Silicon Containing Patents (Class 420/490)
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Patent number: 5759578Abstract: The present invention is directed to a macrocapsule for encapsulating microcapsules containing biologically active material, such as living cells or free living cells, to make the system more biocompatible by decreasing the surface area and surface roughness of microencapsulated biological materials; increasing mechanical stability of microencapsulated biological materials; enhancing cytoprotectivity by increasing diffusion distance of encapsulated biological material from cytotoxins secreted in vivo; providing retrievability of microencapsulated material; and providing a system of sustained release of the cellular products. The method for producing such a macrocapsule containing the microcapsules is also disclosed.Type: GrantFiled: May 23, 1996Date of Patent: June 2, 1998Assignee: Vivorx, Inc.Inventors: Patrick Soon-Shiong, Neil P. Desai, Roswitha E. Heintz
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Patent number: 5705125Abstract: A wire for electric railways comprises a copper alloy which consists essentially, by weight percent, of 0.1 to 1.0% Cr, 0.01 to 0.3% Zr, 0.05 to 0.15% Sn, and 10 ppm or less O, and if required, further contains 0.01 to 0.1% Si, or 0.01 to 0.1% Si and 0.001 to 0.05% Mg, with the balance being Cu and inevitable impurities.Type: GrantFiled: November 22, 1994Date of Patent: January 6, 1998Assignees: Mitsubishi Materials Corporation, Railway Technical Research InstituteInventors: Motoo Goto, Shizuo Kawakita, Yoshiharu Mae, Takuro Iwamura, Yutaka Koshiba, Kenji Yajima, Syunji Ishibashi, Hiroki Nagasawa, Atsushi Sugahara, Sumihisa Aoki, Haruhiko Asao
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Patent number: 5516484Abstract: A copper-nickel based alloy, having reduced break-out during casting and reduced cracking during processing in solid state, which consists essentially of 3.1 to 25 wt. % of Ni, 0.1 to 1.5 wt. % of Mn, 0.0001 to 0.0093 wt. % of B, 0.01 to 0.7 wt. % of Si, and from 3 to 10 wt. % of Sn and the remainder being Cu and unavoidable elements.Type: GrantFiled: February 7, 1995Date of Patent: May 14, 1996Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Kenji Kubosono, Iwao Asamizu, Masazumi Iwase, Toshihiro Kurita
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Patent number: 5441696Abstract: A copper-nickel based alloy, which comprises 3 to 25 wt % of Ni, 0.1 to 1.5 t % of Mn, 0.0001 to 0.01 wt % of B and the rest being Cu and an unavoidable element.Type: GrantFiled: June 26, 1992Date of Patent: August 15, 1995Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Kenji Kubosono, Iwao Asamizu, Masazumi Iwase, Toshihiro Kurita
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Patent number: 5296057Abstract: The object of the present invention is to provide an abrasion resistant aluminum bronze alloy for sliding members of various industrial machines.The abrasion resistant aluminum bronze alloy consists of Al: 7-12%, Mn: 1.5-5.5%, Si: 0.45-2.7%, respectively in weight, and the rest is substantially Cu, wherein metallic compound of Mn and Si is dispersed among said alloy structure, and elongation percentage is at least 5%.The abrasion resistant aluminum bronze alloy is superior to conventional aluminum bronze alloy (JIS-ALBC2) in seizure resistance and abrasion resistance by more than two times.Type: GrantFiled: September 21, 1992Date of Patent: March 22, 1994Assignee: Hitachi, Ltd.Inventors: Noboru Baba, Katsuhiko Komuro, Masateru Suwa, Mitsuo Chigasaki, Yozo Kumagai, Mashayoshi Kainuma, Masaru Sakakura
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Patent number: 5286444Abstract: Copper bearing alloy comprises more than 4% by weight and up to 35% by weight of Bi, 0.2 to less than 1.5% by weight of Pb and the rest of Cu. This considerably improves the erosion resistance while maintaining the excellent seizure resistance and fatigue strength.Type: GrantFiled: June 18, 1992Date of Patent: February 15, 1994Assignee: Taiho Kogyo Co., Ltd.Inventors: Takashi Tomikawa, Yoshio Kumada
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Patent number: 5246509Abstract: A copper base alloy suitable for use as a material of a sliding member, superior in seizure resistance, wear resistance and corrosion resistance. The alloy comprises 1.0 to 3.5 wt % Mn, 0.3 to 1.5 wt % Si, 11.5 to 25 wt % Zn, 5 to 18 wt % Pb and the balance substantially Cu and incidental impurities, the lead being uniformly distributed through the structure of the alloy. The alloy has a microstructure of which matrix is composed of .alpha.-phase alone. The alloy can further contain at least one selected from the group consisting of 0.02 to 1.5 wt % Mg and 0.1 to 1.5 wt % Te and/or at least one selected from the group consisting of 0.5 to 3.0 wt % Ni and 0.3 to 3.0 wt % Al.Type: GrantFiled: July 21, 1992Date of Patent: September 21, 1993Assignee: Daido Metal Company Ltd.Inventors: Tohru Kato, Tadashi Tanaka, Masaaki Sakamoto, Koichi Yamamoto
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Patent number: 5215711Abstract: An age-hardening type special Cu alloy prepared by compounding 0.1 to 5% by weight of Ni, 0.01 to 7% by weight of Si, 0.01 to 10% by weight of Fe, 0.01 to 7% by weight of Ti and 0.001 to 1% by weight of B in Cu as the main component.This alloy is improved in the electrical conductivity, heat-conductivity and mechanical properties such as, in particular, the hardness and resiliency compared to the hitherto known alloys, and is useful for electronic parts.Type: GrantFiled: April 6, 1992Date of Patent: June 1, 1993Inventor: Tsuneaki Mikawa
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Patent number: 5188799Abstract: A wear-resistant copper-base alloy having superior self-lubricity includes, by weight %,Ni: 10.0 to 30.0%;Si: 0.5 to 3%;Co: 2.0 to 15.0%;at least one metal selected from the group consisting of Mo, W, Nb and V:2.0 to 15.0%; andthe balance being Cu and unavoidable impurities, and having a structure in which hard phase grains containing 5 vol% or more of silicide of at least one metal selected from the group consisting of Mo, W, Nb and V are uniformly dispersed in an amount of 10 to 60 vol% in a copper-rich matrix, to which 2.0 to 15.0% of Fe and/or 1.0 to 10.0% of Cr may be further added.Type: GrantFiled: March 19, 1992Date of Patent: February 23, 1993Assignees: Toyota Jidosha Kabushiki Kaisha, Kabushiki Kaisha Toyota Chuo KenkyushoInventors: Kazuhiko Mori, Minoru Kawasaki, Shin Yoshida, Hiroyuki Murase, Takashi Saito, Kouji Tanaka, Yoshio Shimura
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Patent number: 5132083Abstract: A laser padding material in accordance with the present invention comprises copper as its main component and at least one, as other contained elements, selected from the group consisting of 1-5 weight % of nickel (Ni), 0.2-5 weight % of silicon (Si), less than 1 weight % of boron (B), less than 2 weight % of phosphorus (P) and less than 3 weight % of manganese (Mn), whereby there can be easily formed at a high speed a padded layer which is high both in sliding friction resistance and in quality.In accordance with a laser padding method of the present invention, since material powder having such a composition as mentioned above is blown onto a metal base material and at the same time a laser beam is irradiated thereon in an inert gas atmosphere to thereby melt the material powder and form a padded layer, there can be easily formed at a high speed a padded layer which is high both in sliding friction resistance and in quality.Type: GrantFiled: January 19, 1990Date of Patent: July 21, 1992Assignee: Kabushiki Kaisha Komatsu SeisakushoInventors: Toshihide Takeda, Kazuo Okamura
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Patent number: 5024815Abstract: A copper alloy comprising:(A) 0.15-1.0 wt % Fe,(B) 0.05-0.3 wt % P, and(C)(1) 0.01-0.1 wt % Ni and 0.01-0.05 wt % Si or(2) 0.01-0.1 wt % Ni and 0.005-0.05 wt % b or(3) 0.05-0.3 wt % Mg and 0.05-0.3 wt % Pb or(4) 0.01-0.1 wt % Mn and 0.005-0.05 wt % Si,with the balance being essentially composed of Cu.Type: GrantFiled: May 24, 1989Date of Patent: June 18, 1991Assignee: Yazaki CorporationInventors: Yasusuke Ohashi, Toshihiro Fujino, Yasuhito Taki, Tamotsu Nishijima
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Patent number: 4971758Abstract: A copper-based alloy connector excellent in electrical conductivity, adherence of solder of the connector when bent, high-temperature creep strength, and migration resistance, consists essentially by weight percent of 0.5 to 3% Ni, 0.1 to 0.9% Sn, 0.08 to 0.8% Si, 0.1 to 3% Zn, 0.007 to 0.25% Fe, 0.001 to 0.2% P, and the balance of Cu and inevitable impurities. The copper-based alloy connector can withstand use for a long term in a high-temperature and high-humidity environment.Type: GrantFiled: April 18, 1990Date of Patent: November 20, 1990Assignee: Mitsubishi Shindoh Co., Ltd.Inventors: Takeshi Suzuki, Tadao Sakakibara, Seiji Noguchi, Takao Fukatami
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Patent number: 4886641Abstract: A novel electrical contact spring material made of a copper base alloy is disclosed. This spring material has high strength and toughness, as well as good adhesion of solder. It also has reduced anisotropy in its characteristics in two directions, i.e., the working direction and the direction perpendicular to it. A very thin-walled member can be produced from this spring material since its anisotropy in characteristics is small and will not increase even if the amount of working is increased.The copper base alloy of which this spring material is made consists essentially of 2.2-5% Ti, 0.1-0.8% Co, 0.02-0.5% Cr, 0-0.6% of Ni and/or Fe, 0-0.5% of at least one of Ca, Mg, Zn, Cd, Li, Zr, Si, Mn, Sn and Al, and the balance being Cu and incidental impurities.Type: GrantFiled: April 20, 1988Date of Patent: December 12, 1989Assignee: Mitsubishi Kinzoku Kabushiki KaishaInventors: Takuro Iwamura, Masao Kobayashi
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Patent number: 4853184Abstract: The invention relates to contact material for vacuum interrupter, and in order to be splendid in the breakdown voltage ability and increase the interrupting ability, a contact material is constituted by containing copper and chromium, and moreover adding one component selected from silicon, titanium, zirconium and aluminum as another component, and is used in a vacuum interrupter.Type: GrantFiled: December 16, 1985Date of Patent: August 1, 1989Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Naya Eizo, Nagata Yoshikazu, Horiuchi Toshiaki, Okumura Mitsuhiro, Demizu Michinosuke, Harima Mitsuhiro, Asakawa Shigeki, Asakawa Masuo
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Patent number: 4810468Abstract: The invention relates to a copper-chromium-titanium-silicon-alloy, which consists essentially of 0.10 to 0.50% chromiun; 0.01 to 0.25% titanium; silicon; the remainder being copper and the usual impurities, wherein the silicon content (a) is more than 0.1-times of the titanium content, (b) when the titanium content is up to 0.099% the silicon content is limited by the equation:Silicon content (%)=0.05%+0.5 titanium content (%),and (c) when the titanium content is more than 0.099%, the silicon content is limited by the equation:silicon (%)=0.149%-0.5% titanium content (%).Because of its excellent properties, the alloy is used as a material for electronic components, in particular semiconductor carriers for transistors, integrated circuits or the like, for plug connectors and parts for electrical systems for cars.Type: GrantFiled: October 2, 1987Date of Patent: March 7, 1989Assignee: Wieland-Werke AGInventors: Wolfgang Duerrschnabel, Franz Puckert, Max Bletschacher
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Patent number: 4791036Abstract: This invention pertains to an anode current collector for alkaline electrochemical cells having zinc anodes. An anode current collector made from silicon bronze alloy has improved welding characteristics and has a minimal effect on gassing.Type: GrantFiled: January 11, 1988Date of Patent: December 13, 1988Assignee: Duracell Inc.Inventors: David J. Schrenk, Patrick E. Murphy
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Patent number: 4751049Abstract: Connectors which are essentially, by weight, 85% to 93% copper, with silicon in the amount of 1.5% to 2.5% is disclosed. The balance of the material is zinc, desirably in the range of 5% to 12%. Trace elements of tin, lead and aluminum can be tolerated but should be minimized to less than 0.05%. Ideally the material is 81% to 91% copper, 1.75% to 2.4% silicon and the balance zinc of 6% to 10%. The traces may be 0.05% tin, 0.01% lead, and 0.005% aluminum.Type: GrantFiled: May 6, 1987Date of Patent: June 14, 1988Inventor: John K. Shannon
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Patent number: 4732874Abstract: Rapid thermal annealing, involving rapid heating to a temperature of between 550 degrees C. and 750 degree C. for between 30 and 90 seconds and rapid cooling, is used to dissolve the precipitates of transition metals which tend to occur in a silicon wafer and to keep such metals in solution after cooling. Such annealing can be used in the manufacture of bipolar transistors to limit the emitter-collector shorting caused by metallic precipitates. It is also useful more generally to improve the leakage current of p-n junctions either in diodes or as parts of bipolar or field-effect transistors.Type: GrantFiled: October 15, 1986Date of Patent: March 22, 1988Assignee: Delco Electronics CorporationInventor: Douglas R. Sparks
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Patent number: 4678637Abstract: The invention relates to a copper-chromium-titanium-silicon alloy which consists of 0.1 to 0.5% chromium, 0.05 to 0.5% titanium and 0.01 to 0.1% silicon, the remainder comprising copper and usual impurities. Because of its excellent properties as regards electrical and thermal conductivity, mechanical strength, resistance to softening, homogeneity and flexibility, the alloy is employed as a material for electronic components, in particular semiconductor carriers for transistors, integrated circuits or the like, and parts for electrical systems for cars.Type: GrantFiled: July 9, 1986Date of Patent: July 7, 1987Assignee: Weiland-Werke AGInventors: Wolfgang Duerrschnabel, Franz Puckert, Heinrich Stueer, Max Bletschacher
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Patent number: 4642146Abstract: A copper base alloy capable of forming a microstructure comprising a plurality of discrete particles in a surrounding metal matrix having a lower melting point than the particles. The alloy consists essentially of from about 3% to about 6% nickel, from about 2% to about 4.25% aluminum, from about 0.25% to about 1.2% silicon, from about 5% to about 15% zinc, up to about 5% iron and the balance essentially copper. When iron is included in an amount from about 3% to about 5% and zinc is restricted to a range of from about 8% to about 10%, the alloy is capable of forming the desired structure in the as-cast condition using a process which does not include stirring during casting.Type: GrantFiled: October 11, 1985Date of Patent: February 10, 1987Assignee: Olin CorporationInventors: Sankaranarayanan Ashok, John F. Breedis
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Patent number: 4624833Abstract: A liquid metal ion source for emitting P ions, wherein a Cu alloy which contains at most 25 at. % of P and if necessary, further contains Ag, C or Si, and/or B is melted and fed to an emitter tip so as to generate an ion beam under a high electric field.Type: GrantFiled: November 26, 1984Date of Patent: November 25, 1986Assignee: Hitachi, Ltd.Inventors: Kaoru Umemura, Tohru Ishitani, Toshiyuki Aida, Hifumi Tamura
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Patent number: 4612166Abstract: The present invention relates to copper-silicon-tin alloys having improved cleanability. These alloys consist essentially of from about 1.0% to about 5.0% tin, from about 1.0% to about 4.5% silicon, an element selected from the group consisting of from about 0.05% to about 0.5% magnesium and from about 0.01% to about 0.5% lithium, and the balance essentially copper. The alloys may also contain from about 0.01% to about 0.45% chromium.Type: GrantFiled: October 15, 1985Date of Patent: September 16, 1986Assignee: Olin CorporationInventors: Andrew J. Brock, Edward F. Smith, Eugene Shapiro
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Patent number: 4594221Abstract: A multipurpose copper base alloy having an improved combination of ultimate tensile strength and electrical conductivity. The alloy can be tailored for applications such as in connectors or leadframes by processing. The alloy may be processed to provide improved bead formability at some sacrifice in strength. The alloy in the stabilized condition shows surprising improvement in stress relaxation resistance. The alloy comprises a Cu-Ni-Si alloy to which about 0.05 to about 0.45% by weight magnesium is added.Type: GrantFiled: April 26, 1985Date of Patent: June 10, 1986Assignee: Olin CorporationInventors: Ronald N. Caron, John F. Breedis
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Patent number: 4587097Abstract: A metal alloy consisting essentially of about 4-16 atom percent manganese, 4-16 atom percent silicon, 0-16 atom percent tin, 0-20 atom percent zinc, 0-10 atom percent silver and about 0-10 atom percent indium, the balance being copper and incidental impurities. The alloy is adapted for brazing steels, cemented carbides to steels, copper and copper alloys to steels, copper to copper and copper alloys, and composite materials to steels and copper.Type: GrantFiled: June 22, 1984Date of Patent: May 6, 1986Assignee: Allied CorporationInventors: Anatol Rabinkin, Amitava Datta
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Patent number: 4517157Abstract: A brazing alloy having a composition consisting essentially of from about 1% to about 3% by weight boron, from about 8% to about 12% by weight silicon, and the balance copper is beneficial in brazing stainless steels and other ferrous metals.Type: GrantFiled: October 11, 1984Date of Patent: May 14, 1985Assignee: GTE Products CorporationInventor: Brian C. Coad
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Patent number: 4465511Abstract: NbSn.sub.2 is made by passing NbCl.sub.5 volatilized in an argon stream at 550.degree. C. to liquid tin. The product precipitates as a solid, while the tin chloride by product is carried away by the argon. Nb.sub.6 Sn.sub.5 is made from this NbSn.sub.2 by reacting it with more niobium halide vapor. NbSn.sub.2 or Nb.sub.6 Sn.sub.5 are useful intermediates in making the Al5-structure superconductor Nb.sub.3 Sn.Type: GrantFiled: November 15, 1983Date of Patent: August 14, 1984Assignee: National Research Development CorporationInventors: Frank R. Sale, Huseyin Yorucu
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Patent number: 4416853Abstract: A Cu-Ag alloy brazing filler material with low Ag content that exhibits excellent brazability and has a low vapor pressure is disclosed. The filler material comprises 5 to 35% by weight of Ag, 2.5 to 13% by weight of Si, with the balance being Cu and incidental impurities. The properties of the filler material can be improved further by addition of at least one element selected from the group consisting of Sn, In, Fe, Ni, Co, B and Li.Type: GrantFiled: April 16, 1982Date of Patent: November 22, 1983Assignee: Mitsubishi Kinzoku Kabushiki KaishaInventors: Masaki Morikawa, Hideaki Yoshida, Kunio Kishida, Chuji Tanaka
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Patent number: 4366117Abstract: A copper alloy for use as a lead material for semiconductor devices, which comprises 0.04-1.0% Ni, 0.01-0.3% Si, and 0.05-15% Zn, all by weight, and the remainder Cu and inevitable impurities. The alloy may contain, in addition to these, a total amount of 0.001-1.0% by weight of one or two or more elements as an accessory ingredient or ingredients selected from the group consisting of 0.001-0.1% by weight each of P and As and 0.01-0.5% by weight each of Ti, Cr, Sn, Mn, and Mg.Type: GrantFiled: June 3, 1981Date of Patent: December 28, 1982Assignee: Nikon Kogyo Kabushiki KaishaInventor: Masahiro Tsuji