 0.65, and preferably greater than 0.70 or still more preferably greater than 0.75.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object surface onto an image surface of the projection objective has an object-side imaging subsystem for creating a final intermediate image closest to the image surface from radiation coming from the object surface and an image-side imaging subsystem for directly imaging the final intermediate image onto the image surface. The image-side imaging subsystem includes a last optical element closest to the image surface and is designed for creating a convergent beam having an aperture sin ??0.8 in the last optical element.