Abstract: The invention concerns a method which consists in a process known per se in producing, on the curved substrate (10) to be treated, a film of material derived from a specific material source (13). The invention is characterized in that it consists in inserting, between the curved substrate (10) and the material source (13), a mask (19) relative to the curved substrate (10), preferably selecting as mask (19), a mask comprising a ring-shaped part (20). The invention is particularly useful for providing lenses with antiglare treatment.

Abstract: This invention relates to antisoiling compositions for antireflective substrates. More particularly, this invention relates to methods for depositing antisoiling compositions onto antireflective substrates. In particular, this invention relates to a method of depositing an antisoiling composition on an antireflective substrate comprising vaporizing an antisoiling composition and depositing the antisoiling composition onto an antireflective substrate. In another aspect, this invention relates to method of preparing an antireflective film stack comprising depositing an antireflective layer onto the surface of a transparent substrate and vapor depositing an antisoiling layer onto the surface of the antireflective layer. In yet another aspect, this invention relates to a method of depositing an antisoiling composition on an antireflective coated ophthalmic lens comprising vaporizing an antisoiling composition and depositing the antisoiling composition onto an antireflective coated ophthalmic lens.

Abstract: A lens including a lens substrate, a surface layer, and a backing member provided beneath the surface layer, in which the backing member may be either the same as the lens substrate or a separate layer from the lens substrate, and wherein the surface layer includes a hydrolysis-condensation product of a perfluoropolyether modified silane with a hydrolysable functional group or a halogen atom X at both terminals, represented by a general formula (1) shown below: (wherein, Rf is a bivalent group with a straight chain perfluoropolyether structure containing no branching, which incorporates a unit represented by a formula —(CkF2kO)— (wherein, k represents an integer from 1 to 6)) is resistant to the adhesion of contaminants to the surface thereof, can be easily wiped to remove any adhered contaminants, provides a slippery surface that is difficult to scratch, and moreover displays excellent durability and is capable of retaining the above properties over extended periods.

Abstract: A process for the production of a heat-treatable low emissivity coated glass that comprises the steps of depositing an underlayer onto a glass substrate and subsequently depositing a reflective metal layer by a vacuum deposition process, wherein the underlayer is deposited by a pyrolytic deposition process. Preferably an anti-reflection layer is deposited by a vacuum deposition process on to the coated glass after deposition of the reflective metal layer. The underlayer may comprise a silicon oxide, the reflective metal layer may comprise silver and the anti-reflection layer may comprise a metal oxide, especially tin oxide or zinc oxide. The coated glass preferably has an emissivity of below 0.2 after heat treatment in an oxidising atmosphere.

Abstract: Optical components may be made with reflectors that increase the reflectivity of the resulting device. Increasing in the reflectivity may reduce the need for higher power light sources. In particular, the use of deposited silver layers may dramatically increase the reflectivity compared to aluminum and copper alloys. In addition, an absorptive layer may be positioned over the reflective layer to reduce the amount of blue light output from the reflector. This blue light absorber may be used to automatically rebalance light sources that produce an excessive proportion of blue light.

Abstract: A method for treating a non-planar surface of an object by employing a plasma treatment apparatus in which a microwave dielectric has a non-planar surface corresponding to the surface of the object. A method for forming an optical part is also provided.

Abstract: A method and apparatus for producing an information carrier which has at least two solid material interfaces at which information is, or may be applied and where the information is stored by local modulation of at least one characteristic of the solid material. Reflection of electromagnetic radiation at the interface depends on this characteristic. The method and apparatus applies at least one intermediate layer between the two solid material interfaces. The intermediate layer transmits the radiation and is at least predominantly made of either SixCy or SivNw, or both.

Abstract: To deposit optical quality films by PECVD (Plasma Enhanced Chemical Vapor Deposition), a six-dimensional space wherein five dimensions thereof correspond to five respective independent variables of which a set of four independent variables relate to the flow-rate of respective gases, a fifth independent variable relates to total pressure, and a six dimension relates to observed FTIR characteristics is first created. Then an optical film is deposited while maintaining three of the set of four independent variables substantially constant as well as the fifth independent variable, and varying a fourth of the set of four independent variables to obtain desired characteristics in the sixth dimension.

Abstract: An antiglare film applicable to polarizers or displays includes a light-transparent resin, first light-transparent particles dispersed on surface of the light-transparent resin and second light-transparent particles dispersed inside the resin. The first light-transparent particles have a same refractive index as that of the resin and particle diameters of 9 to 500 nanometers that provide a less roughness surface of the resin in order to prevent from large angle diffusion to the interior light and improve clarity of image. The second particles have a different refractive index from the resin so as to diffuse the exterior light that comes to the antiglare film so as to decrease glare. The antiglare film can be made by one time of coating. The two layer light-transparent particles provide light interference and achieve a low reflectivity.

Abstract: The subject of the invention is a glass-, ceramic- or vitroceramic-based substrate (1) provided on at least part of at least one of its faces with a coating (3) with a photocatalytic property containing at least partially crystalline titanium oxide. It also relates to the applications of such a substrate and to its method of preparation.

Abstract: A method provides high-vacuum vapor coating methods, with the methods producing novel coating compositions with surprisingly increased performance levels over coatings produced from the same materials under different processing conditions. Compounds of the general formulae II, III and IV, defined herein, can be applied by vapor deposition from a merely compacted, rather than fused or sintered porous matrix source with improved performance, even where the same chemicals are used in the coating, at the same coating temperatures. The generally useful materials include silanes and siloxanes, and siloxazanes of formulae I, II, III and IV.

Abstract: A method for forming an optical thin film used for optical elements of laser systems including high-energy lasers and an optical element of optical apparatuses is provided. The optical thin film can be easily formed on a desired substrate with reproducibility by vapor-depositing a porous fluoride layer for preventing reflection in the deep ultraviolet region, and can be easily removed in a short time to reuse the substrate if the thin film damaged. A water-insoluble material (2) for preventing reflection is vapor-deposited onto an optical element substrate (1). A water-soluble material (3) having a higher particle energy is vapor-deposited onto the surface of the water-insoluble material (2). The water-soluble material (3) permeates deep into the water-insoluble material (2) to form a mixed film on the surface of the substrate (1). Then, the water-soluble material (3) is dissolved and removed to form a porous thin film (5) comprising the water-insoluble material (2).

Abstract: A membrane structure comprising a silicon film having a grain structure including grains defining pores therebetween.

Abstract: A method is disclosed for depositing an optical quality silica film on a wafer by PECVD. The flows rates for a raw material gas, an oxidation gas, a carrier gas, and a dopant gas are first set at predetermined levels. The total deposition pressure is set at a predetermined level. The deposited film is then subjected to a post deposition heat treatment at a temperature selected to optimize the mechanical properties without affecting the optical properties. Finally, the observed FTIR characteristics of the deposited film are monitored to produce a film having the desired optical and mechanical properties. This technique permits the production of high quality optical films with reduced stress.

Abstract: A high-reflectance silver mirror has a high-reflectance film comprising a silver layer formed on a base material made of phosphorus-containing glass. The high-reflectance film is formed by a wet film-forming process on an acid-resistant protection film covering the base material. A reflecting optical element employing the high-reflectance silver mirror, and a process for producing the high-reflectance silver mirror are also provided. The high-reflectance silver mirror is producible at a reduced cost and has improved reflectivity.

Abstract: Substrates have anti-reflective hydrophobic surface coatings comprised of the reaction products of a vapor-deposited chlorosilyl group containing compound and a vapor-deposited alkylsilane. Most preferably the substrate is glass. In one preferred form of the invention, highly durable antireflective hydrophobic coatings may be provided by forming a silicon oxide anchor layer from a humidified reaction product of silicon tetrachloride, followed by the vapor-deposition of a chloroalkylsilane, preferably dimethyldichlorosilane (DMDCS). The layer thickensses of the anchor layer and the overlayer are such that the coating exhibits light reflectance of less than about 1.5% (more preferably less than about 1.0%) at a wavelength of about 525 nm (+/−50 nm).

Abstract: Solid phase methods for the identification of an analyte in a biological medium, such as a body fluid, using bioluminescence are provided. A chip designed for performing the method and detecting the bioluminescence is also provided. Methods employing biomineralization for depositing silicon on a matrix support are also provided. A synthetic synapse is also provided.

Abstract: Within a chamber in a vacuum atmosphere, SiO is deposited on a glass substrate so as to form a first layer as a protective film, Al is deposited on the first layer so as to form a second layer as an aluminum reflective film, MgF2 is deposited on the second layer so as to form a third layer as a transparent protective film, and CeO2 is deposited on the third layer so as to form a fourth layer as a transparent protective film. Then, while O2 gas is introduced into the chamber, SiO2 is deposited on the fourth layer so as to form a fifth layer as a transparent protective film.

Abstract: A heat treatable coated article includes an anti-migration or barrier layer(s) provided between a solar management layer (e.g., NiCr layer) and a dielectric layer (e.g., silicon nitride). In certain example embodiments, the anti-migration or barrier layer(s) may include a metal oxide, and functions to prevent element(s) from migrating between the solar management layer and the dielectric layer upon heat treatment (HT) of the coated article. As a result, the coated article has improved color stability (and thus a lower &Dgr;E* value) upon HT. For example, the coated article may have a &Dgr;E* value (transmissive and/or glass side reflective) upon HT of no greater than 5.0, more preferably no greater than 4.0. Coated articles herein may be used in the context of insulating glass (IG) window units, other architectural windows, vehicle windows, or the like.

Abstract: A heat processable coated article suitable for tempering and/or bending which has metallic properties is prepared by coating a glass substrate. The substrate has deposited over it a stabilizing film and a metal-containing film is deposited over the stabilizing film. Also an overcoating with a protective layer of a silicon compound is deposited over the metal-containing film and forms a durable layer and prevents oxidation of the underlying metal-containing film. The coated article can be tempered and/or bent without losing its metallic properties to oxidation.

Abstract: A thin film layer can be formed on a glass substrate by preheating the substrate, depositing an amorphous silicon precursor layer on the substrate at a first temperature, and annealing the substrate in a thermal processing chamber at a second temperature sufficiently higher than the first temperature to substantially reduce the hydrogen concentration in the precursor layer. The preheating and annealing steps can occur in the same thermal processing chamber. Then the precursor layer is converted to a polycrystaline silicon layer by laser annealing.

Abstract: An method, and method of production thereof, which provides excellent performance, reduced cost, and reduced breakage due to reduced manual handling. The present invention comprises a substrate, a bond layer coating the substrate, a reflective layer coating the bond layer, and a radiative layer coating the reflective layer. Preferably, the radiative layer comprises SiO2, Si3N4 or SiOxNy, low absorbency of electromagnetic radiation having wavelengths of approximately 200 nm to approximately 2500 nm and high absorbency and emissivity electromagnetic radiation having wavelengths of approximately 2.5 &mgr;m to approximately 25 &mgr;m. Preferably, the bond layer comprises chromium, titanium, or titanium-tungsten and the substrate comprises aluminum, aluminum alloys, polyimide, carbon-filled polyimide, or carbon composite.

Abstract: Changes in the infrared reflection spectrum of a thin film of silica-like resinous material sandwiched between metal electrodes can be induced by applying an electric potential to a top electrode which is semitransparent. Characteristic infrared absorption lines change in proportion to a small electric current flowing through the material. These changes occur with response times of the order of seconds, and show time constants of the order of minutes to reach stationary values.

Abstract: Within a chamber in a vacuum atmosphere, SiO is deposited on a glass substrate so as to form a first layer as a protective film, Al is deposited on the first layer so as to form a second layer as an aluminum reflective film, MgF2 is deposited on the second layer so as to form a third layer as a transparent protective film, and CeO2 is deposited on the third layer so as to form a fourth layer as a transparent protective film. Then, while O2 gas is introduced into the chamber, SiO2 is deposited on the fourth layer so as to form a fifth layer as a transparent protective film.

Abstract: An improved high temperature chemical treatment of deposited silica films wherein they are subjected to a reactive ambient comprising hydrogen and oxygen atoms. This method results in better elimination of residual undesirable oscillators so as to provide improved optical quality silica waveguides with reduced optical absorption.

Abstract: Silicon dioxide thin film have been deposited at temperatures from 25° C. to 250° C. by plasma enhanced chemical vapor deposition (PECVD) using tetramethylsilane (TMS) as the silicon containing precursor. At these temperatures, the PETMS oxide films have been found to exhibit adjustable stress and adjustable conformality. Post deposition annealing in forming gas at or below the deposition temperatures has been shown to be very effective in improving the PETMS oxide properties while preserving the low temperature aspect of the PETMS oxides.

Abstract: The invention relates to a coated glass substrate, covered with at least one thin layer based on silicon nitride or silicon oxynitride. The thin layer contains the elements Si, O, N, C in the following atomic percentages: Si: from 30 to 60%, N: from 10 to 56%, O: from 1 to 40%, C: from 1 to 40%. The invention also relates to the process for obtaining the coated glass substrate using a gas-phase pyrolysis technique, and to its applications.

Abstract: A water repellent glass treatment for automotive applications comprising a windshield washer solvent which contains quaternary compounds, preferably siloxane based quaternary ammonium compounds, fatty quaternary ammonium compounds, and mixtures thereof which are dispersible in water, alcohol's and water alcohol mixtures and imparts a good degree of hydrophobicity to the windshield surface. The fluid is used in underhood washer solvent reservoirs and applied to the windshield of the automobile in the conventional manner and is packaged in diluted solution or a concentrate for addition to the windshield cleaner/solvent solution.

Abstract: An optically clear protective thin film having covalent chemical bonds on a molecular level between organic polymer and in situ generated silica molecules is formed from a hydrolyzed coating solution of tetraalkyl orthosilicate, epoxyalkylalkoxy silanes, (math)acryloxyalkylalkoxy silanes and solvent.

Abstract: A solar control transparent glass sheet is provided by a soda-lime glass sheet carrying a coating of at least two pyrolytically-formed layers, characterised by the presence in the coating of a conductive or semi-conductive layer having a thickness in the range 15 to 500 nm and formed of a material comprising a metal oxide containing a dopant in an amount of from 1 to 100 moles per 100 moles of the metal oxide, the said metal oxide being selected from one or more of tungsten trioxide (W03), molybdenum trioxide (MoO3), niobium pentoxide (Nb2O5), tantalum pentoxide (Ta2O5), vanadium pentoxide (V2O5) and vanadium dioxide (VO2), whereby the so-coated sheet has a neutral or blue tint in transmission and in reflection, a luminous transmittance (TL) which is in the range 30 to 85% and a selectivity of greater than 1, preferably greater than 1.2.

Abstract: A optic is produced for operation at the fundamental Nd:YAG laser wavelength of 1.06 micrometers through the tripled Nd:YAG laser wavelength of 355 nanometers by the method of reducing or eliminating the growth of laser damage sites in the optics by processing the optics to stop damage in the optics from growing to a predetermined critical size. A system is provided of mitigating the growth of laser-induced damage in optics by virtue of very localized removal of glass and absorbing material.

Abstract: The present invention relates to a more easily recyclable enamel composition which includes at least one glass frit and includes, as pigment(s), at least one or more manganese compounds, this composition furthermore having a melting temperature below 750° C. The invention also relates to an enamelling process using this composition, as well as to the enamelled products obtained.

Abstract: A hydrophobic/oleophobic coating is formed on a substrate by a process, which comprises ionizing at least one precursor during deposition on the substrate, while during deposition the substrate temperature decreases from a temperature above 80° C. to a temperature below 80° C.

Abstract: A glazing assembly is provided made of at least one transparent substrate having a stack thereon that includes an alternation of n functional layers and n−1 coatings, wherein the functional layers have reflection properties in the infrared and/or solar radiation and where n≧1 and where, in order to maintain the quality of the stack when the substrate is subjected to a heat treatment step, at least one of the following must be satisfied:

Abstract: A method for applying a light-blocking layer between a photoconducting layer and a mirror when making an optically addressable spatial light modulator (OASLM) using a chemical vapor deposition process. The light-blocking layer and the photoconducting layer are applied in a shared process step in which both the thickness and composition of the photoconducting layer to be applied to the transparent electrode, as well as the thickness and composition of the light-blocking layer to be applied to the photoconducting layer are determined by a time-related change of the variation of the gas composition during the deposition process. The structure of the OASLM can be optimally adapted to a desired purpose.

Abstract: An anti-reflection high conductivity multi-layer coating for CRT products includes three layers coating created by vacuum sputtering and a fourth layer coating created by wet coating process. A first layer, nearest to the substrate, is made of a transparent conductive oxide material having a refractive index within the approximating range of 1.85 to 2.1 at a wavelength of 520 nm. The second layer is formed from an oxide material having a refractive index within the range of 1.45 to 1.50 at a wavelength of 520 nm. The third layer is formed of an oxide material having a refractive index within the range of 1.85 to 2.2 at a wavelength of 520 nm. The fourth layer has a refractive index within the range of 1.45 to 1.55 at a wavelength of 520 nm.

Abstract: A hydrophilic mirror comprising a glass substrate having on the main surface side thereof a layer having a refractive index n1 at 550 nm, a layer having a refractive index n2 at 550 nm, a titanium oxide layer having a refractive index n3 at 550 nm, and an overcoat in this order, the refractive indices n1, n2 and n3 satisfying the relationship: n1≧n3>n2, and having a visible light reflectance of 70% or more.

Abstract: Composition for preparing water-repellent coatings on optical substrates, comprising a porous, electrically conductive molding and an organosilicon compound, obtainable by mixing an electrically conductive or semiconductive support material with a binder and subjecting the mixture to compression molding to form a compression molding, sintering the compression molding at preferably 1100 to 1500° C. in air to form a porous molding, impregnating the molding with the organosilicon compound, and ageing the impregnated molding by storage in air for at least 3 days.

Abstract: A thin film layer can be formed on a glass substrate by preheating the substrate, depositing an amorphous silicon precursor layer on the substrate at a first temperature, and annealing the substrate in a thermal processing chamber at a second temperature sufficiently higher than the first temperature to substantially reduce the hydrogen concentration in the precursor layer. The preheating and annealing steps can occur in the same thermal processing chamber. Then the precursor layer is converted to a polycrystaline silicon layer by laser annealing.

Abstract: A film containing TiO2 and SiO2. It is formed by depositing TiO2 and SiO2 onto a substrate by sputtering method, or depositing their vapors thereon. The film is heat treated at a temperature of 200-1200° C. to form a film of anatase type TiO2 containing SiO2.

Abstract: There is provided a quartz glass crucible for pulling a silicon single crystal and a production process for the crucible, wherein an inner surface of the crucible is crystallized without addition of impurities during pulling a silicon single crystal, thereby impurities serving as causes of crystal defects being not incorporated into the silicon single crystal, so that deterioration of its inner surface is suppressed to improve a crystallization ratio, and accordingly productivity of the quartz glass crucible as well as a quality of the silicon single crystal is improved, and the quartz glass crucible for pulling a silicon single crystal comprises a crucible base body (3) made of a translucent quartz glass layer and a synthetic quartz glass layer (4) formed on an inner wall surface of the crucible base body (3), wherein a portion encircled by a brown ring on an inner surface of the quartz glass crucible is uniformly crystallized during pulling the silicon single crystal.

Abstract: An antisoiling coating for an antireflective surface, particularly the outer surface of an antireflective film stack, wherein the antisoiling coating includes a fluorinated siloxane, preferably prepared by applying a coating composition of a fluorinated silane, having a number average molecular weight of at least about 1000, of the following formula: Rƒ—[—R1—SiY3−xR2x]y  (I) wherein: Rƒ is a monovalent or divalent polyfluoropolyether group; R1 is a divalent alkylene group, arylene group, or combinations thereof, R2 is a lower alkyl group; Y is a halide, a lower alkoxy group, or a lower acyloxy group; x is 0 or 1; and y is 1 or 2.

Abstract: A method of depositing a silicon oxide coating on hot glass at a temperature below 600° C. comprising contacting the hot glass with a gaseous mixture of a source of silicon and oxygen enriched with ozone. Preferably, the hot glass in the form of a hot glass ribbon is contacted with the gaseous mixture during the float glass production process downstream of the float bath. Preferred sources of silicon are silanes, alkylsilanes, alkoxysilanes and siloxanes.

Abstract: A lens comprises a lens body having a lens surface with a convex-concave portion and a filler whose optical characteristics are the same as or much similar to that of said lens body, wherein said convex-concave portion of said lens is filled with said filler.

Abstract: A method of and a solution for making a highly porous optical antireflection coating of a selectively designed index of refraction, by applying a colloidal dispersion derived from hydrolytically condensing, in the presence of water and a catalyst, one or more silicon compounds of the general formula RaSiX4-a, or precondensates derived therefrom, to a substrate. In the formula, R is an organic group having from 1 to 10 carbon atoms which may be interrupted by oxygen atoms and/or sulfur atoms and/or amino groups, X is hydrogen, halogen, hydroxy, alkoxy, acyloxy, alkylcarbonyl, alkoxycarbonyl or NR′2, R′ being hydrogen, alkyl or aryl and a being 0, 1 or 2. The solution also contains colloidally dispersed organic polymers at a molar ratio, relative to the silane, between 0.1 mmol/mol silane and 100 mmol/mol silane, the median molecular mass of the polymer being between 200 and 500,000. Sol-vents, preferably alcohol, may also be present in the solution.

Abstract: In the method of fabricating a CRT including a sputtering method for forming an anti-static layer and a spin-coating or spray-coating method for forming an anti-reflection layer on a CRT panel, a method of fabricating a low-resistance, anti-reflection CRT is characterized by applying a silicon oxide (SiO2) coating between the anti-static layer and the anti-reflection layer by a sputtering method. As a result, the CRT has enhanced strength of layers and a low surface resistance. Also, the screen is provided with a charge protection function in the surface, with reflectivity of an external light being mitigated. As a result, it is possible to enhance the contrast characteristics of the screen, to avoid leaving fingerprints on the screen, and also to eliminate unpleasant feeling of static electricity.

Abstract: A heat treatable, durable and chemically resistant layer system for glasses used for automotive and architectural purposes includes a metallic layer of nickel or alloy thereof overcoated with silicon nitride (Si.sub.3 N.sub.4). The layer system may include an undercoat of silicon nitride (Si.sub.3 N.sub.4) and the metallic layer may also include silicon nitride. The metallic layer may be partially oxidized or surrounded by layers of stoichiometric oxides of the metal. The metallic layer, however, should not contain a nitride.

Abstract: Silicon dioxide thin films have been deposited at temperatures from 40.degree. C. to 250.degree. C. by plasma enhanced chemical vapor deposition (PECVD) using tetramethylsilane (TMS) as the silicon containing precursor. The properties of the PECVD TMS oxides (PETMS-Oxs) were analyzed with Fourier TransformInfrared (FTIR) transmissionspectroscopy, BOEand P-etch rates and both current-voltage (I-V) and capacitance-voltage (C-V) electrical characterization. It was found that the deposition rate for films produced from TMS increased with decreasing temperature; that the --OH inclusions could be affected by TMS flow rate; and that He dilution rate affected trapping for films produced over the temperature range explored. At both 130.degree. C. and 250.degree. C., deposition conditions were identified which formed high quality as-deposited oxide films. Under the best conditions, unannealed Al/PETMS-Ox/c-Si capacitor structures displayed flat band voltages of V.sub.fb -2.9 V and breakdown fields (V.sub.

Abstract: A heat formable mirror is formed by sputter depositing upon a sheet such as glass a reflective coating utilizing a base layer of silicon or a combination of silicon and stainless steel films, a reflective layer formed of a reflective metallic film such as titanium or aluminum, and a protective layer comprising preferably silicon nitride. The resulting mirror can be heat formed at elevated temperatures to form a curved mirror having a reflective coating free of objectionable defects.

Abstract: A method is described for strengthening or restoring strength to a flat brittle oxide substrate which includes the steps of coating the edges of the brittle oxide substrate with a strengthening composition without coating a significate portion of the flat surfaces. The strengthen brittle oxide substrate such as glass and a window containing as the window pane the edge strengthen glass are also provided.