Abstract: A regenerative ring resonator in the path of a light beam includes a discharge chamber having electrodes and a gain medium between the electrodes; an optical coupler that is partially reflective so that at least a portion of a light beam impinging on the optical coupler from the discharge chamber is reflected back through the discharge chamber and at least a portion of the light beam impinging on the optical coupler from the discharge chamber is transmitted through the optical coupler; and an attenuation optical system in the path of the light beam within the resonator, the attenuation optical system having a plurality of distinct attenuation states, with each attenuation state defining a distinct attenuation factor applied to the light beam to provide adjustment of an energy of the light beam.

Abstract: A laser apparatus may include: a first module including an oscillator configured to output a laser beam and an oscillator support portion for supporting the oscillator; a second module including a beam delivery unit for delivering the laser beam and a beam delivery unit support portion for supporting the beam delivery unit; a third module including an amplifier for amplifying the laser beam and an amplifier support portion for supporting the amplifier; and a frame on which the modules are placed, the frame including mounts on which the oscillator support portion, the beam delivery support portion and the amplifier support portion are placed.

Abstract: An RF power-supply for driving a carbon dioxide CO2 gas-discharge laser includes a plurality of power-oscillators phase-locked to a common reference oscillator. Outputs of the phase-locked power-oscillators are combined by a power combiner for delivery, via an impedance matching network, to discharge-electrodes of the laser. In one example the powers are analog power-oscillators. In another example, the power-oscillators are digital power-oscillators.

Abstract: Continuous mass flow gas replenishment may be implemented in a gas lasing device, such as a gas laser or amplifier, by using a restrictive orifice to bleed one or more gases into a reservoir and/or discharge chamber of the gas laser or amplifier at a predefined mass flow rate. The mass flow rate is a function of the pressure drop across the restrictive orifice resulting from the pressure differential between the depleted gas and the source gas. Thus, gases may be added as needed such that the gas total pressure, as well as the constituent partial pressures, is maintained within a desired range throughout the laser or amplifier fill lifetime. The continuous mass flow gas replenishment may thus make up the lost partial pressure of reactive gases in gas lasing devices in a manner that is less complicated and is less expensive than other continuous flow methodologies.

Abstract: The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.

Abstract: The gas laser oscillator apparatus of the present invention has laser gas sealed in a vacuum chamber under a decompressed condition lower than atmospheric pressure; a discharge means for exciting the laser gas; a blower means for blowing the laser gas; a laser-gas flow passage as a circulation passage of the laser gas between the discharge means and the blower means; and a gas compression means for discharging a predetermined amount of the laser gas from the laser-gas flow passage. The gas decompression means is structured on the application of Bernoulli's principle. The gas decompression means has a sequence for decreasing the ratio of air mixed into the laser gas below a predetermined level with use of a part of pressurized gas used in a laser processing machine or the gas laser oscillator apparatus.

Abstract: A thin beam laser crystallization apparatus for selectively melting a film deposited on a substrate is disclosed having a laser source producing a pulsed laser output beam, the source having an oscillator comprising a convex reflector and a piano output coupler; and an optical arrangement focusing the beam in a first axis and spatially expanding the beam in a second axis to produce a line beam for interaction with the film.

Abstract: A method for providing a laser beam and a laser arrangement that includes an elongated tube; an elongated discharge region within the elongated tube including a discharge medium to be excited to induce laser radiation; two DC discharge electrodes disposed at opposite ends of the elongated discharge region; two RF electrodes disposed at opposite elongated sides of the elongated discharge region; and/or a laser resonator having two opposite mirrors disposed at opposite ends of the elongated tube, the laser resonator is unstable in at least one lateral axis. The method includes applying a DC discharge between the DC electrodes, and applying a RF discharge transverse to the DC discharge between the RF electrodes. The DC and RF discharges may be provided by the DC and/or RF voltage suppliers provided according to embodiments of the present invention.

Abstract: An Echelle diffraction grating has a Littrow configuration. Each grating includes a resin layer made of light curing resin and having a thickness between 2 ?m and 10 ?m, and a reflective coating layer formed on the resin layer, having a thickness between 120 nm and 500 nm, and made of aluminum. An apex angle between a blazed surface and a counter surface is between 85° and 90°. A first blaze angle is an angle that maximizes diffraction efficiency of a set blazed order for incident light of a wavelength of 193.3 nm. A blaze angle has an initial value of a second blaze angle smaller than the first blaze angle. 0.25°?bd?ba?1.2° is satisfied where bd denotes the first blaze angle and ba denotes the second blaze angle.

Abstract: A laser oscillation device includes an oscillation unit oscillating a laser, a shutter unit covering the laser, and a connection unit covering the laser, connecting the oscillation unit and the shutter unit and including a first connection part supported by the oscillation unit and a second connection part supported by the shutter unit. The first and second connection parts are separated from each other, and one of the first and second connection parts covers at least a portion of the other one of the first and second connection parts.

Abstract: A compact CO2 slab-laser is contained in a fluid cooled housing having three compartments. One compartment houses discharge electrodes and a laser resonator. Another compartment houses a radio-frequency power supply (RFPS) assembled on a fluid-cooled chill plate and an impedance-matching network. The remaining compartment houses beam-conditioning optics including a spatial filter. The housing and RFPS chill-plate are on a common coolant-fluid circuit having a single input and a single output. The spatial filter is optionally fluid-coolable on the common coolant fluid circuit.

Abstract: A laser system in this disclosure may include: a master oscillator configured to output pulsed laser light, a coherence reduction optical system configured to reduce coherence of the pulsed laser light from the master oscillator, and a controller configured to control the coherence reduction optical system so that a speckle of the pulsed laser light varies.

Abstract: Disclosed is a gas laser apparatus having: a first estimation unit which calculates an estimate of input power to the laser power supply device by using the output current value and output voltage value of the DC power supply unit and also using the efficiency of conversion from input power to output power by the DC power supply unit; a second estimation unit which calculates an estimate of input power to the driving device by using the output current value of the driving device; and a power calculation unit which calculates the power consumption value of the gas laser apparatus, based on the estimate of the input power to the laser power supply device and the estimate of the input power to the driving device.

Abstract: A deep ultraviolet light source includes a master oscillator producing a seed light beam; a regenerative ring amplifier receiving the seed light beam from the master oscillator and outputting an output light beam, the regenerative ring amplifier including a set of optical components that define a plane of a closed ring; and a divergence control device within the master oscillator or between the master oscillator and the regenerative ring amplifier and configured to reduce a divergence of the output light beam along a normal direction, the normal direction being perpendicular to the plane of the ring.

Abstract: A fan for circulating laser gas in a gas laser, the fan having a shaft which is supported by at least one radial bearing and at least one axial gas bearing. The axial gas bearing has at least two rotating bearing faces, one or both being structured with a groove pattern, and at least two stationary bearing faces that are arranged at both sides of a plate.

Abstract: This disclosure is directed to widen an adjustable range of the spectral linewidth of laser light output from a laser apparatus. This laser apparatus may include: (1) an excitation source configured to excite a laser medium in a laser gain space, (2) an optical resonator including an output coupler arranged on one side of an optical path through the laser gain space and a wavelength dispersion element arranged on the other side of the optical path through the laser gain space, and (3) a switching mechanism configured to switch a beam-width magnification or reduction factor by placing or removing at least one beam-width change optical system for expanding or reducing a beam width in or from an optical path between the laser gain space and the wavelength dispersion element or by inverting orientation of the at least one beam-width change optical system in the optical path.

Abstract: The sealed gas laser oscillator that includes the airtight vessel, the laser gas supply source that supplies a laser gas to the airtight vessel, and the vacuum pump that performs evacuation until a pressure of an inside of the airtight vessel reaches a target reached pressure every predetermined interval between laser gas exchanges and is connected to the airtight vessel, and that performs laser oscillation in a state where the airtight vessel is filled with the laser gas. The gas laser oscillator includes a unit that determines the target reached pressure on the basis of the interval between laser gas exchanges, a leakage rate of an impurity gas from the outside to the airtight vessel after evacuation, and an allowable impurity gas pressure at which the gas laser oscillator is capable of being operated.

Abstract: An attenuation optical system is in a beam path of a light beam traveling through a regenerative ring resonator. The attenuation optical system includes an actuator configured to receive an electromagnetic signal; and a plate mounted to the actuator to be moveable between a plurality of positions, with each position placing an attenuation region in the beam path such that the beam profile is covered by the attenuation region and each attenuation region representing an attenuation factor applied to the light beam as determined by a geometry of the attenuation region. At least one attenuation region includes a plurality of evenly-spaced elongated openings between solid energy-reflecting surfaces and at least one attenuation region includes an open area that is larger than the beam profile of the light beam.

Abstract: An excimer laser device capable of suppressing deterioration of optical elements provided in a laser chamber even if output energy per pulse is increased more than the conventional level, in which a width of a laser beam applied to the optical elements provided in the laser chamber is enlarged so as to reduce the energy density of the laser beam within such a range that a laser output of no less than a desired level is obtained.

Abstract: An extreme ultraviolet light source apparatus, in which a target material is irradiated with a laser beam from a laser apparatus and the target material is turned into plasma, thereby emitting extreme ultraviolet light, may include a burst control unit configured to control irradiation of the target material is irradiated with the laser beam outputted successively in pulses from the laser apparatus when the extreme ultraviolet light is emitted successively in pulses. The target material is prevented from being turned into plasma by the laser beam while the laser beam is outputted successively in pulses from the laser apparatus when the successive pulsed emission is paused.

Abstract: An excimer laser apparatus includes a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.

Abstract: A laser may comprise a ceramic body including a first wall and a second wall opposite the first wall, a first mirror positioned at first ends of the first and second walls, a second mirror positioned at second ends of the first and second walls opposite the first ends, the first and second walls and the first and second mirrors defining a slab laser cavity within the ceramic body. The laser may further comprise a first electrode positioned outside the laser cavity and adjacent to the first wall of the ceramic body and a second electrode positioned outside the laser cavity and adjacent to the second wall of the ceramic body, wherein a laser gas disposed in the laser cavity is excited when an excitation signal is applied to the first and second electrodes. In some embodiments, the first and second mirrors may form a free-space multi-folded resonator in the slab laser cavity. In other embodiments, the first and second mirrors may form a free-space unstable resonator in the slab laser cavity.

Abstract: An Echelle diffraction grating has a Littrow configuration. Each grating includes a resin layer made of light curing resin and having a thickness between 2 ?m and 10 ?m, and a reflective coating layer formed on the resin layer, having a thickness between 120 nm and 500 nm, and made of aluminum. An apex angle between a blazed surface and a counter surface is between 85° and 90°. A first blaze angle is an angle that maximizes diffraction efficiency of a set blazed order for incident light of a wavelength of 193.3 nm. A blaze angle has an initial value of a second blaze angle smaller than the first blaze angle. 0.25°?bd?ba?1.2° is satisfied where bd denotes the first blaze angle and ba denotes the second blaze angle.

Abstract: An oscillator housing includes a main body unit that is shaped into a frame and formed of a metallic material and a cover unit that is formed of a metallic material to cover openings of the main body unit, and has an outer wall that has an arc cross section perpendicular to the optical axis and extends in the optical axis direction and side walls that are connected to the both ends of the outer wall in the optical axis direction. When the cover unit is fixed to the main body unit with a fixing member, the outer wall having an arc shape is configured such that force is generated in the height direction towards the outside of the oscillator housing on the connecting portion of the cover unit with the main body unit.

Abstract: A system and method for automatically performing gas optimization after a refill in the chambers of a two chamber gas discharge laser such as an excimer laser is disclosed. The laser is continuously fired at a low power output, and the gas in the amplifier laser chamber bled if necessary until the discharge voltage meets or exceeds a minimum value without dropping the pressure below a minimum value. The power output is increased, and the gas bled again if necessary until the voltage and pressure meet or exceed the minimum values. The laser is then fired in a burst pattern that approximates the expected firing of the laser in operation, and the gas bled if necessary until the discharge voltage meets or exceeds the minimum value and the output energy meets or exceeds a minimum value, again without dropping the pressure in the chamber below the minimum value. Once the minimum values are provided, the process runs quickly without manual interaction.

Abstract: A gas discharge laser including a lasing gas between discharge electrodes and has a power supply for generating RF pulses to be delivered to the electrodes of the laser for energizing the lasing gas. A sequence of RF simmer pulses is delivered to the electrodes. The simmer pulses create sufficient free electrons in the lasing gas to facilitate subsequent ignition of the discharge while not causing laser action. RF lasing pulses having a longer duration than the simmer pulses are delivered to the electrodes to ignite the discharge and provide corresponding laser output pulses. Delivery of the simmer pulses is suspended during delivery of the lasing pulses to avoid amplitude or pulse-width modulation of the laser output pulses by the simmer pulses.

Abstract: A line narrowed gas discharge laser system and method of operating same is disclosed which may comprise a dispersive center wavelength selective element; a beam expander comprising a plurality of refractive elements; a refractive element positioning mechanism positioning at least one of the refractive elements to modify an angle of incidence of a laser light beam on the dispersive center wavelength selection element; each of the dispersive center wavelength selection element and the beam expander being aligned with each other and with a housing containing at least the dispersive center wavelength selection element; a housing positioning mechanism positioning the housing with respect to an optical axis of the gas discharge laser system. The dispersive element may comprise a grating and the beam expander may comprise a plurality of prisms. The housing may contain the dispersive center wavelength selective element and the beam expander. The housing positioning element may comprise a position locking mechanism.

Abstract: Disclosed is a gas laser apparatus having: a first estimation unit which calculates an estimate of input power to the laser power supply device by using the output current value and output voltage value of the DC power supply unit and also using the efficiency of conversion from input power to output power by the DC power supply unit; a second estimation unit which calculates an estimate of input power to the driving device by using the output current value of the driving device; and a power calculation unit which calculates the power consumption value of the gas laser apparatus, based on the estimate of the input power to the laser power supply device and the estimate of the input power to the driving device.

Abstract: Methods and systems for generating pulses of laser radiation at higher repetition rates than those of available excimer lasers are disclosed that use multiple electronic triggers for multiple laser units and arrange the timings of the different triggers with successive delays, each delay being a fraction of the interval between two successive pulses of a single laser unit. Methods and systems for exposing nanoscale patterns using such high-repetition-rate lasers are disclosed.

Abstract: Two excimer lasers have individual pulsing circuits each including a storage capacitor which is charged and then discharged through a pulse transformer to generate an electrical pulse, which is delivered to the laser to generate a light pulse. The time between generation of the electrical pulse and creation of the light pulse is dependent on the charged voltage of the capacitor. The capacitors are charged while disconnected from each other. The generation of the electrical pulses is synchronized by connecting the capacitors together for a brief period after the capacitors are charged to equalize the charging voltages. The capacitors are disconnected from each other before they are discharged.

Abstract: Laser systems have a line-narrowed master oscillator and a power oscillator for amplifying the output of the master oscillator. The power oscillator includes optical arrangements for limiting the bandwidth of radiation that can be amplified. The limited amplification bandwidth of the power oscillator is relatively broad compared to that of the output of the master oscillator, but narrower than would be the case without the bandwidth limiting arrangements. The bandwidth narrowing arrangements of the power oscillator function primarily to restrict the bandwidth of amplified spontaneous emission generated by the power oscillator.

Abstract: The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.

Abstract: A method of recharging an excimer laser Includes opening an outlet in a chamber containing spent laser gas at a first pressure, opening an inlet in the chamber, the inlet in communication with a laser gas container at a second pressure higher than the first pressure, and flowing fresh laser gas into the chamber and removing at least a portion of the spent laser gases from the chamber without using a vacuum pump.

Abstract: Laser light wavelength control is provided by periodically predicting a next position of a light controlling prism using a model of the prism's motion characteristics. The prediction is then updated if a measurement of laser output wavelength is obtained. However, because the predictions are made without waiting for a measurement, they can be made more frequently than the laser firing repetition rate and the prism can be repositioned at discrete points in time which can occur more frequently than the laser firing events. This also reduces performance degradation which may be caused by being one pulse behind a laser measurement and the resultant laser control signal being applied.

Abstract: A CO2 gas flow laser with multiple discharge modules places acoustic baffles between the discharge modules to suppress shock waves and ions passing between the discharge modules such as may disrupt the optical path of the laser. A catalyst may be placed in a center of a toroidal recirculation chamber of the laser and may have integrated filters to prevent catalyst particulates from coating the chamber optical windows.

Abstract: RF power is transmitted to a CO2 gas discharge laser form a source of RF power via a series combination of transmission line sections. The lengths and characteristic impedances of the transmission line sections are selected to transform the impedance of the RF power source to the operating impedance of the laser.

Abstract: A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.

Abstract: A degree of polarization control device includes: a calcium fluoride crystal substrate for transmitting a laser beam; a polarization monitor for measuring the degree of polarization of a laser beam transmitted through the calcium fluoride crystal substrate; and a controller for controlling the rotation angle of the calcium fluoride crystal substrate according to the degree of polarization measured by the polarization monitor; the calcium fluoride crystal substrate being formed by a flat plate having a laser beam entering surface and a laser beam exiting surface running in parallel with the (111) crystal face, the Brewster angle being selected for the incident angle, the rotation angle around the [111] axis operating as a central axis being controlled by the controller.

Abstract: An apparatus/method may comprise a line narrowed pulsed lithography laser light source which may comprise: a seed pulse providing laser system which may comprise: a first pulsed seed laser producing seed pulses at a rate of X kHz; a second pulsed seed laser producing seed pulses at a rate of X kHz; an amplification system which may comprise: a first amplifier gain system which may comprise a first and a second pulsed gas discharge amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½X kHz on output pulses from the first seed laser; a second amplifier gain system which may comprise a first and a second pulsed amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½X kHz on output pulses from the second seed laser.

Abstract: A gas laser oscillator includes a plurality of discharge tube arrays, each discharge tube array including a plurality of electrical discharge tubes, a support mechanism supporting the plurality of discharge tube arrays, and an optical part optically connecting the plurality of discharge tube arrays. The support mechanism includes a discharge tube linking holder and an elastic member. The elastic member joins the discharge tube linking holder to a first support rod arranged at an upper side as seen in a direction of gravity.

Abstract: An apparatus is disclosed which may comprise a grating receiving light, a first prism moveable to coarsely select an angle of incidence of the light on the grating, and a second prism moveable to finely select an angle of incidence of the light on the grating. In one application, the apparatus may be used as a line narrowing module for a laser light source.

Abstract: The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.

Abstract: According to aspects of an embodiment of the disclosed subject matter, a line narrowed high average power high pulse repetition laser micro-photolithography light source bandwidth control method and apparatus are disclosed which may comprise a bandwidth metrology module measuring the bandwidth of a laser output light pulse beam pulse produced by the light source and providing a bandwidth measurement; a bandwidth error signal generator receiving the bandwidth measurement and a bandwidth setpoint and providing a bandwidth error signal; an active bandwidth controller providing a fine bandwidth correction actuator signal and a coarse bandwidth correction actuator signal responsive to the bandwidth error. The fine bandwidth correction actuator and the coarse bandwidth correction actuator each may induce a respective modification of the light source behavior that reduces bandwidth error. The coarse and fine bandwidth correction actuators each may comprise a plurality of bandwidth correction actuators.

Abstract: A pulsed CO2 laser is Q-switched by an intracavity acousto-optic (AO) Q-switch including an AO material transparent at a fundamental wavelength of the laser. In one example the AO material is germanium.

Abstract: The proposed gas discharge laser comprises extended solid main discharge electrodes, at each of which at least one ultraviolet pre-ionizer is placed, a gas flow area being formed by means of dielectric gas flow guides and the work surfaces of main electrodes and the pre-ionizers being placed outside of the gas flow area for illuminating a space between the main discharge electrodes through a gap defined between the main electrodes and dielectric guides. The proposed invention makes it possible to design a gas discharge laser for a high pulse repetition frequency mode with high-quality laser radiation.

Abstract: A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.

Abstract: The higher efficiency and lower power consumption are realized in a laser system for generating a high-power short-pulse laser beam. The laser system includes a laser oscillator for generating a pulse laser beam by laser oscillation, plural amplifiers for sequentially inputting the pulse laser beam generated by the laser oscillator and amplifying the pulse laser beam, and a control unit for controlling the laser oscillator to perform burst oscillation and halting an amplification operation of at least one of the plural amplifiers in a burst halt period between burst oscillation periods.

Abstract: An excimer laser device capable of suppressing deterioration of optical elements provided in a laser chamber even if output energy per pulse is increased more than the conventional level, in which a width of a laser beam applied to the optical elements provided in the laser chamber is enlarged so as to reduce the energy density of the laser beam within such a range that a laser output of no less than a desired level is obtained.

Abstract: RF power is transmitted to a CO2 gas discharge laser form a source of RF power via a series combination of transmission line sections. The lengths and characteristic impedances of the transmission line sections are selected to transform the impedance of the RF power source to the operating impedance of the laser.

Abstract: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.