Charging Of Chamber Patents (Class 414/160)
  • Patent number: 11015342
    Abstract: A movable wall element for a building with a floor and a ceiling is disclosed, where the movable wall element comprises at least one lower roller device comprising a wheel element which is capable of engaging the floor of the building when the wall element is to be moved across the floor. The movable wall element further comprises at least one upper roller device comprising a wheel element which is capable of engaging the ceiling of the building when the wall element is to be moved across the floor.
    Type: Grant
    Filed: June 21, 2017
    Date of Patent: May 25, 2021
    Assignee: WHEEL.ME AS
    Inventor: Atle Timenes
  • Patent number: 10665488
    Abstract: A load port apparatus connects a main opening of a wafer transportation container with a frame opening. The load port apparatus includes an installation part, a frame, and a flange clamp. The installation part has an installation table configured to install the wafer transportation container and move to and from the frame opening. The frame is upright from the installation part and has the frame opening. The flange clamp includes an engagement portion and a drive portion. The engagement portion is configured to be engaged with a flange surrounding an outer circumference of the main opening. The drive portion is configured to drive the engagement portion. The engagement portion is engaged from above or the side with a flange groove formed in the flange and opening radially outwardly.
    Type: Grant
    Filed: September 26, 2018
    Date of Patent: May 26, 2020
    Assignee: TDK CORPORATION
    Inventors: Tadamasa Iwamoto, Hiroshi Igarashi
  • Patent number: 10115617
    Abstract: A system for processing substrates in plasma chambers, such that all substrates transport and loading/unloading operations are performed in atmospheric environment, but processing is performed in vacuum environment. The substrates are transported throughout the system on carriers. The system's chambers are arranged linearly, such that carriers move from one chamber directly to the next. A conveyor, placed above or below the system's chambers, returns the carriers to the system's entry area after processing is completed. Loading and unloading of substrates may be performed at one side of the system, or loading can be done at the entry side and unloading at the exit side.
    Type: Grant
    Filed: October 3, 2016
    Date of Patent: October 30, 2018
    Assignee: INTEVAC, INC.
    Inventors: Terry Bluck, Vinay Shah, Alexandru Riposan
  • Patent number: 9991139
    Abstract: A vertical furnace processing system for processing semiconductor substrates, comprising the following modules: —a processing module including a vertical furnace; an I/O-station module including at least one load port to which a substrate cassette is dockable; a wafer handling module configured to transfer semiconductor substrates between the processing module and a substrate cassette docked to the load port of the I/O-station module; and a gas supply module including at least one gas supply or gas supply connection for providing the vertical furnace of the processing module with process gas, wherein at least two of the said modules are mutually decouplably coupled, such that said at least two modules are decouplable from one another to facilitate servicing of the system, and in particular the vertical furnace thereof.
    Type: Grant
    Filed: December 3, 2013
    Date of Patent: June 5, 2018
    Assignee: ASM IP HOLDING B.V.
    Inventors: Theodorus G. M. Oosterlaken, Chris G. M. de Ridder, Bert Jongbloed
  • Patent number: 8672602
    Abstract: The present invention is a processing apparatus comprising a transfer mechanism including at least one transfer plate, the transfer mechanism being configured to cause, when a substrate to be processed is placed on an upper surface of the transfer plate, the transfer plate to move while maintaining the substrate to be processed placed horizontally thereon. The transfer plate has a cantilevered support structure horizontally extending from a proximal end thereof to a distal end thereof in a fore and aft direction. An upper surface of the transfer plate is provided with a plurality of support projections configured to horizontally support the substrate to be processed at a substantially central position thereof and a rear position thereof in the fore and aft direction. The substrate to be processed is not supported on the distal portion of the transfer plate.
    Type: Grant
    Filed: August 28, 2009
    Date of Patent: March 18, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Satoshi Asari, Kiichi Takahashi, Toshihiro Abe
  • Publication number: 20140064885
    Abstract: Provided is a cover opening/closing apparatus which includes: a wafer conveyance port having an opening edge and configured to be opened/closed by an opening/closing door; and a cover removal apparatus installed on the opening/closing door and configured to remove a cover of a FOUP which is formed with a substrate outlet having a opening edge. When the cover removal apparatus removes the cover of the FOUP, the opening edge of the substrate outlet is closely contacted with the opening edge of the wafer conveyance port. The cover removal apparatus includes: a latch key which is engaged with the cover of the FOUP, a driving unit configured to drive the latch key, and an accommodation unit configured to accommodate the driving unit. The cover opening/closing apparatus further includes an exhaust system configured to exhaust a space within the accommodation unit.
    Type: Application
    Filed: September 4, 2013
    Publication date: March 6, 2014
    Applicant: Tokyo Electron Limited
    Inventors: Katsuhiko Oyama, Yasushi Takeuchi
  • Patent number: 8641350
    Abstract: A wafer boat assembly for use with a loading apparatus configured to insert the wafer boat assembly loaded with semiconductor substrates into a furnace. The wafer boat assembly includes a first wafer boat part comprising a base and a first cover part mounted on the base; and a second wafer boat part comprising a second cover part that is provided with receiving slots for holding a plurality of semiconductor substrates. The second cover part has an arcuate shape that extends from a first longitudinal edge to a second longitudinal edge. The first and second wafer boat parts are detachably connectable, such that they mate together to extend around an outer perimeter of a loaded substrate at a predetermined distance.
    Type: Grant
    Filed: February 18, 2011
    Date of Patent: February 4, 2014
    Assignee: ASM International N.V.
    Inventor: Chris G. M. de Ridder
  • Patent number: 8562270
    Abstract: A dam arrangement is provided for confining catalyst and other particles. The dam can be arranged in a wide variety of configurations. In one embodiment, blocks are provided that are releasably secured to the top tubesheet by means of magnets, and sheets are secured to the blocks to create a dam. In another embodiment, the blocks are releasably secured to the tubesheet by fasteners which project into the tops of some of the tubes and then lock into those tubes.
    Type: Grant
    Filed: September 17, 2010
    Date of Patent: October 22, 2013
    Assignee: Extundo Incorporated
    Inventors: Clifford L. Johns, Dennis McAndrews, Douglas K. Cornett
  • Patent number: 8528886
    Abstract: Methods and apparatus provide for delivering a controlled supply of gas to at least one aero-mechanical device to impart a gas flow to suspend a material sheet; preventing lateral movement of the material sheet in at least one direction when suspended; and imparting a stream of water, from a side of the material sheet opposite the at least one aero-mechanical device, to cut the material sheet when suspended.
    Type: Grant
    Filed: February 2, 2009
    Date of Patent: September 10, 2013
    Assignee: Corning Incorporated
    Inventors: Chester Hann Huei Chang, Michael John Moore, Michael Yoshiya Nishimoto, Chunhe Zhang
  • Publication number: 20130175741
    Abstract: A load transport mechanism for moving a heat treating load in a multi-station heat treating system is disclosed. The transport mechanism has a compact construction that allows it to fit in a centrally located stationary transport chamber. The transport chamber is adapted to provide ready access to multiple treating chambers arrayed around the chamber. The transport mechanism includes a load translation mechanism for moving the load linearly and a load rotation mechanism for rotating the load within the transport chamber. A multi-station heat treating system having a centrally located quenching chamber that includes the load transport mechanism is also disclosed.
    Type: Application
    Filed: December 21, 2012
    Publication date: July 11, 2013
    Applicant: IPSEN, INC.
    Inventor: IPSEN, INC.
  • Publication number: 20130039723
    Abstract: A distribution device for distributing bulk material with a distribution spout on a cardan suspension that has a first and a second gimbal member pivotable about two perpendicular suspension axes where a drive arrangement has a first and a second transmission mechanism for controlling pivotal motion of the distribution spout about the suspension axes and the drive arrangement has a further cardan joint, with a first part pivotable about a third axis and a second part pivotable about a fourth axis, and a rotary motor for driving a rotary drive shaft that is connected to the cardan joint by means of an articulated connecting arm such that the rotational position and the axial position of the drive shaft determine the pivotal position of the second part about the third and fourth axes respectively, where the transmission mechanisms transmit torque about the third and fourth axes from the cardan joint to the cardan suspension for pivoting the distribution spout about the first and second axes respectively.
    Type: Application
    Filed: April 14, 2011
    Publication date: February 14, 2013
    Applicant: PAUL WURTH S.A.
    Inventors: Guy Thillen, Emile Lonardi, Jean-Joseph Stumper, Harald Lang, Klaus Mutschler
  • Publication number: 20130028687
    Abstract: A heat treatment apparatus includes a vessel loading unit on which a substrate vessel configured to accommodate a plurality of substrates at a first interval is loaded, a substrate holder configured to hold the plurality of substrates at a second interval which is smaller than the first interval, a substrate transfer unit capable of supporting the substrates and configured to transfer the plurality of substrates between the substrate holder and the substrate vessel and includes at least two substrate supporting parts stacked with the first interval therebetween and configured to be simultaneously advanced and retreated relative to the substrate vessel and individually advanced and retreated relative to the substrate holder, and a control unit configured to control an upper one of the at least two substrate supporting parts to be in an inoperative state when a lower one is supporting the substrate.
    Type: Application
    Filed: July 26, 2012
    Publication date: January 31, 2013
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Kiichi TAKAHASHI, Terumi KAMADA, Ittetsu OIKAWA
  • Publication number: 20120321433
    Abstract: An alkali metal introduction apparatus (1) includes: a dedicated fracture chamber (10) and a vacuum chamber (20); vacuum pumps (60a) and (60b) for evacuating the insides of the dedicated fracture chamber (10) and the vacuum chamber (20); an ampul fracturing section for causing, in the dedicated fracture chamber (10), an alkali metal encapsulated in an ampul (16) to be exposed out of the ampul (16) by deforming the ampul (16); a collision cell (40) configured to allow the ampul (16) to be introduced therein, the collision room (40) being provided inside the vacuum chamber (20); and an ampul introducing section (12) for moving the ampul (16) between an exposure position where the alkali metal encapsulated in the ampul (16) is to be exposed out of the ampul (16) thus deformed and an introduction position where the ampul (16) is to be introduced into the collision cell (40).
    Type: Application
    Filed: January 25, 2011
    Publication date: December 20, 2012
    Applicant: Osaka University
    Inventors: Michisato Toyoda, Hirofumi Nagao, Shuichi Shimma, Shigeo Hayakawa
  • Publication number: 20120269603
    Abstract: A loading unit which elevates a substrate holder holding a plurality of substrates to be subjected to heat treatment with respect to a cylindrical processing container whose bottom portion is opened and closed by a cap, includes, a loading housing, an elevator mechanism elevating the substrate holder, a shutter closing an opening of the bottom of the processing container, a substrate moving and loading mechanism having an elevatable moving and loading arm, a first partitioning box installed to surround the elevator mechanism and a moving space of the elevated substrate holder and provided with a cooling gas injecting means, a second partitioning box connected to the first partitioning box and is installed to surround the substrate moving and loading mechanism and a moving space of the substrate moving and loading mechanism, and a third partitioning box connected to the first partitioning box and is installed to surround the shutter.
    Type: Application
    Filed: April 18, 2012
    Publication date: October 25, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventor: Katsuya TOBA
  • Patent number: 8287227
    Abstract: Particulate filling devices and methods are disclosed that use a loading system generally including a loading cart, a drive system, and a line assembly. The drive system generally includes a motor, a drive shaft, a driven shaft, a spool, a plurality of cable partitions, and a controller. Each line assembly generally includes cable sections, swivel connectors, one or more spring blocks and a weight.
    Type: Grant
    Filed: March 2, 2011
    Date of Patent: October 16, 2012
    Assignee: Catalyst Services, Inc.
    Inventor: Paul Fry
  • Publication number: 20120219387
    Abstract: Contact lens curing systems and methods are described. A contact lens curing system includes an oven that has a plurality of curing zones, a mold advancement system for moving contact lens mold assemblies between the plurality of zones, and a controlled atmosphere the curing zones that provides a substantially chemically inert environment in which contact lens precursor materials can be polymerized in contact mold assemblies located in the curing zones. Methods of producing contact lenses include curing contact lens precursor materials in contact lens mold assemblies in the lens curing system.
    Type: Application
    Filed: April 20, 2012
    Publication date: August 30, 2012
    Applicant: CooperVision International Holding Company, LP
    Inventors: Hayden Atkinson, Paul Riggs, John Gibson, Tim Warren, Ronnie Dover, Arthur Williams, Jennifer Cowden, Michael Gunner
  • Publication number: 20120213613
    Abstract: Wafer boat assembly for use in a loading apparatus for loading semiconductor substrates in a vertical furnace configured for batch processing, wherein the wafer boat assembly comprises a wafer boat for holding semiconductor substrates and a cover configured to substantially surround the substrates, wherein the wafer boat assembly is provided with a first wafer boat part comprising a base and a first cover part mounted thereto, said first cover part extending at least partially along a base upper perimeter; and a second wafer boat part comprising a second cover part removably provided on the first wafer boat part and configured to cooperate with the first cover part, said second cover part comprising receiving slots for receiving at least a semiconductor substrate to be processed.
    Type: Application
    Filed: February 18, 2011
    Publication date: August 23, 2012
    Inventor: Chris G.M. de Ridder
  • Publication number: 20120170999
    Abstract: A load lock device is connected between a vacuum chamber and an atmospheric chamber through gate valves and the interior thereof is selectively switchable between a vacuum atmosphere and an atmospheric pressure atmosphere. The load lock device includes: a load lock container; a support unit provided in the load lock container and having supporting portions for supporting target objects in multiple stages; a gas introduction unit having gas ejection holes which are provided so as to correspond to the supporting portions and eject as a cooling gas a restoring as for restoring the atmosphere in the load lock container to the atmospheric pressure; and a vacuum exhaust system for evacuating the atmosphere in the load lock container to vacuum.
    Type: Application
    Filed: August 23, 2010
    Publication date: July 5, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventor: Hiromitsu Sakaue
  • Patent number: 8205565
    Abstract: A device is provided for accelerating and propelling whole tires into the combustion zone of a kiln. More specifically, the device comprises an upper accelerating assembly and a lower accelerating assembly for providing approximately constant exit velocity to a whole tire regardless of its size or weight.
    Type: Grant
    Filed: March 4, 2005
    Date of Patent: June 26, 2012
    Assignee: Cemex, Inc.
    Inventors: Roy L. Edberg, Derek Thorington, Gary Pinault, Bryan Martin, Victor Garza
  • Patent number: 8182758
    Abstract: An apparatus and method for loading particulate material in a vertical tube comprising at least one impact-absorbing module, a central axis and a sustaining wire to position the apparatus suspended in the interior of the tube in such a way as to allow loading and uniform distribution of all the material loaded in the tube and the method of loading that uses the apparatus is also described.
    Type: Grant
    Filed: April 14, 2009
    Date of Patent: May 22, 2012
    Assignee: Petroleo Brasileiro S.A.-Petrobras
    Inventors: Francisco de Assis Oliveira, Ricardo Lopes Matriciano
  • Patent number: 8157497
    Abstract: A loader assembly for a TEM machine having a retractable arm that is moveable between a retracted position and an extended position. A hoop portion of the retractable arm also moves between the retracted position and the extended position. A lower closure for holding a part to be processed in the TEM machine is removably positioned in the hoop portion. A ram piston of the TEM machine is movable between a load position and a process position. When the ram piston moves from a load position to a process position the ram piston contacts the lower closure and extends through the hoop of the retractable arm to move the lower closure to the process position. A thermal chamber receives the lower closure when the ram piston moves to the process position.
    Type: Grant
    Filed: May 6, 2008
    Date of Patent: April 17, 2012
    Assignee: Kennametal Inc.
    Inventors: Miles Edmond Loretta, Daryl Duane Perkins, Axel Willi Kieser
  • Patent number: 8052922
    Abstract: The invention relates to the iron and steel industry, in particular to batch charging into shaft, mainly blast furnaces. The inventive rotary batch distributor for shaft furnaces comprises an axle platform (1) and blades (2) which are equally spaced around the platform and are fixed thereto by means of brackets (3). The surface of each blade is embodied in the form of an involute of a truncated cone and consists of trapezoidal sections (4). The tilting angles of the trapezoidal sections with respect to the rotary batch distributor axis and to a horizontal plane are defined by the involutes (5) of truncated cone which are focused at the same point of the rotary batch distributor axis. The surface area of each blade is defined by the sector angle value ranging from 90 to 120° and by the radius of the describe circle of the rotary batch distributor. The end part (6) of the blade whose surface area is equal to 0.05-0.
    Type: Grant
    Filed: December 26, 2006
    Date of Patent: November 8, 2011
    Assignee: Zakrytoe Aktsionernoe Obschestvo “Nauchno-Proizvodstvenny I Kommerchesky Tsentr ″Totem”
    Inventors: Bekmurat Meketaevich Boranbaev, German Vasilievich Abramin, Yury Alexandrovich Smirnov, Andrey Mikhailovich Dyatlov, Alexander Yurievich Glazer
  • Patent number: 8025472
    Abstract: Particulate filling devices and methods are disclosed that use a loading system generally including a loading cart, a drive system, and a line assembly. The drive system generally includes a motor, a drive shaft, a driven shaft, a spool, a plurality of cable partitions, and a controller. Each line assembly generally includes cable sections, swivel connectors, one or more spring blocks and a weight.
    Type: Grant
    Filed: June 1, 2007
    Date of Patent: September 27, 2011
    Assignee: Catalyst Services, Inc.
    Inventor: Paul Fry
  • Publication number: 20110217469
    Abstract: In accordance with some embodiments described herein, a method for transferring a substrate is provided. The method includes loading one or more substrates into a respective mobile chamber of one or more mobile chambers. The mobile chambers are movable on a first rail positioned adjacent to two or more process modules. Each mobile chamber is configured to maintain a specified gas condition. The respective mobile chamber is moved along the first rail. The respective mobile chamber is docked to a respective process module of the two or more process modules. At least one of the one or more substrates is conveyed from the respective mobile chamber to the respective process module.
    Type: Application
    Filed: December 20, 2010
    Publication date: September 8, 2011
    Inventors: Lawrence Chung-Lai Lei, Alfred Mak, Rex Liu, Kon Park, Samuel S. Pak, Tzy-Chung Terry Wu, Simon Zhu, Ronald L. Rose, Gene Shin, Xiaoming Wang
  • Patent number: 7933685
    Abstract: A system and method is disclosed for calibrating a semiconductor wafer handling robot and a semiconductor wafer cassette. A robot blade boot is attached to a robot blade of the semiconductor handling robot. The robot blade boot decreases a value of tolerance for the robot blade to move between two semiconductor wafers in the semiconductor wafer cassette. In one embodiment the vertical tolerance is decreased to approximately twenty thousandths of an inch (0.020?) on a top and a bottom of the robot blade boot. The use of the robot blade boot makes the calibration steps more critical and precise. The robot blade boot is removed from the robot blade after the calibration process has been completed.
    Type: Grant
    Filed: January 10, 2006
    Date of Patent: April 26, 2011
    Assignee: National Semiconductor Corporation
    Inventors: Roger Sarver, Christopher Qualey
  • Publication number: 20110076116
    Abstract: A system for use in a gasification system, comprises a solid pump that delivers a pressurized fuel and a high-pressure transition vessel. The transition vessel comprises a first inlet connected to an outlet of the solid pump so that all of the fuel from the solid pump passes through the transition vessel, a second inlet for connection to a conveyance gas line, and an outlet through which the fuel is transported to a gasifier. The transition vessel is elongated in the direction of a flow so that a conveyance gas introduced through said conveyance gas line plus the pressure difference carries the fuel to the gasifier.
    Type: Application
    Filed: September 29, 2009
    Publication date: March 31, 2011
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Ke Liu, Zhe Cui, Wei Chen, Mingmin Wang
  • Publication number: 20110064543
    Abstract: A cuvette (10) for an automatic analyzing apparatus according to the invention comprises at least two positions (20), for each position pair one separating wall (22) connecting the positions (20), and brackets (24), which are at the outermost positions (20) and which are adapted to guide the cuvette (10) into a curved shape. In a handling method of a cuvette (10) according to the invention a cuvette (10) is transported from its brackets (24) to an incubator (30) and bent into a curved shape. In the method the cuvette (10) is then loaded into an opening (34) of the incubator (30), in which opening (34) it remains by means of its own spring back factor, until the cuvette (10) is removed from the opening (34) after the analysis.
    Type: Application
    Filed: May 27, 2009
    Publication date: March 17, 2011
    Applicant: THERMO FISHER SCIENTIFIC OY
    Inventors: Vesa Nuotio, Juhani Makunen
  • Publication number: 20100316472
    Abstract: A solids distributor for injection plants includes a collecting chamber having a plurality of lance lines leading away from the chamber. The chamber has a supply connection for a solid to be distributed and is surrounded by a common wall in which a plurality of ports is formed. The lance lines are connected to the ports, and an annular gap is formed in front of the ports and along the common wall. A pressure vessel is arranged geodetically above the collecting chamber, the lower part of the pressure vessel being designed as a bunker, having an outlet providing a direct and continuous junction to the supply connection and an upper part designed as a gas space. The collecting chamber may include a central displacement body which forms the annular gap with the common wall and which may be an upwardly tapering cone which projects out of the collecting chamber.
    Type: Application
    Filed: October 22, 2007
    Publication date: December 16, 2010
    Applicant: Claudius Peters Technologies GmbH
    Inventors: Peter Hilgraf, Dietrich Schumpe, Hans-Dieter Nolde, Volker Goecke
  • Publication number: 20100143079
    Abstract: A vacuum treatment apparatus is provided with a plurality of carriers whereupon a base material is mounted; a circulation path which is held in a controlled atmosphere and permits the carriers to circulate therein; a plurality of base material exit/entrance chambers arranged in the circulation path for loading and taking out the base material on and from the carriers; and vacuum treatment chambers which are arranged between the base material exit/entrance chambers in the circulation path and perform vacuum treatment to the base material.
    Type: Application
    Filed: July 21, 2006
    Publication date: June 10, 2010
    Applicant: ULVAC, INC.
    Inventor: Eiichi Iijima
  • Publication number: 20100143080
    Abstract: The invention relates to a device for loading and unloading a heat treatment furnace and to a corresponding method. Heat treatment furnaces are normally loaded and unloaded by means of a so-called elevator. During unloading, a removed workpiece is usually lowered by means of the elevator into an oil bath, in which it is then removed from the elevator. Oil is then transferred into the furnace chamber via the oil-covered elevator. Such an application of oil is avoided by means of a device comprising a frame rack having a first and a second level, which are disposed parallel above each other, and are connected to each other by means of a plurality of frame braces, wherein the first and the second levels have a plurality of openings and the frame braces have guide means.
    Type: Application
    Filed: November 28, 2008
    Publication date: June 10, 2010
    Applicant: LOI Thermprocess GmbH
    Inventors: Friedhelm Kühn, Horst Barth, Wolfgang Schalberger
  • Publication number: 20100104402
    Abstract: Methods and apparatus provide for imparting a controlled supply of gas to at least one Bernoulli chuck to provide a balanced draw and repellant gas flow to a material sheet; and at least one of: elevating a temperature of the supply of gas to the at least one Bernoulli chuck such that the gas flow to the material sheet is provided at the elevated temperature providing a stream of gas to an insulator substrate to promote separation of an exfoliation layer from a donor semiconductor wafer, and providing a stream of gas to a junction of the insulator substrate and any support structure to promote separation of the insulator substrate and the supporting structure.
    Type: Application
    Filed: October 23, 2008
    Publication date: April 29, 2010
    Inventors: Michael Yoshiya Nishimoto, William Edward Lock
  • Publication number: 20100098517
    Abstract: A processing apparatus including: a carry-in area into which a container containing substrates to be processed is carried, the container having a flange part on an upper part thereof and an opening in a front surface thereof, with a lid being detachably fixed to the opening; a transfer area whose atmosphere is maintained differently from an atmosphere of the carry-in area; a partition wall separating the carry-in area and transfer area; a through-hole formed in the partition wall; a door configured to open and close the through-hole; and a table on which the container can be placed in the carry-in area. After the container has been placed and then held on the table, the container is brought into contact with the through-hole, the door and the lid are opened, and the substrates to be processed in the container are conveyed to the transfer area so as to process the substrates.
    Type: Application
    Filed: October 15, 2009
    Publication date: April 22, 2010
    Applicant: Tokyo Electron Limited
    Inventor: Katsuyuki HISHIYA
  • Publication number: 20100061828
    Abstract: The present invention is a processing apparatus comprising a transfer mechanism including at least one transfer plate, the transfer mechanism being configured to cause, when a substrate to be processed is placed on an upper surface of the transfer plate, the transfer plate to move while maintaining the substrate to be processed placed horizontally thereon. The transfer plate has a cantilevered support structure horizontally extending from a proximal end thereof to a distal end thereof in a fore and aft direction. An upper surface of the transfer plate is provided with a plurality of support projections configured to horizontally support the substrate to be processed at a substantially central position thereof and a rear position thereof in the fore and aft direction. The substrate to be processed is not supported on the distal portion of the transfer plate.
    Type: Application
    Filed: August 28, 2009
    Publication date: March 11, 2010
    Applicant: Tokyo Electron Limited
    Inventors: Satoshi ASARI, Kiichi Takahashi, Toshihiro Abe
  • Publication number: 20090257849
    Abstract: An apparatus and method for loading particulate material in a vertical tube comprising at least one impact-absorbing module, a central axis and a sustaining wire to position the apparatus suspended in the interior of the tube in such a way as to allow loading and uniform distribution of all the material loaded in the tube and the method of loading that uses the apparatus is also described.
    Type: Application
    Filed: April 14, 2009
    Publication date: October 15, 2009
    Applicant: PETROLEO BRASILEIRO S.A. - PETROBRAS
    Inventors: Francisco de Assis OLIVEIRA, Ricardo Lopes MATRICIANO
  • Patent number: 7597529
    Abstract: A method of charging a vertical tube having an internal diameter of 50 mm or less with catalyst particles, which comprises introducing a filling aid into the vertical tube, where the filling aid comprises a flexible elongated body and the ratio of the cross section of the flexible elongated body to the cross section of the tube is from 0.003 to 0.08, and introducing the catalyst particles into the tube.
    Type: Grant
    Filed: August 17, 2004
    Date of Patent: October 6, 2009
    Assignee: BASF Aktiengesellschaft
    Inventors: Volker Diehl, Steffen Rissel, Silke Berndt, Mark Duda, Knut Eger, Markus Hoelzle, Veron Nsunda
  • Publication number: 20090142162
    Abstract: The invention provides coating units, heat-treating units, and a first main transport mechanism for transporting substrates to each of these treating units. The substrates are transferred from the first main transport mechanism to a second main transport mechanism through a receiver. When a substrate cannot be placed on the receiver, this substrate is placed on a buffer. Thus, the first main transport mechanism can continue transporting other substrates. The other substrates in the treating units are transported between the treating units without delay, to receive a series of treatments including coating treatment and heat treatment as scheduled. This prevents lowering of the quality of treatment for forming film on the substrates.
    Type: Application
    Filed: November 26, 2008
    Publication date: June 4, 2009
    Applicant: SOKUDO CO., LTD.
    Inventors: Hiroyuki Ogura, Tsuyoshi Mitsuhashi, Yoshiteru Fukutomi, Kenya Morinishi, Yasuo Kawamatsu, Hiromichi Nagashima
  • Patent number: 7497985
    Abstract: To facilitate a trouble-free charging of scrap metal having differing constitutions, such as light and heavy scrap metal, from a lower discharge opening of a shaft-shaped charging device or a charging stock preheater (1) into a melting vessel by a pusher (13), the lateral surfaces of the pusher (13) are formed so as to converge from the upper side to the lower side and the actuating device (2) of the pusher (13) is pivotably supported in a frame structure (3) about a horizontal axis. In addition, the upper boundary of the discharge opening for the charging stock from the shaft (2) is preferably formed by a horizontal, rotatably supported roller (26), more preferably with engaging elements (30) distributed around the circumferential surface. Sections of the charging device that are severely mechanically stressed are preferably formed by steel billet sections connected to form a structural unit.
    Type: Grant
    Filed: November 25, 2004
    Date of Patent: March 3, 2009
    Assignee: Fuchs Technology AG
    Inventor: Gerhard Fuchs
  • Publication number: 20080292432
    Abstract: An airflow management system and/or method used in particle abatement in semiconductor manufacturing equipment. In particular, the apparatus disclosed is capable of creating and managing a carefully controlled particle free environment for the handling of semiconductor wafers or similar articles. The apparatus is particularly suited to be used as an interface between an equipment front end module (EFEM) and a vacuum loadlock chamber or other such article of process equipment. The apparatus also enables relative motion between enclosures while maintaining a particle free environment utilizing a moving air diffuser mounted to an interface panel.
    Type: Application
    Filed: May 22, 2007
    Publication date: November 27, 2008
    Inventors: James S. Castantini, Tent-Chao D. Tao, Erin M. Madden, Donald N. Polner
  • Publication number: 20080110809
    Abstract: A multifunctional handler system for electrical testing of semiconductor devices is provided. The multifunctional handler system comprises: (1) a semiconductor device processing section comprising a loading unit including a buffer, a sorting unit including a separate marking machine, and a unloading unit; (2) a semiconductor device testing section, separate from the semiconductor device processing section, comprises a test chamber, the test chamber is separated into two or more test spaces, and the test spaces of the test chamber include a second chamber positioned at a lower position, a first chamber positioned above the second chamber, and pipelines for connecting the first and second chambers to each other; and (3) a host computer which is independently connected to the semiconductor device processing section and the semiconductor device testing section and controls tray information, test results, marking information, and test program information.
    Type: Application
    Filed: November 9, 2007
    Publication date: May 15, 2008
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Seong-goo Kang, Jun-ho Lee, Ki-sang Kang, Hyun-seop Shim, Do-young Kam, Jae-il Lee, Ju-il Kang
  • Patent number: 7329947
    Abstract: When a two-division structure heat treatment jig for semiconductor substrate that includes a silicon first jig that comes into direct contact with a semiconductor substrate that is heat treated and supports the semiconductor substrate, and a second jig (holder) that holds the first jig and is mounted on a heat treatment boat is adopted as a heat treatment boat of a vertical heat treatment furnace, the stress concentrated during the heat treatment on a particular portion of the semiconductor substrate can be reduced; in the case of a semiconductor substrate large in the tare stress and having an outer shape of 300 mm being heat treated, or even in the case of the heat treatment being carried out under very high temperature conditions, the slips can be suppressed from occurring. The present invention can be widely applied as a stable heat treatment method of semiconductor substrates.
    Type: Grant
    Filed: January 5, 2004
    Date of Patent: February 12, 2008
    Assignee: Sumitomo Mitsubishi Silicon Corporation
    Inventors: Naoshi Adachi, Kazushi Yoshida, Yoshiro Aoki
  • Patent number: 7309201
    Abstract: Automation of the delivery of a particulate to a tube contained in a reformer type heater with vertical tubes is disclosed and includes a hopper having an opening at the lower end. A slide gate is mounted on the hopper and selectively projects over the opening in the hopper. A box mounted below the hopper. A primary ramp is mounted in the box and underlaps the opening in the hopper. The primary ramp has an angle of inclination and extends to a lower end of the box. The primary ramp also has a screen. A cone is connected to the box proximate to one end of the primary ramp and a tube is connected to the lower end of the cone for conveying particulate to a tube loading adaptor. A dust collection cone is connected to the box underlapping the primary ramp and a discharge port is connected to the lower end of the dust collection cone. The tube loading adaptor is positioned for connection to the tube in the reformer type heater with vertical tubes. A vibrator is connected to the box.
    Type: Grant
    Filed: December 21, 2006
    Date of Patent: December 18, 2007
    Assignee: Catalyst Services, Inc.
    Inventors: Michael D. McNaughton, Edmund Lowrie
  • Patent number: 6932559
    Abstract: A method of loading particulate catalytic material into a reactor tube and a loading apparatus for use in the method. The method comprises providing a loading tube through which catalyst particles pass in a damped motion. The damped motion is provided by mounting a spirally formed body on the inner wall of each loading tube section. The spirally formed body is formed from a rod having an arbitrarily shaped cross-section and a maximum dimension in any direction of the cross-section of 1/25-½ of the diameter of the loading tube section. The spirally formed body in each section has a pitch, with respect to the diameter of the loading tube section, in the interval of 2-8.
    Type: Grant
    Filed: July 12, 2002
    Date of Patent: August 23, 2005
    Assignee: Haldor Topsoe A/S
    Inventors: Michael Boe, Niels Erikstrup
  • Patent number: 6929719
    Abstract: The invention relates to a levelling bar for coking ovens, for levelling the cones of discharged coal which form under the filling holes of the oven chamber during the filling process. The levelling bar consists of two cheeks, such as plates (1), which extend essentially over the entire length of the ranged at a distance from each other depending on the width of the oven chamber, and parallel to each other. They are also interconnected and are essentially vertical. The levelling bar also has transversal coal carriers (2) which are arranged in the intermediate space delimited by the cheeks (1) at a mutual distance, one behind the other and which only extend over part of the cross-sectional surface of the levelling bar formed between he cheeks (1). The height (3) of the coal carriers (2), which take up the entire interval between the cheeks, is less than the height (H) of the cheeks (1) and the cheek form a gas channel (6) above the coal carriers (2) which is essentially free of built-in components.
    Type: Grant
    Filed: July 2, 1999
    Date of Patent: August 16, 2005
    Assignee: DMT Deutsche Montan Technologie GmbH
    Inventors: Hans-Josef Giertz, Jürgen George, Klaus-Dieter Ruthemann
  • Patent number: 6905660
    Abstract: There is provided a method for loading solid particles into a multi-tube reactor having an upper tube-sheet holding together the upper ends of the multitude of reactor tubes, the method comprising positioning a loading device having a plurality of holes on top of the upper tube-sheet such that the loading device rests on and substantially covers the upper tube-sheet and the holes correspond to the reactor tubes, the loading device comprising a plurality of adjacent polygonal plates, each polygonal plate having from 1 to 30 holes, each hole corresponding to one reactor tube; pouring the particles over the combined polygonal plates covering the tube-sheet; sweeping the particles through the holes in the plates into the respective reactor tubes; removing residual particles and any dust remaining on and between the plates; and removing the loading device.
    Type: Grant
    Filed: March 29, 2002
    Date of Patent: June 14, 2005
    Assignee: Cat Tech, Inc.
    Inventors: Jamie Stewart Harper, Karl Barry Thew
  • Patent number: 6786974
    Abstract: Both of a first insulating film and a second insulating film are formed by a spin coating method. Accordingly, the formation of the first insulating film and the second insulating film can be performed in the same SOD processing system. Moreover, the aforesaid formation of both of the first insulating film and the second insulating film by the spin coating method can provide favorable low dielectric constant properties and good adhesion of the first insulating film and the second insulating film.
    Type: Grant
    Filed: March 17, 2003
    Date of Patent: September 7, 2004
    Assignee: Tokyo Electron Limited
    Inventors: Takayuki Komiya, Shinji Nagashima, Shigeyoshi Kojima
  • Publication number: 20040076495
    Abstract: The invention is an improved reflow tool for performing a reflow process on a wafer. An input robot may be used to transport wafers from an input carrier to an oven where a reflow process is performed. After processing the wafers in the oven, the wafers are transported to a storage carrier. In a preferred embodiment, the storage carrier includes a plurality of left and right slats that use chamfer tabs and centering tabs to precisely position the wafer as the wafer is loaded into the storage carrier. The storage carrier may be part of a buffer indexer that also includes an actuator for vertically positioning the storage carrier. An output robot may be used to sequentially remove the wafers from the storage carrier and to place the wafers in an output carrier. In another preferred embodiment, the power from a main power supply to the reflow tool is monitored and an uninterruptible power supply is used to power the oven and buffer indexer if power is lost.
    Type: Application
    Filed: October 21, 2002
    Publication date: April 22, 2004
    Inventors: Robert D. Henderson, Xan D. Henderson
  • Patent number: 6694802
    Abstract: A multi-tube differential pressure testing system for testing catalyst filled tubes of tube and shell type catalytic reactors having an upper tube sheet and multiple catalyst tubes having upper ends thereof fixed to the upper tube sheet. The system has at least one mobile support device for selective positioning on the upper tube sheet of a catalytic reactor. A plurality of testing tubes are mounted to the mobile support device and are selectively positionable in sealed gas pressure communicating engagement with the upper ends of a plurality of reactor tubes. A pressure testing gas delivery system is interconnected with the testing tubes and is adapted for communicating pressurized gas at a selected test pressure to the testing tubes and into the reactor tubes being engaged thereby.
    Type: Grant
    Filed: September 21, 2001
    Date of Patent: February 24, 2004
    Inventor: Mathis P. Comardo
  • Patent number: 6663332
    Abstract: Installation for treatment of wafers in a reactor. To that end a series of wafers is placed in a wafer rack and fed into the reactor. Transport into and out of the reactor, which is sited in an enclosed chamber, takes place with the aid of conveyor means. The wafers are transferred from the wafer rack to one or more cassettes. During this operation the wafer rack is always in the vertical position, that is to say the wafers are horizontal. The same preferably also applies to the cassettes, so that the wafers remain horizontal throughout the entire process.
    Type: Grant
    Filed: October 10, 2000
    Date of Patent: December 16, 2003
    Assignee: ASM International N.V.
    Inventors: Boudewijn Gijsbert Sluijk, Christianus Gerardus Maria De Ridder
  • Patent number: 6565304
    Abstract: An apparatus for assisting the loading of a plurality of wafer boats into a multi-level wafer boat loading system (1) includes a vertical elevator mechanism (10) attached to the wafer boat loading system (1). A vertically movable horizontal wafer boat platform (18B) is attached to a vertically movable carriage (31) included in the elevator mechanism and vertically movable along a linear track (30) therein. A control system (25) associated with the vertical elevator mechanism includes a processor for executing a stored program which stores information representing a plurality of elevation levels the plurality of cantilever paddles (5), respectively, and which responds to a selection signal corresponding to manual selection of one of the elevator levels to control a drive mechanism (22,27) which moves the wafer boat support platform (18B) from an initial position to the selected elevator level.
    Type: Grant
    Filed: May 16, 2001
    Date of Patent: May 20, 2003
    Assignee: Amtech Systems, Incorporated
    Inventors: John M. Martin, Arthur W. Harrison, Allen D. Edwards
  • Patent number: 6543980
    Abstract: A teaching tool for a robot arm for wafer reaction ovens is provided to anchor the robot arm with respect to a tray located inside a reaction oven. The teaching tool provides an upper flange for maintaining a spacing between a handle of the robot arm and a door of the oven, a position width for keeping the teaching tool aligning with a center line of the tray, and a lower tunnel aligning with the center line for allowing a blade of the robot arm to contact closely and horizontally from a lower position and thus for maintaining a position height between the blade and a floor of the reaction oven. By providing the teaching tool, easy blind calibration with multiple contact points between the robot arm and the oven can be performed so that possible efficiency down and cost up from an ill-calibration can be reduced to a minimum.
    Type: Grant
    Filed: May 24, 2001
    Date of Patent: April 8, 2003
    Assignee: Mosel Vitelic Inc.
    Inventors: Hsien Hsiang Lin, Thanku Shieh, Wen-Ching Wu, Hsiao-Ping Hsieh