Abstract: A radiant heating system includes a molded agglomeration of inert natural stone waste and a heating element embedded in the agglomeration. The agglomeration contains 45-55% by weight of stone particles having a size from 1 to 5 mm; 30-35% by weight of stone dust having a size from 0.01 mm to 0.5 mm; and 20-25% by weight of a resin having a water-based acrylic component.

Abstract: A method of adjusting the heat transfer properties within a processing chamber is presented. Chamber properties may be determined and adjusted by adjusting the thermal mass of an edge ring disposed in the processing chamber.

Abstract: A thermal processing chamber with a dielectric barrier discharge (DBD) lamp assembly and a method for using the same are provided. In one embodiment, a thermal processing chamber includes a chamber body and a dielectric barrier discharge lamp assembly. The dielectric barrier discharge lamp assembly further comprises a first electrode, a second electrode and a dielectric barrier. The dielectric barrier discharge lamp assembly is positioned between the first electrode and the second electrode. The dielectric barrier defines a discharge space between the dielectric barrier and the second electrode. A circuit arrangement is coupled to the first and second electrodes, and is adapted to operate the dielectric barrier discharge lamp assembly.

Abstract: A heating apparatus comprising a support base and a microplate having a first surface and an opposing second surface. The microplate is positioned adjacent the support base and comprises a plurality of wells formed in the first surface thereof. Each of the plurality of wells is sized to receive an assay therein. A sapphire crystalline transparent window is positioned adjacent the microplate opposing the support base. A heating device heats the transparent window in response to a control system.

Abstract: The present invention is a heat processing furnace comprising: a processing vessel for accommodating an object to be processed and performing thereto a heat process; and a cylindrical heater disposed to surround a circumference of the processing vessel, for heating the object to be processed; wherein: the heater includes a cylindrical heat insulating member, ribbed shelf sections that are axially formed in a tier-like manner on an inner circumference of the heat insulating member, and heating resistance wires of a helical pattern that are placed along the respective shelf sections; and pin members are arranged in the heat insulating member at suitable intervals therebetween, the pin members holding the heating resistance wires such that the heating resistance wires are movable in a radial direction of the heater, while preventing dropout of the heating resistance wires from the shelf sections.

Abstract: An object is to provide a method of activating impurity elements added to a semiconductor film, and a method of gettering, in a process of manufacturing a semiconductor device using a substrate having a low resistance to heat, such as glass, without changing the shape of the substrate, by using a short time heat treatment process. Another object is to provide a heat treatment apparatus that makes this type of heat treatment process possible. A unit for supplying a gas from the upstream side of a reaction chamber, a unit for heating the gas in the upstream side of the reaction chamber, a unit for holding a substrate to be processed in the downstream side of the reaction chamber, and a unit for circulating the gas from the downstream side of the reaction chamber to the upstream side are prepared. The amount of electric power used in heating the gas can be economized by circulating the gas used to heat the substrate to be processed.

Abstract: In a heat treatment apparatus, a holding part moves upwardly to receive a semiconductor wafer transported into a chamber and placed on support pins. The semiconductor wafer held in close proximity to a light-transmittable plate by the holding part is preheated by a hot plate, and is then flash-heated by a flash of light emitted from flash lamps. Thereafter, the holding part moves downwardly to transfer the semiconductor wafer to the support pins, and the semiconductor wafer is transported out of the chamber. Then, a new semiconductor wafer is transported into the chamber. The holding part is adapted to perform such a series of operations of moving upwardly and downwardly also when in a standby condition pending the transport of the first semiconductor wafer in a lot into the chamber.

Abstract: An apparatus for controlling the temperature of a warm bore of a superconducting magnet in a magnetic resonance imaging (MRI) includes a plurality of warm bore thermal sensors positioned on a surface of the warm bore and a plurality of heater elements positioned on the surface of the warm bore. A heater element thermal sensor is coupled to each of the plurality of heater elements and configured to monitor the temperature of the corresponding heater element. A controller is coupled to the plurality of warm bore thermal sensors and the plurality of heater element thermal sensors. The controller is configured to control each of the plurality of heater elements to maintain a predetermined temperature of the warm bore.

Abstract: An infant warmer system include a heater canopy comprising a solar panel configured to convert solar energy into electricity, and a heater operatively connected to the solar panel. The heater is powered by the electricity from the solar panel and/or electricity from a steam generator, and is configured to provide radiant energy in the infrared spectrum to impinge upon and thereby warm an infant. The heater canopy also includes a controller operatively connected to the heater. The controller is configured to regulate the temperature of the heater such that the infant may be maintained within a selectable temperature range. The heater canopy also includes an attachment member configured to secure the heater canopy to a wall during operation.

Abstract: A thermal treatment apparatus having a first light source emitting a first light having light diffusion property, a reflectance measuring unit irradiating a treatment target with the light from plural directions by the first light source and determining a light reflectance of the treatment target, a light irradiation controller adjusting an intensity of a second light of a second light source on the basis of the light reflectance, the second light has diffusion property, and a thermal treatment unit irradiating the treatment target with the second light having adjusted the intensity of the second light by the light irradiation controller.

Abstract: A far infrared panel for humid and dry environments includes a frame, a thin layer, a grounding circuit board, a cloth layer and a second layer. The thin layer includes a carbon membrane and a printed circuit board. Two wires are used to connect the carbon membrane with a control device. The grounding circuit board includes a grounding layer, a circuit board and a wire. The wire is used to connect the grounding circuit board with the ground. The second layer which has a crisscross pattern and a plurality of fixing devices are used to fixedly hold the thin layer, grounding circuit board and cloth layer in the frame. Therefore, the far infrared panel of the present invention may be used to raise the temperature of a sauna room swiftly and evenly and then can make users to sweat heavily.

Abstract: The invention relates to systems and methods including a combination of thermal generating device technologies to achieve more efficiency and accuracy in PCR temperature cycling of nucleic samples undergoing amplification.

Abstract: An underlayment system is provided that includes a plurality of bosses that emanate form a common base member. The bosses and bases preferably include an opening therethrough that will allow for subsequent layers of adhesive to interact and bond to each other. The bosses are also spaced in such a way to help secure a wire snugly therebetween.

Abstract: A technique is provided to model a heat penetration profile for various targets which are non-planar or three-dimensionally shaped targets for use in a heating system. The relative volume of material that is irradiated at various depths may have an impact on the absorbed heat profile through the target. For example, a hollow cylindrical product has substantially more material per micro-meter near the outside diameter than it does near the inside diameter. Accordingly, the thickness of the wall or the diameter of the hollow inside the cylinder, as well as the outer diameter of the cylinder, have a substantial impact on the ultimate heat profile through the wall.

Abstract: A radiant device (1) comprises a supporting frame (2) and at least a radiant element (4) having two mutually opposed ends (4a), each being provided with electrical connection terminals (7). The radiant element (4) engages hooking groups (3) of the supporting frame (2) by means of suitable electrical connection elements (9) placed between the ends (4a) and the hooking assemblies (3). The elastic connection elements (9) dampen collisions and/or vibrations, if present, and insulate at the same time the electrical parts of the device (1) both from fluid seepages and from overheating.

Abstract: An annealing apparatus includes heating sources 17a and 17b provided to face a wafer W, the heating sources 17a and 17b having LEDs 33 emitting lights to the wafer; light-transmitting members 18a and 18b for transmitting the lights emitted from the LEDs 33; and cooling members 4a and 4b made of aluminum and provided to directly contact with the heating sources 17a and 17b, respectively. The heating sources 17a and 17b include a plurality of LED arrays having supporters 32 made of AlN, each having one surface on which the LEDs 33 are adhered by using a silver paste 56; and other surface on which thermal diffusion members 50 made of copper are adhered by using a solder 57. The LED arrays 34 are fixed to the cooling member 4a(4b) by using screws via a silicon grease.

Abstract: A rotary furnace (1) for the heat treatment of solids includes at least one rotary tube into which the solids are introduced and a first heater outside of the rotary tube that makes it possible to conduct a portion of the heat treatment in the absence of oxygen. A second heater for heating feedstock to improve heat treatment is formed by a second heating element (4, 4?, 4?) positioned above the feedstock when the furnace rotates and at least one deflector panel that surrounds the heating element (4, 4?, 4?) is provided on the side opposite to the feedstock (2) and arranged inside of the rotary tube. The rotary furnace is used to roast solid biomass.

Abstract: A method and system are provided for digitally injecting heat into a wide range of products by way of incorporation of a special class of semi-conductor lasers, e.g. surface emitting devices. This technique relates to a more specific, economical, and advantageous way of practicing the art of directly injecting narrowband radiant energy that desirously matches the absorption specification of a particular material at a specified wavelength.

Abstract: A system for direct injection of selected thermal-infrared (IR) wavelength radiation or energy into food items for a wide range of processing purposes is provided. These purposes may include heating, raising or maintaining the temperature of the food articles. The system is especially applicable to operations that require or benefit from the ability to irradiate at specifically selected wavelengths or to pulse or inject the radiation. The system is particularly advantageous when functioning at higher speeds and in a non-contact environment with the target.

Abstract: An apparatus for cooking food with infrared radiation includes an infrared energy emitter for emitting the infrared radiation, and a grid in close proximity to the infrared energy emitter. A first side of the grid can be for supporting the food at a position so that at least some of the infrared radiation will cook the food. A second side of the grid can be sufficiently close to the emitting side of the emitter for substantially restricting any airflow in any space between the second side of the grid and the emitting side of the emitter. Partitions of the grid can operatively segregate the emitting side of the emitter into segments, which can provide a substantially uniform distribution of infrared radiation.

Abstract: A radiant tube assembly (12) has at least one tubular structure (14, 16, 22, or 24), and a heat source (30), with a thermal protective layer (18) is on at least one side, interior or exterior (17 or 15), thereof. An outer tubular structure (16) may be present. A protective layer (18) may be disposed on the outer tubular structure's (16) interior and/or exterior sides (17 and/or 15). A shield (26), having two sides (25 and 27) and a thermal protective layer (18) may be disposed along an exterior or interior side (27 or 25).

Abstract: The invention relates to a method for heating a wafer (1) comprising at least one layer to be heated (2) and a sub-layer (4), under the effect of at least one light flux pulse, comprising the following steps: selecting a light flux (7), a layer to be heated (2) such that the absorption coefficient of said flux by the layer to be heated (2) is low as long as the temperature of said layer to be heated is in the low temperature range (PBT) and said absorption coefficient increases significantly when the temperature of the layer to be heated enters a high temperature range (PHT); and selecting a sub-layer (4) such that the absorption coefficient of said light flux at said selected wavelength is high in said low temperature range (PBT) and the temperature enters the high temperature range (PHT) when said sub-layer is subject to the light flux; and applying said light flux (7) to said wafer (1).

Abstract: An electric fireplace includes a fireplace housing having a housing first and second side walls and a housing top wall, a housing floor, a housing back wall, and a housing open end opposite the housing back wall; a flame simulator mounted inside the housing; a diffusion screen removably mounted upright within the housing in front of the flame simulator; an ember bed simulating the appearance of fireplace fuel such as fire wood, embers or coal, and removably mounted inside the housing in front of the flame simulator, so that removal of the ember bed and the flame cutout panel provides access to the flame simulator from the housing open end; and a hot air generator removably mounted inside the housing to be accessible from the housing open end.

Abstract: An intra-convertible thermal vapor extraction and delivery system comprising: an ergonomically-shaped casing comprising a heating element, a fan, an output nozzle thermally coupled to the heating element and having a nozzle base and a tapered nozzle end, and a nozzle sleeve; and a cradle having a bottom surface and a top surface, wherein bottom surface is substantially planar, and top surface is substantially concave so as to accept and securely hold the casing, wherein the fan is positioned substantially behind the heating element so as to blow ambient air through the element, heating it to a desired temperature, and forcing it through the output nozzle, and wherein the nozzle base is positioned to receive the air before the tapered nozzle end, and the nozzle base has a greater outer diameter than the tapered nozzle end, creating a step at the transition between the nozzle base and the tapered nozzle end.

Abstract: Substrate processing equipment and methods are used to improve the uniformity of illumination across an illuminated portion of a substrate by processing light with multiple optical homogenizers. The multiple optical homogenizers each include micro-lens arrays and Fourier lens. The multiple optical homogenizers are arranged so that the output numerical aperture of one of the optical homogenizers is within 5% of the input numerical aperture of another optical homogenizer.

Abstract: A far infrared ray ceramic flat plate heating module is provided. The far infrared ray ceramic flat plate heating module includes a ceramic heat-generating flat plate, an integrated terminal block for electrical distribution, a metal plate and a metal frame. The ceramic heat-generating flat plate includes a ceramic flat plate, a heat-generating film coated on a surface of the ceramic flat plate, silver paste electrodes configured on and coupled to two opposite sides of the heat-generating film, a first insulating layer coated on the heat-generating film and the silver paste electrodes, a temperature sensor configured by forming a temperature sensing paint layer on the first insulating layer, and a second insulating layer formed on the temperature sensor. The integrated terminal block is secured on the metal plate. The metal frame is disposed surrounding the periphery of the metal plate and the ceramic heat-generating flat plate.

Abstract: An apparatus for heating a pipe, having at least one heating unit, at least one temperature sensor and a controller, wherein the controller is arranged to control the at least one heating unit in dependence on the temperature measured by the temperature sensor.

Abstract: Described are roll-to-roll or reel-to-reel thermal or rapid thermal processing tools (reactors) are used to react a precursor layer on a continuous flexible workpiece. Variants of the reactors are described, including a reactor having multiple exhaust outlets connected to a process gap of the reactor between an entrance opening and an exit opening of the process gap; a reactor including multiple gas inlets and exhaust outlets connected to a process gap of the reactor between an entrance opening and an exit opening of the process gap; a reactor including multiple gas inlets and exhaust outlets connected to a process gap of the reactor between an entrance opening and an exit opening of the process gap; and a reactor including multiple gas inlets and exhaust outlets connected to a process gap of the reactor between an entrance opening and an exit opening of the process gap.

Abstract: An installation for heating grounds, in particular sports grounds, using cables (9, 9?, 9?) supplied with electric current which are buried in the ground. The installation is characterized in that the surface of the grounds to be heated is divided into a number of sectors (1a, 1b, 1c, . . . , 1n), and each sector is heated by at least two heating lines (9, 9?, 9?) constituting each a secondary of a common transformer (3a, 3b et 3c).

Abstract: Disclosed herein is a carbon heater. The carbon heater comprises a carbon filament disposed in a tube for serving as a heating element. The carbon filament has support parts integrally formed at the carbon filament while being protruded from the carbon filament in the direction perpendicular to the longitudinal direction of the carbon filament such that the support parts are supported inside the tube. Consequently, the carbon filament is more stably supported in the tube by the support parts, whereby the service life of the carbon heater is increased, and easy and convenient design and assembly of the carbon heater is accomplished.

Abstract: A processing gas is prevented from entering into a space below a placement table. A supporting surface 62 for supporting the lower face of a placement table 58 is provided at an inner circumferential portion of the upper end of a support 56. A circumferentially extending purge gas groove 64 is formed outside the supporting surface 62, in an intermediate circumferential portion of the upper end of the support 56. A narrow flow path 68 is provided outside the purge gas groove 64, at a position corresponding to an outer circumferential portion of the upper end of the support 56. A purge gas fed from purge gas-feeding means 66 into the purge gas groove diffuses in the circumferential direction in the purge gas groove 64 and flows out to the outside from the narrow flow path 68. Such a flow of the purge gas prevents a processing gas from entering into the purge gas groove 64 and a space S1 below the placement table.

Abstract: A light irradiation heating process in which, even in the case of an asymmetrical physical property of an article to be treated, uniform heating is possible, or in which heating can be performed such that the article acquires a desired physical property after heat treatment. Based on the measured value of the local physical property of the article to be treated, the emissivity distribution is obtained and the distribution pattern of the light intensity on the article to be treated is determined. According to this light intensity pattern, the individual intensity of the light emitted from respective light emitting parts of lamp units of the heating device are determined beforehand. According to this determined result, the intensity of the light emitted from the respective light emitting parts of the lamp units are controlled individually, and thus, the article to be treated is irradiated with light.

Abstract: For the purpose of providing a heating unit being small in size, high in efficiency, long in service life, and high in versatility so as to be easily adaptable to various applications, and providing a heating apparatus that uses the heating unit, the heating unit is configured so that a first glass tube is protected against contaminants and the like using a second glass tube, caps and spacers, a reflective sheet may be disposed in a clearance between the first glass tube and the second glass tube, and the clearance in which the reflective sheet is disposed is sealed using the caps. The heating apparatus uses the heating unit described above as a heat source.

Abstract: The invention thus relates to a radiation module incorporating a support, at least one heating and/or heat conducting element and a temperature exchanging element made by extrusion and constituted by a single-piece base with an internal face incorporating at least one means to integrate the heating and/or heat conducting element and an external face incorporating radiation fins wherein the module incorporate a diffuser receiving infrared radiation from the temperature exchanging element, said diffuser enabling infrared radiation to be emitted of a wavelength that is less than that of the radiation received.

Abstract: Two-step photo-irradiation heat treatment is performed so that a total photo-irradiation time is not more than one second and that a first step of photo-irradiation of a semiconductor wafer is performed with a light-emission output that averages out at a first light-emission output and a second step of photo-irradiation of the semiconductor wafer is performed in accordance with an output waveform that peaks at a second light-emission output that is higher than both average and maximum light-emission outputs in the first step. Performing preliminary photo-irradiation with a relatively low light-emission output in the first step and then performing intense photo-irradiation with a higher peak in the second step enables the surface temperature of a semiconductor wafer to increase further with a smaller amount of energy than in conventional cases, while preventing the semiconductor wafer from shattering.

Abstract: A heating system which may include a bonding membrane having a water permeable lamina, an electrically conductive ink-based radiant heater, and a first adhesive adapted to adhere to both the conductive ink-based radiant heater and the bonding membrane. The heating system may be incorporated in a floor including a substrate, the heating system and a decorative floor surface. The heating system may also be in the form of a multilayer panel having a bonding membrane, an electrically conductive ink-based heater including a plurality of electrically resistive strips printed on a first polymer sheet connected by electrically conductive buses, and electrical conductors extending from the buses to at least an edge of the panel.

Abstract: A reaction block is provided that utilizes a refrigerant gas for cooling that includes a plurality of reaction stations each defining a reaction chamber for receiving a reaction vessel and defining a gas conducting passageway for conducting the refrigerant gas through the reaction station in temperature transmitting relation thereto. The reaction block also includes a metering means in fluid communication with a respective one of the reaction stations and is configured to receive a liquid refrigerant and to deliver an amount of refrigerant gas to the gas conducting passageway of one of the reaction stations in order to cool the contents inside the reaction vessel located at that reaction station. The metering means is also configured so that the amount of the refrigerant gas delivered to the gas conducting passageway of one reaction station is independent of the amount of refrigerant gas delivered to another one of the reaction stations.

Abstract: The present invention relates to a pipe heater encircled conduit device (1), in which a heating element (111) wrapped with a filament (112) having high resistance is provided and a hollow quartz inner tube (113) is inserted at the outside of said heating element (113) to form a pipe heater (11), both ends of the heating element (111) being connected with an electrode pin (114) respectively. A hollow quartz outer tube (123) is inserted at the outside of the pipe heater (11), which has an inlet (121) and an outlet (122) on the tube wall. A heat transfer space (A) is thus formed between the inner quartz tube (113) and the outer quartz tube (123), and insulation members (124) are combined with the respective opening end of both tubes. By the arrangement of the inner and outer quartz tubes.

Abstract: A method of controlled heating of a micro channel reactor structure (46, 48, 50) comprises providing a structure (b1, b2, B1, B2) defining a desired temperature profile. A preferred embodiment of a heating element structure comprises a pattern of areas of a material capable of providing heat when energized, disposed over said micro channel reactor structure.

Abstract: A radiation appliance for irradiating surfaces of objects during powder coating, having energy radiators movably arranged on one carrier wherein at least one measuring temperature sensor that can measure the temperature of the object in at least one section of the surface of the object and a control unit are provided, wherein the control unit can record the measured temperature of the temperature sensor(s) and controls at least one energy radiator, which is assigned to the section of the surface whose temperature is being measured, and an arrangement and method for powder coating wooden objects, comprising a powder-coating station, a first radiation appliance, and a section for hardening or crosslinking the powder, wherein the first radiation appliance is arranged between powder-coating station and section and the second radiation appliance is arranged in the section, and the moisture content of the objects is set to 7 to 7.8 weight-percent water.

Abstract: The present invention relates to new compositions of matter, particularly metals and alloys, and methods of making such compositions. The new compositions of matter exhibit long-range ordering and unique electronic character.

Abstract: A filament lamp is provided. The filament lamp includes: a long light emitting section including a plurality of filaments aligned with one another in an axial direction of the light emitting section, wherein electric power is independently supplied to each of the filaments; a sealing section that seals the light emitting section, including: a first sealing section provided at one end of the light emitting section; and a second sealing section provided at the other end of the light emitting section; a plurality of metal foils embedded in the sealing section; a plurality of external leads each connected to a corresponding one of the metal foils and extending from the sealing section to the outside; and a plurality of glass pipes each provided on the sealing section so as to cover a corresponding one of the external leads.

Abstract: The invention relates to a method or producing a container from a thermoplastic blank (2), comprising: a step in which the blank (2) is heated using at least one beam (22) of coherent electromagnetic radiation, and a step in which the container is formed from the bank (2) thus heated. The invention also relates to an installation (1) which is used to produce containers (2) and which comprises a unit (16) for heating the blanks (2) in order to form containers from the blanks (2) thus heated. The inventive installation (1) defines a path (23) along which the blanks (2) travel inside the heating unit (16). In addition, the heating unit (16) comprises at least one coherent electromagnetic radiation source (26) which is directed towards a zone (25) that is located on the aforementioned path (23).

Abstract: Methods and systems are provided for optimally curing a deposited curable material film using a light source and feedback system for monitoring the degree of curing using detected optical properties of the film. Operational parameters of the light source (e.g., power) are adjusted by a control system in response to the detected optical properties of the film. The curing system includes at least one light source in optical communication with an uncured material, a detector for monitoring an optical property of the curing material, and a feedback system for controlling the light emitted from the light source in response to the detector.

Abstract: A filament lamp that allows independent control of the state of luminescence of multiple filaments and that reliably prevents the occurrence of unwanted discharge between adjacent portions of neighboring filaments, even when a high voltage is injected into the filaments to achieve a desired irradiation distribution, and light-irradiation-type heat treatment device that can heat the article to be treated uniformly. The filament lamp has multiple filament assemblies, each having a filament and respective leads arrangement sequentially within a light emitting bulb, in the axial direction of the light emitting bulb. With alternating current power supplied to each filament independently, the current will be supplied with the same phase and mutually adjacent terminals of neighboring filament assemblies will have the same potential, and with direct current power supplied to each filament independently, adjacent terminals of neighboring filament assemblies will be of the same polarity.

Abstract: The present invention relates to a device for controlling at least one heater (6) within an installation for preheating the preforms used in the manufacture of plastic containers. The device comprises: at least one detection means (3) connected in series with said heater (6) and with a first power switch (4), and enabling the current and/or voltage to be measured; and at least one second power switch (5) connected in parallel with said first power switch (4) and controlled by a control card (8), said control card (8) being designed to divert, as soon as a current exceeding a threshold value is detected in said detection means (3), the current into said second power switch (5). The invention also relates to a corresponding control method and a corresponding preheating installation.

Abstract: A radiant heating system comprises a thermally sprayed resistive heating layer bonded to an underlayment building material substrate. The substrate can comprise a sub-flooring material and the heating system can comprise a radiant floor heating system. The resistive heating layer can be thermally sprayed directly onto a sub-floor or similar underlayment material, including a cementitious backing material or a sound reduction board. A finished floor surface, such as a tile, wood or laminate surface, can be provided over the substrate and thermally sprayed heater to provide a radiant floor heater. In other embodiments, a radiant heating system includes a thermally sprayed heater bonded to a flooring overlay, such as a laminate board, to a heater insert, such as a flexible polymer film or a mica-based material, or to a concrete substrate. Methods of fabricating radiant heating systems include thermally-spraying a resistive material on a sub-floor or flooring overlay.

Abstract: A heating body is provided. The heating body includes a tube, a heating member disposed in the tube, and a supporting unit disposed along a length of the tube to maintain a predetermined space between the tube and the heating member.

Abstract: In photo-irradiation heating with a total photo-irradiation time of one second or less, after initial photo-irradiation of a semiconductor wafer is performed while increasing an emission output to a target value, succeeding photo-irradiation of the semiconductor wafer is performed while maintaining the emission output within a range of plus or minus 20% from the target value. The photo-irradiation time for the initial photo-irradiation ranges from 0.1 to 10 milliseconds, and the photo-irradiation time for the succeeding photo-irradiation ranges from 5 milliseconds to less than one second. This allows the temperature of the semiconductor wafer even at a somewhat greater depth below the surface to be raised to some extent while allowing the surface temperature to be maintained at a generally constant processing temperature, thus achieving both the activation of implanted ions and the repair of introduced defects without any thermal damage to the semiconductor wafer.

Abstract: In light-irradiation heating with a total irradiation time of one second or less, two-stage irradiation is performed, including a first stage of light irradiation of a semiconductor wafer, which irradiation produces an output waveform that reaches a peak at a given emission output; and a second stage of supplemental light irradiation of the semiconductor wafer, which irradiation is started after the peak, producing an emission output smaller than the above given emission output. The emission output in the second stage is two thirds or less than the above given emission output at the peak. The first-stage light-irradiation time is between 0.1 and 10 milliseconds, and the second-stage light-irradiation time is 5 milliseconds or more. This allows the temperature of the semiconductor wafer even at a somewhat greater depth below the surface to be raised to some extent while allowing the surface temperature to be maintained at a generally constant processing temperature.