Abstract: A mirror projection system for use in a step-and-scan lithographic projection apparatus in which a mask pattern is repetitively scan-imaged on a number of areas of a substrate by means of a beam of EUV radiation having a circular segment-shaped cross-section. The projection system, which is easier to manufacture at lower cost than a projection system with six or more imaging mirrors, has only five imaging mirrors with a good numerical aperture and an acceptable image-ringfield width. An EUV lithographic projection apparatus provided with the new projection system has a wafer throughput which is approximately 50% higher than that of an apparatus provided with a six-mirror projection system. Moreover, such a lithographic projection has a compact construction.

Abstract: A faceted reflector assembly including a plurality of reflector segments which are preferably, but not necessarily, comprised of pre-anodized and enhanced aluminum having a specular, semi-specular or a diffuse finish. The reflector segments include interlocking means such as tabs and slots for attachment to other reflector segments. The reflector segments, when interlocked, form the faceted reflector of the present invention.

Abstract: A reflection reduction projection optical system having large numerical aperture for use in X-ray lithography. The reflection reduction projection optical system includes at least five aspheric surface reflecting mirrors and a reflecting mirror having a predetermined configuration, causing reduction imaging on an imaging surface I by imaging a light beam from an object O only one time. The reflection reduction projection optical system includes, in light path sequence from the object, a first convex mirror, a first concave mirror, the mirror having a predetermined configuration, a second concave mirror, a second convex mirror, and a third concave mirror. The reflection reduction projection optical system also includes an aperture stop located on the second convex mirror.

Abstract: A vehicle image acquisition and display assembly 10 which is deployed within conventional vehicle rear-view mirror housing or shroud members 20, 22 and which selectively provides images of areas/regions and/or objects residing within the front and/or along the side of a vehicle 12

Abstract: A viewing device for viewing a relatively inaccessible gap between two closely positioned surfaces, such as a circuit component and a circuit board, may be viewed by a device including a first reflector which reflects light from the gap to a relatively accessible location for viewing. The first reflector is connected to a support which can be a bar or platform. Additionally a second element such as a second reflector or a threaded post can be included. Where the viewing device includes a first and second reflector connected by a platform support, the support may include a pair of threaded post holes on either side of a scored region. The support may be broken along the scored region to form two separate devices. The reflectors can be right angle prisms and may reflect light by total internal reflection or by a reflective coating.

Abstract: A light energy efficient and low cost optical system for providing uniform illumination of a light valve. The light source is an extended source generally emitting a non-uniform spatial distribution of light power. The source light is focused into the entrance end of a light transmitting tunnel having reflecting interior wall surfaces and having cross sectional and length dimensions chosen to deliver, at the exit end of the tunnel, light which is substantially uniform is power distribution, over the surface area of the exit end, due multiple reflections from the tunnel walls. The exiting light is advantageously used to uniformly illuminate a light valve. The invention includes a combination of mirrors arranged about the source light to most effectively collect and direct the light.

Abstract: An irradiance redistribution guide (IRG) for providing from a radiation source having a nonuniform irradiation distribution, a predetermined irradiance distribution over a predetermined target area spaced away from the IRG. The IRG includes a tubular reflective inner surface disposed between an entrance aperture and an exit aperture. The reflective inner surface has a varying cross-sectional radius. The profile of the cross-sectional radius is defined by a spline function that is uniquely determined by a plurality of knots. The IRG, when used in conjunction with a high-power solar concentrator, is advantageous in materials processing that requires high irradiance level that is uniformly distributed over an area spaced away from the exit aperture by a working distance.

Abstract: An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first concave mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle of less than substantially 12°, and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 15°. Four of the six reflecting surfaces have an aspheric departure of less than substantially 7 &mgr;m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 14 &mgr;m. Each of the six reflecting surfaces has an aspheric departure of less than 16.0 &mgr;m.

Abstract: A composite mirror adapted for use as an outside rearview mirror of a motor vehicle includes a main or primary viewing mirror and an auxiliary blindzone viewing mirror juxtaposed to expose the vehicle blindzone to the vehicle operator. The main viewing mirror is generally of unit magnification. The auxiliary mirror is composed of a planar array of reflecting facets mimicking a convex mirror.

Abstract: A catoptric reduction projection optical system (5) is provided with a first catoptric optical system (10) that images an object (R) in first (object) plane (OP) into a second plane (12) and forming an intermediate image (II) therein, and a second catoptric optical system (20) that images the intermediate image in the second plane onto a third (image) plane (IP), thereby forming a reduced image of the object in the first (object) plane onto the third (image) plane. The first catoptric optical system comprises a first mirror pair comprising two reflective mirrors (M1, M2). The second catoptric optical system comprises a second mirror pair comprising a convex mirror (M3) and a concave mirror (M4). The system also preferably satisfied a number of design conditions.

Abstract: A mirror projection system for use in a step-and-scan lithographic projection apparatus in which a mask pattern is repetitively scan-imaged on a number of areas of a substrate by means of a beam of EUV radiation having a circular segment-shaped cross-section. The projection system, which is easier to manufacture at lower cost than a projection system with six or more imaging mirrors, has only five imaging mirrors with a good numerical aperture and an acceptable image-ringfield width. An EUV lithographic projection apparatus provided with the new projection system has a wafer throughput which is approximately 50% higher than that of an apparatus provided with a six-mirror projection system. Moreover, such a lithographic projection has a compact construction.

Abstract: Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.

Abstract: The optical system provided with a first optical part disposed most adjacent to the object side, the optical part having three or more optical surfaces, of which at least one is a reflecting surface, and an aperture stop disposed more adjacent to the image side than the first optical part, wherein when the spacing from the first optical surface to the third optical surface as counted from the object side of the first optical part is defined as D and the spacing from the first optical surface to the entrance pupil at an azimuth &xgr; degrees is defined as X(&xgr;), the following condition is satisfied: (X(0)+X(90))/2<D. The specification also discloses an optical apparatus provided with such optical system.

Abstract: A polygonal illumination reflector includes a support base and a configuration of discrete reflector elements supported by the support base. The reflector elements have respective pairs of opposite side edges and respective interior reflective surfaces. The reflector elements adjoin one another in providing the configuration. The support base has a plurality of adjacent side portions and a plurality of retaining pockets defined between and interconnecting the adjacent side portions to one another. The adjacent side portions of the support base correspond in number to the reflector elements. The retaining pockets are arranged in pairs wherein the retaining pockets of each pair are open in a facing relationship toward one another so as to receive therein and set in engagement therewith the opposite side edges of the reflector elements in a first sequence in the configuration.

Abstract: A catoptric reduction projection optical system (5) is provided with a first catoptric optical system (10) that images an object (R) in first (object) plane (OP) into a second plane (12) and forming an intermediate image (II) therein, and a second catoptric optical system (20) that images the intermediate image in the second plane onto a third (image) plane (IP), thereby and forming a reduced image of the object in the first (object) plane onto the third (image) plane. The first catoptric optical system comprises a first mirror pair comprising two reflective mirrors (M1, M2). The second catoptric optical system comprises a second mirror pair comprising a convex mirror (M3) and a concave mirror (M4). The system also preferably satisfied a number of design conditions.

Abstract: An electromagnetic radiation collecting and condensing optical system includes a plurality of cascaded concave paraboloid reflectors and a plurality of electromagnetic radiation or light sources which radiate light energy onto the concave reflectors in such manner that the energy from each source is combined by the reflectors into an output target, such as the end of a single core optical fiber.

Abstract: A photolithography system that employs a condenser that includes a series of aspheric mirrors on one side of a small, incoherent source of radiation producing a series of beams is provided. Each aspheric mirror images the quasi point source into a curved line segment. A relatively small arc of the ring image is needed by the camera; all of the beams are so manipulated that they all fall onto this same arc needed by the camera. Also, all of the beams are aimed through the camera's virtual entrance pupil. The condenser includes a correcting mirror for reshaping a beam segment which improves the overall system efficiency. The condenser efficiently fills the larger radius ringfield created by today's advanced camera designs. The system further includes (i) means for adjusting the intensity profile at the camera's entrance pupil or (ii) means for partially shielding the illumination imaging onto the mask or wafer.

Abstract: According to the proposed invention, this technical result is achieved so that many-facet concentrator of a solar setup for exposure of objects, placed in a target plane, to the action of solar radiation containing a supporting frame and facets differing by that the facets of the concentrator are chosen with spherical focusing reflective surfaces of equal focal lengths and with selective coatings reflecting a desired spectral fraction of solar radiation, and are arranged on the supporting frame symmetrically with respect to the common axis of the concentrator, their optical axes being directed to the single point on the optical axis of the concentrator located before the nominal focus point of the concentrator and determining the position of arranging the target plane.

Abstract: A catoptric reduction projection optical system (5) is provided with a first catoptric optical system (10) that images an object (R) in first (object) plane (OP) into a second plane (12) and forming an intermediate image (II) therein, and a second catoptric optical system (20) that images the intermediate image in the second plane onto a third (image) plane (IP), thereby forming a reduced image of the object in the first (object) plane onto the third (image) plane. The first catoptric optical system comprises a first mirror pair comprising two reflective mirrors (M1, M2). The second catoptric optical system comprises a second mirror pair comprising a convex mirror (M3) and a concave mirror (M4). The system also preferably satisfied a number of design conditions.

Abstract: Condenser system for use with a ringfield camera in projection lithography where the condenser includes a series of segments of a parent aspheric mirror having one foci at a quasi-point source of radiation and the other foci at the radius of a ringfield have all but one or all of their beams translated and rotated by sets of mirrors such that all of the beams pass through the real entrance pupil of a ringfield camera about one of the beams and fall onto the ringfield radius as a coincident image as an arc of the ringfield. The condenser has a set of correcting mirrors with one of the correcting mirrors of each set, or a mirror that is common to said sets of mirrors, from which the radiation emanates, is a concave mirror that is positioned to shape a beam segment having a chord angle of about 25 to 85 degrees into a second beam segment having a chord angle of about 0 to 60 degrees.

Abstract: To freely adjust the angle of the light incident on a workpiece in a light irradiation part for oblique irradiation of the workpiece with light without needing to move a large light irradiation part, on the exit side of a collimation lens or a collimation mirror, in a light irradiation part, there is a flat mirror which is moved in the direction in which the length of the optical path of the irradiation light is changed, such that its angle is changed with respect to the optical axis, and at the same time, the center of an area to be irradiated by reflection of the flat mirror essentially does not move. Thus, the angle of the light incident in the workpiece can be changed. Furthermore, by changing the angle of the collimation mirror with reference to the optical axis and by moving the collimation mirror in the direction in which the length of the optical path of the irradiation light is changed, the angle of the light incident in the workpiece can be changed without using a flat mirror.

Abstract: A reflector includes a reflecting surface provided on a display cell, and fine concave surfaces are formed on the surface of the reflector. When the cross sections of the concave surfaces are formed in the shape of circular curves, the frequency of tilt angles &thgr;1, &thgr;2, . . . &thgr;n formed between tangents to the concave surfaces and horizontal lines H can be set to predetermined angle range &thgr;1 to &thgr;n, an angle range in which luminance of reflected light increases can be determined, and the reflected light can be allowed to have a directivity within the angle range. By designing &thgr;1 and &thgr;n in accordance with an effective viewing angle of the display cell, display contrast can be increased.

Abstract: A non-imaging optical concentrator (18, 70) includes an optically transparent body having a substantially dome-shaped convex surface (42, 74) of revolution formed about an optical axis (24) and at least one conical concave surface of revolution (44, 76, 78) protruding into the convex surface in a direction along the optical axis toward a light sensor (46). The convex surface receives light rays (54, 90) propagating from low to medium elevational angles and causes them to propagate through the optically transparent body, reflect off the concave surface, and propagate generally along the optical axis toward the light sensor. The concave surface further receives light rays (58) propagating from high elevational angles and refracts them through the optically transparent body toward the light sensor. This invention is advantageous because only one light sensor is required to receive light rays, such as IR controller data, propagating from a wide range of elevational and azimuthal angles.

Abstract: A mask pattern is repetitively scan-imaged on a number of areas of a substrate by means of a beam of EUV radiation having a circular segment-shaped cross-section. This system, which is easier to manufacture at lower cost than a projection system with six or more imaging mirrors, has only five imaging mirrors with a good numerical aperture and an acceptable image-ringfield width. An EUV lithographic projection apparatus provided with the new projection system has a wafer throughput which is approximately 50% higher than that of an apparatus provided with a six-mirror projection system. Moreover, it has a compact construction.

Abstract: Radiant energy sensor is protected from severe environments with a radiant energy sensor assembly that off-sets the sensor from the environment. The sensor assembly includes a radiant energy sensor, a pair of reflective walls facing one another, one of the walls having a transmissive aperture for receiving radiant energy over a wide angle of incidence, an entry, the other wall having a transmissive aperture for passing energy from behind the wall to the sensor, an exit, with the walls having the reflection characteristics such that the radiant energy entering the entry aperture at any angle is always reflected to the exit aperture. The reflective walls may be paraboloids or Fresnel surfaces in geometry.

Abstract: An electromagnetic radiation source, such as an arc lamp, is located at a point displaced from the optical axis of a concave toroidal reflecting surface. The concave primary reflector focuses the radiation from the source at an off-axis image point that is displaced from the optical axis. The use of a toroidal reflecting surface enhances the collection efficiency into a small target, such as an optical fiber, relative to a spherical reflecting surface by substantially reducing aberrations caused by the off-axis geometry. A second concave reflector is placed opposite to the first reflector to enhance further the total flux collected by a small target. In accordance with one embodiment, the present invention is directed to devices in which the square of the off-axis distance divided by the radius of curvature is equal to or less than the extent of the source of electromagnetic radiation (y02/r≦s0).

Abstract: An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first concave mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle of less than substantially 12°, and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 15°. Four of the six reflecting surfaces have an aspheric departure of less than substantially 7 &mgr;m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 14 &mgr;m. Each of the six reflecting surfaces has an aspheric departure of less than 16.0 &mgr;m.

Abstract: An optical device includes a light transmitting non-linear optical material having a first face and a second face. The first and second faces oppose each other. The first face has a plurality of first reflecting portions provided thereon, and the second face has a plurality of second reflecting portions provided thereon. Each of the second reflecting portions corresponds to one of the first reflecting portions. Furthermore, the first and second faces are substantially flat except for at least one convex arcuate portion being formed on at least one of the first and second faces. Additionally, at least one of the first and second reflecting portions is obtained by coating a reflective material on the convex arcuate portion.

Abstract: A catoptric reduction projection optical system (100), a projection exposure apparatus (EX) and a method using same. The catoptric reduction projection optical system is capable of forming a reduced magnification image of an object present on a first surface (R) onto a third surface W. The system includes a first catoptric optical system (10) capable of forming an intermediate image of the object onto a second surface (IM) and comprises a first mirror pair having a first reflective mirror (M1) and a second reflective mirror (M2).

Abstract: A deconcentrating optic has an input aperture positioned near a point of minimum focus of a reflector, and has an output aperture which is larger than the input aperture. An inner surface connects the two apertures of the optic. The surface is reflective to visible light, and is shaped to decrease the angles of incident light rays from the reflector so that an emerging light beam is bounded by a cone the angle of which is less than or equal to the acceptance cone of a projection lens. The size and shape of the output beam is such that the object lying in the projection plane of the lens is fully illuminated but not overfilled. The inner surface of the reflecting optic may be selectively perturbed so that the object plane of the projection lens is uniformly illuminated. The general shape of the reflecting optic's inner surface may be parabolic, elliptical, hyperbolic, circular, conical, or combinations of these shapes.

Abstract: The invention provides a reflector device and a reflector system for mounting to a vehicle having front and rear seats to allow a person in the front seat to view an infant in a rearwardly facing safety seat attached to the rear seat. The reflector system includes a pair of reflector devices of which one may be in accordance with the invention. The reflector device in accordance with the invention is mountable upright on a back of the rear seat and includes a mounting assembly and a reflector with a forwardly-facing reflecting surface pivotally connected to the mounting assembly so as to be pivotable in three-dimensions. The reflector device is preferably mounted to one side of the infant and has an upward extent below the rear window of the vehicle so as not to obstruct a driver's view through the rear window and to not present a hazard to the infant.

Abstract: An optical element has a plurality of reflecting regions for reflecting light in succession, each of the plurality of reflecting regions comprises a curved surface, at least two of the reflecting regions has a common reflecting surface, and the optical paths of the light defined by the plurality of reflecting regions intersect with one another.

Abstract: A planetary astrographic telescope of the Cassegrain type having a concave paraboloidal primary mirror and a convex secondary mirror located in the spherical zone between the primary mirror and said primary mirror's focal point. The spherical secondary mirror receives the light reflected from the primary mirror. The secondary mirror, in turn, reflects such light through an aperture in the primary mirror to a focal plane located behind the primary mirror. The spherical secondary mirror and its holder are in combination sized to be not more than twenty percent of the diameter of the primary mirror and positioned in the spherical zone of light reflected from the paraboloidal primary mirror. One embodiment of the present invention is a tube containing the concave paraboloidal primary mirror and convex spherical secondary mirror with said tube attached to and supported on a mount at a height above a support surface.

Abstract: Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.

Abstract: A catoptric reduction projection optical system (8), exposure apparatus (EX) including same, and a method using same for forming in a second plane (WP) a reduced image of an object (R) in a first plane (RP). The projection optical system includes, in order along a folded optical path on in optical axis (AX), from the first plane to the second plane, a first mirror (M1) having a concavely shaped reflecting surface and a first vertex, a second mirror (M2) having a second vertex, a third mirror (M3) having a convexly shaped reflecting surface and a third vertex, a single aperture stop (AS), and a fourth mirror (M4) having a concavely shaped reflecting surface and a fourth vertex. The projection optical system also preferable satisfies a number of design conditions.

Abstract: An irradiance redistribution guide (IRG) for providing from a radiation source having a nonuniform irradiation distribution, a predetermined irradiance distribution over a predetermined target area spaced away from the IRG, includes a tubular reflective inner surface disposed between an entrance aperture and an exit aperture. The reflective inner surface has a varying cross-sectional radius. The profile of the cross-sectional radius is defined by a spline function that is uniquely determined by a plurality of knots. The IRG, when used in conjunction with a high-power solar concentrator, is advantageous in materials processing that requires high irradiance level that is uniformly distributed over an area spaced away from the exit aperture by a working distance.

Abstract: An all-reflective optical system uses a mirror with a hole to transmit a focused laser beam to an on-axis elliptical mirror. The reflected beam from the ellipse is predominately reflected off the mirror with a hole and focused to a distant adjustable focus. This focus spot can be positioned by X-Y scanning mirrors.

Abstract: An all-refelctive optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first concave mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle less than substantially 12.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 15.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 7 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 14 .mu.m. Each of the six refelecting surfaces has an aspheric departure of less than 16.0 .mu.m.

Abstract: The present invention is directed to an optical system for measurement of a three dimensional device. The optical system is designed and configured to meet telecentric and f-.theta. requirements. The system employs primary and secondary mirrors operating in conjunction with a tertiary deflector mounted on a pivot. Light from a light source produces a beam which is deflected off the deflector and the secondary and primary reflectors respectively. The beam is then transmitted to the surface of the object to be measured. Deflection of the tertiary deflector on the pivot results in scanning of the light beam across the surface of the object to be measured.

Abstract: An anamorphic system and method having first and second reflective anamorphic surfaces producing different magnifications in orthogonal directions in a collimated beam of radiation incident on the first anamorphic surface. The anamorphic surfaces have parabolic cross-sections in the two orthogonal directions. The parabolic cross-sections have base radii of curvatures and the magnifications in the first and second directions are determined by the ratio of the base radii of curvatures in the first and second directions.

Abstract: A reflector assembly is provided for efficiently collecting and forming the electromagnetic radiation from a radiation source into a desired beam pattern. The reflector assembly uses a smaller non-symmetrical generally convex reflector and a larger non-symmetrical generally concave reflector. The generally convex reflector intercepts a large fraction of light emitted by the source that would otherwise escape without interacting with the assembly and redirects this light onto the generally concave reflector for eventual inclusion in the beam.

Abstract: Radiant energy sensor is protected from severe environments with a radiant energy sensor assembly that off-sets the sensor from the environment. The sensor assembly includes a radiant energy sensor, a pair of reflective walls facing one another, one of the walls having a transmissive aperture for receiving radiant energy over a wide angle of incidence, an entry, the other wall having a transmissive aperture for passing energy from behind the wall to the sensor, an exit, with the walls having the reflection characteristics such that the radiant energy entering the entry aperture at any angle is always reflected to the exit aperture. The reflective walls may be paraboloids or Fresnel surfaces in geometry.

Abstract: A reflective optical system includes, in traveling order of light, a correction plate having an aspherical surface and a reflecting mirror for concentrating the light. An image is formed out of an optical path between the correction plate and the reflecting mirror.

Abstract: Radiant energy sensor is protected from severe environments with a radiant energy sensor assembly that off-sets the sensor from the environment. The sensor assembly includes a radiant energy sensor, a pair of reflective walls facing one another, one of the walls having a transmissive aperture for receiving radiant energy over a wide angle of incidence, an entry, the other wall having a transmissive aperture for passing energy from behind the wall to the sensor, an exit, with the walls having the reflection characteristics such that the radiant energy entering the entry aperture at any angle is always reflected to the exit aperture. The reflective walls may be paraboloids or Fresnel surfaces in geometry.

Abstract: A laser beam condensing device which can be manufactured at low cost by using reflecting mirrors which can be machined at low cost. The device is capable of condensing a laser beam to a high energy density while eliminating any optical path difference, even if the optical axis of the incident beam strays. This device includes a first and a second reflecting mirror. An incident laser beam is deflected by these mirrors in the same direction. One of the two mirrors is a toroidal mirror, while the other is a spherical, cylindrical or toroidal reflecting mirror. The mirror surfaces of the two reflecting mirrors are machined so that the second reflecting mirror can cancel out any wave front aberrations of the laser beam reflected by the first reflecting mirror.

Abstract: A reflector assembly is provided for efficiently collecting and forming the electromagnetic radiation from a radiation source into a desired beam pattern. The reflector assembly uses a smaller non-symmetrical generally convex reflector and a larger non-symmetrical generally concave reflector. The generally convex reflector intercepts a large fraction of light emitted by the source that would otherwise escape without interacting with the assembly and redirects this light onto the generally concave reflector for eventual inclusion in the beam.

Abstract: An optical system for an optical character reader in which a camera, such as a TV camera, reads an image field in a document, includes at least one pair of mirrors which shift half of the image both laterally and vertically to convert a relatively long image, for example with a length to height aspect ratio of 1.5:8, into a rectangular image with a much lower aspect ratio, for example 3:4. Preferably two pairs of mirrors are used, so that the image light path for both parts of the image field is the same length. This optical system reshapes the image field from one having an aspect ratio which does not match the 3:4 aspect ratio of most cameras, such as camcorders, TV cameras, security and surveillance cameras and the like, into one that does, thus significantly simplifying the optical character reader, and lowering its cost.

Abstract: A wide-angle side mirror device with a mirror box having a front and a rear, and first and second side walls. An object window is disposed in the first side wall of the mirror box. An observation window is disposed in the second wall of the mirror box. An object mirror having a curved shape which is concave in horizontal cross section and convex in vertical cross section is disposed to face out the object window and diagonally rearwards. An observation mirror is disposed in the mirror box to reflect a mirror image from the object mirror through the observation window. The object mirror preferably has a doughnut or drum shape, and more preferably has a degree of curvature in horizontal cross section approximately the same as a degree of curvature in vertical cross section. The observation mirror is preferably a flat mirror. The device has a wide field of view and allows the driver of a vehicle to view road conditions at acute angle intersections from the driver's seat.

Abstract: An optical projection reduction system used in photolithography for the manufacture of semiconductor devices having a first mirror pair, a second field mirror pair, and a third mirror pair. Electromagnetic radiation from a reticle or mask is reflected by a first mirror pair to a second field mirror pair forming an intermediate image. A third mirror pair re-images the intermediate image to an image plane at a wafer. All six mirrors are spherical or aspheric and rotationally symmetrical about an optical axis. An annular ring field is obtained, a portion of which may be used in a step and scan photolithography system. In another embodiment, weak refracting elements are introduced to further reduce residual aberrations allowing a higher numerical aperture. In the catoptric embodiment of the present invention, a numerical aperture of 0.25 is obtained resulting in a working resolution of 0.03 microns with electromagnetic radiation having a wavelength of 13 nanometers.

Abstract: A projection lithography camera is presented with a wide ringfield optimized so as to make efficient use of extreme ultraviolet radiation from a large area radiation source (e.g., D.sub.source .apprxeq.0.5 mm). The camera comprises four aspheric mirrors optically arranged on a common axis of symmetry with an increased etendue for the camera system. The camera includes an aperture stop that is accessible through a plurality of partial aperture stops to synthesize the theoretical aperture stop. Radiation from a mask is focused to form a reduced image on a wafer, relative to the mask, by reflection from the four aspheric mirrors.